CN105671493A - Bactericidal and high light preventing abrasion-resistant mobile phone cover plate and manufacturing method thereof - Google Patents
Bactericidal and high light preventing abrasion-resistant mobile phone cover plate and manufacturing method thereof Download PDFInfo
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- CN105671493A CN105671493A CN201511028465.9A CN201511028465A CN105671493A CN 105671493 A CN105671493 A CN 105671493A CN 201511028465 A CN201511028465 A CN 201511028465A CN 105671493 A CN105671493 A CN 105671493A
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
- C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/081—Oxides of aluminium, magnesium or beryllium
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/083—Oxides of refractory metals or yttrium
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/10—Glass or silica
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/18—Metallic material, boron or silicon on other inorganic substrates
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- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04M—TELEPHONIC COMMUNICATION
- H04M1/00—Substation equipment, e.g. for use by subscribers
- H04M1/02—Constructional features of telephone sets
- H04M1/0202—Portable telephone sets, e.g. cordless phones, mobile phones or bar type handsets
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- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Health & Medical Sciences (AREA)
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Abstract
The invention discloses a bactericidal and high light preventing abrasion-resistant mobile phone cover plate and a manufacturing method thereof. The mobile phone cover plate comprises a substrate; a first film layer, a second film layer and a third film layer are arranged on the outer surface of the substrate in sequence from inside to outside; the first film layer is a nano-silver layer with the thickness being 5-20 nm; the second film layer is a high reflecting substance layer with the thickness being 10-50 nm; and the third film layer is a high-hardness layer with the thickness being 10-50 nm. The manufacturing method of the mobile phone cover plate includes the following steps that (1) the substrate is cleaned; and (2) the outer surface of the substrate is subjected to film plating. According to the bactericidal and high light preventing abrasion-resistant mobile phone cover plate, the enough bactericidal ability of the mobile phone cover plate is guaranteed by means of the nano-silver layer; besides, high light can be effectively filtered out and prevented from entering eyes of people by means of the high reflecting substance layer, so that the effect of high light preventing is achieved; and moreover, the abrasion resistance of the mobile phone cover plate can be remarkably improved by means of the high-hardness layer.
Description
Technical field
The present invention relates to the wear-resistant mobile phone cover plate of a kind of anti glare anti static coatings that sterilizes and manufacture method thereof.
Background technology
Existing mobile phone screen cover plate is in use easy to scratched or rub flower, affects attractive in appearance, and more seriously, the surface of mobile phone screen cover plate scratches or rubs after spending, and internal layer exposes in atmosphere, it is easy to is corroded, affects service life. It addition, the rarer sterilizing function of existing mobile phone screen cover plate, people are in use easily from bacterial infection hand-set lid. And owing to existing mobile phone screen cover plate does not have the function of anti glare anti static coatings, therefore mobile phone is in use, the high light that mobile phone screen sends also can damage to human body.
Summary of the invention
It is an object of the invention to provide the wear-resistant mobile phone cover plate of a kind of anti glare anti static coatings that sterilizes and manufacture method thereof, the produced hand-set lid of the method has the injury preventing antibacterial and high light to human body, and has high-wearing feature.
For achieving the above object, the present invention is by the following technical solutions:
A kind of wear-resistant mobile phone cover plate of the anti glare anti static coatings that sterilizes, including substrate, the outer surface of described substrate is sequentially provided with the first rete, the second rete and third membrane layer from the inside to surface, and described first rete is nano-silver layer, and the thickness of the first rete is 5-20nm; Described second rete is high reflecting material layer, and the thickness of the second rete is 10-50nm; Described third membrane layer is high rigidity layer, and the thickness of third membrane layer is 10-50nm.
The film material of described nano-silver layer is the oxide of silver, and is deposited with molding by electron gun.
The oxide of described silver is Ag2O, AgO or Ag2O3。
The film material of described high reflecting material layer is chromium or silver, and is deposited with molding by electron gun.
The film material of described high rigidity layer is aluminium sesquioxide, zirconium oxide, silica crystals or silicon monoxide crystal, and is deposited with molding by electron gun.
