CN105589253A - Color film substrate and manufacturing method thereof, display device and exposure equipment - Google Patents
Color film substrate and manufacturing method thereof, display device and exposure equipment Download PDFInfo
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- CN105589253A CN105589253A CN201610158239.0A CN201610158239A CN105589253A CN 105589253 A CN105589253 A CN 105589253A CN 201610158239 A CN201610158239 A CN 201610158239A CN 105589253 A CN105589253 A CN 105589253A
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- light beam
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
- G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2008—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the reflectors, diffusers, light or heat filtering means or anti-reflective means used
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Optical Filters (AREA)
Abstract
The invention relates to a color film substrate and a manufacturing method thereof, a display device and exposure equipment. The manufacturing method of the color film substrate comprises the steps that a layer of photo-sensitive glue is formed on the surface of a substrate comprising a shading graph; a first light beam and a second light beam which are propagated in the different directions are utilized to penetrate through a film masking plate to expose the photo-sensitive glue, so that a color film layer is formed through the processes including developing; the area irradiated by the first light beam by penetrating through the film masking plate overlaps with the area irradiated by the second light beam by penetrating through the film masking plate, so that an overlapped area and a non-overlapped area are formed in an exposure area of the photo-sensitive glue; the portions, located on the shading graph in a lap joint mode, of the color film layer are all located in the non-overlapped area. Therefore, the angle section difference appearing in the overlapped portion of the color film and a black matrix in a traditional technology can be improved, and improvement of flatness of the film layer and the display quality of display devices is facilitated.
Description
Technical field
The present invention relates to Display Technique, be specifically related to a kind of color membrane substrates and preparation method thereof, aobviousShowing device, exposure sources.
Background technology
Thin Film Transistor-LCD (TFT-LCD) has high image quality, space utilization with itThe high and low consumed power of rate, the many merits such as radiationless become the main flow in market. Aobvious as suchShow the critical piece in device, color membrane substrates mainly makes by the color film corresponding with sub-pixelThe light of penetrating presents corresponding color. In prior art, color film is conventionally with the composition work of photoresistsSkill is produced on the substrate that forms black matrix (BlackMatrix, BM). As shown in Figure 1,Under traditional exposure technology, the color film 12 evenly forming after directional light exposure is understood some limitEdge is overlapped on black matrix 11, and easily forms at overlap the projection knot going out as shown in Figure 1Structure and to produce angle section poor, has a strong impact on the flatness of rete and reduces display quality.
Summary of the invention
For defect of the prior art, the invention provides a kind of color membrane substrates and preparation method thereof,Display unit, exposure sources, can improve color film and black matrix overlapping portion under traditional handicraft and separateExisting angle section is poor.
First aspect, the invention provides a kind of preparation method of color membrane substrates, comprising:
On the substrate surface that comprises shading graph, form one deck photoresists;
Use and propagate the first light beam and the second light beam along different directions and see through mask plate to described sensitizationGlue exposes, to form color rete by the process that comprises development;
Wherein, described the first light beam irradiates through mask plate region and described the second light beam are saturatingCross the region that mask plate irradiates mutually overlapping, to form in the exposure area of described photoresistsOverlapping region and non-overlapping region; In described color rete, be overlapped on described shading graphPart is all positioned at described non-overlapping region.
Alternatively, described the first light beam and described the second light beam come from beam splitting device to a branch of flatThe beam splitting of row light.
Alternatively, the optical system that forms described the first light beam and described the second light beam comprises beam splittingDevice, the first polarizing device and the second polarizing device, wherein:
Described beam splitting device for a branch of directional light of incident is divided into propagate along different directions theOne directional light and the second directional light;
Described the first polarizing device and described the second polarizing device are respectively used to change described first flatThe direction of propagation of row light and described the second directional light, to form described first light of directive mask plateBundle and described the second light beam.
Alternatively, the optical system of described the first light beam of described formation and described the second light beam is also wrappedDraw together the first level crossing, fly lens, concave mirror and the second level crossing, wherein:
Described the first level crossing reflexes to the light inlet of described fly lens for the light that light source is sentFace;
Described concave mirror is for parallel by being reflected into by the light from described fly lens outgoingLight;
Described the second level crossing is for the directional light from described concave mirror is reflected, to be formed intoPenetrate a branch of directional light of described beam splitting device.
