CN106348301B - A kind of 60 pairs of stick improved Siemens polycrystalline silicon reduction furnace base plates - Google Patents
A kind of 60 pairs of stick improved Siemens polycrystalline silicon reduction furnace base plates Download PDFInfo
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- CN106348301B CN106348301B CN201611023921.5A CN201611023921A CN106348301B CN 106348301 B CN106348301 B CN 106348301B CN 201611023921 A CN201611023921 A CN 201611023921A CN 106348301 B CN106348301 B CN 106348301B
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/02—Silicon
- C01B33/021—Preparation
- C01B33/027—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
- C01B33/035—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material by decomposition or reduction of gaseous or vaporised silicon compounds in the presence of heated filaments of silicon, carbon or a refractory metal, e.g. tantalum or tungsten, or in the presence of heated silicon rods on which the formed silicon is deposited, a silicon rod being obtained, e.g. Siemens process
Abstract
A kind of 60 pairs of stick improved Siemens polycrystalline silicon reduction furnace base plates, are related to a kind of polycrystalline silicon reduction furnace base plate.Solve the problems, such as that the polysilicon of existing improved Siemens polycrystalline silicon reducing furnace production is of poor quality, energy consumption is high, low output, a conversion ratio are low.8 electrodes, 16 electrodes, 24 electrodes, 32 electrodes and 40 electrodes are sequentially distributed on one ring annular center line of electrode, electrode bicyclic ring shape center line, electrode tricyclic annular center line, electrode Fourth Ring annular center line and electrode five rings annular center line；Center mixed gas nozzle of air supply is equipped in the center on chassis；8 the first mixed gas nozzles of air supply, 12 the second mixed gas nozzles of air supply, 16 third mixed gas nozzles of air supply and 4 mixed gas outlets are successively set on one ring annular center line of mixed gas nozzle of air supply, mixed gas nozzle of air supply bicyclic ring shape center line, mixed gas nozzle of air supply tricyclic annular center line and chassis discharge ring annular center line.
Description
Technical field
The present invention relates to a kind of polycrystalline silicon reduction furnace base plates.
Background technique
The polycrystalline silicon material material one of best as photovoltaic converter, all the time all by the close attention of people.
Current 95% solar battery is all using silicon as basic material.Improved Siemens are to prepare polysilicon comparative maturity at present
Process, principle is exactly that reduction reaction occurs in the silicon wicking surface of heating using High Purity Hydrogen and high-purity trichlorosilane, raw
At polysilicon micromeritics, and adsorb the technical process being deposited on silicon core.Compared with traditional Siemens Method, improved Siemens
Has many advantages, such as energy conservation, consumption reduction, environmental pollution is small.Wherein reduction furnace is the key equipment in improved Siemens technique,
The structure and operation stability of reduction furnace are an important factor for determining polysilicon product quality and production cost.It is most of more at present
What crystal silicon manufacturing enterprise generallyd use is 36 pairs of sticks, 40 pairs of stick reduction furnace apparatus progress production of polysilicon, polycrystalline silicon reducing furnace
There are limits throughput, conversion ratio of TCS is low, heat radiation utilization rate is low the problems such as, directly affect the life of polycrystalline silicon reducing furnace
It produces.
Therefore, to solve the above problems, being set it is necessary to develop the larger improved Siemens polycrystalline silicon reducing furnace of one kind
It is standby, the heat radiation between silicon rod, and reasonable chassis configuration are made full use of, polysilicon product quality and production are further increased
Amount reduces production energy consumption, increases the competitive advantage of enterprise.
Summary of the invention
The object of the present invention is to provide a kind of 60 pairs of stick improved Siemens polycrystalline silicon reduction furnace base plates；To solve existing change
Good Siemens process polycrystalline silicon reduction furnace there are limits throughput, conversion ratio of TCS is low, heat radiation utilization rate is low the problems such as.