Described substrate is resin or glass ware forming.
When the substrate of described hand-set lid is resin forming, the manufacture method of described hand-set lid specifically includes following steps:
1) outer surface of substrate is carried out;
2) outer surface of substrate is carried out plated film;
A, plate the first rete:
Vacuum in vacuum coating cabin is adjusted to more than or equal to 5.0 × 10-3Handkerchief, and control the temperature in vacuum coating cabin and be 50-70 DEG C, electron gun is adopted to bombard the film material of the first rete, wherein the film material of the first rete is the oxide of silver, under the effect of electron gun evaporation, be attached to the surface of substrate after the peroxide breaks down of silver with the form of nanometer silver, the speed simultaneously controlling the first rete evaporation is 1/S, and the first rete ultimately forms the nano-silver layer that thickness is 5-20nm; The oxide of wherein said silver is Ag2O, AgO or Ag2O3;
B, plate the second rete:
Keep the vacuum in vacuum coating cabin more than or equal to 5.0 × 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 50-70 DEG C, electron gun is adopted to bombard the film material of the second rete, the surface being deposited in above-mentioned steps A the first rete with nanoscale molecular form after the film material evaporation of the second rete, the speed simultaneously controlling the second rete evaporation is 1.5/S, second rete ultimately form after thickness be 10-50nm, wherein the film material of the second rete is chromium or silver, forms high reflecting material layer;
C, plating third membrane layer:
Keep the vacuum in vacuum coating cabin more than or equal to 5.0 × 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 50-70 DEG C, adopt the film material of electron gun bombardment third membrane layer, the surface being deposited in above-mentioned steps B the second rete with nanoscale molecular form after the film material evaporation of third membrane layer, the speed simultaneously controlling third membrane layer evaporation is 7/S, third membrane layer ultimately form after thickness be 10-50nm, wherein the film material of third membrane layer is aluminium sesquioxide, zirconium oxide, silica crystals or silicon monoxide crystal, formed high rigidity layer.
In described step 1), the concrete grammar that outer surface of substrate is cleaned is as follows: be placed in vacuum chamber by substrate, bombards the outer surface 3 minutes of substrate with ion gun.
When the substrate of described hand-set lid is glass ware forming, the manufacture method of described hand-set lid specifically includes following steps:
1) outer surface of substrate is carried out;
2) outer surface of substrate is carried out plated film;
A, plate the first rete:
Vacuum in vacuum coating cabin is adjusted to more than or equal to 5.0 × 10-3Handkerchief, and control the temperature in vacuum coating cabin and be 200-300 DEG C, electron gun is adopted to bombard the film material of the first rete, wherein the film material of the first rete is the oxide of silver, under the effect of electron gun evaporation, be attached to the surface of substrate after the peroxide breaks down of silver with the form of nanometer silver, the speed simultaneously controlling the first rete evaporation is 1/S, and the first rete ultimately forms the nano-silver layer that thickness is 5-20nm; The oxide of wherein said silver is Ag2O, AgO or Ag2O3;
B, plate the second rete:
Keep the vacuum in vacuum coating cabin more than or equal to 5.0 × 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 200-300 DEG C, electron gun is adopted to bombard the film material of the second rete, the surface being deposited in above-mentioned steps A the first rete with nanoscale molecular form after the film material evaporation of the second rete, the speed simultaneously controlling the second rete evaporation is 1.5/S, second rete ultimately form after thickness be 10-50nm, wherein the film material of the second rete is chromium or silver, forms high reflecting material layer;
C, plating third membrane layer:
Keep the vacuum in vacuum coating cabin more than or equal to 5.0 × 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 200-300 DEG C, adopt the film material of electron gun bombardment third membrane layer, the surface being deposited in above-mentioned steps B the second rete with nanoscale molecular form after the film material evaporation of third membrane layer, the speed simultaneously controlling third membrane layer evaporation is 7/S, third membrane layer ultimately form after thickness be 10-50nm, wherein the film material of third membrane layer is aluminium sesquioxide, zirconium oxide, silica crystals or silicon monoxide crystal, formed high rigidity layer.
