CN105185843A - Strippable any imaging transparent conductive thin film and applications thereof - Google Patents
Strippable any imaging transparent conductive thin film and applications thereof Download PDFInfo
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Abstract
The invention belongs to the photoelectric device field, and discloses a strippable any imaging transparent conductive thin film. The transparent conductive thin film comprises a substrate, a transparent conductive thin film layer and a conductive thin layer which are arranged from bottom to top in order. The adhesive force between the substrate and the transparent conductive thin film layer is more than the adhesive force between the transparent conductive thin film layer and the conductive thin layer. The conductive thin layer is strippable. The transparent conductive thin film further comprises a middle layer, an ultrathin interface modification layer or a substrate interface modification layer. When the provided transparent conductive thin film is applied, the conductive thin layer can be stripped according to needs, the transparent conductive thin film layer is reserved and a strippable any imaging transparent conductive thin film is formed. The provided transparent conductive thin film has wide application prospects as a transparent electrode of a photoelectric device or a transparent window with electromagnetic wave interference resistance and the like.
Description
Technical field
The invention belongs to field of photoelectric devices, be specifically related to a kind of transparent conductive film and application thereof of taking off arbitrary graphic.
Background technology
The transparent conductive oxide (TCO) being representative with tin-doped indium oxide (ITO), fluorine doped tin oxide (FTO) and Al-Doped ZnO (AZO) film has that forbidden band is wide, visible range light transmission is high and the common light electrical characteristics such as resistivity is low usually, is widely used in solar cell, plane display, the interference of specific function window coating, anti-electromagnetic wave and other field of photoelectric devices.In recent years, oxide-metal-oxide is (as ITO|Ag|ITO, AZO|Ag|AZO, NiO|Ag|NiO etc.) and the transparent conductive film of the development such as metal Nano structure base transparent conductive composite films be also progressively applied to the fields such as solar cell, display and electromagnetism interference.Usually require that at least one electrode is transparent conductive film at the photoelectric field such as solar cell, display, require high transmission rate and high conductivity.But some special dimension, as translucent solar cell or all-transparent display, requires that upper/lower electrode has transparent requirement.In the place of anti-electromagnetic interference, nontransparent nickeline metal composite coating or metallic film is used usually all to have good electrical magnetic reactance interference performance, but should high light transmittance the window material of strong anti-electromagnetic interference capability and window film still have very strong application, as military aircraft window, instrument window and the watch window etc. requiring place, good electrical magnetic screen field again.High printing opacity and high connductivity film normally restriction and contradictory mutually, increase film thickness can improve Thin film conductive ability usually, but can reduce light transmittance.In solar cells, increase light transmission and can improve cell light absorption, but film rectangular resistance increase causes high series resistance, reduces battery efficiency.At luminescence display as in organic luminescent device (OLED), high euphotic electrode can improve the light effusion of OLED, but high value electrode needs more high driving voltage and cause more high energy dissipation.In anti electromagnetic wave interference place, low resistance thin film is conducive to improving anti-electromagnetic interference capability, and high value transparent window will reduce anti electromagnetic wave interference performance.In order to reduce its negative effect in practical application, reducing high value transparent membrane area coverage as far as possible, increasing the area coverage of low resistance film, normally a kind of feasible solution.Conventional transparent conductive film is as ITO, FTO and AZO at present, oxide-metal-oxide electroconductive film is as AZO|Ag|AZO, after metal Nano structure base composition transparent conductive composite films etc. prepares transparent conductive film on substrate, prior art means graphically adjust flexibly as required with regard to being difficult in subsequent applications, and this makes troubles for the later stage is applied and improve application cost.
Summary of the invention
The present invention overcomes the above-mentioned shortcoming of prior art, propose a kind of transparent conductive film of taking off arbitrary graphic, can Upper conductive film be peeled off as required and expose lower floor's transparent conductive film window in actual use, and other unstripped parts still keep the film with satisfactory electrical conductivity, the transparent conductive film of taking off arbitrary graphic of the present invention in use has very strong flexibility and operability.
