CN106204535B - A kind of scaling method of high energy beam spot - Google Patents
A kind of scaling method of high energy beam spot Download PDFInfo
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- CN106204535B CN106204535B CN201610492848.XA CN201610492848A CN106204535B CN 106204535 B CN106204535 B CN 106204535B CN 201610492848 A CN201610492848 A CN 201610492848A CN 106204535 B CN106204535 B CN 106204535B
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T7/00—Image analysis
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T7/00—Image analysis
- G06T7/60—Analysis of geometric attributes
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T7/00—Image analysis
- G06T7/80—Analysis of captured images to determine intrinsic or extrinsic camera parameters, i.e. camera calibration
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Abstract
The present invention relates to a kind of scaling methods, disclose a kind of scaling method of high energy beam spot, comprising: adjust at beam spot to preset coordinate, beam spot is made to be in preset state, record beam spot is in circularity when preset state；In the case where keeping beam spot astigmatism constant, change the focus value of beam spot at least once；Generate the functional relation between beam spot location parameter and focus value.The present invention is by generating the functional relation between beam spot location parameter and focus value, and circularity when being in preset state according to the functional relation and beam spot, it can be realized the calibration of the calibration to beam spot position, and the influence focused to beam spot position can be demarcated, it will not be influenced by pattern distortion when being demarcated to beam spot, without solving imaging device with respect to the complicated position orientation relation between plane where beam spot.
Description
Technical field
The present invention relates to a kind of scaling method more particularly to a kind of scaling methods of high energy beam spot.
Background technique
Calibration is also referred to as calibrated, is corrected.Even if the size of beam spot, shape and position reach preset state, and allow system
Remember the state.
In high energy beams manufacture fields such as increasing material manufacturings (3D printing), size, shape and the position of high energy beam spot can direct shadows
Ring the quality of processing technology.For example, the size of beam spot should maintain minimum, so that energy is more concentrated；Beam spot size is excessive,
It will lead to energy not concentrate, cause manufacturing deficiency.The shape of beam spot should be held round, and the beam spot of distortion will lead to the precision of processing
Decline.The position of beam spot should be accurate, and there are the accuracy declines that the beam spot of deviation will lead to processing for position.Therefore, high energy is being carried out
Before Shu Jiagong, need to demarcate beam spot.
At present to the scaling method of beam spot first is that calibration, that is, the size, shape and position for manually adjusting beam spot make manually
Reach preset state.Manual scaling method generally can carry out in advance mark by some standardized elements such as on standardized element
Remember point, the position of mark point is by pinpoint.It adjusts beam spot to be allowed to be overlapped with mark point, adjusting beam spot makes its size most
It is small, shape is most round.The quantity of mark point is generally higher than 1, is in array distribution.The major defect of manual scaling method is to rely on
The experience of people, reliability are insufficient and time-consuming and laborious.
Another scaling method to beam spot is automation calibration, i.e., the ruler of beam spot is adjusted by computer and sensor
Very little, shape and position make up to preset state.Vision-sensing method is generally used, imaging device shooting figure is passed through
Picture extracts beam spot size, shape and location information.But the scaling method is opposite due to the distortion of shooting image, imaging device
The position orientation relation of plane where beam spot is difficult to solve, cannot eliminate the reasons such as influence of the focusing to beam spot position, leads to beam spot
Location information is difficult to extract, and can not be completed quickly and effectively calibration.
Summary of the invention
The purpose of the present invention is to provide a kind of scaling method of high energy beam spot, with solve can existing for existing scaling method
The problem of being difficult to extract, calibration can not be completed quickly and effectively by the location information of property deficiency and beam spot.
To achieve this purpose, the present invention adopts the following technical scheme:
A kind of scaling method of high energy beam spot, which comprises the following steps:
It adjusts at beam spot to preset coordinate, beam spot is made to be in preset state, record when the beam spot is in preset state
Circularity；
In the case where keeping the beam spot astigmatism constant, change the focus value of the beam spot at least once；
Generate the functional relation between beam spot location parameter and focus value；
Current beam spot astigmatism is adjusted, the absolute value of the difference of circularity of the circularity of beam spot in preset state when is made
Less than preset value, and determine according to the functional relation location parameter of current beam spot.
