CN106395792B - Carbon nano-tube growth apparatus - Google Patents
Carbon nano-tube growth apparatus Download PDFInfo
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- CN106395792B CN106395792B CN201610772333.5A CN201610772333A CN106395792B CN 106395792 B CN106395792 B CN 106395792B CN 201610772333 A CN201610772333 A CN 201610772333A CN 106395792 B CN106395792 B CN 106395792B
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Abstract
The present invention relates to a kind of carbon nano-tube growth apparatus,Including reaction chamber,Reaction chamber upper end is equipped with feed pipe,Air supply pipe,Air supply pipe is set on the outside of feed pipe,Feed pipe lower end connects ultrasonic atomizer,Air supply pipe lower end connects circular cowling,Plasma emitter is equipped in reaction chamber,Reaction chamber lower end connects discharge nozzle,The first aerating chamber is connected on the outside of reaction chamber,First aerating chamber upper end is equipped with aerating mouth,First aerating chamber periphery is equipped with heating device,The second aerating chamber is connected on the outside of discharge nozzle,Second aerating chamber and the perforation of the first aerating chamber connect,The reaction chamber is equipped with several air nozzles with discharging inside pipe wall,The air intake of air nozzle on reaction cavity wall is connect with the first aerating chamber,The air intake of air nozzle on discharging inside pipe wall is connect with the second aerating chamber,It is low that the present invention solves carbon nano tube growth efficiency,The problem of reaction uniformity is poor and carbon nanotube can be attached to reaction chamber and discharging inside pipe wall when preparing carbon nanotube and discharging.
Description
Technical field
The present invention relates to a kind of carbon nano-tube growth apparatus, belong to carbon nanotube technology field.
Background technology
Nanotube is also 10,000 times thinner than the hairline of people, and 100 times harder than steel of its hardness.It can be resistant to
6500°F（3593℃）High temperature, and with remarkable heat conductivility.Nanotube both may be used as metallic conductor, than gold
Electric conductivity is much higher, is also used as semiconductor necessary to manufacture computer chip.Nanotube also has at very low temperature
Superconductivity.
The classification of nanotube has：Nano-tube, single-walled carbon nanotube, double-walled carbon nano-tube, multi-walled carbon nanotube, functionalization
Multi-walled carbon nanotube, short MWCNTs, industrial multi-walled carbon nano-tube, graphite multi-walled carbon nano-tube, large diameter thin-walled
Carbon nanotube, nickel-plating carbon nanotube.Aerolite carbonaceous crystalline nanometric pipe.
In the development process that nanotube is applied to computer operation, an important milestone is exactly that nanotube is manufactured into
Switch or transistor used in computer.1998, a research group in the gloomy research center in the affiliated Witter of IBM Corporation was i.e. with this
It is studied for target.Researchers have shown that single nanotube there can be transistor, and improve its crystalline substance
The electric conductivity of body.
However, being also that nanotube demonstrates the one side of its superiority applied to computer operation.People can be these
Miniature tube is bonded together, and fiber or rope is made, and is used as the superpower reinforcing of superconducting cable or plastics and other advanced materials
Agent.If nanotube has extremely strong flexibility, intensity and restoring force, they by can synthesized high-performance sport and aeronautical material.
Due to its powerful tension, they have the curved property without rolling over and can restore original form.
In addition, nanotube applies also for needing most the place of heat conductivility.For example, if motor is done using nanotube
Cooling fin, plastic components therein would not be melted by high temperature.This Minisize materials, which can be also placed in, to be needed to be resistant to extreme high heat
Material among, such as the panel outside aircraft and rocket.American National space flight and Space Agency it is expected nanotube being placed in from anti-
Among thermosphere to the various facilities such as suit.
