CN105866192A - Anti-lightning power distribution cabinet based on CO gas detection function - Google Patents

Anti-lightning power distribution cabinet based on CO gas detection function Download PDF

Info

Publication number
CN105866192A
CN105866192A CN201610427453.1A CN201610427453A CN105866192A CN 105866192 A CN105866192 A CN 105866192A CN 201610427453 A CN201610427453 A CN 201610427453A CN 105866192 A CN105866192 A CN 105866192A
Authority
CN
China
Prior art keywords
film
sno
silicon chip
gas
nano
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201610427453.1A
Other languages
Chinese (zh)
Inventor
杨林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to CN201610427453.1A priority Critical patent/CN105866192A/en
Publication of CN105866192A publication Critical patent/CN105866192A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N27/00Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
    • G01N27/02Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance
    • G01N27/04Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance
    • G01N27/12Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance of a solid body in dependence upon absorption of a fluid; of a solid body in dependence upon reaction with a fluid, for detecting components in the fluid
    • G01N27/125Composition of the body, e.g. the composition of its sensitive layer
    • G01N27/127Composition of the body, e.g. the composition of its sensitive layer comprising nanoparticles

Abstract

The invention relates to an anti-lightning power distribution cabinet based on a CO gas detection function. The anti-lightning power distribution cabinet is provided with a CO gas sensor, the CO gas sensor comprises a Si substrate, a silicon oxide thin film formed on the Si substrate, a W film placed on the silicon oxide thin film, a WO3 nanowire thin film formed on the W film, a SnO2 nano thin film covering the WO3 nanowire thin film, two Pt electrodes manufactured on the SnO2 nano thin film, and a heating module located on the Si substrate. The anti-lightning power distribution cabinet is high in CO gas sensitivity, short in response time and good in repeatability and stability.

