CN105884816B - 制备含脲硅烷的方法 - Google Patents
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- 238000000034 method Methods 0.000 title claims abstract description 43
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 title claims abstract description 32
- 229910000077 silane Inorganic materials 0.000 title claims abstract description 32
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 title claims abstract description 28
- 239000004202 carbamide Substances 0.000 title claims abstract description 28
- 150000004985 diamines Chemical class 0.000 claims abstract description 18
- BUZRAOJSFRKWPD-UHFFFAOYSA-N isocyanatosilane Chemical class [SiH3]N=C=O BUZRAOJSFRKWPD-UHFFFAOYSA-N 0.000 claims abstract description 15
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 15
- 239000000047 product Substances 0.000 claims description 14
- 239000003960 organic solvent Substances 0.000 claims description 9
- 238000006243 chemical reaction Methods 0.000 claims description 8
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 6
- 239000003513 alkali Substances 0.000 claims description 6
- 239000012433 hydrogen halide Substances 0.000 claims description 5
- 229910000039 hydrogen halide Inorganic materials 0.000 claims description 5
- 150000003839 salts Chemical class 0.000 claims description 5
- 125000001931 aliphatic group Chemical group 0.000 claims description 4
- 125000003118 aryl group Chemical group 0.000 claims description 3
- 125000000027 (C1-C10) alkoxy group Chemical group 0.000 claims description 2
- 125000006736 (C6-C20) aryl group Chemical group 0.000 claims description 2
- -1 C1- C10 alkyl Chemical group 0.000 claims description 2
- 125000003358 C2-C20 alkenyl group Chemical group 0.000 claims description 2
- 150000001412 amines Chemical class 0.000 claims description 2
- 239000007795 chemical reaction product Substances 0.000 claims description 2
- 125000000000 cycloalkoxy group Chemical group 0.000 claims description 2
- 229910052736 halogen Inorganic materials 0.000 claims description 2
- 150000002367 halogens Chemical class 0.000 claims description 2
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 claims description 2
- 238000005406 washing Methods 0.000 claims description 2
- 125000000923 (C1-C30) alkyl group Chemical group 0.000 claims 1
- NOHQTLHHNIKWBA-UHFFFAOYSA-N [SiH4].NC(=O)N Chemical compound [SiH4].NC(=O)N NOHQTLHHNIKWBA-UHFFFAOYSA-N 0.000 claims 1
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 17
- IAZDPXIOMUYVGZ-WFGJKAKNSA-N DMSO-d6 Substances [2H]C([2H])([2H])S(=O)C([2H])([2H])[2H] IAZDPXIOMUYVGZ-WFGJKAKNSA-N 0.000 description 10
