CN106483719B - A kind of electronic equipment, array substrate and preparation method thereof - Google Patents
A kind of electronic equipment, array substrate and preparation method thereof Download PDFInfo
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- CN106483719B CN106483719B CN201611247179.6A CN201611247179A CN106483719B CN 106483719 B CN106483719 B CN 106483719B CN 201611247179 A CN201611247179 A CN 201611247179A CN 106483719 B CN106483719 B CN 106483719B
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- color blocking
- blocking layer
- layer
- convex block
- light shield
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
- G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133512—Light shielding layers, e.g. black matrix
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
- G02F1/13396—Spacers having different sizes
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- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Optical Filters (AREA)
- Liquid Crystal (AREA)
Abstract
The invention discloses a kind of electronic equipment, array substrate and preparation method thereof, wherein production method includes by forming multiple color blocking layers arranged side by side and multiple convex blocks in base side, convex block is stacked by least part in color blocking layer and is formed, and the height of convex block is different, and light shield layer is further set in color blocking layer, and light shield layer and convex block are formed together spacer column.By the above-mentioned means, the present invention forms the separation material with different height difference without designing special light shield, simplify processing procedure and reduce production cost, and improves the uneven situation of display base plate display.
Description
Technical field
The present invention relates to field of display technology, more particularly to a kind of electronic equipment, array substrate and preparation method thereof.
Background technique
In the prior art, liquid crystal display substrate includes BM (black matrix) and PS (Photo Space；Spacer), wherein BM
Interception is played in liquid crystal display substrate so that display panel reaches preferable display effect, PS be set to two substrates it
Between to maintain the distance between liquid crystal display substrate two substrates, PS generally includes Main PS (primary interval object) and Sub PS is (auxiliary
Help spacer), wherein Main PS plays the effect of support liquid crystal cell thickness, Sub PS when array substrate and color membrane substrates seal
Support and buffer function are played when liquid crystal cell is squeezed by further external force.
The BM and PS of the liquid crystal display substrate of industry production at present, can be used following methods:
One, conventional design, using transparent PS material, BM and the independent processing procedure of PS difference twice are completed, process efficiency
It is low, it is at high cost, and the difference in height in order to realize Main PS and Sub PS, different shapes is usually designed on PS light shield
To realize the purpose of Main PS Yu Sub PS different height, needs to be separately provided the type and quantity of PS light shield, increase processing procedure
Complexity.
Two, using improved material BPS (Black Photo Space), BM is synthesized with PS and is completed in processing procedure together,
But current processing method is needed by MTM (Multi Tone Mask；Multisection type adjusts light shield) technology, to realize three to BPS
The exposure light irradiation of kind varying strength, and then the BPS figure of three different-thickness, i.e. BM, Main PS and Sub are obtained after developing
PS, but need to combine three height, the more difficult tune of BPS yellow light technique since MTM light shield is complicated and expensive, and in exposure
Section, therefore, production cost also remains high, and production efficiency is not high.
Summary of the invention
In view of this, the present invention provides a kind of electronic equipment, array substrate and preparation method thereof, LCD display can be reduced
The production cost of plate, and process difficulty is reduced, improve production efficiency.
In order to solve the above technical problems, an aspect of of the present present invention provides a kind of production method of array substrate, comprising: in base
Layer side forms at least the first color blocking layer arranged side by side, the second color blocking layer, at least the first convex block, the second convex block, the first convex block
It is stacked by respective a part of two color blocking layers at least the first color blocking layer, the second color blocking layer, the second convex block is by extremely
Few first color blocking layer, a part of of a color blocking layer in the second color blocking layer are constituted, and the first convex block is higher than the second convex block；In base
Side forms the light shield layer being arranged side by side together at least the first color blocking layer, the second color blocking layer, and the screening on the first convex block
Photosphere follows protrusion to form the first spacer column, and is higher than between the light shield layer on the second convex block follows protrusion to be formed second
Spacer post.
Wherein, the light shield layer packet being arranged side by side together at least the first color blocking layer, the second color blocking layer is formed in base side
Include: in the shading layer material of base's side coating fluid shape, shading layer material covers at least the first convex block, the second convex block；It is hiding
Before photosphere material levelling, using light shield to light shield layer material exposure, wherein between respective pixel region lightproof area light shield
Zonal ray percent of pass is identical；Etch away the shading layer material in respective pixel region.
