CN106204535A - A kind of scaling method of high energy beam spot - Google Patents
A kind of scaling method of high energy beam spot Download PDFInfo
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- CN106204535A CN106204535A CN201610492848.XA CN201610492848A CN106204535A CN 106204535 A CN106204535 A CN 106204535A CN 201610492848 A CN201610492848 A CN 201610492848A CN 106204535 A CN106204535 A CN 106204535A
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- beam spot
- focus value
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T7/00—Image analysis
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T7/00—Image analysis
- G06T7/60—Analysis of geometric attributes
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T7/00—Image analysis
- G06T7/80—Analysis of captured images to determine intrinsic or extrinsic camera parameters, i.e. camera calibration
Abstract
The present invention relates to a kind of scaling method, disclose the scaling method of a kind of high energy beam spot, including: at regulation beam spot to preset coordinate, making beam spot be in preset state, record beam spot is in circularity during preset state；In the case of keeping beam spot astigmatism constant, change the focus value of beam spot at least one times；Generate the functional relationship between beam spot location parameter and focus value.The present invention is by generating the functional relationship between beam spot location parameter and focus value, and it is in circularity during preset state according to this functional relationship and beam spot, it is capable of the calibration of the demarcation to beam spot position, and the impact focused on beam spot position can be demarcated, beam spot is carried out timing signal to be affected by pattern distortion, it is not necessary to solve imaging device relative to the complicated position orientation relation between the plane of beam spot place.
Description
Technical field
The present invention relates to a kind of scaling method, particularly relate to the scaling method of a kind of high energy beam spot.
Background technology
Demarcate, also referred to as calibration, rectification.Even if the size of beam spot, shape and position reach default state, and allow system
Remember this state.
Increasing the high energy beam manufacture fields such as material manufacture (3D printing), the size of high energy beam spot, shape and position can direct shadows
Ring the quality of processing technique.Such as, the size of beam spot should maintain minimum, so that energy is more concentrated；Beam spot size is excessive,
Energy can be caused not concentrate, cause manufacturing deficiency.The shape of beam spot should be held round, and the beam spot of distortion can cause the precision of processing
Decline.The position of beam spot should be accurate, and position exists the beam spot of deviation can cause the precise decreasing of processing.Therefore, high energy is being carried out
Before Shu Jiagong, need beam spot is demarcated.
One of current scaling method to beam spot is manually to demarcate, and the most manually regulates the size of beam spot, shape and position and makes
Reach default state.Manual scaling method typically can be by some standardized elements, as carried out mark on standardized element in advance
Note point, the position of labelling point is through pinpoint.Regulation beam spot is allowed to overlap with labelling point, regulates beam spot and makes its size
Little, shape is round.The quantity of labelling point is generally higher than 1, in array distribution.The major defect of manual scaling method is, relies on
The experience of people, reliability is not enough and wastes time and energy.
Another kind of scaling method to beam spot is that automatization demarcates, and i.e. relies on computer and sensor to regulate the chi of beam spot
Very little, shape and position make up to default state.Commonly use is vision-sensing method, by imaging device shooting figure
Picture, extracts beam spot size, shape and positional information.But this scaling method is relative due to the shooting distortion of image, imaging device
The position orientation relation of beam spot place plane is difficult to solve, can not eliminate reasons such as focusing on the impact on beam spot position, causes beam spot
Positional information is difficult to extract, it is impossible to be completed quickly and effectively demarcation.
Summary of the invention
It is an object of the invention to provide the scaling method of a kind of high energy beam spot, with solve existing scaling method exist can
Not enough by property and beam spot positional information is difficult to extract, it is impossible to the problem being completed quickly and effectively demarcation.