Alternatively, described use the first light beam and the second light beam see through mask plate to described photoresistsExpose, to form color rete by the process that comprises development, comprising:
Use the first light beam and the first mask plate in described overlapping region and the first non-overlapping regionPhotoresists expose;
Use the second light beam and the second mask plate in described overlapping region and the second non-overlapping regionPhotoresists expose.
Alternatively, described the first light beam has identical light intensity with described the second light beam; DescribedThe direction of propagation that angle between the direction of propagation and the substrate of one light beam equals described the second light beam withAngle between substrate.
Second aspect, the present invention also provides a kind of exposure sources, comprises planar light source, beam splittingMechanism, mask plate placement mechanism and substrate placement mechanism; Wherein, described beam splitting mechanism will be for willFrom a branch of directional light beam splitting of described planar light source be along different directions propagate the first light beam andThe second light beam, and see through by determined the covering of described mask plate placement mechanism with preset angles respectivelyLamina membranacea plane, is radiated at by the determined base plate exposure plane of described substrate placement mechanism.
Alternatively, described beam splitting mechanism comprises beam splitting device, the first polarizing device and the second polarisationDevice, wherein:
Described beam splitting device for a branch of directional light of incident is divided into propagate along different directions theOne directional light and the second directional light;
Described the first polarizing device and described the second polarizing device are respectively used to change described first flatThe direction of propagation of row light and described the second directional light, to form described first light of directive mask plateBundle and described the second light beam.
The third aspect, the present invention also provides a kind of color membrane substrates, and described color membrane substrates is by above-mentionedThe preparation method of any one color membrane substrates forms
Fourth aspect, the present invention also provides a kind of display unit, and this display unit comprises above-mentionedAny one color membrane substrates.
As shown from the above technical solution, the present invention use have the different directions of propagation the first light beam andThe second light beam sees through mask plate and in exposure area, forms overlapping region and non-overlapping region, makesThe light exposure in overlapping region is greater than the light exposure of non-overlapping region. Overlapping with shading graphThe color rete of part while being positioned at non-overlapping region, there is this part of relatively little light exposureColor rete will have less thickness. Thus, the present invention can improve color film under traditional handicraftPoor with the angle section that black matrix lap occurs, and contribute to promote flatness and the demonstration of reteThe display quality of device.
Brief description of the drawings
In order to be illustrated more clearly in the embodiment of the present invention or technical scheme of the prior art, belowAccompanying drawing to required use in embodiment or description of the Prior Art is done to one and simply introduce, aobviousAnd easy insight, the accompanying drawing in the following describes is some embodiments of the present invention, general for this areaLogical technical staff, is not paying under the prerequisite of creative work, can also be attached according to theseFigure obtains other accompanying drawing.
Fig. 1 is the reason schematic diagram that in prior art, traditional exposure technology causes the poor generation of angle section;
Fig. 2 is the steps flow chart of a kind of preparation method of color membrane substrates in one embodiment of the inventionSchematic diagram;
Fig. 3 is that in one embodiment of the invention, a kind of the first light beam and the second light beam of using exposes to the sunThe principle schematic of light;
Fig. 4 is the generation light path of a kind of the first light beam and the second light beam in one embodiment of the inventionSchematic diagram;
Fig. 5 is the structural representation of a kind of exposure sources in one embodiment of the invention.
Detailed description of the invention
For making object, technical scheme and the advantage of the embodiment of the present invention clearer, will tie belowClose the accompanying drawing in the embodiment of the present invention, to the technical scheme in the embodiment of the present invention carry out clear,Intactly describe, obviously, described embodiment is the present invention's part embodiment, instead ofWhole embodiment. Based on the embodiment in the present invention, those of ordinary skill in the art are not havingMake the every other embodiment obtaining under creative work prerequisite, all belong to the present invention's protectionScope.
Fig. 2 is the steps flow chart of a kind of preparation method of color membrane substrates in one embodiment of the inventionSchematic diagram. Referring to Fig. 2, the preparation method of the color membrane substrates in the embodiment of the present invention comprises:
Step 201: form one deck photoresists on the substrate surface that comprises shading graph;
Step 202: use and propagate the first light beam and the second light beam along different directions and see through mask plate pairDescribed photoresists expose, to form color rete by the process that comprises development;
Wherein, described the first light beam irradiates through mask plate region and described the second light beam are saturatingCross the region that mask plate irradiates mutually overlapping, to form in the exposure area of described photoresistsOverlapping region and non-overlapping region; In described color rete, be overlapped on described shading graphPart is all positioned at described non-overlapping region.