The beam spot is set to include: in preset state preferably, described
The focus value for adjusting beam spot, makes the beam spot size reach predetermined minimum；
The astigmatism for adjusting beam spot makes the beam spot circularity be in default circularity.
Preferably, described in the case where keeping the beam spot astigmatism constant, change the poly- of the beam spot at least once
Coke number includes:
It keeps the astigmatism of the beam spot constant, makes the difference of circularity of the circularity of beam spot in preset state when
Absolute value is less than preset value；
The focus value for changing the beam spot, the focusing focus after changing the beam spot are in above/below the beam spot
Focusing focus when preset state.
Preferably, the focus value for changing the beam spot, the focusing focus after changing the beam spot are above
After focusing focus when the beam spot is in preset state further include:
The focus value for changing the beam spot again, focusing focus after changing the beam spot lower than/be higher than the beam spot
Focusing focus when in preset state.
Preferably, the functional relation generated between beam spot location parameter and focus value includes:
The focus value and location parameter of beam spot when record is in preset state；
The focus value of the beam spot after focus value changes is recorded, change location parameter is moved at preset coordinate up to beam spot,
Record the new location parameter；
According to gathering for the beam spot after the focus value of beam spot when being in preset state and location parameter and focus value change
Coke number and new location parameter generate the functional relation between beam spot location parameter and focus value.
Preferably, functional relation is between the beam spot location parameter and focus valueAndIt or is (X, Y)=f (F), in which:
X is the coordinate control parameter of the beam spot position in the X direction, and Y is the coordinate of the beam spot position in the Y direction
Control parameter, F are focus value.
Preferably, before at the adjusting beam spot to preset coordinate further include:
At least one index point is set on standard plate；
The image of the standard plate is shot by imaging device；
The corresponding preset coordinate is generated according to each index point in described image.
Preferably, the imaging device is CCD camera, CMOS camera, infrared camera, near infrared camera or far infrared
Camera.
Preferably, further include:
When the preset coordinate is more than or equal to two, the corresponding beam spot of first preset coordinate is demarcated；
After the corresponding beam spot calibration of first preset coordinate, the corresponding beam spot of next preset coordinate is carried out
Calibration.
Preferably, further include:
When the preset coordinate is more than or equal to two, adjust at each beam spot to the corresponding preset coordinate of the beam spot, and
So that each beam spot is in preset state, records circularity when each beam spot is in preset state；
After all beam spots are adjusted at corresponding preset coordinate and are in preset state, each beam spot astigmatism is kept not
In the case where change, change the focus value of beam spot at least once；
Generate the functional relation between each beam spot location parameter and focus value.
The present invention by generating the functional relation between beam spot location parameter and focus value, and according to the functional relation and
Beam spot is in circularity when preset state, can be realized the calibration of the calibration to beam spot position, and can demarcate focusing to beam spot
The influence of position will not be influenced when demarcating to beam spot by pattern distortion, without solving imaging device with respect to beam spot institute
Complicated position orientation relation between plane.Have the advantages that quick, conveniently, reliably.
Detailed description of the invention
Fig. 1 is the structural schematic diagram of caliberating device of the invention；
Fig. 2 is the flow chart of the scaling method of high energy beam spot of the present invention；
Fig. 3 is the structural schematic diagram of Plays plate of the present invention；
Fig. 4 is the image schematic diagram for the standard plate that imaging device is shot in the present invention；
Fig. 5 is the positional relationship when present invention does not adjust beam spot between beam spot and preset coordinate；
Positional relationship when Fig. 6 is at present invention adjusting beam spot to preset coordinate between beam spot and preset coordinate；
Positional relationship when Fig. 7 is the beam spot focus value of change for the first time of the invention between beam spot and preset coordinate；
Positional relationship when Fig. 8 is second of change beam spot focus value of the present invention between beam spot and preset coordinate.
In figure:
1, ray generating device；2, working face；3, imaging device；4, computer；5, beam；6, standard plate；7,
Index point；8, coordinate；9, beam spot.
Specific embodiment
To further illustrate the technical scheme of the present invention below with reference to the accompanying drawings and specific embodiments.