- 229910052799 carbon Inorganic materials 0.000 description 10
- YMWUJEATGCHHMB-UHFFFAOYSA-N methylene chloride Substances ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 10
- HEDRZPFGACZZDS-MICDWDOJSA-N deuterated chloroform Substances [2H]C(Cl)(Cl)Cl HEDRZPFGACZZDS-MICDWDOJSA-N 0.000 description 9
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 8
- 239000000203 mixture Substances 0.000 description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 7
- 239000002904 solvent Substances 0.000 description 7
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 5
- 150000001875 compounds Chemical class 0.000 description 5
- 239000008234 soft water Substances 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 238000005481 NMR spectroscopy Methods 0.000 description 4
- 238000001035 drying Methods 0.000 description 4
- 229920001971 elastomer Polymers 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 4
- FIQMHBFVRAXMOP-UHFFFAOYSA-N triphenylphosphane oxide Chemical compound C=1C=CC=CC=1P(C=1C=CC=CC=1)(=O)C1=CC=CC=C1 FIQMHBFVRAXMOP-UHFFFAOYSA-N 0.000 description 4
- YUFRRMZSSPQMOS-UHFFFAOYSA-N 2-(2-aminoethyldisulfanyl)ethanamine;hydron;dichloride Chemical compound Cl.Cl.NCCSSCCN YUFRRMZSSPQMOS-UHFFFAOYSA-N 0.000 description 3
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 3
- 238000005133 29Si NMR spectroscopy Methods 0.000 description 3
- 239000006227 byproduct Substances 0.000 description 3
- 150000001721 carbon Chemical group 0.000 description 3
- 230000006837 decompression Effects 0.000 description 3
- 239000012065 filter cake Substances 0.000 description 3
- GRVDJDISBSALJP-UHFFFAOYSA-N methyloxidanyl Chemical compound [O]C GRVDJDISBSALJP-UHFFFAOYSA-N 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 238000010926 purge Methods 0.000 description 3
- 238000010992 reflux Methods 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- 238000001644 13C nuclear magnetic resonance spectroscopy Methods 0.000 description 2
- 238000005160 1H NMR spectroscopy Methods 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- 241000907661 Pieris rapae Species 0.000 description 2
- 150000001335 aliphatic alkanes Chemical class 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- 229910052740 iodine Inorganic materials 0.000 description 2
- 239000012948 isocyanate Substances 0.000 description 2
- 150000002513 isocyanates Chemical class 0.000 description 2
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 2