For reaching this purpose, the present invention by the following technical solutions:
The scaling method of a kind of high energy beam spot, it is characterised in that comprise the following steps:
Regulation beam spot, at preset coordinate, makes beam spot be in preset state, records when described beam spot is in preset state
Circularity；
In the case of keeping described beam spot astigmatism constant, change the focus value of the most described beam spot；
Generate the functional relationship between beam spot location parameter and focus value；
Adjust current beam spot astigmatism, make the circularity of beam spot and the absolute value of the difference of circularity when being in preset state
Less than preset value, and determine the location parameter of current beam spot according to described functional relationship.
As preferably, described in make beam spot be in preset state to include:
Adjust the focus value of beam spot, make described beam spot size reach predetermined minimum；
Adjust the astigmatism of beam spot, make described beam spot circularity be in default circularity.
As preferably, described in the case of keeping described beam spot astigmatism constant, change the poly-of the most described beam spot
Coke number includes:
The astigmatism keeping described beam spot is constant, makes the circularity of beam spot and the difference of circularity when being in preset state
Absolute value is less than preset value；
Changing the focus value of described beam spot, the focused spot after making described beam spot change is in above/below described beam spot
Focused spot during preset state.
As preferably, the focus value of the described beam spot of described change, the focused spot after making described beam spot change is above
Also include after focused spot when described beam spot is in preset state:
Again change the focus value of described beam spot, make described beam spot change after focused spot less than/higher than described beam spot
It is in focused spot during preset state.
As preferably, the functional relationship between described generation beam spot location parameter and focus value includes:
The focus value of beam spot when record is in preset state and location parameter；
Record focus value change after the focus value of beam spot, change location parameter until beam spot moves to preset coordinate,
Record this new location parameter；
Focus value according to beam spot when being in preset state and location parameter and focus value change after beam spot poly-
Coke number and new location parameter, generate the functional relationship between beam spot location parameter and focus value.
As preferably, between described beam spot location parameter and focus value, functional relationship isAndOr it is (X, Y)=f (F), wherein:
X is described beam spot position coordinate control parameter in the X direction, and Y is described beam spot position coordinate in the Y direction
Controlling parameter, F is focus value.
As preferably, at described regulation beam spot to preset coordinate before also include:
Standard plate arranges at least one index point；
The image of described standard plate is shot by imaging device；
Corresponding described preset coordinate is generated according to each index point in described image.
As preferably, described imaging device is CCD camera, CMOS camera, infrared camera, near infrared camera or far infrared
Camera.
As preferably, also include:
When described preset coordinate is more than or equal to two, the beam spot that first preset coordinate is corresponding is demarcated；
Beam spot corresponding to described first preset coordinate is demarcated after terminating, and carries out the beam spot that next preset coordinate is corresponding
Demarcate.
As preferably, also include:
When described preset coordinate is more than or equal to two, regulate at each beam spot preset coordinate that extremely described beam spot is corresponding, and
Make each beam spot be in preset state, record circularity when each beam spot is in preset state；
After all beam spots all regulate to corresponding preset coordinate and are in preset state, keep each beam spot astigmatism not
In the case of change, change the focus value of beam spot at least one times；
Generate the functional relationship between each beam spot location parameter and focus value.
The present invention by generating the functional relationship between beam spot location parameter and focus value, and according to this functional relationship and
Beam spot is in circularity during preset state, it is possible to realizes the demarcation to beam spot position and calibrates, it is possible to demarcates and focus on beam spot
The impact of position, will not be affected by pattern distortion beam spot is carried out timing signal, it is not necessary to solve imaging device relative to beam spot institute
Complicated position orientation relation between plane.There is advantage quick, convenient, reliable.
Accompanying drawing explanation
Fig. 1 is the structural representation of the caliberating device of the present invention；
Fig. 2 is the flow chart of the scaling method of high energy beam spot of the present invention；
Fig. 3 is the structural representation of Plays plate of the present invention；
Fig. 4 is the image schematic diagram of the standard plate of imaging device shooting in the present invention；
Fig. 5 is present invention position relationship when not regulating beam spot between beam spot and preset coordinate；
Fig. 6 is that the present invention regulates beam spot to position relationship between beam spot and preset coordinate time at preset coordinate；
Fig. 7 is present invention position relationship when changing for the first time beam spot focus value between beam spot and preset coordinate；
Fig. 8 be the present invention second time change beam spot focus value time beam spot and preset coordinate between position relationship.
