CN106086970A - A kind of processing method of natural jade spar class bijouterie - Google Patents

A kind of processing method of natural jade spar class bijouterie Download PDF

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Publication number
CN106086970A
CN106086970A CN201610432042.1A CN201610432042A CN106086970A CN 106086970 A CN106086970 A CN 106086970A CN 201610432042 A CN201610432042 A CN 201610432042A CN 106086970 A CN106086970 A CN 106086970A
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China
Prior art keywords
gem
processing method
layer
micron
spar
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CN201610432042.1A
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Chinese (zh)
Inventor
钟福龙
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Individual
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Priority to CN201610432042.1A priority Critical patent/CN106086970A/en
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    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/54—Electroplating of non-metallic surfaces
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/083—Oxides of refractory metals or yttrium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/18—Metallic material, boron or silicon on other inorganic substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/46—Sputtering by ion beam produced by an external ion source
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Electrochemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electroplating Methods And Accessories (AREA)

Abstract

A kind of processing method of natural jade spar class bijouterie, the combination that manufacture field is solution gem and metal level belonging to gem is excessively poor, easily fade, and skin allergy, yield rate is low, the problem that cost is the highest, the present invention provides a kind of processing cost low, the method of working gemstones that natural jade spar gem is good with gold noble metal combination degree, the method of processing is that first to carry out PVD sputtering one layer of adhesion of plating before electrochemical plating strong and possess the metallic diaphragm of electric conductivity, its gemstone surface is made to possess very thin layer of metal layer, the existence of this metal level, gem is not only made to possess electric conductivity, carrying out electrochemical plating again makes its surface more 3D effect glossiness the strongest, and the problem thoroughly having solved the combination degree of gem and electrochemical plating metal layer.

