CN105589253B - Color membrane substrates and preparation method thereof, display device, exposure sources - Google Patents
Color membrane substrates and preparation method thereof, display device, exposure sources Download PDFInfo
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- CN105589253B CN105589253B CN201610158239.0A CN201610158239A CN105589253B CN 105589253 B CN105589253 B CN 105589253B CN 201610158239 A CN201610158239 A CN 201610158239A CN 105589253 B CN105589253 B CN 105589253B
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
- G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2008—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the reflectors, diffusers, light or heat filtering means or anti-reflective means used
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Optical Filters (AREA)
Abstract
The present invention relates to a kind of color membrane substrates and preparation method thereof, display device, exposure sources, the production method of color membrane substrates therein includes: that one layer of photoresists are formed on the substrate surface for including shading graph；The photoresists are exposed through mask plate using the first light beam and the second light beam is propagated along different directions, to form color film layer by the process for including development；Wherein, first light beam is mutually overlapped with second light beam through the region that mask plate is irradiated through the region that mask plate is irradiated, to form overlapping region and non-overlapping region in the exposure area of the photoresists；In the coloured silk film layer, it is overlapped on the part on the shading graph and is respectively positioned in the non-overlapping region.The present invention can improve the angle segment difference that color film and black matrix lap occur under traditional handicraft as a result, and help to promote the flatness of film layer and the display quality of display device.
Description
Technical field
The present invention relates to display technologies, and in particular to a kind of color membrane substrates and preparation method thereof, display device, exposure are set
It is standby.
Background technique
Thin Film Transistor-LCD (TFT-LCD) with its with high image quality, the high and low consumption power of space utilization rate,
Radiationless equal many merits become the mainstream in market.As the main component in such display device, color membrane substrates mainly pass through
Color film corresponding with sub-pixel makes the corresponding color of the light presentation of transmission.In the prior art, color film is usually with photoresists
Patterning processes are produced on the substrate for having formed black matrix (Black Matrix, BM).As shown in Figure 1, in traditional exposure
Under technique, the color film 12 formed after uniform parallel light exposure understands some overlapping edges in black matrix 11, and is easy taking
Socket part point forms bulge-structure as illustrated in FIG. 1 and generates angle segment difference, seriously affects the flatness of film layer and reduces display product
Matter.
Summary of the invention
For the defects in the prior art, the present invention provides a kind of color membrane substrates and preparation method thereof, display device, exposure
Equipment can improve the angle segment difference that color film and black matrix lap occur under traditional handicraft.
In a first aspect, the present invention provides a kind of production methods of color membrane substrates, comprising:
One layer of photoresists are formed on the substrate surface for including shading graph；
The photoresists are exposed through mask plate using the first light beam and the second light beam is propagated along different directions, with
Color film layer is formed by the process for including development；
Wherein, first light beam is irradiated with second light beam through mask plate through the region that mask plate is irradiated
Region it is mutually overlapping, to form overlapping region and non-overlapping region in the exposure area of the photoresists；The coloured silk film layer
In, it is overlapped on the part on the shading graph and is respectively positioned in the non-overlapping region.
Optionally, the beam splitting of first light beam and second light beam from beam splitting device to a branch of directional light.
Optionally, forming first light beam and the optical system of second light beam includes beam splitting device, the first polarisation
Device and the second polarizing device, in which:
The beam splitting device is used to for incident a branch of directional light being divided into the first directional light propagated along different directions and the
Two directional lights；
First polarizing device and second polarizing device are respectively used to change first directional light and described
The direction of propagation of two directional lights, to form first light beam and second light beam of directive mask plate.
Optionally, the optical system for forming first light beam and second light beam further include the first plane mirror,
Fly lens, concave mirror and the second plane mirror, in which:
First plane mirror is used to reflex to the light that light source issues the incidence surface of the fly lens；
The light that the concave mirror is used to be emitted from the fly lens is by being reflected into directional light；
Second plane mirror from the directional light of the concave mirror for that will reflect, to form the incident beam splitting device
A branch of directional light.
