CN105338723A - DBD plasma discharge device driven by high-voltage high-frequency source - Google Patents

DBD plasma discharge device driven by high-voltage high-frequency source Download PDF

Info

Publication number
CN105338723A
CN105338723A CN201510645834.2A CN201510645834A CN105338723A CN 105338723 A CN105338723 A CN 105338723A CN 201510645834 A CN201510645834 A CN 201510645834A CN 105338723 A CN105338723 A CN 105338723A
Authority
CN
China
Prior art keywords
support plate
quartz ampoule
plasma discharge
dbd plasma
power supply
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CN201510645834.2A
Other languages
Chinese (zh)
Other versions
CN105338723B (en
Inventor
胡一波
金成刚
�田润
牟之豫
诸葛兰剑
吴雪梅
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Suzhou University
Original Assignee
Suzhou University
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Suzhou University filed Critical Suzhou University
Priority to CN201510645834.2A priority Critical patent/CN105338723B/en
Publication of CN105338723A publication Critical patent/CN105338723A/en
Application granted granted Critical
Publication of CN105338723B publication Critical patent/CN105338723B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/2406Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • HELECTRICITY
    • H02GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02MAPPARATUS FOR CONVERSION BETWEEN AC AND AC, BETWEEN AC AND DC, OR BETWEEN DC AND DC, AND FOR USE WITH MAINS OR SIMILAR POWER SUPPLY SYSTEMS; CONVERSION OF DC OR AC INPUT POWER INTO SURGE OUTPUT POWER; CONTROL OR REGULATION THEREOF
    • H02M5/00Conversion of ac power input into ac power output, e.g. for change of voltage, for change of frequency, for change of number of phases
    • H02M5/40Conversion of ac power input into ac power output, e.g. for change of voltage, for change of frequency, for change of number of phases with intermediate conversion into dc
    • H02M5/42Conversion of ac power input into ac power output, e.g. for change of voltage, for change of frequency, for change of number of phases with intermediate conversion into dc by static converters
    • H02M5/44Conversion of ac power input into ac power output, e.g. for change of voltage, for change of frequency, for change of number of phases with intermediate conversion into dc by static converters using discharge tubes or semiconductor devices to convert the intermediate dc into ac
    • H02M5/453Conversion of ac power input into ac power output, e.g. for change of voltage, for change of frequency, for change of number of phases with intermediate conversion into dc by static converters using discharge tubes or semiconductor devices to convert the intermediate dc into ac using devices of a triode or transistor type requiring continuous application of a control signal
    • H02M5/458Conversion of ac power input into ac power output, e.g. for change of voltage, for change of frequency, for change of number of phases with intermediate conversion into dc by static converters using discharge tubes or semiconductor devices to convert the intermediate dc into ac using devices of a triode or transistor type requiring continuous application of a control signal using semiconductor devices only
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/2406Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H05H1/2431Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes using cylindrical electrodes, e.g. rotary drums
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/46Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy

Abstract

The invention relates to a DBD plasma discharge device driven by a high-voltage high-frequency source. The DBD plasma discharge device comprises a high-voltage power supply, a ground electrode, a support, an air inlet pipe, a plurality of discharge tubes and a high-voltage electrode. The high-voltage power supply comprises a drive circuit, an auxiliary power supply, a rectifying circuit, an inverter circuit and a transformer, wherein the rectifying circuit, the inverter circuit and the transformer are electrically connected in sequence; the drive circuit is electrically connected with the inverter circuit; the auxiliary power supply provides power for the drive circuit; the support comprises a hollow cylinder body, a first support plate, a second support plate and a third support plate, wherein the first support plate, the second support plate and the third support plate are sequentially arranged in the cylinder body at intervals and are in seal connection with the cylinder body; the air inlet pipe passes through the third support plate and the second support plate; each discharge tube comprises an outer quartz tube and an inner quartz tube, which are in concentric circle form; one end of the outer quartz tube passes through the first support plate; the air inlet pipe is communicated with the outer quartz tube; one end of the inner quartz tube passes through the second support plate; and the high-voltage electrode comprises an electrode plate and a plurality of copper rods connected with the electrode plate, wherein the electrode plate is connected with the output end of the transformer, and the copper rods pass through the third support plate and are inserted into the inner quartz tube.