It should be noted that, above-mentioned color membrane substrates can be that any one comprises colored filterThe board structure of figure and shading graph, and the shape of two kinds of figures and arrangement mode can be notLimit. And photoresists can form color rete by the process that comprises exposure and development,It is the raw material that forms color rete. Be understandable that, the color rete in the embodiment of the present invention formsOn the substrate surface that comprises shading graph, thereby may exist and be overlapped on shading graphPart. Above-mentioned the first light beam and above-mentioned the second light beam are all can be for photoresists are exposedLight beam, and propagate along different direction respectively; Thereby be understandable that, the first light beam withAngle between angle, the second light beam and substrate between substrate, the mask pattern on mask plate,The time for exposure of angle and spacing and the first light beam and the second light beam between mask plate and substrate,All the technology essential factors that can affect the pattern of color rete. And according to the pattern of needed color rete,Can arrange in advance above-mentioned each technology essential factor.
As a kind of concrete example, Fig. 3 is that a kind of the first light beam and the second light beam of using carries outThe principle schematic of exposure. Referring to Fig. 3, Fig. 3 is putting down perpendicular to mask plate 20 and substrate 30On face, show the first light beam R1 and the second light beam R2 by the exposure of place's mask pattern openingAnd the color rete 32 forming. Wherein, the angle between the first light beam R1 and substrate 30 is α 1,Angle between the first light beam R2 and substrate 30 is α 2. It can be seen, for as figure instituteThese a part of color rete 32, the first light beam R1 that show see through the district that mask plate 20 irradiatesThe region A2 that territory A1 and the second light beam R2 irradiate through mask plate 20 is mutually overlapping, therebyIn the exposure area of photoresists (being the formation region of color rete 32), form overlapping region (districtTerritory A1 and region A2 be overlapping region mutually, is positioned in the drawings central position) and non-overlappingRegion (region A1 and region A2 be not overlapping region mutually, is positioned in the drawings the position on both sides).Be negative-working photoresist at the photoresists of the embodiment of the present invention, the sense beyond exposure areaOptical cement all can be removed by developing, to form the color rete of filling all exposure areas.
Further, the part being overlapped on shading graph in above-mentioned color rete is all positioned at above-mentionedIn non-overlapping region. Example as shown in Figure 3, exists in color rete 32 with shading graph 31 perpendicularUpwards overlapping part of Nogata, and these parts are all positioned at above-mentioned non-overlapping region. Easily reasonSeparate, the light exposure of the photoresists in overlapping region is light exposures and second of the first light beam R1The stack of the light exposure of light beam R2, but not the light exposure of photoresists in overlapping region only fromIn the light exposure of the first light beam R1 or the light exposure of the second light beam R2. Can find out non-friendshipPhotoresists in folded region are less than the photoresists in overlapping region in light exposure, thereby it canThere is relatively little thicknesses of layers. In contrast, the traditional handicraft shown in Fig. 1 forms color reteIn 12 process, the light exposure of photoresists is identical everywhere under the irradiation of collimated light beam, thereby colorIn rete 12 with the thicknesses of layers of the overlapping part of shading graph 11 in the vertical directions can with screeningThe thicknesses of layers of light figure 11 superposes mutually, forms bulge-structure as shown in Figure 1, produces angleSection is poor. And in embodiments of the present invention, the light exposure of the first light beam R1 and the second light beam R2'sThe stack of light exposure is corresponding to the general thickness of color rete 32, thus relatively attenuate vertical sideThe upwards part color rete 32 overlapping with shading graph 31. Therefore, the embodiment of the present invention can changeThe angle section that under kind traditional handicraft, color film and black matrix lap occur is poor, and contributes to promote filmThe flatness of layer and the display quality of display device.
