CN105629351A - Lamp cover for blue light filtering, sterilization and reflection resisting and manufacturing method thereof - Google Patents

Lamp cover for blue light filtering, sterilization and reflection resisting and manufacturing method thereof Download PDF

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Publication number
CN105629351A
CN105629351A CN201511028728.6A CN201511028728A CN105629351A CN 105629351 A CN105629351 A CN 105629351A CN 201511028728 A CN201511028728 A CN 201511028728A CN 105629351 A CN105629351 A CN 105629351A
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rete
film material
vacuum
vacuum coating
thickness
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Inventor
吴晓彤
方俊勇
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Ott Road (zhangzhou) Optical Technology Co Ltd
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Ott Road (zhangzhou) Optical Technology Co Ltd
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Priority to CN201511028728.6A priority Critical patent/CN105629351A/en
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/10—Glass or silica
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21—LIGHTING
    • F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
    • F21V3/00—Globes; Bowls; Cover glasses
    • F21V3/04—Globes; Bowls; Cover glasses characterised by materials, surface treatments or coatings
    • F21V3/06—Globes; Bowls; Cover glasses characterised by materials, surface treatments or coatings characterised by the material
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21—LIGHTING
    • F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
    • F21V9/00—Elements for modifying spectral properties, polarisation or intensity of the light emitted, e.g. filters
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/12—Optical coatings produced by application to, or surface treatment of, optical elements by surface treatment, e.g. by irradiation

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Optics & Photonics (AREA)
  • Materials Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Engineering & Computer Science (AREA)
  • Toxicology (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

The invention discloses a lamp cover for blue light filtering, sterilization and reflection resisting and a manufacturing method thereof. The lamp cover comprises a substrate. A first film layer, a second film layer, a third film layer, a fourth film layer, a fifth film layer, a sixth film layer, a seventh film layer, an eighth film layer and a ninth film layer are successively arranged from inside to outside on the outer surface of the substrate. The first film layer, the fourth film layer and the sixth film layer are trititanium pentoxide layers. The thickness of each of the trititanium pentoxide layers is 10-100 nm. The second film layer, the fifth film layer and the seventh film layer are silicon dioxide layers. The thickness of each of the silicon dioxide layers is 50-100 nm. The third film layer is a metal layer of which the thickness is 5-20 n. The eighth film layer is a nano-silver layer of which the thickness is 5-20 nm. The ninth film layer is an acrylic acid layer of which the thickness is 5-15 nm. The manufacturing method comprises following steps of 1) cleaning the substrate; and 2) carrying out film coating on the outer surface of the substrate. The lamp cover is capable of effectively filtering harmful blue light and dazzling light, so reflection resisting performance can be improved and the lamp cover has a sterilization function.

Description

A kind of filter blue light anti-reflection lampshade of sterilization and manufacture method thereof
Technical field
The present invention relates to a kind of lampshade technical field, especially relate to a kind of filter blue light anti-reflection lampshade of sterilization and manufacture method thereof.
Background technology
Progress and scientific and technological development along with society, luminaire extensively enters in work and the life of people, along with luminaire (such as light fixture) is used the growing of time by people, blue light that these light fixtures send, ultraviolet, dazzling light are increasingly severe to the injury of eye eyesight.
Blue light is wavelength is the high-energy visible ray of 400-500nm, blue light is to be directed through cornea, eyes crystal, through retina, blue light can stimulate retina to produce a large amount of radical ions, make the atrophy of retinal pigment epithelium, and cause the death of photaesthesia cell, retinal pigment epithelium is very strong to the light absorption effect of blue region, absorbs blue ray radiation and can make retinal pigment epithelium atrophy, and this is also the one of the main reasons producing maculopathy; Blue ray radiation composition is more high more big to optic cell injury, and the atrophy of retinal pigment epithelium can make amphiblestroid image thicken, fuzzy image ciliary muscle can done continuous adjustment, increasing the weight of the working strength of ciliary muscle, cause visual fatigue. Causing the visual fatigue of people under the effect of ultraviolet and blue light, vision can be gradually reduced, and easily causes the early onset cataract such as dry and astringent, photophobia, fatigue on ocular vision, spontaneous macular diseases.
At present, mainly by arranging lampshade outside light fixture, in order to optically focused, weather proof and solution the problems referred to above, but effect is unsatisfactory, and people are chronically exposed in light environment, and health receives strong influence. It addition, in cold winter, the easy condensing water droplet of cover surface, thus affecting the light transmittance of lampshade, the function of existing lampshade also rare sterilization simultaneously.
Therefore, on market in the urgent need to occur a kind of with anti-blue light, anti-glare, sterilization, anti-reflection function lampshade to replace existing tradition lampshade.
Summary of the invention
Present invention aims to the deficiencies in the prior art, it is provided that a kind of can effectively prevent the blue light injury to human body, have anti-glare function, the filter blue light being suitable to use night sterilizes anti-reflection lampshade and manufacture method thereof.
For achieving the above object, the present invention is by the following technical solutions:
The lampshade that the sterilization of a kind of filter blue light is anti-reflection, including substrate, the outer surface of described substrate is sequentially provided with the first rete, the second rete, third membrane layer, the 4th rete, the 5th rete, the 6th rete, the 7th rete, the 8th rete and the 9th rete from the inside to surface; Described first rete, the 4th rete and the 6th rete are five oxidation three titanium layers, and thickness is 10-100nm; Described second rete, the 5th rete and the 7th rete are silicon dioxide layer, and thickness is 50-100nm; Described third membrane layer is metal level, and thickness is 5-20nm; Described 8th rete is nano-silver layer, and the thickness of the 8th rete is 5-20nm; Described 9th rete is acrylate layer, and thickness is 5-15nm.
The film material of described metal level is gold, silver, platinum, neodymium, copper, zinc or nickel, and is deposited with molding by electron gun.
The film material of described metal level is billon, silver alloy, platinum alloy, neodymium alloy, copper alloy, kirsite or nickel alloy, and is deposited with molding by electron gun.
The film material of described nano-silver layer is the oxide of silver, and is deposited with molding by electron gun.