The present invention proposes a kind of transparent conductive film of taking off arbitrary graphic, it comprises substrate and the transparent conductive film deposited successively from bottom to up over the substrate and conductive membrane layer.Wherein, the adhesive force between described substrate and transparent conductive film layer is greater than the adhesive force between transparent conductive film layer and conductive membrane layer; Described conductive membrane layer is peelable.
In the present invention, conductive membrane layer can be peeled off as required.Because the adhesive force between substrate and transparent conductive film layer is obviously greater than the adhesive force between transparent conductive film layer and conductive membrane layer, therefore, when peeling off conductive membrane layer, not peeling off phenomenon between transparent conductive film layer and substrate, thus the transparent conductive film forming arbitrary graphic.
The transparent conductive film of taking off arbitrary graphic of the present invention comprises intermediate layer further.By introducing intermediate layer between described transparent conductive film layer and described conductive membrane layer, thus weaken the adhesive force between described transparent conductive film layer and described conductive membrane layer.Preferably, described intermediate layer comprises LiF, common salt, carbon film, organic molecule, polymeric material, molybdenum oxide, silane etc.
The transparent conductive film of taking off arbitrary graphic of the present invention comprises ultra-thin interface-modifying layer further.Described ultra-thin interface-modifying layer is formed the modifying interface mode of transparent conductive film layer by adopting, thus weakens the adhesive force between described transparent conductive film layer and conductive membrane layer.Wherein, in order to adopt nitrogen, oxygen, Ar, methane, acetylene, hydrogen, steam etc., surface plasma process is carried out to the modifying interface of transparent conductive film layer, or pass into the methods such as silane gas, thus form self-assembling ultrathin interface-modifying layer etc., weaken the adhesive force between described transparent conductive film layer and conductive membrane layer.
The transparent conductive film of taking off arbitrary graphic of the present invention comprises substrate interface decorative layer further.By carrying out chemistry or physical modification at substrate surface to form substrate interface decorative layer, thus strengthen the adhesive force between described substrate and transparent conductive film layer.Wherein, describedly carry out chemistry or physical modification is included in substrate surface buffer layer, substrate surface alligatoring at substrate surface, pass into gas and carry out the methods such as surface plasma process, form substrate interface decorative layer.Preferably, described substrate interface decorative layer is the functionalised silica gel layer in substrate surface coating.Preferably, coating functions layer of silica gel on the surface of a substrate, with the process of oxygen/argon surface plasma or form hydroxyl with alkaline solution treatment such as NaOH at substrate surface.Described " functionalised silica gel layer " refers to containing silane coupler in layer of silica gel, by " functionalised silica gel layer " effect, transparent conductive film is connected by covalent bond or ionic bond with substrate; " silane coupler " refers to the silane containing alkoxy grp, and typical silane coupler is as methacryloxypropyl trimethyl silane, tetraethoxysilance, propyl silane and 1,2-bis-(triethoxysilyl) ethane etc.
In the present invention, substrate can be any one of any transparent material such as glass, plastics, quartz and sapphire.
In the present invention, transparent conductive film layer is the transparent metal film that metal or metal alloy is formed, and can be transparent conductive oxide film, can also be the laminated film that transparent conductive oxide/metal/transparent conductive oxide (O/M/O) forms.
Wherein, the transparent metal film of metal or metal alloy formation is any one of the transparent metal film of the unitary such as aluminium, titanium, chromium, nickel, iron, copper, silver, gold, titanium chromium, silver-colored aluminium, magnalium, titanium is silver-colored, magnesium is silver-colored, nickeline, Ag-Cu-Zn or multicomponent alloy formation.
Wherein, transparent conductive oxide film is Al-Doped ZnO (AZO), gallium-doped zinc oxide (GZO), mixes any one of the transparent conductive film that indium zinc oxide (IZO), tin-doped indium oxide (ITO), fluorine doped tin oxide (FTO) etc. formed.