But be understandable that, Exposure mode illustrated in fig. 3 is only a kind of concrete example,Realize and can improve too under traditional handicraft in different ways on aspect at least one followingThe angle section that color film and black matrix lap occur is poor:
In the first, Fig. 3, adopt the first light beam R1 and the second light beam R2 to see through same mask platePhotoresists are exposed, only need a mask plate to carry out single exposure and just can reach requiredThe exposure effect of wanting. But in order to reach same exposure effect, also can utilize same to coverLamina membranacea adopts the first light beam and the second light beam successively to expose, can also utilize two differentMask plate adopts the first light beam and the second light beam successively to expose, thereby the embodiment of the present invention pairThis does not limit.
The ad hoc structure of a kind of substrate 30 shown in the second, Fig. 3 on thickness direction, however rightSmall part need to be formed to from the teeth outwards be overlapped on the base of the color rete of shading graph in any onePlate, all can carry out the poor improvement of angle section by the method for the embodiment of the present invention, thereby thisBright embodiment does not limit this.
The 3rd, in the corresponding example of Fig. 3, photoresists are specially negative-working photoresist, and it is subject toThe part of the first light beam or the second light beam irradiates will be retained and in order to form color rete. ButFor positive-working photoresist, will be by least by the part of the first light beam or the second light beam irradiatesPartly remove, and make remainder be used to form color rete; Based on this point, keepThe color rete of part being overlapped on shading graph is positioned at non-overlapping region, and by overlapping regionCorrespond to the region that need to remove photoresists completely, it can make to be overlapped on shading graph equallyOn the color rete of part there is relatively little thicknesses of layers, relatively attenuate at vertical directionThe color rete of part upper and that shading graph is overlapping. Therefore, the embodiment of the present invention to photoresists for justSexy optical cement or negative-working photoresist does not limit.
The 4th, in the corresponding example of Fig. 3, mask plate 20 is flat at exposure process with substrate 30Row arranges. But in order to form the above-mentioned exposure region simultaneously with overlapping region and non-overlapping regionTerritory, mask plate 20 can be in exposure process with substrate 30 at an angle, for example: utilizeWhen two different mask plates adopt the first light beam and the second light beam successively to expose, Ke YifenNot by vertically with the first light beam mask plate arranging, another piece mask plate is vertical with the second light beamArrange, and the mask pattern of adjusting two mask plates is to reach same exposure effect. Thus,Whether the present invention be arranged in parallel and does not limit mask plate in exposure process and substrate.
Also it should be noted that, in concrete application scenarios, can arrange in the following mannerState the direction of propagation, the direction of propagation of the second light beam and the mask pattern of mask plate of the first light beam:First in the pattern of the color rete that will form, the pattern according to shading graph marks off overlapping regionWith non-overlapping region, then according to optical principle, (the first light beam sees through mask plate and is radiated at substrateUpper formation the first irradiation area, the second light beam sees through mask plate and on substrate, forms the second irradiated regionTerritory, in the first irradiation area and the second irradiation area, overlapped part is overlapping region, noOverlapping part is non-overlapping region) arranging can be in mask plate and the given situation of substrate spacingThe first light beam, the second light beam and the mask plate of the above-mentioned overlapping region of lower formation and non-overlapping region.
Wherein be understandable that, because the color rete meeting in non-overlapping region is by relative attenuate,Thereby likely cause surface to a certain degree to cave in part; To this, can be by non-crossover regionTerritory align with the line of demarcation between overlapping region the first thickness region and the second thickness district in color reteLine of demarcation between territory, wherein the second thickness region refers to as increasing surface smoothness correspondingArrange in shading graph, thicknesses of layers is than the first little region, thickness region. Thus, canBy the first light beam, the second light beam and mask plate meticulous arranged, to realize the surface of color rete flatThe further increase of whole degree.
In addition, in the corresponding example of Fig. 3, can arrange as follows: the first light beam R1There is identical light intensity with the second light beam R2; The direction of propagation of the first light beam R1 and substrate 30Between angle α 1 equal the angle α 2 between the direction of propagation and the substrate 30 of the second light beam R2.Based on this, the first light beam R1 and the second light beam R2 can be according to the mode of Mirror Symmetry to sensitizationGlue exposes, and formed color rete can be put down at even and symmetrical exposure lower surfaceWhole and symmetrical, thus more stable optical filtering performance there is.