Optionally, described that the photoresists are exposed through mask plate using the first light beam and the second light beam, with logical
It crosses the process including development and forms color film layer, comprising:
The photoresists in the overlapping region and the first non-overlapping region are carried out using the first light beam and the first mask plate
Exposure；
The photoresists in the overlapping region and the second non-overlapping region are carried out using the second light beam and the second mask plate
Exposure.
Optionally, first light beam and the second light beam light intensity having the same；The propagation side of first light beam
The angle being equal between the direction of propagation and substrate of second light beam to the angle between substrate.
Second aspect, the present invention also provides a kind of exposure sources, including planar light source, beam splitting mechanism, mask plate to place
Mechanism and substrate placement mechanism；Wherein, the beam splitting mechanism for being by a branch of directional light beam splitting from the planar light source
The first light beam and the second light beam propagated along different directions, and penetrated respectively with predetermined angle by the mask plate placement mechanism institute
Determining mask plate plane is radiated in the base plate exposure plane determined by the substrate placement mechanism.
Optionally, the beam splitting mechanism includes beam splitting device, the first polarizing device and the second polarizing device, in which:
The beam splitting device is used to for incident a branch of directional light being divided into the first directional light propagated along different directions and the
Two directional lights；
First polarizing device and second polarizing device are respectively used to change first directional light and described
The direction of propagation of two directional lights, to form first light beam and second light beam of directive mask plate.
The third aspect, the present invention also provides a kind of color membrane substrates, the color membrane substrates are by any one of the above coloured silk film base
The production method of plate is formed
Fourth aspect, the present invention also provides a kind of display device, which includes the color film of any one of the above
Substrate.
As shown from the above technical solution, the present invention is penetrated using having different the first light beams of the direction of propagation and the second light beam
Mask plate forms overlapping region and non-overlapping region in exposure area, so that the light exposure in overlapping region is greater than non-overlapping area
The light exposure in domain.When the part coloured silk film layer be overlapped with shading graph is located in non-overlapping region, there is relatively small exposure
This part coloured silk film layer of amount will have lesser thickness.The present invention can improve color film and black matrix under traditional handicraft as a result,
The angle segment difference that lap occurs, and help to promote the flatness of film layer and the display quality of display device.
Detailed description of the invention
In order to more clearly explain the embodiment of the invention or the technical proposal in the existing technology, to embodiment or will show below
There is attached drawing needed in technical description to make one simply to introduce, it should be apparent that, the accompanying drawings in the following description is this hair
Bright some embodiments for those of ordinary skill in the art without creative efforts, can be with root
Other attached drawings are obtained according to these attached drawings.
Fig. 1 is that conventional exposure technique leads to angle segment difference Producing reason schematic diagram in the prior art；
Fig. 2 is a kind of step flow diagram of the production method of color membrane substrates in one embodiment of the invention；
Fig. 3 is a kind of principle signal being exposed using the first light beam and the second light beam in one embodiment of the invention
Figure；
Fig. 4 is the schematic diagram of the generation optical path of the first light beam of one kind and the second light beam in one embodiment of the invention；
Fig. 5 is a kind of structural schematic diagram of exposure sources in one embodiment of the invention.
Specific embodiment
In order to make the object, technical scheme and advantages of the embodiment of the invention clearer, below in conjunction with the embodiment of the present invention
In attached drawing, technical scheme in the embodiment of the invention is clearly and completely described, it is clear that described embodiment is
A part of the embodiment of the present invention, instead of all the embodiments.Based on the embodiments of the present invention, those of ordinary skill in the art
Every other embodiment obtained without creative efforts, shall fall within the protection scope of the present invention.
Fig. 2 is a kind of step flow diagram of the production method of color membrane substrates in one embodiment of the invention.Referring to figure
2, the production method of the color membrane substrates in the embodiment of the present invention includes:
Step 201: one layer of photoresists are formed on the substrate surface for including shading graph；
Step 202: use along different directions propagate the first light beam and the second light beam through mask plate to the photoresists into
Row exposure, to form color film layer by the process for including development；
Wherein, first light beam is irradiated with second light beam through mask plate through the region that mask plate is irradiated
Region it is mutually overlapping, to form overlapping region and non-overlapping region in the exposure area of the photoresists；The coloured silk film layer
In, it is overlapped on the part on the shading graph and is respectively positioned in the non-overlapping region.