Description

A kind of lightning protection power distribution cabinet based on CO gas detection function
Technical field
The application relates to lightning protection power distribution cabinet field, particularly relates to a kind of based on CO gas detection function Lightning protection power distribution cabinet.
Background technology
Power distribution cabinet is exactly for carrying out electric energy distribution, controlling, measure and connect in power supply system The controller switching equipment of cable, generally steel construction, square, land placement, in it, lay various electric power mould Block, and connected by wiring.
Owing in lightning protection power distribution cabinet, place apparatus relates to the safety of electricity consumption and unimpeded, accordingly, it would be desirable to protect Demonstrate,prove its uninterrupted normal work, but, owing to placing the impact of environment, it inevitably contacts Dangerous gas, such as CO etc., but, general lightning protection power distribution cabinet does not possess the detection energy of this kind of gas Power, in the case of gas leakage, it is impossible to ensure normal work and personal security.
Summary of the invention
For overcoming problem present in correlation technique, the application provides a kind of and detects merit based on CO gas The lightning protection power distribution cabinet of energy.
The present invention is achieved through the following technical solutions: a kind of lightning protection based on CO gas detection function is joined Electricity cabinet, this lightning protection power distribution cabinet is provided with CO gas sensor;Described CO gas sensor includes Si Substrate, the W being formed at the suprabasil silicon oxide film of described Si, being placed on described silicon oxide film Film, the WO being formed on W film3Nano wire film, it is overlying on WO3SnO on nano wire film2 Nano thin-film, at SnO2On nano thin-film make two Pt electrodes and be positioned at below described Si substrate Heating module;Described WO3Nanowire length is 1000~7000nm.
Preferably, the preparation method of CO gas sensor comprises the steps:
Step one, preparation Si substrate:
Take the silicon chip of certain size (5cm × 5cm), sequentially pass through acetone, ethanol, deionized water Ultrasonic cleaning, ultrasonic time is 30min, is then putting in oxidation furnace by silicon chip, at 1100 DEG C Thermal oxide, obtains the silicon oxide film of a layer thickness about 600nm at silicon chip surface;
Step 2, prepares WO3Nano wire film:
Silicon chip through step one thermal oxide is put in magnetic control sputtering device, is evacuated to 2.0 × 10-3Hereinafter, Then utilize magnetron sputtering technique, plate one layer of W film at silicon oxide surface, using as WO3Nano wire Growth source, magnetron sputtering power be the thickness of 300W, W film be 300nm, size is 3cm × 3 cm;
Then silicon chip is put in tube furnace, at ambient pressure, be passed through the Ar gas of 20sccm, the most steady Determining 1h, discharge the air in tube furnace, following heated Tube-furnace is with the ramp of 10 DEG C/min To 380 DEG C, and it is incubated 6h, is incubated and complete allows it naturally cool down, after dropping to room temperature, take out silicon chip, One layer of WO is obtained on the W film surface of silicon chip3Nano wire film;
Step 3, prepares SnO2Nano thin-film:
First, prepare 100ml deionized water, weigh 5g SnCl4·5H2O is dissolved in deionized water, with Rear interpolation 0.3g citric acid, heated solution to 53 DEG C, under magnetic stirring, add 0.5mol/L's Ammoniacal liquor to pH value is 3, prepares Sn (OH)4Sediment, precipitation stands 15h, through repeatedly washing Remove removing chloride;Then 7g TiO is weighed2Nano particle, with precipitation mixed grinding 0.5h, is formed mixed Compound precipitates, and mixture precipitation is heated to 63 DEG C, adds back dissolving in saturated oxalic acid, until precipitation It is completely dissolved, obtains transparent SnO2Colloidal sol, using saturated for 10ml polyethylene glycol as surfactant Join in vitreosol, and put into 90 DEG C of baking oven drying 20h, obtain SnO2Gel Precursor, By this SnO2Gel Precursor is roasting 1.5h at 580 DEG C, obtains the TiO that adulterates2Nano particle SnO2Nanometer powder;
Use terpinol and SnO2Nanometer powder mixes, and preparation becomes SnO2Slurry, and use silk screen The method of printing is by SnO2Slurry is coated in the WO of silicon chip3Nano wire film region, SnO2Slurry is thick Degree is 2 μm, silicon chip is dried at 100 DEG C 5min subsequently, at WO3Nano wire film region Fill one layer of SnO2Nano thin-film;
Step 4, preparation pt electrode:
This sensor electrode uses Pt electrode, utilizes magnetron sputtering to combine template at SnO2Slurry table Face makes two Pt electrodes;Described Pt electrode is added with Bi2O3Material and MgB2Material, described Bi2O3The addition of material is 0.01wt%~0.1wt%, described MgB2The addition of material is 0.005wt%~0.05wt%.
Step 5, assembling CO gas sensor:
Wire and two Pt electrodes are connected, at Si backside of substrate, heating module and sensor is installed Shell mechanism.
The technical scheme that embodiments herein provides can include following beneficial effect:
(1) a kind of based on CO gas detection function the lightning protection that embodiments herein is provided is joined Electricity cabinet, it is provided with CO gas sensor, and this CO gas sensor is based on SnO2Nanometer material The resistor-type CO sensor of material, passes through WO3Nano wire and SnO2The combination of nano material, strengthens The aspect effects such as selectivity that CO is detected by CO gas sensor, stability;CO gas passes Sensor is at WO3On the basis of nano wire film, coat one layer of SnO2Nano material, is filled in nano wire Between space, due to WO3Nano wire has bigger specific surface area so that itself and SnO2Nanometer material Material contact area substantially increases, WO3Nano wire makees catalyst and substantially increases SnO2Spirit to CO Sensitivity and selectivity, and then improve the sensitivity of lightning protection power distribution cabinet.
(2) a kind of based on CO gas detection function the lightning protection that embodiments herein is provided is joined Electricity cabinet, owing to its CO gas sensor used uses SnO2Nano material is by collosol and gel legal system Standby, and SnO2Nano material increases with the contact area of gas, and then improves SnO2Nano material Adsorption capacity to gas, simultaneously because doping TiO2Nano particle, it is possible to promote material surface oxygen from Son and the reaction of reducibility gas CO, and then improve the sensor sensitivity to CO.
Aspect and advantage that the application adds will part be given in the following description, and part will be from following Description in become obvious, or recognized by the practice of the application.It should be appreciated that above It is only exemplary and explanatory that general description and details hereinafter describe, and can not limit the application.
Accompanying drawing explanation
Accompanying drawing herein is merged in specification and constitutes the part of this specification, it is shown that meet this Inventive embodiment, and for explaining the principle of the present invention together with specification.
Fig. 1 is the structural representation of the CO gas sensor of the present invention.Wherein: 01-Si substrate, 02- Silicon oxide film, 03-W film, 04-WO3Nano wire film, 05-SnO2Nano thin-film, 06-Pt electricity Pole, 07-heating module.
Fig. 2 is to prepare CO gas sensor flow chart.
Detailed description of the invention
Here will illustrate exemplary embodiment in detail, its example represents in the accompanying drawings.Below Description when relating to accompanying drawing, unless otherwise indicated, the same numbers in different accompanying drawings represents identical or phase As key element.Embodiment described in following exemplary embodiment does not represent and present invention phase one The all embodiments caused.On the contrary, they only with as appended claims describes in detail, this The example of the consistent apparatus and method of some aspects of invention.