Description

The DBD plasma discharge apparatus that a kind of high voltagehigh frequency source drives
Technical field
The present invention relates to plasma discharging teclmiques, particularly relate to the DBD plasma discharge apparatus that a kind of high voltagehigh frequency source drives.
Background technology
Dielectric barrier discharge (DielectricBarrierDischarge, DBD) having dielectric to insert discharge space, producing a kind of nonequilibrium state gas discharge of plasma by applying enough alternating voltages.Owing to being under atmospheric pressure produce plasma, eliminating expensive vacuum cavity device, greatly reduce the cost of equipment, so have broad application prospects at industrial circle.Simultaneously, in DBD region of discharge, can produce a large amount of active materials, as high energy electron, ion, free radical and excited state molecule etc., these advantages make it apply in three industrial wastes purification, environment deodorizing, material surface process and modification, ozone generation etc. to be expected to realize higher efficiency.
The type of drive of DBD plasma has a lot, and high direct voltage can be adopted to drive, and also can adopt to exchange to drive.And the effect of the frequency of alternating current to electric discharge also can have a great impact.Early stage interchange drives and adopts fixing low frequency (50-60Hz) variable voltage or fixed intermediate frequency (400-600Hz) variable voltage power supply.This type of power supply cost is low, so still have use so far, but its discharging efficiency is lower.Along with the fast development of semi-conductor industry especially semiconductor switch device, the realization of medium-high frequency (a few K is to hundreds of K) frequency conversion electric discharge device becomes no longer very difficult, and can realize relatively high power, the DBD plasma making high-frequency and high-voltage drive industrially has the possibility of large-scale application.
For the application of low temperature plasma, in traditional handicraft, be widely used corona discharge and direct current glow discharge.This means technology is relatively simple, and cost is lower.But corona discharge discharge capacity is low, the active particle of generation is less, and energy is low, so efficiency is low in the application such as process gas, sewage and production ozone.And corona discharge only occurs in needle point, the plasma of Large-Area-Uniform can not be produced, therefore gradually can not meet industrial large area, high-power, high efficiency Production requirement.And traditional direct current glow discharge also also exists defect.Such as in Plasma heat teratment technology, when adopting DC power supply to produce glow discharge, suppress the arc light velocity of discharge slower and unreliable; And need when discharging to add current-limiting resistance, but current-limiting resistance can be wasted a large amount of electric energy and bring serious heating problem.In addition, often can produce hollow cathode effect in the aperture of workpiece, gap, trench portions, cause workpiece surface temperature and uneven, be difficult to obtain uniform plasma and cover.
In adopted power supply, the early stage high voltage direct current that adopts drives corona discharge, produces plasma and with " whistling " sound during electric discharge around needle point.When continuing boosted voltage, electric discharge will be converted into glow discharge.When continuing boosted voltage, discharge space may be breakdown, occurs very strong sparkover and with comparatively large " whip " sound.During sparkover, a large amount of charge concentration ground moment flows to ground electrode from high-field electrode, and discharge channel carefully strong (discharge channel diameter is less than 1mm), and discharge electrode is uneven.This situation can bring damage to sparking electrode, improves the expense of equipment operation and maintenance, is unfavorable for the work of long-time stable.So also will accurately controlled discharge voltage in traditional handicraft, and various mode be taked to prevent the generation of sparkover.
In order to overcome the deficiency that DC power supply drives, low-frequency ac high-tension electricity is also adopted to drive plasma producing apparatus in early days.The industrial-frequency alternating current of 220V, 50Hz is directly boosted to the thousands of high-tension electricity to volt up to ten thousand of same frequency by step-up transformer by this power supply.This type of drive structure is simple, but significant shortcoming is that transformer is in continuous print operating state for a long time, and volume is large, require high to step-up transformer, power is larger, and electrode puncture voltage is higher, the insulation property of winding just require height, therefore technique for coiling etc. are more difficult, and cost is also higher; Secondly, this power supply is power frequency supply, and follow-up research shows, voltage fast rising edge can bring higher discharging efficiency, so this low-frequency Alternating current discharges efficiency far is less than high-frequency alternating current.
Developed again pulse direct current glow discharge technique in the late nineteen eighties, due to adopt the pulse power, have rising edge faster, its successful is better than Traditional DC and low-frequency ac power, and due to duty ratio low, very save electric energy.But it is unfavorable for processing nonconducting matrix or film, on the other hand, the low-frequency d pulse power neither be very good for the inhibition of arc discharge and hollow cathode effect.To be conducive to improving this situation although improve pulse frequency and design effective overcurrent-overvoltage protecting circuit; and the rising edge speed (nanosecond rank) improving the pulse power can improve the flash-over characteristic of plasma greatly, but this is difficult to realize technically.Even now, be also difficult to the frequency accomplishing simultaneously to improve the pulse power and rising edge speed.
Summary of the invention
Instant invention overcomes the deficiencies in the prior art, the DBD plasma discharge apparatus that a kind of high voltagehigh frequency source drives is provided.