Wherein, the transparent conductive film that transparent conductive oxide/metal/transparent conductive oxide (O/M/O) multi-layered composite system is formed is any one of the systems such as AZO|Ag|AZO, ZnO|Ag|ZnO, GZO|Ag|GZO.
Any one of the translucent or opaque metal film of the formation of the unitary such as in the present invention, that conductive membrane layer is metal or metal alloy is as silver-colored in aluminium, titanium, chromium, nickel, iron, copper, silver, titanium chromium, silver-colored aluminium, magnalium, titanium silver, magnesium, nickeline, Ag-Cu-Zn or multicomponent alloy.
In the present invention, intermediate layer is for weakening the tack of transparent conductive film and conductive membrane layer.Intermediate layer can select LiF, common salt, carbon film etc. to form one deck physics film.
In the present invention, weaken the tack between transparent conductive film and conductive membrane layer, physico-chemical process can also be adopted as plasma treatment, hydride modified process transparent conductive film interface, such as, pass into nitrogen, oxygen, Ar, methane, acetylene, hydrogen or steam to carry out surface plasma process or pass into silane gas forming ultra-thin interface-modifying layer, thus weaken chemical bond between transparent conductive film and conductive membrane layer and contact, weaken the tack between transparent conductive film and conductive membrane layer.
The invention allows for the preparation method of the transparent conductive film of above-mentioned taking off arbitrary graphic, vacuum thermal evaporation plated film, magnetron sputtering deposition, chemical vapour deposition (CVD) (CVD), solwution method spin coating, print, scrape figure film forming etc., obtain the transparent conductive film of taking off arbitrary graphic.
In a specific embodiment, preparation method of the present invention comprises following concrete steps: select high-transparent glass, first use cleaning procedure that glass surface is totally clear, then with NaOH solution or HF solution, surface coarsening and hydroxylating are carried out to glass, then dry.Ready glass is put into vacuum thermal evaporation system vacuumize, then steaming degree TiCr or NiCr alloy transparent conductive film, then evaporate LiF film and Ag layer.
Preferably, metal or metal alloy film, transparent conductive oxide and intermediate layer are prepared by modes such as magnetron sputtering, vacuum thermal evaporation, electron beam evaporation and laser depositions, and also prepared by the mode such as available print, printing and spin coating.As prepared transparent conductive film with thermal evaporation, first at deposited on substrates transparent conductive film, then depositing inter-layer and conductive membrane layer.In order to improve substrate and transparent conductive film adhesive force, substrate surface is by raising and transparent conductive film adhesive force such as plasma treatment, silane chemistries modification, chemical cleaning alligatoring and plus substrate temperature.As adopted magnetron sputtering deposition transparency conducting layer, intermediate layer and conductive membrane layer, substrate sputters transparent conductive film layer, intermediate layer and conductive membrane layer successively.Substrate surface cleaning, physical chemistry process and the parameter such as underlayer temperature and bias voltage to raising substrate and transparent conductive film adhesive force closely related, sputtering parameter such as power, air pressure, sputter rate, O2 to Ar ratio, each layer film thickness, target and substrate spacing and angle etc. can adjust as required.Adhesive force between substrate and transparent conductive film will obviously be greater than adhesive force between transparent conductive film and conductive membrane layer, when being convenient to follow-up viscosity instrument stripping conductive film, only peels off Upper conductive film and lower floor's transparent conductive film does not affect by stripping.In the present invention, the adhesive force between described transparent conductive film layer and conductive membrane layer is starkly lower than the adhesive force between described substrate and transparent conductive film.LiF, organic molecule layer, non-functionalized silylation layer etc. are inserted in intermediate layer.Here refer to " non-functionalized silylation layer " refer to middle the silylation layer that formed and between the transparent conductive film layer of lower floor and Upper conductive thin layer mainly with van der Waals interaction, covalent bond and ionic bond effect negligible amounts or more weak.