As the concrete example of the producing method of a kind of the first light beam and the second light beam, Fig. 4 is onePlant the schematic diagram of the generation light path of the first light beam and the second light beam. Referring to Fig. 4, the embodiment of the present inventionIn the first light beam R1 and the second light beam R2 come from beam splitting device 41 to a branch of directional light pointBundle, specifically:
The optical system that forms above-mentioned the first light beam R1 and above-mentioned the second light beam R2 comprises beam splitterPart 41, the first polarizing device 42 and the second polarizing device 43, beam splitting device 41 wherein forA branch of directional light re of incident is divided into the first directional light rf of propagating along different directions and second flatRow light rg; The first polarizing device 42 is for changing the direction of propagation of the first directional light rf, to formThe first light beam R1 of directive mask plate 20; The second polarizing device 43 is for changing the second directional lightThe direction of propagation of rg, to form the second light beam R2 of directive mask plate 20.
And the optical system that forms above-mentioned the first light beam R1 and above-mentioned the second light beam R2 is also wrappedDraw together the first level crossing 51, fly lens 52, concave mirror 53 and the second level crossing 54, whereinThe first level crossing 51 reflects for the light ra that light source 50 is sent, and reverberation rb is enteredBe incident upon the incidence surface of fly lens 52; Concave mirror 53 is for by the light from fly lens 52 outgoingLine rc is by being reflected into directional light rd; Flat for by from concave mirror 53 of the second level crossing 54Row light rd reflection, to form a branch of directional light re of incident beam splitter part 41.
It should be noted that, light channel structure illustrated in fig. 4 is only a kind of example, each opticsConcrete device parameters, the setting position of device, angle, setting space etc. are set all can beIn concrete application scenarios, the processing procedure of the above-mentioned light that light source 50 is sent of reference according to actual needsSet, the embodiment of the present invention does not limit this.
It can be seen, based on beam splitting device 41, the first polarizing device 42 and the second polarizerThe setting of part 43, can adjust the direction of propagation and the second light beam R2 of the first light beam R1 neatlyThe direction of propagation and range of exposures, to be adapted to various application scenarios. And, based on above-mentioned lightThe setting of system, the light path of the embodiment of the present invention can be arranged on exposure sources, with at coloured silkDescribed the first light beam and the second light beam is provided in the exposure process in the manufacture craft of film substrate.
But be understandable that, the beam splitting based on beam splitting device to a branch of directional light, all rightWith reference to prior art by other different light channel structures generate the first light beam as above andThe second light beam, the present invention does not limit this. And come from based on the first light beam and the second light beamThe beam splitting this point of beam splitting device to a branch of directional light, can be at the first light beam and the second light beamUnder mixing, only complete exposure process by the single exposure of photoresists, technological process is relatively simple; AndAnd the relative light intensity of the first light beam and the second light beam can pass through optics in same light pathModulate, thereby the control of light exposure do not need to use light intensity sensor, relatively simple.
Certainly, with mentioned above consistent, except adopt the first light beam and the second light beam see through withOutside the mode that mask plate exposes to photoresists, can also utilize same mask plateAdopt the first light beam and the second light beam successively to expose, or utilize two different mask platesAdopt the first light beam and the second light beam successively to expose. For instance, above-mentioned steps 202:,Use the first light beam and the second light beam to see through mask plate photoresists are exposed, with by comprisingThe process of developing forms color rete, can specifically comprise following step not shown in figures:
Step 202a: use the first light beam and the first mask plate to overlapping region and first non-overlappingPhotoresists in region expose;
Step 202b: use the second light beam and the second mask plate to overlapping region and second non-overlappingPhotoresists in region expose.
Specifically, referring to Fig. 3, in step 202a, can first use the first light beam R1 to see through phaseFirst mask plate of answering exposes to photoresists, so that the photoresists in the A1 of region are subject to oneDetermine the exposure of degree; Re-using the second light beam R2 comes photoresists through corresponding the second mask plateExpose, so that the photoresists in the A2 of region are subject to exposure to a certain extent. UnderstandableThat the mode of first post-exposure can reach with exposure simultaneously in the situation that light exposure control is appropriateIdentical exposure effect, and under this kind of mode on mask plate the design of mask pattern relatively simpleAnd directly perceived, and it is clearly demarcated to coordinate the first or second light beam to carry out irradiation area border to photoresistsExposure process.