60 pairs of stick improved Siemens polycrystalline silicon reduction furnace base plates of one kind include chassis and 120 electrodes；
Center location on chassis is equipped with center mixed gas nozzle of air supply；
One ring annular center line of electrode, electrode bicyclic ring shape center are set gradually to the peripheral direction on chassis along the chassis center of circle
Line, one ring annular center line of mixed gas nozzle of air supply, electrode tricyclic annular center line, mixed gas nozzle of air supply bicyclic ring shape
Center line, electrode Fourth Ring annular center line, mixed gas nozzle of air supply tricyclic annular center line, electrode five rings annular center line and
Chassis discharge ring annular center line；
The one ring annular center line of electrode, electrode bicyclic ring shape center line, mixed gas nozzle of air supply one ring annular
Center line, electrode tricyclic annular center line, mixed gas nozzle of air supply bicyclic ring shape center line, electrode Fourth Ring annular center line,
Mixed gas nozzle of air supply tricyclic annular center line, electrode five rings annular center line and chassis discharge ring annular center line and chassis
For concentric circles；
Wherein, 8 electrodes are evenly distributed on one ring annular center line of electrode, and 16 electrodes are evenly distributed on two ring of electrode
On annular center line, 24 electrodes are evenly distributed on electrode tricyclic annular center line, and 32 electrodes are evenly distributed on electrode four
On ring annular center line, 40 electrodes are evenly distributed on the annular center line of electrode five rings；
8 the first mixed gas nozzles of air supply, 12 the second mixed gas nozzles of air supply, 16 are additionally provided on chassis
Three mixed gas nozzles of air supply and 4 mixed gas outlets；
8 the first mixed gas nozzles of air supply are equally divided into 4 the first mixed gas nozzle of air supply groups, 4 first mixing
Gas inlet nozzle sets are uniformly arranged on one ring annular center line of mixed gas nozzle of air supply, each first mixed gas air inlet
Linear distance is 360mm~460mm between two neighboring first mixed gas nozzle of air supply center in nozzle sets；
12 the second mixed gas nozzles of air supply are equally divided into 4 the second mixed gas nozzle of air supply groups, 4 second mixing
Gas inlet nozzle sets are uniformly arranged on mixed gas nozzle of air supply bicyclic ring shape center line, each second mixed gas air inlet
Linear distance is 360mm~460mm between two neighboring second mixed gas nozzle of air supply center in nozzle sets；
16 third mixed gas nozzles of air supply are equally divided into 4 third mixed gas nozzle of air supply groups, 4 third mixing
Gas inlet nozzle sets are uniformly arranged on mixed gas nozzle of air supply tricyclic annular center line, each third mixed gas air inlet
Linear distance is 360mm~460mm between two neighboring third mixed gas nozzle of air supply center in nozzle sets；
4 mixed gas outlets are evenly distributed on the discharge ring annular center line of chassis；
The chassis diameter is 3300mm~4200mm；The one ring annular center line of electrode, electrode bicyclic ring shape
Adjacent two with ring in center line, electrode tricyclic annular center line, electrode Fourth Ring annular center line and electrode five rings annular center line
Linear distance is 200mm~230mm between a electrode centers；The one ring annular center line of mixed gas nozzle of air supply it is straight
Diameter is 1300mm~1400mm；The diameter of the mixed gas nozzle of air supply bicyclic ring shape center line be 1900mm~
2000mm；The diameter of the mixed gas nozzle of air supply tricyclic annular center line is 2400mm~2500mm；The chassis
The diameter of discharge ring annular center line is 3000mm~3200mm.
The chassis 1 is disc structure.
The beneficial effects of the present invention are: 60 pairs of stick improved Siemens polycrystalline silicon reduction furnace base plates that the present invention designs can
More silicon rods are carried, the yield of polysilicon can be substantially improved, reach 120kg/h~140kg/h.Meanwhile chassis of reducing furnace
Electrode arrangements design is more reasonable, and chassis space is more fully utilized, improves the heat radiation utilization rate between silicon rod, energy
Consumption can be reduced to 30kwh/kg~45kwh/kg.Due to the rational deployment of chassis of reducing furnace nozzle location and rationally setting for structure
Meter, is distributed mixture of feed body in reduction furnace more uniform, can carry out more strong circulation, is more advantageous to internal temperature
And silicon rod surface temperature be uniformly distributed, further enhance the consistency of all silicon core growing states inside reduction furnace, energy
The quality and yield of polysilicon are significantly improved, energy consumption is reduced, increases a conversion ratio of TCS, reach 9%~11%.
