CN105624613A - Wear-resisting touch display screen capable of achieving sterilizing, dazzle preventing and permeability increasing and manufacturing method of wear-resisting touch display screen - Google Patents

Wear-resisting touch display screen capable of achieving sterilizing, dazzle preventing and permeability increasing and manufacturing method of wear-resisting touch display screen Download PDF

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Publication number
CN105624613A
CN105624613A CN201511028583.XA CN201511028583A CN105624613A CN 105624613 A CN105624613 A CN 105624613A CN 201511028583 A CN201511028583 A CN 201511028583A CN 105624613 A CN105624613 A CN 105624613A
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rete
film material
evaporation
vacuum
substrate
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Inventor
吴晓彤
方俊勇
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Ott Road (zhangzhou) Optical Technology Co Ltd
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Ott Road (zhangzhou) Optical Technology Co Ltd
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Priority to CN201511028583.XA priority Critical patent/CN105624613A/en
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/081—Oxides of aluminium, magnesium or beryllium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/083—Oxides of refractory metals or yttrium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/10—Glass or silica
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
    • C23C28/322—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer only coatings of metal elements only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
    • C23C28/345—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer
    • C23C28/3455—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer with a refractory ceramic layer, e.g. refractory metal oxide, ZrO2, rare earth oxides or a thermal barrier system comprising at least one refractory oxide layer
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • General Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Human Computer Interaction (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Ceramic Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

The invention discloses a wear-resisting touch display screen capable of achieving sterilizing, dazzle preventing and permeability increasing and a manufacturing method of the wear-resisting touch display screen. The touch display screen comprises a substrate. A first film layer, a second film layer, a third film layer, a fourth film layer, a fifth film layer and a sixth film layer are sequentially arranged on the outer surface of the substrate from inside to outside. The first film layer and the third film layer are trititanium pentoxide layers, and the thickness of the first film layer and the third film layer is 10-100 nm. The second film layer and the fourth film layer are silicon dioxide layers, and the thickness of the second film layer and the fourth film layer is 50-100 nm. The fifth film layer is a nano-silver layer, and the thickness of the fifth film layer is 5-20 nm. The sixth film layer is a high-hardness layer, and the thickness of the sixth film layer is 10-50 nm. The manufacturing method of the wear-resisting touch display screen includes the following steps that firstly, the substrate is cleaned; and secondly, the outer surface of the substrate is coated. The touch display screen filters dazzle light so that the visual fatigue can be effectively relieved, and the sterilizing capability, the sufficient wear resistance and the sterilizing function are achieved.

Description

Wear-resistant touch display screen that a kind of anti-glazing that sterilizes is anti-reflection and manufacture method thereof
Technical field
The present invention relates to a kind of touch display screen technology field, especially relate to the anti-reflection wear-resistant touch display screen of a kind of anti-glazing that sterilizes and manufacture method thereof.
Background technology
Progress and scientific and technological development along with society, mobile phone, computer, TV extensively enter in work and the life of people, the display screen that at present mobile phone, computer, TV are with on the market is based on liquid crystal, LED, LCD, along with people to computer, TV etc. with display screen electronic equipment use the time growing, these display screens the dazzling light sent is increasingly severe to the injury of eye eyesight.
Existing touch display screen is in use easy to scratched or rub flower simultaneously, affects attractive in appearance, and more seriously, the surface of touch display screen scratches or rubs after spending, and internal layer exposes in atmosphere, it is easy to is corroded, affects service life. It addition, the existing rarer sterilizing function of touch display screen, people in use easily from touching bacterial infection display screen, damage to human body. Therefore in the urgent need to a kind of wear-resisting touch display screen with function antibacterial, anti-glare occurring to replace existing traditional display screen on market.
Summary of the invention
Present invention aims to the deficiencies in the prior art, it is provided that a kind of can effectively prevent the blue light injury to human body, there is high-wearing feature and anti-glare function, be suitable to the anti-reflection wear-resistant touch display screen of the sterilization anti-glazing that uses night and manufacture method thereof.
For achieving the above object, the present invention is by the following technical solutions:
The wear-resistant touch display screen that a kind of anti-glazing that sterilizes is anti-reflection, including substrate, the outer surface of described substrate is sequentially provided with the first rete, the second rete, third membrane layer, the 4th rete, the 5th rete and the 6th rete from the inside to surface; Described first rete and third membrane layer are five oxidation three titanium layers, and thickness is 10-100nm; Described second rete and the 4th rete are silicon dioxide layer, and thickness is 50-100nm; Described 5th rete is nano-silver layer, and the thickness of the 5th rete is 5-20nm; Described 6th rete is high rigidity layer, and thickness is 10-50nm.
The film material of nano-silver layer is the oxide of silver, and uses electron gun evaporation molding.
The oxide of described silver is Ag2O, AgO or Ag2O3��
The film material of described high rigidity layer is aluminium sesquioxide, zirconium oxide, silica crystals or silicon monoxide crystal, and is deposited with molding by electron gun.
Described substrate is by resin or glass ware forming.