The invention allows for the transparent conductive film of taking off arbitrary graphic in the application as each side such as the transparency electrode of photoelectric device or the transparent windows of anti-electromagnetic wave interference.
In the present invention, when adhesive force between substrate and the transparent conductive film adhesive force be obviously greater than between transparent conductive film layer and conductive membrane layer refers to and peels off Upper conductive film, Upper conductive film can thoroughly be peeled off and lower floor's transparent conductive film layer can not anyly come off.In the present invention, as long as the adhesive force between substrate and transparent conductive film obviously will be greater than the adhesive force between transparent conductive film layer and conductive membrane layer, transparent conductive film is not peeled off by conductive membrane layer to be affected, and intermediate layer and/or ultra-thin interface-modifying layer can omit.
The present invention's innovation is, between transparent conductive film layer and conductive membrane layer, introduce intermediate layer or modifying interface is carried out to transparent conductive film layer, thus the adhesive force weakened between transparent conductive film layer and conductive membrane layer, and between transparent conductive film layer and substrate, keep enough adhesive force, when peeling off Upper conductive film, lower floor's transparent conductive film is unaffected.The position of electrically conducting transparent window as required, peels off flexibly Upper conductive film and intact reservation lower floor transparent conductive film, thus forms the transparent conductive film window that figure can design arbitrarily.
The present invention's innovation is, by carrying out chemistry or physical modification at substrate surface, make, between transparent conductive film layer and substrate, there is very strong adhesive force, and between transparent conductive film and conductive membrane layer, introduce intermediate layer or the modifying interface to transparent conductive film layer, between transparent conductive film layer and conductive membrane layer, adhesive force is starkly lower than the adhesive force between substrate and transparent conductive film, unaffected with lower floor's transparent conductive film when adhesive tape and seal stripping Upper conductive film, obtain the patterned transparent conductive film window that can design arbitrarily thus, and unstripped full structural membrane still with the conductive film of patterned linking into an integrated entity of transparent conductive film window.With the patterned structure of transparent conductive film that above-mentioned design obtains, scope all should be belonged to.
Accompanying drawing explanation
Fig. 1 is the schematic cross-section of the transparent conductive film of taking off arbitrary graphic of the present invention in embodiment 1.
Fig. 2 is the schematic cross-section of the transparent conductive film of taking off arbitrary graphic of the present invention in embodiment 2.
Fig. 3 is the schematic cross-section of the taking off arbitrary graphic transparent conductive film of the present invention in embodiment 3.
Fig. 4 is the schematic cross-section of the taking off arbitrary graphic transparent conductive film of the present invention in embodiment 4.
Embodiment
In conjunction with following specific embodiments and the drawings, the present invention is described in further detail, and protection content of the present invention is not limited to following examples.Under the spirit and scope not deviating from inventive concept, the change that those skilled in the art can expect and advantage are all included in the present invention, and are protection range with appending claims.Implement process of the present invention, condition, reagent, experimental technique etc., except the following content mentioned specially, be universal knowledege and the common practise of this area, the present invention is not particularly limited.
As Fig. 1-Fig. 4,1 represents substrate, and 10 represent substrate interface decorative layer, and 2 represent transparent conductive film layer, and 21 represent ultra-thin interface-modifying layer, and 3 represent intermediate layer, and 4 represent conductive membrane layer.
As shown in Fig. 1 (a) He (b), the transparent conductive film of taking off arbitrary graphic of the present invention, comprises substrate 1, transparent conductive film layer 2, intermediate layer 3 and conductive membrane layer 4 from bottom to up successively.Adhesive force between described substrate 1 and transparent conductive film layer 2 is greater than the adhesive force between transparent conductive film layer 2 and conductive membrane layer 4.
