CN104409642B - Preparation method of perovskite/P-type quantum dot composite solar cell - Google Patents
Preparation method of perovskite/P-type quantum dot composite solar cell Download PDFInfo
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- CN104409642B CN104409642B CN201410673751.XA CN201410673751A CN104409642B CN 104409642 B CN104409642 B CN 104409642B CN 201410673751 A CN201410673751 A CN 201410673751A CN 104409642 B CN104409642 B CN 104409642B
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Abstract
The invention discloses a preparation method of a perovskite/P-type quantum dot composite solar cell, belonging to the field of solar cells and nanotechnologies. The perovskite/P-type quantum dot composite solar cell disclosed by the invention is composed of a transparent conducting electrode (1), a compact layer (2), an n-type semiconductor mesoporous layer (3), a perovskite-phase light absorbing layer (4), a p-type semiconductor quantum dot layer (5) and a counter electrode (6). A p-type semiconductor quantum dot is Cu2O, CuI, CuInS2, PbS, PbSe or Sb2S3; expensive organic hole-transport material is replaced; therefore, a photon-generated carrier in the solar cell can be effectively separated; composite of electron and holes is reduced; and the filling factor and the photoelectric conversion efficiency are obviously increased. The perovskite/P-type quantum dot composite solar cell disclosed by the invention is high in photoelectric conversion efficiency, simple in preparation process, low in raw material cost and easy to carry out industrialization implementation.
Description
Technical field
The invention belongs to solaode cell art, is related to a kind of perovskite/p-type quantum dot composite construction sun
Design of energy battery and preparation method thereof.
Background technology
Solar energy is the inexhaustible renewable and clean energy resource of the mankind, in the effectively utilizes of solar energy, too
The solar photovoltaic utilization of positive energy is research field with fastest developing speed in the last few years, most active.Perovskite solaode is every year on average
Increase by 3% photoelectric transformation efficiency, cause the highest attention of academia, by science magazines the ten of 2013 years are chosen as
One of big Progress & New Products.
The structure of sensitization class solar cell is inherited and developed to perovskite solaode.Tsutomu in 2009
Miyasaka et al. assembles liquid electrolyte structure perovskite solaode, realizes 3.81% photoelectric transformation efficiency
(Akihiro Kojima and Tsutomu Miyasaka,et al.JACS,2009,131:6050-6051);2012
MichaelEt al. replace liquid electrolyte prepare structure of whole solid state perovskite solaode, opto-electronic conversion performance
More than 9% (Hui-Seon Kim and Michaelet al.Sci Rep,2012,2:1-7);With perovskite too
It is positive can battery research work further deeply, planar heterojunction perovskite solaode as new breakthrough, by simply having
The structure of effect obtains higher photoelectric transformation efficiency, and 2014, YangYang et al. optimized the perovskite of plane junction structure
Solaode, 19% (Huanping and YangYang, et al.Science, 2014,345 of breakthrough performance:542-
546).However, these efficient perovskite solaodes are usually used expensive Organic substance (such as spiro-
OMeTAD, P3HT etc.) it is the hole transport rate that further improves, in addition it is also necessary to add additive TBP, lithium as hole mobile material
Salt etc., has caused the problems such as preparing complicated, stability difference and strong toxicity, is unfavorable for research work.
For the hole mobile material of perovskite solaode, need to possess hole transport rate high, level structure matching, steady
Qualitative good and with low cost the features such as.At present, the hole mobile material in the perovskite solaode of report is mainly included
Machine thing spiro-OMeTAD, P3HT, PTAA etc. and inorganic matters CuI and CuSCN etc..The Central China University of Science and Technology discloses quasiconductor calcium titanium
Ore deposit solaode and preparation method thereof (application number:201410357461.4), one kind is relate to by nano-oxide particles structure
Into mesoporous hole collection layer preparation method.Shanghai Inst. of Technical Physics, Chinese Academy of Sciences discloses one kind with inorganic chemical
Thing is the perovskite solaode (application number of hole transmission layer:201410121154.6) and with zinc telluridse as hole transmission layer
Perovskite solaode (application number:201410120455.7).Organic hole transport material contributes to obtaining efficient
Perovskite solar cell device, but need to add multiple additives to improve and expensive, it is unfavorable for research work, and it is inorganic
The photoelectric transformation efficiency of hole mobile material still has much room for improvement.Develop and prepare a kind of stable chemical nature, level structure matching
And the cheap hole mobile material of preparation cost, the research to perovskite solaode is significant.