Based on same inventive concept, Fig. 5 is a kind of exposure sources in one embodiment of the inventionStructural representation. Referring to Fig. 5, the exposure mechanism of the embodiment of the present invention comprise planar light source 61,Beam splitting mechanism 62, mask plate placement mechanism 63 and substrate placement mechanism 64; Wherein, BeamsplitterStructure 62 is for being to propagate along different directions by a branch of directional light re beam splitting from planar light source 61The first light beam R1 and the second light beam R2, and respectively with preset angles see through placed by mask plateThe determined mask plate plane P 1 of mechanism 63, is radiated at by substrate placement mechanism 64 determinedIn base plate exposure plane P 2.
Be understandable that, the exposure device of the embodiment of the present invention is mentioned above specifically for realizingAny one the preparation method of color membrane substrates in exposure process, therefore can have identicalOr corresponding feature, for example beam splitting device 41 in Fig. 4, the first polarizing device 42 and second are inclined to one sideThe combination of optical device 43 can be regarded the concrete example of one of above-mentioned beam splitting mechanism 62 as; And Fig. 4Middle light source 50, the first level crossing 51, fly lens 52, concave mirror 53 and the second level crossing 54The combination concrete example of one that can regard planar light source 61 as; Covering shown in Fig. 3 and Fig. 4Lamina membranacea 20 can be regarded mask plate plane P 1 and exposure plane P2 as with the set-up mode of substrate 30The concrete example of one, do not repeat them here.
Based on this, the embodiment of the present invention is used has the different directions of propagation the first light beam and the second lightBundle sees through mask plate and in exposure area, forms overlapping region and non-overlapping region, makes overlappingLight exposure in region is greater than the light exposure of non-overlapping region. In the part overlapping with shading graphWhen color rete is positioned at non-overlapping region, there is this part color rete of relatively little light exposureWill there is less thickness. Thus, the embodiment of the present invention can be improved color film under traditional handicraftPoor with the angle section that black matrix lap occurs, and contribute to promote flatness and the demonstration of reteThe display quality of device.
Further, in a kind of specific implementation of the embodiment of the present invention, beam splitting mechanism bagDraw together beam splitting device, the first polarizing device and the second polarizing device, beam splitting device is wherein used for willA branch of directional light of incident is divided into the first directional light and the second directional light propagated along different directions;The first polarizing device and the second polarizing device are respectively used to change the first directional light and the second directional lightThe direction of propagation, to form the first light beam and second light beam of directive mask plate. Based on this, thisInventive embodiments provides described the in can the exposure process in the manufacture craft of color membrane substratesOne light beam and the second light beam, and realize above-mentioned employing the first light beam and the second light beam and see through sameThe Exposure mode that mask plate exposes to photoresists.
Based on same inventive concept, the embodiment of the present invention provides by above-mentioned any one color film baseThe preparation method of plate and the color membrane substrates that forms. As a kind of example, can in this color membrane substratesRealize the exposure process in manufacturing process by above-mentioned any one exposure sources. Based on this, thisBright embodiment sees through mask plate and exists with having the different directions of propagation the first light beam and the second light beamIn exposure area, form overlapping region and non-overlapping region, make the light exposure in overlapping region largeIn the light exposure of non-overlapping region. Be positioned at non-overlapping with the color rete of the overlapping part of shading graphIn region time, this part color rete with relatively little light exposure will have less thickDegree. Thus, the embodiment of the present invention can be improved color film and black matrix lap under traditional handicraftThe angle section occurring is poor, and contributes to promote the flatness of rete and the display quality of display device.
On this basis, the embodiment of the present invention provides a kind of display unit, this display unit bagDraw together above-mentioned any one color membrane substrates. It should be noted that the display unit in the present embodimentCan be: display floater, Electronic Paper, mobile phone, panel computer, television set, notebook computer,Any product or parts with Presentation Function such as DPF, navigator. Be understandable that,Because the display unit of the embodiment of the present invention comprises above-mentioned any one color membrane substrates, therefore withIt is poor that sample can improve the angle section that under traditional handicraft, color film and black matrix lap occur, and helpIn promoting the flatness of rete and the display quality of display device.