Following disclosure provides many different embodiments or example for realizing the difference of the application Structure.In order to simplify disclosure herein, hereinafter parts and setting to specific examples are described. Certainly, they are the most merely illustrative, and are not intended to limit the application.Additionally, the application is permissible Repeat reference numerals and/or letter in different examples.This repetition is to simplify and clearly mesh , itself it is more than the relation between various embodiment being discussed and/or arranging.Additionally, the application The various specific technique provided and the example of material, but those of ordinary skill in the art can anticipate Know the applicability to other techniques and/or the use of other materials.It addition, described below first is special Levy Second Eigenvalue " on " structure can include what the first and second features were formed as directly contacting Embodiment, it is also possible to include the embodiment that other feature is formed between the first and second features, this Sample the first and second feature is not likely to be directly contact.
In the description of the present application, it should be noted that unless otherwise prescribed and limit, term " peace Dress ", should be interpreted broadly " being connected ", " connection ", for example, it may be mechanical connection or electrically connect, also Can be the connection of two element internals, can be to be joined directly together, it is also possible to indirect by intermediary It is connected, for the ordinary skill in the art, above-mentioned term can be understood as the case may be Concrete meaning.
At present, sensor technology has become as the pith of modern development in science and technology, itself and computer skill Three broad aspect of art, communication technology composition modern information technologies.Report to the police based on gas detection and identification Gas sensor is an important branch of sensor.In breed of crop, beverage industry, food work The aspects such as industry, atmospheric monitoring, industrial production, sensor plays the most important effect.
CO gas is a kind of gas harmful to human body and environmental toxic.When people suck a small amount of CO After, its easily in blood ferroheme be combined and form stable associated matter, cause hemoglobin to lose defeated Sending the ability of oxygen, eventually cause tissue anoxic, the lighter produces the symptoms such as headache, vomiting, sternly Severe one can cause brain injury or death.
In productive life, the source of CO is a lot.In coke plant, steel mill, chemical plant etc., behaviour Being likely to be exposed in high concentration CO gas as personnel, family's coal heating, the accident of terminal coal gas are let out Dew, scene of fire etc. also can produce a large amount of CO, easily cause the poisoning of people.It addition, CO It is a kind of inflammable and explosive gas simultaneously, can occur when CO content is at 12%~74% in air Blast.
The sensor being currently based on the detection of CO gas mainly has MOS type, electrochemistry Type, solid electrolyte type, catalytic combustion type etc., it is steady that MOS type sensor has heat Qualitative good, low cost, components and parts make the advantages such as simple, have become as the class sensing that research is more Device.
Tin is a kind of common elements, is positioned at IVA race in periodic table, and it can be combined into multiple oxygen with oxygen Compound, wherein, SnO2It is most stable of.SnO2Belong to a kind of typical wide bandgap semiconductor metal Oxide, due to self crystal structure, surface characteristic and characterization of adsorption etc., SnO2At gas sensing The fields such as device, solar cell, electrochemistry are widely used.SnO2As a kind of important air-sensitive Sensor sensing material, has the advantages such as response is sensitive, cost of manufacture is low, technological process is simple, warp It is commonly used for the detection of reducibility gas.
The probe gas principle of MOS type gas sensor be based on sensing element with The interaction of object gas.Metal-oxide semiconductor (MOS) for gas have stronger physically or chemically Adsorption capacity, when it is with air contact, it is quick that the oxygen in air can be adsorbed in metal-oxide semiconductor (MOS) The surface of sense material, and interact with sensitive material, produce negative oxygen ion;When contact reproducibility gas After body, reducibility gas reacts with the negative oxygen ion on this sensitive material surface, causes semiconductor sensitivity material Material carrier concentration becomes big, thus causes this sensitive material electrical conductivity to become big, and resistance declines, based on quick The change of sense material electrical properties, it is achieved the detection to reducibility gas.
MOS type gas sensor have corrosion-resistant, cost of manufacture is low, Cleaning Principle The advantage such as simple, but, existing metal oxide semiconductor sensor based on the detection of CO gas is still There is the problems such as selectivity, less stable, response be the sensitiveest.
Embodiment one:
Embodiments herein relates to a kind of lightning protection power distribution cabinet based on CO gas detection function, and this is prevented Thunder power distribution cabinet is provided with CO gas sensor;As it is shown in figure 1, described CO gas sensor includes Si substrate (01), the silicon oxide film (02) being formed on described Si substrate (01), it is placed in institute The WO state the W film (03) on silicon oxide film (02), being formed on W film (03)3Nanometer Line film (04), it is overlying on WO3SnO on nano wire film (04)2Nano thin-film (05), SnO2Nano thin-film (05) is gone up two the Pt electrodes (06) made and is positioned at below described Si substrate Heating module (07);Described WO3Nanowire length is 1000~7000nm.
Preferably, the preparation method such as Fig. 2, CO gas sensor comprises the steps:
Step one, preparation Si substrate:
Take the silicon chip of certain size (5cm × 5cm), sequentially pass through acetone, ethanol, deionized water Ultrasonic cleaning, ultrasonic time is 30min, is then putting in oxidation furnace by silicon chip, at 1100 DEG C Thermal oxide, obtains the silicon oxide film of a layer thickness about 600nm at silicon chip surface;
Step 2, prepares WO3Nano wire film:
Silicon chip through step one thermal oxide is put in magnetic control sputtering device, is evacuated to 2.0 × 10-3Hereinafter, Then utilize magnetron sputtering technique, plate one layer of W film at silicon oxide surface, using as WO3Nano wire Growth source, magnetron sputtering power be the thickness of 300W, W film be 300nm, size is 3cm × 3 cm;
Then silicon chip is put in tube furnace, at ambient pressure, be passed through the Ar gas of 20sccm, the most steady Determining 1h, discharge the air in tube furnace, following heated Tube-furnace is with the ramp of 10 DEG C/min To 380 DEG C, and it is incubated 6h, is incubated and complete allows it naturally cool down, after dropping to room temperature, take out silicon chip, One layer of WO is obtained on the W film surface of silicon chip3Nano wire film;
Step 3, prepares SnO2Nano thin-film:
First, prepare 100ml deionized water, weigh 5g SnCl4·5H2O is dissolved in deionized water, with Rear interpolation 0.3g citric acid, heated solution to 53 DEG C, under magnetic stirring, add 0.5mol/L's Ammoniacal liquor to pH value is 3, prepares Sn (OH)4Sediment, precipitation stands 15h, through repeatedly washing Remove removing chloride;Then 7g TiO is weighed2Nano particle, with precipitation mixed grinding 0.5h, is formed mixed Compound precipitates, and mixture precipitation is heated to 63 DEG C, adds back dissolving in saturated oxalic acid, until precipitation It is completely dissolved, obtains transparent SnO2Colloidal sol, using saturated for 10ml polyethylene glycol as surfactant Join in vitreosol, and put into 90 DEG C of baking oven drying 20h, obtain SnO2Gel Precursor, By this SnO2Gel Precursor is roasting 1.5h at 580 DEG C, obtains the TiO that adulterates2Nano particle SnO2Nanometer powder;
Use terpinol and SnO2Nanometer powder mixes, and preparation becomes SnO2Slurry, and use silk screen The method of printing is by SnO2Slurry is coated in the WO of silicon chip3Nano wire film region, SnO2Slurry is thick Degree is 2 μm, silicon chip is dried at 100 DEG C 5min subsequently, at WO3Nano wire film region Fill one layer of SnO2Nano thin-film;
Step 4, preparation pt electrode:
This sensor electrode uses Pt electrode, utilizes magnetron sputtering to combine template at SnO2Slurry table Face makes two Pt electrodes;Described Pt electrode is added with Bi2O3Material and MgB2Material, described Bi2O3The addition of material is 0.01wt%~0.1wt%, described MgB2The addition of material is 0.005wt%~0.05wt%.
Step 5, assembling CO gas sensor:
Wire and two Pt electrodes are connected, at Si backside of substrate, heating module and sensor is installed Shell mechanism.
Preferably, the test system of described CO sensor is by gas dilution system, electrochemical workstation Composition, can realize the detection to minimum 1ppm gas, and the sample sensor made is put into test chamber, Discharging chamber air, two electrodes are connected with external electrical chem workstation, and test voltage is 10V.Pass Sensor response is defined as: R=R0/Rg, and wherein R0 is material resistance in atmosphere, and Rg is material Resistance in certain concentration object gas, response time and recovery time are respectively response and recovery Value reaches the time used during the 90% of balance.Found by test, in CO concentration for being respectively 200,500,1000,1500ppm time, this sensor response corresponds to 10,21,41,72, H2 concentration be respectively 200,500,1000,1500ppm time, this sensor response is corresponding It is 5,9,17,32, shows preferable CO selectivity;By the reperformance test of 2000 times, Under same concentrations CO, response drops to original 94%, has good stability.
Test specification, the lightning protection power distribution cabinet installing this CO sensor is highly sensitive, repeated, stable Property good, there is the biggest market application foreground.
Embodiment two:
Embodiments herein relates to a kind of lightning protection power distribution cabinet based on CO gas detection function, and this is prevented Thunder power distribution cabinet is provided with CO gas sensor;As it is shown in figure 1, described CO gas sensor includes Si substrate (01), the silicon oxide film (02) being formed on described Si substrate (01), it is placed in institute The WO state the W film (03) on silicon oxide film (02), being formed on W film (03)3Nanometer Line film (04), it is overlying on WO3SnO on nano wire film (04)2Nano thin-film (05), SnO2Nano thin-film (05) is gone up two the Pt electrodes (06) made and is positioned at below described Si substrate Heating module (07);Described WO3Nanowire length is 1000~6000nm.
Preferably, the preparation method such as Fig. 2, CO gas sensor comprises the steps:
Step one, preparation Si substrate:
Take the silicon chip of certain size (5cm × 5cm), sequentially pass through acetone, ethanol, deionized water Ultrasonic cleaning, ultrasonic time is 30min, is then putting in oxidation furnace by silicon chip, at 1100 DEG C Thermal oxide, obtains the silicon oxide film of a layer thickness about 600nm at silicon chip surface;
Step 2, prepares WO3Nano wire film:
Silicon chip through step one thermal oxide is put in magnetic control sputtering device, is evacuated to 2.0 × 10-3Hereinafter, Then utilize magnetron sputtering technique, plate one layer of W film at silicon oxide surface, using as WO3Nano wire Growth source, magnetron sputtering power be the thickness of 300W, W film be 300nm, size is 3cm × 3 cm;
Then silicon chip is put in tube furnace, at ambient pressure, be passed through the Ar gas of 20sccm, the most steady Determining 1h, discharge the air in tube furnace, following heated Tube-furnace is with the ramp of 10 DEG C/min To 380 DEG C, and it is incubated 6h, is incubated and complete allows it naturally cool down, after dropping to room temperature, take out silicon chip, One layer of WO is obtained on the W film surface of silicon chip3Nano wire film;
Step 3, prepares SnO2Nano thin-film:
First, prepare 500ml deionized water, weigh 39g SnCl4·5H2O is dissolved in deionized water, Add 0.3g citric acid, heated solution to 53 DEG C subsequently, under magnetic stirring, add 0.5mol/L Ammoniacal liquor to pH value be 3.6, prepare Sn (OH)4Sediment, precipitation stands 15h, through repeatedly washing Wash removing chloride;Then 34g TiO is weighed2Nano particle, with precipitation mixed grinding 0.5h, is formed Mixture precipitation, is heated to 63 DEG C by mixture precipitation, adds back dissolving in saturated oxalic acid, until heavy Shallow lake is completely dissolved, and obtains transparent SnO2Colloidal sol, using saturated for 10ml polyethylene glycol as surface-active Agent joins in vitreosol, and puts into 90 DEG C of baking oven drying 20h, obtains SnO2Gel Precursor, By this SnO2Gel Precursor is roasting 1.5h at 580 DEG C, obtains the TiO that adulterates2Nano particle SnO2Nanometer powder;
Use terpinol and SnO2Nanometer powder mixes, and preparation becomes SnO2Slurry, and use silk screen The method of printing is by SnO2Slurry is coated in the WO of silicon chip3Nano wire film region, SnO2Slurry is thick Degree is 2 μm, silicon chip is dried at 100 DEG C 5min subsequently, at WO3Nano wire film region Fill one layer of SnO2Nano thin-film;
Step 4, preparation pt electrode:
This sensor electrode uses Pt electrode, utilizes magnetron sputtering to combine template at SnO2Slurry table Face makes two Pt electrodes;Described Pt electrode is added with Bi2O3Material and MgB2Material, described Bi2O3The addition of material is 0.04wt%~0.1wt%, described MgB2The addition of material is 0.005wt%~0.05wt%.
Step 5, assembling CO gas sensor:
Wire and two Pt electrodes are connected, at Si backside of substrate, heating module and sensor is installed Shell mechanism.
Preferably, the test system of described CO sensor is by gas dilution system, electrochemical workstation Composition, can realize the detection to minimum 1ppm gas, and the sample sensor made is put into test chamber, Discharging chamber air, two electrodes are connected with external electrical chem workstation, and test voltage is 10V.Pass Sensor response is defined as: R=R0/Rg, and wherein R0 is material resistance in atmosphere, and Rg is material Resistance in certain concentration object gas, response time and recovery time are respectively response and recovery Value reaches the time used during the 90% of balance.Found by test, in CO concentration for being respectively 200,500,1000,1500ppm time, this sensor response corresponds to 9,36,41,62, H2 concentration be respectively 200,500,1000,1500ppm time, this sensor response is corresponding It is 5,9,16,34, shows preferable CO selectivity;By the reperformance test of 2000 times, Under same concentrations CO, response drops to original 93%, has good stability.
Test specification, the lightning protection power distribution cabinet installing this CO sensor is highly sensitive, repeated, stable Property good, there is the biggest market application foreground.
Embodiment three:
Embodiments herein relates to a kind of lightning protection power distribution cabinet based on CO gas detection function, and this is prevented Thunder power distribution cabinet is provided with CO gas sensor;As it is shown in figure 1, described CO gas sensor includes Si substrate (01), the silicon oxide film (02) being formed on described Si substrate (01), it is placed in institute The WO state the W film (03) on silicon oxide film (02), being formed on W film (03)3Nanometer Line film (04), it is overlying on WO3SnO on nano wire film (04)2Nano thin-film (05), SnO2Nano thin-film (05) is gone up two the Pt electrodes (06) made and is positioned at below described Si substrate Heating module (07);Described WO3Nanowire length is 1000~5000nm.
Preferably, the preparation method such as Fig. 2, CO gas sensor comprises the steps:
Step one, preparation Si substrate:
Take the silicon chip of certain size (5cm × 5cm), sequentially pass through acetone, ethanol, deionized water Ultrasonic cleaning, ultrasonic time is 30min, is then putting in oxidation furnace by silicon chip, at 1100 DEG C Thermal oxide, obtains the silicon oxide film of a layer thickness about 600nm at silicon chip surface;
Step 2, prepares WO3Nano wire film:
Silicon chip through step one thermal oxide is put in magnetic control sputtering device, is evacuated to 2.0 × 10-3Hereinafter, Then utilize magnetron sputtering technique, plate one layer of W film at silicon oxide surface, using as WO3Nano wire Growth source, magnetron sputtering power be the thickness of 300W, W film be 300nm, size is 3cm × 3 cm;
Then silicon chip is put in tube furnace, at ambient pressure, be passed through the Ar gas of 30sccm, the most steady Determining 1h, discharge the air in tube furnace, following heated Tube-furnace is with the ramp of 10 DEG C/min To 380 DEG C, and it is incubated 6h, is incubated and complete allows it naturally cool down, after dropping to room temperature, take out silicon chip, One layer of WO is obtained on the W film surface of silicon chip3Nano wire film;
Step 3, prepares SnO2Nano thin-film:
First, prepare 100ml deionized water, weigh 5g SnCl4·5H2O is dissolved in deionized water, with Rear interpolation 0.3g citric acid, heated solution to 50 DEG C, under magnetic stirring, add 0.5mol/L's Ammoniacal liquor to pH value is 5, prepares Sn (OH)4Sediment, precipitation stands 15h, through repeatedly washing Remove removing chloride;Then 7g TiO is weighed2Nano particle, with precipitation mixed grinding 0.5h, is formed mixed Compound precipitates, and mixture precipitation is heated to 63 DEG C, adds back dissolving in saturated oxalic acid, until precipitation It is completely dissolved, obtains transparent SnO2Colloidal sol, using saturated for 10ml polyethylene glycol as surfactant Join in vitreosol, and put into 90 DEG C of baking oven drying 20h, obtain SnO2Gel Precursor, By this SnO2Gel Precursor is roasting 1.5h at 580 DEG C, obtains the TiO that adulterates2Nano particle SnO2Nanometer powder;
Use terpinol and SnO2Nanometer powder mixes, and preparation becomes SnO2Slurry, and use silk screen The method of printing is by SnO2Slurry is coated in the WO of silicon chip3Nano wire film region, SnO2Slurry is thick Degree is 4 μm, silicon chip is dried at 100 DEG C 5min subsequently, at WO3Nano wire film region Fill one layer of SnO2Nano thin-film;
Step 4, preparation pt electrode:
This sensor electrode uses Pt electrode, utilizes magnetron sputtering to combine template at SnO2Slurry table Face makes two Pt electrodes;Described Pt electrode is added with Bi2O3Material and MgB2Material, described Bi2O3The addition of material is 0.01wt%~0.1wt%, described MgB2The addition of material is 0.005wt%~0.05wt%.
Step 5, assembling CO gas sensor:
Wire and two Pt electrodes are connected, at Si backside of substrate, heating module and sensor is installed Shell mechanism.
Preferably, the test system of described CO sensor is by gas dilution system, electrochemical workstation Composition, can realize the detection to minimum 1ppm gas, and the sample sensor made is put into test chamber, Discharging chamber air, two electrodes are connected with external electrical chem workstation, and test voltage is 10V.Pass Sensor response is defined as: R=R0/Rg, and wherein R0 is material resistance in atmosphere, and Rg is material Resistance in certain concentration object gas, response time and recovery time are respectively response and recovery Value reaches the time used during the 90% of balance.Found by test, in CO concentration for being respectively 200,500,1000,1500ppm time, this sensor response corresponds to 12,29,41,72, H2 concentration be respectively 200,500,1000,1500ppm time, this sensor response is corresponding It is 5,9,16,24, shows preferable CO selectivity;By the reperformance test of 2000 times, Under same concentrations CO, response drops to original 88%, has good stability.
Test specification, the lightning protection power distribution cabinet installing this CO sensor is highly sensitive, repeated, stable Property good, there is the biggest market application foreground.
Embodiment four:
Embodiments herein relates to a kind of lightning protection power distribution cabinet based on CO gas detection function, and this is prevented Thunder power distribution cabinet is provided with CO gas sensor;As it is shown in figure 1, described CO gas sensor includes Si substrate (01), the silicon oxide film (02) being formed on described Si substrate (01), it is placed in institute The WO state the W film (03) on silicon oxide film (02), being formed on W film (03)3Nanometer Line film (04), it is overlying on WO3SnO on nano wire film (04)2Nano thin-film (05), SnO2Nano thin-film (05) is gone up two the Pt electrodes (06) made and is positioned at below described Si substrate Heating module (07);Described WO3Nanowire length is 1000~5000nm.
Preferably, the preparation method such as Fig. 2, CO gas sensor comprises the steps:
Step one, preparation Si substrate:
Take the silicon chip of certain size (5cm × 5cm), sequentially pass through acetone, ethanol, deionized water Ultrasonic cleaning, ultrasonic time is 30min, is then putting in oxidation furnace by silicon chip, at 1100 DEG C Thermal oxide, obtains the silicon oxide film of a layer thickness about 200nm at silicon chip surface;
Step 2, prepares WO3Nano wire film:
Silicon chip through step one thermal oxide is put in magnetic control sputtering device, is evacuated to 2.0 × 10-3Hereinafter, Then utilize magnetron sputtering technique, plate one layer of W film at silicon oxide surface, using as WO3Nano wire Growth source, magnetron sputtering power be the thickness of 300W, W film be 300nm, size is 3cm × 3 cm;
Then silicon chip is put in tube furnace, at ambient pressure, be passed through the Ar gas of 20sccm, the most steady Determining 1h, discharge the air in tube furnace, following heated Tube-furnace is with the ramp of 10 DEG C/min To 380 DEG C, and it is incubated 6h, is incubated and complete allows it naturally cool down, after dropping to room temperature, take out silicon chip, One layer of WO is obtained on the W film surface of silicon chip3Nano wire film;
Step 3, prepares SnO2Nano thin-film:
First, prepare 100ml deionized water, weigh 5g SnCl4·5H2O is dissolved in deionized water, with Rear interpolation 0.3g citric acid, heated solution to 53 DEG C, under magnetic stirring, add 0.5mol/L's Ammoniacal liquor to pH value is 3, prepares Sn (OH)4Sediment, precipitation stands 15h, through repeatedly washing Remove removing chloride;Then 7g TiO is weighed2Nano particle, with precipitation mixed grinding 0.5h, is formed mixed Compound precipitates, and mixture precipitation is heated to 63 DEG C, adds back dissolving in saturated oxalic acid, until precipitation It is completely dissolved, obtains transparent SnO2Colloidal sol, using saturated for 10ml polyethylene glycol as surfactant Join in vitreosol, and put into 90 DEG C of baking oven drying 20h, obtain SnO2Gel Precursor, By this SnO2Gel Precursor is roasting 5h at 580 DEG C, obtains the TiO that adulterates2The SnO of nano particle2 Nanometer powder;