The present invention is used for improved Siemens polycrystalline silicon reduction furnace base plate.
Detailed description of the invention
Fig. 1 is the structural schematic diagram of 60 pairs of stick improved Siemens polycrystalline silicon reduction furnace base plates of the invention.
Specific embodiment
Technical solution of the present invention is not limited to the specific embodiment of act set forth below, further include each specific embodiment it
Between any combination.
Specific embodiment 1: illustrating present embodiment below with reference to Fig. 1.
60 pairs of stick improved Siemens polycrystalline silicon reduction furnace base plates of one kind of present embodiment include chassis 1 and 120 electricity
Pole；
Center location on chassis 1 is equipped with center mixed gas nozzle of air supply 2；
One ring annular center line 3 of electrode is set gradually to the peripheral direction on chassis along 1 center of circle of chassis, in electrode bicyclic ring shape
Heart line 4, one ring annular center line 5 of mixed gas nozzle of air supply, electrode tricyclic annular center line 6, mixed gas nozzle of air supply two
Ring annular center line 7, electrode Fourth Ring annular center line 8, mixed gas nozzle of air supply tricyclic annular center line 9, electrode five rings ring
Shape center line 10 and chassis discharge ring annular center line 11；
The one ring annular center line 3 of electrode, electrode bicyclic ring shape center line 4, one ring ring of mixed gas nozzle of air supply
During shape center line 5, electrode tricyclic annular center line 6, mixed gas nozzle of air supply bicyclic ring shape center line 7, electrode Fourth Ring are annular
In heart line 8, mixed gas nozzle of air supply tricyclic annular center line 9, electrode five rings annular center line 10 and chassis discharge ring annular
Heart line 11 and chassis 1 are concentric circles；
Wherein, 8 electrodes are evenly distributed on one ring annular center line 3 of electrode, and 16 electrodes are evenly distributed on electrode two
On ring annular center line 4,24 electrodes are evenly distributed on electrode tricyclic annular center line 6, and 32 electrodes are evenly distributed on electricity
On pole Fourth Ring annular center line 8,40 electrodes are evenly distributed on electrode five rings annular center line 10；
8 the first mixed gas nozzle of air supply 5-1,12 the second mixed gas nozzle of air supply 7- are additionally provided on chassis 1
1,16 third mixed gas nozzle of air supply 9-1 and 4 mixed gas outlet 11-1；
8 the first mixed gas nozzle of air supply 5-1 are equally divided into 4 the first mixed gas nozzle of air supply groups, and 4 first mixed
It closes gas inlet nozzle sets to be uniformly arranged on one ring annular center line 5 of mixed gas nozzle of air supply, each first mixed gas
Linear distance is 360mm~460mm between the center two neighboring first mixed gas nozzle of air supply 5-1 in nozzle of air supply group；
12 the second mixed gas nozzle of air supply 7-1 are equally divided into 4 the second mixed gas nozzle of air supply groups, and 4 second
Mixed gas nozzle of air supply group is uniformly arranged on mixed gas nozzle of air supply bicyclic ring shape center line 7, each second gaseous mixture
Linear distance is 360mm~460mm between the center two neighboring second mixed gas nozzle of air supply 7-1 in body nozzle of air supply group；
16 third mixed gas nozzle of air supply 9-1 are equally divided into 4 third mixed gas nozzle of air supply groups, 4 thirds
Mixed gas nozzle of air supply group is uniformly arranged on mixed gas nozzle of air supply tricyclic annular center line 9, each third gaseous mixture
Linear distance is 360mm~460mm between the center two neighboring third mixed gas nozzle of air supply 9-1 in body nozzle of air supply group；
4 mixed gas outlet 11-1 are evenly distributed on chassis discharge ring annular center line 11；
1 diameter of chassis is 3300mm~4200mm；The one ring annular center line 3 of electrode, electrode bicyclic ring
Same ring in shape center line 4, electrode tricyclic annular center line 6, electrode Fourth Ring annular center line 8 and electrode five rings annular center line 10
Linear distance is 200mm~230mm between two neighboring electrode centers；The one ring annular center of mixed gas nozzle of air supply
The diameter of line 5 is 1300mm~1400mm；The diameter of the mixed gas nozzle of air supply bicyclic ring shape center line 7 is 1900mm
~2000mm；The diameter of the mixed gas nozzle of air supply tricyclic annular center line 9 is 2400mm~2500mm；The bottom
The diameter of disk discharge ring annular center line 11 is 3000mm~3200mm.