- CSNNHWWHGAXBCP-UHFFFAOYSA-L magnesium sulphate Substances [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 239000003607 modifier Substances 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 239000012071 phase Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 239000000725 suspension Substances 0.000 description 2
- 125000000008 (C1-C10) alkyl group Chemical group 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- CYTYCFOTNPOANT-UHFFFAOYSA-N Perchloroethylene Chemical compound ClC(Cl)=C(Cl)Cl CYTYCFOTNPOANT-UHFFFAOYSA-N 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 239000012482 calibration solution Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- OOTFVKOQINZBBF-UHFFFAOYSA-N cystamine Chemical compound CCSSCCN OOTFVKOQINZBBF-UHFFFAOYSA-N 0.000 description 1
- 229940099500 cystamine Drugs 0.000 description 1
- 239000000806 elastomer Substances 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000012634 fragment Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 239000012074 organic phase Substances 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 230000001376 precipitating effect Effects 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000004611 spectroscopical analysis Methods 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 239000012815 thermoplastic material Substances 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 238000005303 weighing Methods 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/10—Compounds having one or more C—Si linkages containing nitrogen having a Si-N linkage
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
- C07F7/1804—Compounds having Si-O-C linkages
- C07F7/1872—Preparation; Treatments not provided for in C07F7/20
- C07F7/1892—Preparation; Treatments not provided for in C07F7/20 by reactions not provided for in C07F7/1876 - C07F7/1888
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
- C07F7/1804—Compounds having Si-O-C linkages
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C275/00—Derivatives of urea, i.e. compounds containing any of the groups, the nitrogen atoms not being part of nitro or nitroso groups
- C07C275/04—Derivatives of urea, i.e. compounds containing any of the groups, the nitrogen atoms not being part of nitro or nitroso groups having nitrogen atoms of urea groups bound to acyclic carbon atoms
- C07C275/06—Derivatives of urea, i.e. compounds containing any of the groups, the nitrogen atoms not being part of nitro or nitroso groups having nitrogen atoms of urea groups bound to acyclic carbon atoms of an acyclic and saturated carbon skeleton