The present invention provides a kind of scaling method of high energy beam spot, for the height in the high energy beams manufacture field such as increasing material manufacturing
The position of energy beam spot is demarcated, and is completed by a kind of caliberating device, as shown in Figure 1, the caliberating device includes ray
Device 1, working face 2, imaging device 3 and computer 4, wherein ray generating device 1 is for generating beam 5, the ray
Beam 5 can be laser or electron beam, and the present embodiment beam 5 is electron beam, and the acceleration voltage of above-mentioned ray generating device 1 is
60kV, power 0-10kW, and above-mentioned electron beam is used in the high vacuum environment formed under the action of pump, valve.
Above-mentioned beam 5 leaves beam spot on working face 2, and imaging device 3 is used to shoot the beam spot on working face 2,
And image is obtained, computer 4 receives the image that imaging device 3 is shot, and handles the image, meanwhile, computer 4 may be used also
To control ray generating device 1, to adjust the size, shape and the position on working face 2 of ray beam spot, and then realize
Calibration to beam spot position.
In the present invention, above-mentioned imaging device 3 can be CCD (Charged Coupled Device) camera, CMOS
(Complementary Metal Oxide Semiconductor) camera, infrared camera, near infrared camera or far infrared phase
Machine.
In the present invention, above-mentioned caliberating device is mainly used on increasing material manufacturing device, is used for high during increasing material manufacturing
The calibration of energy beam spot.
As shown in Fig. 2, the scaling method of high energy beam spot of the invention specifically includes the following steps:
S100, it adjusts at beam spot to preset coordinate, beam spot is made be in preset state, record when beam spot is in preset state
Circularity.
In the present embodiment, above-mentioned preset coordinate is pre-set before being demarcated, specifically, above-mentioned default seat
Target acquisition methods are as follows:
Firstly, can refer to Fig. 3, a standard plate 6 is first provided, which is in plane tabular, on standard plate 6
At least one index point 7 is set, can be arranged in array when which is multiple, such as can be circular array, or
N × N array setting (such as 5 × 5 or 7 × 7 etc.), is also possible to other arrangements.Above-mentioned index point 7 can be hole, laser is beaten
It marks on a map case, spray painting, polishing point, as long as guaranteeing that other position contrasts of index point 7 and standard plate 6 are strong, readily identified.
The shape of index point 7 can be the regular patterns such as round, rectangular or regular polygon.Due to being in the enterprising rower of standard plate 6
The setting of will point 7, so relative position of the index point 7 on standard plate 6 is accurately unique.
Then, standard plate 6 is placed on the working face 2 of caliberating device, by imaging device 3 to standard plate 6
Upper surface shot, due to imaging device 3 shoot when, shooting image exist distortion, therefore shoot image such as Fig. 4
Shown, the shape of the standard plate 6 of shooting and index point 7 thereon and standard plate 6 and index point 7 in practice has difference
Not, the coordinate 8 of index point 7 in the picture is calculated by computer 4, which is above-mentioned preset coordinate of the invention, by
It is set as at least one in index point 7, therefore it is at least one that preset coordinate is corresponding.
In the present invention, above-mentioned preset coordinate is stored in computer 4, as long as the phase between imaging device 3 and working face 2
Constant to pose, there is no need to update for preset coordinate.
In the image that imaging device 3 is shot, index point 7 and beam spot exist with pixel form, can use index point 7 or beam
The coordinate at the center of spot represents the coordinate of index point 7 or beam spot.For the coordinate as unit of pixel, resolving power can be lower than 1 picture
Element.
After setting above-mentioned preset coordinate, the image of the beam spot under some focus value is shot by molding machine 3,
At this time the positional relationship between the beam spot 9 and preset coordinate as shown in figure 5, in figure × be expressed as preset coordinate, beam spot at this time
Size, shape and position are stochastic regime, and the size, shape and position of the beam spot 9 are then calculated by computer 4.