The manufacture method of the wear-resistant touch display screen that a kind of anti-glazing that sterilizes of disclosure is anti-reflection, when described substrate is by resin forming, described manufacture method specifically includes following steps:
1) substrate is carried out, dries;
2) outer surface of substrate is carried out plated film;
A, plate the first rete:
Vacuum in vacuum coating cabin is adjusted to less than or equal to 5.0 �� 10-3 handkerchief, and control the temperature in vacuum coating cabin and be 50-70 DEG C, electron gun is adopted to bombard the film material of the first rete, it is deposited on the outer surface of substrate with nanoscale molecular form after the film material evaporation of the first rete, control simultaneously first rete evaporation speed be 2.5/S, the first rete ultimately form after thickness be 10-100nm; Wherein, the film material of described first rete is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
B, plate the second rete:
Keep the vacuum in vacuum coating cabin less than or equal to 5.0 �� 10-3 handkerchief, it is maintained with the temperature in vacuum coating cabin and is 50-70 DEG C, electron gun is adopted to bombard the film material of the second rete, the surface being deposited in above-mentioned steps A the first rete with nanoscale molecular form after the film material evaporation of the second rete, control simultaneously second rete evaporation speed be 7/S, the second rete ultimately form after thickness be 50-100nm; Wherein, the film material of described second rete is silicon dioxide, forms silicon dioxide layer;
C, plating third membrane layer:
Keep the vacuum in vacuum coating cabin less than or equal to 5.0 �� 10-3 handkerchief, it is maintained with the temperature in vacuum coating cabin and is 50-70 DEG C, adopt the film material of electron gun bombardment third membrane layer, the surface being deposited in above-mentioned steps B the second rete with nanoscale molecular form after the film material evaporation of third membrane layer, simultaneously control third membrane layer evaporation speed be 2.5/S, third membrane layer ultimately form after thickness be 10-100nm; Wherein, the film material of described third membrane layer is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
D, plating the 4th rete:
Keep the vacuum in vacuum coating cabin less than or equal to 5.0 �� 10-3 handkerchief, it is maintained with the temperature in vacuum coating cabin and is 50-70 DEG C, adopt the film material of electron gun bombardment the 4th rete, the surface being deposited in above-mentioned steps C third membrane layer with nanoscale molecular form after the film material evaporation of the 4th rete, simultaneously control the 4th rete evaporation speed be 7/S, the 4th rete ultimately form after thickness be 50-100nm; Wherein, the film material of described 4th rete is silicon dioxide, forms silicon dioxide layer;
E, plating the 5th rete:
Keep the vacuum in vacuum coating cabin more than or equal to 5.0 �� 10-3 handkerchief, it is maintained with the temperature in vacuum coating cabin and is 50-70 DEG C, adopt the film material of electron gun bombardment the 5th rete, wherein the film material of the 5th rete is the oxide of silver, decompose after the oxide evaporation of the silver of the film material of the 5th rete under the effect of electron gun evaporation, with the surface that the form of nanoscale elemental silver is attached in above-mentioned steps D the 4th rete, the speed simultaneously controlling the 5th rete evaporation is 1/S, the 5th rete ultimately form after the nano-silver layer of the thin layer that thickness is 5-20nm; The oxide of wherein said silver is Ag2O, AgO or Ag2O3;
F, plating the 6th rete:
Keep the vacuum in vacuum coating cabin less than or equal to 5.0 �� 10-3 handkerchief, it is maintained with the temperature in vacuum coating cabin and is 50-70 DEG C, adopt the film material of electron gun bombardment the 6th rete, the surface being deposited in above-mentioned steps E the 5th rete with nanoscale molecular form after the film material evaporation of the 6th rete, simultaneously control the 6th rete evaporation speed be 7/S, the 6th rete ultimately form after thickness be 10-50nm; Wherein, the film material of described 6th rete is aluminium sesquioxide, zirconium oxide, silicon dioxide high rigidity crystal or silicon monoxide high rigidity crystal, forms high rigidity layer.
In described step 1), substrate is carried out, substrate is placed in the vacuum chamber of vacuum evaporation plating machine by dry specifically comprising the following steps that, the outer surface bombarding substrate with ion gun is carried out for 2-3 minute.