It should be noted that above-mentioned color membrane substrates can be the figure and shading graph that any one includes colored filter
Board structure, and the shape of two kinds of figures and arrangement mode can be with no restrictions.Moreover, photoresists can be by including exposing
Light and the process of development form color film layer, are the raw materials to form color film layer.It is understood that the color film in the embodiment of the present invention
Layer is formed on the substrate surface including shading graph, thus there may be the parts being overlapped on shading graph.Above-mentioned
One light beam and above-mentioned second light beam can be used for the light beam being exposed to photoresists, and pass in different directions respectively
It broadcasts；It is therefore appreciated that angle, the second light beam between the first light beam and substrate and the angle between substrate, mask plate
On mask pattern, the time for exposure of angle and spacing and the first light beam and the second light beam between mask plate and substrate, be
It will affect the technology essential factor of the pattern of color film layer.And according to the pattern of required color film layer, above-mentioned each technology can be wanted
Element is configured in advance.
As a kind of specific example, Fig. 3 is a kind of principle signal being exposed using the first light beam and the second light beam
Figure.Referring to Fig. 3, Fig. 3 is logical perpendicular to the first light beam R1 and the second light beam R2 is shown in the plane of mask plate 20 and substrate 30
The color film layer 32 crossing the exposure of mask pattern opening at one and being formed.Wherein, the angle between the first light beam R1 and substrate 30 is α
1, the angle between the first light beam R2 and substrate 30 is α 2.It can be seen that for the color film layer of this part as shown in the figure
For 32, the first light beam R1 penetrates the region A1 that mask plate 20 is irradiated and the second light beam R2 and penetrates the area that mask plate 20 is irradiated
Domain A2 is mutually overlapping, to form overlapping region (region in the exposure area (forming region of i.e. color film layer 32) of photoresists
A1 and region A2 mutually overlapping region, the centrally located position in figure) and (region A1 and region A2 are mutually not in non-overlapping region
Overlapping region is located at the position on both sides in figure).In the case where the photoresists of the embodiment of the present invention are negative-working photoresist,
Photoresists other than exposure area can be removed by development, to form the color film layer for filling all exposure areas.
Further, the part on shading graph is overlapped in above-mentioned color film layer to be respectively positioned in above-mentioned non-overlapping region.
Exist such as shown in Fig. 3, in color film layer 32 with the be overlapped part in the vertical direction of shading graph 31, and these parts are respectively positioned on
In above-mentioned non-overlapping region.It is easily understood that the light exposure of the photoresists in overlapping region is the light exposure of the first light beam R1
With being superimposed for the light exposure of the second light beam R2, rather than the light exposure of the photoresists in overlapping region is only from the first light beam R1
Light exposure or the second light beam R2 light exposure.It is handed over as can be seen that the photoresists in non-overlapping region are less than in light exposure
Photoresists in folded region, thus it can have relatively small thicknesses of layers.As control, traditional handicraft shape shown in FIG. 1
During color film layer 12, the light exposure of photoresists is identical everywhere under the irradiation of collimated light beam, thus in color film layer 12 with
The thicknesses of layers for the part that shading graph 11 is overlapped in the vertical direction can be overlapped mutually with the thicknesses of layers of shading graph 11, shape
At bulge-structure as shown in Figure 1, angle segment difference is generated.And in embodiments of the present invention, the light exposure and second of the first light beam R1
The superposition of the light exposure of light beam R2 corresponds to the general thickness of color film layer 32, thus it is opposite be thinned in the vertical direction with shading
The part coloured silk film layer 32 that figure 31 is overlapped.Therefore, it is Chong Die with black matrix can to improve color film under traditional handicraft for the embodiment of the present invention
The angle segment difference that part occurs, and help to promote the flatness of film layer and the display quality of display device.