In described step 1), the concrete grammar that outer surface of substrate is cleaned is as follows: be placed in vacuum chamber by substrate, bombards outer surface 5-10 minute of substrate with ion gun.
The present invention adopts the principle of electron beam vacuum evaporation, charged particle is utilized after accelerating in the electric field, to have the feature of certain kinetic energy, ion is guided into the electrode being intended to be made by the substrate of plated film, and by high purity metal, metal alloy or other oxide that electron gun with high temperature bombardment simple substance exists, the nano molecular being evaporated makes it move to substrate the method finally depositing film forming on substrate along certain direction. This invention technology is combined with the trajectory of electron motion in the special distributed controll electric field in magnetic field, and with this technique improving plated film so that coating film thickness and uniformity are controlled, and the rete compactness of preparation is good, cohesive force strong and high purity.
The tens of kinds of pathogenic microorganism such as escherichia coli, gonococcus, chlamydia trachomatis are had strong suppression and killing action by the nano-silver layer that the present invention is coated with on the substrate of hand-set lid, and drug resistance will not be produced, ensure that hand-set lid has enough sterilizing abilities, high reflecting material layer can effectively filter high light, prevent high light from entering the eyes of human body, thus serving the effect of anti glare anti static coatings, high rigidity layer being set in addition and can significantly improve the wearability of hand-set lid.
Accompanying drawing explanation
Below in conjunction with the drawings and specific embodiments, the present invention is described in further details:
Fig. 1 is that the present invention sterilizes the exploded view of wear-resistant mobile phone cover plate of anti glare anti static coatings.
Detailed description of the invention
As it is shown in figure 1, the hand-set lid of the present invention includes substrate 1, the outer surface of substrate 1 is sequentially provided with the first rete the 2, second rete 3 and third membrane layer 4 from the inside to surface, and the first rete 2 is nano-silver layer, and the thickness of the first rete 2 is 5-20nm; Second rete 3 is high reflecting material layer, and the thickness of the second rete 3 is 10-50nm; Third membrane layer 4 is high rigidity layer, and the thickness of third membrane layer 4 is 10-50nm.
The film material of nano-silver layer is the oxide of silver, and is deposited with molding by electron gun.
The oxide of silver is Ag2O, AgO or Ag2O3。
The film material of high reflecting material layer is chromium or silver, and is deposited with molding by electron gun.
The film material of high rigidity layer is aluminium sesquioxide, zirconium oxide, silica crystals or silicon monoxide crystal, and is deposited with molding by electron gun.
Substrate 1 is resin or glass ware forming.
Embodiment 1, when the substrate 1 of hand-set lid is resin forming, the manufacture method of hand-set lid specifically includes following steps:
1) outer surface of substrate 1 is carried out;
2) outer surface of substrate 1 is carried out plated film;
A, plate the first rete 2:
Vacuum in vacuum coating cabin is adjusted to more than or equal to 5.0 × 10-3Handkerchief, and control the temperature in vacuum coating cabin and be 50-70 DEG C, electron gun is adopted to bombard the film material of the first rete, wherein the film material of the first rete is the oxide of silver, under the effect of electron gun evaporation, be attached to the surface of substrate after the peroxide breaks down of silver with the form of nanometer silver, the speed simultaneously controlling the first rete evaporation is 1/S, and the first rete ultimately forms the nano-silver layer that thickness is 5-20nm; The oxide of wherein said silver is Ag2O, AgO or Ag2O3;
B, plate the second rete 3:
Keep the vacuum in vacuum coating cabin more than or equal to 5.0 × 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 50-70 DEG C, electron gun is adopted to bombard the film material of the second rete 3, the surface being deposited in above-mentioned steps A the first rete 2 with nanoscale molecular form after the film material evaporation of the second rete 3, the speed simultaneously controlling the second rete 3 evaporation is 1.5/S, second rete 3 ultimately form after thickness be 10-50nm, wherein the film material of the second rete 3 be have highly reflective can chromium or silver, form high reflecting material layer;
C, plating third membrane layer 4:
Keep the vacuum in vacuum coating cabin more than or equal to 5.0 × 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 50-70 DEG C, adopt the film material of electron gun bombardment third membrane layer 4, the surface being deposited in above-mentioned steps B the second rete 3 with nanoscale molecular form after the film material evaporation of third membrane layer 4, the speed simultaneously controlling third membrane layer 4 evaporation is 7/S, third membrane layer 4 ultimately form after thickness be 10-50nm, wherein the film material of third membrane layer 4 is aluminium sesquioxide, zirconium oxide, silica crystals or silicon monoxide crystal, formed high rigidity layer.
