CN105784680A - Method for enhancing plasma spectrum of fused silica induced by femtosecond laser double pulses - Google Patents
Method for enhancing plasma spectrum of fused silica induced by femtosecond laser double pulses Download PDFInfo
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- CN105784680A CN105784680A CN201610134583.6A CN201610134583A CN105784680A CN 105784680 A CN105784680 A CN 105784680A CN 201610134583 A CN201610134583 A CN 201610134583A CN 105784680 A CN105784680 A CN 105784680A
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- plasma
- femtosecond laser
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
- G01N21/71—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light thermally excited
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2201/00—Features of devices classified in G01N21/00
- G01N2201/06—Illumination; Optics
- G01N2201/061—Sources
- G01N2201/06113—Coherent sources; lasers
Abstract
The invention relates to a method for enhancing a plasma spectrum of fused silica induced by femtosecond laser double pulses, in particular to the method for carrying out ultrafast repetitive ablation on the fused silica by using the femtosecond laser double pulses to improve the radiation spectral intensity of a producing plasma, and belongs to the technical field of femtosecond laser application. The conventional femtosecond laser single pulse is modulated to the femtosecond laser double pulses, and the local transient electron dynamic state of the processed fused silica is regulated in the scale of subpicoseconds to hundred picoseconds to change the temperature and electron number density of the induced fused silica plasma and finally improve the spectral radiation intensity of the plasma. Furthermore, compared with the conventional femtosecond laser single pulse, the radiation spectral intensity can be enhanced by multiple times.
Description
Technical field
The present invention relates to the Enhancement Method of a kind of femtosecond double pulses induced fusion quartz plasma spectrum, being specifically related to one utilizes femtosecond double pulses that vitreous silica carries out ultrafast repetition ablation, and then improve the method producing plasma resonance spectral intensity, belong to femtosecond laser applied technical field.
Background technology
LIBS has great application potential in micro-nano technology.LIBS is a kind of element detection method based on atomic emission spectrum and Laser Plasma Emission Spectrum, its ultimate principle is: can produce to carry the plasma characteristics spectrum of sample element information when test sample is by laser pulse ablation, element contained in sample can be carried out qualitative and quantitative analysis according to these spectrum.LIBS is that elemental composition carries out one of detection effective method of most convenient: can on-the-spot detection and remote probe in real time；Can detecting all of chemical composition (including heavy element), especially to some extremely hard materials, the detection such as pottery and superconductor is easier；The damage of sample is can be controlled in material surface and submicron order, it is achieved non-intruding and lossless/Non-destructive test, there is high spatial resolution.
Femtosecond pulse processing belongs to cold working mode.When being processed with femtosecond pulse, owing to laser pulse width is 10-15Second-time, much smaller than the energy release time of excited electron in material, laser in extremely short interval, minimum region and matter interaction, is nearly free from the diffusion of energy, on machining area periphery almost without impact；Additionally, owing to femtosecond pulse is short for action time, high peak power can be obtained, almost can process any material, therefore, femtosecond pulse processing has high three dimensions resolution, low energy consumption, a low thermal effect impact etc., but simultaneously also to some extent the plasma in process life-span short, the open defect that intensity is weak, is especially apparent in the induced breakdown spectroscopy of dielectric substance is measured.
Summary of the invention
The invention aims to improve vitreous silica and puncture the intensity of radiation spectrum, the Enhancement Method of a kind of femtosecond double pulses induced fusion quartz plasma spectrum is proposed, by traditional femtosecond laser pulse is modulated to femtosecond double pulses, yardstick at subpicosecond to hundred psecs regulates and controls the Local Instantaneous electronic Dynamic of processed vitreous silica, thus changing temperature and the electron number densitiy of induced fusion quartz plasma, the final spectral radiance improving plasma.