The content of the invention
It is an object of the invention to provide a kind of design of perovskite/p-type quantum dot composite construction solaode
And preparation method thereof, expensive organic hole transport material is substituted with p-type semiconductor quanta point material, solar energy can be efficiently separated
Photo-generated carrier in battery, reduction electronics is compound with hole, significantly improves fill factor, curve factor and photoelectric transformation efficiency.
A kind of preparation method of perovskite/p-type quantum dot composite construction solaode, perovskite/p-type quantum dot is combined
Structure solaode is by transparency conductive electrode (1), compacted zone (2), the mesoporous layer of n-type semiconductor (3), Perovskite Phase light-absorption layer
(4), p-type semiconductor quantum dot layer (5) and electrode (6) is constituted, concrete preparation process is as follows:
A () prepares compacted zone (2) in transparency conductive electrode (1):Using spin coating proceeding, with 2000~5000 revs/min
The oxide precursor liquid solution of 0.05~0.3 molar concentration is coated in transparency conductive electrode (1), 300~500 degrees Celsius of Jing
After sintering, the oxide compacting layer (2) that thickness is 10~80 nanometers is obtained;
The preparation of the mesoporous layer of (b) n-type semiconductor (3):By nanometer n-type semiconductor oxide that particle diameter is 20~50 by quality
Than 1:2~1:5 are scattered in dehydrated alcohol, are covered on compacted zone (2) with 2000~6000 revs/min of spin coatings, and Jing 300~
After 500 degrees Celsius of sintering, the mesoporous layer of the n-type semiconductor (3) that thickness is 150~800 nanometers is obtained;
The preparation of (c) Perovskite Phase light-absorption layer (4):By lead chloride (PbCl2) or lead iodide (PbI2) and methylamino iodine
(CH3NH3I) in molar ratio 1:1~1:4 are dissolved in N-N dimethylformamides (DMF) solvent, before forming 0.5~1.5 molar concentration
Solution is driven, is covered on the mesoporous layer of quasiconductor (3) with 1000~5000 revs/min of spin coatings, the degrees Centigrades 10 of Jing 70~100~
After 60 minutes, the organic inorganic hybridization thing CH that overburden cover is 50~500 nanometers is obtained3NH3PbI(3-x)ClxOr CH3NH3PbI3
Perovskite Phase light-absorption layer (4);
The preparation of (d) p-type semiconductor quantum dot layer (5):By the p-type quantum dot colloid solution of 0.05~1.0 molar concentration,
Covered on calcium titanium ore bed (4) with 1000~5000 revs/min of kind spin coatings, 50~100 DEG C of Jing is heated 5~40 minutes, obtains thickness
For 5~500 nanometers of p-type semiconductor quantum dot layer (5);
E () is to be to electrode in quantum dot layer surface (5) evaporation a layer thickness using vacuum thermal evaporation or electron beam evaporation plating
50~100 nanometers of golden or silver is to electrode (6).
Transparency conductive electrode is fluorine doped tin oxide (FTO) or indium doped tin oxide (ITO) transparent conducting glass.
The oxide precursor solution for preparing compacted zone is two metatitanic acid diisopropyl ester butanol solutions or zinc acetate ethylene glycol first
Ethereal solution.
The mesoporous layer material of n-type semiconductor is titanium dioxide (TiO2) or Zinc Oxide (ZnO) conductor oxidate.