The oxide of described silver is Ag2O, AgO or Ag2O3��
Described substrate is by resin or glass ware forming.
When described substrate is by resin forming, the anti-reflection lampshade manufacture method of this filter blue light sterilization specifically includes following steps:
1) substrate is carried out, dries;
2) outer surface of substrate is carried out plated film;
A, plate the first rete:
Vacuum in vacuum coating cabin is adjusted to less than or equal to 5.0 �� 10-3Handkerchief, and control the temperature in vacuum coating cabin and be 50-70 DEG C, electron gun is adopted to bombard the film material of the first rete, it is deposited on the outer surface of substrate with nanoscale molecular form after the film material evaporation of the first rete, control simultaneously first rete evaporation speed be 2.5/S, the first rete ultimately form after thickness be 10-100nm; Wherein, the film material of described first rete is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
B, plate the second rete:
Keep the vacuum in vacuum coating cabin less than or equal to 5.0 �� 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 50-70 DEG C, electron gun is adopted to bombard the film material of the second rete, the surface being deposited in above-mentioned steps A the first rete with nanoscale molecular form after the film material evaporation of the second rete, control simultaneously second rete evaporation speed be 7/S, the second rete ultimately form after thickness be 50-100nm; Wherein, the film material of described second rete is silicon dioxide, forms silicon dioxide layer;
C, plating third membrane layer:
Keep the vacuum in vacuum coating cabin less than or equal to 5.0 �� 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 50-70 DEG C, adopt the film material of electron gun bombardment third membrane layer, the surface being deposited in above-mentioned steps B the second rete with nanoscale molecular form after the film material evaporation of third membrane layer, simultaneously control third membrane layer evaporation speed be 1/S, third membrane layer ultimately form after thickness be 5-20nm; Wherein, the film material of described third membrane layer is gold, silver, platinum, neodymium, copper, zinc, nickel, billon, silver alloy, platinum alloy, neodymium alloy, copper alloy, kirsite or nickel alloy, forms metal level;
D, plating the 4th rete:
Keep the vacuum in vacuum coating cabin less than or equal to 5.0 �� 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 50-70 DEG C, adopt the film material of electron gun bombardment the 4th rete, the surface being deposited in above-mentioned steps C third membrane layer with nanoscale molecular form after the film material evaporation of the 4th rete, simultaneously control the 4th rete evaporation speed be 2.5/S, the 4th rete ultimately form after thickness be 10-100nm; Wherein, the film material of described 4th rete is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
E, plating the 5th rete:
Keep the vacuum in vacuum coating cabin less than or equal to 5.0 �� 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 50-70 DEG C, adopt the film material of electron gun bombardment the 5th rete, the surface being deposited in above-mentioned steps D the 4th rete with nanoscale molecular form after the film material evaporation of the 5th rete, simultaneously control the 5th rete evaporation speed be 7/S, the 5th rete ultimately form after thickness be 50-100nm; Wherein, the film material of described 5th rete is silicon dioxide, forms silicon dioxide layer;
F, plating the 6th rete:
Keep the vacuum in vacuum coating cabin less than or equal to 5.0 �� 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 50-70 DEG C, adopt the film material of electron gun bombardment the 6th rete, the surface being deposited in above-mentioned steps E the 5th rete with nanoscale molecular form after the film material evaporation of the 6th rete, simultaneously control the 6th rete evaporation speed be 2.5/S, the 6th rete ultimately form after thickness be 10-100nm; Wherein, the film material of described 6th rete is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
G, plating the 7th rete:
Keep the vacuum in vacuum coating cabin less than or equal to 5.0 �� 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 50-70 DEG C, adopt the film material of electron gun bombardment the 7th rete, the surface being deposited in above-mentioned steps F the 6th rete with nanoscale molecular form after the film material evaporation of the 7th rete, simultaneously control the 7th rete evaporation speed be 7/S, the 7th rete ultimately form after thickness be 50-100nm; Wherein, the film material of described 7th rete is silicon dioxide, forms silicon dioxide layer;
H, plating the 8th rete:
Keep the vacuum in vacuum coating cabin more than or equal to 5.0 �� 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 50-70 DEG C, adopt the film material of electron gun bombardment the 8th rete, wherein the film material of the 8th rete is the oxide of silver, under the effect of electron gun evaporation, the surface that the peroxide breaks down of silver is attached in above-mentioned steps G the 7th rete with the form of nanometer silver, the speed simultaneously controlling the 8th rete evaporation is 1/S, and the 8th rete ultimately forms the nano-silver layer that thickness is 5-20nm; The oxide of wherein said silver is Ag2O, AgO or Ag2O3;
I, plating the 9th rete:
In above-mentioned steps H on the surface of the 8th rete, it is coated with water soluble acrylic resin or polyacrylic acid material by nebulization, is coated with through several times, ultimately forms the 9th rete acrylate layer that thickness is 5-15nm.
In described step 1), substrate is carried out, substrate is placed in vacuum chamber by dry specifically comprising the following steps that, the outer surface bombarding substrate with ion gun is carried out for 2-3 minute.