It will be understood, however, that Exposure mode illustrated in fig. 3 is only a kind of specific example, it is following at least one
The angle section that color film and black matrix lap under traditional handicraft occur can be improved by realizing in different ways in aspect similarly
Difference:
Photoresists are exposed through same mask plate using the first light beam R1 and the second light beam R2 in first, Fig. 3,
Required exposure effect can be reached by only needing one piece of mask plate to carry out single exposure.However in order to reach same exposure
Effect also can use same mask plate and is successively exposed using the first light beam and the second light beam, can also utilize two pieces
Different mask plates is successively exposed using the first light beam and the second light beam, thus the embodiment of the present invention is without limitation.
A kind of specific structure of substrate 30 in a thickness direction is shown in second, Fig. 3, however any one is needed to exist
The substrate for being at least partly overlapped on the color film layer of shading graph is formed on surface, the method that the embodiment of the present invention can be used is come
The improvement of angle segment difference is carried out, thus the embodiment of the present invention is without limitation.
Third, in example corresponding to Fig. 3, photoresists are specially negative-working photoresist, by the first light beam or the second light
The part of beam irradiation will be retained and to form color film layer.However for positive-working photoresist, by the first light beam or
The part of two light beams irradiation will be at least partially removed, and rest part is made to be used to form color film layer；Based on this
Point, holding are overlapped on the part coloured silk film layer on shading graph and are located in non-overlapping region, and overlapping region is corresponding to needs
The region of photoresists is completely removed, can equally make the part coloured silk film layer being overlapped on shading graph have relatively small
Thicknesses of layers, it is opposite to be thinned part coloured silk film layer Chong Die with shading graph in the vertical direction.Therefore, the embodiment of the present invention
To photoresists be positive-working photoresist or negative-working photoresist with no restrictions.
In example corresponding to 4th, Fig. 3, mask plate 20 is arranged in parallel with substrate 30 in exposure process.However for shape
At above-mentioned while there is the exposure area of overlapping region and non-overlapping region, mask plate 20 can in exposure process with substrate 30
At an angle, such as:, can be with when being successively exposed using two pieces of different mask plates using the first light beam and the second light beam
One piece of mask plate and the setting of the first beam orthogonal, another piece of mask plate and the second beam orthogonal are arranged respectively, and adjust two pieces
The mask pattern of mask plate is to reach same exposure effect.As a result, the present invention to mask plate in exposure process and substrate whether
It is arranged in parallel with no restrictions.
It should also be noted that, the biography of above-mentioned first light beam can be arranged in the following manner in concrete application scene
Broadcast the mask pattern in direction, the direction of propagation of the second light beam and mask plate: the first basis in the pattern of institute's coloured silk film layer to be formed
The pattern of shading graph marks off overlapping region and non-overlapping region, and then according to optical principle, (the first light beam penetrates mask plate
It being radiated on substrate and forms the first irradiation area, the second light beam forms the second irradiation area through mask plate on substrate, and first
Overlapped part is overlapping region in irradiation area and the second irradiation area, and nonoverlapping part is non-overlapping region) it sets
Set the first light beam that above-mentioned overlapping region and non-overlapping region can be formed in the case where mask plate and substrate spacing are given, the
Two light beams and mask plate.
Wherein it is understood that since the color film layer in non-overlapping region can be thinned relatively, thus it is possible in office
Cause a degree of surface indentation in portion；In this regard, the line of demarcation between non-overlapping region and overlapping region can be aligned color film
Line of demarcation in layer between the first film thickness region and the second film thickness region, wherein the second film thickness region refers to increasing surface and putting down
Whole degree and correspond to shading graph setting, region that thicknesses of layers is smaller than the first film thickness region.Thus, it is possible to by first
Further increasing for the surface smoothness of color film layer is realized in the fine setting of light beam, the second light beam and mask plate.
In addition, can be arranged as follows: the first light beam R1 has with the second light beam R2 in example corresponding to Fig. 3
Identical light intensity；The direction of propagation of angle α 1 between the direction of propagation and substrate 30 of first light beam R1 equal to the second light beam R2 with
Angle α 2 between substrate 30.Based on this, the first light beam R1 and the second light beam R2 can be according to mirror-symmetrical mode to photosensitive
Glue is exposed, allow be formed by color film layer uniformly and symmetrically expose lower surface it is smooth and bilateral symmetry, thus
With more stable optical filtering performance.