The manufacture method of the wear-resistant touch display screen that a kind of anti-glazing that sterilizes of disclosure is anti-reflection, when described substrate is by glass ware forming, described manufacture method specifically includes following steps:
1) substrate is carried out, dries;
2) outer surface of substrate is carried out plated film;
A, plate the first rete:
Vacuum in vacuum coating cabin is adjusted to less than or equal to 5.0 �� 10-3 handkerchief, and control the temperature in vacuum coating cabin and be 200-300 DEG C, electron gun is adopted to bombard the film material of the first rete, it is deposited on the outer surface of substrate with nanoscale molecular form after the film material evaporation of the first rete, control simultaneously first rete evaporation speed be 2.5/S, the first rete ultimately form after thickness be 10-100nm; Wherein, the film material of described first rete is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
B, plate the second rete:
Keep the vacuum in vacuum coating cabin less than or equal to 5.0 �� 10-3 handkerchief, it is maintained with the temperature in vacuum coating cabin and is 200-300 DEG C, electron gun is adopted to bombard the film material of the second rete, the surface being deposited in above-mentioned steps A the first rete with nanoscale molecular form after the film material evaporation of the second rete, control simultaneously second rete evaporation speed be 7/S, the second rete ultimately form after thickness be 50-100nm; Wherein, the film material of described second rete is silicon dioxide, forms silicon dioxide layer;
C, plating third membrane layer:
Keep the vacuum in vacuum coating cabin less than or equal to 5.0 �� 10-3 handkerchief, it is maintained with the temperature in vacuum coating cabin and is 200-300 DEG C, adopt the film material of electron gun bombardment third membrane layer, the surface being deposited in above-mentioned steps B the second rete with nanoscale molecular form after the film material evaporation of third membrane layer, simultaneously control third membrane layer evaporation speed be 2.5/S, third membrane layer ultimately form after thickness be 10-100nm; Wherein, the film material of described third membrane layer is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
D, plating the 4th rete:
Keep the vacuum in vacuum coating cabin less than or equal to 5.0 �� 10-3 handkerchief, it is maintained with the temperature in vacuum coating cabin and is 200-300 DEG C, adopt the film material of electron gun bombardment the 4th rete, the surface being deposited in above-mentioned steps C third membrane layer with nanoscale molecular form after the film material evaporation of the 4th rete, simultaneously control the 4th rete evaporation speed be 7/S, the 4th rete ultimately form after thickness be 50-100nm; Wherein, the film material of described 4th rete is silicon dioxide, forms silicon dioxide layer;
E, plating the 5th rete:
Keep the vacuum in vacuum coating cabin more than or equal to 5.0 �� 10-3 handkerchief, it is maintained with the temperature in vacuum coating cabin and is 200-300 DEG C, adopt the film material of electron gun bombardment the 5th rete, wherein the film material of the 5th rete is the oxide of silver, decompose after the oxide evaporation of the silver of the film material of the 5th rete under the effect of electron gun evaporation, with the surface that the form of nanoscale elemental silver is attached in above-mentioned steps D the 4th rete, the speed simultaneously controlling the 5th rete evaporation is 1/S, the 5th rete ultimately form after the nano-silver layer of the thin layer that thickness is 5-20nm; The oxide of wherein said silver is Ag2O, AgO or Ag2O3;
F, plating the 6th rete:
Keep the vacuum in vacuum coating cabin less than or equal to 5.0 �� 10-3 handkerchief, it is maintained with the temperature in vacuum coating cabin and is 200-300 DEG C, adopt the film material of electron gun bombardment the 6th rete, the surface being deposited in above-mentioned steps E the 5th rete with nanoscale molecular form after the film material evaporation of the 6th rete, simultaneously control the 6th rete evaporation speed be 7/S, the 6th rete ultimately form after thickness be 10-50nm; Wherein, the film material of described 6th rete is aluminium sesquioxide, zirconium oxide, silicon dioxide high rigidity crystal or silicon monoxide high rigidity crystal, forms high rigidity layer.
In described step 1), substrate is carried out, substrate is placed in the vacuum chamber of vacuum evaporation plating machine by dry specifically comprising the following steps that, the outer surface bombarding substrate with ion gun is carried out for 5-10 minute.
The present invention adopts the principle of electron beam vacuum evaporation, charged particle is utilized after accelerating in the electric field, to have the feature of certain kinetic energy, ion is guided into the electrode being intended to be made by the substrate of plated film, and bombarded high purity metal or metal-oxide by electron gun with high temperature, the nano molecular being evaporated makes it move to substrate the final method in deposition on substrate film forming along certain direction. This invention technology is combined with the trajectory of electron motion in the special distributed controll electric field in magnetic field, and with this technique improving plated film so that coating film thickness and uniformity are controlled, and the rete compactness manufactured is good, cohesive force strong and high purity.
Present invention vacuum evaporation on substrate has five oxidation three titanium layers, take full advantage of five oxidation Tritanium/Trititanium crystalline material coating operations good, rete is intensive, uniformly, stable, the performances such as stress is little, and five oxidation Tritanium/Trititanium crystalline material there is the highest refractive index in visible light wave range, good crystallinity, evaporation is stable, without advantages such as venting and splashes so that it is be adapted on touch display screen substrate and be coated with the multilayer film that anti-reflection property is good.
The present invention is vacuum evaporation silica layer on substrate, acts primarily as the effect increasing film adhesion, wearability and impact resistance, can absorb harmful light simultaneously.
Five oxidation three titanium layers of the present invention and silicon dioxide layer cooperate, and primarily serve the effect controlling wavelength-filtered. The present invention is cooperated by above-mentioned rete, plays the effects such as absorption, reflection, conversion, filtration, is touch the core technology that display screen plated film sterilization anti-glazing is wear-resisting; Meanwhile, by regulating the thickness of above-mentioned each rete so that longer wavelengths of visible ray produces coherent interference, thus producing antiglare effect further; The oxide oxide of silver under the effect that electron gun is deposited with utilizing silver decomposes after evaporating, the lamellar nano-silver layer of shape is adhered to the form of nanoscale elemental silver, nanometer simple substance silver bactericidal effect makes it have sterilizing ability, nanometer simple substance silver is nontoxic non-stimulated, while ensure that the sterilizing ability that touch display screen is enough, avoid human body to come to harm, high rigidity layer is set in addition and can be effectively increased the wearability touching display screen, it is possible to prevent it from scratching.