In step 1), the concrete grammar of substrate 1 cleaning of outer surface is as follows: substrate 1 is placed in vacuum chamber, the outer surface 3 minutes of substrate 1 is bombarded with ion gun.
Being 2-4hrs by the adhesive force when subzero 20 DEG C of each rete on the hand-set lid that said method prepares, the adhesive force when 80 DEG C is 2-4hrs, has very strong adhesive ability, and the compactness of each rete is good simultaneously, high purity. And, the tens of kinds of pathogenic microorganism such as escherichia coli, gonococcus, chlamydia trachomatis are had strong suppression and killing action by the nano-silver layer on this hand-set lid, and will not produce drug resistance, and the film material of nano-silver layer is the oxide of silver, such as Ag2O, AgO or Ag2O3The oxide of silver oxonium ion after electron gun is deposited with is separated from the oxide of silver, and form nanometer silver thin layer, high reflecting material layer can effectively filter high light, prevent high light from entering the eyes of human body, thus serving the effect of anti glare anti static coatings, high rigidity layer can significantly improve the wearability of hand-set lid in addition.
Embodiment 2, when the substrate 1 of hand-set lid is glass ware forming, the manufacture method of hand-set lid specifically includes following steps:
1) outer surface of substrate 1 is carried out;
2) outer surface of substrate 1 is carried out plated film;
A, plate the first rete 2:
Vacuum in vacuum coating cabin is adjusted to more than or equal to 5.0 × 10-3Handkerchief, and control the temperature in vacuum coating cabin and be 200-300 DEG C, electron gun is adopted to bombard the film material of the first rete, wherein the film material of the first rete is the oxide of silver, under the effect of electron gun evaporation, be attached to the surface of substrate after the peroxide breaks down of silver with the form of nanometer silver, the speed simultaneously controlling the first rete evaporation is 1/S, and the first rete ultimately forms the nano-silver layer that thickness is 5-20nm; The oxide of wherein said silver is Ag2O, AgO or Ag2O3;
B, plate the second rete 3:
Keep the vacuum in vacuum coating cabin more than or equal to 5.0 × 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 200-300 DEG C, electron gun is adopted to bombard the film material of the second rete 3, the surface being deposited in above-mentioned steps A the first rete 2 with nanoscale molecular form after the film material evaporation of the second rete 3, the speed simultaneously controlling the second rete 3 evaporation is 1.5/S, second rete 3 ultimately form after thickness be 10-50nm, wherein the film material of the second rete 3 be have highly reflective can chromium or silver, form high reflecting material layer;
C, plating third membrane layer 4:
Keep the vacuum in vacuum coating cabin more than or equal to 5.0 × 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 200-300 DEG C, adopt the film material of electron gun bombardment third membrane layer 4, the surface being deposited in above-mentioned steps B the second rete 3 with nanoscale molecular form after the film material evaporation of third membrane layer 4, the speed simultaneously controlling third membrane layer 4 evaporation is 7/S, third membrane layer 4 ultimately form after thickness be 10-50nm, wherein the film material of third membrane layer 4 is aluminium sesquioxide, zirconium oxide, silica crystals or silicon monoxide crystal, formed high rigidity layer.
In step 1), the concrete grammar of substrate 1 cleaning of outer surface is as follows: substrate 1 is placed in vacuum chamber, outer surface 5-10 minute of substrate 1 is bombarded with ion gun.