Use terpinol and SnO2Nanometer powder mixes, and preparation becomes SnO2Slurry, and use silk screen The method of printing is by SnO2Slurry is coated in the WO of silicon chip3Nano wire film region, SnO2Slurry is thick Degree is 2 μm, silicon chip is dried at 100 DEG C 5min subsequently, at WO3Nano wire film region Fill one layer of SnO2Nano thin-film;
Step 4, preparation pt electrode:
This sensor electrode uses Pt electrode, utilizes magnetron sputtering to combine template at SnO2Slurry table Face makes two Pt electrodes;Described Pt electrode is added with Bi2O3Material and MgB2Material, described Bi2O3The addition of material is 0.05wt%~0.1wt%, described MgB2The addition of material is 0.005wt%~0.03wt%.
Step 5, assembling CO gas sensor:
Wire and two Pt electrodes are connected, at Si backside of substrate, heating module and sensor is installed Shell mechanism.
Preferably, the test system of described CO sensor is by gas dilution system, electrochemical workstation Composition, can realize the detection to minimum 1ppm gas, and the sample sensor made is put into test chamber, Discharging chamber air, two electrodes are connected with external electrical chem workstation, and test voltage is 10V.Pass Sensor response is defined as: R=R0/Rg, and wherein R0 is material resistance in atmosphere, and Rg is material Resistance in certain concentration object gas, response time and recovery time are respectively response and recovery Value reaches the time used during the 90% of balance.Found by test, in CO concentration for being respectively 200,500,1000,1500ppm time, this sensor response corresponds to 14,29,41,72, H2 concentration be respectively 200,500,1000,1500ppm time, this sensor response is corresponding It is 5,9,26,48, shows preferable CO selectivity;By the reperformance test of 2000 times, Under same concentrations CO, response drops to original 93%, has good stability.
Test specification, the lightning protection power distribution cabinet installing this CO sensor is highly sensitive, repeated, stable Property good, there is the biggest market application foreground.
Embodiment five:
Embodiments herein relates to a kind of lightning protection power distribution cabinet based on CO gas detection function, and this is prevented Thunder power distribution cabinet is provided with CO gas sensor;As it is shown in figure 1, described CO gas sensor includes Si substrate (01), the silicon oxide film (02) being formed on described Si substrate (01), it is placed in institute The WO state the W film (03) on silicon oxide film (02), being formed on W film (03)3Nanometer Line film (04), it is overlying on WO3SnO on nano wire film (04)2Nano thin-film (05), SnO2Nano thin-film (05) is gone up two the Pt electrodes (06) made and is positioned at below described Si substrate Heating module (07);Described WO3Nanowire length is 1000~4000nm.
Preferably, the preparation method such as Fig. 2, CO gas sensor comprises the steps:
Step one, preparation Si substrate:
Take the silicon chip of certain size (5cm × 5cm), sequentially pass through acetone, ethanol, deionized water Ultrasonic cleaning, ultrasonic time is 30min, is then putting in oxidation furnace by silicon chip, at 1100 DEG C Thermal oxide, obtains the silicon oxide film of a layer thickness about 600nm at silicon chip surface;
Step 2, prepares WO3Nano wire film:
Silicon chip through step one thermal oxide is put in magnetic control sputtering device, is evacuated to 2.0 × 10-3Hereinafter, Then utilize magnetron sputtering technique, plate one layer of W film at silicon oxide surface, using as WO3Nano wire Growth source, magnetron sputtering power be the thickness of 300W, W film be 300nm, size is 3cm × 3 cm;
Then silicon chip is put in tube furnace, at ambient pressure, be passed through the Ar gas of 20sccm, the most steady Determining 1h, discharge the air in tube furnace, following heated Tube-furnace is with the ramp of 10 DEG C/min To 380 DEG C, and it is incubated 6h, is incubated and complete allows it naturally cool down, after dropping to room temperature, take out silicon chip, One layer of WO is obtained on the W film surface of silicon chip3Nano wire film;
Step 3, prepares SnO2Nano thin-film:
First, prepare 100ml deionized water, weigh 5g SnCl4·5H2O is dissolved in deionized water, with Rear interpolation 0.3g citric acid, heated solution to 53 DEG C, under magnetic stirring, add 0.5mol/L's Ammoniacal liquor to pH value is 3, prepares Sn (OH)4Sediment, precipitation stands 15h, through repeatedly washing Remove removing chloride;Then 7g TiO is weighed2Nano particle, with precipitation mixed grinding 0.5h, is formed mixed Compound precipitates, and mixture precipitation is heated to 63 DEG C, adds back dissolving in saturated oxalic acid, until precipitation It is completely dissolved, obtains transparent SnO2Colloidal sol, using saturated for 10ml polyethylene glycol as surfactant Join in vitreosol, and put into 90 DEG C of baking oven drying 20h, obtain SnO2Gel Precursor, By this SnO2Gel Precursor is roasting 1.5h at 580 DEG C, obtains the TiO that adulterates2Nano particle SnO2Nanometer powder;
Use terpinol and SnO2Nanometer powder mixes, and preparation becomes SnO2Slurry, and use silk screen The method of printing is by SnO2Slurry is coated in the WO of silicon chip3Nano wire film region, SnO2Slurry is thick Degree is 2 μm, silicon chip is dried at 100 DEG C 5min subsequently, at WO3Nano wire film region Fill one layer of SnO2Nano thin-film;
Step 4, preparation pt electrode:
This sensor electrode uses Pt electrode, utilizes magnetron sputtering to combine template at SnO2Slurry table Face makes two Pt electrodes;Described Pt electrode is added with Bi2O3Material and MgB2Material, described Bi2O3The addition of material is 0.01wt%~0.1wt%, described MgB2The addition of material is 0.01 Wt%~0.07wt%.
Step 5, assembling CO gas sensor:
Wire and two Pt electrodes are connected, at Si backside of substrate, heating module and sensor is installed Shell mechanism.
Preferably, the test system of described CO sensor is by gas dilution system, electrochemical workstation Composition, can realize the detection to minimum 1ppm gas, and the sample sensor made is put into test chamber, Discharging chamber air, two electrodes are connected with external electrical chem workstation, and test voltage is 10V.Pass Sensor response is defined as: R=R0/Rg, and wherein R0 is material resistance in atmosphere, and Rg is material Resistance in certain concentration object gas, response time and recovery time are respectively response and recovery Value reaches the time used during the 90% of balance.Found by test, in CO concentration for being respectively 200,500,1000,1500ppm time, this sensor response corresponds to 14,29,41,68, H2 concentration be respectively 200,500,1000,1500ppm time, this sensor response is corresponding It is 5,25,31,47, shows preferable CO selectivity;By the reperformance test of 2000 times, Under same concentrations CO, response drops to original 93%, has good stability.
Test specification, the lightning protection power distribution cabinet installing this CO sensor is highly sensitive, repeated, stable Property good, there is the biggest market application foreground.
Those skilled in the art, after considering specification and putting into practice invention disclosed herein, will readily occur to Other embodiments of the present invention.The application is intended to any modification of the present invention, purposes or fits Answering property changes, and these modification, purposes or adaptations are followed the general principle of the present invention and wrap Include the undocumented common knowledge in the art of the application or conventional techniques means.Specification and reality Executing example and be considered only as exemplary, true scope and spirit of the invention are referred to by claim below Go out.
It should be appreciated that the invention is not limited in essence described above and illustrated in the accompanying drawings Really structure, and various modifications and changes can carried out without departing from the scope.The scope of the present invention is only Limited by appended claim.