When described substrate is by glass ware forming, the manufacture method of the lampshade that the sterilization of this filter blue light is anti-reflection specifically includes following steps:
1) substrate is carried out, dries;
2) outer surface of substrate is carried out plated film;
A, plate the first rete:
Vacuum in vacuum coating cabin is adjusted to less than or equal to 5.0 �� 10-3Handkerchief, and control the temperature in vacuum coating cabin and be 200-300 DEG C, electron gun is adopted to bombard the film material of the first rete, it is deposited on the outer surface of substrate with nanoscale molecular form after the film material evaporation of the first rete, control simultaneously first rete evaporation speed be 2.5/S, the first rete ultimately form after thickness be 10-100nm; Wherein, the film material of described first rete is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
B, plate the second rete:
Keep the vacuum in vacuum coating cabin less than or equal to 5.0 �� 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 200-300 DEG C, electron gun is adopted to bombard the film material of the second rete, the surface being deposited in above-mentioned steps A the first rete with nanoscale molecular form after the film material evaporation of the second rete, control simultaneously second rete evaporation speed be 7/S, the second rete ultimately form after thickness be 50-100nm; Wherein, the film material of described second rete is silicon dioxide, forms silicon dioxide layer;
C, plating third membrane layer:
Keep the vacuum in vacuum coating cabin less than or equal to 5.0 �� 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 200-300 DEG C, adopt the film material of electron gun bombardment third membrane layer, the surface being deposited in above-mentioned steps B the second rete with nanoscale molecular form after the film material evaporation of third membrane layer, simultaneously control third membrane layer evaporation speed be 1/S, third membrane layer ultimately form after thickness be 5-20nm; Wherein, the film material of described third membrane layer is gold, silver, platinum, neodymium, copper, zinc, nickel, billon, silver alloy, platinum alloy, neodymium alloy, copper alloy, kirsite or nickel alloy, forms metal level;
D, plating the 4th rete:
Keep the vacuum in vacuum coating cabin less than or equal to 5.0 �� 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 200-300 DEG C, adopt the film material of electron gun bombardment the 4th rete, the surface being deposited in above-mentioned steps C third membrane layer with nanoscale molecular form after the film material evaporation of the 4th rete, simultaneously control the 4th rete evaporation speed be 2.5/S, the 4th rete ultimately form after thickness be 10-100nm; Wherein, the film material of described 4th rete is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
E, plating the 5th rete:
Keep the vacuum in vacuum coating cabin less than or equal to 5.0 �� 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 200-300 DEG C, adopt the film material of electron gun bombardment the 5th rete, the surface being deposited in above-mentioned steps D the 4th rete with nanoscale molecular form after the film material evaporation of the 5th rete, simultaneously control the 5th rete evaporation speed be 7/S, the 5th rete ultimately form after thickness be 50-100nm; Wherein, the film material of described 5th rete is silicon dioxide, forms silicon dioxide layer;
F, plating the 6th rete:
Keep the vacuum in vacuum coating cabin less than or equal to 5.0 �� 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 200-300 DEG C, adopt the film material of electron gun bombardment the 6th rete, the surface being deposited in above-mentioned steps E the 5th rete with nanoscale molecular form after the film material evaporation of the 6th rete, simultaneously control the 6th rete evaporation speed be 2.5/S, the 6th rete ultimately form after thickness be 10-100nm; Wherein, the film material of described 6th rete is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
G, plating the 7th rete:
Keep the vacuum in vacuum coating cabin less than or equal to 5.0 �� 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 200-300 DEG C, adopt the film material of electron gun bombardment the 7th rete, the surface being deposited in above-mentioned steps F the 6th rete with nanoscale molecular form after the film material evaporation of the 7th rete, simultaneously control the 7th rete evaporation speed be 7/S, the 7th rete ultimately form after thickness be 50-100nm; Wherein, the film material of described 7th rete is silicon dioxide, forms silicon dioxide layer;
H, plating the 8th rete:
Keep the vacuum in vacuum coating cabin more than or equal to 5.0 �� 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 200-300 DEG C, adopt the film material of electron gun bombardment the 8th rete, wherein the film material of the 8th rete is the oxide of silver, under the effect of electron gun evaporation, the surface that the peroxide breaks down of silver is attached in above-mentioned steps G the 7th rete with the form of nanometer silver, the speed simultaneously controlling the 8th rete evaporation is 1/S, and the 8th rete ultimately forms the nano-silver layer that thickness is 5-20nm; The oxide of wherein said silver is Ag2O, AgO or Ag2O3;
I, plating the 9th rete:
In above-mentioned steps H on the surface of the 8th rete, it is coated with water soluble acrylic resin or polyacrylic acid material by nebulization, is coated with through several times, ultimately forms the 9th rete acrylate layer that thickness is 5-15nm.
In described step 1), substrate is carried out, substrate is placed in vacuum chamber by dry specifically comprising the following steps that, the outer surface bombarding substrate with ion gun is carried out for 5-10 minute.
The present invention adopts the principle of electron beam vacuum evaporation, charged particle is utilized after accelerating in the electric field, to have the feature of certain kinetic energy, ion is guided into the electrode being intended to be made by the substrate of plated film, and bombarded high purity metal or metal-oxide by electron gun with high temperature, the nano molecular being evaporated makes it move to substrate the final method in deposition on substrate film forming along certain direction. This invention technology is combined with the trajectory of electron motion in the special distributed controll electric field in magnetic field, and with this technique improving plated film so that coating film thickness and uniformity are controlled, and the rete compactness of preparation is good, cohesive force strong and high purity.
Present invention vacuum evaporation on substrate has five oxidation three titanium layers, taking full advantage of five oxidation Tritanium/Trititanium crystalline material coating operations good, rete is intensive, uniformly, stable, the performances such as stress is little, and five oxidation Tritanium/Trititanium crystalline materials there is the highest refractive index, good crystallinity in visible light wave range, evaporation is stable, without advantages such as venting and splashes so that it is be adapted on lampshade substrate to be coated with the multilayer film that anti-reflection property is good, prepared lampshade has the anti-reflection performance of excellence.
The present invention is vacuum evaporation silica layer on substrate, acts primarily as the effect increasing film adhesion, wearability and impact resistance, can absorb harmful light simultaneously.
Five oxidation three titanium layers of the present invention and silicon dioxide layer cooperate, primarily serve the effect controlling wavelength-filtered, the present invention is at some five oxidation three titanium layers and the silicon dioxide layers being arranged alternately of lampshade substrate outer surface evaporation, not only effective elimination most purple lights and blue light, and can effectively reflect harmful light, high light, dazzling light wave, flash light wave by force, reduce the stimulation of the injury to human eye retina and shortwave dazzle; The metal level of third membrane layer of the present invention, not only improves anti-blue light effect and definition, and can also reflect harmful light, dazzling light wave, flash light wave etc. by force; The present invention is cooperated by above-mentioned rete, plays the effects such as absorption, reflection, conversion, filtration, is the core technology of coating on lampshade filter blue light anti-glazing; Meanwhile, by regulating the thickness of above-mentioned each rete so that longer wavelengths of visible ray produces coherent interference, thus producing antiglare effect further.