Being 6-9hrs by the adhesive force when subzero 20 DEG C of each rete on the hand-set lid that said method prepares, the adhesive force when 80 DEG C is 6-9hrs, has very strong adhesive ability, and the compactness of each rete is good simultaneously, high purity. And, the tens of kinds of pathogenic microorganism such as escherichia coli, gonococcus, chlamydia trachomatis are had strong suppression and killing action by the nano-silver layer on this hand-set lid, and will not produce drug resistance, and the film material of nano-silver layer is the oxide of silver, such as Ag2O, AgO or Ag2O3The oxide of silver oxonium ion after electron gun is deposited with is separated from the oxide of silver, and form nanometer silver thin layer, high reflecting material layer can effectively filter high light, prevent high light from entering the eyes of human body, thus serving the effect of anti glare anti static coatings, high rigidity layer can significantly improve the wearability of hand-set lid in addition.
Claims (10)
1. the wear-resistant mobile phone cover plate of the anti glare anti static coatings that sterilizes, including substrate, it is characterized in that: the outer surface of described substrate is sequentially provided with the first rete, the second rete and third membrane layer from the inside to surface, and described first rete is nano-silver layer, and the thickness of the first rete is 5-20nm; Described second rete is high reflecting material layer, and the thickness of the second rete is 10-50nm; Described third membrane layer is high rigidity layer, and the thickness of third membrane layer is 10-50nm.
2. the wear-resistant mobile phone cover plate of a kind of radioprotective that sterilizes according to claim 1, it is characterised in that: the film material of described nano-silver layer is the oxide of silver, and is deposited with molding by electron gun.
3. the wear-resistant mobile phone cover plate of a kind of radioprotective that sterilizes according to claim 1, it is characterised in that: the oxide of described silver is Ag2O, AgO or Ag2O3。
4. the wear-resistant mobile phone cover plate of a kind of anti glare anti static coatings that sterilizes according to claim 1, it is characterised in that: the film material of described high reflecting material layer is chromium or silver, and is deposited with molding by electron gun.
5. the wear-resistant mobile phone cover plate of a kind of anti glare anti static coatings that sterilizes according to claim 1, it is characterised in that: the film material of described high rigidity layer is aluminium sesquioxide, zirconium oxide, silica crystals or silicon monoxide crystal, and is deposited with molding by electron gun.
6. the wear-resistant mobile phone cover plate of a kind of anti glare anti static coatings that sterilizes according to claim 1, it is characterised in that: described substrate is resin or glass ware forming.
7. the manufacture method of the wear-resistant mobile phone cover plate of sterilization radioprotective according to claim 6, it is characterised in that: when the substrate of described hand-set lid is resin forming, described manufacture method specifically includes following steps:
1) outer surface of substrate is carried out;
2) outer surface of substrate is carried out plated film;
A, plate the first rete:
Vacuum in vacuum coating cabin is adjusted to more than or equal to 5.0 × 10-3Handkerchief, and control the temperature in vacuum coating cabin and be 50-70 DEG C, electron gun is adopted to bombard the film material of the first rete, wherein the film material of the first rete is the oxide of silver, under the effect of electron gun evaporation, be attached to the surface of substrate after the peroxide breaks down of silver with the form of nanometer silver, the speed simultaneously controlling the first rete evaporation is 1/S, and the first rete ultimately forms the nano-silver layer that thickness is 5-20nm; The oxide of wherein said silver is Ag2O, AgO or Ag2O3;
B, plate the second rete:
Keep the vacuum in vacuum coating cabin more than or equal to 5.0 × 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 50-70 DEG C, electron gun is adopted to bombard the film material of the second rete, the surface being deposited in above-mentioned steps A the first rete with nanoscale molecular form after the film material evaporation of the second rete, the speed simultaneously controlling the second rete evaporation is 1.5/S, second rete ultimately form after thickness be 10-50nm, wherein the film material of the second rete is chromium or silver, forms high reflecting material layer;
C, plating third membrane layer:
Keep the vacuum in vacuum coating cabin more than or equal to 5.0 × 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 50-70 DEG C, adopt the film material of electron gun bombardment third membrane layer, the surface being deposited in above-mentioned steps B the second rete with nanoscale molecular form after the film material evaporation of third membrane layer, the speed simultaneously controlling third membrane layer evaporation is 7/S, third membrane layer ultimately form after thickness be 10-50nm, wherein the film material of third membrane layer is aluminium sesquioxide, zirconium oxide, silica crystals or silicon monoxide crystal, formed high rigidity layer.