When the touch display screen substrate of the present invention is by resin forming, the display screen each rete adhesive force when subzero 20 DEG C that touches prepared by manufacture method of the present invention is 2-4Hrs, and the adhesive force when 80 DEG C is 2-4Hrs, when the touch display screen substrate of the present invention is by glass ware forming, the display screen each rete adhesive force when subzero 20 DEG C that touches prepared by manufacture method of the present invention is 6-9Hrs, and the adhesive force when 80 DEG C is 6-9Hrs, the filtration of glare can effectively be alleviated visual fatigue by multiple retes that the touch display screen of the present invention is coated with effectively, the oxide oxide of silver under the effect that electron gun is deposited with utilizing silver decomposes after evaporating, the lamellar nano-silver layer of shape is adhered to the form of nanoscale elemental silver, nanometer simple substance silver bactericidal effect makes it have sterilizing ability, nanometer simple substance silver is nontoxic non-stimulated, while ensure that the sterilizing ability that touch display screen is enough, human body is avoided to come to harm, high rigidity layer is set in addition and can be effectively increased the wearability touching display screen, it is possible to prevent it to scratch.
Accompanying drawing explanation
Below in conjunction with the drawings and specific embodiments, the present invention is described in further details:
Fig. 1 is that the present invention sterilizes the exploded view of the anti-reflection wear-resistant touch display screen of anti-glazing.
Detailed description of the invention
As it is shown in figure 1, the present invention includes substrate 1, including substrate 1, the outer surface of described substrate 1 is sequentially provided with first rete the 2, second rete 3, third membrane layer the 4, the 4th rete the 5, the 5th rete 6 and the 6th rete 7 from the inside to surface; Described first rete 2 and third membrane layer 4 are five oxidation three titanium layers, and thickness is 10-100nm; Described second rete 3 and the 4th rete 5 are silicon dioxide layer, and thickness is 50-100nm; Described 5th rete 6 is nano-silver layer, and the thickness of the 5th rete 6 is 5-20nm; Described 6th rete 7 is high rigidity layer, and thickness is 10-50nm.
The film material of described nano-silver layer is the oxide of silver, and uses electron gun evaporation molding.
The oxide of described silver is Ag2O, AgO or Ag2O3��
The film material of described high rigidity layer is aluminium sesquioxide, zirconium oxide, silica crystals or silicon monoxide crystal, and is deposited with molding by electron gun.
Described substrate 1 is by resin or glass ware forming.
Embodiment 1:
When the substrate 1 of described touch display screen is by resin forming, the manufacture method of the wear-resistant touch display screen that described sterilization anti-glazing is anti-reflection specifically includes following steps:
1) substrate 1 is carried out, dries;
2) outer surface of substrate 1 is carried out plated film;
A, plate the first rete 2:
Vacuum in vacuum coating cabin is adjusted to less than or equal to 5.0 �� 10-3Handkerchief, and control the temperature in vacuum coating cabin and be 50-70 DEG C, electron gun is adopted to bombard the film material of the first rete 2, it is deposited on the outer surface of substrate 1 with nanoscale molecular form after the film material evaporation of the first rete 2, control simultaneously first rete 2 evaporation speed be 2.5/S, the first rete 2 ultimately form after thickness be 10-100nm; Wherein, the film material of described first rete 2 is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
B, plate the second rete 3:
Keep the vacuum in vacuum coating cabin less than or equal to 5.0 �� 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 50-70 DEG C, electron gun is adopted to bombard the film material of the second rete 3, the surface being deposited in above-mentioned steps A the first rete 2 with nanoscale molecular form after the film material evaporation of the second rete 3, control simultaneously second rete 3 evaporation speed be 7/S, the second rete 3 ultimately form after thickness be 50-100nm; Wherein, the film material of described second rete 3 is silicon dioxide, forms silicon dioxide layer;
C, plating third membrane layer 4:
Keep the vacuum in vacuum coating cabin less than or equal to 5.0 �� 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 50-70 DEG C, adopt the film material of electron gun bombardment third membrane layer 4, the surface being deposited in above-mentioned steps B the second rete 3 with nanoscale molecular form after the film material evaporation of third membrane layer 4, simultaneously control third membrane layer 4 evaporation speed be 2.5/S, third membrane layer 4 ultimately form after thickness be 10-100nm; Wherein, the film material of described third membrane layer 4 is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
D, plating the 4th rete 5:
Keep the vacuum in vacuum coating cabin less than or equal to 5.0 �� 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 50-70 DEG C, adopt the film material of electron gun bombardment the 4th rete 5, the surface being deposited in above-mentioned steps C third membrane layer 4 with nanoscale molecular form after the film material evaporation of the 4th rete 5, simultaneously control the 4th rete 5 evaporation speed be 7/S, the 4th rete 5 ultimately form after thickness be 50-100nm; Wherein, the film material of described 4th rete 5 is silicon dioxide, forms silicon dioxide layer;
E, plating the 5th rete 6:
Keep the vacuum in vacuum coating cabin more than or equal to 5.0 �� 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 50-70 DEG C, adopt the film material of electron gun bombardment the 5th rete 6, wherein the film material of the 5th rete 6 is the oxide of silver, decompose after the oxide evaporation of the silver of the film material of the 5th rete 6 under the effect of electron gun evaporation, with the surface that the form of nanoscale elemental silver is attached in above-mentioned steps D the 4th rete 5, the speed simultaneously controlling the 5th rete 6 evaporation is 1/S, the 5th rete ultimately form after the nano-silver layer of the thin layer that thickness is 5-20nm; The oxide of wherein said silver is Ag2O, AgO or Ag2O3;
F, plating the 6th rete 7:
Keep the vacuum in vacuum coating cabin less than or equal to 5.0 �� 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 50-70 DEG C, adopt the film material 11 of electron gun bombardment the 6th rete, the surface being deposited in above-mentioned steps E the 5th rete 6 with nanoscale molecular form after the film material evaporation of the 6th rete 7, simultaneously control the 6th rete 7 evaporation speed be 7/S, the 6th rete 7 ultimately form after thickness be 10-50nm; Wherein, the film material of described 6th rete 7 is aluminium sesquioxide, zirconium oxide, silicon dioxide high rigidity crystal or silicon monoxide high rigidity crystal, forms high rigidity layer.