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/0834—Compounds having one or more O-Si linkage
- C07F7/0892—Compounds with a Si-O-N linkage
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- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
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- C07F7/1872—Preparation; Treatments not provided for in C07F7/20
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- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/0803—Compounds with Si-C or Si-Si linkages
- C07F7/081—Compounds with Si-C or Si-Si linkages comprising at least one atom selected from the elements N, O, halogen, S, Se or Te
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Abstract
本发明涉及一种制备通式I的含脲硅烷的方法其中通式II的二胺与通式III的异氰酸基硅烷在水中反应:H2N‑R‑S‑S‑R‑NH2 (II)(R1)3Si‑R‑NCO (III)。
Description
技术领域
本发明涉及一种制备含脲硅烷的方法。
发明背景
CAS 1184961-62-3、442527-46-0和498553-03-0公开了下式的化合物:
另外,US 20030191270 A1公开了下式的硅烷:
JP 2002201312 A公开了下式的橡胶改性剂:
另外,J.Mat.Chem.2009,19,4746-4752公开由介孔二氧化硅形成的SH官能化的框架结构内的金纳米颗粒和含脲硅烷的制备。在已知方法中,使用的是有机溶剂。
已知制备方法的一个缺点在于,其是具有许多方法步骤和有机溶剂的复杂方法(在H2O中中和,萃取到CH2Cl2相中,用MgSO4干燥,去除溶剂,将溶剂交换为THF,在THF中反应,去除溶剂,在戊烷中沉淀/洗涤)。
发明内容
本发明的目的是提供一种方法,与源自现有技术的方法相比,其在不含有机溶剂的情况下有效,并且具有更少的方法步骤。
本发明提供一种制备通式I的含脲硅烷的方法,
其中R1相同或不同,并且是C1-C10烷氧基,优选地甲氧基或乙氧基、C2-C10环二烷氧基、苯氧基、C4-C10环烷氧基、C6-C20芳基,优选地苯基、C1-C10烷基,优选地甲基或乙基、C2-C20烯基、C7-C20芳烷基或卤素,优选地Cl;并且R相同或不同,并且是任选地经F-、Cl-、Br-、I-、-CN或HS-取代的支链或非支链、饱和或不饱和的脂肪族、芳香族或混合脂肪族/芳香族的二价C1-C30、优选地C1-C20、更优选地C1-C10、甚至更优选地C1-C7、尤其优选地C2和C3烃基,其特征在于,
使通式II的二胺与通式III的异氰酸基硅烷在水中反应:
H2N-R-S-S-R-NH2 (II)
(R1)3Si-R-NCO (III),
其中R和R1各自如上文所定义。
对于所述反应,任选地可以使用额外的有机溶剂。
反应可以在不含有机溶剂的情况下进行。
含脲硅烷可以是通式I的含脲硅烷的混合物。
过程产物可以包含通过使通式I的含脲硅烷的烷氧基硅烷官能团水解和缩合而形成的低聚物。
R可以优选地是-CH2-、-CH2CH2-、-CH2CH2CH2-、-CH2CH2CH2CH2-、-CH(CH3)-、-CH2CH(CH3)-、-CH(CH3)CH2-、-C(CH3)2-、-CH(C2H5)-、-CH2CH2CH(CH3)-、-CH(CH3)CH2CH2-、-CH2CH(CH3)CH2-、-CH2CH2CH2CH2CH2-、-CH2CH2CH2CH2CH2CH2-、-CH2CH2CH2CH2CH2CH2CH2-、-CH2CH2CH2CH2CH2CH2CH2CH2-、-CH2CH2CH2CH2CH2CH2CH2CH2CH2-、-CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2-、-CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2-、-CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2-、-CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2-、-CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2-或或-CH2-CH2-C6H4-CH2-。
通式I的含脲硅烷可以优选地是:
((EtO)3Si-CH2-NH-CO-NH-CH2-S)2、
((EtO)3Si-CH2CH2-NH-CO-NH-CH2-S)2、
((EtO)3Si-CH2-NH-CO-NH-CH2CH2-S)2、
((EtO)3Si-CH2CH2-NH-CO-NH-CH2CH2-S)2、
((EtO)3Si-CH2CH2CH2-NH-CO-NH-CH2-S)2、
((EtO)3Si-CH2CH2CH2-NH-CO-NH-CH2CH2-S)2、
((EtO)3Si-CH2-NH-CO-NH-CH2CH2CH2-S)2、