Wherein, production method further comprises: be further formed third color blocking layer in the side of base, third color blocking layer with
At least the first color blocking layer, the second color blocking layer, at least the first convex block, the second convex block be arranged side by side, the first convex block by the first color blocking layer,
Respective a part of second color blocking layer stacks, and the second convex block is made of a part of three color blocking layers；Forming the first color
It while resistance layer, the second color blocking layer, respectively leaves a part and forms stacking color blocking block, to form the first convex block, forming third color
While resistance layer, leaves a part of color blocking block and form the second convex block.
Wherein, light shield layer extends along the orientation strip of the first color blocking layer, the second color blocking layer, while also along first
Boundary linear between color blocking layer, the second color blocking layer extends；Or light shield layer is only along the row of the first color blocking layer, the second color blocking layer
Column direction strip extends, and array substrate includes pixel electrode and along the line of demarcation between the first color blocking layer, the second color blocking layer
The array public electrode that strip extends, array public electrode and pixel electrode same layer are arranged, and voltage with to public on substrate
Electrode is identical.
In order to solve the above technical problems, another aspect of the present invention provides a kind of array substrate, comprising: base；At least first
Color blocking layer, the second color blocking layer, are arranged side by side in base side；Light shield layer, together at least the first color blocking layer, the second color blocking layer simultaneously
Row is set to base side；At least the first convex block, the second convex block, are set between light shield layer and base, and the first convex block is by least
Respective a part of two color blocking layers in first color blocking layer, the second color blocking layer stacks, and the second convex block is by least first
A part of a color blocking layer in color blocking layer, the second color blocking layer is constituted, and the first convex block is higher than the second convex block, so that the first convex block
On light shield layer follow protrusion to form the first spacer column, and be higher than the light shield layer on the second convex block and follow protrusion to be formed
The second spacer column
Wherein, light shield layer is etched using light shield, and the light shield zonal ray percent of pass of corresponding light shield layer is identical.
Wherein, array substrate further comprises third color blocking layer, the first convex block by the first color blocking layer, the second color blocking layer it is each
It is stacked from a part, the second convex block is made of a part of three color blocking layers.
Wherein, the first color blocking layer, the second color blocking layer are red color resistance layer, green color blocking layer respectively, and third color blocking layer is blue
Color color blocking layer.
Wherein, light shield layer extends along the orientation strip of the first color blocking layer, the second color blocking layer, while also along first
Boundary linear between color blocking layer, the second color blocking layer extends；Or light shield layer is only along the row of the first color blocking layer, the second color blocking layer
Column direction strip extends, and array substrate includes pixel electrode and along the line of demarcation between the first color blocking layer, the second color blocking layer
The array public electrode that strip extends, array public electrode and pixel electrode same layer are arranged, and voltage with to public on substrate
Electrode is identical.
In order to solve the above technical problems, the third aspect of the present invention provides a kind of electronic equipment, including above-mentioned array substrate.
Through the above scheme, the beneficial effects of the present invention are: being different from the prior art, array substrate of the invention can lead to
It crosses the side in base and forms multiple color blocking layers, and multiple convex blocks, and convex block are formed by at least partly stacking of multiple color blocking layers
Height it is different, and then light shield layer is further set on convex block, so that the spacer column of different height is formed, to realize simplification
Processing procedure, and the light shield by labyrinth is not needed, production cost is reduced, production efficiency is improved.
Detailed description of the invention
To describe the technical solutions in the embodiments of the present invention more clearly, make required in being described below to embodiment
Attached drawing is briefly described, it should be apparent that, drawings in the following description are only some embodiments of the invention, for
For those of ordinary skill in the art, without creative efforts, it can also be obtained according to these attached drawings other
Attached drawing.Wherein:
Fig. 1 is the flow diagram of the production method of the array substrate of one embodiment of the invention；
Fig. 2 is the top view of the array substrate of one embodiment of the invention；
Fig. 3 is sectional view of the array substrate shown in Fig. 2 along A-A' line；
Fig. 4 is the top view of the array substrate of further embodiment of this invention；
Fig. 5 is the structural schematic diagram of the electronic equipment of one embodiment of the invention.
Specific embodiment
Following will be combined with the drawings in the embodiments of the present invention, and technical solution in the embodiment of the present invention carries out clear, complete
Site preparation description, wherein identical label indicates same or similar element or element with the same or similar functions in the present invention.
Obviously, described embodiments are only a part of the embodiments of the present invention, rather than whole embodiments.Based on the reality in the present invention
Apply example, those of ordinary skill in the art's every other embodiment obtained under the premise of not making creative labor, all
Belong to the scope of protection of the invention.