The silver oxide layer of the present invention, its strong oxidizing property makes lampshade have bactericidal property, and the thickness of this layer is 5-20nm, it is ensured that lampshade has enough sterilizing abilities.
The present invention adopts nebulization to spray acrylate layer at the outermost layer of lampshade substrate surface, utilizes the hydrophilic that it is extremely strong, reduces the reflection because water smoke causes and refraction, thus reaching anti-fog effect.
When the lampshade substrate of the present invention is by resin forming, each rete of lampshade prepared by the manufacture method of the present invention adhesive force when subzero 20 DEG C is 2-4hrs, and the adhesive force when 80 DEG C is 2-4hrs; When the lampshade substrate of the present invention is by glass ware forming, each rete of lampshade prepared by the manufacture method of the present invention adhesive force when subzero 20 DEG C is 6-9hrs, and the adhesive force when 80 DEG C is 6-9hrs; Multiple retes that the lampshade of the present invention is coated with can filter 23 more than 3% harmful blue light effectively, metal level can promote definition and anti-blue light effect effectively simultaneously, thus improving the overall definition of lampshade, definition and verity for vision have good contribution, and the filtration of harmful blue light, glare can effectively be alleviated visual fatigue. The tens of kinds of pathogenic microorganism such as escherichia coli, gonococcus, chlamydia trachomatis are had strong suppression and killing action by described nano-silver layer, and will not produce drug resistance, and the thickness of this layer is 5-20nm, it is ensured that lampshade has enough sterilizing abilities.
Accompanying drawing explanation
Below in conjunction with the drawings and specific embodiments, the present invention is described in further details:
Fig. 1 is the exploded view of the filter blue light of the present invention anti-reflection lampshade of sterilization.
Detailed description of the invention
As it is shown in figure 1, the present invention includes substrate 1, the outer surface of described substrate is sequentially provided with first rete the 2, second rete 3, third membrane layer the 4, the 4th rete the 5, the 5th rete the 6, the 6th rete 7 and the 7th rete the 8, the 8th rete 9 and the 9th rete 10 from the inside to surface; Described first rete the 2, the 4th rete 5 and the 6th rete 7 are five oxidation three titanium layers, and thickness is 10-100nm; Described second rete the 3, the 5th rete 6 and the 7th rete 8 are silicon dioxide layer, and thickness is 50-100nm; Described third membrane layer 4 is metal level, and thickness is 5-20nm; Described 8th rete 9 is nano-silver layer, and the thickness of the 8th rete is 5-20nm; Described 9th rete 10 is acrylate layer, and thickness is 5-15nm.
The film material of described metal level is gold, silver, platinum, neodymium, copper, zinc or nickel, and is deposited with molding by electron gun.
The film material of described metal level is billon, silver alloy, platinum alloy, neodymium alloy, copper alloy, kirsite or nickel alloy, and is deposited with molding by electron gun.
The film material of described nano-silver layer is the oxide of silver, and is deposited with molding by electron gun, and the oxide of described silver is Ag2O, AgO or Ag2O3��
Described substrate 1 is by resin or glass ware forming.
Embodiment 1:
When described substrate 1 is by resin forming, the manufacture method of the lampshade that the sterilization of described filter blue light is anti-reflection specifically includes following steps:
1) substrate 1 being carried out, dry: be placed in vacuum chamber by substrate, the outer surface bombarding substrate with ion gun is carried out for 2-3 minute;
2) outer surface of substrate 1 is carried out plated film;
A, plate the first rete 2:
Vacuum in vacuum coating cabin is adjusted to less than or equal to 5.0 �� 10-3Handkerchief, and control the temperature in vacuum coating cabin and be 50-70 DEG C, electron gun is adopted to bombard the film material of the first rete 2, it is deposited on the outer surface of substrate with nanoscale molecular form after the film material evaporation of the first rete 2, control simultaneously first rete 2 evaporation speed be 2.5/S, the first rete 2 ultimately form after thickness be 10-100nm; Wherein, the film material of described first rete 2 is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
B, plate the second rete 3:
Keep the vacuum in vacuum coating cabin less than or equal to 5.0 �� 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 50-70 DEG C, electron gun is adopted to bombard the film material of the second rete 3, the surface being deposited in above-mentioned steps A the first rete 2 with nanoscale molecular form after the film material evaporation of the second rete 3, control simultaneously second rete 3 evaporation speed be 7/S, the second rete 3 ultimately form after thickness be 50-100nm; Wherein, the film material of described second rete 3 is silicon dioxide, forms silicon dioxide layer;
C, plating third membrane layer 4:
Keep the vacuum in vacuum coating cabin less than or equal to 5.0 �� 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 50-70 DEG C, adopt the film material of electron gun bombardment third membrane layer 4, the surface being deposited in above-mentioned steps B the second rete 3 with nanoscale molecular form after the film material evaporation of third membrane layer 4, simultaneously control third membrane layer 4 evaporation speed be 1/S, third membrane layer 4 ultimately form after thickness be 5-20nm; Wherein, the film material of described third membrane layer 4 is gold, silver, platinum, neodymium, copper, zinc, nickel, billon, silver alloy, platinum alloy, neodymium alloy, copper alloy, kirsite or nickel alloy, forms metal level;
D, plating the 4th rete 5:
Keep the vacuum in vacuum coating cabin less than or equal to 5.0 �� 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 50-70 DEG C, adopt the film material of electron gun bombardment the 4th rete 5, the surface being deposited in above-mentioned steps C third membrane layer 4 with nanoscale molecular form after the film material evaporation of the 4th rete 5, simultaneously control the 4th rete 5 evaporation speed be 2.5/S, the 4th rete 5 ultimately form after thickness be 10-100nm; Wherein, the film material of described 4th rete 5 is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