Wherein, substrate 1 is glass, and substrate 1 can also be any one of plastics, quartz or sapphire.Transparent conductive film layer 2 is transparent metal films that aluminium is formed; Can also be aluminium, the transparent metal film that formed of titanium, chromium, nickel, iron, copper, silver, gold, titanium chromium, silver-colored aluminium, magnalium, titanium silver, the unitary such as magnesium silver-colored, nickeline, Ag-Cu-Zn or multicomponent alloy any one; Can also be the transparent conductive film that AZO transparent conductive oxide is formed, can also be the transparent conductive film of the transparent conductive oxide formation such as AZO, GZO, IZO, ITO, FTO any one.Any one of transparent, the translucent or opaque metal film that the unitary such as conductive membrane layer 4 is aluminium, titanium, chromium, nickel, iron, copper, silver, titanium chromium, silver-colored aluminium, magnalium, titanium silver, magnesium silver-colored, nickeline, Ag-Cu-Zn or multicomponent alloy are formed.Intermediate layer 3 is LiF; Any one of LiF, common salt, carbon film, organic molecule, polymeric material, molybdenum oxide, silane etc. can also be selected.
In a specific embodiment, can also adopt and the transition zone that the method for modifying interface etc. forms one deck reduction transparent conductive film 2 and conductive membrane layer 4 adhesive force is carried out to transparent conductive film layer 2, be i.e. ultra-thin interface-modifying layer 21, as shown in Figure 2.The described modifying interface method to transparent conductive film layer 2 comprises employing and passes into nitrogen, oxygen, Ar, methane, acetylene, hydrogen or steam and carry out surface plasma process or pass into silane gas forming self-assembling ultrathin interface-modifying layer.
The present invention can also by introducing intermediate layer 3 between transparent conductive film layer 2 and conductive membrane layer 4, adhesive force between transparent conductive film layer 2 and conductive membrane layer 4 is made to be starkly lower than the adhesive force between transparent conductive film layer 2 and substrate 1, then adopt adhesive tape or graphical seal that conductive membrane layer 4 part on upper strata is peeled off, and the transparent conductive film layer 2 of lower floor does not affect by stripping, obtain patterned transparent conductive film.
The present invention also can by carrying out chemistry or physical modification formation substrate interface decorative layer 10 on substrate 1 surface, it strengthens the adhesive force between described substrate 1 and transparent conductive film layer 2.Such as, substrate 1 surface-coated functionalised silica gel layer or functional silane layers is included in.
In the present invention, as long as the adhesive force between substrate 1 and transparent conductive film 2 obviously will be greater than the adhesive force between transparent conductive film layer 3 and conductive membrane layer 4, transparent conductive film 2 is not peeled off by conductive membrane layer 4 to be affected, and intermediate layer 3 and/or ultra-thin interface-modifying layer 21 can omit.In the present invention, when adhesive force between substrate 1 and transparent conductive film 2 adhesive force be obviously greater than between transparent conductive film layer 3 and conductive membrane layer 4 refers to and peels off Upper conductive film, Upper conductive film can thoroughly be peeled off and lower floor's transparent conductive film layer can not anyly come off.Because the adhesive force between substrate and transparent conductive film layer is obviously greater than the adhesive force between transparent conductive film layer and conductive membrane layer, therefore, when peeling off conductive membrane layer 4, not peeling off phenomenon between transparent conductive film layer 2 and substrate 1.In the transparent conductive film of taking off arbitrary graphic of the present invention, conductive membrane layer 4 can be peeled off by adhesive tape or viscosity seal, and transparent conductive film layer 2 does not affect by stripping, obtains the transparent conductive film of arbitrary graphic.
