CN106186724A - 一种高透浅绿色可弯钢三银低辐射镀膜玻璃及制备方法 - Google Patents
一种高透浅绿色可弯钢三银低辐射镀膜玻璃及制备方法 Download PDFInfo
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Abstract
本发明公开了一种高透浅绿色可弯钢三银低辐射镀膜玻璃,包括玻璃基片层和镀膜层,所述镀膜层自所述玻璃基片层向外依次复合有十六个膜层,其中第一层为SiNx层,第二层为ZnO层,第三层Ag层,第四层为NiCr层,第五层为AZO层,第六层为SiNx层,第七层为ZnO层,第八层为Ag层,第九层为NiCr层,第十层为AZO层,第十一层为ZnSnO层,第十二层为ZnO层,第十三层为Ag层,第十四层为NiCr层,第十五层为AZO层,第十六层为SiNx层,该玻璃的6mm单片透过率可达70%,玻面外观颜色为浅绿色,清新自然,可钢三银钢化后正侧面颜色接近,本款膜系可做弯钢产品与一款普通三银(先钢再镀)配套使用,通过控制关键膜层厚度,降低生产成本。
Description
技术领域
本发明涉及无机非金属镀膜玻璃技术领域,具体为一种高透浅绿色可弯钢三银低辐射镀膜玻璃及制备方法。
背景技术
作为一种优良的建筑材料,玻璃由于其良好的通透性,具有透光防风雪的功能,被广泛应用于建筑上。随着现代科技水平的发展,玻璃被赋予各种新的内涵,其中low-E玻璃以其美观大方的颜色、较好的质感以及优良的节能特性,在建筑幕墙领域已受到广泛应用。Low-E玻璃又称低辐射玻璃,常使用磁控溅射法在玻璃基片表面沉积出纳米膜层,进而改变玻璃的光学、电学、机械和化学等方面的性能,达到装饰、节能、环保等目的。
作为节能建筑材料,low-E玻璃的节能特性与普通玻璃及热反射镀膜玻璃相比,Low-E玻璃对远红外辐射具有极高的反射率。在有效减少室内外的热传递的作用下,保持室内温度稳定,减少建筑加热或制冷的能耗,起到了非常优秀的节能降耗作用。但是随着玻璃上堆积的膜层越来与复杂,膜层对可见光的吸收与反射能力也越来越强,导致玻璃的透光性变差,特别是对于可钢三银来说,其需要足够厚的保护层避免Ag层在后续加工过程中被氧化。因而在保证膜层的稳定性情况下,提高膜层透过率成为一个难点。
现有技术的缺点:
1)可钢三银膜层颜色较深,多为深绿色、深蓝色或中性色泛红。
2)膜层质感不清透,透过率较低。
3)可钢三银银当量高,生产成本较高。
发明内容
针对以上问题,本发明提供了一种高透浅绿色可弯钢三银低辐射镀膜玻璃及制备方法,该玻璃的6mm单片透过率可达70%,玻面外观颜色为浅绿色,清新自然,可钢三银钢化后正侧面颜色接近,本款膜系可做弯钢产品与一款普通三银(先钢再镀)配套使用,通过控制关键膜层厚度,降低生产成本,可以有效解决背景技术中的问题。
为实现上述目的,本发明提供如下技术方案:一种高透浅绿色可弯钢三银低辐射镀膜玻璃,包括玻璃基片层和镀膜层,所述镀膜层自所述玻璃基片层向外依次复合有十六个膜层,其中第一层为SiNx层,第二层为ZnO层,第三层Ag层,第四层为NiCr层,第五层为AZO层,第六层为SiNx层,第七层为ZnO层,第八层为Ag层,第九层为NiCr层,第十层为AZO层,第十一层为ZnSnO层,第十二层为ZnO层,第十三层为Ag层,第十四层为NiCr层,第十五层为AZO层,第十六层为SiNx层。
优选的,所述第一层和第二层构成第一电介质组合层,第三层作为低辐射功能层,第四层作为第一阻挡保护层,第五层作为晶床介质层,第六层和第七层作为第二电介质组合层,第八层作为低辐射功能层,第九层作为第二阻挡保护层,第十层作为晶床介质层,第十一层和第十二层作为第三电介质组合层,第十三层作为低辐射功能层,第十四层作为第三阻挡保护层,第十五层作为晶床介质层,第十六层作为第四电介质。
优选的,所述第一层的厚度为10-20nm。
优选的,所述第二层、第五层、第七层、第十层的厚度均为10-15nm。