In described step 1), substrate 1 is carried out, substrate 1 is placed in the vacuum chamber of vacuum evaporation plating machine by dry specifically comprising the following steps that, the outer surface bombarding substrate 1 with ion gun is carried out for 2-3 minute.
The each rete touched on display screen prepared by the said method adhesive force when subzero 20 DEG C is 2-4Hrs, and the adhesive force when 80 DEG C is 2-4Hrs, has very strong adhesive ability, and the compactness of each rete is good simultaneously, high purity. And, this touch display screen can make longer wavelengths of visible ray produce coherent interference, thus producing antiglare effect further; The oxide oxide of silver under the effect that electron gun is deposited with utilizing silver decomposes after evaporating, the lamellar nano-silver layer of shape is adhered to the form of nanoscale elemental silver, nanometer simple substance silver bactericidal effect makes it have sterilizing ability, nanometer simple substance silver is nontoxic non-stimulated, while ensure that the sterilizing ability that touch display screen is enough, avoid human body to come to harm, high rigidity layer is set in addition and can be effectively increased the wearability touching display screen, it is possible to prevent it from scratching.
Embodiment 2:
When the substrate 1 of described touch display screen is by glass ware forming, described manufacture method specifically includes following steps:
1) substrate 1 is carried out, dries;
2) outer surface of substrate 1 is carried out plated film;
A, plate the first rete 2:
Vacuum in vacuum coating cabin is adjusted to less than or equal to 5.0 �� 10-3Handkerchief, and control the temperature in vacuum coating cabin and be 200-300 DEG C, electron gun is adopted to bombard the film material of the first rete 2, it is deposited on the outer surface of substrate 1 with nanoscale molecular form after the film material evaporation of the first rete 2, control simultaneously first rete 2 evaporation speed be 2.5/S, the first rete 2 ultimately form after thickness be 10-100nm; Wherein, the film material of described first rete 2 is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
B, plate the second rete 3:
Keep the vacuum in vacuum coating cabin less than or equal to 5.0 �� 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 200-300 DEG C, electron gun is adopted to bombard the film material of the second rete 3, the surface being deposited in above-mentioned steps A the first rete 2 with nanoscale molecular form after the film material evaporation of the second rete 3, control simultaneously second rete 3 evaporation speed be 7/S, the second rete 3 ultimately form after thickness be 50-100nm; Wherein, the film material of described second rete 3 is silicon dioxide, forms silicon dioxide layer;
C, plating third membrane layer 4:
Keep the vacuum in vacuum coating cabin less than or equal to 5.0 �� 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 200-300 DEG C, adopt the film material of electron gun bombardment third membrane layer 4, the surface being deposited in above-mentioned steps B the second rete 3 with nanoscale molecular form after the film material evaporation of third membrane layer 4, simultaneously control third membrane layer 4 evaporation speed be 2.5/S, third membrane layer 4 ultimately form after thickness be 10-100nm; Wherein, the film material of described third membrane layer 4 is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
D, plating the 4th rete 5:
Keep the vacuum in vacuum coating cabin less than or equal to 5.0 �� 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 200-300 DEG C, adopt the film material of electron gun bombardment the 4th rete 5, the surface being deposited in above-mentioned steps C third membrane layer 4 with nanoscale molecular form after the film material evaporation of the 4th rete 5, simultaneously control the 4th rete 5 evaporation speed be 7/S, the 4th rete 5 ultimately form after thickness be 50-100nm; Wherein, the film material of described 4th rete 5 is silicon dioxide, forms silicon dioxide layer;
E, plating the 5th rete 6:
Keep the vacuum in vacuum coating cabin more than or equal to 5.0 �� 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 200-300 DEG C, adopt the film material of electron gun bombardment the 5th rete 6, wherein the film material of the 5th rete 6 is the oxide of silver, decompose after the oxide evaporation of the silver of the film material of the 5th rete 6 under the effect of electron gun evaporation, with the surface that the form of nanoscale elemental silver is attached in above-mentioned steps D the 4th rete 5, the speed simultaneously controlling the 5th rete 6 evaporation is 1/S, the 5th rete ultimately form after the nano-silver layer of the thin layer that thickness is 5-20nm; The oxide of wherein said silver is Ag2O, AgO or Ag2O3;
F, plating the 6th rete 7:
Keep the vacuum in vacuum coating cabin less than or equal to 5.0 �� 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 200-300 DEG C, adopt the film material 11 of electron gun bombardment the 6th rete, the surface being deposited in above-mentioned steps E the 5th rete 6 with nanoscale molecular form after the film material evaporation of the 6th rete 7, simultaneously control the 6th rete 7 evaporation speed be 7/S, the 6th rete 7 ultimately form after thickness be 10-50nm; Wherein, the film material of described 6th rete 7 is aluminium sesquioxide, zirconium oxide, silicon dioxide high rigidity crystal or silicon monoxide high rigidity crystal, forms high rigidity layer.