It is please the flow diagram of the production method of the array substrate of one embodiment of the invention referring to Fig. 1-3, Fig. 1 together,
Fig. 2 is the top view of array substrate made from the production method using Fig. 1, and Fig. 3 is the cuing open along A-A' line of array substrate shown in Fig. 2
Face figure.As shown in Figure 1-3, the production method of the array substrate 100 of the present embodiment includes:
S101: at least the first color blocking layer 120 arranged side by side, the second color blocking layer 130, at least are formed in 110 side of base
First convex block 101 and the second convex block 102.
Wherein, the material of base 110 can be glass baseplate or plastic basis material.First convex block 101 is by least the first color blocking layer
120, respective a part of two color blocking layers in the second color blocking layer 130 stacks, and the second convex block 102 is by least the first color
A part of a color blocking layer in resistance layer 120, the second color blocking layer 130 is constituted, and the height h1 of the first convex block 101 is greater than the
The height h2 of two convex blocks 102.Wherein, the first color blocking layer 120 and the second color blocking layer 130 can be red color resistance layer R, green color blocking layer
Any two kinds in G or blue color blocking layer B.Therefore, can be while forming the first color blocking layer 120 and the second color blocking layer 130, it will
First color blocking layer 120 and the second color blocking layer 130, which respectively leave a part and formed, stacks color blocking block, and the stacking color blocking block is made to be formed as the
One convex block 101, and while forming the first color blocking layer 120 or the second color blocking layer 130, by the first color blocking layer 120 or second
Color blocking layer 130 leaves a part and forms color blocking block, so that the color blocking block is formed as the second convex block 102, and keep the first convex block 101 high
In the second convex block 102.
In other embodiments, also it can be further formed third color blocking layer 140 in the side of base 110, and makes third color
Resistance layer 140 and at least the first color blocking layer 120, the second color blocking layer 130, at least the first convex block 101, the second convex block 102 are arranged side by side,
In turn, the first convex block 101 can be stacked by respective a part of the first color blocking layer 120, the second color blocking layer 130, the second convex block
102 can be made of a part of third color blocking layer 140.Therefore, formed the first color blocking layer 120, the second color blocking layer 130 it is same
When, it can be stacked into color blocking layer by first color blocking layer 120, a part that respectively leaves of the second color blocking layer 130, and then be formed
First convex block 101, while forming third color blocking layer 140, leave a part formed color blocking layer to form the second convex block 102,
And the first convex block 101 is made to be higher than the second convex block 102.
S102: in 110 side of base, formation is arranged side by side together at least the first color blocking layer 120, the second color blocking layer 130
Light shield layer 103.
Wherein, in 103 material of light shield layer of 110 side coating fluid shape of base, such as BPS, the covering of 103 material of light shield layer
At least the first convex block 101, the second convex block 102, the light shield layer before 103 material levelling of light shield layer, i.e. on the first convex block 101
During 103 materials are still higher than 103 material of light shield layer on the second convex block 102,103 material of light shield layer is exposed using light shield
Light, and then by 103 material solidification of light shield layer on the light shield layer 103 and the second convex block 102 on the first convex block 101, that is, make
103 material of light shield layer on first convex block 101 is higher than the relationship solidification of 103 material of light shield layer on the second convex block 102.Then,
Etch away 103 material of light shield layer in respective pixel region so that the light shield layer 103 being formed on the first convex block 101 follow it is convex
It rises to form the first spacer column 104, is formed between the light shield layer 103 on the second convex block 102 follows protrusion to be formed second
Spacer post 105, the height h6 of the first spacer column 104 are greater than the height h7 of the second spacer column 105.Wherein, correspond to pixel region it
Between lightproof area light shield region light transmittance it is identical.Therefore, after development etching, light shield layer 103 is each in array substrate 100
The thickness in a region is identical, i.e., so that the difference in height of the first spacer column 104 and the second spacer column 105 is the height of color blocking lamination
Difference.
In the present embodiment, light shield layer 103 prolongs along the orientation strip of the first color blocking layer 120, the second color blocking layer 130
It stretches, while extending also along the boundary linear between the first color blocking layer 120, the second color blocking layer 130.In other embodiments,
As shown in figure 4, light shield layer 103 can extend only along the orientation strip of the first color blocking layer 120, the second color blocking layer 130, array
Substrate 200 further comprise pixel electrode (not shown) and along between the first color blocking layer 120, the second color blocking layer 130 point
The array public electrode 220 that boundary line strip extends, array public electrode 220 and pixel electrode same layer are arranged, and voltage with to base
Public electrode on plate is identical.