The chassis 1 is disc structure.
Present embodiment the utility model has the advantages that 60 pairs of stick improved Siemens polycrystalline reductions of present embodiment
Furnace hearth plate can carry more silicon rods, and the yield of polysilicon can be substantially improved, reach 120kg/h~140kg/h.Meanwhile
The design of chassis of reducing furnace electrode arrangements is more reasonable, and chassis space is more fully utilized, improves the hot spoke between silicon rod
Utilization rate is penetrated, energy consumption can be reduced to 30kwh/kg~45kwh/kg.Due to the rational deployment and knot of chassis of reducing furnace nozzle location
The rational design of structure is distributed mixture of feed body in reduction furnace more uniform, can carry out more strong circulation, more have
Conducive to being uniformly distributed for internal thermal field and silicon rod surface temperature, all silicon core growing states inside reduction furnace are further enhanced
Consistency, can significantly improve the quality and yield of polysilicon, reduce energy consumption, increase a conversion ratio of TCS, reach 9%~
11%.
Specific embodiment 2: the present embodiment is different from the first embodiment in that: 1 diameter of chassis is
4000mm.It is other same as the specific embodiment one.
Specific embodiment 3: the present embodiment is different from the first and the second embodiment in that: 1 diameter of chassis
For 3600mm.It is other the same as one or two specific embodiments.
Specific embodiment 4: unlike one of present embodiment and specific embodiment one to three: 8 first mixing
Gas inlet nozzle 5-1 is equally divided into 4 the first mixed gas nozzle of air supply groups, and 4 the first mixed gas nozzle of air supply groups are equal
It is even to be arranged on one ring annular center line 5 of mixed gas nozzle of air supply, adjacent two in each first mixed gas nozzle of air supply group
Linear distance is 390mm between the center a first mixed gas nozzle of air supply 5-1.It is other with specific embodiment one to three-phase
Together.
Specific embodiment 5: unlike one of present embodiment and specific embodiment one to four: 12 second mixed
It closes gas inlet nozzle 7-1 and is equally divided into 4 the second mixed gas nozzle of air supply groups, 4 the second mixed gas nozzle of air supply groups
It is uniformly arranged on mixed gas nozzle of air supply bicyclic ring shape center line 7, it is adjacent in each second mixed gas nozzle of air supply group
Linear distance is 390mm between two the second centers mixed gas nozzle of air supply 7-1.It is other with one to four phase of specific embodiment
Together.
Specific embodiment 6: unlike one of present embodiment and specific embodiment one to five: 16 thirds are mixed
It closes gas inlet nozzle 9-1 and is equally divided into 4 third mixed gas nozzle of air supply groups, 4 third mixed gas nozzle of air supply groups
It is uniformly arranged on mixed gas nozzle of air supply tricyclic annular center line 9, it is adjacent in each third mixed gas nozzle of air supply group
Linear distance is 390mm between two centers third mixed gas nozzle of air supply 9-1.It is other with one to five phase of specific embodiment
Together.
Specific embodiment 7: unlike one of present embodiment and specific embodiment one to six: the electrode
One ring annular center line 3, electrode bicyclic ring shape center line 4, electrode tricyclic annular center line 6, electrode Fourth Ring annular center line 8 and
In electrode five rings annular center line 10 with linear distance between the two neighboring electrode centers of ring be 220mm.Other and specific implementation
Mode one to six is identical.
Specific embodiment 8: unlike one of present embodiment and specific embodiment one to seven: the mixing
The diameter of one ring annular center line 5 of gas inlet nozzle is 1350mm.It is other identical as specific embodiment one to seven.
Specific embodiment 9: unlike one of present embodiment and specific embodiment one to eight: the mixing
The diameter of gas inlet nozzle bicyclic ring shape center line 7 is 1950mm.It is other identical as specific embodiment one to eight.