In described step 1), substrate 1 is carried out, substrate 1 is placed in the vacuum chamber of vacuum evaporation plating machine by dry specifically comprising the following steps that, the outer surface bombarding substrate 1 with ion gun is carried out for 5-10 minute.
The each rete touched on display screen prepared by the said method adhesive force when subzero 20 DEG C is 6-9Hrs, and the adhesive force when 80 DEG C is 6-9Hrs, has very strong adhesive ability, and the compactness of each rete is good simultaneously, high purity. And, this touch display screen can make longer wavelengths of visible ray produce coherent interference, thus producing antiglare effect further; The oxide oxide of silver under the effect that electron gun is deposited with utilizing silver decomposes after evaporating, the lamellar nano-silver layer of shape is adhered to the form of nanoscale elemental silver, nanometer simple substance silver bactericidal effect makes it have sterilizing ability, nanometer simple substance silver is nontoxic non-stimulated, while ensure that the sterilizing ability that touch display screen is enough, avoid human body to come to harm, high rigidity layer is set in addition and can be effectively increased the wearability touching display screen, it is possible to prevent it from scratching.
In sum, the present invention adopts the principle of electron beam vacuum evaporation, charged particle is utilized after accelerating in the electric field, to have the feature of certain kinetic energy, ion is guided into the electrode being intended to be made by the substrate of plated film, and bombarded high purity metal or metal-oxide by electron gun with high temperature, the nano molecular being evaporated makes it move to substrate the final method in deposition on substrate film forming along certain direction. This invention technology is combined with the trajectory of electron motion in the special distributed controll electric field in magnetic field, and with this technique improving plated film so that coating film thickness and uniformity are controlled, and the rete compactness manufactured is good, cohesive force strong and high purity.
Present invention vacuum evaporation on substrate has five oxidation three titanium layers, take full advantage of five oxidation Tritanium/Trititanium crystalline material coating operations good, rete is intensive, uniformly, stable, the performances such as stress is little, and five oxidation Tritanium/Trititanium crystalline material there is the highest refractive index in visible light wave range, good crystallinity, evaporation is stable, without advantages such as venting and splashes so that it is be adapted on touch display screen substrate and be coated with the multilayer film that anti-reflection property is good.
The present invention is vacuum evaporation silica layer on substrate, acts primarily as the effect increasing film adhesion, wearability and impact resistance, can absorb harmful light simultaneously.
Five oxidation three titanium layers of the present invention and silicon dioxide layer cooperate, and primarily serve the effect controlling wavelength-filtered. The present invention is cooperated by above-mentioned rete, plays the effects such as absorption, reflection, conversion, filtration, is touch the core technology that display screen plated film sterilization anti-glazing is wear-resisting; Meanwhile, by regulating the thickness of above-mentioned each rete so that longer wavelengths of visible ray produces coherent interference, thus producing antiglare effect further; Decompose after the oxide evaporation of the oxide of silver silver under the effect that electron gun is deposited with, the lamellar nano-silver layer of shape is adhered to the form of nanoscale elemental silver, nanometer simple substance silver bactericidal effect makes it have sterilizing ability, nanometer simple substance silver is nontoxic non-stimulated, while ensure that the sterilizing ability that touch display screen is enough, avoid human body to come to harm, high rigidity layer is set in addition and can be effectively increased the wearability touching display screen, it is possible to prevent it from scratching.
The filtration of glare can effectively be alleviated visual fatigue by multiple retes that the touch display screen of the present invention is coated with effectively, the oxide oxide of silver under the effect that electron gun is deposited with utilizing silver decomposes after evaporating, the lamellar nano-silver layer of shape is adhered to the form of nanoscale elemental silver, nanometer simple substance silver bactericidal effect makes it have sterilizing ability, nanometer simple substance silver is nontoxic non-stimulated, while ensure that the sterilizing ability that touch display screen is enough, human body is avoided to come to harm, high rigidity layer is set in addition and can be effectively increased the wearability touching display screen, it is possible to prevent it to scratch.

Claims (9)

1. the wear-resistant touch display screen that the anti-glazing that sterilizes is anti-reflection, including substrate, it is characterised in that: the outer surface of described substrate is sequentially provided with the first rete, the second rete, third membrane layer, the 4th rete, the 5th rete and the 6th rete from the inside to surface; Described first rete and third membrane layer are five oxidation three titanium layers, and thickness is 10-100nm; Described second rete and the 4th rete are silicon dioxide layer, and thickness is 50-100nm; Described 5th rete is nano-silver layer, and the thickness of the 5th rete is 5-20nm; Described 6th rete is high rigidity layer, and thickness is 10-50nm.