P-type semiconductor quanta point material is Cu2O、CuI、CuInS2, PbS, PbSe or Sb2S3。
The advantage of the inventive method
The present invention instead of the organic of costliness using preparation process is simple and p-type semiconductor quanta point material with low cost
Hole mobile material, is a kind of preferable hole mobile material.Major advantage is as follows:
1) by the band gap for controlling the size of p-type quantum dot to regulate and control quantum dot, the energy level with Perovskite Phase light absorbent
Matching, constitutes the p-i-n junction solaode of similar sandwich;
2) p-type semiconductor quanta point material is fully infiltrated in the hole of perovskite material, is formed in interface and is closely connect
Touch, be conducive to the separation of carrier, reduce the compound of electronics and hole, significantly improve fill factor, curve factor;
3) p-type quanta point material has the advantages that band gap is controllable, is easy to modification, preparation process is simple and good stability,
Reduce simplifying preparation method while research cost.
Description of the drawings
Fig. 1 is the structural representation of perovskite/p-type quantum dot composite construction solaode:1 be transparency conductive electrode, 2
It is the mesoporous layer of n-type semiconductor, 4 is Perovskite Phase light-absorption layer, 5 is p-type semiconductor quantum dot layer, 6 is to electrode for compacted zone, 3;
Fig. 2 is the SEM photograph of perovskite/p-type quantum dot composite construction solaode prepared by the present invention.
Fig. 3 is that the current-voltage (I-V) of perovskite/p-type quantum dot composite construction solaode prepared by the present invention is bent
Line.
Specific embodiment
Embodiment 1
A) successively deionized water, acetone and EtOH Sonicate cleaning FTO or ITO electro-conductive glass is each 15 minutes, uses after drying
Plasma cleaning is processed 15 minutes.Configuration concentration be the n-butyl alcohol precursor solution of the two metatitanic acid diisopropyl esters of 0.05~0.3M or
The ethylene glycol monomethyl ether precursor solution of zinc acetate, is added drop-wise on FTO or ITO electro-conductive glass, with 2000~5000 after mix homogeneously
Rev/min spin coating 20~50 seconds, sinters 10~50 minutes under being placed in 500 degrees Celsius after drying under 70 degrees Celsius;B) grain is selected
Footpath is 20 nanometers of ZnO or TiO21 is pressed with dehydrated alcohol:3.5 mass ratioes dilute, using spin coating proceeding, with 5000 revs/min of rotations
Apply 30 seconds, sinter 30 minutes under being placed in 500 degrees Celsius after drying under 70 degrees Celsius;C) by PbCl2With CH3NH3I is with mol ratio
1:3 are dissolved in DMF solution, form PbCl2Concentration is the precursor solution of 0.8M, using spin coating proceeding, is revolved with 2000 revs/min
Apply 30 seconds, heat 30 minutes under 100 degrees Celsius;D) by concentration for 0.5M Cu2O quantum dot colloids utilize spin coating proceeding, with
2000 revs/min of spin coatings 30 seconds, dry at 50 c;E) specific mask is selected to be covered in above-mentioned sample surfaces, profit
With vacuum thermal evaporation machine gold that a layer thickness is 60 nanometers is deposited with to electrode.
Impact of the different compacted zones of table 1 to solar cell properties
Embodiment 2
A) successively deionized water, acetone and EtOH Sonicate cleaning FTO or ITO electro-conductive glass is each 15 minutes, uses after drying
Plasma cleaning is processed 15 minutes.Configuration concentration is the n-butyl alcohol precursor solution of the two metatitanic acid diisopropyl esters of 0.15M, mixes equal
It is added drop-wise to after even on FTO electro-conductive glass, with 2000 revs/min of spin coatings 30 seconds, after drying under 70 degrees Celsius 500 degrees Celsius is placed in
Lower sintering 10~50 minutes;B) from the TiO that particle diameter is 20 nanometers2Or ZnO presses 1 with dehydrated alcohol:2~1:5 mass ratioes dilute,
Using spin coating proceeding, with 2000~6000 revs/min of spin coatings 30 seconds, burn under being placed in 500 degrees Celsius after drying under 70 degrees Celsius
Knot 30 minutes;C) by PbCl2With CH3NH3I is with mol ratio 1:3 are dissolved in DMF solution, form PbCl2Concentration is the forerunner of 0.8M
Liquid solution, using spin coating proceeding, with 2000 revs/min of spin coatings 30 seconds, heats 30 minutes under 100 degrees Celsius;D) it is by concentration
The Cu of 0.5M2O quantum dot colloids utilize spin coating proceeding, with 2000 revs/min of spin coatings 30 seconds, dry at 50 c;E) select
Select specific mask and be covered in above-mentioned sample surfaces, gold that a layer thickness is 60 nanometers is deposited with to electricity using vacuum thermal evaporation machine
Pole.