In figure:
1, ray generating device；2, working face；3, imaging device；4, computer；5, beam；6, standard plate；7、
Index point；8, coordinate；9, beam spot.
Detailed description of the invention
Further illustrate technical scheme below in conjunction with the accompanying drawings and by detailed description of the invention.
The present invention provides the scaling method of a kind of high energy beam spot, for the height increased in the high energy beam manufacture fields such as material manufacture
The position of energy beam spot is demarcated, and it is completed, as it is shown in figure 1, this caliberating device includes that ray occurs by a kind of caliberating device
Device 1, working face 2, imaging device 3 and computer 4, wherein ray generating device 1 is used for producing beam 5, this ray
Bundle 5 can be laser or electron beam, and the present embodiment beam 5 is electron beam, and the accelerating potential of above-mentioned ray generating device 1 is
60kV, power is 0-10kW, and above-mentioned electron beam be pump, valve effect under formed high vacuum environment in use.
Above-mentioned beam 5 stays beam spot, imaging device 3 to be used for shooting the beam spot on working face 2 on working face 2,
And obtaining image, computer 4 receives the image of imaging device 3 shooting, and processes this image, and meanwhile, computer 4 also may be used
To control ray generating device 1, to adjust the size of ray beam spot, shape and the position on working face 2, and then realize
Demarcation to beam spot position.
In the present invention, above-mentioned imaging device 3 can be CCD (Charged Coupled Device) camera, CMOS
(Complementary Metal Oxide Semiconductor) camera, infrared camera, near infrared camera or far infrared phase
Machine.
In the present invention, above-mentioned caliberating device is mainly used in increasing material and manufactures on device, and it is for high to increasing in material manufacture process
The demarcation of energy beam spot.
As in figure 2 it is shown, the scaling method of the high energy beam spot of the present invention specifically includes following steps:
S100, regulation beam spot, at preset coordinate, make beam spot be in preset state, when record beam spot is in preset state
Circularity.
In the present embodiment, above-mentioned preset coordinate pre-set before demarcating, concrete, above-mentioned default seat
Target acquisition methods is as follows:
First, can refer to Fig. 3, first provide a standard plate 6, this standard plate 6 is in plane tabular, on standard plate 6
Arranging at least one index point 7, this index point 7 can be arranged in array when being multiple, such as, can be circular array, or
N × N array setting (such as 5 × 5, or 7 × 7 etc.), it is also possible to it is other arrangements.Above-mentioned index point 7 can be that hole, laser are beaten
Mark on a map case, spray paint, polish point, as long as ensureing that index point 7 is strong, readily identified with other position contrasts of standard plate 6.
The shape of index point 7 can be circular, square or the regular pattern such as regular polygon.Owing to being at the enterprising rower of standard plate 6
The setting of will point 7, so the relative position that index point 7 is on standard plate 6 is the most unique.
Subsequently, standard plate 6 is placed on the working face 2 of caliberating device, by imaging device 3 to standard plate 6
Upper surface shoot, when shooting due to imaging device 3, its shooting image exist distortion, the image therefore shot such as Fig. 4
Shown in, the standard plate 6 of shooting and index point thereon 7 have difference with the shape of the standard plate 6 in reality and index point 7
Not, calculating index point 7 coordinate 8 in the picture by computer 4, this coordinate 8 is the above-mentioned preset coordinate of the present invention, by
Be set at least one in index point 7, therefore preset coordinate corresponding at least one.
In the present invention, above-mentioned preset coordinate is stored in computer 4, if the phase between imaging device 3 with working face 2
Constant to pose, preset coordinate avoids the need for updating.
In the image of imaging device 3 shooting, index point 7 and beam spot all exist with pixel form, can be with index point 7 or bundle
The coordinate at the center of speckle represents the coordinate of index point 7 or beam spot.This coordinate is in units of pixel, and resolving power can be less than 1 picture
Element.