2. the wear-resistant touch display screen that a kind of anti-glazing that sterilizes according to claim 1 is anti-reflection, it is characterised in that: the film material of described nano-silver layer is the oxide of silver, and uses electron gun evaporation molding.
3. the wear-resistant touch display screen that a kind of anti-glazing that sterilizes according to claim 2 is anti-reflection, it is characterised in that: the oxide of described silver is Ag2O, AgO or Ag2O3��
4. the wear-resistant touch display screen that a kind of anti-glazing that sterilizes according to claim 1 is anti-reflection, it is characterised in that: the film material of described high rigidity layer is aluminium sesquioxide, zirconium oxide, silica crystals or silicon monoxide crystal, and is deposited with molding by electron gun.
5. the wear-resistant touch display screen that a kind of anti-glazing that sterilizes according to claim 1 is anti-reflection, it is characterised in that: described substrate is by resin or glass ware forming.
6. the manufacture method of the wear-resistant touch display screen that the anti-glazing that sterilizes according to claim 5 is anti-reflection, it is characterised in that: when described substrate is by resin forming, described manufacture method specifically includes following steps:
1) substrate is carried out, dries;
2) outer surface of substrate is carried out plated film;
A, plate the first rete:
Vacuum in vacuum coating cabin is adjusted to less than or equal to 5.0 �� 10-3Handkerchief, and control the temperature in vacuum coating cabin and be 50-70 DEG C, electron gun is adopted to bombard the film material of the first rete, it is deposited on the outer surface of substrate with nanoscale molecular form after the film material evaporation of the first rete, control simultaneously first rete evaporation speed be 2.5/S, the first rete ultimately form after thickness be 10-100nm; Wherein, the film material of described first rete is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
B, plate the second rete:
Keep the vacuum in vacuum coating cabin less than or equal to 5.0 �� 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 50-70 DEG C, electron gun is adopted to bombard the film material of the second rete, the surface being deposited in above-mentioned steps A the first rete with nanoscale molecular form after the film material evaporation of the second rete, control simultaneously second rete evaporation speed be 7/S, the second rete ultimately form after thickness be 50-100nm; Wherein, the film material of described second rete is silicon dioxide, forms silicon dioxide layer;
C, plating third membrane layer:
Keep the vacuum in vacuum coating cabin less than or equal to 5.0 �� 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 50-70 DEG C, adopt the film material of electron gun bombardment third membrane layer, the surface being deposited in above-mentioned steps B the second rete with nanoscale molecular form after the film material evaporation of third membrane layer, simultaneously control third membrane layer evaporation speed be 2.5/S, third membrane layer ultimately form after thickness be 10-100nm; Wherein, the film material of described third membrane layer is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
D, plating the 4th rete:
Keep the vacuum in vacuum coating cabin less than or equal to 5.0 �� 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 50-70 DEG C, adopt the film material of electron gun bombardment the 4th rete, the surface being deposited in above-mentioned steps C third membrane layer with nanoscale molecular form after the film material evaporation of the 4th rete, simultaneously control the 4th rete evaporation speed be 7/S, the 4th rete ultimately form after thickness be 50-100nm; Wherein, the film material of described 4th rete is silicon dioxide, forms silicon dioxide layer;
E, plating the 5th rete:
Keep the vacuum in vacuum coating cabin more than or equal to 5.0 �� 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 50-70 DEG C, adopt the film material of electron gun bombardment the 5th rete, wherein the film material of the 5th rete is the oxide of silver, decompose after the oxide evaporation of the silver of the film material of the 5th rete under the effect of electron gun evaporation, with the surface that the form of nanoscale elemental silver is attached in above-mentioned steps D the 4th rete, the speed simultaneously controlling the 5th rete evaporation is 1/S, the 5th rete ultimately form after the nano-silver layer of the thin layer that thickness is 5-20nm; The oxide of wherein said silver is Ag2O, AgO or Ag2O3;
F, plating the 6th rete:
Keep the vacuum in vacuum coating cabin less than or equal to 5.0 �� 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 50-70 DEG C, adopt the film material of electron gun bombardment the 6th rete, the surface being deposited in above-mentioned steps E the 5th rete with nanoscale molecular form after the film material evaporation of the 6th rete, simultaneously control the 6th rete evaporation speed be 7/S, the 6th rete ultimately form after thickness be 10-50nm; Wherein, the film material of described 6th rete is aluminium sesquioxide, zirconium oxide, silicon dioxide high rigidity crystal or silicon monoxide high rigidity crystal, forms high rigidity layer.
7. the manufacture method of the wear-resistant touch display screen that a kind of anti-glazing that sterilizes according to claim 5 is anti-reflection, it is characterized in that: in described step 1), substrate is carried out, substrate is placed in the vacuum chamber of vacuum evaporation plating machine by dry specifically comprising the following steps that, the outer surface bombarding substrate with ion gun is carried out for 2-3 minute.