To sum up, the production of the array substrate 100 of the present embodiment, by the way that multiple color blockings are arranged side by side in the side of base 110
Layer is stacked by respective a part in multiple color blocking layers and forms multiple convex blocks, and light shield layer 103, shading are arranged in color blocking layer
Layer 103 is formed on convex block and with convex block protrusion and then formation spacer column, since the height of convex block is different, between being formed
The height of spacer post is also different, and therefore, the present embodiment is formed without additional setting BM by the difference in height of color blocking lamination
The spacer column of different height is formed simultaneously BM, Main PS and Sub PS, the light shield without design complex configurations is to form not
Level spacer column reduces production cost, and simplifies processing procedure, reduces process difficulty.
It is please the top view of the array substrate of one embodiment of the invention referring further to Fig. 2, Fig. 2.As shown in Fig. 2, this reality
Apply example array substrate 100 include base 110, be formed in base 110 light shield layer 103, be formed in light shield layer 103 enclose set and
At subpixel area in single layer color blocking layer, wherein in red subpixel areas be arranged red color resistance layer R, green sub-pixels
Green color blocking layer G is set in region, blue color blocking layer B is set in blue subpixel areas, and in adjacent subpixel area
Color blocking lamination made of a part in corresponding color blocking layer stacks is formed, as shown in Fig. 2, by taking two rows of subpixel areas as an example,
In the corresponding region of controlling grid scan line, it is formed with the color blocking lamination of part red color resistance layer R and green color blocking layer G formation, and
In addition the blue color blocking layer B of position.
In conjunction with Fig. 2, please further referring to Fig. 3, Fig. 3 is sectional view of the array substrate shown in Fig. 2 along A-A' line.Such as Fig. 3 institute
Show, array substrate 100 includes base 110, at least the first color blocking layer 120, the second color blocking layer 130, light shield layer 103, at least first
Convex block 101 and the second convex block 102.Wherein, at least the first color blocking layer 120 and the second color blocking layer 130 are arranged side by side in base 110 1
Side, light shield layer 103 are arranged side by side in 110 side of base, at least together at least the first color blocking layer 120 and the second color blocking layer 130
First convex block 101 and the second convex block 102 are set between light shield layer 103 and base 110, and the first convex block 101 is by least
Respective a part of two color blocking layers in one color blocking layer 120, the second color blocking layer 130 stacks, and the second convex block 102 is by extremely
Few first color blocking layer 120, a part of of a color blocking layer in the second color blocking layer 130 are constituted, and it is convex that the first convex block 101 is higher than second
Block 102, so that the light shield layer 103 on the first convex block 101 follows protrusion to form the first spacer column 104, and it is convex to be higher than second
Light shield layer 103 on block 102 follows second spacer column 105 of the protrusion to be formed.
In other embodiments, array substrate 100 further comprises third color blocking layer 140, and the first convex block 101 is by the first color
Resistance layer 120, respective a part of the second color blocking layer 130 stack, and the second convex block 102 is a part of structure by three color blocking layers
At optionally, the first color blocking layer 120, the second color blocking layer 130 are red color resistance layer R, green color blocking layer G, third color blocking layer respectively
140 be blue color blocking layer B.Or first color blocking layer 120, the second color blocking layer 130 and third color blocking layer 140 are red respectively
Any one in color blocking layer R, green color blocking layer G and blue color blocking layer B, no longer limits herein.
Fig. 3 illustrates by taking red color resistance layer R, green color blocking layer G and blue color blocking layer B as an example.Wherein the first convex block 101 and
Two convex blocks 102 are set between light shield layer 103 and base 110, and the first convex block 101 is by red color resistance layer R's and green color blocking layer G
It respectively partially stacks, the second convex block 102 is made of a part in blue color blocking layer B, and the height h1 of the first convex block 101 is big
The first convex block 101 is followed to convex to form the first interval in the light shield layer 103 on the height h2 of the second convex block 102, the first convex block 101
Column 104, the light shield layer 103 on the second convex block 102 follow the second convex block 102 to convex to form the second spacer column 105.
Wherein, light shield layer 103 is etched using light shield, and the light shield zonal ray percent of pass phase of corresponding light shield layer 103
Together, therefore, so that corresponding to the thickness h 3 of the light shield layer 103 on the first convex block 101, corresponding to the shading on the second convex block 102
The thickness h 5 of the light shield layer 103 of the thickness h 4 and remaining region of layer 103 is equal.