((EtO)3Si-CH2CH2-NH-CO-NH-CH2CH2CH2-S)2、
((EtO)3Si-CH2CH2CH2-NH-CO-NH-CH2CH2CH2-S)2、
((MeO)3Si-CH2-NH-CO-NH-CH2-S)2、
((MeO)3Si-CH2CH2-NH-CO-NH-CH2-S)2、
((MeO)3Si-CH2-NH-CO-NH-CH2CH2-S)2、
((MeO)3Si-CH2CH2-NH-CO-NH-CH2CH2-S)2、
((MeO)3Si-CH2CH2CH2-NH-CO-NH-CH2-S)2、
((MeO)3Si-CH2CH2CH2-NH-CO-NH-CH2CH2-S)2、
((MeO)3Si-CH2-NH-CO-NH-CH2CH2CH2-S)2、
((MeO)3Si-CH2CH2-NH-CO-NH-CH2CH2CH2-S)2或
((MeO)3Si-CH2CH2CH2-NH-CO-NH-CH2CH2CH2-S)2。
尤其优选的化合物具有下式:
((EtO)3Si-CH2CH2CH2-NH-CO-NH-CH2CH2-S)2。
通式II的二胺可以优选地是:
H2N-CH2-S-S-CH2-NH2、
H2N-CH2CH2-S-S-CH2-NH2、
H2N-CH2CH2-S-S-CH2CH2-NH2、
H2N-CH2-S-S-CH2CH2CH2-NH2、
H2N-CH2CH2-S-S-CH2CH2CH2-NH2或
H2N-CH2CH2CH2-S-S-CH2CH2CH2-NH2。
通式III的异氰酸基硅烷可以优选地是:
(C2H5O)3Si-CH2-NCO、
(C2H5O)3Si-CH2CH2-NCO、
(C2H5O)3Si-CH2CH2CH2-NCO、
(CH3O)3Si-CH2-NCO、
(CH3O)3Si-CH2CH2-NCO或
(CH3O)3Si-CH2CH2CH2-NCO。
可通过根据本发明的方法获得的通式I的含脲硅烷可以以大于50%、优选地大于60%、更优选地大于70%、极优选地大于80%的收率获得。
通过根据本发明的方法获得的产物在DMSO-d6或CDCl3中的可溶分数通过在DMSO-d6或CDCl3中添加内标物,例如添加三苯基氧化膦(TPPO)和本领域技术人员已知的1H NMR方法测定。
相对于所用通式II的二胺,水的量可以大于1重量%、优选大于10重量%、更优选大于50重量%并且最优选大于100重量%。
反应可以在排除空气的情况下进行。
反应可以在惰性气体氛围下进行,例如在氩气或氮气下、优选地在氮气下进行。
本发明的方法可以在大气压力、升高的压力或减压下进行。优选地,根据本发明的方法可以在标准压力下进行。
升高的压力可以是1.1巴到100巴、优选地1.5巴到50巴、更优选地2巴到20巴并且极优选地2到10巴的压力。
减压可以是1毫巴到1000毫巴、优选地1毫巴到500毫巴、更优选地1毫巴到250毫巴、极优选地5毫巴到100毫巴的压力。
根据本发明的方法可以在0℃与+100℃之间、优选地在5℃与60℃之间、更优选地在5℃与30℃之间进行。
对于本发明的方法,可以将通式II的二胺计量加入通式III的异氰酸基硅烷中。
对于本发明的方法,可以优选地将通式III的异氰酸基硅烷计量加入通式II的二胺中。
通式II的二胺在与通式III的异氰酸基硅烷反应之前,由以下通式IV的二胺的氢卤化物盐通过添加碱、优选地添加NaOH或KOH而制备:
Hal-+H3N-R-S-S-R-NH3 +Hal- (IV)
其中Hal是F、Cl、Br或I,优选地Cl。可以添加碱直到确立7与14之间的pH。
在根据本发明的方法中,通式II的二胺可以相对于通式III的异氰酸基硅烷以1:1.70到1:2.20、优选地1:1.75到1:2.10的摩尔比率、更优选地以1:1.80到1:2.00的比率使用。
通过根据本发明的方法制备的产物可以具有少于25摩尔%、优选地少于10摩尔%、更优选地少于5摩尔%、极优选地少于3摩尔%的通式II的二胺残余物含量。
通过根据本发明的方法制备的产物中通式II的二胺的相对摩尔百分比可在13CNMR中通过相对于通式I的含脲硅烷的Si-CH2-基团中的碳原子对通式II的二胺的-CH2-NH2基团中的碳原子求积分而测定。
对于式II的物质H2N-CH2-CH2-S-S-CH2-CH2-NH2,举例来说,将-CH2-NH2基团的碳原子的积分用于测定相对含量。
通过根据本发明的方法制备的产物可以具有少于10摩尔%、优选地少于5摩尔%、更优选地少于1摩尔%、极优选地少于0.1摩尔%的通式III的异氰酸基硅烷残余物含量。
通过根据本发明的方法制备的产物中的通式III的异氰酸基硅烷在>1摩尔%范围内的相对摩尔百分比可在13C NMR中通过相对于通式I的含脲硅烷的Si-CH2-基团中的碳原子对通式III的异氰酸基硅烷的-NCO基团中的碳原子求积分而测定。
对于式III的物质(EtO)3Si-CH2-CH2-CH2-NCO,举例来说,将-NCO基团的碳原子(δ=122.22ppm)的积分用于测定在>1摩尔%范围内的相对含量。
通过根据本发明的方法制备的产物中的通式III的异氰酸基硅烷在<1摩尔%范围内的相对摩尔百分比可通过本领域技术人员已知的定量FT-IR光谱术测定。所述方法通过使用适合浓度的校准溶液(例如在C2Cl4中)校准。为了测量,将约1g样品称重到25ml辊颈瓶中,并且添加25g C2Cl4。将样品在搅拌器上搅拌1-2小时。之后,将下部液相小心计量加入20mm IR比色皿中,并且通过FT-IR光谱法(4000-1200cm-1,分辨率2cm-1)进行分析。在相同条件下,记录溶剂的光谱以用于扣除。
对于式III的物质(EtO)3Si-CH2-CH2-CH2-NCO,举例来说,将-NCO基团在2270cm-1下的价键振动的波长用于测定在<1摩尔%范围内的相对含量。
通过根据本发明的方法制备的产物可以具有少于25摩尔%、优选地少于10摩尔%、更优选地少于5摩尔%、极优选地少于3摩尔%的通式IV的二胺的氢卤化物盐残余物含量。