Claims (2)

1. a lightning protection power distribution cabinet based on CO gas detection function, this lightning protection power distribution cabinet is provided with CO gas sensor;Described CO gas sensor includes Si substrate, is formed in described Si substrate Silicon oxide film, the W film being placed on described silicon oxide film, the WO that is formed on W film3 Nano wire film, it is overlying on WO3SnO on nano wire film2Nano thin-film, at SnO2Nanometer thin On film make two Pt electrodes and be positioned at the heating module below described Si substrate;Described WO3Receive Rice noodles a length of 1000~7000nm.
Lightning protection power distribution cabinet the most according to claim 1, wherein, the preparation of CO gas sensor Method comprises the steps:
Step one, preparation Si substrate:
Take the silicon chip of certain size (5cm × 5cm), sequentially pass through acetone, ethanol, deionized water Ultrasonic cleaning, ultrasonic time is 30min, is then putting in oxidation furnace by silicon chip, at 1100 DEG C Thermal oxide, obtains the silicon oxide film of a layer thickness about 600nm at silicon chip surface;
Step 2, prepares WO3Nano wire film:
Silicon chip through step one thermal oxide is put in magnetic control sputtering device, is evacuated to 2.0 × 10-3Hereinafter, Then utilize magnetron sputtering technique, plate one layer of W film at silicon oxide surface, using as WO3Nano wire Growth source, magnetron sputtering power be the thickness of 300W, W film be 300nm, size is 3cm × 3 cm;
Then silicon chip is put in tube furnace, at ambient pressure, be passed through the Ar gas of 20sccm, the most steady Determining 1h, discharge the air in tube furnace, following heated Tube-furnace is with the ramp of 10 DEG C/min To 380 DEG C, and it is incubated 6h, is incubated and complete allows it naturally cool down, after dropping to room temperature, take out silicon chip, One layer of WO is obtained on the W film surface of silicon chip3Nano wire film;
Step 3, prepares SnO2Nano thin-film:
First, prepare 100ml deionized water, weigh 5g SnCl4·5H2O is dissolved in deionized water, with Rear interpolation 0.3g citric acid, heated solution to 53 DEG C, under magnetic stirring, add 0.5mol/L's Ammoniacal liquor to pH value is 3, prepares Sn (OH)4Sediment, precipitation stands 15h, through repeatedly washing Remove removing chloride;Then 7g TiO is weighed2Nano particle, with precipitation mixed grinding 0.5h, is formed mixed Compound precipitates, and mixture precipitation is heated to 63 DEG C, adds back dissolving in saturated oxalic acid, until precipitation It is completely dissolved, obtains transparent SnO2Colloidal sol, using saturated for 10ml polyethylene glycol as surfactant Join in vitreosol, and put into 90 DEG C of baking oven drying 20h, obtain SnO2Gel Precursor, By this SnO2Gel Precursor is roasting 1.5h at 580 DEG C, obtains the TiO that adulterates2Nano particle SnO2Nanometer powder;
Use terpinol and SnO2Nanometer powder mixes, and preparation becomes SnO2Slurry, and use silk screen The method of printing is by SnO2Slurry is coated in the WO of silicon chip3Nano wire film region, SnO2Slurry is thick Degree is 2 μm, silicon chip is dried at 100 DEG C 5min subsequently, at WO3Nano wire film region Fill one layer of SnO2Nano thin-film;
Step 4, preparation pt electrode:
This sensor electrode uses Pt electrode, utilizes magnetron sputtering to combine template at SnO2Slurry table Face makes two Pt electrodes;Described Pt electrode is added with Bi2O3Material and MgB2Material, described Bi2O3The addition of material is 0.01wt%~0.1wt%, described MgB2The addition of material is 0.005wt%~0.05wt%.
Step 5, assembling CO gas sensor:
Wire and two Pt electrodes are connected, at Si backside of substrate, heating module and sensor is installed Shell mechanism.
CN201610427453.1A 2016-06-15 2016-06-15 Anti-lightning power distribution cabinet based on CO gas detection function Pending CN105866192A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201610427453.1A CN105866192A (en) 2016-06-15 2016-06-15 Anti-lightning power distribution cabinet based on CO gas detection function