It is an object of the invention to be achieved through the following technical solutions, specifically comprise the following steps that
Step one, closes bundle or shaping pulse by beam splitting, and tradition femtosecond laser pulse is modulated to femtosecond double pulses in time domain, and the energy of two pulses is equal, and adjusts the interval between two subpulses；
Step 2, regulates femtosecond laser power, uses planoconvex lens that adjustable for pulse daley dipulse femtosecond laser is focused on fused silica material surface, and ablation produces plasma；
Step 3, focuses on plasma resonance spectrum in spectrogrph through the planoconvex lens of fused silica material, adjusts the gate delay of ICCD, it is determined that the gate delay of same laser intensity induction spectral intensity maximum；
Step 4, uses above-mentioned spectrogrph and ICCD to be provided as spectra collection parameter, adjusts laser power and dipulse pulse daley, gathers the vitreous silica plasma light spectral intensity under different lasing condition, it is determined that spectral maximum.
Beneficial effect
1. under identical experiment condition, adopting femtosecond double pulses induction to excite the plasma of vitreous silica ablation, the strength ratio of its radiation spectrum adopts traditional femto-second laser pulse to improve several times.
2. adopting the radiation spectrum of femtosecond double pulses induced fusion quartz ablation plasma, femtosecond laser power is more strong, and plasma light spectral intensity is more strong, and when power reaches 100mW, plasma light spectral intensity reaches maximum；
3. adopt the radiation spectrum of femtosecond double pulses induced fusion quartz ablation plasma, when pulse daley is lower than 6ps, plasma resonance spectral intensity is more weak, and when pulse daley is 400fs, plasma radiation intensity reaches local maximum, and when pulse daley more than 400fs less than 6ps time, plasma radiation intensity linearly reduces；
4. adopting the radiation spectrum of femtosecond double pulses induced fusion quartz ablation plasma, when pulse daley is higher than 10ps, plasma light spectral intensity is obviously enhanced；When pulse daley reaches 120ps, plasma light spectral intensity reaches maximum.
Accompanying drawing explanation
Fig. 1 is technical scheme flow chart；
Fig. 2 is embodiment of the present invention femtosecond double pulses induced breakdown processing light path and spectra collection equipment drawing；
Accompanying drawing labelling:
1-femto-second laser；2-the first mechanical switch；3-the second mechanical switch；4-the first stationary mirror；5-the second stationary mirror；6-light combination mirror；7-beam splitter；8-double mirror translation stage；9-half-wave plate；The ultrafast polaroid of 10-；11-object lens；12-sample to be processed；13-three-dimensional mobile platform；The planoconvex lens group of 14-vitreous silica；15-spectrogrph；16-ICCD；17-computer；
Fig. 3 is the change (wherein 0ps is pulse) with pulse daley of the embodiment of the present invention 100mW femtosecond laser single and double-pulse induced plasma radiation spectrum intensity
Detailed description of the invention
Below in conjunction with drawings and Examples, the present invention is described in detail.
A kind of Enhancement Method of femtosecond double pulses induced fusion quartz plasma spectrum, femtosecond double pulses induced breakdown processing light path and spectra collection equipment are as shown in Figure 1, including processing light path and spectra collection equipment two parts, wherein processing light path is traditional femtosecond laser pulse that femto-second laser 1 produces, after the first mechanical switch 2 opened, by beam splitter 7, tradition femtosecond laser pulse is divided into two bundle subpulse light, transmission subpulse light, through two secondary reflections of moveable double mirror translation stage 8, arrives the light combination mirror 6 of 1:1；Two secondary reflections of reflection the first stationary mirror 4 of being fixed after the second mechanical switch 3 of subpulse light and the second stationary mirror 5, arrive light combination mirror 6 and merge into pulse spacing adjustable femtosecond double pulses with transmission subpulse light.Femtosecond double pulses realizes the adjustment of pulsed laser power then through half-wave plate 9 and ultrafast polaroid 10, and the surface focusing on sample 12 to be processed through object lens 11 realizes ablation, and is realized the mobile update of sample by three-dimensional mobile platform 13.After generating plasma, radiation spectrum is collected in spectrogrph 15 by the planoconvex lens group 14 of vitreous silica by its radiation spectrum, finally forms spectrum in ICCD16.In whole Laser Processing and spectra collection process, femto-second laser 1, mechanical switch 2, moveable double mirror translation stage 8 and three-dimensional mobile platform 13 carry out Collaborative Control by computer 17.