Also, light shield layer 103 extends along the orientation strip of red color resistance layer R, green color blocking layer G, while also edge
The boundary linear extension of red coloration color blocking layer R, green color blocking layer G.
In other embodiments, as shown in figure 4, light shield layer 103 can be only along the row of red color resistance layer R, green color blocking layer G
Column direction strip extends, and array substrate 200 further includes pixel electrode (not shown) and along red color resistance layer R and green color blocking
The array public electrode 220 that boundary linear between layer G extends, array public electrode 220 and pixel electrode same layer are arranged, and
Voltage is identical as to the public electrode (not shown) in substrate (not shown).
Therefore, the present embodiment can form color blocking lamination in base 110, and light shield layer further is arranged on color blocking lamination
103, so that forming difference in array substrate 100 has different height spacer column, i.e., using the difference in height of color blocking lamination
BM, Main PS and Sub PS simplify the processing procedure of array substrate 100, reduce process difficulty and light shield cost, and without additional
BM is set, production efficiency is improved.
As shown in figure 5, the present invention also provides a kind of electronic equipment 300, including color membrane substrates 310, array substrate 100 or
200 and the liquid crystal layer 320 that is set between color membrane substrates 310 and array substrate 100 or 200, wherein array substrate 100 or 200
For the array substrate 100 or 200 of above-described embodiment, details are not described herein.
In conclusion be different from the prior art, electronic equipment of the present invention, array substrate and preparation method thereof, wherein array
Substrate can be by forming multiple color blocking layers arranged side by side in base side, and the respective part in multiple color blocking layers stacks shape
At convex block, and light shield layer is provided on convex block, thus form the spacer column of different height as BM, Main PS and Sub PS,
The process difficulty of array substrate is reduced, and reduces the cost of light shield, improves production efficiency.
The above description is only an embodiment of the present invention, is not intended to limit the scope of the invention, all to utilize this hair
Equivalent structure or equivalent flow shift made by bright specification and accompanying drawing content is applied directly or indirectly in other relevant skills
Art field, is included within the scope of the present invention.
Claims (10)
1. a kind of production method of array substrate, which is characterized in that the production method includes:
At least the first color blocking layer arranged side by side, the second color blocking layer, at least the first convex block, the second convex block are formed in base side,
First convex block by two color blocking layers at least first color blocking layer, the second color blocking layer it is respective a part stack and
At second convex block is made of a part of a color blocking layer at least first color blocking layer, the second color blocking layer, institute
The first convex block is stated higher than second convex block；
The light shield layer being arranged side by side together at least first color blocking layer, the second color blocking layer is formed in the base side, and
And the light shield layer on first convex block follows protrusion to form the first spacer column, and is higher than on second convex block
The light shield layer follow second spacer column of the protrusion to be formed.
2. manufacturing method according to claim 1, which is characterized in that described to be formed and described at least first in base side
The light shield layer that color blocking layer, the second color blocking layer are arranged side by side together includes:
In the shading layer material of the base side coating fluid shape, the shading layer material cover at least first convex block,
Second convex block；
Before the light shield layer material levelling, using light shield to the light shield layer material exposure, wherein respective pixel region it
Between lightproof area the light shield zonal ray percent of pass it is identical；
Etch away the shading layer material in the respective pixel region.
3. production method according to claim 1 or 2, which is characterized in that the production method further comprises:
Third color blocking layer is further formed in the side of the base, the third color blocking layer and at least first color blocking layer,
Second color blocking layer, at least first convex block, second convex block are arranged side by side, and first convex block is by first color
Resistance layer, respective a part of the second color blocking layer stack, and second convex block is made of a part of three color blocking layer；
While forming first color blocking layer, second color blocking layer, respectively leaves a part and form stacking color blocking block, with shape
It leaves a part of color blocking block while forming the third color blocking layer at first convex block and forms second convex block.
4. production method according to claim 3, which is characterized in that the light shield layer is along first color blocking layer,
The orientation strip of two color blocking layers extends, while also along the boundary lines between first color blocking layer, the second color blocking layer
Shape extends；Or
The light shield layer extends only along the orientation strip of first color blocking layer, the second color blocking layer, the array substrate
Including pixel electrode and the array common electrical extended along the boundary linear between first color blocking layer, the second color blocking layer
Pole, the array public electrode and the pixel electrode same layer are arranged, and voltage is identical as to the public electrode on substrate.