通过根据本发明的方法制备的产物中的通式IV的二胺的氢卤化物盐的相对摩尔百分比可在13C NMR中通过相对于通式I的含脲硅烷的Si-CH2-基团中的碳原子对通式IV的二胺的氢卤化物盐的-CH2-NH2·HCl基团中的碳原子求积分而测定。
对于式IV的物质HCl·H2N-CH2-CH2-S-S-CH2-CH2-NH2·HCl,举例来说,将S-CH2-CH2-NH2·HCl基团的碳原子(δ=37.82ppm)或S-CH2-CH2-NH2·HCl基团的碳原子(δ=33.79ppm)的积分用于测定相对含量。
随后可以将反应产物过滤,并且用水和/或有机溶剂、优选地烷烃、更优选地戊烷、己烷或庚烷洗涤。优选的是用水洗涤,然后用烷烃、更优选地用己烷洗涤。
可以将产物在过滤之后干燥。干燥可以在20℃-100℃、优选地25℃-50℃的温度下实施。干燥可以在1-500毫巴的减压下实施。
在优选的实施方案中,制备其中R和R1各自如上文所定义的通式I的含脲硅烷的方法
可以特征在于,将通式IV的二胺的氢卤化物盐溶解于水中并且与碱反应,
Hal-+H3N-R-S-S-R-NH3 +Hal- (IV)
然后添加通式III的异氰酸基硅烷:
(R1)3Si-R-NCO (III)
将沉淀产物滤出,用水和己烷洗涤,并且干燥。
通式I的含脲硅烷可以用作以下物质之间的促粘剂:无机材料,例如玻璃珠、玻璃碎片、玻璃表面、玻璃纤维或氧化性填料、优选地二氧化硅,如沉淀法二氧化硅和热解法二氧化硅;和有机聚合物,例如热固性材料、热塑性材料或弹性体;或用作用于氧化性表面的交联剂和表面改性剂。
通式I的含脲硅烷可以用作填充橡胶混合物中的偶联剂,实例是轮胎胎面、工业橡胶制品或鞋类鞋底。
根据本发明的方法的优点在于,通式I的含脲硅烷能够在不含有机溶剂情况下的一个合成步骤中进行制备。
根据本发明的方法的另一个优点在于,反应可在相对短的周期内实施。
根据本发明的方法的另一个优点在于,所得产物的复杂纯化处理可以省略。
具体实施方式
实施例:
实施例1:[(EtO)3Si-(CH2)3-NH-C(=O)-NH-(CH2)2-S-]2在水中的制备(用己烷洗涤)
开始时以溶解于软水(940ml)中的胱胺二盐酸盐(108.39克,0.47摩尔,1.00当量)加料至N2吹扫的2l带夹套的四口烧瓶,所述烧瓶具有精密玻璃搅拌器、回流冷凝器、内部温度计和滴加漏斗。借助于滴加漏斗,在17-20℃下计量加入50%KOH溶液(92.31克,0.82摩尔,1.75当量),并且将混合物搅拌15分钟。然后将3-异氰酸基丙基三乙氧基硅烷(221.05克,0.85摩尔,1.8当量)计量加入,加入速度应使内部温度不超过30℃。之后,将混合物在23℃下搅拌一小时。将白色悬浮体在压力下过滤,用200ml软水冲洗,并且用干燥的N2干燥2小时。将滤饼用三份己烷(每份150ml)洗涤,并再次用干燥的N2干燥1小时。[(EtO)3Si-(CH2)3-NH-C(=O)-NH-(CH2)2-S-]2产物是白色细粉(254.78克,理论值的92.8%);
1H NMR(δppm,500MHz,CDCl3):0.64(4H,t),1.22(18H,t),1.61(4H,m),2.78(4H,m),3.15(4H,m),3.52(4H,m),3.81(12H,q),5.2-6.5(4H,br);
13C NMR(δppm,125MHz,CDCl3):7.7(2C),18.3(6C),23.8(2C),38.8(2C),38.9(2C),42.8(2C),58.3(6C),159.0(2C)。
29Si NMR(δppm,100MHz,CDCl3):-45.7(97.4%硅烷),-53.5(2.6%M结构);
使用TPPO内标物时在CDCl3中的可溶分数:94.4%;
水含量(DIN 51777): 0.4%;
初始熔点: 106-110℃;
残余异氰酸酯含量: 0.04%
实施例2:[(EtO)3Si-(CH2)3-NH-C(=O)-NH-(CH2)2-S-]2在水中的制备(无己烷洗涤)
开始时以溶解于软水(382ml)中的胱胺二盐酸盐(108.39克,0.47摩尔,1.00当量)加料至N2吹扫的1l带夹套的四口烧瓶,所述烧瓶具有精密玻璃搅拌器、回流冷凝器、内部温度计和滴加漏斗。借助于滴加漏斗,在15-23℃下计量加入50%KOH溶液(92.31克,0.82摩尔,1.75当量),并且将混合物搅拌30分钟。然后将3-异氰酸基丙基三乙氧基硅烷(221.05克,0.85摩尔,1.8当量)以使得内部温度不超过30℃的速率计量加入。之后,将混合物在24℃下搅拌一小时。将白色悬浮体在压力下过滤,用三份软水(总计340ml)冲洗,并用干燥的N2干燥2小时。将滤饼在旋转蒸发器中在N2流中在35℃和166毫巴下干燥7小时,在35℃和150毫巴下干燥10小时,并在35℃和100毫巴下干燥9小时。[(EtO)3Si-(CH2)3-NH-C(=O)-NH-(CH2)2-S-]2产物是白色细粉(246.38克,理论值的90.7%);
1H NMR(δppm,500MHz,DMSO-d6):0.52(4H,t),1.14(18H,t),1.42(4H,m),2.74(4H,m),2.96(4H,m),3.29(4H,m),3.74(12H,q),6.05(4H,m);
13C NMR(δppm,125MHz,DMSO-d6):7.3(2C),18.2(6C),23.5(2C),38.5(2C),39.6(2C),42.0(2C),57.7(6C)157.9(2C)。
29Si NMR(δppm,100MHz,DMSO-d6):-45.3(100%硅烷);
使用TPPO内标物、在d6-DMSO中的可溶分数:86.0%;
水含量(DIN 51777): 0.7%;
初始熔点: 97℃;
残余异氰酸酯含量: 0.08%
实施例3:(比较例)
有机二氯甲烷和THF溶剂中的[(EtO)3Si-(CH2)3-NH-C(=O)-NH-(CH2)2-S-]2的制备
