CN110282882A - 一种低辐射阳光控制镀膜玻璃及其制备方法 - Google Patents
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Abstract
本发明提供了一种低辐射阳光控制镀膜玻璃及制备方法,属于磁控溅射镀膜技术领域;本发明中,通过对镀膜玻璃镀膜层的优化设计,使本产品不仅对于可见光有适当的透射率,对红外线有较高的反射率,对紫外线有较高吸收率,具有低辐射性能,同时提高产品的耐氧化能力;一种低辐射阳光控制镀膜玻璃,包括玻璃基片层和镀膜层,所述镀膜层自所述玻璃基片层向外依次复合有五个膜层,其中第一层和第二层为第一电介质组合层,第三层为低辐射功能层,第四层和第五层为第二电介质组合层。本发明玻璃具有透射率适当、不会氧化,可单片使用等优点。
Description
技术领域
本发明属于磁控溅射镀膜技术领域,具体涉及一种低辐射阳光控制镀膜玻璃及其制备方法。
背景技术
作为节能建筑材料,low-E玻璃的节能特性与普通玻璃及热反射镀膜玻璃相比,Low-E玻璃对远红外辐射具有极高的反射率。可保持室内温度稳定,减少建筑加热或制冷的能耗,起到了非常优秀的节能降耗作用。夏季白天和光照强度较大的地区,阳光控制镀膜玻璃的隔热作用明显,能部分降低进入室内的太阳直接辐射。但是在寒冷地区,需要阳光进入室内采暖,阳光控制镀膜玻璃就不适用了,北方寒冷地区则只能用性能更优的Low-E低辐射玻璃。而具有低辐射功能的阳光控制镀膜玻璃在具有良好的遮阳效果的情况下,还能有效阻挡热量对流,具有保温隔热效果,适合东南亚和非洲高日照条件的遮阳需求,市场前景比普通热反射更加广阔。
发明内容
本发明的目的是针对现有的技术存在的上述问题,提供一种低辐射阳光控制镀膜玻璃及其制备方法,本发明所要解决的技术问题是如何通过镀膜层的设计,使本产品不仅对于可见光有适当的透射率,对红外线有较高的反射率,对紫外线有较高吸收率,具有低辐射性能。
本发明的目的可通过下列技术方案来实现:一种低辐射阳光控制镀膜玻璃,其特征在于,本镀膜玻璃包括玻璃基片层和镀膜层,所述镀膜层自所述玻璃基片层向外依次复合有五个膜层,其中第一层和第二层为第一电介质组合层,第三层为低辐射功能层,第四层和第五层为第二电介质组合层。
一种低辐射阳光控制镀膜玻璃,其特征在于,所述第一层为SiNx层,所述第二层为NiCr层,所述第三层NB层,所述第四层为NiCr层,所述第五层为SiNx层。
由于本专利技术膜层透过率较低,使用普通白玻原片生产时产品室外观察呈灰色。
一种低辐射阳光控制镀膜玻璃的制备方法,其特征在于,本方法包括如下步骤:
1)、磁控溅射镀膜层;
A、磁控溅射第一层:
靶材数量:交流旋转靶3~4个;靶材配置为硅铝(SiAl);工艺气体比例:氩气和氮气,氩气和氮气的比例为1:1.14,溅射气压为3~5×10-3mbar;镀膜厚度为20~100nm;
B、磁控溅射第二层:
靶材数量:交流旋转靶1个;靶材配置为镍铬(NiCr);工艺气体比例:纯氩气,溅射气压为2~3×10-3mbar;镀膜厚度为1~5nm;
C、磁控溅射第三层:
靶材数量:交流旋转靶1个;靶材配置为铌(Nb);工艺气体比例:纯氩气,溅射气压为2~3×10-3mbar;镀膜厚度为5~20nm;
D、磁控溅射第四层:
靶材数量:交流旋转靶1个;靶材配置为镍铬(NiCr);工艺气体比例:纯氩气,溅射气压为2~3×10-3mbar;镀膜厚度为1~5nm;
E、磁控溅射第五层:
靶材数量:交流旋转靶4~6个;靶材配置为硅铝(SiAl);工艺气体比例:氩气和氮气,氩气和氮气的比例为1:1.14,溅射气压为3~5×10-3mbar;镀膜厚度为20~100nm;
2)、镀膜层总厚度控制在47-230nm之间,溅射室传动走速控制在4.0-5.0m/min。
本发明优点:
1、本专利技术产品6mm单片透过率10-30%,辐射率为0.2。
2、本专利技术产品外观颜色广泛可是灰色、蓝色、绿色。
3、本专利技术产品生产成本低,且不会氧化,可单片使用。
4,、本专利技术产品具有低辐射性能,且遮阳性能优越(Sc=0.28)。
附图说明
图1是本低辐射阳光控制镀膜玻璃层状结构示意图。
图中,G、玻璃基片层;1、第一层;2、第二层;3、第三层;4、第四层;5、第五层。
具体实施方式
以下是本发明的具体实施例并结合附图,对本发明的技术方案作进一步的描述,但本发明并不限于这些实施例。