8. the manufacture method of the wear-resistant mobile phone cover plate of a kind of anti glare anti static coatings that sterilizes according to claim 7, it is characterized in that: in described step 1), the concrete grammar that outer surface of substrate is cleaned is as follows: be placed in vacuum chamber by substrate, bombards the outer surface 3 minutes of substrate with ion gun.
9. the manufacture method of the wear-resistant mobile phone cover plate of sterilization radioprotective according to claim 6, it is characterised in that: when the substrate of described hand-set lid is glass ware forming, described manufacture method specifically includes following steps:
1) outer surface of substrate is carried out;
2) outer surface of substrate is carried out plated film;
A, plate the first rete:
Vacuum in vacuum coating cabin is adjusted to more than or equal to 5.0 × 10-3Handkerchief, and control the temperature in vacuum coating cabin and be 200-300 DEG C, electron gun is adopted to bombard the film material of the first rete, wherein the film material of the first rete is the oxide of silver, under the effect of electron gun evaporation, be attached to the surface of substrate after the peroxide breaks down of silver with the form of nanometer silver, the speed simultaneously controlling the first rete evaporation is 1/S, and the first rete ultimately forms the nano-silver layer that thickness is 5-20nm; The oxide of wherein said silver is Ag2O, AgO or Ag2O3;
B, plate the second rete:
Keep the vacuum in vacuum coating cabin more than or equal to 5.0 × 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 200-300 DEG C, electron gun is adopted to bombard the film material of the second rete, the surface being deposited in above-mentioned steps A the first rete with nanoscale molecular form after the film material evaporation of the second rete, the speed simultaneously controlling the second rete evaporation is 1.5/S, second rete ultimately form after thickness be 10-50nm, wherein the film material of the second rete is chromium or silver, forms high reflecting material layer;
C, plating third membrane layer:
Keep the vacuum in vacuum coating cabin more than or equal to 5.0 × 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 200-300 DEG C, adopt the film material of electron gun bombardment third membrane layer, the surface being deposited in above-mentioned steps B the second rete with nanoscale molecular form after the film material evaporation of third membrane layer, the speed simultaneously controlling third membrane layer evaporation is 7/S, third membrane layer ultimately form after thickness be 10-50nm, wherein the film material of third membrane layer is aluminium sesquioxide, zirconium oxide, silica crystals or silicon monoxide crystal, formed high rigidity layer.
10. the manufacture method of the wear-resistant mobile phone cover plate of a kind of anti glare anti static coatings that sterilizes according to claim 9, it is characterized in that: in described step 1), the concrete grammar that outer surface of substrate is cleaned is as follows: be placed in vacuum chamber by substrate, bombards outer surface 5-10 minute of substrate with ion gun.
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CN201251654Y (en) * | 2008-07-24 | 2009-06-03 | 甄兆忠 | Multifunctional healthcare spectacles |
CN103984120A (en) * | 2014-05-30 | 2014-08-13 | 奥特路(漳州)光学科技有限公司 | Method for manufacturing blue light-resistant optical lens |
CN104339749A (en) * | 2013-08-06 | 2015-02-11 | 三星显示有限公司 | Multi-layer optical coating structure having an antibacterial coating layer |
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CN201251654Y (en) * | 2008-07-24 | 2009-06-03 | 甄兆忠 | Multifunctional healthcare spectacles |
CN104339749A (en) * | 2013-08-06 | 2015-02-11 | 三星显示有限公司 | Multi-layer optical coating structure having an antibacterial coating layer |
CN103984120A (en) * | 2014-05-30 | 2014-08-13 | 奥特路(漳州)光学科技有限公司 | Method for manufacturing blue light-resistant optical lens |
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