For achieving the above object, the technical solution used in the present invention is: the DBD plasma discharge apparatus that a kind of high voltagehigh frequency source drives, comprise high voltage source, ground electrode, support and the air inlet pipe of installing on the bracket, multiple discharge tube and high-field electrode, described high voltage source comprises drive circuit, accessory power supply and the rectification circuit be electrically connected successively, inverter circuit and transformer, described drive circuit is electrically connected with described inverter circuit, described drive circuitry given by described accessory power supply, described support comprises the cylindrical shell of hollow, interval to be located in described cylindrical shell and the first support plate be tightly connected with cylindrical shell successively, second support plate, 3rd support plate, described air inlet pipe is through described 3rd support plate, second support plate, described discharge tube comprises the outer quartz ampoule of concentric-ring pattern and interior quartz ampoule, one end of described outer quartz ampoule is through described first support plate, described air inlet pipe is communicated with described outer quartz ampoule, one end of described interior quartz ampoule is through described second support plate, described high-field electrode comprises pole plate, the multiple copper rods be connected with described pole plate, described pole plate is connected with the output of described transformer, described copper rod inserts in described interior quartz ampoule through described 3rd support plate.
In a preferred embodiment of the present invention, it is E class inverter circuit that the DBD plasma discharge apparatus that a kind of high voltagehigh frequency source drives comprises described inverter circuit further.
In a preferred embodiment of the present invention, the output voltage that the DBD plasma discharge apparatus that a kind of high voltagehigh frequency source drives comprises described accessory power supply is further 15V.
In a preferred embodiment of the present invention, the magnetic core that the DBD plasma discharge apparatus that a kind of high voltagehigh frequency source drives comprises described transformer is further UY30 ferrite high frequency magnetic core.
In a preferred embodiment of the present invention, it is 1:40-1:50 that the DBD plasma discharge apparatus that a kind of high voltagehigh frequency source drives comprises described number of primary turns further with the ratio of secondary winding turns.
In a preferred embodiment of the present invention, the DBD plasma discharge apparatus that a kind of high voltagehigh frequency source drives comprises multiple described discharge tube circular array further.
In a preferred embodiment of the present invention, the DBD plasma discharge apparatus gap comprised further between the inwall of described outer quartz ampoule and the outer wall of interior quartz ampoule that a kind of high voltagehigh frequency source drives is 1-2mm.
The present invention has following beneficial effect:
(1) on discharge mode, have selected dielectric barrier discharge (DBD) technology, relative glow discharge, the discharge capacity of DBD is large, and discharging efficiency is higher, and can produce the plasma of Large-Area-Uniform, is conducive to industrial high-power large-area application.
(2) there is medium to insert discharge space, effectively can suppress sparkover, discharge voltage can be regulated in a big way, and effectively protect sparking electrode, make electric discharge device can long-time steady operation.
(3) on driving power, adopt high voltagehigh frequency to exchange drive, both can ensure generation efficiency and the uniformity of plasma, simpler than nanosecond pulse voltage process again, relatively easily realize, be conducive to industrial reduction production cost.
(4) the complete independent development of power acquisition, can with electric discharge device matched well.
(5) power supply architecture is simple and reliable, and produce waveform stabilization, cost is lower, and components and parts all adopt industrial large power high voltage with standing device, and the design of each device leaves 3-5 allowance doubly, and power work is stablized, and the quality problems such as not easily to puncture, burn.
(6) whole system all adopts modular design, installs, simple to operate, and is conducive to the work such as maintenance, repair, test, cleaning, replacing in later stage, caters to the demand of large-scale industrial application.
Accompanying drawing explanation
Below in conjunction with drawings and Examples, the present invention is further described.
Fig. 1 is the schematic block circuit diagram of the high voltage source of the preferred embodiments of the present invention;
Fig. 2 is the circuit diagram of the high voltage source of the preferred embodiments of the present invention;
Fig. 3 is voltage, the current waveform figure of the high voltage source of the preferred embodiments of the present invention;
Fig. 4 is the rack-mount structural representations of multiple discharge tubes of the preferred embodiments of the present invention;
Fig. 5 is the cutaway view of the preferred embodiments of the present invention;
Fig. 6 is the schematic cross-section that the discharge tube of the preferred embodiments of the present invention is connected with copper rod;
Fig. 7 is the discharge effect figure of the preferred embodiments of the present invention.
Embodiment
The present invention is further detailed explanation in conjunction with the accompanying drawings and embodiments now, and these accompanying drawings are the schematic diagram of simplification, only basic structure of the present invention are described in a schematic way, and therefore it only shows the formation relevant with the present invention.