E, plating the 5th rete 6:
Keep the vacuum in vacuum coating cabin less than or equal to 5.0 �� 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 50-70 DEG C, adopt the film material of electron gun bombardment the 5th rete 6, the surface being deposited in above-mentioned steps D the 4th rete 5 with nanoscale molecular form after the film material evaporation of the 5th rete 6, simultaneously control the 5th rete 6 evaporation speed be 7/S, the 5th rete 6 ultimately form after thickness be 50-100nm; Wherein, the film material of described 5th rete 6 is silicon dioxide, forms silicon dioxide layer;
F, plating the 6th rete 7:
Keep the vacuum in vacuum coating cabin less than or equal to 5.0 �� 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 50-70 DEG C, adopt the film material of electron gun bombardment the 6th rete 7, the surface being deposited in above-mentioned steps E the 5th rete 6 with nanoscale molecular form after the film material evaporation of the 6th rete 7, simultaneously control the 6th rete 7 evaporation speed be 2.5/S, the 6th rete 7 ultimately form after thickness be 10-100nm; Wherein, the film material of described 6th rete 7 is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
G, plating the 7th rete 8:
Keep the vacuum in vacuum coating cabin less than or equal to 5.0 �� 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 50-70 DEG C, adopt the film material of electron gun bombardment the 7th rete 8, the surface being deposited in above-mentioned steps F the 6th rete 7 with nanoscale molecular form after the film material evaporation of the 7th rete 8, simultaneously control the 7th rete 8 evaporation speed be 7/S, the 7th rete 8 ultimately form after thickness be 50-100nm; Wherein, the film material of described 7th rete 8 is silicon dioxide, forms silicon dioxide layer;
In described step 1), substrate 1 is carried out, substrate 1 is placed in vacuum chamber by dry specifically comprising the following steps that, the outer surface bombarding substrate 1 with ion gun is carried out for 2-3 minute;
H, plating the 8th rete 9:
Keep the vacuum in vacuum coating cabin more than or equal to 5.0 �� 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 50-70 DEG C, adopt the film material of electron gun bombardment the 8th rete 9, wherein the film material of the 8th rete 9 is the oxide of silver, under the effect of electron gun evaporation, the surface that the peroxide breaks down of silver is attached in above-mentioned steps G the 7th rete 8 with the form of nanometer silver, the speed simultaneously controlling the 8th rete 9 evaporation is 1/S, and the 8th rete 9 ultimately forms the nano-silver layer that thickness is 5-20nm; The oxide of wherein said silver is Ag2O, AgO or Ag2O3;
I, plating the 9th rete 10:
In above-mentioned steps H on the surface of the 8th rete 9, it is coated with water soluble acrylic resin or polyacrylic acid material by nebulization, is coated with through several times, ultimately forms the 9th rete 10 acrylate layer that thickness is 5-15nm;
It is 2-4hrs by the adhesive force when subzero 20 DEG C of each rete on the lampshade that said method prepares, adhesive force when 80 DEG C is 2-4hrs, there is very strong adhesive ability, the compactness of each rete is good simultaneously, high purity, described lampshade can filter 23 more than 3% harmful blue light effectively, visual fatigue can be effectively alleviated in the filtration of harmful blue light, glare, it is possible to improve lampshade light transmission significantly and anti-fog properties, also there is the function of sterilization.
Embodiment 2:
When described substrate 1 is by glass ware forming, the manufacture method of the lampshade that the sterilization of described filter blue light is anti-reflection specifically includes following steps:
1) substrate 1 being carried out, dry: be placed in vacuum chamber by substrate, the outer surface bombarding substrate with ion gun is carried out for 5-10 minute;
2) outer surface of substrate 1 is carried out plated film;
A, plate the first rete 2:
Vacuum in vacuum coating cabin is adjusted to less than or equal to 5.0 �� 10-3Handkerchief, and control the temperature in vacuum coating cabin and be 200-300 DEG C, electron gun is adopted to bombard the film material of the first rete 2, it is deposited on the outer surface of substrate with nanoscale molecular form after the film material evaporation of the first rete 2, control simultaneously first rete 2 evaporation speed be 2.5/S, the first rete 2 ultimately form after thickness be 10-100nm; Wherein, the film material of described first rete 2 is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
B, plate the second rete 3:
Keep the vacuum in vacuum coating cabin less than or equal to 5.0 �� 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 200-300 DEG C, electron gun is adopted to bombard the film material of the second rete 3, the surface being deposited in above-mentioned steps A the first rete 2 with nanoscale molecular form after the film material evaporation of the second rete 3, control simultaneously second rete 3 evaporation speed be 7/S, the second rete 3 ultimately form after thickness be 50-100nm; Wherein, the film material of described second rete 3 is silicon dioxide, forms silicon dioxide layer;
C, plating third membrane layer 4:
Keep the vacuum in vacuum coating cabin less than or equal to 5.0 �� 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 200-300 DEG C, adopt the film material of electron gun bombardment third membrane layer 4, the surface being deposited in above-mentioned steps B the second rete 3 with nanoscale molecular form after the film material evaporation of third membrane layer 4, simultaneously control third membrane layer 4 evaporation speed be 1/S, third membrane layer 4 ultimately form after thickness be 5-20nm; Wherein, the film material of described third membrane layer 4 is gold, silver, platinum, neodymium, copper, zinc, nickel, billon, silver alloy, platinum alloy, neodymium alloy, copper alloy, kirsite or nickel alloy, forms metal level;