Embodiment 1
As shown in Fig. 1 (a), in the present embodiment, the transparent conductive film of taking off arbitrary graphic comprises substrate 1 successively, transparent conductive film layer 2, intermediate layer 3 and conductive membrane layer 4 from down to up.Wherein, substrate 1 is glass, and transparent conductive film layer 2 is aerdentalloy films, and intermediate layer 3 is LiF, and conductive membrane layer 4 is silverskin.The transparent conductive film stayed after the stripping of conductive membrane layer 4 part is as shown in Fig. 1 (b).Provide single concrete material in the present embodiment, do not limit other Material selec-tion, just illustrate the present invention.Substrate 1 glass surface through surface coarsening and surface plasma process, electrically conducting transparent aerdentalloy film 2 on hot evaporation, then thermal evaporation intermediate layer 3LiF transition zone, conductive membrane layer 4 silverskin in last thermal evaporation.The structure of the product that above-mentioned the present embodiment prepares is Glass/AgAl/LiF/Ag, the adhesive force of glass and aerdentalloy film is obviously greater than the adhesive force between aerdentalloy film and silverskin, by adhesive tape or patterned seal, in silverskin stripping process, the silver-colored aluminium film of lower floor is unaffected, forms the patterned transparent conductive film be made up of Glass/AgAl or Glass/AgAl/LiF structure after stripping.The transparent conductive film that the present embodiment obtains can as the transparent cathode of photoelectric device or transparent anode, and unstripped conductive film can be used as connection wire lower without the need to the resistance of transparent requirement in photoelectric device.The present embodiment transparent conductive film can also be used as the transparent window of anti-electromagnetic wave interference, namely require that transparent position adhesive tape peels off conductive film, the patterned transparent conductive film of Glass/AgAl or Glass/AgAl/LiF composition is formed as watch window after stripping, unstripped film is full structural membrane Glass/AgAl/LiF/Ag, realizes more high-grade anti-electromagnetic interference capability.
Embodiment 2
As shown in Figure 2, the present embodiment transparent conductive film comprises substrate 1, transparent conductive film layer 2 and conductive membrane layer 4 successively from down to up, and the ultra-thin interface-modifying layer 21 that modifying interface is formed on transparent conductive film layer 2.Wherein, substrate 1 is glass or PET, and transparent conductive film layer 2 is NiCr alloy film, and conductive membrane layer 4 is silver film.The present embodiment provides single concrete material, does not limit other Material selec-tion, just in order to demonstrate the invention.Manufacturing process is with embodiment 1.Substrate 1 is after alligatoring and surface plasma process, and NiCr transparent conductive film layer 2 and substrate 1 have very strong adhesive force.Steam mode is adopted to carry out surface plasma process to NiCr film 2, NiCr film 2 is formed ultra-thin interface-modifying layer 21, cause the adhesive force between silverskin 4 and NiCr film 2 can decline fast under steam effect, therefore very well stripping Ag layer can be obtained patterned Glass/NiCr or PET/NiCr transparent conductive film with adhesive tape.Silane gas can also be passed into the modifying interface of NiCr film 2 and form self-assembling ultrathin interface-modifying layer, or pass into nitrogen, oxygen, Ar, methane, acetylene, hydrogen carries out surface plasma process.The present embodiment transparent conductive film can be used as the transparent window of anti-electromagnetic wave interference, namely with patterned Glass/NiCr or PET/NiCr transparent conductive film as watch window, unstripped film Glass/NiCr/Ag or PET/NiCr/Ag is as more high-grade electromagnetism interference protection film.Transparent conductive film window forms continuous print integrated electromagnetic wave interference protecting film together with unstripped conductive film.