优选的,所述第三层的厚度为4-11nm。
优选的,所述第四层和第九层的厚度均为0.5-1nm。
优选的,所述第六层的厚度为35-45nm。
优选的,所述第八层的厚度为5-10nm。
优选的,所述第十一层的厚度为30-40nm。
优选的,所述第十二层的厚度为35-40nm。
优选的,所述第十三层的厚度为7-12nm。
优选的,所述第十四层的厚度为3-6nm。
优选的,所述第十五层的厚度为15-20nm。
优选的,所述第十六层的厚度为25-35nm。
优选的,所述镀膜层的总厚度为250-270nm。
另外本发明还设计了一种高透浅绿色可弯钢三银低辐射镀膜玻璃的制备方法,将经清洗后新鲜浮法原片引入真空镀膜腔室,腔室本底漏率需小于1×10-8mbar*L/S。根据不同膜层需求在事先配置好的靶位中通入反应气体与工作气体,通入气体后腔体真空度在2*10-3-5*10-3mbar,玻璃运行在靶位下方的过程中需在靶材上施加高电压,通过磁控溅射原理在等离子体氛围中成膜。
与现有技术相比,本发明的有益效果是:该玻璃的6mm单片透过率可达70%,玻面外观颜色为浅绿色,清新自然,可钢三银钢化后正侧面颜色接近,本款膜系可做弯钢产品与一款普通三银(先钢再镀)配套使用,通过控制关键膜层厚度,降低生产成本。
附图说明
图1为本发明结构示意图;
图中:1-SiNx层,2-ZnO层,3-Ag层,4-NiCr层,5-AZO层,6-SiNx层,7-ZnO层,8-Ag层,9-NiCr层,10-AZO层,11-ZnSnO层,12-ZnO层,13-Ag层,14-NiCr层,15-AZO层,16-SiNx层;Clean glass-玻璃基片层。
具体实施方式
下面将结合本发明实施例中的附图,对本发明实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例仅仅是本发明一部分实施例,而不是全部的实施例。基于本发明中的实施例,本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例,都属于本发明保护的范围。
实施例:
请参阅图1,本发明提供一种技术方案:一种高透浅绿色可弯钢三银低辐射镀膜玻璃,包括玻璃基片层和镀膜层,所述镀膜层自所述玻璃基片层向外依次复合有十六个膜层,其中第一层为SiNx层1,第二层为ZnO层2,第三层Ag层3,第四层为NiCr层4,第五层为AZO层5,第六层为SiNx层6,第七层为ZnO层7,第八层为Ag层8,第九层为NiCr层9,第十层为AZO层10,第十一层为ZnSnO层11,第十二层为ZnO层12,第十三层为Ag层13,第十四层为NiCr层14,第十五层为AZO层15,第十六层为SiNx层16。
优选的,所述第一层和第二层构成第一电介质组合层,第三层作为低辐射功能层,第四层作为第一阻挡保护层,第五层作为晶床介质层,第六层和第七层作为第二电介质组合层,第八层作为低辐射功能层,第九层作为第二阻挡保护层,第十层作为晶床介质层,第十一层和第十二层作为第三电介质组合层,第十三层作为低辐射功能层,第十四层作为第三阻挡保护层,第十五层作为晶床介质层,第十六层作为第四电介质。
每层膜靶材及工艺技术要求如下表所示:
另外本发明还设计了一种高透浅绿色可弯钢三银低辐射镀膜玻璃的制备方法,将经清洗后新鲜浮法原片(夏季1个月以内,冬季3个月以内)引入真空镀膜腔室,腔室本底漏率需小于1×10-8mbar*L/S。根据不同膜层需求,在事先配置好的靶位中通入反应气体与工作气体,通入气体后腔体真空度在2*10-3-5*10-3mbar,玻璃运行在靶位下方的过程中需在靶材上施加高电压,在腔室中形成等离子辉光体系,通过磁控溅射原理在玻璃表面成膜,其中不同气氛工艺气体的靶位间需空置一个靶位,避免窜气产生膜层杂质。