As Fig. 1, shown in Fig. 4-Fig. 6, the DBD plasma discharge apparatus that a kind of high voltagehigh frequency source drives, comprises high voltage source, ground electrode 2, support and rack-mount air inlet pipe 4, multiple discharge tube 6 and high-field electrode, high voltage source comprises drive circuit 10, accessory power supply 12 and the rectification circuit 14 be electrically connected successively, inverter circuit 16 and transformer 18, drive circuit 10 is electrically connected with inverter circuit 16, and accessory power supply 12 powers to drive circuit 10, and support comprises the cylindrical shell 20 of hollow, interval to be located in cylindrical shell 20 and the first support plate 22 be tightly connected with cylindrical shell 20 successively, second support plate 24, 3rd support plate 26, air inlet pipe 4 is through the 3rd support plate 26, second support plate 24, discharge tube 6 comprises outer quartz ampoule 28 and the interior quartz ampoule 30 of concentric-ring pattern, and one end of outer quartz ampoule 28 is through the first support plate 22, and air inlet pipe 4 is communicated with outer quartz ampoule 28, one end of interior quartz ampoule 30 is through the second support plate 24, and high-field electrode comprises pole plate 32, the multiple copper rods 34 be connected with pole plate 32, pole plate 32 is connected with the output of transformer 18, and copper rod 34 inserts in interior quartz ampoule 30 through the 3rd support plate 26.
As shown in Figure 2, 220V, in the single phase alternating current (A.C.) civil power access rectification circuit 14 of 50Hz, first AC signal waveform is become the sinusoidal signal only having the half period by rectification circuit 14 by bridge rectifier diode D1, be now but that the fluctuation of direct current signal magnitude of voltage is larger, HFS in waveform is removed to reduce the fluctuation of signal again by filter capacitor C4, finally by the direct current signal of voltage stabilizing didoe D2 stable output, output voltage 0-60V is adjustable, the maximum 12A of output current, peak power output 720W, larger electric current can be provided during work and larger voltge surge can be born, meet the demand of subsequent conditioning circuit.Principle and the rectification circuit 14 of accessory power supply 12 are similar, but do not need to export very large power, therefore, the preferred accessory power supply 12 of the present invention output voltage be 15V, power for giving drive circuit 10 and other active device.The preferred inverter circuit 16 of the present invention is E class inverter circuit, the switching device of inverter circuit 14 selects the single tube IGBT of rated voltage 1000V, rated current 60A, direct current input is charged to follow-up inductance, capacitance network by inductance L 1, and when IGBT conducting, unnecessary electric energy is discharged by IGBT by L, C network, by charge and discharge so repeatedly, then can produce alternating voltage for driving load on electric capacity C3.Drive circuit 10 adopts the EXB841 integrated drive chips of Japanese fuji company; this chip has the advantages such as isolation strength is high, reaction speed is fast; and overcurrent protection can be implemented to IGBT; by this chip and its expanded circuit coordinate the square-wave signal that produces can fast and effeciently control IGBT conducting with turn off with the charge and discharge realizing inverter circuit 16, produce the alternating current that amplitude maximum is about 800V, frequency is about 25KHz.
The magnetic core of the preferred transformer 18 of the present invention is UY30 ferrite high frequency magnetic core, and its relative permeability is 2000-2600, and the length of magnetic path is 300-360mm, and magnetic core net sectional area is 650-750mm 2, cut-off frequency is 90-110K, and the skeleton of transformer 18 is processed into by polytetrafluoroethylene is manual, and number of primary turns is 1:40-1:50 with the ratio of secondary winding turns.Preferably the relative permeability of transformer 18 is 2300 further, and the length of magnetic path is 330.8mm, and magnetic core net sectional area is 691.9mm 2, cut-off frequency is 100K, and number of primary turns is 10, and secondary winding turns is that 450(every layer 90 encloses, totally 5 layers).Because voltage is higher, need to take good insulation measures, adopt the golden finger adhesive tape of high pressure resistant high temperature to be wound around insulation between coil every layer, this golden finger adhesive tape is Kapton Tape, and thickness in monolayer is only 0.1mm, withstand voltagely reaches several kilovolts.In addition, the measure being coated with ceramic glue insulation can be taked in the position for easy disruptive discharge.
Finally, frequency adjustable by transformer 18 secondary coil output voltage amplitude 0-30kV is the High Level AC Voltage of 25KHz.In addition, also on the device of easily heating, installed heat abstractor in such as inverter circuit 16, ensure that devices function is reliable and stable, this heat abstractor is powered by accessory power supply 12.High voltage source adopts modular design, make power supply install, operation, test, maintenance all very convenient.Be that this high voltage source drives the voltage, the current waveform figure that record during plasma discharge apparatus as shown in Figure 3, wherein 1. voltage oscillogram is shown by curve, and 2. current waveform figure is shown by curve.
The outside of quartz ampoule 28 is around upper copper wire and ground connection outside, as ground electrode 2.Preferred multiple discharge tube 6 circular array of the present invention.The both ends open of outer quartz ampoule 28, one end that interior quartz ampoule 30 is positioned at outer quartz ampoule 28 is closed, and extends the other end opening outside outer quartz ampoule 28.Outer quartz ampoule 28 and the first support plate 22 junction seal and arrange, interior quartz ampoule 30 and the second support plate 24 junction seal and arrange, air inlet pipe 4 and the 3rd support plate 26, second support plate 24 junction all seal setting, guarantee that waste gas enters in outer quartz ampoule 28 along air inlet pipe 6 like this.Gap between the inwall of outer quartz ampoule 28 and the outer wall of interior quartz ampoule 30 is 1-2mm, and this gap is exactly the reaction zone producing plasma discharge.During use, pending waste gas passes into the reaction zone of each discharge tube 6 by air inlet pipe 4, under the driving of High Level AC Voltage, produce plasma and react, discharge effect as shown in Figure 7, high and the discharge stability of discharging efficiency, evenly, the clean gas after process is discharged from the end of outer quartz ampoule 28.
Above according to desirable embodiment of the present invention for enlightenment, by above-mentioned description, related personnel in the scope not departing from this invention technological thought, can carry out various change and amendment completely.The technical scope of this invention is not limited to the content on specification, must determine technical scope according to right.