Specific embodiment 10: unlike one of present embodiment and specific embodiment one to nine: the mixing
The diameter of gas inlet nozzle tricyclic annular center line 9 is 2450mm；The diameter of the chassis discharge ring annular center line 11
For 3100mm.It is other identical as specific embodiment one to nine.
Embodiment one:
60 pairs of stick improved Siemens polycrystalline silicon reduction furnace base plates of one kind include chassis 1 and 120 electrodes；
Center location on chassis 1 is equipped with center mixed gas nozzle of air supply 2；
One ring annular center line 3 of electrode is set gradually to the peripheral direction on chassis along 1 center of circle of chassis, in electrode bicyclic ring shape
Heart line 4, one ring annular center line 5 of mixed gas nozzle of air supply, electrode tricyclic annular center line 6, mixed gas nozzle of air supply two
Ring annular center line 7, electrode Fourth Ring annular center line 8, mixed gas nozzle of air supply tricyclic annular center line 9, electrode five rings ring
Shape center line 10 and chassis discharge ring annular center line 11；
The one ring annular center line 3 of electrode, electrode bicyclic ring shape center line 4, one ring ring of mixed gas nozzle of air supply
During shape center line 5, electrode tricyclic annular center line 6, mixed gas nozzle of air supply bicyclic ring shape center line 7, electrode Fourth Ring are annular
In heart line 8, mixed gas nozzle of air supply tricyclic annular center line 9, electrode five rings annular center line 10 and chassis discharge ring annular
Heart line 11 and chassis 1 are concentric circles；
Wherein, 8 electrodes are evenly distributed on one ring annular center line 3 of electrode, and 16 electrodes are evenly distributed on electrode two
On ring annular center line 4,24 electrodes are evenly distributed on electrode tricyclic annular center line 6, and 32 electrodes are evenly distributed on electricity
On pole Fourth Ring annular center line 8,40 electrodes are evenly distributed on electrode five rings annular center line 10；
8 the first mixed gas nozzle of air supply 5-1,12 the second mixed gas nozzle of air supply 7- are additionally provided on chassis 1
1,16 third mixed gas nozzle of air supply 9-1 and 4 mixed gas outlet 11-1；
8 the first mixed gas nozzle of air supply 5-1 are equally divided into 4 the first mixed gas nozzle of air supply groups, and 4 first mixed
It closes gas inlet nozzle sets to be uniformly arranged on one ring annular center line 5 of mixed gas nozzle of air supply, each first mixed gas
Linear distance is 390mm between the center two neighboring first mixed gas nozzle of air supply 5-1 in nozzle of air supply group；
12 the second mixed gas nozzle of air supply 7-1 are equally divided into 4 the second mixed gas nozzle of air supply groups, and 4 second
Mixed gas nozzle of air supply group is uniformly arranged on mixed gas nozzle of air supply bicyclic ring shape center line 7, each second gaseous mixture
Linear distance is 390mm between the center two neighboring second mixed gas nozzle of air supply 7-1 in body nozzle of air supply group；
16 third mixed gas nozzle of air supply 9-1 are equally divided into 4 third mixed gas nozzle of air supply groups, 4 thirds
Mixed gas nozzle of air supply group is uniformly arranged on mixed gas nozzle of air supply tricyclic annular center line 9, each third gaseous mixture
Linear distance is 390mm between the center two neighboring third mixed gas nozzle of air supply 9-1 in body nozzle of air supply group；
4 mixed gas outlet 11-1 are evenly distributed on chassis discharge ring annular center line 11；
1 diameter of chassis is 3600mm；The one ring annular center line 3 of electrode, electrode bicyclic ring shape center line
4, two neighboring with ring in electrode tricyclic annular center line 6, electrode Fourth Ring annular center line 8 and electrode five rings annular center line 10
Linear distance is 220mm between electrode centers；The diameter of the one ring annular center line 5 of mixed gas nozzle of air supply is
1350mm；The diameter of the mixed gas nozzle of air supply bicyclic ring shape center line 7 is 1950mm；The mixed gas air inlet
The diameter of nozzle tricyclic annular center line 9 is 2450mm；The diameter of the chassis discharge ring annular center line 11 is 3100mm.
The chassis 1 is disc structure.