It needs to be adjusted beam spot shown in Fig. 5 later, place it at preset coordinate and in preset state (such as
Shown in Fig. 6), in the present embodiment, above-mentioned preset state is specifically referred to:
The focus value for adjusting beam spot, makes the beam spot size reach predetermined minimum；
The astigmatism for adjusting beam spot makes the beam spot circularity be in default circularity；
The location parameter for adjusting beam spot is less than the distance between the center of the beam spot and the center of preset coordinate default
It is worth, calculation method of the preset value depending on the coverage of imaging device 3, resolution ratio and computer 4, in the present embodiment,
Above-mentioned 3 resolution ratio of imaging device is more than 20,000,000 pixels, and preset value can be selected as 0.2mm, 0.1mm or 0.05mm.
It adjusts by beam spot to preset state, astigmatism when beam spot be in preset state, focusing is recorded by computer 4
Value and location parameter, in the present embodiment, the location parameter of beam spot refers to that corresponding above-mentioned preset coordinate position is formed by position
Parameter is embodied in a manner of the coordinate control parameter in X, Y-direction.
S110, in the case where keeping beam spot astigmatism constant, change the focus value of beam spot at least once.
I.e. the astigmatism of beam spot is constant in keeping step S100, makes circle of the circularity of beam spot in preset state when
The absolute value of the difference of degree is less than preset value, then changes the focus value of the beam spot, at this time since the focus value of beam spot becomes
Change, can not only change the size of beam spot, location parameter can also change accordingly.
In the present embodiment, it can only change the focus value of a beam spot, change the focus value of beam spot at this time, beam spot can be made
Focusing focus after change is in focusing focus when preset state above/below beam spot, as shown in Figure 7.
It can certainly change as needed repeatedly, to improve the accuracy of calibration.In the present embodiment, preferably change two
It is secondary, change the focus value of beam spot for the first time at this time, when so that the focusing focus after beam spot change being in preset state higher than beam spot
Focusing focus (as shown in Figure 7), second changes the focus value of beam spot, and the focusing focus after change is in default lower than beam spot
Focusing focus (as shown in Figure 8) when state.
Functional relation between S120, generation beam spot location parameter and focus value.
I.e. when adjustment beam spot is in preset state, the focus value of beam spot when record is in preset state and position ginseng
Number；
After the focus value for changing beam spot, the focus value of the beam spot after record focus value change, and it is straight to change location parameter
It is moved at preset coordinate to beam spot, records the new location parameter；
Beam spot after then being changed according to the focus value of beam spot when being in preset state and location parameter and focus value
Focus value and new location parameter, generate the functional relation between beam spot location parameter and focus value.
In the present embodiment, above-mentioned position is embodied in the picture with coordinate form, therefore the parameter including X, Y both direction,
Above-mentioned functional relation can be the functional relation formed between focus value F and X-direction coordinate and focus value F and Y-direction coordinate
Between the functional relation that is formed, it can beAndWherein X is the beam spot position in the side X
Upward coordinate control parameter, Y are the coordinate control parameter of the beam spot position in the Y direction, and F is focus value, and k is coefficient, b
For constant.It is also possible to the coordinate of X, Y both direction functional relation between focus value F jointly, it can be (X, Y)=f
(F), wherein X is the coordinate control parameter of the beam spot position in the X direction, and Y is the coordinate of the beam spot position in the Y direction
Control parameter, F are focus value.
In the present embodiment, after the generation of above-mentioned functional relation, it can determine that actual production manufactured according to the functional relation
The location parameter of the beam spot of certain focus value used in journey can calculate the current coordinate control of the beam spot according to functional relation
Parameter processed.Under the control of the coordinate control parameter, beam spot is in the actual coordinate on working face and to the mistake between position fixing
Poor very little, to achieve the purpose that improve beam spot machining accuracy.
In the present embodiment, in above-mentioned scaling method, the beam 5 that the radiation-emitting device 1 used emits is electron beam, because
This, can be by changing the current regulation beam spot focus value in focus coil, by changing the current regulation beam spot in astigmatism coil
Shape, by the position for changing the current regulation beam spot in deflection coil.
In the present embodiment, it is one that above-mentioned preset coordinate, which can be, need to only complete the calibration of a beam spot at this time, in advance
If coordinate be also possible to it is multiple, at this point, the calibration mode of beam spot of the invention can be divided into two kinds, in which:
The first: first demarcating the corresponding beam spot of first preset coordinate, until calibration terminates, i.e., first to first
The corresponding beam spot of preset coordinate carries out the operation of step S100- step S120.