Claims (7)

1. the DBD plasma discharge apparatus of a high voltagehigh frequency source driving, it is characterized in that: comprise high voltage source, ground electrode, support and the air inlet pipe of installing on the bracket, multiple discharge tube and high-field electrode, described high voltage source comprises drive circuit, accessory power supply and the rectification circuit be electrically connected successively, inverter circuit and transformer, described drive circuit is electrically connected with described inverter circuit, described drive circuitry given by described accessory power supply, described support comprises the cylindrical shell of hollow, interval to be located in described cylindrical shell and the first support plate be tightly connected with cylindrical shell successively, second support plate, 3rd support plate, described air inlet pipe is through described 3rd support plate, second support plate, described discharge tube comprises the outer quartz ampoule of concentric-ring pattern and interior quartz ampoule, one end of described outer quartz ampoule is through described first support plate, described air inlet pipe is communicated with described outer quartz ampoule, one end of described interior quartz ampoule is through described second support plate, described high-field electrode comprises pole plate, the multiple copper rods be connected with described pole plate, described pole plate is connected with the output of described transformer, described copper rod inserts in described interior quartz ampoule through described 3rd support plate.
2. the DBD plasma discharge apparatus of a kind of high voltagehigh frequency source driving according to claim 1, is characterized in that: described inverter circuit is E class inverter circuit.
3. the DBD plasma discharge apparatus of a kind of high voltagehigh frequency source driving according to claim 1, is characterized in that: the output voltage of described accessory power supply is 15V.
4. the DBD plasma discharge apparatus of a kind of high voltagehigh frequency source driving according to claim 1, is characterized in that: the magnetic core of described transformer is UY30 ferrite high frequency magnetic core.
5. the DBD plasma discharge apparatus that a kind of high voltagehigh frequency source according to claim 1 or 4 drives, is characterized in that: described number of primary turns is 1:40-1:50 with the ratio of secondary winding turns.
6. the DBD plasma discharge apparatus of a kind of high voltagehigh frequency source driving according to claim 1, is characterized in that: multiple described discharge tube circular array.
7. the DBD plasma discharge apparatus of a kind of high voltagehigh frequency AC power driving according to claim 1, is characterized in that: the gap between the inwall of described outer quartz ampoule and the outer wall of interior quartz ampoule is 1-2mm.
CN201510645834.2A 2015-10-09 2015-10-09 A kind of DBD plasma discharge apparatus of high voltagehigh frequency source driving Active CN105338723B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201510645834.2A CN105338723B (en) 2015-10-09 2015-10-09 A kind of DBD plasma discharge apparatus of high voltagehigh frequency source driving