开始时以溶解于二氯甲烷(100ml)中的胱胺二盐酸盐(22.52克,0.10摩尔,1.00当量)加料至干燥的N2吹扫的三口烧瓶,所述烧瓶具有搅拌器、回流冷凝器、内部温度计和滴加漏斗。借助于滴加漏斗,计量加入50%KOH溶液(11.5ml,0.20摩尔,2.00当量)。将所得悬浮体引入具有50ml软水的溶液中,另外添加6.5ml的50%KOH溶液,并将混合物搅拌2小时。分离两相,水相用二氯甲烷(3×50ml)萃取。将经合并的有机相经MgSO4干燥,过滤,并且在旋转蒸发器上去除溶剂。将所得浅黄色粘稠油(胱胺,12.07g)吸收(take up)至THF(100ml)中,将滴加漏斗用以计量加入3-异氰酸基丙基三乙氧基硅烷(49.47克,0.20摩尔,2.00当量),并且将混合物在23℃下搅拌过夜。在反应已经结束之后,在旋转蒸发器上去除溶剂。将所得白色固体吸收于新鲜THF(84ml)中,并通过在8℃下添加正戊烷(521ml)而沉淀。将悬浮体在压力下过滤,将滤饼用正戊烷(3×100ml)洗涤,并且用干燥的N2干燥。[(EtO)3Si-(CH2)3-NH-C(=O)-NH-(CH2)2-S-]2产物为白色细粉(50.42克,理论值的77.9%);
29Si NMR(δppm,100MHz,DMSO-d6):-40.5(91.2%硅烷),-48.2(8.9%M结构)。
Claims (10)
1.一种制备通式I的含脲硅烷的方法,
其中R1相同或不同,并且是C1-C10烷氧基、苯氧基、C4-C10环烷氧基、C6-C20芳基、C1-C10烷基、C2-C20烯基、C7-C20芳烷基或卤素;R相同或不同,并且是支链或非支链、饱和或不饱和的脂肪族、芳香族或混合脂肪族/芳香族的二价C1-C30烃基,其特征在于,
使通式II的二胺与通式III的异氰酸基硅烷在水中反应:
H2N-R-S-S-R-NH2 (II)
(R1)3Si-R-NCO (III),
并且,其中所述反应在不含有机溶剂的情况下进行。
2.根据权利要求1所述的制备通式I的含脲硅烷的方法,其特征在于所述通式I的含脲硅烷是:
((EtO)3Si-CH2-NH-CO-NH-CH2-S)2、
((EtO)3Si-CH2CH2-NH-CO-NH-CH2-S)2、
((EtO)3Si-CH2-NH-CO-NH-CH2CH2-S)2、
((EtO)3Si-CH2CH2-NH-CO-NH-CH2CH2-S)2、
((EtO)3Si-CH2CH2CH2-NH-CO-NH-CH2-S)2、
((EtO)3Si-CH2CH2CH2-NH-CO-NH-CH2CH2-S)2、
((EtO)3Si-CH2-NH-CO-NH-CH2CH2CH2-S)2、
((EtO)3Si-CH2CH2-NH-CO-NH-CH2CH2CH2-S)2或
((EtO)3Si-CH2CH2CH2-NH-CO-NH-CH2CH2CH2-S)2。
3.根据权利要求1所述的制备通式I的含脲硅烷的方法,其特征在于以所用通式II的二胺计,水的量大于1重量%。
4.根据权利要求1所述的制备通式I的含脲硅烷的方法,其特征在于温度在0℃与+100℃之间。
5.根据权利要求1所述的制备通式I的含脲硅烷的方法,其特征在于通式II的二胺在与通式III的异氰酸基硅烷反应之前由以下通式IV的二胺的氢卤化物盐通过添加碱而制备:
Hal-+H3N-R-S-S-R-NH3 +Hal- (IV)。
6.根据权利要求5所述的制备通式I的含脲硅烷的方法,其特征在于所用的碱是NaOH或KOH。
7.根据权利要求5或6所述的制备通式I的含脲硅烷的方法,其特征在于添加所述碱,直到pH值在7与14之间的范围内。
8.根据权利要求1所述的制备通式I的含脲硅烷的方法,其特征在于通式II的二胺相对于通式III的异氰酸基硅烷以1:1.80到1:2.25的摩尔比率使用。
9.根据权利要求1所述的制备通式I的含脲硅烷的方法,其特征在于随后将反应产物滤出,并且用水和/或有机溶剂洗涤。
10.根据权利要求9所述的制备通式I的含脲硅烷的方法,其特征在于将已经滤出的所述产物干燥。
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Publication number | Publication date |
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US20150329574A1 (en) | 2015-11-19 |
DE102014209215A1 (de) | 2015-11-19 |
CN105884816A (zh) | 2016-08-24 |
BR102015010658A8 (pt) | 2020-03-31 |
HUE035976T2 (hu) | 2018-06-28 |
EP2944642A1 (de) | 2015-11-18 |
RU2679800C2 (ru) | 2019-02-13 |
RU2015118036A3 (zh) | 2018-10-04 |
UA122115C2 (uk) | 2020-09-25 |
ES2628213T3 (es) | 2017-08-02 |
BR102015010658B1 (pt) | 2020-10-20 |
KR20150131987A (ko) | 2015-11-25 |
US9290523B2 (en) | 2016-03-22 |
JP2015218170A (ja) | 2015-12-07 |
PL2944642T3 (pl) | 2017-10-31 |
BR102015010658A2 (pt) | 2015-12-15 |
EP2944642B1 (de) | 2017-05-10 |
RU2015118036A (ru) | 2016-12-10 |
JP6530232B2 (ja) | 2019-06-12 |
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