Energy company also regards to nanotube with special esteem.Nanotube can be used for manufacturing smaller, lighter, the higher fuel of efficiency
Battery, it can also be used to hydrogen of the storage as the energy.Researcher receives on flat sheet glass or other materials numerous
Mitron is lined up, them is allowed to look like the neat wheatland of a piece of harvesting.The NEC of Japan and the Samsung of South Korea prepare will
This display screen that television set is made by " field " that nanotube forms, to replace television set used by old-fashioned cathode-ray
Pipe.
Currently, carbon nanotube preparation process mainly has arc discharge method, radium-shine ablation and chemical vapour deposition technique.Its
In, chemical vapour deposition technique with its simple process, at low cost, nanotube is controllable, length is big, collection rate is high the features such as obtain extensively
Research and application.Chemical vapour deposition technique is mainly transition metal or its oxide with nanoscale as catalyst,
Carbon containing air source is pyrolyzed at relatively low temperature to prepare carbon nanotube.
In traditional carbon nanotube preparing apparatus, substrate is air-locked, when reaction gas is passed through, with catalyst film
Contact can grow carbon nanotube on its surface, and with carbon nanotube progressive additive, catalyst film is gradually flooded completely,
The catalyst film being submerged cannot be contacted with reaction gas again, not have the effect of catalyst, cause carbon nanotube can not be after
Continuous growth.It will generally stop growing after carbon nano tube growth to about 1-2mm, in this case so that carbon nanotube cannot
It continuous growth and growing vertically downward, growth efficiency is relatively low, and general preparation facilities is when preparing carbon nanotube and discharging,
Carbon nanotube can be attached to reaction chamber and discharging inside pipe wall.
103569998 A of Chinese invention patent specification CN disclose such a carbon nanotube preparing apparatus, including：One
Reaction chamber is provided in the reaction chamber：At least one air inlet pipe, each air inlet pipe are equipped with multiple air admission holes；Substrate bearing
Disk；At least one escape pipe, each escape pipe are equipped with multiple ventholes；Wherein, the substrate bearing disk is located at the air inlet
Between pipe and the escape pipe, each air inlet pipe and each escape pipe are detachably arranged in the reaction chamber.But it is this
Preparation facilities reaction uniformity is poor, and when preparing carbon nanotube and discharging, carbon nanotube can be attached to reaction chamber and discharge nozzle
Inner wall.
205045828 U of Chinese utility model patent specification CN disclose the process units of such a carbon nanotube, packet
Horizontal reacting chamber, crystal reaction tube, quartz boat, heating device, temperature-controlling cabinet are included, the crystal reaction tube is located at the horizontal reacting
Intracavitary, the heating device are located at the top of the horizontal reacting chamber, and the temperature-controlling cabinet is located at the lower section of the horizontal reacting chamber,
The process units further includes ultrasonator, millipore filter, hydrofluoric acid wash pool, potassium permanganate reactor, the sonic oscillation
Device is connected with the horizontal reacting chamber, and the ultrasonator is connected with the millipore filter, the millipore filter and institute
State hydrofluoric acid wash pool be connected, the hydrofluoric acid wash pool is connected with the potassium permanganate reactor, the potassium permanganate reactor and
The drier is connected.But this preparation facilities low production efficiency, reaction uniformity is poor, is preparing carbon nanotube and discharging
When, carbon nanotube can be attached to reaction chamber and discharging inside pipe wall.
Invention content
The technical problem to be solved in the present invention is to provide a kind of carbon nano-tube growth apparatus, the carbon nano-tube growth apparatus solutions
Carbon nano tube growth efficiency of having determined is low, reaction uniformity is poor and carbon nanotube can adhere to when preparing carbon nanotube and discharging
The problem of reaction chamber is with discharging inside pipe wall.