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201510645834.2A CN105338723B (en) 2015-10-09 2015-10-09 A kind of DBD plasma discharge apparatus of high voltagehigh frequency source driving

Publications (2)

Publication Number Publication Date
CN105338723A true CN105338723A (en) 2016-02-17
CN105338723B CN105338723B (en) 2018-04-10

Family

ID=55288888

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201510645834.2A Active CN105338723B (en) 2015-10-09 2015-10-09 A kind of DBD plasma discharge apparatus of high voltagehigh frequency source driving

Country Status (1)

Country Link
CN (1) CN105338723B (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107040158A (en) * 2017-04-21 2017-08-11 哈尔滨工业大学深圳研究生院 A kind of series parallel resonance inverter circuit structure
CN107395043A (en) * 2017-08-22 2017-11-24 哈尔滨工业大学深圳研究生院 A kind of series parallel resonance inverter circuit for thering is second harmonic to suppress branch road
CN109831104A (en) * 2019-03-22 2019-05-31 江苏亚威变压器有限公司 A kind of low shelf depreciation type three-phase high-voltage silicon rectifying equipment of flashover
CN110536531A (en) * 2019-08-20 2019-12-03 南京工业大学 A kind of portable rechargeable-type plasma comb
CN113993263A (en) * 2021-11-15 2022-01-28 安徽工业大学 Atmospheric pressure plasma generator, preparation method and plasma generating device

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN201167434Y (en) * 2008-01-29 2008-12-17 华中科技大学 Plasma current-jetting apparatus
CN101330794A (en) * 2008-05-09 2008-12-24 西安交通大学 Jet apparatus capable of blocking discharging from generating low temperature plasma by atmos medium
CN203761669U (en) * 2014-01-16 2014-08-06 中国科学院等离子体物理研究所 Atmospheric pressure cold plasma generator capable of being used for wound healing
CN204145308U (en) * 2014-07-01 2015-02-04 象山星旗电器科技有限公司 High-frequency high-voltage switch power source
JP5681943B2 (en) * 2010-08-30 2015-03-11 株式会社ダイヘン High frequency power supply
CN204447754U (en) * 2015-01-12 2015-07-08 北京科技大学 Matrix form medium barrier plasma synergistic sorption/catalytic decomposition denitrification apparatus
CN104936370A (en) * 2015-06-16 2015-09-23 上海交通大学 Adjustable device for atmospheric pressure low-temperature plasma jet arrays

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN201167434Y (en) * 2008-01-29 2008-12-17 华中科技大学 Plasma current-jetting apparatus
CN101330794A (en) * 2008-05-09 2008-12-24 西安交通大学 Jet apparatus capable of blocking discharging from generating low temperature plasma by atmos medium
JP5681943B2 (en) * 2010-08-30 2015-03-11 株式会社ダイヘン High frequency power supply
CN203761669U (en) * 2014-01-16 2014-08-06 中国科学院等离子体物理研究所 Atmospheric pressure cold plasma generator capable of being used for wound healing
CN204145308U (en) * 2014-07-01 2015-02-04 象山星旗电器科技有限公司 High-frequency high-voltage switch power source
CN204447754U (en) * 2015-01-12 2015-07-08 北京科技大学 Matrix form medium barrier plasma synergistic sorption/catalytic decomposition denitrification apparatus
CN104936370A (en) * 2015-06-16 2015-09-23 上海交通大学 Adjustable device for atmospheric pressure low-temperature plasma jet arrays