Description

A kind of processing method of natural jade spar class bijouterie
Technical field
The invention belongs to the processing method designing a kind of gem, belong to the manufacture field of gem.
Background technology
The processing on the surface of gem is extremely important, and its effect and degree being worth and processing has the biggest relation, adds Work is good, is worth height, processes bad, it could even be possible to reduce the value of beautiful spar, it may be said that the success or not of processing determines jade The value of spar gem；Traditional beautiful spar gem outer surface processing method has: 1. directly gild toward beautiful spar gemstone surface edge Paillon foil, is a little simple to operate, and shortcoming is to need to make to stick with glue, and easily falls, and cost is high；2. the heavy plating of chemistry or spray silver-bearing copper Oil, then electrochemical plating processes: elder generation is in jade surface chemically layer of metal, or spray silver-bearing copper oil carries out electrochemical plating again, but It is that these techniques are excessively poor in the combination of gem and metal level, easily fades, and skin allergy, yield rate is low, and cost height is the highest.
Summary of the invention
For solving problem mentioned above, the present invention provides a kind of processing cost low, and natural jade spar gem is expensive with gold The method of working gemstones that metal combination degree is good, the method for processing is first to carry out PVD sputtering one layer of knot of plating before electrochemical plating Make a concerted effort metallic diaphragm that is strong and that possess electric conductivity so that it is gemstone surface possesses very thin layer of metal layer, the existence of this metal level, Not only make gem possess electric conductivity, then carry out electrochemical plating and make its surface more 3D effect glossiness very strong, and thoroughly The problem having solved the combination degree of gem and electrochemical plating metal layer.
Technical scheme is as follows:
The processing method of a kind of natural jade spar gem, described method comprises the steps:
1.1 surface blots removing gem, such as oil stain, can clean with ultrasonic washing unit, or detergent cleans；
The gem having removed spot is entered in PVD ion sputtering film coating instrument and to carry out sputter coating under vacuum conditions by 1.2.Electricity Stream 40-50A, voltage 100V, the time is 7-10Min, carries out PVD plasma sputter plated film: under vacuum, natural jade spar table Face first sputters the white titanium plating 0.01-0.02 micron, and plating thickness the most again is 0.01-0.02 micron nickel or environmental protection nickel, first plates The reason of upper titanium is to strengthen natural jade spar and nickel or the adhesion of environmental protection nickel, then the reason of plated with nickel or environmental protection nickel is to make Obtain gemstone surface and possess electric conductivity；In this step, (1～100 receive to allow metal material (titanium, nickel and environmental protection nickel) be ionized into nanoscale Rice) granule makes it be direct splashing to gemstone surface, makes it more wear-resisting, and adhesion is strong, and has electric conductivity, in order under carrying out The electrochemical treatments of one step；
1.3 electrochemical treatments platings: the gem processed through step 1.2, easily generate a kind of very thin in atmosphere after taking out Oxide-film, activator is mainly diluted acid, and (mass fraction is the dilute sulfuric acid of 10%-30% or dilute salt that mass fraction is 10%-18% Acid), effect is the oxide layer removing surface, then carries out electrochemical plating, plates environmental protection nickel or nickel, thickness 0.8-in gemstone surface 1.2 microns so that gem more possesses 3D effect, the thickness of electrochemical plating is greater than in step 1.2 thickness of the nickel of sputtering Degree；
1.4 PVD vacuum sputter ion coating films: on the basis of gemstone surface possesses conduction, gloss, beautifulr spar is plated The high abrasion light titanium nitride film of 0.01-0.02 micron, voltage 150V, electric current 50-60A, the time is 12-15min so that it is tool There is brightness effect, sputter high abrasion resistance metallic film layer on the surface of gem.
1.5 have plated after titanium nitride metal film layer and just can sputter precious metal metallic diaphragm on gem in the past, as gold, silver, Palladium, platinum, rhodium or karat gold etc..
Further, the method for the removing spot in step 1.1 includes: carry out ultrasonic waves for cleaning (frequently when 60-70 DEG C Rate: 20 ~ 90KHz) machine cleans oil removing.
Further, the method for the removing spot in step 1.1 includes: (such as wash clean when 60-70 DEG C at cleanout fluid Essence) in carry out electrochemical deoiling.
Further, described gem is the natural stone such as Aeschna melanictera, white jade, black jade, obsidian or crystal
Further, described noble metal is gold, silver, palladium, platinum, rhodium or karat gold.
The beneficial effects of the present invention is, the processing method of the offer of the present invention, low cost, brightness is high, and third dimension is more By force, can increase the surcharge of gem, compare with traditional technique, more wear-resisting, conjugation is higher, and gem can arbitrarily be arranged in pairs or groups respectively Plant metal.
Detailed description of the invention
Below in conjunction with specific embodiment, this case is further detailed.
Embodiment 1
The processing method of a kind of Aeschna melanictera, described method comprises the steps:
1.1 surface blots removing Aeschna melanictera, carry out when 60-70 DEG C cleaning in ultrasonic waves for cleaning (frequency: 20 ~ 90KHz) machine removing Oil；
The Aeschna melanictera removing spot is put into ion sputtering film coating instrument, electric current 40-50A, voltage 100V by 1.2, and the time is 8Min, enters Row PVD plasma sputter plated film: under vacuum, Aeschna melanictera surface first sputters the white titanium plating 0.01 micron, plates thickness the most again Degree is 0.02 micron of nickel；
1.3 electrochemical treatments platings: the Aeschna melanictera processed through step 1.2, are placed in the dilute sulfuric acid that mass fraction is 10%-30%, live Change Aeschna melanictera surface, then carry out electrochemical plating, at Aeschna melanictera surface plated with nickel, thickness 0.9 microns so that Aeschna melanictera more possesses 3D Effect；
1.4 PVD vacuum sputter ion coating films: on the basis of Aeschna melanictera is conducted electricity, then Aeschna melanictera is plated the full light of 0.01 micron Bright titanium nitride so that surface there is gloss and 3D effect, voltage 150V, electric current 50-60A, the time is 12-15min so that it is tool There is brightness effect, on the splash-proofing sputtering metal top layer, surface of Aeschna melanictera；
1.5 have plated titanium nitride, finally sputter layer gold on Aeschna melanictera.
Embodiment 2
The processing method of a kind of crystal, described method comprises the steps:
1.1 surface blots removing crystal, carry out when 60-70 DEG C cleaning in ultrasonic waves for cleaning (frequency: 20 ~ 90KHz) machine removing Oil；
The crystal removing spot is put into ion sputtering film coating instrument, electric current 40-50A, voltage 100V by 1.2, and the time is 8Min, enters Row PVD plasma sputter plated film: under vacuum, crystal surface first sputters the white titanium plating 0.02 micron, plates thickness the most again Degree is 0.01 micron of environmental protection nickel；
1.3 electrochemical treatments platings: the crystal processed through step 1.2, are placed in the dilute hydrochloric acid that mass fraction is 10%-18%, live Change crystal surface, then carry out electrochemical plating, plate environmental protection nickel, thickness 1.2 microns so that crystal more has at crystal surface Standby 3D effect；
1.4 PVD vacuum sputter ion coating films: on the basis of crystal is conducted electricity, then crystal is plated the full light of 0.02 micron Bright titanium nitride so that surface there is gloss and 3D effect, voltage 150V, electric current 50-60A, the time is 12-15min so that it is tool There is brightness effect, finally sputter karat gold on the surface of crystal.