After the corresponding beam spot calibration of first preset coordinate, the corresponding beam spot of next preset coordinate is marked
It is fixed, the operation of step S100- step S120 is equally carried out to the corresponding beam spot of the preset coordinate.
And so on, complete the calibration of all beam spots.
Second, the operation of step S100 is first carried out to all beam spots, i.e., adjusting beam spot is corresponding default to the beam spot
At coordinate, and each beam spot is made to be in preset state, records circularity when each beam spot is in preset state.
Later after all beam spots are adjusted at corresponding preset coordinate and are in preset state, each beam spot picture is kept
Dissipate it is constant in the case where, change the focus value of each beam spot, and the focus value of each beam spot changes at least once.
The functional relation between each beam spot location parameter and focus value is generated, i.e., each beam spot is corresponding with a function
Relationship.
Obviously, the above embodiment of the present invention is just for the sake of clearly illustrating examples made by the present invention, and being not is pair
The restriction of embodiments of the present invention.For those of ordinary skill in the art, may be used also on the basis of the above description
To make other variations or changes in different ways.There is no necessity and possibility to exhaust all the enbodiments.It is all this
Made any modifications, equivalent replacements, and improvements etc., should be included in the claims in the present invention within the spirit and principle of invention
Protection scope within.
Claims (8)
1. a kind of scaling method of high energy beam spot, which comprises the following steps:
It adjusts at beam spot to preset coordinate, so that beam spot is in preset state, record the circle when beam spot is in preset state
Degree；
In the case where keeping the beam spot astigmatism constant, change the focus value of the beam spot at least once；
Generate the functional relation between beam spot location parameter and focus value；
It is described to make the beam spot include: in preset state
The focus value for adjusting beam spot, makes the beam spot size reach predetermined minimum；
The astigmatism for adjusting beam spot makes the beam spot circularity be in default circularity；
The location parameter for adjusting beam spot makes the distance between the center of the beam spot and the center of preset coordinate be less than preset value；
The functional relation generated between beam spot location parameter and focus value includes:
The focus value and location parameter of beam spot when record is in preset state；
The focus value of the beam spot after focus value changes is recorded, change location parameter is moved at preset coordinate up to beam spot, is recorded
The new location parameter；
The focus value of beam spot after being changed according to the focus value of beam spot when being in preset state and location parameter and focus value
And new location parameter, generate the functional relation between beam spot location parameter and focus value.
2. scaling method according to claim 1, which is characterized in that described in the situation for keeping the beam spot astigmatism constant
Under, the focus value for changing the beam spot at least once includes:
It keeps the astigmatism of the beam spot constant, makes the absolute of the difference of circularity of the circularity of beam spot in preset state when
Value is less than preset value；
The focus value for changing the beam spot, the focusing focus after changing the beam spot are in default above/below the beam spot
Focusing focus when state.
3. scaling method according to claim 2, which is characterized in that the focus value for changing the beam spot makes described
Beam spot change after focusing focus of focusing focus when being in preset state above/below the beam spot after further include:
The focus value for changing the beam spot again, the focusing focus after changing the beam spot are lower than/are higher than the beam spot and be in
Focusing focus when preset state.
4. scaling method according to claim 1, which is characterized in that function between the beam spot location parameter and focus value
Relationship isAnd, in which:
X is the coordinate control parameter of the beam spot position in the X direction, and Y is the coordinate control of the beam spot position in the Y direction
Parameter, F are focus value.
5. scaling method according to claim 1 to 4, which is characterized in that at the adjusting beam spot to preset coordinate it
Before further include:
At least one index point is set on standard plate；
The image of the standard plate is shot by imaging device；
Corresponding preset coordinate is generated according to each index point in described image.
6. scaling method according to claim 5, which is characterized in that the imaging device be CCD camera, CMOS camera,
Infrared camera, near infrared camera or far infrared camera.
