CN106449995A - Ternary plate-type light active layer organic thin-film solar cell and preparation method thereof - Google Patents

Ternary plate-type light active layer organic thin-film solar cell and preparation method thereof Download PDF

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CN106449995A
CN106449995A CN201611179211.1A CN201611179211A CN106449995A CN 106449995 A CN106449995 A CN 106449995A CN 201611179211 A CN201611179211 A CN 201611179211A CN 106449995 A CN106449995 A CN 106449995A
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ternary
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李瑞锋
王斐
李典
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Abstract

The invention discloses a ternary plate-type light active layer organic thin-film solar cell. The ternary plate-type light active layer organic thin-film solar cell comprises a metal anode layer, an anode modifying layer, a ternary plate-type light active layer, a cathode buffering layer, a transparent conductive cathode layer and a liner layer which are arranged and superposed in sequence from top to bottom. An electron donor, a first electron acceptor and a second electron acceptor are made into a ternary plate-type structure which is perpendicular to the liner layer by optimizing the structure of the light active layer of a battery. A preparation method for the solar cell comprises the following steps: cleaning and drying a liner for later use; preparing the transparent conductive cathode layer, the cathode buffering layer, the ternary plate-type light active layer, the anode modifying layer and the metal anode layer on the liner in sequence; finally, obtaining the organic solar cell. According to the ternary plate-type light active layer disclosed by the invention, on one hand, a contact surface layer of a material is increased, so that more carriers can be generated; on the other hand, the annihilation of the carriers in migration can be reduced, and the photoelectric conversion efficiency of the solar cell is finally improved.

Description

Board-like photoactive layer organic thin film solar cell of a kind of ternary and preparation method thereof
Technical field
The present invention relates to a kind of area of solar cell, particularly to a kind of ternary plate organic thin film solar cell and its Preparation method.
Background technology
Because increasingly serious problem of environmental pollution, traditional energy faces progressively exhausted predicament, and photovoltaic generation is as replacing For the energy emphasis of concern, particularly organic solar batteries.This solaode has environmental friendliness, quality Gently, many advantages, such as flexible, thus the emphasis of the people's research during the decade that becomes history.Organic solar batteries are typical three Mingzhi's structure:Transparent conductive material as anode, the metal of low work function as negative electrode, centre be then common rail polymeric donor and The mixed layer of receptor.In recent years, organic ternary solaode causes people's increasingly keen interest, compared to binary electricity Pond, enhancing on light absorpting ability for the ternary battery makes their energy conversion efficiency higher.
2014, IBM academy invented a microcosmic(microscopic)3D printer, can be in soft polymerization The upper nanometer resolution pattern of thing engraving, subsequently extension is carried out in materials such as silicon, III-V (GaAs), or Graphene substrates Engraving.It can operate as the milling machine of nanometer resolution, carves out nano level groove on organic compound.
Common are machine ternary photoactive layer mainly has version, is to be subject to a kind of electron donor material and two kinds of electronics Make thin film after body material mixing, the heterogeneous photoactive layer of this body phase although contact area is larger, but hole and electronics to Electrode is easily buried in oblivion in migrating, the photoelectric transformation efficiency of impact battery.
Content of the invention
In order to overcome the deficiencies in the prior art, the present invention provides a kind of ternary board-like photoactive layer organic thin film solar electricity Pond, this battery with the difference of traditional ternary organic thin film cells is, by electron donor, the first electron acceptor and the second electron acceptor Make the hierarchy perpendicular to substrate layer, reduce the ratio that hole and electronics are mutually buried in oblivion in migrating to electrode, Neng Gouti High raising photoelectric transformation efficiency.
A kind of board-like photoactive layer organic thin film solar cell of ternary, including the metal being arranged in order superposition from top to bottom Anode layer 1, anode modification layer 2, the board-like photoactive layer of ternary 3, cathode buffer layer 4, transparent conductive cathode layer 5 and substrate layer 6.
The material of described metal anode layer 1 is:Argent, its film thickness is 1-5 μm.
The material of described anode modification layer 2 is:Tungsten oxide, its film thickness is 80-150nm.
The material of described photoactive layer 3 is:Polyphenyl 1,4-Dithiapentalene:Fullerene derivate:Bis (1-3- [(methoxycarbonyl group) Propyl group] -1- phenyl)-[6,6]-C70, its film thickness is 200-250nm.
The material of described cathode buffer layer 4 is:Zinc oxide, its film thickness is 80-150nm.