The present embodiment yield can reach 120kg/h~140kg/h, and energy consumption is 30kwh/kg~45kwh/kg, primary to convert
Rate is 9~11%.
Claims (9)
1. a kind of 60 pairs of stick improved Siemens polycrystalline silicon reduction furnace base plates, it is characterised in that: chassis of reducing furnace includes chassis (1)
And 120 electrodes；
Center location in chassis (1) is equipped with center mixed gas nozzle of air supply (2)；
One ring annular center line (3) of electrode is set gradually to the peripheral direction on chassis along chassis (1) center of circle, in electrode bicyclic ring shape
Heart line (4), one ring annular center line (5) of mixed gas nozzle of air supply, electrode tricyclic annular center line (6), mixed gas air inlet
Nozzle bicyclic ring shape center line (7), electrode Fourth Ring annular center line (8), mixed gas nozzle of air supply tricyclic annular center line
(9), electrode five rings annular center line (10) and chassis discharge ring annular center line (11)；
The one ring annular center line (3) of electrode, electrode bicyclic ring shape center line (4), one ring ring of mixed gas nozzle of air supply
Shape center line (5), electrode tricyclic annular center line (6), mixed gas nozzle of air supply bicyclic ring shape center line (7), electrode Fourth Ring
Annular center line (8), mixed gas nozzle of air supply tricyclic annular center line (9), electrode five rings annular center line (10) and chassis
Discharge ring annular center line (11) and chassis (1) are concentric circles；
Wherein, 8 electrodes are evenly distributed on one ring annular center line (3) of electrode, and 16 electrodes are evenly distributed on two ring of electrode
On annular center line (4), 24 electrodes are evenly distributed on electrode tricyclic annular center line (6), and 32 electrodes are evenly distributed on
On electrode Fourth Ring annular center line (8), 40 electrodes are evenly distributed on electrode five rings annular center line (10)；
8 the first mixed gas nozzles of air supply (5-1), 12 the second mixed gas nozzle of air supply (7- are additionally provided on chassis (1)
1), 16 third mixed gas nozzles of air supply (9-1) and 4 mixed gas outlets (11-1)；
8 the first mixed gas nozzles of air supply (5-1) are equally divided into 4 the first mixed gas nozzle of air supply groups, 4 first mixing
Gas inlet nozzle sets are uniformly arranged on one ring annular center line (5) of mixed gas nozzle of air supply, each first mixed gas
Linear distance is 360mm~460mm between two neighboring first mixed gas nozzle of air supply (5-1) center in nozzle of air supply group；
12 the second mixed gas nozzles of air supply (7-1) are equally divided into 4 the second mixed gas nozzle of air supply groups, and 4 second mixed
It closes gas inlet nozzle sets to be uniformly arranged on mixed gas nozzle of air supply bicyclic ring shape center line (7), each second gaseous mixture
In body nozzle of air supply group between two neighboring second mixed gas nozzle of air supply (7-1) center linear distance be 360mm~
460mm；
16 third mixed gas nozzles of air supply (9-1) are equally divided into 4 third mixed gas nozzle of air supply groups, and 4 thirds are mixed
It closes gas inlet nozzle sets to be uniformly arranged on mixed gas nozzle of air supply tricyclic annular center line (9), each third gaseous mixture
In body nozzle of air supply group between two neighboring third mixed gas nozzle of air supply (9-1) center linear distance be 360mm~
460mm；
4 mixed gas outlets (11-1) are evenly distributed on chassis discharge ring annular center line (11)；
Chassis (1) diameter is 3300mm~4200mm；The one ring annular center line (3) of electrode, electrode bicyclic ring
Shape center line (4), electrode tricyclic annular center line (6), electrode Fourth Ring annular center line (8) and electrode five rings annular center line
(10) in linear distance between the two neighboring electrode centers of ring be 200mm~230mm；The mixed gas nozzle of air supply one
The diameter of ring annular center line (5) is 1300mm~1400mm；The mixed gas nozzle of air supply bicyclic ring shape center line (7)
Diameter be 1900mm~2000mm；The diameter of the mixed gas nozzle of air supply tricyclic annular center line (9) is 2400mm
~2500mm；The diameter of the chassis discharge ring annular center line (11) is 3000mm~3200mm；
The chassis (1) is disc structure；On entire chassis, four symmetrical electrodes and nozzle distributed area are formd,
In each region, using the straight line where center mixed gas nozzle of air supply (2) and mixed gas outlet (11-1) as symmetry axis.