Impact of the different n-type semiconductors of table 2 to solar cell properties
Embodiment 3
A) successively deionized water, acetone and EtOH Sonicate cleaning FTO electro-conductive glass is each 15 minutes, and plasma is used after drying
Cleaning treatment 15 minutes.Configuration concentration is the n-butyl alcohol precursor solution of the two metatitanic acid diisopropyl esters of 0.15M, drips after mix homogeneously
It is added on FTO electro-conductive glass, with 2000 revs/min of spin coatings 30 seconds, sinters under being placed in 500 degrees Celsius after drying under 70 degrees Celsius
10~50 minutes;B) from the TiO that particle diameter is 20 nanometers21 is pressed with dehydrated alcohol:3.5 mass ratioes dilute, using spin coating proceeding,
With 5000 revs/min of spin coatings 30 seconds, sinter 30 minutes under being placed in 500 degrees Celsius after drying under 70 degrees Celsius;C) (1) spin coating
Method:Configuration concentration is the PbCl of 0.8M2With the CH of 2.4M3NH3The DMF solution of I, using spin coating proceeding, with 2000 revs/min of rotations
Apply 30 seconds, mixed solution is coated uniformly on mesoporous layer, heat 10~60 minutes under 100 degrees Celsius;(2) solwution method:Profit
With spin-coating method, spin coating a layer thickness is 10~500 nanometers of PbI on mesoporous layer2, after heating 30 minutes under 70 degrees Celsius, use
Aqueous isopropanol pre-soaking 1~2 second, is quickly transferred to the CH that concentration is 0.06 molar concentration3NH3In I aqueous isopropanols, treat anti-
Cleaning, drying are taken out after answering 25 seconds, is heated 30 minutes under 70 degrees Celsius;D) by concentration for 0.5M Cu2O quantum dots colloid profit
With spin coating proceeding, with 2000 revs/min of spin coatings 30 seconds, dry at 50 c;E) specific mask is selected to be covered in
Sample surfaces are stated, gold that a layer thickness is 60 nanometers is deposited with to electrode using vacuum thermal evaporation machine.
Impact of the attracting photosphere preparation technology of the different perovskites of table 3 to solar cell properties
Embodiment 4
A) successively deionized water, acetone and EtOH Sonicate cleaning FTO electro-conductive glass is each 15 minutes, and plasma is used after drying
Cleaning treatment 15 minutes.Configuration concentration is the n-butyl alcohol precursor solution of the two metatitanic acid diisopropyl esters of 0.15M, drips after mix homogeneously
It is added on FTO electro-conductive glass, with 2000 revs/min of spin coatings 30 seconds, sinters under being placed in 500 degrees Celsius after drying under 70 degrees Celsius
10~50 minutes;B) from the TiO that particle diameter is 20 nanometers21 is pressed with dehydrated alcohol:3.5 mass ratioes dilute, using spin coating proceeding,
With 5000 revs/min of spin coatings 30 seconds, sinter 30 minutes under being placed in 500 degrees Celsius after drying under 70 degrees Celsius;C) by PbCl2With
CH3NH3I is with mol ratio 1:3 are dissolved in DMF solution, form PbCl2Concentration is the precursor solution of 0.8M, using spin coating proceeding,
With 2000 revs/min of spin coatings 30 seconds, heat 30 minutes under 100 degrees Celsius;D) by Cu that molar concentration is 0.05~1.02O、
CuI, CuInS, PbS, PbSe and Sb2S3Quantum dot colloid utilizes spin coating proceeding, with 1000~5000 rpms of rotating speed spin coating
10~60 seconds, and dry at 50 c;E) select specific mask to be covered in above-mentioned sample surfaces, steamed using Vacuum Heat
Plating machine is deposited with gold that a layer thickness is 60 nanometers to electrode.