5. a kind of array substrate, which is characterized in that the array substrate includes:
Base；
At least the first color blocking layer, the second color blocking layer are arranged side by side in the base side；
Light shield layer is arranged side by side together at least first color blocking layer, the second color blocking layer in the base side；
At least the first convex block, the second convex block, are set between the light shield layer and the base, first convex block by it is described extremely
Few first color blocking layer, respective a part of two color blocking layers in the second color blocking layer stack, and second convex block is by institute
State at least the first color blocking layer, a part of a color blocking layer in the second color blocking layer is constituted, first convex block is higher than described the
Two convex blocks so that the light shield layer on first convex block follows protrusion to form the first spacer column, and are higher than described the
The light shield layer on two convex blocks follows second spacer column of the protrusion to be formed.
6. array substrate according to claim 5, which is characterized in that the light shield layer is etched using light shield, and right
Answer the light shield zonal ray percent of pass of the light shield layer identical.
7. array substrate according to claim 5, which is characterized in that the array substrate further comprises third color blocking
Layer, first convex block are stacked by first color blocking layer, respective a part of the second color blocking layer, and second convex block is
It is made of a part of three color blocking layer.
8. array substrate according to claim 7, which is characterized in that first color blocking layer, the second color blocking layer are respectively
Red color resistance layer, green color blocking layer, the third color blocking layer is blue color blocking layer.
9. array substrate according to claim 5, which is characterized in that the light shield layer is along first color blocking layer,
The orientation strip of two color blocking layers extends, while also along the boundary lines between first color blocking layer, the second color blocking layer
Shape extends；Or
The light shield layer extends only along the orientation strip of first color blocking layer, the second color blocking layer, the array substrate
Including pixel electrode and the array common electrical extended along the boundary linear between first color blocking layer, the second color blocking layer
Pole, the array public electrode and the pixel electrode same layer are arranged, and voltage is identical as to the public electrode on substrate.
10. a kind of electronic equipment, which is characterized in that including the array substrate as described in any one of claim 5 to 9.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201611247179.6A CN106483719B (en) | 2016-12-29 | 2016-12-29 | A kind of electronic equipment, array substrate and preparation method thereof |
Applications Claiming Priority (1)
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| KR102347665B1 (en) * | 2017-03-21 | 2022-01-07 | 삼성디스플레이 주식회사 | Display apparatus and method of manufacturing the same |
| CN106896571B (en) | 2017-04-10 | 2019-01-15 | 深圳市华星光电半导体显示技术有限公司 | The production method of the production method and liquid crystal display panel of color membrane substrates |
| CN107039352B (en) * | 2017-04-12 | 2019-09-10 | 深圳市华星光电半导体显示技术有限公司 | The production method and TFT substrate of TFT substrate |
| CN107065320A (en) * | 2017-06-05 | 2017-08-18 | 深圳市华星光电技术有限公司 | A kind of liquid crystal panel and its manufacture method |
| CN107275288B (en) * | 2017-06-16 | 2019-12-24 | 深圳市华星光电半导体显示技术有限公司 | TFT substrate manufacturing method and TFT substrate |
| CN107315287A (en) * | 2017-07-19 | 2017-11-03 | 深圳市华星光电半导体显示技术有限公司 | A kind of display panel and its processing procedure |
| CN107290911A (en) * | 2017-07-19 | 2017-10-24 | 深圳市华星光电半导体显示技术有限公司 | A kind of display panel and its processing procedure |
| CN107193162A (en) * | 2017-07-31 | 2017-09-22 | 深圳市华星光电技术有限公司 | A kind of array base palte and manufacture method |
| CN107728389A (en) * | 2017-10-17 | 2018-02-23 | 深圳市华星光电技术有限公司 | Liquid crystal display panel and preparation method thereof |
| CN108535909A (en) * | 2018-04-17 | 2018-09-14 | 深圳市华星光电技术有限公司 | The production method and BPS type array substrates of BPS type array substrates |
| CN109085713A (en) * | 2018-07-25 | 2018-12-25 | 深圳市华星光电半导体显示技术有限公司 | A kind of display panel and preparation method thereof |
| CN109814314A (en) * | 2018-12-25 | 2019-05-28 | 惠科股份有限公司 | The array substrate manufacturing method and display device of display device |
| CN109445178B (en) * | 2019-01-28 | 2019-04-26 | 南京中电熊猫平板显示科技有限公司 | A kind of color membrane substrates and its manufacturing method |
| CN114779535A (en) * | 2022-04-27 | 2022-07-22 | 京东方科技集团股份有限公司 | Display panel and display device |
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