The material of described transparent conductive cathode layer 5 is:Electric conductive oxidation indium tin thin film, its film thickness is 120-250nm.
The material of described substrate layer 6 is:Poly terephthalic acid second two fat, its film thickness is 0.1-1.0mm.
The symbol of element of silver is Ag, and tungsten oxide symbol is WO3, polyphenyl 1,4-Dithiapentalene symbol is PTB7, fullerene derivate Symbol is PC70BM, Bis (1-3- [(methoxycarbonyl group) propyl group] -1- phenyl)-[6,6]-C70 symbol is Bis-PC70BM, zinc oxide Symbol is ZnO, and electric conductive oxidation indium tin thin film symbol is ITO, and poly terephthalic acid second two fat symbol is PET.
The Ag that described metal anode layer 1 is 3 μm for thickness, described anode modification layer 2 is the WO of 100nm3, described light work Property layer 3 be including electron donor 8, the first electron acceptor 7 and the second electron acceptor 9 composition ternary board-like photoactive layer structure, Thickness is 200nm;Described cathode buffer layer 4 is the ZnO of 140nm, and described transparent conductive cathode layer 5 and substrate layer 6 gross thickness are The PET-ITO of 0.125mm.
Described ternary plank frame photoactive layer, the separating surface of electron donor 8 and the first electron acceptor 7 and substrate layer 6 Vertically, the separating surface of electron donor 8 and the second electron acceptor 9 is vertical with substrate layer 6.
Described ternary plank frame photoactive layer, the material of electron donor 8 is PTB7, the material of the first electron acceptor 7 For PC70BM, the material of the second electron acceptor 9 is Bis-PC70BM.
The preparation method of the board-like photoactive layer organic solar batteries of ternary provided by the present invention, comprises the steps:
(1) in 100mmX100mm, thickness is on the PET-ITO substrate of 0.125mm(Zhuhai Kaivo Optoelectronic Technology Co., Ltd., The two-sided stiffened of PET is processed, light transmittance 85%, 45ohm/sq)It is etched into the fine strip shape with one fixed width, clean up and dry Stand-by;
(2) ZnO nanoparticle prepared using sol-gel process is dispersed in chlorobenzene, concentration is 50mg/mL, is then spin coated onto On transparent conductive film, spin coating machine speed is 4500rpm (rev/min), and spin coating time is 30s, and forming a layer thickness is The ZnO of 80-150nm, and heating 30min solidification, cooling under 200 °C;
(3) three kinds of material PTB7, PC70BM and Bis-PC70Choose any one kind of them in BM, thin layer is prepared on cathode buffer layer, control Thickness processed is 80-250nm, heating 15min solidification, cooling under 120 °C, obtains the thin film solidifying;
(4)From the beginning of any side of battery, from the beginning of at side 5-15nm, according to the interval of 15-45nm,(3)In To thin film on microcosmic 3D printer engraving width be 5-15nm, depth be 80-250nm straight trough;
(5) exist(3)In except making the material of thin film, three kinds of material PTB7, PC70BM and Bis-PC70Remaining two kinds of materials in BM Material arbitrarily selects a kind of material wiring solution-forming, is filled and led up straight trough with sol evenning machine, heating 15min solidification under 120 °C, and cooling obtains The thin film of solidification;
(6)With(4)In consistent battery side start, from the beginning of at side 10-30nm, according to the interval of 15-45nm, ?(5)In be 5-15nm with microcosmic 3D printer engraving width on the thin film that obtains, depth is the straight trough of 80-250nm, straight trough with (4)Middle straight trough direction is parallel;
(7) remove(3)With(5)The bi-material using, PTB7, PC in three kinds of materials70BM and Bis-PC70BM is not using material Straight trough is filled and led up by material wiring solution-forming with sol evenning machine, and under 120 °C, heating 15min solidification, cooling, obtain the board-like photolytic activity of ternary Layer;
(8)From with(4)Any side of the vertical battery of middle straight trough starts, and from the beginning of away from side 10nm, the interval according to 20nm is used Microcosmic 3D printer engraving width is 10nm, and depth is the straight trough of 50nm;
(9) one layer of WO of spin coating on photoactive layer3Layer, control spin coating machine speed is 1500rpm, spin coating time 20s, makes thickness 80-150nm, heating 30min solidification, cooling under 150 °C;
(10) in WO3Layer forms one layer of conductive silver paste, the wherein composition of slurry by quality ratio above with silk screen print method For:Particle diameter be l μm argentum powder 60%, adipic acid diformazan vinegar 30%, epoxy resin 1%, resol resin 9%, forming thickness is 1-5 μm of film, is placed in heating 40min solidification under 100 °C in glove box;
(11) finally whole device is placed in glove close annealing, obtains organic solar batteries.