The femto-second laser parameter adopted in experimentation is as follows: centre wavelength is 800nm, and pulse width is 50fs, and repetition rate is 10Hz, linear polarization；In experiment, sample to be processed is sheet-shaped molten quartz glass.
It is embodied as step as follows:
Embodiment 1:
First producing plasma resonance spectrum with tradition femtosecond laser pulse induced fusion quartz, and measure its spectral intensity, specific process and spectra collection mode are as follows:
(1) open femto-second laser 1, open the first mechanical switch 2, close the second mechanical switch 3, now only have transmission subpulse can focus on sample surfaces and be processed, adjust light path, it is ensured that laser light incident direction is vertical with machined sample surfaces.
(2) by adjusting the combination angle of half-wave plate 9 and polaroid 10, the power of the conventional laser pulse before focusing is adjusted 30mW～100mW, being approximately 34 μm by the focused spot diameter after the planoconvex lens of 100mm focal length, laser flux is approximately 3.3～11J/cm2。
(3) computer 17 controls three-D displacement platform and drives vitreous silica sample relative focal in horizontal plane to move with the speed of 500 μm/s to obtain new undressed point.
(4) computer 17 controls to gather in the ICCD 100ns time after femto-second laser pulse sends pulse 230ns the radiation spectrum intensity of the plasma under different laser power, and calculates the result of integration 100 times.
Embodiment 2:
Below for femtosecond double pulses, the femtosecond double pulses induced fusion strengthened effect of quartz plasma radiation spectrum is described.
The Enhancement Method utilizing femto-second laser pulse sequence ablation vitreous silica plasma resonance spectrum that the present invention proposes, concrete procedure of processing is as follows:
(1) femto-second laser 1 is opened, opening the first mechanical switch 2, and open the second mechanical switch 3, now transmission subpulse and reflection subpulse conjunction focuses on sample surfaces after restrainting and is processed, adjust light path, it is ensured that laser light incident direction is vertical with machined sample surfaces.
(2) by adjusting the combination angle of half-wave plate 9 and polaroid 10, the power of the conventional laser pulse before focusing is adjusted 30mW～100mW, being approximately 34 μm by the focused spot diameter after the planoconvex lens of 100mm focal length, laser flux is approximately 3.3～11J/cm2。
(3) computer 17 controls three-D displacement platform and drives vitreous silica sample relative focal in horizontal plane to move with the speed of 500 μm/s to obtain new undressed point.
(4) computer 17 controls moveable double mirror translation stage 8, it is achieved the dipulse of zero propagation postpones.
(5) computer 17 controls to gather in the ICCD 100ns time after femto-second laser pulse sends pulse 230ns the radiation spectrum intensity of the plasma under different laser power, and calculates the result of integration 100 times.
(6) computer 17 controls moveable double mirror translation stage 8, it is achieved 0.2,0.4,0.6,0.8,2,6,10,40, the dipulse of 80,120ps postpones, and repeats step (5), it is thus achieved that the radiation spectrum intensity of the femtosecond double pulses induced plasma under different delays.
Experimental result shows, adopt the radiation spectrum of femtosecond double pulses induced fusion quartz ablation plasma, femtosecond laser power is more strong, plasma light spectral intensity is more strong, when power reaches 100mW, plasma light spectral intensity reaches maximum, pulse and dipulse to specific power 100mW, different dipulses postpones to have different plasma intensity, wherein pulse femtosecond laser induced plasma intensity is 10715, there is several characteristic kink in dipulse femtosecond laser induced plasma intensity, plasma intensity in 400fs dipulse delay situation is 125737, plasma intensity in 6ps dipulse delay situation is 94369, plasma intensity in 120ps dipulse delay situation is 382775.Concrete condition is as shown in Figure 2.
In sum, under identical experiment condition, adopting femtosecond double pulses induction to excite the plasma of vitreous silica ablation, the strength ratio of its radiation spectrum adopts traditional femto-second laser pulse to improve several times.