7. scaling method according to claim 6, which is characterized in that further include:
When the preset coordinate is more than or equal to two, the corresponding beam spot of first preset coordinate is demarcated；
After the corresponding beam spot calibration of first preset coordinate, the corresponding beam spot of next preset coordinate is marked
It is fixed.
8. scaling method according to claim 6, which is characterized in that further include:
It when the preset coordinate is more than or equal to two, adjusts at each beam spot to the corresponding preset coordinate of the beam spot, and makes every
A beam spot is in preset state, records circularity when each beam spot is in preset state；
After all beam spots are adjusted at corresponding preset coordinate and are in preset state, keep each beam spot astigmatism constant
In the case of, change the focus value of beam spot at least once；
Generate the functional relation between each beam spot location parameter and focus value.
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| CN201610492848.XA CN106204535B (en) | 2016-06-24 | 2016-06-24 | A kind of scaling method of high energy beam spot |
| RU2019101537A RU2722267C1 (en) | 2016-06-24 | 2017-06-23 | Beam spot calibration method |
| PCT/CN2017/089866 WO2017220030A1 (en) | 2016-06-24 | 2017-06-23 | Method for calibrating beam spot |
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| CN109323653B (en) * | 2018-11-14 | 2024-03-08 | 江苏一六仪器有限公司 | X-ray facula positioning instrument and positioning method thereof |
| CN110031887B (en) * | 2019-04-30 | 2022-01-04 | 清华大学 | Electron beam spot calibration device and method |
| JP2021087967A (en) * | 2019-12-03 | 2021-06-10 | 株式会社ディスコ | Method for adjusting laser processing device |
| CN112397363B (en) * | 2020-09-28 | 2022-08-30 | 西安增材制造国家研究院有限公司 | Electron gun beam spot correction device and correction method |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105184857A (en) * | 2015-09-13 | 2015-12-23 | 北京工业大学 | Scale factor determination method in monocular vision reconstruction based on dot structured optical ranging |
| CN105404238A (en) * | 2015-10-22 | 2016-03-16 | 南京航空航天大学 | Probe position linearization calibration method for on-machine laser measurement |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN100346150C (en) * | 2000-12-28 | 2007-10-31 | 株式会社尼康 | Imaging characteristics measuring method, imaging characteristics adjusting method, exposure method and equipment, program and recording medium, and device producing method |
| MX2007014700A (en) * | 2005-05-27 | 2008-04-16 | Opto Global Holdings Pty Ltd | System and method for laser calibration. |
| WO2013001424A2 (en) * | 2011-06-27 | 2013-01-03 | Koninklijke Philips Electronics N.V. | Ultrasound-image-guide system and volume-motion-base calibration method |
| TWI543830B (en) * | 2013-05-10 | 2016-08-01 | 財團法人工業技術研究院 | Visual error correction method |
| RU2545070C9 (en) * | 2013-10-29 | 2015-08-10 | Федеральное Государственное унитарное предприятие "Российский Федеральный ядерный центр-Всероссийский научно-исследовательский институт экспериментальной физики-ФГУП "РФЯЦ-ВНИИЭФ" | Method for automated adjustment of optical system |
| TWI577484B (en) * | 2014-11-20 | 2017-04-11 | 財團法人工業技術研究院 | Three-dimension laser processing apparatus and positioning error correction method |
| CN104959724B (en) * | 2015-07-15 | 2017-03-01 | 桂林狮达机电技术工程有限公司 | Electron beam rapid forming equipment characteristic point data harvester and method |
| CN106204535B (en) * | 2016-06-24 | 2018-12-11 | 天津清研智束科技有限公司 | A kind of scaling method of high energy beam spot |
-
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Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105184857A (en) * | 2015-09-13 | 2015-12-23 | 北京工业大学 | Scale factor determination method in monocular vision reconstruction based on dot structured optical ranging |
| CN105404238A (en) * | 2015-10-22 | 2016-03-16 | 南京航空航天大学 | Probe position linearization calibration method for on-machine laser measurement |
Non-Patent Citations (1)
| Title |
|---|
| "高能激光能量测量装置的现场标定方法";魏继锋等;《中国激光》;20090930;第36卷(第9期);论文第2399-2403页 * |
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| WO2017220030A1 (en) | 2017-12-28 |
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