如图1所示,本低辐射阳光控制镀膜玻璃,包括玻璃基片层G和镀膜层,所述镀膜层自所述玻璃基片层G向外依次复合有五个膜层,其中第一层1和第二层2为第一电介质组合层,第三层3为低辐射功能层,第四层4和第五层5为第二电介质组合层。
一种低辐射阳光控制镀膜玻璃,其特征在于,所述第一层1为SiNx层,所述第二层2为NiCr层,所述第三层3NB层,所述第四层4为NiCr层,所述第五层5为SiNx层。
由于本专利技术膜层透过率较低,使用普通白玻原片生产时产品室外观察呈灰色。
一种低辐射阳光控制镀膜玻璃的制备方法,其特征在于,本方法包括如下步骤:
1)、磁控溅射镀膜层;
A、磁控溅射第一层1:
靶材数量:交流旋转靶3~4个;靶材配置为硅铝(SiAl);工艺气体比例:氩气和氮气,氩气和氮气的比例为1:1.14,溅射气压为3~5×10-3mbar;镀膜厚度为20~100nm;
B、磁控溅射第二层2:
靶材数量:交流旋转靶1个;靶材配置为镍铬(NiCr);工艺气体比例:纯氩气,溅射气压为2~3×10-3mbar;镀膜厚度为1~5nm;
C、磁控溅射第三层3:
靶材数量:交流旋转靶1个;靶材配置为铌(Nb);工艺气体比例:纯氩气,溅射气压为2~3×10-3mbar;镀膜厚度为5~20nm;
D、磁控溅射第四层4:
靶材数量:交流旋转靶1个;靶材配置为镍铬(NiCr);工艺气体比例:纯氩气,溅射气压为2~3×10-3mbar;镀膜厚度为1~5nm;
E、磁控溅射第五层5:
靶材数量:交流旋转靶4~6个;靶材配置为硅铝(SiAl);工艺气体比例:氩气和氮气,氩气和氮气的比例为1:1.14,溅射气压为3~5×10-3mbar;镀膜厚度为20~100nm;
2)、镀膜层总厚度控制在47-230nm之间,溅射室传动走速控制在4.0-5.0m/min。
本文中所描述的具体实施例仅仅是对本发明精神作举例说明。本发明所属技术领域的技术人员可以对所描述的具体实施例做各种各样的修改或补充或采用类似的方式替代,但并不会偏离本发明的精神或者超越所附权利要求书所定义的范围。
Claims (1)
1.一种低辐射阳光控制镀膜玻璃,其特征在于,本镀膜玻璃包括玻璃基片层(G)和镀膜层,所述镀膜层自所述玻璃基片层(G)向外依次复合有五个膜层,其中第一层(1)和第二层(2)为第一电介质组合层,第三层(3)为低辐射功能层,第四层(4)和第五层(5)为第二电介质组合层。
一种低辐射阳光控制镀膜玻璃,其特征在于,所述第一层(1)为SiNx层,所述第二层(2)为NiCr层,所述第三层(3)NB层,所述第四层(4)为NiCr层,所述第五层(5)为SiNx层。
一种低辐射阳光控制镀膜玻璃的制备方法,其特征在于,本方法包括如下步骤:
1)、磁控溅射镀膜层;
A、磁控溅射第一层(1):
靶材数量:交流旋转靶3~4个;靶材配置为硅铝(SiAl);工艺气体比例:氩气和氮气,氩气和氮气的比例为1:1.14,溅射气压为3~5×10-3mbar;镀膜厚度为20~100nm;
B、磁控溅射第二层(2):
靶材数量:交流旋转靶1个;靶材配置为镍铬(NiCr);工艺气体比例:纯氩气,溅射气压为2~3×10-3mbar;镀膜厚度为1~5nm;
C、磁控溅射第三层(3):
靶材数量:交流旋转靶1个;靶材配置为铌(Nb);工艺气体比例:纯氩气,溅射气压为2~3×10-3mbar;镀膜厚度为5~20nm;
D、磁控溅射第四层(4):
靶材数量:交流旋转靶1个;靶材配置为镍铬(NiCr);工艺气体比例:纯氩气,溅射气压为2~3×10-3mbar;镀膜厚度为1~5nm;
E、磁控溅射第五层(5):
靶材数量:交流旋转靶4~6个;靶材配置为硅铝(SiAl);
工艺气体比例:氩气和氮气,氩气和氮气的比例为1:1.14,溅射气压为3~5×10-3mbar;镀膜厚度为20~100nm;
镀膜层总厚度控制在47-230nm之间,溅射室传动走速控制在4.0-5.0m/min。
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CN114956598A (zh) * | 2022-05-17 | 2022-08-30 | 湖南旗滨节能玻璃有限公司 | 一种红外屏蔽热反射玻璃及其制备方法 |
CN115073019A (zh) * | 2022-07-11 | 2022-09-20 | 咸宁南玻节能玻璃有限公司 | 一种高反金色阳光控镀膜玻璃及其制备方法 |
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