Beneficial effects of the present invention:
A kind of ternary board-like photoactive layer organic thin film solar cell that the present invention provides, by optimizing the photoactive layer of battery Structure, by electron donor, the first electron acceptor and the second electron acceptor are constructed perpendicular to the ternary plank frame of substrate layer, this Structure can be effectively increased the contact area of electron donor material and electron acceptor material, reduces hole and electronics in migration course In the photoelectric transformation efficiency mutually buried in oblivion ratio, improve solaode.
Brief description
Fig. 1 is present configuration schematic diagram.
Fig. 2 is ternary board-like photoactive layer structural representation.
Specific embodiments
The present invention is described in detail in detail with reference to the accompanying drawings and in conjunction with the embodiments.
As shown in Figure 1:A kind of organic thin film solar cell of the board-like photoactive layer of ternary, including arranging successively from top to bottom The metal anode layer 1 of row superposition, anode modification layer 2, the board-like photoactive layer of ternary 3, cathode buffer layer 4, transparent conductive cathode layer 5 With substrate layer 6.
The preparation method of the board-like photoactive layer organic solar batteries of ternary provided by the present invention, comprises the steps:
(1) it is etched into the fine strip shape with one fixed width on PET-ITO substrate, clean up and dry stand-by;(2) by profit It is spin-coated on transparent conductive film with the solution of the ZnO of sol-gel process preparation, form cathode buffer layer;
(3) three kinds of material PTB7, PC70BM and Bis-PC70Choose any one kind of them in BM, cathode buffer layer prepares thin layer, 120 Heating 15min solidification, cooling under °C;
(4) from the beginning of any side of battery, carve width straight trough with microcosmic 3D printer;
(5) exist(3)In except making the material of thin film, three kinds of material PTB7, PC70BM and Bis-PC70Remaining two kinds of materials in BM Material arbitrarily selects a kind of material wiring solution-forming, is filled and led up straight trough with sol evenning machine, heating 15min solidification, cooling under 120 °C;
(6)With(4)In battery side consistent, be straight trough with microcosmic 3D printer engraving width, straight trough with(4)Middle straight trough direction Parallel;
(7) remove(3)With(5)The bi-material using, three kinds of material PTB7, PC70BM and Bis-PC70Not using material in BM Straight trough is filled and led up by material wiring solution-forming with sol evenning machine, heating 15min solidification, cooling under 120 °C;
(8)From with(4)Any side of the vertical battery of middle straight trough starts, and carves width straight trough with microcosmic 3D printer;
(9) one layer of PEDOT of spin coating on photoactive layer:PSS layer, prepares thin film and heats 30min solidification under 150 °C, cold But;
(10) in PEDOT:PSS layer forms one layer of conductive silver paste above with silk screen print method, prepares metal anode, is placed in Heating 40min solidification under 100 °C in glove box;
(11) finally whole device is placed in glove close annealing, obtains organic solar batteries.