In order to solve the above-mentioned technical problem, carbon nano-tube growth apparatus of the invention includes reaction chamber, and reaction chamber upper end is set
There are feed pipe, air supply pipe, air supply pipe to be set on the outside of feed pipe, feed pipe lower end connects ultrasonic atomizer, and air supply pipe lower end connects
Circular cowling is connect, plasma emitter is equipped in reaction chamber, reaction chamber lower end connects discharge nozzle, the first aerating is connected on the outside of reaction chamber
Chamber, the first aerating chamber upper end are equipped with aerating mouth, and the first aerating chamber periphery is equipped with heating device, the second aerating is connected on the outside of discharge nozzle
Chamber, the second aerating chamber and the perforation of the first aerating chamber connect, and the reaction chamber is equipped with several air nozzles with discharging inside pipe wall, instead
The air intake of the air nozzle on cavity wall is answered to be connect with the first aerating chamber, the air intake and second of the air nozzle to discharge on inside pipe wall
Aerating chamber connects.
The ultrasonic atomizer bottom end and air supply pipe bottom end are contour.
The substrate material is ceramics.
The reaction chamber bottom is concave.
The gas outlet of the air nozzle is diagonally downward.
Using this carbon nano-tube growth apparatus, has the following advantages：
1, since air supply pipe is set on the outside of feed pipe, feed pipe lower end connects ultrasonic atomizer, the connection of air supply pipe lower end
Circular cowling, such reaction solution are entered by feed pipe, are atomized by ultrasonic atomizer, and the reaction solution after atomization is with carbon-source gas in ring
It is come into full contact in shape cover, improves the growth efficiency of carbon nanotube and the uniformity of reaction and continuity；
2, due in reaction chamber be equipped with plasma emitter, in this way can further carbon-source gas decomposition, make reaction more
Add fully, further improves the growth efficiency of carbon nanotube；
3, since reaction chamber and discharging inside pipe wall are equipped with several air nozzles, that reacts the air nozzle on cavity wall enters gas
Mouth is connect with the first aerating chamber, and the air intake for the air nozzle on inside pipe wall that discharges is connect with the second aerating chamber, past can be added in this way
Air cavity be added inert gas, then from air nozzle spray, avoid carbon nanotube be attached to reaction chamber and discharging inside pipe wall on and
Block discharge nozzle.
Description of the drawings
The present invention will be further described in detail below with reference to the accompanying drawings and specific embodiments.
Fig. 1 is the structural schematic diagram of the present invention.
Wherein have：1. reaction chamber；2. feed pipe；3. ultrasonic atomizer；4. air supply pipe；5. circular cowling；6. wait from
Sub- transmitter；7. the first aerating chamber；8. air nozzle；9. aerating mouth；10. heating device；11. discharge nozzle；12. second adds
Air cavity.
Specific implementation mode
Carbon nano-tube growth apparatus shown in Fig. 1, including reaction chamber, reaction chamber upper end are equipped with feed pipe, air supply pipe, air supply pipe
It being set on the outside of feed pipe, feed pipe lower end connects ultrasonic atomizer, and air supply pipe lower end connects circular cowling, be equipped in reaction chamber etc.
Ion emitter, reaction chamber lower end connect discharge nozzle, and the first aerating chamber is connected on the outside of reaction chamber, and the first aerating chamber upper end, which is equipped with, to be added
Gas port, the first aerating chamber periphery are equipped with heating device, the second aerating chamber, the second aerating chamber and the first aerating are connected on the outside of discharge nozzle
Chamber perforation connection, the reaction chamber are equipped with several air nozzles with discharging inside pipe wall, react entering for the air nozzle on cavity wall
Gas port is connect with the first aerating chamber, and the air intake for the air nozzle on inside pipe wall that discharges is connect with the second aerating chamber.
The ultrasonic atomizer bottom end and air supply pipe bottom end are contour.
The material of the substrate is ceramics.
The reaction chamber bottom is concave.
The gas outlet of the air nozzle is diagonally downward.