D, plating the 4th rete 5:
Keep the vacuum in vacuum coating cabin less than or equal to 5.0 �� 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 200-300 DEG C, adopt the film material of electron gun bombardment the 4th rete 5, the surface being deposited in above-mentioned steps C third membrane layer 4 with nanoscale molecular form after the film material evaporation of the 4th rete 5, simultaneously control the 4th rete 5 evaporation speed be 2.5/S, the 4th rete 5 ultimately form after thickness be 10-100nm; Wherein, the film material of described 4th rete 5 is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
E, plating the 5th rete 6:
Keep the vacuum in vacuum coating cabin less than or equal to 5.0 �� 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 200-300 DEG C, adopt the film material of electron gun bombardment the 5th rete 6, the surface being deposited in above-mentioned steps D the 4th rete 5 with nanoscale molecular form after the film material evaporation of the 5th rete 6, simultaneously control the 5th rete 6 evaporation speed be 7/S, the 5th rete 6 ultimately form after thickness be 50-100nm; Wherein, the film material of described 5th rete 6 is silicon dioxide, forms silicon dioxide layer;
F, plating the 6th rete 7:
Keep the vacuum in vacuum coating cabin less than or equal to 5.0 �� 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 200-300 DEG C, adopt the film material of electron gun bombardment the 6th rete 7, the surface being deposited in above-mentioned steps E the 5th rete 6 with nanoscale molecular form after the film material evaporation of the 6th rete 7, simultaneously control the 6th rete 7 evaporation speed be 2.5/S, the 6th rete 7 ultimately form after thickness be 10-100nm; Wherein, the film material of described 6th rete 7 is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
G, plating the 7th rete 8:
Keep the vacuum in vacuum coating cabin less than or equal to 5.0 �� 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 200-300 DEG C, adopt the film material of electron gun bombardment the 7th rete 8, the surface being deposited in above-mentioned steps F the 6th rete 7 with nanoscale molecular form after the film material evaporation of the 7th rete 8, simultaneously control the 7th rete 8 evaporation speed be 7/S, the 7th rete 8 ultimately form after thickness be 50-100nm; Wherein, the film material of described 7th rete 8 is silicon dioxide, forms silicon dioxide layer;
H, plating the 8th rete 9:
Keep the vacuum in vacuum coating cabin more than or equal to 5.0 �� 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 200-300 DEG C, adopt the film material of electron gun bombardment the 8th rete 9, wherein the film material of the 8th rete 9 is the oxide of silver, under the effect of electron gun evaporation, the surface that the oxide of silver is attached in above-mentioned steps G the 7th rete 8 with the form of nanometer silver, the speed simultaneously controlling the 8th rete 9 evaporation is 1/S, and the 8th rete 9 ultimately forms the nano-silver layer that thickness is 5-20nm; The oxide of wherein said silver is Ag2O, AgO or Ag2O3;
I, plating the 9th rete 10:
In above-mentioned steps H on the surface of the 8th rete 9, it is coated with water soluble acrylic resin or polyacrylic acid material by nebulization, is coated with through several times, ultimately forms the 9th rete 10 acrylate layer that thickness is 5-15nm.
In described step 1), substrate 1 is carried out, substrate 1 is placed in vacuum chamber by dry specifically comprising the following steps that, the outer surface bombarding substrate 1 with ion gun is carried out for 5-10 minute.
It is 6-9hrs by the adhesive force when subzero 20 DEG C of each rete on the lampshade that said method prepares, adhesive force when 80 DEG C is 6-9hrs, there is very strong adhesive ability, the compactness of each rete is good simultaneously, high purity, described lampshade can filter 23 more than 3% harmful blue light effectively, visual fatigue can be effectively alleviated in the filtration of harmful blue light, glare, it is possible to improve lampshade light transmission significantly and anti-fog properties, also there is the function of sterilization.

Claims (10)

1. the lampshade that a filter blue light sterilization is anti-reflection, including substrate, it is characterised in that: the outer surface of described substrate is sequentially provided with the first rete, the second rete, third membrane layer, the 4th rete, the 5th rete, the 6th rete, the 7th rete, the 8th rete and the 9th rete from the inside to surface; Described first rete, the 4th rete and the 6th rete are five oxidation three titanium layers, and thickness is 10-100nm; Described second rete, the 5th rete and the 7th rete are silicon dioxide layer, and thickness is 50-100nm; Described third membrane layer is metal level, and thickness is 5-20nm; Described 8th rete is nano-silver layer, and the thickness of the 8th rete is 5-20nm; Described 9th rete is acrylate layer, and thickness is 5-15nm.
2. the lampshade that a kind of filter blue light according to claim 1 sterilization is anti-reflection, it is characterised in that: the film material of described metal level is gold, silver, platinum, neodymium, copper, zinc or nickel, and is deposited with molding by electron gun.
3. the lampshade that a kind of filter blue light according to claim 1 sterilization is anti-reflection, it is characterised in that: the film material of described metal level is billon, silver alloy, platinum alloy, neodymium alloy, copper alloy, kirsite or nickel alloy, and is deposited with molding by electron gun.
4. the lampshade that a kind of filter blue light according to claim 1 sterilization is anti-reflection, it is characterised in that: the film material of described nano-silver layer is the oxide of silver, and is deposited with molding by electron gun.
5. the lampshade that a kind of filter blue light according to claim 4 sterilization is anti-reflection, it is characterised in that: the oxide of described silver is Ag2O, AgO or Ag2O3��
6. the lampshade that a kind of filter blue light according to claim 1 sterilization is anti-reflection, it is characterised in that: described substrate is by resin or glass ware forming.