Embodiment 1:
(1)In 100mmX100mm, thickness is on the PET-ITO substrate of 0.125mm(Zhuhai Kaivo Optoelectronic Technology Co., Ltd., The two-sided stiffened of PET is processed, light transmittance 85%, 45ohm/sq)It is etched into the fine strip shape with one fixed width, clean up and dry Stand-by;
(2) ZnO nanoparticle prepared using sol-gel process is dispersed in chlorobenzene, concentration is 50mg/mL, is then spin coated onto On transparent conductive film, spin coating machine speed is 4500rpm (rev/min), and spin coating time is 30s, and forming a layer thickness is The ZnO of 80nm, and heating 30min solidification, cooling under 200 °C;
(3) in ZnO layer, Deca contains PTB7, and total concentration is the chlorobenzene solution of 15mg/mL, and the rotating speed of control sol evenning machine is 4000rpm, spin coating time is 30s, and control thickness is 80nm, heating 15min solidification, cooling under 120 °C;
(4)From the beginning of any side of battery, from the beginning of with a distance from side for the position of 5nm, the microcosmic 3D of the interval according to 15nm Printer engraving width is 5nm, and depth is the straight trough of 80nm;
(5) on PTB7 layer, Deca contains PC70BM, total concentration is the chlorobenzene solution of 15mg/mL, and the rotating speed of control sol evenning machine is 4000rpm, stops after straight trough is filled and led up, heating 15min solidification, cooling under 120 °C;
(6)With(4)In beginning battery side consistent, from the beginning of with a distance from side for the position of 10nm, according to the interval of 15nm With microcosmic 3D printer engraving width be 5nm, depth be 80nm straight trough, straight trough with(4)Middle straight trough direction is parallel;
(7) on PTB7 layer, Deca contains Bis-PC70BM, total concentration is the chlorobenzene solution of 15mg/mL, controls the rotating speed of sol evenning machine For 4000rpm, stop after straight trough is filled and led up, under 120 °C, heating 15min solidification, cooling, obtain the board-like photoactive layer of ternary;
(8)From with(4)Any side of the vertical battery of middle straight trough starts, from the beginning of with a distance from side for the position of 10nm, according to The interval microcosmic 3D printer engraving width of 20nm is 10nm, and depth is the straight trough of 50nm;
(9) one layer of WO of spin coating on photoactive layer3Layer, control spin coating machine speed is 1500rpm, spin coating time 20s, makes film Thick 80nm, heating 30min solidification, cooling under 150 °C;
(10) in WO3Layer forms one layer of conductive silver paste, the wherein composition of slurry by quality ratio above with silk screen print method For:Particle diameter be l μm argentum powder 60%, adipic acid diformazan vinegar 30%, epoxy resin 1%, resol resin 9%, forms thickness for 1 μm film, be placed in glove box heating 40min solidification under 100 °C;
(11) finally whole device is placed in glove close annealing, obtains organic solar batteries.
Embodiment 2:
(1)In 100mmX100mm, thickness is on the PET-ITO substrate of 0.125mm(Zhuhai Kaivo Optoelectronic Technology Co., Ltd., The two-sided stiffened of PET is processed, light transmittance 85%, 45ohm/sq)It is etched into the fine strip shape with one fixed width, clean up and dry Stand-by;
(2) ZnO nanoparticle prepared using sol-gel process is dispersed in chlorobenzene, concentration is 50mg/mL, is then spin coated onto On transparent conductive film, spin coating machine speed is 4500rpm (rev/min), and spin coating time is 30s, and forming a layer thickness is The ZnO of 250nm, and heating 35min solidification, cooling under 180 °C;
(3) in ZnO layer, Deca contains PC70BM, total concentration is the chlorobenzene solution of 15mg/mL, and the rotating speed of control sol evenning machine is 3500rpm, spin coating time is 35s, and control thickness is 250nm, heating 15min solidification, cooling under 120 °C;
(4)From the beginning of any side of battery, from the beginning of with a distance from side for the position of 15nm, the microcosmic 3D of the interval according to 45nm Printer engraving width is 15nm, and depth is the straight trough of 250nm;
(5) in PC70On BM layer, Deca contains PTB7, and total concentration is the chlorobenzene solution of 15mg/mL, and the rotating speed of control sol evenning machine is 4000rpm, stops after straight trough is filled and led up, heating 15min solidification, cooling under 120 °C;
(6)With(4)In starting position consistent, from the beginning of with a distance from side for the position of 30nm, according to 45nm interval with micro- See 3D printer engraving width be 15nm, depth be 250nm straight trough, straight trough with(4)Middle straight trough direction is parallel;
(7) in PC70On BM layer, Deca contains Bis-PC70BM, total concentration is the chlorobenzene solution of 15mg/mL, controls the rotating speed of sol evenning machine For 4000rpm, stop after straight trough is filled and led up, under 120 °C, heating 15min solidification, cooling, obtain the board-like photoactive layer of ternary;
(8)From with(4)Any side of the vertical battery of middle straight trough starts, from the beginning of with a distance from side for the position of 10nm, according to The interval microcosmic 3D printer engraving width of 20nm is 10nm, and depth is the straight trough of 50nm;
(9) one layer of WO of spin coating on photoactive layer3Layer, control spin coating machine speed is 1500rpm, spin coating time 20s, makes thickness 150nm, heating 30min solidification, cooling under 150 °C;
(10) in WO3Layer forms one layer of conductive silver paste, the wherein composition of slurry by quality ratio above with silk screen print method For:Particle diameter be 1 μm argentum powder 60%, adipic acid diformazan vinegar 30%, epoxy resin 1%, resol resin 9%, formed thickness be 5 μm film, be placed in glove box heating 40min solidification under 100 °C;
(11) finally whole device is placed in glove close annealing, obtains organic solar batteries.