A kind of specific example of producing method as first light beam and the second light beam, Fig. 4 are a kind of first light beam and the
The schematic diagram of the generation optical path of two light beams.Referring to fig. 4, the first light beam R1 in the embodiment of the present invention and the second light beam R2 from
Beam splitting of the beam splitting device 41 to a branch of directional light, specifically:
The optical system for forming above-mentioned first light beam R1 and above-mentioned second light beam R2 includes beam splitting device 41, the first polarizer
Part 42 and the second polarizing device 43, beam splitting device 41 therein are used for incident a branch of directional light re points as along different directions biography
The the first directional light rf and the second directional light rg broadcast；First polarizing device 42 for changing the first directional light rf the direction of propagation,
To form the first light beam R1 of directive mask plate 20；Second polarizing device 43 for changing the second directional light rg the direction of propagation,
To form the second light beam R2 of directive mask plate 20.
Moreover, the optical system for forming above-mentioned first light beam R1 and above-mentioned second light beam R2 further include the first plane mirror 51,
Fly lens 52, concave mirror 53 and the second plane mirror 54, the first plane mirror 51 therein be used for the light ra that issues light source 50 into
Row reflects, and reflected light rb is incident to the incidence surface of fly lens 52；Concave mirror 53 is used to be emitted from fly lens 52
Light rc is by being reflected into directional light rd；Second plane mirror 54 from the directional light rd of concave mirror 53 for that will reflect, to be formed
A branch of directional light re of incident beamsplitter part 41.
It should be noted that light channel structure illustrated in fig. 4 is only a kind of example, the specific device ginseng of each optical device
Number, setting position, setting angle, setting spacing etc. can issue light source 50 referring to above-mentioned in concrete application scene
The treatment process of light is set according to actual needs, and the embodiment of the present invention is without limitation.
It, can be with it can be seen that the setting based on beam splitting device 41, the first polarizing device 42 and the second polarizing device 43
The direction of propagation of the first light beam R1 and the direction of propagation and the range of exposures of the second light beam R2 are adjusted, neatly to be adapted to various answer
Use scene.Moreover, the setting based on above-mentioned optical system, the optical path of the embodiment of the present invention be can be set on exposure sources, with
First light beam and the second light beam are provided in the exposure process in the manufacture craft of color membrane substrates.
It will be understood, however, that the beam splitting based on beam splitting device to a branch of directional light, it can also be logical with reference to the prior art
Other different light channel structures are crossed to generate the first light beam and the second light beam as described above, the present invention is without limitation.And
Based on the first light beam and the second light beam from beam splitting device to the beam splitting this point of a branch of directional light, can the first light beam with
Exposure process is only completed by the single exposure of photoresists under the mixing of second light beam, process flow is relatively easy；Moreover, the first light
The relative light intensity of beam and the second light beam can be modulated in same optical path by optical device, thus the control of light exposure is not
It needs using light intensity sensor, it is relatively easy.
Certainly, with it is described above consistent, in addition to using the first light beam and the second light beam through same mask plate to sense
Except the mode that optical cement is exposed, can also successively it be exposed using same mask plate using the first light beam and the second light beam
Light, or be successively exposed using two pieces of different mask plates using the first light beam and the second light beam.For example, above-mentioned step
Rapid 202:, photoresists are exposed through mask plate using the first light beam and the second light beam, to pass through the process including development
Color film layer is formed, following step not shown in figures can be specifically included:
Step 202a: using the first light beam and the first mask plate to the photoresists in overlapping region and the first non-overlapping region
It is exposed；
Step 202b: using the second light beam and the second mask plate to the photoresists in overlapping region and the second non-overlapping region
It is exposed.
Specifically, referring to Fig. 3, can first be come using the first light beam R1 through corresponding first mask plate in step 202a
Photoresists are exposed, so that the photoresists in the A1 of region are by a degree of exposure；Reuse the second light beam R2 transmission
Corresponding second mask plate is exposed photoresists, so that the photoresists in the A2 of region are by a degree of exposure.It can
With understanding, the mode of first post-exposure can reach identical exposure with exposure simultaneously in the case where light exposure control is appropriate
Effect, and the design of mask pattern is relatively easy and intuitive on mask plate under such mode, and can cooperate the first or second
Light beam is irradiated the clearly demarcated exposure process in zone boundary to photoresists.