It should be noted that, in this article, the relational terms such as the first and second grades onlyOnly be used for an entity or operation and another entity or operating space to separate, and not necessarilyRequire or imply between these entities or operation and have the relation of any this reality or suitableOrder. And term " comprises ", " comprising " or its any other variant are intended to contain non-rowComprising of his property, thus make to comprise process, method, article or the equipment of a series of key elementsNot only comprise those key elements, but also comprise other key elements of clearly not listing, or alsoBe included as the intrinsic key element of this process, method, article or equipment. There is no more limitsIn the situation of system, the key element being limited by statement " comprising ... ", and be not precluded within and compriseIn process, method, article or the equipment of described key element, also there is other identical element. ArtLanguage " on ", the orientation of the instruction such as D score or position relationship be based on orientation shown in the drawings orPutting relation, is only the present invention for convenience of description and simplified characterization, instead of instruction or hint instituteThe device referring to or element must have specific orientation, construct and operation with specific orientation, because ofThis can not be interpreted as limitation of the present invention. Unless otherwise clearly defined and limited, term " peaceDress ", " being connected ", " connection " should be interpreted broadly, and for example, can be to be fixedly connected with, also canBeing to removably connect, or connect integratedly; Can be mechanical connection, can be also electrical connection;Can be to be directly connected, also can indirectly be connected by intermediary, can be in two elementsThe connection of portion. For the ordinary skill in the art, can understand as the case may beAbove-mentioned term concrete meaning in the present invention.
In description of the present invention, a large amount of details are described. But can understand,Embodiments of the invention can be put into practice in the situation that there is no these details. At some examplesIn, be not shown specifically known method, structure and technology, so that not fuzzy to this descriptionUnderstanding. Similarly, should be appreciated that in order to simplify the present invention and disclose and help to understand eachOne or more in bright aspect, in the above in the description of exemplary embodiment of the present invention,Each feature of the present invention is grouped together into single embodiment, figure or retouching it sometimesIn stating.
Finally it should be noted that: above each embodiment is only in order to technical scheme of the present invention to be described,Be not intended to limit; Although the present invention is had been described in detail with reference to aforementioned each embodiment,Those of ordinary skill in the art is to be understood that: it still can be recorded aforementioned each embodimentTechnical scheme modify, or some or all of technical characterictic is wherein equal to and is replacedChange; And these amendments or replacement do not make essence disengaging the present invention of appropriate technical solution eachThe scope of embodiment technical scheme, it all should be encompassed in the middle of the scope of description of the present invention.
Claims (10)
1. a preparation method for color membrane substrates, is characterized in that, comprising:
On the substrate surface that comprises shading graph, form one deck photoresists;
Use and propagate the first light beam and the second light beam along different directions and see through mask plate to described sensitizationGlue exposes, to form color rete by the process that comprises development;
Wherein, described the first light beam irradiates through mask plate region and described the second light beam are saturatingCross the region that mask plate irradiates mutually overlapping, to form in the exposure area of described photoresistsOverlapping region and non-overlapping region; In described color rete, be overlapped on described shading graphPart is all positioned at described non-overlapping region.
2. the preparation method of color membrane substrates according to claim 1, is characterized in that, instituteState the first light beam and described the second light beam comes from the beam splitting of beam splitting device to a branch of directional light.
3. the preparation method of color membrane substrates according to claim 1, is characterized in that, shapeBecome the optical system of described the first light beam and described the second light beam to comprise beam splitting device, the first polarisationDevice and the second polarizing device, wherein:
Described beam splitting device for a branch of directional light of incident is divided into propagate along different directions theOne directional light and the second directional light;
Described the first polarizing device and described the second polarizing device are respectively used to change described first flatThe direction of propagation of row light and described the second directional light, to form described first light of directive mask plateBundle and described the second light beam.
4. the preparation method of color membrane substrates according to claim 1, is characterized in that, instituteState the optical system that forms described the first light beam and described the second light beam also comprise the first level crossing,Fly lens, concave mirror and the second level crossing, wherein:
Described the first level crossing reflexes to the light inlet of described fly lens for the light that light source is sentFace;
Described concave mirror is for parallel by being reflected into by the light from described fly lens outgoingLight;
Described the second level crossing is for the directional light from described concave mirror is reflected, to be formed intoPenetrate a branch of directional light of described beam splitting device.