2. a kind of 60 pairs of sticks improved Siemens polycrystalline silicon reduction furnace base plate according to claim 1, it is characterised in that institute
Chassis (1) diameter stated is 3600mm.
3. a kind of 60 pairs of sticks improved Siemens polycrystalline silicon reduction furnace base plate according to claim 1, it is characterised in that 8
First mixed gas nozzle of air supply (5-1) is equally divided into 4 the first mixed gas nozzle of air supply groups, 4 the first mixed gas into
Gas jets group is uniformly arranged on one ring annular center line (5) of mixed gas nozzle of air supply, each first mixed gas air inlet spray
Linear distance is 390mm between two neighboring first mixed gas nozzle of air supply (5-1) center in mouth group.
4. a kind of 60 pairs of sticks improved Siemens polycrystalline silicon reduction furnace base plate according to claim 1, it is characterised in that 12
A second mixed gas nozzle of air supply (7-1) is equally divided into 4 the second mixed gas nozzle of air supply groups, 4 the second mixed gas
Nozzle of air supply group is uniformly arranged on mixed gas nozzle of air supply bicyclic ring shape center line (7), each second mixed gas air inlet
Linear distance is 390mm between two neighboring second mixed gas nozzle of air supply (7-1) center in nozzle sets.
5. a kind of 60 pairs of sticks improved Siemens polycrystalline silicon reduction furnace base plate according to claim 1, it is characterised in that 16
A third mixed gas nozzle of air supply (9-1) is equally divided into 4 third mixed gas nozzle of air supply groups, 4 third mixed gas
Nozzle of air supply group is uniformly arranged on mixed gas nozzle of air supply tricyclic annular center line (9), each third mixed gas air inlet
Linear distance is 390mm between two neighboring third mixed gas nozzle of air supply (9-1) center in nozzle sets.
6. a kind of 60 pairs of sticks improved Siemens polycrystalline silicon reduction furnace base plate according to claim 1, it is characterised in that institute
One ring annular center line (3) of electrode, the electrode bicyclic ring shape center line (4), electrode tricyclic annular center line (6), electrode four stated
It is with linear distance between the two neighboring electrode centers of ring in ring annular center line (8) and electrode five rings annular center line (10)
220mm。
7. a kind of 60 pairs of sticks improved Siemens polycrystalline silicon reduction furnace base plate according to claim 1, it is characterised in that institute
The diameter for the one ring annular center line (5) of mixed gas nozzle of air supply stated is 1350mm.
8. a kind of 60 pairs of sticks improved Siemens polycrystalline silicon reduction furnace base plate according to claim 1, it is characterised in that institute
The diameter for the mixed gas nozzle of air supply bicyclic ring shape center line (7) stated is 1950mm.
9. a kind of 60 pairs of sticks improved Siemens polycrystalline silicon reduction furnace base plate according to claim 1, it is characterised in that institute
The diameter for the mixed gas nozzle of air supply tricyclic annular center line (9) stated is 2450mm；The chassis discharge ring annular center
The diameter of line (11) is 3100mm.
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Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101870471A (en) * | 2010-07-08 | 2010-10-27 | 江苏中能硅业科技发展有限公司 | High-efficiency large polycrystalline silicon reducing furnace |
| CN102320604A (en) * | 2011-07-01 | 2012-01-18 | 中国恩菲工程技术有限公司 | Polysilicon reducing furnace with novel nozzles |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5509578B2 (en) * | 2007-11-28 | 2014-06-04 | 三菱マテリアル株式会社 | Polycrystalline silicon manufacturing apparatus and manufacturing method |
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Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101870471A (en) * | 2010-07-08 | 2010-10-27 | 江苏中能硅业科技发展有限公司 | High-efficiency large polycrystalline silicon reducing furnace |
| CN102320604A (en) * | 2011-07-01 | 2012-01-18 | 中国恩菲工程技术有限公司 | Polysilicon reducing furnace with novel nozzles |
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