7. the manufacture method of the lampshade that a kind of filter blue light according to claim 6 sterilization is anti-reflection, it is characterised in that: when described substrate is by resin forming, described manufacture method specifically includes following steps:
1) substrate is carried out, dries;
2) outer surface of substrate is carried out plated film;
A, plate the first rete:
Vacuum in vacuum coating cabin is adjusted to less than or equal to 5.0 �� 10-3Handkerchief, and control the temperature in vacuum coating cabin and be 50-70 DEG C, electron gun is adopted to bombard the film material of the first rete, it is deposited on the outer surface of substrate with nanoscale molecular form after the film material evaporation of the first rete, control simultaneously first rete evaporation speed be 2.5/S, the first rete ultimately form after thickness be 10-100nm; Wherein, the film material of described first rete is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
B, plate the second rete:
Keep the vacuum in vacuum coating cabin less than or equal to 5.0 �� 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 50-70 DEG C, electron gun is adopted to bombard the film material of the second rete, the surface being deposited in above-mentioned steps A the first rete with nanoscale molecular form after the film material evaporation of the second rete, control simultaneously second rete evaporation speed be 7/S, the second rete ultimately form after thickness be 50-100nm; Wherein, the film material of described second rete is silicon dioxide, forms silicon dioxide layer;
C, plating third membrane layer:
Keep the vacuum in vacuum coating cabin less than or equal to 5.0 �� 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 50-70 DEG C, adopt the film material of electron gun bombardment third membrane layer, the surface being deposited in above-mentioned steps B the second rete with nanoscale molecular form after the film material evaporation of third membrane layer, simultaneously control third membrane layer evaporation speed be 1/S, third membrane layer ultimately form after thickness be 5-20nm; Wherein, the film material of described third membrane layer is gold, silver, platinum, neodymium, copper, zinc, nickel, billon, silver alloy, platinum alloy, neodymium alloy, copper alloy, kirsite or nickel alloy, forms metal level;
D, plating the 4th rete:
Keep the vacuum in vacuum coating cabin less than or equal to 5.0 �� 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 50-70 DEG C, adopt the film material of electron gun bombardment the 4th rete, the surface being deposited in above-mentioned steps C third membrane layer with nanoscale molecular form after the film material evaporation of the 4th rete, simultaneously control the 4th rete evaporation speed be 2.5/S, the 4th rete ultimately form after thickness be 10-100nm; Wherein, the film material of described 4th rete is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
E, plating the 5th rete:
Keep the vacuum in vacuum coating cabin less than or equal to 5.0 �� 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 50-70 DEG C, adopt the film material of electron gun bombardment the 5th rete, the surface being deposited in above-mentioned steps D the 4th rete with nanoscale molecular form after the film material evaporation of the 5th rete, simultaneously control the 5th rete evaporation speed be 7/S, the 5th rete ultimately form after thickness be 50-100nm; Wherein, the film material of described 5th rete is silicon dioxide, forms silicon dioxide layer;
F, plating the 6th rete:
Keep the vacuum in vacuum coating cabin less than or equal to 5.0 �� 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 50-70 DEG C, adopt the film material of electron gun bombardment the 6th rete, the surface being deposited in above-mentioned steps E the 5th rete with nanoscale molecular form after the film material evaporation of the 6th rete, simultaneously control the 6th rete evaporation speed be 2.5/S, the 6th rete ultimately form after thickness be 10-100nm; Wherein, the film material of described 6th rete is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
G, plating the 7th rete:
Keep the vacuum in vacuum coating cabin less than or equal to 5.0 �� 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 50-70 DEG C, adopt the film material of electron gun bombardment the 7th rete, the surface being deposited in above-mentioned steps F the 6th rete with nanoscale molecular form after the film material evaporation of the 7th rete, simultaneously control the 7th rete evaporation speed be 7/S, the 7th rete ultimately form after thickness be 50-100nm; Wherein, the film material of described 7th rete is silicon dioxide, forms silicon dioxide layer;
H, plating the 8th rete:
Keep the vacuum in vacuum coating cabin more than or equal to 5.0 �� 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 50-70 DEG C, adopt the film material of electron gun bombardment the 8th rete, wherein the film material of the 8th rete is the oxide of silver, under the effect of electron gun evaporation, the surface that the peroxide breaks down of silver is attached in above-mentioned steps G the 7th rete with the form of nanometer silver, the speed simultaneously controlling the 8th rete evaporation is 1/S, and the 8th rete ultimately forms the nano-silver layer that thickness is 5-20nm; The oxide of wherein said silver is Ag2O, AgO or Ag2O3;
I, plating the 9th rete:
In above-mentioned steps H on the surface of the 8th rete, it is coated with water soluble acrylic resin or polyacrylic acid material by nebulization, is coated with through several times, ultimately forms the 9th rete acrylate layer that thickness is 5-15nm.
8. the manufacture method of the lampshade that a kind of filter blue light according to claim 7 sterilization is anti-reflection, it is characterized in that: in described step 1), substrate is carried out, substrate is placed in vacuum chamber by dry specifically comprising the following steps that, the outer surface bombarding substrate with ion gun is carried out for 2-3 minute.
9. the manufacture method of the lampshade that a kind of filter blue light according to claim 6 sterilization is anti-reflection, it is characterised in that: when described substrate is by glass ware forming, described manufacture method specifically includes following steps:
1) substrate is carried out, dries;
2) outer surface of substrate is carried out plated film;
A, plate the first rete:
Vacuum in vacuum coating cabin is adjusted to less than or equal to 5.0 �� 10-3Handkerchief, and control the temperature in vacuum coating cabin and be 200-300 DEG C, electron gun is adopted to bombard the film material of the first rete, it is deposited on the outer surface of substrate with nanoscale molecular form after the film material evaporation of the first rete, control simultaneously first rete evaporation speed be 2.5/S, the first rete ultimately form after thickness be 10-100nm; Wherein, the film material of described first rete is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
B, plate the second rete:
Keep the vacuum in vacuum coating cabin less than or equal to 5.0 �� 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 200-300 DEG C, electron gun is adopted to bombard the film material of the second rete, the surface being deposited in above-mentioned steps A the first rete with nanoscale molecular form after the film material evaporation of the second rete, control simultaneously second rete evaporation speed be 7/S, the second rete ultimately form after thickness be 50-100nm; Wherein, the film material of described second rete is silicon dioxide, forms silicon dioxide layer;