Based on same inventive concept, Fig. 5 is a kind of structural schematic diagram of exposure sources in one embodiment of the invention.Ginseng
See that Fig. 5, the exposure mechanism of the embodiment of the present invention include planar light source 61, beam splitting mechanism 62, mask plate placement mechanism 63 and substrate
Placement mechanism 64；Wherein, beam splitting mechanism 62 will be for that will be along different directions from a branch of directional light re beam splitting of planar light source 61
The the first light beam R1 and the second light beam R2 propagated, and penetrated with predetermined angle covered determined by mask plate placement mechanism 63 respectively
Diaphragm plate plane P1 is radiated on the base plate exposure plane P2 determined by substrate placement mechanism 64.
It is understood that the exposure device of the embodiment of the present invention is specifically used for realizing the coloured silk of any one described above
Exposure process in the production method of ilm substrate, therefore can have identical or corresponding feature, such as beam splitting device in Fig. 4
41, the combination of the first polarizing device 42 and the second polarizing device 43 can be regarded as a kind of specific example of above-mentioned beam splitting mechanism 62；
And the combination of light source 50, the first plane mirror 51, fly lens 52, concave mirror 53 and the second plane mirror 54 can be regarded as putting down in Fig. 4
A kind of specific example of area source 61；The set-up mode of mask plate 20 shown in Fig. 3 and Fig. 4 and substrate 30 can be regarded as exposure mask
A kind of specific example of plate plane P1 and exposure plane P2, details are not described herein.
Based on this, the embodiment of the present invention penetrates mask plate using having different the first light beams of the direction of propagation and the second light beam
Overlapping region and non-overlapping region are formed in exposure area, so that the light exposure in overlapping region is greater than the exposure in non-overlapping region
Light quantity.When the part coloured silk film layer be overlapped with shading graph is located in non-overlapping region, there is this of relatively small light exposure
The color film layer in part will have lesser thickness.The embodiment of the present invention can improve color film and black matrix under traditional handicraft as a result,
The angle segment difference that lap occurs, and help to promote the flatness of film layer and the display quality of display device.
Further, in a kind of specific implementation of the embodiment of the present invention, beam splitting mechanism includes beam splitting device, first
Polarizing device and the second polarizing device, beam splitting device therein are used to for incident a branch of directional light being divided into and propagate along different directions
The first directional light and the second directional light；First polarizing device and the second polarizing device are respectively used to change the first directional light and the
The direction of propagation of two directional lights, to form the first light beam and the second light beam of directive mask plate.Based on this, the embodiment of the present invention can
To provide first light beam and the second light beam in the exposure process in the manufacture craft of color membrane substrates, and realize above-mentioned adopt
The Exposure mode that same mask plate is exposed photoresists is penetrated with the first light beam and the second light beam.
Based on same inventive concept, the embodiment of the present invention provide by the production method of any one of the above color membrane substrates and
The color membrane substrates of formation.As an example, it can be realized and be made by any one of the above exposure sources in the color membrane substrates
Exposure process in journey.Based on this, the embodiment of the present invention is saturating using having different the first light beams of the direction of propagation and the second light beam
It crosses mask plate and forms overlapping region and non-overlapping region in exposure area, so that the light exposure in overlapping region is greater than non-overlapping
The light exposure in region.When the part coloured silk film layer be overlapped with shading graph is located in non-overlapping region, there is relatively small exposure
This part coloured silk film layer of light quantity will have lesser thickness.The embodiment of the present invention can improve color film under traditional handicraft as a result,
The angle segment difference occurred with black matrix lap, and help to promote the flatness of film layer and the display quality of display device.