Impact of the different p-type semiconductor quanta point materials of table 4 to solar cell properties
Claims (3)
1. the preparation method of a kind of perovskite/p-type quantum dot composite construction solaode, it is characterised in that be by electrically conducting transparent
Electrode (1), compacted zone (2), the mesoporous layer of n-type semiconductor (3), Perovskite Phase light-absorption layer (4), p-type semiconductor quantum dot layer (5) and
Electrode (6) is constituted, concrete preparation process is as follows:
A () prepares compacted zone (2) in transparency conductive electrode (1):Using spin coating proceeding, will with 2000~5000 revs/min
The oxide precursor liquid solution of 0.05~0.3 molar concentration is coated in transparency conductive electrode (1), 300~500 degrees Celsius of burnings of Jing
After knot, the oxide compacting layer (2) that thickness is 10~80 nanometers is obtained;
The preparation of the mesoporous layer of (b) n-type semiconductor (3):By the n-type semiconductor oxide in mass ratio 1 that particle diameter is 20~50 nanometers:
2~1:5 are scattered in dehydrated alcohol, are covered on compacted zone (2) with 2000~6000 revs/min of spin coatings, and Jing 300~500 takes the photograph
After family name's degree sintering, the mesoporous layer of the n-type semiconductor (3) that thickness is 150~800 nanometers is obtained;
The preparation of (c) Perovskite Phase light-absorption layer (4):By lead chloride (PbCl2) or lead iodide (PbI2) and methylamino iodine (CH3NH3I)
In molar ratio 1:1~1:4 are dissolved in N-N dimethylformamides (DMF) solvent, form 0.5~1.5 molar concentration precursor aqueous solution,
It is covered on the mesoporous layer of quasiconductor (3) with 1000~5000 revs/min of spin coatings, 70~100 degrees Centigrades of Jing 10~60 minutes
Afterwards, the organic inorganic hybridization thing CH that overburden cover is 50~500 nanometers is obtained3NH3PbI(3-x)ClxOr CH3NH3PbI3Perovskite
Phase light-absorption layer (4);
The preparation of (d) p-type semiconductor quantum dot layer (5):By the p-type quantum dot colloid solution of 0.05~1.0 molar concentration, with
1000~5000 revs/min of kind spin coatings are covered on calcium titanium ore bed (4), and 50~100 DEG C of Jing is heated 5~40 minutes, and it is 5 to obtain thickness
~500 nanometers of p-type semiconductor quantum dot layer (5);
(e) be to electrode using vacuum thermal evaporation or electron beam evaporation plating quantum dot layer surface (5) evaporation a layer thickness be 50~
100 nanometers of golden or silver is to electrode (6);
Wherein transparency conductive electrode is fluorine doped tin oxide (FTO) or indium doped tin oxide (ITO) transparent conducting glass;
The oxide precursor solution for preparing compacted zone is that two metatitanic acid diisopropyl ester butanol solutions or zinc acetate ethylene glycol monomethyl ether are molten
Liquid.
2. the preparation method of a kind of perovskite according to claim 1/p-type quantum dot composite construction solaode, its
It is characterised by, the mesoporous layer material of n-type semiconductor is titanium dioxide (TiO2) or Zinc Oxide (ZnO) conductor oxidate.
3. the preparation method of a kind of perovskite according to claim 1/p-type quantum dot composite construction solaode, its
It is characterised by, p-type semiconductor quanta point material is Cu2O、CuI、CuInS2, PbS, PbSe or Sb2S3。
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