After setting above-mentioned preset coordinate, shot the image of beam spot under certain focus value by shaped device 3,
Now position relationship between this beam spot 9 and preset coordinate as it is shown in figure 5, in figure × be expressed as preset coordinate, now beam spot
Size, shape and position are random manner, calculate the size of this beam spot 9, shape and position by computer 4 subsequently.
Need afterwards the beam spot shown in Fig. 5 is adjusted so that it is be placed at preset coordinate and be in preset state (as
Shown in Fig. 6), in the present embodiment, above-mentioned preset state specifically refers to:
Adjust the focus value of beam spot, make described beam spot size reach predetermined minimum；
Adjust the astigmatism of beam spot, make described beam spot circularity be in default circularity；
Adjust the location parameter of beam spot, make the distance between center and the center of preset coordinate of described beam spot less than presetting
Value, this preset value depends on the coverage of imaging device 3, resolution and the computational methods of computer 4, in the present embodiment,
Above-mentioned imaging device 3 resolution is more than 20,000,000 pixels, and preset value can be selected for as 0.2mm, 0.1mm or 0.05mm.
Beam spot is being adjusted to preset state, is recording astigmatism when beam spot is in preset state, focusing by computer 4
Value and location parameter, in the present embodiment, the location parameter of beam spot refers to the position that corresponding above-mentioned preset coordinate position is formed
Parameter, embodies in the way of its coordinate control parameter in X, Y-direction.
S110, keep beam spot astigmatism constant in the case of, change the focus value of beam spot at least one times.
I.e. keeping the astigmatism of beam spot in step S100 constant, making the circularity of beam spot and circle when being in preset state
The absolute value of the difference of degree, less than preset value, then changes the focus value of this beam spot, now becomes due to the focus value of beam spot
Changing, not only can change the size of beam spot, its location parameter also can change accordingly.
In the present embodiment, can only change the focus value of a beam spot, now change the focus value of beam spot, it is possible to make beam spot
Focused spot after change is in focused spot during preset state above/below beam spot, as shown in Figure 7.
Can certainly change repeatedly as required, to improve the accuracy demarcated.In the present embodiment, preferably change two
Secondary, now change the focus value of beam spot for the first time so that when the focused spot after beam spot change is in preset state higher than beam spot
Focused spot (as shown in Figure 7), second time changes the focus value of beam spot, and the focused spot after change is in default less than beam spot
Focused spot (as shown in Figure 8) during state.
S120, the functional relationship generated between beam spot location parameter and focus value.
I.e. when adjusting beam spot and being in preset state, focus value and the position of beam spot when record is in preset state are joined
Number；
After the focus value changing beam spot, the focus value of the beam spot after record focus value change, and it is straight to change location parameter
Move to preset coordinate to beam spot, record this new location parameter；
Beam spot after changing according to the focus value of beam spot when being in preset state and location parameter and focus value subsequently
Focus value and new location parameter, generate the functional relationship between beam spot location parameter and focus value.
In the present embodiment, above-mentioned position is embodied with coordinate form in the picture, therefore includes the parameter of X, Y both direction,
Above-mentioned functional relationship can be the functional relationship and focus value F and Y-direction coordinate formed between focus value F and X-direction coordinate
Between formed functional relationship, can thinkAndWherein X is that described beam spot position is in X side
Coordinate control parameter upwards, Y is described beam spot position coordinate control parameter in the Y direction, and F is focus value, and k is coefficient, b
For constant.Can also be that the coordinate of X, Y both direction is common and functional relationship between focus value F, (X, Y)=f can be thought
(F), wherein X is described beam spot position coordinate control parameter in the X direction, and Y is described beam spot position coordinate in the Y direction
Controlling parameter, F is focus value.