Herein on basis, the embodiment of the present invention provides a kind of display device, which includes any one of the above
Color membrane substrates.It should be noted that display device in the present embodiment can be with are as follows: display panel, Electronic Paper, mobile phone, plate
Any products or components having a display function such as computer, television set, laptop, Digital Frame, navigator.It is understood that
, since the display device of the embodiment of the present invention includes the color membrane substrates of any one of the above, can equally improve biography
The angle segment difference that color film and black matrix lap occur under technique of uniting, and help to be promoted the flatness and display device of film layer
Display quality.
It should be noted that, in this document, relational terms such as first and second and the like are used merely to a reality
Body or operation are distinguished with another entity or operation, are deposited without necessarily requiring or implying between these entities or operation
In any actual relationship or order or sequence.Moreover, the terms "include", "comprise" or its any other variant are intended to
Non-exclusive inclusion, so that the process, method, article or equipment including a series of elements is not only wanted including those
Element, but also including other elements that are not explicitly listed, or further include for this process, method, article or equipment
Intrinsic element.In the absence of more restrictions, the element limited by sentence "including a ...", it is not excluded that
There is also other identical elements in process, method, article or equipment including the element.Term " on ", "lower" etc. refer to
The orientation or positional relationship shown is to be based on the orientation or positional relationship shown in the drawings, and is merely for convenience of the description present invention and simplifies
Description, rather than the device or element of indication or suggestion meaning must have a particular orientation, constructed and grasped with specific orientation
Make, therefore is not considered as limiting the invention.Unless otherwise clearly defined and limited, term " installation ", " connected ",
" connection " shall be understood in a broad sense, for example, it may be being fixedly connected, may be a detachable connection, or be integrally connected；It can be
Mechanical connection, is also possible to be electrically connected；It can be directly connected, two can also be can be indirectly connected through an intermediary
Connection inside element.For the ordinary skill in the art, above-mentioned term can be understood at this as the case may be
Concrete meaning in invention.
In specification of the invention, numerous specific details are set forth.Although it is understood that the embodiment of the present invention can
To practice without these specific details.In some instances, well known method, structure and skill is not been shown in detail
Art, so as not to obscure the understanding of this specification.Similarly, it should be understood that disclose in order to simplify the present invention and helps to understand respectively
One or more of a inventive aspect, in the above description of the exemplary embodiment of the present invention, each spy of the invention
Sign is grouped together into a single embodiment, figure, or description thereof sometimes.
Finally, it should be noted that the above embodiments are only used to illustrate the technical solution of the present invention., rather than its limitations；To the greatest extent
Pipe present invention has been described in detail with reference to the aforementioned embodiments, those skilled in the art should understand that: its according to
So be possible to modify the technical solutions described in the foregoing embodiments, or to some or all of the technical features into
Row equivalent replacement；And these are modified or replaceed, various embodiments of the present invention technology that it does not separate the essence of the corresponding technical solution
The range of scheme should all cover in the range of specification of the invention.
Claims (8)
1. a kind of production method of color membrane substrates characterized by comprising
One layer of photoresists are formed on the substrate surface for including shading graph；
The photoresists are exposed through mask plate using the first light beam and the second light beam is propagated along different directions, to pass through
Process including development forms color film layer；
Wherein, first light beam penetrates the area that mask plate is irradiated with second light beam through the region that mask plate is irradiated
Domain is mutually overlapping, to form overlapping region and non-overlapping region in the exposure area of the photoresists；In the coloured silk film layer, take
The part on the shading graph is connect to be respectively positioned in the non-overlapping region；
The optical system for forming first light beam and second light beam includes that beam splitting device, the first polarizing device and second are inclined
Optical device, in which:
The beam splitting device is used to for incident a branch of directional light being divided into flat along the first directional light of different directions propagation and second
Row light；The beam splitting device includes the plane of incidence, the first exit facet and the second exit facet；First exit facet, described second
Exit facet is respectively relative to the plane of incidence and is obliquely installed, and first exit facet and second exit facet are crossed to form friendship
Line, first exit facet, second exit facet extend from the intersection to the direction away from the plane of incidence respectively；It is described
The incident plane of incidence of incident a branch of directional light, first directional light are flat from first exit face, described second
Row light is from second exit face；
First polarizing device and second polarizing device are respectively used to change first directional light and described second flat
The direction of propagation of row light, to form first light beam and second light beam of directive mask plate.