Claims (7)

1. the processing method of a natural jade spar class bijouterie, it is characterised in that described method comprises the steps:
1.1 surface blots removing gem；
1.2 PVD vacuum sputter ion coating films: using vacuum ion sputtering method, first, plating thickness in gemstone surface sputtering is The titanium layer of 0.01-0.02 micron；Next, then on the plated surface of described titanium layer, thickness is the nickel dam of 0.01-0.02 micron, makes Obtain gem and possess electric conductivity；
1.3 electrochemical treatments platings: the gem after nickel coating in step 2 is put in acid solution, removes the oxide-film on surface, Use electrochemical method to plate on gem again nickel dam that thickness is 0.8-1.2 micron so that gem possesses 3D effect；
1.4 PVD vacuum sputter ion coating films: conducted electricity by gem, use vacuum ion sputtering method, at gemstone surface plating thickness are 0.05 1 0.1 microns of high abrasion high-bond titanium nitride films.
2. processing method as claimed in claim 1, it is characterised in that after step 1.4 completes, at described full light titanium nitride layer One layer of precious metal of upper sputtering.
3. processing method as claimed in claim 2, it is characterised in that described precious metal is gold, silver, palladium, platinum, rhodium or K Gold.
4. processing method as claimed in claim 1, it is characterised in that described gem is Aeschna melanictera, white jade, black jade, obsidian Or crystal.
5. processing method as claimed in claim 1, it is characterised in that the method for the removing spot in step 1.1 includes: Carry out ultrasonic washing unit cleans oil removing when 60-70 DEG C.
6. processing method as claimed in claim 1, it is characterised in that the method for the removing spot in step 1.1 includes: In cleanout fluid, electrochemical deoiling is carried out when 60-70 DEG C.
7. processing method as claimed in claim 1, it is characterised in that in step 1.3 acid solution be mass fraction be 10%- The dilute sulfuric acid of 30% or mass fraction are the dilute hydrochloric acid of 10%-18%.
CN201610432042.1A 2016-06-17 2016-06-17 A kind of processing method of natural jade spar class bijouterie Pending CN106086970A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115503383A (en) * 2022-09-29 2022-12-23 黄向文 Article with wire inlay graph-text structure on outer surface and processing method thereof

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1572541A (en) * 2003-05-23 2005-02-02 施华洛世奇公司 Method for manufacturing ornament
CN1958861A (en) * 2005-11-06 2007-05-09 陈大植 Method for fabricating artificial headdress
CN102051646A (en) * 2009-11-06 2011-05-11 张富贵 Gold-jade process of gold and solver painting
WO2011064092A1 (en) * 2009-11-25 2011-06-03 Dress Your Body Ag Invisible crimp decoration part
CN103757673A (en) * 2013-11-25 2014-04-30 于洪洲 Making method of wearing ornaments
CN104789963A (en) * 2015-03-13 2015-07-22 武汉钢铁(集团)公司 Production method of composite plated tie for packaging gold and silver jewelries
CN105370003A (en) * 2014-08-29 2016-03-02 无锡慧明电子科技有限公司 Vacuum ion silver plating metal decoration plate
CN105483703A (en) * 2015-11-30 2016-04-13 苏州市金星工艺镀饰有限公司 Manufacturing method of embedded type gold and silver double-color pattern crystal standing table
CN105480000A (en) * 2015-11-30 2016-04-13 苏州市金星工艺镀饰有限公司 Manufacturing method of gold and silver double-color pattern crystal standing table

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1572541A (en) * 2003-05-23 2005-02-02 施华洛世奇公司 Method for manufacturing ornament
CN1958861A (en) * 2005-11-06 2007-05-09 陈大植 Method for fabricating artificial headdress
CN102051646A (en) * 2009-11-06 2011-05-11 张富贵 Gold-jade process of gold and solver painting
WO2011064092A1 (en) * 2009-11-25 2011-06-03 Dress Your Body Ag Invisible crimp decoration part
CN102665478A (en) * 2009-11-25 2012-09-12 为你装扮股份公司 Invisible crimp decoration part
CN103757673A (en) * 2013-11-25 2014-04-30 于洪洲 Making method of wearing ornaments
CN105370003A (en) * 2014-08-29 2016-03-02 无锡慧明电子科技有限公司 Vacuum ion silver plating metal decoration plate
CN104789963A (en) * 2015-03-13 2015-07-22 武汉钢铁(集团)公司 Production method of composite plated tie for packaging gold and silver jewelries
CN105483703A (en) * 2015-11-30 2016-04-13 苏州市金星工艺镀饰有限公司 Manufacturing method of embedded type gold and silver double-color pattern crystal standing table
CN105480000A (en) * 2015-11-30 2016-04-13 苏州市金星工艺镀饰有限公司 Manufacturing method of gold and silver double-color pattern crystal standing table

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115503383A (en) * 2022-09-29 2022-12-23 黄向文 Article with wire inlay graph-text structure on outer surface and processing method thereof

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