Claims (1)
1. the Enhancement Method of a femtosecond double pulses induced fusion quartz plasma spectrum, it is characterized in that, by traditional femtosecond laser pulse is modulated to femtosecond double pulses, yardstick at subpicosecond to hundred psecs regulates and controls the Local Instantaneous electronic Dynamic of processed vitreous silica, thus changing temperature and the electron number densitiy of induced fusion quartz plasma, the final spectral radiance improving plasma；Comprise the steps:
Step one, closes bundle or shaping pulse by beam splitting, and tradition femtosecond laser pulse is modulated to femtosecond double pulses in time domain, and the energy of two pulses is equal, and adjusts the interval between two subpulses；
Step 2, regulates femtosecond laser power, uses planoconvex lens that adjustable for pulse daley dipulse femtosecond laser is focused on fused silica material surface, and ablation produces plasma；
Step 3, focuses on plasma resonance spectrum in spectrogrph through the planoconvex lens of fused silica material, adjusts the gate delay of ICCD, it is determined that the gate delay of same laser intensity induction spectral intensity maximum；
Step 4, uses above-mentioned spectrogrph and ICCD to be provided as spectra collection parameter, adjusts laser power and dipulse pulse daley, gathers the vitreous silica plasma light spectral intensity under different lasing condition, it is determined that spectral maximum.
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106483103A (en) * | 2016-12-01 | 2017-03-08 | 上海电机学院 | A kind of ultrafast process imaging device of high-space resolution |
| CN109884034A (en) * | 2019-01-31 | 2019-06-14 | 广东朗研科技有限公司 | A kind of method and device of femtosecond plasma grating induced breakdown spectroscopy detection |
| CN113108745A (en) * | 2021-03-29 | 2021-07-13 | 中船重工重庆智能装备工程设计有限公司 | Bearing bush radius height and alignment parallelism detection device |
| CN113543922A (en) * | 2019-03-11 | 2021-10-22 | 株式会社藤仓 | Laser processing apparatus |
-
2016
- 2016-03-10 CN CN201610134583.6A patent/CN105784680A/en active Pending
Non-Patent Citations (5)
| Title |
|---|
| ANMIN CHEN ET.AL: "Optimally enhanced optical emission in laser-induced air plasma by femtosecond double-pulse", 《PHYSICS OF PLASMAS》 * |
| RIZWAN AHMED ET.AL: "A comparative study of enhanced emission in double pulse laser induced breakdown spectroscopy", 《OPTICS & LASER TECHNOLOGY》 * |
| SUN QUAN ET.AL: "Diagnose Parameters of Plasma Induced by Femtosecond Laser Pulse in Quartz and Glasses", 《FRONTIERS OF PHYSICS IN CHINA》 * |
| 何飞等: "飞秒激光微加工:激光精密加工领域的新前沿", 《中国激光》 * |
| 张晓萍等: "激光等离子体光谱分析技术的发展现状", 《光谱学与光谱分析》 * |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106483103A (en) * | 2016-12-01 | 2017-03-08 | 上海电机学院 | A kind of ultrafast process imaging device of high-space resolution |
| CN109884034A (en) * | 2019-01-31 | 2019-06-14 | 广东朗研科技有限公司 | A kind of method and device of femtosecond plasma grating induced breakdown spectroscopy detection |
| CN109884034B (en) * | 2019-01-31 | 2021-07-13 | 广东朗研科技有限公司 | Method and device for detecting femtosecond plasma grating induced breakdown spectrum |
| CN113543922A (en) * | 2019-03-11 | 2021-10-22 | 株式会社藤仓 | Laser processing apparatus |
| CN113543922B (en) * | 2019-03-11 | 2023-08-08 | 株式会社藤仓 | Laser processing device |
| CN113108745A (en) * | 2021-03-29 | 2021-07-13 | 中船重工重庆智能装备工程设计有限公司 | Bearing bush radius height and alignment parallelism detection device |
| CN113108745B (en) * | 2021-03-29 | 2023-03-10 | 中船重工重庆智能装备工程设计有限公司 | Bearing bush radius height and alignment parallelism detection device |
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