Embodiment 3:
(1)In 100mmX100mm, thickness is on the PET-ITO substrate of 0.125mm(Zhuhai Kaivo Optoelectronic Technology Co., Ltd., The two-sided stiffened of PET is processed, light transmittance 85%, 45ohm/sq)It is etched into the fine strip shape with one fixed width, clean up and dry Stand-by;
(2) ZnO nanoparticle prepared using sol-gel process is dispersed in chlorobenzene, concentration is 50mg/mL, is then spin coated onto On transparent conductive film, spin coating machine speed is 4500rpm (rev/min), and spin coating time is 30s, and forming a layer thickness is The ZnO of 140nm, and heating 35min solidification, cooling under 180 °C;
(3) in ZnO layer, Deca contains Bis-PC70BM, total concentration is the chlorobenzene solution of 15mg/mL, and the rotating speed of control sol evenning machine is 4500rpm, spin coating time is 35s, and control thickness is 200nm, heating 15min solidification, cooling under 120 °C;
(4)From the beginning of any side of battery, from the beginning of with a distance from side for the position of 10nm, the microcosmic 3D of the interval according to 30nm Printer engraving width is 10nm, and depth is the straight trough of 200nm;
(5) in Bis-PC70On BM layer, Deca contains PTB7, and total concentration is the chlorobenzene solution of 15mg/mL, controls the rotating speed of sol evenning machine For 4000rpm, stop after straight trough is filled and led up, heating 15min solidification, cooling under 120 °C;
(6)With(4)In starting position consistent, from the beginning of with a distance from side for the position of 20nm, according to 30nm interval with micro- See 3D printer engraving width be 10nm, depth be 200nm straight trough, straight trough with(4)Middle straight trough direction is parallel;
(7) in Bis-PC70On BM layer, Deca contains PC70BM, total concentration is the chlorobenzene solution of 15mg/mL, controls the rotating speed of sol evenning machine For 4000rpm, stop after straight trough is filled and led up, under 120 °C, heating 15min solidification, cooling, obtain the board-like photoactive layer of ternary;
(8)From with(4)Any side of the vertical battery of middle straight trough starts, from the beginning of with a distance from side for the position of 10nm, according to The interval microcosmic 3D printer engraving width of 20nm is 10nm, and depth is the straight trough of 50nm;
(9) one layer of WO of spin coating on photoactive layer3Layer, control spin coating machine speed is 1500rpm, spin coating time 20s, makes film Thick 100nm about, heating 30min solidification, cooling under 150 °C;
(10) in WO3Layer forms one layer of conductive silver paste, the wherein composition of slurry by quality ratio above with silk screen print method For:Particle diameter be 1 μm argentum powder 60%, adipic acid diformazan vinegar 30%, epoxy resin 1%, resol resin 9%, formed thickness be 3 μm film, be placed in glove box heating 50min solidification under 100 °C;
(11) finally whole device is placed in glove close annealing, obtains organic solar batteries.
The foregoing is only the representative embodiment of the present invention, never in any form limit the present invention, all this Any modification, equivalent or improvement made within the spirit of invention and principle etc., should be included in the protection model of the present invention Within enclosing.

Claims (9)

1. a kind of board-like photoactive layer organic thin film solar cell of ternary is it is characterised in that include being arranged in order from top to bottom The metal anode layer of superposition(1), anode modification layer(2), the board-like photoactive layer of ternary(3), cathode buffer layer(4), electrically conducting transparent Cathode layer(5)And substrate layer(6).
2. a kind of board-like photoactive layer organic thin film solar cell of ternary according to claim 1 is it is characterised in that institute State the photoactive layer of ternary plank frame, by the electron donor layer being parallel to each other(8), the first electron acceptor layer(7)With the second electricity Sub- receptive layers(9)Constitute.
3. a kind of board-like active layer organic thin film solar cell of ternary according to claim 1 is it is characterised in that described Metal anode layer(1)The Ag layer being 3 μm for thickness, described anode modification layer(2)WO for 100nm3, described photoactive layer(3) It is including electron donor material PTB7, the first electron acceptor material PC70BM and the second electron acceptor material BisPC70BM ternary plate The photoactive layer of formula structure, thickness is 200nm, described cathode buffer layer(4)ZnO for 200nm, described transparent conductive cathode Layer(5)And substrate layer(6)Gross thickness is the PET-ITO of 0.125mm.