采用离线镀膜技术,通过磁控溅射镀膜技术在预清洗过的洁净玻璃表面镀上低辐射功能膜层,玻璃在高真空的等离子体氛围中成膜,磁控溅射具有高速、低温、低损伤等优点,沉积速率快,基片的温度变化小,对膜层的损伤小等一系列优点。
本发明的三银膜系以一款常规三银膜系(我司命名为SJ68S)颜色为蓝本,反复调节膜层厚度,使得钢化后颜色与该款三银接近,故本款可钢三银膜系可用于弯弧玻璃生产与常规三银配套使用。
通过反复实验确定的较稳定各膜层工艺气体比例,为保证膜层稳定性所设计的膜层结构,通过软件设计及工艺调试、实验确定的各膜层膜层厚度,特别是Ag层、NiCr层、AZO层厚度及相对比例。
经过测试,本发明的优点在于:1、6mm单片透过率可达70%,玻面外观颜色为浅绿色,清新自然,2、可钢三银钢化后正侧面颜色接近,△a*<0.5;3、本款膜系可做弯钢产品与一款普通三银(先钢再镀)配套使用,4、通过控制关键膜层厚度,降低生产成本,关键耗材:靶材消耗<2000元/小时。
以上所述仅为本发明的较佳实施例而已,并不用以限制本发明,凡在本发明的精神和原则之内所作的任何修改、等同替换和改进等,均应包含在本发明的保护范围之内。
Claims (9)
1.一种高透浅绿色可弯钢三银低辐射镀膜玻璃,其特征在于,包括玻璃基片层和镀膜层,所述镀膜层自所述玻璃基片层向外依次复合有十六个膜层,其中第一层为SiNx层(1),第二层为ZnO层(2),第三层Ag层(3),第四层为NiCr层(4),第五层为AZO层(5),第六层为SiNx层(6),第七层为ZnO层(7),第八层为Ag层(8),第九层为NiCr层(9),第十层为AZO层(10),第十一层为ZnSnO层(11),第十二层为ZnO层(12),第十三层为Ag层(13),第十四层为NiCr层(14),第十五层为AZO层(15),第十六层为SiNx层(16)。
2.根据权利要求1所述的一种高透浅绿色可弯钢三银低辐射镀膜玻璃,其特征在于:所述第一层和第二层构成第一电介质组合层,第三层作为低辐射功能层,第四层作为第一阻挡保护层,第五层作为晶床介质层,第六层和第七层作为第二电介质组合层,第八层作为低辐射功能层,第九层作为第二阻挡保护层,第十层作为晶床介质层,第十一层和第十二层作为第三电介质组合层,第十三层作为低辐射功能层,第十四层作为第三阻挡保护层,第十五层作为晶床介质层,第十六层作为第四电介质。
3.根据权利要求1所述的一种高透浅绿色可弯钢三银低辐射镀膜玻璃,其特征在于:所述第一层的厚度为10-20nm。
4.根据权利要求1所述的一种高透浅绿色可弯钢三银低辐射镀膜玻璃,其特征在于:所述第二层、第五层、第七层、第十层的厚度均为10-15nm。
5.根据权利要求1所述的一种高透浅绿色可弯钢三银低辐射镀膜玻璃,其特征在于:所述第三层的厚度为4-11nm。
6.根据权利要求1所述的一种高透浅绿色可弯钢三银低辐射镀膜玻璃,其特征在于:所述第四层和第九层的厚度均为0.5-1nm。
7.根据权利要求1所述的一种高透浅绿色可弯钢三银低辐射镀膜玻璃,其特征在于:所述第六层的厚度为35-45nm,所述第八层的厚度为5-10nm,所述第十一层的厚度为30-40nm,所述第十二层的厚度为35-40nm,所述第十三层的厚度为7-12nm,所述第十四层的厚度为3-6nm,所述第十五层的厚度为15-20nm,所述第十六层的厚度为25-35nm。
8.根据权利要求1所述的一种高透浅绿色可弯钢三银低辐射镀膜玻璃,其特征在于:所述镀膜层的总厚度为250-270nm。
9.一种高透浅绿色可弯钢三银低辐射镀膜玻璃的制备方法,其特征在于:将经清洗后新鲜浮法原片引入真空镀膜腔室,腔室本底漏率需小于1×10-8mbar*L/S,根据不同膜层需求在事先配置好的靶位中通入反应气体与工作气体,通入气体后腔体真空度在2*10-3-5*10-3mbar,玻璃运行在靶位下方的过程中需在靶材上施加高电压,通过磁控溅射原理在等离子体氛围中成膜。
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