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107040158A (en) * 2017-04-21 2017-08-11 哈尔滨工业大学深圳研究生院 A kind of series parallel resonance inverter circuit structure
CN107395043A (en) * 2017-08-22 2017-11-24 哈尔滨工业大学深圳研究生院 A kind of series parallel resonance inverter circuit for thering is second harmonic to suppress branch road
CN109831104A (en) * 2019-03-22 2019-05-31 江苏亚威变压器有限公司 A kind of low shelf depreciation type three-phase high-voltage silicon rectifying equipment of flashover
CN110536531A (en) * 2019-08-20 2019-12-03 南京工业大学 A kind of portable rechargeable-type plasma comb
CN113993263A (en) * 2021-11-15 2022-01-28 安徽工业大学 Atmospheric pressure plasma generator, preparation method and plasma generating device
CN113993263B (en) * 2021-11-15 2024-03-22 安徽工业大学 Atmospheric pressure plasma generator, preparation method and plasma generating device

Also Published As

Publication number Publication date
CN105338723B (en) 2018-04-10

Similar Documents

Publication Publication Date Title
EP3732703B1 (en) Inductively coupled pulsed rf voltage multiplier
CN105338723A (en) DBD plasma discharge device driven by high-voltage high-frequency source
CN103458600B (en) A kind of system producing atmospheric pressure disperse electric discharge nonequilibrium plasma
CN106879155B (en) A kind of microsecond pulse plasma jet integrative machine and its application method
CN103204570B (en) Gas dissolving device for improving gas dissolving efficiency of wastewater treatment by using electromagnetic shear field
CN107124810B (en) A kind of DBD high-frequency bipolar millimicrosecond pulse generator based on magnetic compression
Jin et al. Novel RDD pulse shaping method for high-power high-voltage pulse current power supply in DBD application
Fang et al. Compact microsecond pulsed power generator driven by solar energy for dielectric barrier discharge applications
Wang et al. Repetitive high-voltage pulse modulator using bipolar Marx generator combined with pulse transformer
Amjad et al. Design and development of a high-voltage transformer-less power supply for ozone generators based on a voltage-fed full bridge resonant inverter
Wang et al. Repetitive high voltage all-solid-state Marx generator for dielectric barrier discharge pulsed plasma
KR101706775B1 (en) Power supply device for plasma generator with resonant converter
KR102486653B1 (en) Atmospheric Pressure Plasma Generation Apparatus
Jiang et al. A compact repetitive nanosecond pulsed power generator based on transmission line transformer
Du et al. A 25kW silicon carbide 3kV/540V series-resonant converter for electric aircraft systems
CN112054786A (en) Nanosecond high-voltage pulse power supply, ozone generator and electrostatic dust collector
RU2459395C1 (en) Linear induction accelerator
CN201628685U (en) ICP auto-ignition device
CN108173431B (en) High-voltage direct-current energy-taking converter based on synchronous conduction technology
Kołek et al. Resonant, high voltage power supply for non-thermal plasma reactors
CN219876183U (en) Square wave driving damping sine pulse high-voltage power supply suitable for DBD excimer UV lamp
Tang et al. Circuit analysis and modeling of a soft-switching pulse power supply based on full-bridge inverter for DBD application
CN115459603B (en) Synthetic jet flow generating circuit based on isolation saturated inductor
Tang et al. Analysis and experimental validation of an integrated current-source power supply with high power factor for DBD applications
CN219304718U (en) Bipolar pulse current source type driving circuit suitable for dielectric barrier discharge

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant
CB03 Change of inventor or designer information
CB03 Change of inventor or designer information

Inventor after: Wu Xuemei

Inventor after: Hu Yibo

Inventor after: Jin Chenggang

Inventor after: Zhuge Lanjian

Inventor after: Tian Run

Inventor after: Mou Zhiyu

Inventor before: Hu Yibo

Inventor before: Jin Chenggang

Inventor before: Tian Run

Inventor before: Mou Zhiyu

Inventor before: Zhuge Lanjian

Inventor before: Wu Xuemei