4. according to claim 3 it is characterised in that described electron donor layer(8), width is 5-15nm, highly preferred width Spend for 10nm, highly for 80-250nm, highly preferred height is 200nm.
5. according to claim 3 it is characterised in that described electron acceptor layer(7), width is 5-15nm, highly preferred width Spend for 10nm, highly for 80-250nm, highly preferred height is 200nm.
6. according to claim 3 it is characterised in that described electron acceptor layer(9), width is 5-15nm, highly preferred width Spend for 10nm, highly for 80-250nm, highly preferred height is 200nm.
7. a kind of board-like photoactive layer organic thin film solar cell of ternary according to claim 2 is it is characterised in that Two electron acceptor layer(9)Demarcation line with electron donor layer(8)Vertical with substrate layer.
8. a kind of board-like photoactive layer organic thin film solar cell of ternary according to claim 3 is it is characterised in that Two electron acceptor layer(9)Demarcation line with electron donor layer(8)Vertical with substrate layer.
A kind of preparation of the 9 ternary board-like photoactive layer machine thin-film solar cells according to any one of claim 1-8 Method is it is characterised in that comprise the following steps:
1) in 100mmX100mm, thickness is on the PET-ITO substrate of 0.125mm(Zhuhai Kaivo Optoelectronic Technology Co., Ltd., The two-sided stiffened of PET is processed, light transmittance 85%, 45ohm/sq)It is etched into the fine strip shape with one fixed width, clean up and dry Stand-by;
2) ZnO nanoparticle prepared using sol-gel process is dispersed in chlorobenzene, concentration is 50mg/mL, is then spin coated onto On transparent conductive film, spin coating machine speed is 4500rpm (rev/min), and spin coating time is 30s, and forming a layer thickness is 80- The ZnO of 150nm, and heating 30min solidification, cooling under 200 °C;
3) three kinds of material PTB7, PC70BM and Bis-PC70Choose any one kind of them in BM, thin layer is prepared on cathode buffer layer, control Thickness is 80-250nm, heating 15min solidification, cooling under 120 °C, obtains the thin film solidifying;
4)From the beginning of any side of battery, from the beginning of at side 5-15nm, according to the interval of 15-45nm, 3)In obtain Thin film on microcosmic 3D printer engraving width be 5-15nm, depth be 80-250nm straight trough;
5) 3)In except making the material of thin film, three kinds of material PTB7, PC70BM and Bis-PC70In BM, remaining bi-material is appointed Meaning selects a kind of material wiring solution-forming, is filled and led up straight trough with sol evenning machine, heating 15min solidification under 120 °C, and cooling is solidified Thin film;
6)With 4)In consistent battery side start, from the beginning of at side 10-30nm, according to the interval of 15-45nm, 5)In Carving width with microcosmic 3D printer on the thin film obtaining is 5-15nm, and depth is the straight trough of 80-250nm, straight trough and 4)In straight Groove direction is parallel;
7) 3 are removed)With 5)The bi-material using, PTB7, PC in three kinds of materials70BM and Bis-PC70BM is not joined using material Become solution, with sol evenning machine, straight trough is filled and led up, under 120 °C, heating 15min solidification, cooling, obtain the board-like photoactive layer of ternary;
8)From with 4)Any side of the vertical battery of middle straight trough starts, from the beginning of away from side 10nm, according to 20nm interval with micro- Seeing 3D printer engraving width is 10nm, and depth is the straight trough of 50nm;
9) one layer of WO of spin coating on photoactive layer3Layer, control spin coating machine speed is 1500rpm, spin coating time 20s, makes thickness 80-150nm, heating 30min solidification, cooling under 150 °C;
10) in WO3Layer forms one layer of conductive silver paste above with silk screen print method, and the composition of wherein slurry is by quality ratio: Particle diameter be l μm argentum powder 60%, adipic acid diformazan vinegar 30%, epoxy resin 1%, resol resin 9%, forms thickness for 1-5 μ The film of m, is placed in heating 40min solidification under 100 °C in glove box;
11) finally whole device is placed in glove close annealing, obtains organic solar batteries.
9. according to Claim 8 described in a kind of board-like organic thin film solar cell of ternary preparation method, its feature exists In 4), 6)With 7)In straight trough refer to that downwards engraving forms from surface after thin film is fully cured.
CN201611179211.1A 2016-12-19 2016-12-19 Ternary plate-type light active layer organic thin-film solar cell and preparation method thereof Pending CN106449995A (en)

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Application publication date: 20170222