In the present embodiment, after above-mentioned functional relationship generates, can determine that actual production manufactured according to this functional relationship
The location parameter of the beam spot of certain focus value used in journey, i.e. can calculate, according to functional relationship, the coordinate control that this beam spot is current
Parameter processed.Under the control of this coordinate control parameter, beam spot actual coordinate on working face and give the mistake between position fixing
Difference is the least, to reach to improve the purpose of beam spot machining accuracy.
In the present embodiment, in above-mentioned scaling method, the beam 5 that the radiation-emitting device 1 of use is launched is electron beam, because of
This, can be by changing the electric current regulation beam spot focus value in focus coil, by changing the electric current regulation beam spot in astigmatism coil
Shape, by changing the position of the electric current regulation beam spot in deflection coil.
In the present embodiment, above-mentioned preset coordinate can be for one, the most only need to complete the demarcation of a beam spot, in advance
If coordinate can also be multiple, now, the demarcation mode of the beam spot of the present invention can be divided into two kinds, wherein:
The first: first the beam spot that first preset coordinate is corresponding being demarcated, terminating, the most first to first until demarcating
Beam spot corresponding to preset coordinate carries out the operation of step S100-step S130.
After the beam spot that first preset coordinate is corresponding is demarcated and terminated, the beam spot that next preset coordinate is corresponding is marked
Fixed, equally the beam spot that this preset coordinate is corresponding is carried out the operation of step S100-step S130.
By that analogy, the demarcation of all of beam spot is completed.
The second, first carries out the operation of step S100, i.e. regulation beam spot to corresponding the presetting of this beam spot to all of beam spot
At coordinate, and make each beam spot be in preset state, record circularity when each beam spot is in preset state.
Afterwards after all beam spots all regulate to corresponding preset coordinate and are in preset state, keep each beam spot picture
Dissipate constant in the case of, change the focus value of each beam spot, and the focus value of each beam spot change at least one times.
Generating the functional relationship between each beam spot location parameter and focus value, the most each beam spot is all to there being a function
Relation.
Obviously, the above embodiment of the present invention is only used to understand explanation example of the present invention, and is not right
The restriction of embodiments of the present invention.For those of ordinary skill in the field, the most also may be used
To make other changes in different forms.Here without also cannot all of embodiment be given exhaustive.All at this
Any amendment, equivalent and the improvement etc. made within the spirit of invention and principle, should be included in the claims in the present invention
Protection domain within.
Claims (10)
1. the scaling method of a high energy beam spot, it is characterised in that comprise the following steps:
Regulation beam spot, at preset coordinate, makes beam spot be in preset state, records circle when described beam spot is in preset state
Degree；
In the case of keeping described beam spot astigmatism constant, change the focus value of the most described beam spot；
Generate the functional relationship between beam spot location parameter and focus value.
Scaling method the most according to claim 1, it is characterised in that described in make beam spot be in preset state to include:
Adjust the focus value of beam spot, make described beam spot size reach predetermined minimum；
Adjust the astigmatism of beam spot, make described beam spot circularity be in default circularity；
Adjust the location parameter of beam spot, make the distance between center and the center of preset coordinate of described beam spot less than preset value.
Scaling method the most according to claim 2, it is characterised in that the described situation constant at the described beam spot astigmatism of holding
Under, the focus value changing the most described beam spot includes:
The astigmatism keeping described beam spot is constant, and make the circularity of beam spot with the difference of circularity when being in preset state is absolute
Value is less than preset value；
Changing the focus value of described beam spot, the focused spot after making described beam spot change is in default above/below described beam spot
Focused spot during state.
Scaling method the most according to claim 3, it is characterised in that the focus value of the described beam spot of described change, makes described
Also include after focused spot when focused spot after beam spot change is in preset state above/below described beam spot:
Again changing the focus value of described beam spot, the focused spot after making described beam spot change be less than/is in higher than described beam spot
Focused spot during preset state.