When reaction, carbon-source gas enters between air supply pipe and feed pipe, and reaction solution enters from feed pipe, due to feed pipe
Lower end connects ultrasonic atomizer, and air supply pipe lower end connects circular cowling, and such reaction solution is entered by feed pipe, passes through ultrasonic atomizer
Atomization, the reaction solution after atomization comes into full contact with carbon-source gas in circular cowling, improves the growth efficiency and instead of carbon nanotube
The uniformity and continuity answered, the reaction solution are catalyst.It, in this way can be into due to being equipped with plasma emitter in reaction chamber
The decomposition of one step carbon-source gas, keeps reaction more abundant, further improves the growth efficiency of carbon nanotube.Due to reaction chamber with
Discharging inside pipe wall is equipped with several air nozzles, and the air intake for reacting the air nozzle on cavity wall is connect with the first aerating chamber, is gone out
The air intake of air nozzle on expects pipe inner wall is connect with the second aerating chamber, inert gas can be added toward aerating chamber in this way, then
It is sprayed from air nozzle, avoids carbon nanotube and be attached on reaction chamber and discharging inside pipe wall and block discharge nozzle.The indifferent gas
Body can be nitrogen.
It is the prior art not have the technical characteristic being described in detail in the application.The application is only illustrated in above-described embodiment
Principles and effects, not for limitation the application.Any person skilled in the art all can be in the essence without prejudice to the application
God and under the scope of, carry out modifications and changes to above-described embodiment.Therefore, those of ordinary skill in the art is not taking off
It, should be by the right of the application from all equivalent modifications or change completed under spirit and technological thought disclosed herein
It is required that being covered.
Claims (5)
1. a kind of carbon nano-tube growth apparatus, it is characterised in that：Including reaction chamber, reaction chamber upper end is equipped with feed pipe, air supply pipe,
Air supply pipe is set on the outside of feed pipe, feed pipe lower end connection ultrasonic atomizer, air supply pipe lower end connection circular cowling, in reaction chamber
Equipped with plasma emitter, reaction chamber lower end connects discharge nozzle, and the first aerating chamber, the first aerating chamber upper end are connected on the outside of reaction chamber
Equipped with aerating mouth, the first aerating chamber periphery is equipped with heating device, connects the second aerating chamber on the outside of discharge nozzle, the second aerating chamber and the
The perforation connection of one aerating chamber, the reaction chamber are equipped with several air nozzles with discharging inside pipe wall, react the jet on cavity wall
The air intake of mouth is connect with the first aerating chamber, and the air intake for the air nozzle on inside pipe wall that discharges is connect with the second aerating chamber.
2. carbon nano-tube growth apparatus described in accordance with the claim 1, it is characterised in that：The ultrasonic atomizer bottom end and gas supply
Tube bottom end is contour.
3. carbon nano-tube growth apparatus described in accordance with the claim 1, it is characterised in that：The material of the substrate is ceramics.
4. carbon nano-tube growth apparatus described in accordance with the claim 1, it is characterised in that：The reaction chamber bottom is concave.
5. carbon nano-tube growth apparatus described in accordance with the claim 1, it is characterised in that：The gas outlet of the air nozzle is tilted towards
Under.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610772333.5A CN106395792B (en) | 2016-08-31 | 2016-08-31 | Carbon nano-tube growth apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610772333.5A CN106395792B (en) | 2016-08-31 | 2016-08-31 | Carbon nano-tube growth apparatus |
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| Publication Number | Publication Date |
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| CN106395792A CN106395792A (en) | 2017-02-15 |
| CN106395792B true CN106395792B (en) | 2018-09-25 |
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Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2236460A4 (en) * | 2008-01-21 | 2012-01-11 | Nikkiso Co Ltd | Apparatus for producing carbon nanotube |
| CN203558855U (en) * | 2013-09-05 | 2014-04-23 | 武汉博力信纳米科技有限公司 | Device for preparing continuous carbon nano tube aggregate under assistance of ultrasonic atomization |
| CN205204828U (en) * | 2015-12-08 | 2016-05-04 | 赵屹坤 | Carbon nanotube generates device |
| CN206188391U (en) * | 2016-08-31 | 2017-05-24 | 无锡东恒新能源科技有限公司 | A equipment for growing carbon nanotube |
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