2. the production method of color membrane substrates according to claim 1, which is characterized in that first light beam and described second
Beam splitting of the light beam from beam splitting device to a branch of directional light.
3. the production method of color membrane substrates according to claim 1, which is characterized in that it is described formed first light beam and
The optical system of second light beam further includes the first plane mirror, fly lens, concave mirror and the second plane mirror, in which:
First plane mirror is used to reflex to the light that light source issues the incidence surface of the fly lens；
The light that the concave mirror is used to be emitted from the fly lens is by being reflected into directional light；
Second plane mirror from the directional light of the concave mirror for that will reflect, to form the one of the incident beam splitting device
Beam directional light.
4. the production method of color membrane substrates according to claim 1, which is characterized in that described to use the first light beam and second
Light beam is exposed the photoresists through mask plate, to form color film layer by the process for including development, comprising:
The photoresists in the overlapping region and the first non-overlapping region are exposed using the first light beam and the first mask plate；
The photoresists in the overlapping region and the second non-overlapping region are exposed using the second light beam and the second mask plate.
5. the production method of color membrane substrates as claimed in any of claims 1 to 4, which is characterized in that described first
Light beam and the second light beam light intensity having the same；Angle between the direction of propagation and substrate of first light beam is equal to institute
State the angle between the direction of propagation and substrate of the second light beam.
6. a kind of exposure sources, which is characterized in that placed including planar light source, beam splitting mechanism, mask plate placement mechanism and substrate
Mechanism；Wherein, the beam splitting mechanism will be for that will be to propagate along different directions from a branch of directional light beam splitting of the planar light source
The first light beam and the second light beam, and put down respectively with predetermined angle through the mask plate determined by the mask plate placement mechanism
Face is radiated in the base plate exposure plane determined by the substrate placement mechanism；
The beam splitting mechanism includes beam splitting device, the first polarizing device and the second polarizing device, in which:
The beam splitting device is used to for incident a branch of directional light being divided into flat along the first directional light of different directions propagation and second
Row light；The beam splitting device includes the plane of incidence, the first exit facet and the second exit facet；First exit facet, described second
Exit facet is respectively relative to the plane of incidence and is obliquely installed, and first exit facet and second exit facet are crossed to form friendship
Line, first exit facet, second exit facet extend from the intersection to the direction away from the plane of incidence respectively；It is described
The incident plane of incidence of incident a branch of directional light, first directional light are flat from first exit face, described second
Row light is from second exit face；
First polarizing device and second polarizing device are respectively used to change first directional light and described second flat
The direction of propagation of row light, to form first light beam and second light beam of directive mask plate.
7. a kind of color membrane substrates, which is characterized in that the color membrane substrates color film as described in any one of claim 1 to 5
The production method of substrate is formed.
8. a kind of display device, which is characterized in that the display device includes color membrane substrates as claimed in claim 7.
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| CN201610158239.0A CN105589253B (en) | 2016-03-18 | 2016-03-18 | Color membrane substrates and preparation method thereof, display device, exposure sources |
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| CN201610158239.0A CN105589253B (en) | 2016-03-18 | 2016-03-18 | Color membrane substrates and preparation method thereof, display device, exposure sources |
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| CN102854756A (en) * | 2012-08-06 | 2013-01-02 | 京东方科技集团股份有限公司 | Method and device for exposure |
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| CN2163384Y (en) * | 1992-11-10 | 1994-04-27 | 天津大学 | Tracking-counter laser doppler tachometer |
| CN1077798A (en) * | 1992-12-12 | 1993-10-27 | 天津大学 | The optic frequency shift separation method of three-dimensional laser Doppler signal and three-dimensional laser Doppler speed measuring device |
| CN1437037A (en) * | 2001-11-14 | 2003-08-20 | Jds尤尼费斯公司 | Antipolarization correlation loss light beam exchange |
| JP2007025006A (en) * | 2005-07-12 | 2007-02-01 | Fujifilm Holdings Corp | Method for manufacturing color filter, color filter, and display apparatus |
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