C, plating third membrane layer:
Keep the vacuum in vacuum coating cabin less than or equal to 5.0 �� 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 200-300 DEG C, adopt the film material of electron gun bombardment third membrane layer, the surface being deposited in above-mentioned steps B the second rete with nanoscale molecular form after the film material evaporation of third membrane layer, simultaneously control third membrane layer evaporation speed be 1/S, third membrane layer ultimately form after thickness be 5-20nm; Wherein, the film material of described third membrane layer is gold, silver, platinum, neodymium, copper, zinc, nickel, billon, silver alloy, platinum alloy, neodymium alloy, copper alloy, kirsite or nickel alloy, forms metal level;
D, plating the 4th rete:
Keep the vacuum in vacuum coating cabin less than or equal to 5.0 �� 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 200-300 DEG C, adopt the film material of electron gun bombardment the 4th rete, the surface being deposited in above-mentioned steps C third membrane layer with nanoscale molecular form after the film material evaporation of the 4th rete, simultaneously control the 4th rete evaporation speed be 2.5/S, the 4th rete ultimately form after thickness be 10-100nm; Wherein, the film material of described 4th rete is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
E, plating the 5th rete:
Keep the vacuum in vacuum coating cabin less than or equal to 5.0 �� 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 200-300 DEG C, adopt the film material of electron gun bombardment the 5th rete, the surface being deposited in above-mentioned steps D the 4th rete with nanoscale molecular form after the film material evaporation of the 5th rete, simultaneously control the 5th rete evaporation speed be 7/S, the 5th rete ultimately form after thickness be 50-100nm; Wherein, the film material of described 5th rete is silicon dioxide, forms silicon dioxide layer;
F, plating the 6th rete:
Keep the vacuum in vacuum coating cabin less than or equal to 5.0 �� 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 200-300 DEG C, adopt the film material of electron gun bombardment the 6th rete, the surface being deposited in above-mentioned steps E the 5th rete with nanoscale molecular form after the film material evaporation of the 6th rete, simultaneously control the 6th rete evaporation speed be 2.5/S, the 6th rete ultimately form after thickness be 10-100nm; Wherein, the film material of described 6th rete is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
G, plating the 7th rete:
Keep the vacuum in vacuum coating cabin less than or equal to 5.0 �� 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 200-300 DEG C, adopt the film material of electron gun bombardment the 7th rete, the surface being deposited in above-mentioned steps F the 6th rete with nanoscale molecular form after the film material evaporation of the 7th rete, simultaneously control the 7th rete evaporation speed be 7/S, the 7th rete ultimately form after thickness be 50-100nm; Wherein, the film material of described 7th rete is silicon dioxide, forms silicon dioxide layer;
H, plating the 8th rete:
Keep the vacuum in vacuum coating cabin more than or equal to 5.0 �� 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 200-300 DEG C, adopt the film material of electron gun bombardment the 8th rete, wherein the film material of the 8th rete is the oxide of silver, under the effect of electron gun evaporation, the surface that the peroxide breaks down of silver is attached in above-mentioned steps G the 7th rete with the form of nanometer silver, the speed simultaneously controlling the 8th rete evaporation is 1/S, and the 8th rete ultimately forms the nano-silver layer that thickness is 5-20nm; The oxide of wherein said silver is Ag2O, AgO or Ag2O3;
I, plating the 9th rete:
In above-mentioned steps H on the surface of the 8th rete, it is coated with water soluble acrylic resin or polyacrylic acid material by nebulization, is coated with through several times, ultimately forms the 9th rete acrylate layer that thickness is 5-15nm.
10. the manufacture method of the lampshade that a kind of filter blue light according to claim 7 sterilization is anti-reflection, it is characterized in that: in described step 1), substrate is carried out, substrate is placed in vacuum chamber by dry specifically comprising the following steps that, the outer surface bombarding substrate with ion gun is carried out for 5-10 minute.
CN201511028728.6A 2015-12-31 2015-12-31 Lamp cover for blue light filtering, sterilization and reflection resisting and manufacturing method thereof Pending CN105629351A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109957758A (en) * 2017-12-25 2019-07-02 惠州比亚迪电子有限公司 A kind of colorful aluminum products and preparation method thereof, mobile phone center and phone housing

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101266309A (en) * 2008-04-25 2008-09-17 同济大学 Single peak narrowband reflection filter possessing broad low reflecting bypass belt
KR20090045647A (en) * 2007-11-02 2009-05-08 이노베이션 앤드 인피니티 글로벌 코포레이션 Extreme low resistivity light attenuation anti-reflection coating structure and method for manufacturing the same
CN102269828A (en) * 2010-11-01 2011-12-07 中南大学肝胆肠外科研究中心 Preparation method of nano-optical anti-fog film
CN103439804A (en) * 2013-09-04 2013-12-11 杏晖光学（厦门）有限公司 Anti-blue-light lens
CN103439760A (en) * 2013-09-04 2013-12-11 杏晖光学（厦门）有限公司 Manufacturing method for blue-ray-resistance lens
CN203376492U (en) * 2013-07-23 2014-01-01 厦门虹泰光学有限公司 Blue light-resistant coated eyeglass
CN103487863A (en) * 2013-10-15 2014-01-01 重庆西睿斯光电仪器有限公司 Color temperature adjusting optical film
CN103984120A (en) * 2014-05-30 2014-08-13 奥特路（漳州）光学科技有限公司 Method for manufacturing blue light-resistant optical lens

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20090045647A (en) * 2007-11-02 2009-05-08 이노베이션 앤드 인피니티 글로벌 코포레이션 Extreme low resistivity light attenuation anti-reflection coating structure and method for manufacturing the same
CN101266309A (en) * 2008-04-25 2008-09-17 同济大学 Single peak narrowband reflection filter possessing broad low reflecting bypass belt
CN102269828A (en) * 2010-11-01 2011-12-07 中南大学肝胆肠外科研究中心 Preparation method of nano-optical anti-fog film
CN203376492U (en) * 2013-07-23 2014-01-01 厦门虹泰光学有限公司 Blue light-resistant coated eyeglass
CN103439804A (en) * 2013-09-04 2013-12-11 杏晖光学（厦门）有限公司 Anti-blue-light lens
CN103439760A (en) * 2013-09-04 2013-12-11 杏晖光学（厦门）有限公司 Manufacturing method for blue-ray-resistance lens
CN103487863A (en) * 2013-10-15 2014-01-01 重庆西睿斯光电仪器有限公司 Color temperature adjusting optical film
CN103984120A (en) * 2014-05-30 2014-08-13 奥特路（漳州）光学科技有限公司 Method for manufacturing blue light-resistant optical lens

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109957758A (en) * 2017-12-25 2019-07-02 惠州比亚迪电子有限公司 A kind of colorful aluminum products and preparation method thereof, mobile phone center and phone housing
CN109957758B (en) * 2017-12-25 2021-09-17 惠州比亚迪电子有限公司 Colorful aluminum product and preparation method thereof, mobile phone middle frame and mobile phone shell

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