5. the preparation method of color membrane substrates according to claim 1, is characterized in that, instituteState and use the first light beam and the second light beam through mask plate, described photoresists to be exposed, to lead toCross and comprise that the process of development forms color rete, comprising:
Use the first light beam and the first mask plate in described overlapping region and the first non-overlapping regionPhotoresists expose;
Use the second light beam and the second mask plate in described overlapping region and the second non-overlapping regionPhotoresists expose.
6. according to the preparation method of the color membrane substrates described in any one in claim 1 to 5,It is characterized in that, described the first light beam has identical light intensity with described the second light beam; DescribedThe direction of propagation that angle between the direction of propagation and the substrate of one light beam equals described the second light beam withAngle between substrate.
7. an exposure sources, is characterized in that, comprises planar light source, beam splitting mechanism, maskPlate placement mechanism and substrate placement mechanism; Wherein, described beam splitting mechanism is for will be from described flatA branch of directional light beam splitting of area source is the first light beam and the second light beam of propagating along different directions,And see through by the determined mask plate plane of described mask plate placement mechanism with preset angles respectively,Be radiated at by the determined base plate exposure plane of described substrate placement mechanism.
8. exposure sources according to claim 7, is characterized in that, described beam splitting mechanismComprise beam splitting device, the first polarizing device and the second polarizing device, wherein:
Described beam splitting device for a branch of directional light of incident is divided into propagate along different directions theOne directional light and the second directional light;
Described the first polarizing device and described the second polarizing device are respectively used to change described first flatThe direction of propagation of row light and described the second directional light, to form described first light of directive mask plateBundle and described the second light beam.
9. a color membrane substrates, is characterized in that, described color membrane substrates is by claim 1 to 6The preparation method of the color membrane substrates described in middle any one forms.
10. a display unit, is characterized in that, described display unit comprises as claim 9Described color membrane substrates.
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106773261A (en) * | 2017-01-05 | 2017-05-31 | 京东方科技集团股份有限公司 | The manufacture method of color membrane substrates, color membrane substrates and display panel |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1077798A (en) * | 1992-12-12 | 1993-10-27 | 天津大学 | The optic frequency shift separation method of three-dimensional laser Doppler signal and three-dimensional laser Doppler speed measuring device |
| CN2163384Y (en) * | 1992-11-10 | 1994-04-27 | 天津大学 | Tracking-counter laser doppler tachometer |
| CN1437037A (en) * | 2001-11-14 | 2003-08-20 | Jds尤尼费斯公司 | Antipolarization correlation loss light beam exchange |
| JP2007025006A (en) * | 2005-07-12 | 2007-02-01 | Fujifilm Holdings Corp | Method for manufacturing color filter, color filter, and display apparatus |
| CN102854756A (en) * | 2012-08-06 | 2013-01-02 | 京东方科技集团股份有限公司 | Method and device for exposure |
| CN102906635A (en) * | 2010-04-23 | 2013-01-30 | 株式会社V技术 | Orientation treatment method and orientation treatment device |
-
2016
- 2016-03-18 CN CN201610158239.0A patent/CN105589253B/en active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN2163384Y (en) * | 1992-11-10 | 1994-04-27 | 天津大学 | Tracking-counter laser doppler tachometer |
| CN1077798A (en) * | 1992-12-12 | 1993-10-27 | 天津大学 | The optic frequency shift separation method of three-dimensional laser Doppler signal and three-dimensional laser Doppler speed measuring device |
| CN1437037A (en) * | 2001-11-14 | 2003-08-20 | Jds尤尼费斯公司 | Antipolarization correlation loss light beam exchange |
| JP2007025006A (en) * | 2005-07-12 | 2007-02-01 | Fujifilm Holdings Corp | Method for manufacturing color filter, color filter, and display apparatus |
| CN102906635A (en) * | 2010-04-23 | 2013-01-30 | 株式会社V技术 | Orientation treatment method and orientation treatment device |
| CN102854756A (en) * | 2012-08-06 | 2013-01-02 | 京东方科技集团股份有限公司 | Method and device for exposure |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106773261A (en) * | 2017-01-05 | 2017-05-31 | 京东方科技集团股份有限公司 | The manufacture method of color membrane substrates, color membrane substrates and display panel |
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|---|---|
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