Scaling method the most according to claim 4, it is characterised in that between described generation beam spot location parameter and focus value
Functional relationship include:
The focus value of beam spot when record is in preset state and location parameter；
Record focus value change after the focus value of beam spot, change location parameter until beam spot moves to preset coordinate, record
This new location parameter；
Focus value according to beam spot when being in preset state and location parameter and focus value change after the focus value of beam spot
And new location parameter, generate the functional relationship between beam spot location parameter and focus value.
Scaling method the most according to claim 5, it is characterised in that function between described beam spot location parameter and focus value
Relation isAndOr it is (X, Y)=f (F), wherein:
X is described beam spot position coordinate control parameter in the X direction, and Y is described beam spot position coordinate control in the Y direction
Parameter, F is focus value.
7. according to the arbitrary described scaling method of claim 1-6, it is characterised in that at described regulation beam spot to preset coordinate it
Before also include:
Standard plate arranges at least one index point；
The image of described standard plate is shot by imaging device；
Corresponding preset coordinate is generated according to each index point in described image.
Scaling method the most according to claim 7, it is characterised in that described imaging device be CCD camera, CMOS camera,
Infrared camera, near infrared camera or far infrared camera.
Scaling method the most according to claim 8, it is characterised in that also include:
When described preset coordinate is more than or equal to two, the beam spot that first preset coordinate is corresponding is demarcated；
Beam spot corresponding to described first preset coordinate is demarcated after terminating, and marks the beam spot that next preset coordinate is corresponding
Fixed.
Scaling method the most according to claim 8, it is characterised in that also include:
When described preset coordinate is more than or equal to two, regulates at each beam spot preset coordinate that extremely described beam spot is corresponding, and make every
Individual beam spot is in preset state, records circularity when each beam spot is in preset state；
After all beam spots all regulate to corresponding preset coordinate and are in preset state, keep each beam spot astigmatism constant
In the case of, change the focus value of beam spot at least one times；
Generate the functional relationship between each beam spot location parameter and focus value.
Priority Applications (3)
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| CN201610492848.XA CN106204535B (en) | 2016-06-24 | 2016-06-24 | A kind of scaling method of high energy beam spot |
| RU2019101537A RU2722267C1 (en) | 2016-06-24 | 2017-06-23 | Beam spot calibration method |
| PCT/CN2017/089866 WO2017220030A1 (en) | 2016-06-24 | 2017-06-23 | Method for calibrating beam spot |
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| CN201610492848.XA CN106204535B (en) | 2016-06-24 | 2016-06-24 | A kind of scaling method of high energy beam spot |
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| WO2017220030A1 (en) * | 2016-06-24 | 2017-12-28 | 天津清研智束科技有限公司 | Method for calibrating beam spot |
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| CN110031887A (en) * | 2019-04-30 | 2019-07-19 | 清华大学 | Beam spot caliberating device and method |
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| JP2021087967A (en) * | 2019-12-03 | 2021-06-10 | 株式会社ディスコ | Method for adjusting laser processing device |
| CN112397363B (en) * | 2020-09-28 | 2022-08-30 | 西安增材制造国家研究院有限公司 | Electron gun beam spot correction device and correction method |
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| WO2017220030A1 (en) * | 2016-06-24 | 2017-12-28 | 天津清研智束科技有限公司 | Method for calibrating beam spot |
| CN109323653A (en) * | 2018-11-14 | 2019-02-12 | 江苏六仪器有限公司 | A kind of X-ray spot location instrument and its localization method |
| CN109323653B (en) * | 2018-11-14 | 2024-03-08 | 江苏一六仪器有限公司 | X-ray facula positioning instrument and positioning method thereof |
| CN110031887A (en) * | 2019-04-30 | 2019-07-19 | 清华大学 | Beam spot caliberating device and method |
| CN110031887B (en) * | 2019-04-30 | 2022-01-04 | 清华大学 | Electron beam spot calibration device and method |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2017220030A1 (en) | 2017-12-28 |
| RU2722267C1 (en) | 2020-05-28 |
| CN106204535B (en) | 2018-12-11 |
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