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201610427453.1A CN105866192A (en) 2016-06-15 2016-06-15 Anti-lightning power distribution cabinet based on CO gas detection function

Publications (1)

Publication Number Publication Date
CN105866192A true CN105866192A (en) 2016-08-17

Family

ID=56650423

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201610427453.1A Pending CN105866192A (en) 2016-06-15 2016-06-15 Anti-lightning power distribution cabinet based on CO gas detection function

Country Status (1)

Country Link
CN (1) CN105866192A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113325043A (en) * 2021-07-19 2021-08-31 东北师范大学 Flexible inorganic semiconductor resistance type room temperature gas sensor and preparation method thereof

Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11183420A (en) * 1997-12-17 1999-07-09 Fuji Electric Co Ltd Thin film gas sensor
CN101168472A (en) * 2006-10-24 2008-04-30 北京有色金属研究总院 Leadless platinum electrode slurry and manufacturing method thereof
CN101285705A (en) * 2008-04-18 2008-10-15 中国石油大学(北京) Infrared detector
CN101493430A (en) * 2009-02-17 2009-07-29 武汉工程大学 Hydrogen sulfide gas sensitive, preparation, and method for making hydrogen sulfide gas sensitive device
CN101726956A (en) * 2009-11-18 2010-06-09 华东师范大学 Novel unit module for solar-powered self-driven electronic paper apparatus and method for preparing same
CN101770869A (en) * 2010-02-09 2010-07-07 新奥科技发展有限公司 Method for preparing titanium dioxide films for dye-sensitized solar battery
CN102254695A (en) * 2011-04-22 2011-11-23 南京工业大学 Dye-sensitized nanocrystalline thin film solar cell with light trapping structure
CN102358938A (en) * 2011-07-14 2012-02-22 中山大学 New method for synthesizing patterned single-crystal tungsten oxide nanowire arrays with catalyst localization technology
CN102610862A (en) * 2012-03-16 2012-07-25 浙江大学 Preparation method for lithium battery taking polypyrrole-coated magnesium borate as anode material
CN103818986A (en) * 2014-02-14 2014-05-28 浙江工商大学 Photocatalytic electrode responding to visible lights and application thereof on chromium-containing wastewater treatment
CN104569061A (en) * 2015-01-26 2015-04-29 苏州纳格光电科技有限公司 Metal oxide semiconductor gas sensor and preparation method thereof

Patent Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11183420A (en) * 1997-12-17 1999-07-09 Fuji Electric Co Ltd Thin film gas sensor
CN101168472A (en) * 2006-10-24 2008-04-30 北京有色金属研究总院 Leadless platinum electrode slurry and manufacturing method thereof
CN101285705A (en) * 2008-04-18 2008-10-15 中国石油大学(北京) Infrared detector
CN101493430A (en) * 2009-02-17 2009-07-29 武汉工程大学 Hydrogen sulfide gas sensitive, preparation, and method for making hydrogen sulfide gas sensitive device
CN101726956A (en) * 2009-11-18 2010-06-09 华东师范大学 Novel unit module for solar-powered self-driven electronic paper apparatus and method for preparing same
CN101770869A (en) * 2010-02-09 2010-07-07 新奥科技发展有限公司 Method for preparing titanium dioxide films for dye-sensitized solar battery
CN102254695A (en) * 2011-04-22 2011-11-23 南京工业大学 Dye-sensitized nanocrystalline thin film solar cell with light trapping structure
CN102358938A (en) * 2011-07-14 2012-02-22 中山大学 New method for synthesizing patterned single-crystal tungsten oxide nanowire arrays with catalyst localization technology
CN102610862A (en) * 2012-03-16 2012-07-25 浙江大学 Preparation method for lithium battery taking polypyrrole-coated magnesium borate as anode material
CN103818986A (en) * 2014-02-14 2014-05-28 浙江工商大学 Photocatalytic electrode responding to visible lights and application thereof on chromium-containing wastewater treatment
CN104569061A (en) * 2015-01-26 2015-04-29 苏州纳格光电科技有限公司 Metal oxide semiconductor gas sensor and preparation method thereof

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113325043A (en) * 2021-07-19 2021-08-31 东北师范大学 Flexible inorganic semiconductor resistance type room temperature gas sensor and preparation method thereof

Similar Documents

Publication Publication Date Title
Mittal et al. Is H2O2 involved in the membrane degradation mechanism in PEMFC?
EP2639577A1 (en) Electrochemical gas sensor comprising an anion-exchange membrane
CN105866192A (en) Anti-lightning power distribution cabinet based on CO gas detection function
Phawachalotorn et al. Highly selective amperometric sensors for carbon monoxide detection in exhaust gas
CN105866194A (en) Electric cabinet capable of achieving CO alarming
Kabasawa et al. Influence of decomposition products from perfluorosulfonic acid membrane on fuel cell performance
CN106198652A (en) A kind of organic garbage disposal being capable of gas self-checking function
CN105891288A (en) Intelligent home control system achieving CO detection
CN109557139A (en) A kind of preparation method of ZnO nanorod compound
CN105911112A (en) Iron-smelting blast furnace with CO gas detection function
CN106124571A (en) A kind of gas piping being capable of hazardous gas warning
CN217484246U (en) Anti-interference electrochemical carbon monoxide sensor
Ishihara et al. Solid state amperometric hydrocarbon sensor for monitoring exhaust gas using oxygen pumping current
CN105928990A (en) High-stability CO detection-based power module
Islam et al. Tailoring the microstructure of BiVO4 sensing electrode by nanoparticle decoration and its effect on hazardous NH3 sensing
CN105866193A (en) Fire extinguisher with high-sensitivity CO detection function
CN105322246A (en) Storage battery module and fabrication method thereof
CN106018493A (en) Electrical equipment inspection system based on hazardous gas detection
CN106124572A (en) alarm based on CO gas detection function
CN106124577A (en) A kind of server cabinet based on the detection of high stability CO
CN106124570A (en) A kind of high voltage power supply realizing CO detection
CN105911113A (en) Central air-conditioning system capable of achieving gas self-checking function
CN106124578A (en) A kind of environment monitoring device being capable of highly sensitive CO detection
CN106093151A (en) A kind of microbial manure detecting system realizing highly sensitive gas detecting
CN105300959A (en) Coal mine safety alarm system and manufacture method thereof

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
RJ01 Rejection of invention patent application after publication

Application publication date: 20160817

RJ01 Rejection of invention patent application after publication