8. the manufacture method of the wear-resistant touch display screen that the anti-glazing that sterilizes according to claim 4 is anti-reflection, it is characterised in that: when described substrate is by glass ware forming, described manufacture method specifically includes following steps:
1) substrate is carried out, dries;
2) outer surface of substrate is carried out plated film;
A, plate the first rete:
Vacuum in vacuum coating cabin is adjusted to less than or equal to 5.0 �� 10-3Handkerchief, and control the temperature in vacuum coating cabin and be 200-300 DEG C, electron gun is adopted to bombard the film material of the first rete, it is deposited on the outer surface of substrate with nanoscale molecular form after the film material evaporation of the first rete, control simultaneously first rete evaporation speed be 2.5/S, the first rete ultimately form after thickness be 10-100nm; Wherein, the film material of described first rete is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
B, plate the second rete:
Keep the vacuum in vacuum coating cabin less than or equal to 5.0 �� 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 200-300 DEG C, electron gun is adopted to bombard the film material of the second rete, the surface being deposited in above-mentioned steps A the first rete with nanoscale molecular form after the film material evaporation of the second rete, control simultaneously second rete evaporation speed be 7/S, the second rete ultimately form after thickness be 50-100nm; Wherein, the film material of described second rete is silicon dioxide, forms silicon dioxide layer;
C, plating third membrane layer:
Keep the vacuum in vacuum coating cabin less than or equal to 5.0 �� 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 200-300 DEG C, adopt the film material of electron gun bombardment third membrane layer, the surface being deposited in above-mentioned steps B the second rete with nanoscale molecular form after the film material evaporation of third membrane layer, simultaneously control third membrane layer evaporation speed be 2.5/S, third membrane layer ultimately form after thickness be 10-100nm; Wherein, the film material of described third membrane layer is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
D, plating the 4th rete:
Keep the vacuum in vacuum coating cabin less than or equal to 5.0 �� 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 200-300 DEG C, adopt the film material of electron gun bombardment the 4th rete, the surface being deposited in above-mentioned steps C third membrane layer with nanoscale molecular form after the film material evaporation of the 4th rete, simultaneously control the 4th rete evaporation speed be 7/S, the 4th rete ultimately form after thickness be 50-100nm; Wherein, the film material of described 4th rete is silicon dioxide, forms silicon dioxide layer;
E, plating the 5th rete:
Keep the vacuum in vacuum coating cabin more than or equal to 5.0 �� 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 200-300 DEG C, adopt the film material of electron gun bombardment the 5th rete, wherein the film material of the 5th rete is the oxide of silver, decompose after the oxide evaporation of the silver of the film material of the 5th rete under the effect of electron gun evaporation, with the surface that the form of nanoscale elemental silver is attached in above-mentioned steps D the 4th rete, the speed simultaneously controlling the 5th rete evaporation is 1/S, the 5th rete ultimately form after the nano-silver layer of the thin layer that thickness is 5-20nm; The oxide of wherein said silver is Ag2O, AgO or Ag2O3;
F, plating the 6th rete:
Keep the vacuum in vacuum coating cabin less than or equal to 5.0 �� 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 200-300 DEG C, adopt the film material of electron gun bombardment the 6th rete, the surface being deposited in above-mentioned steps E the 5th rete with nanoscale molecular form after the film material evaporation of the 6th rete, simultaneously control the 6th rete evaporation speed be 7/S, the 6th rete ultimately form after thickness be 10-50nm; Wherein, the film material of described 6th rete is aluminium sesquioxide, zirconium oxide, silicon dioxide high rigidity crystal or silicon monoxide high rigidity crystal, forms high rigidity layer.
9. the manufacture method of the wear-resistant touch display screen that a kind of anti-glazing that sterilizes according to claim 7 is anti-reflection, it is characterized in that: in described step 1), substrate is carried out, substrate is placed in the vacuum chamber of vacuum evaporation plating machine by dry specifically comprising the following steps that, the outer surface bombarding substrate with ion gun is carried out for 5-10 minute.
CN201511028583.XA 2015-12-31 2015-12-31 Wear-resisting touch display screen capable of achieving sterilizing, dazzle preventing and permeability increasing and manufacturing method of wear-resisting touch display screen Pending CN105624613A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108415613A (en) * 2018-04-24 2018-08-17 信利光电股份有限公司 A kind of touch screen and electronic device

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Publication number Priority date Publication date Assignee Title
CN103984120A (en) * 2014-05-30 2014-08-13 奥特路（漳州）光学科技有限公司 Method for manufacturing blue light-resistant optical lens
CN104339749A (en) * 2013-08-06 2015-02-11 三星显示有限公司 Multi-layer optical coating structure having an antibacterial coating layer

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104339749A (en) * 2013-08-06 2015-02-11 三星显示有限公司 Multi-layer optical coating structure having an antibacterial coating layer
CN103984120A (en) * 2014-05-30 2014-08-13 奥特路（漳州）光学科技有限公司 Method for manufacturing blue light-resistant optical lens

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108415613A (en) * 2018-04-24 2018-08-17 信利光电股份有限公司 A kind of touch screen and electronic device
CN108415613B (en) * 2018-04-24 2024-03-12 信利光电股份有限公司 Touch screen and electronic device

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Application publication date: 20160601