Embodiment 3
As shown in Figure 3, the present embodiment transparent conductive film comprises substrate 1, substrate interface decorative layer 10, transparent conductive film layer 2 and conductive membrane layer 4 successively from down to up.Wherein, substrate 1 is glass or PET, and substrate interface decorative layer 10 is transparent silicon glue-line, and transparent conductive film layer 2 is TiCr alloy film, and conductive membrane layer 4 is silver film.The present embodiment provides single concrete material, does not limit other Material selec-tion, just in order to better the present invention is described.Manufacturing process is with embodiment 1.Substrate 1 applies between layer of transparent layer of silica gel 10, TiCr transparent conductive film layer 2 and the substrate 1 after transparent silicon glue-line is modified after roughening treatment has very strong adhesive force.Steam mode is adopted to carry out surface plasma process to TiCr transparent conductive film layer 2, TiCr transparent conductive film layer 2 forms ultra-thin interface-modifying layer, cause adhesive force between silverskin 4 and TiCr film 2 can decline fast under steam effect, therefore very well stripping Ag layer can be obtained patterned Glass/ layer of silica gel/TiCr or PET/ layer of silica gel/TiCr transparent conductive film with adhesive tape.Can also at substrate 1 surface-coated clear silane layer.Silane gas can also be passed into the modifying interface of TiCr transparent conductive film layer 2 and form self-assembling ultrathin interface-modifying layer, or pass into nitrogen, oxygen, Ar, methane, acetylene, hydrogen carries out surface plasma process.The transparent conductive film of the present embodiment can be used as the transparent window of anti-electromagnetic wave interference, namely with patterned Glass/ layer of silica gel/TiCr or PET/ layer of silica gel/TiCr transparent conductive film as watch window, unstripped film is as more high-grade electromagnetism interference protection film, and both films still continuous print.
Embodiment 4
As shown in Figure 4, the present embodiment transparent conductive film comprises substrate 1 successively, substrate interface decorative layer 10, transparent conductive film layer 2, intermediate layer 3 and conductive membrane layer 4 from down to up.Wherein, substrate 1 is glass, and substrate interface decorative layer 10 is transparent silicon glue-line, and transparent conductive film layer 2 is AgAl alloy film, and intermediate layer 3 is LiF layer, and conductive membrane layer 4 is silver film.Provide single concrete material herein, do not limit other Material selec-tion, just in order to better the present invention is described.Manufacturing process is with embodiment 1.Substrate 1 applies layer of transparent layer of silica gel 10 after roughening treatment, AgAl transparent conductive film layer 2 has very strong adhesive force with the substrate 1 after transparent silicon glue-line is modified, between silverskin 4 and AgAl film 2, adhesive force can decline fast behind 3LiF interval, intermediate layer, therefore can obtain the transparent conductive film of patterned Glass/ layer of silica gel/AgAl or Glass/ layer of silica gel/AgAl/LiF structure very well peeling off Ag layer with adhesive tape.The transparent conductive film of the present embodiment can be used as the transparent window of anti-electromagnetic wave interference, also the transparency electrode of photoelectric device can be used, namely after peeling off conductive membrane layer Ag, by the transparency conductive electrode of patterned Glass/ layer of silica gel/AgAl or Glass/ layer of silica gel/AgAl/LiF as device, unstripped film can be used as the connection wire between the lower photoelectric device of series resistance.
Above-described is only the preferred embodiment of the present invention, it should be pointed out that for the person of ordinary skill of the art, and without departing from the concept of the premise of the invention, can also make some distortion and improvement, these all belong to protection scope of the present invention.
Claims (10)
1. a transparent conductive film for taking off arbitrary graphic, is characterized in that, it comprises substrate (1), the transparent conductive film layer (2) that described substrate (1) deposits successively and conductive membrane layer (4); Adhesive force between described substrate (1) and transparent conductive film layer (2) is greater than the adhesive force between transparent conductive film layer (2) and conductive membrane layer (4); Described conductive membrane layer (4) is peelable.
2. the transparent conductive film of taking off arbitrary graphic as claimed in claim 1, it is characterized in that, it comprises intermediate layer (3); Described intermediate layer (3) is located between described transparent conductive film layer (2) and described conductive membrane layer (4), and it weakens the adhesive force between described transparent conductive film layer (2) and described conductive membrane layer (4).
3. the transparent conductive film of taking off arbitrary graphic as claimed in claim 2, it is characterized in that, described intermediate layer (3) comprise LiF, common salt, carbon film, organic molecule, polymeric material, molybdenum oxide or silane.
4. the transparent conductive film of taking off arbitrary graphic as claimed in claim 1, it is characterized in that, it comprises ultra-thin interface-modifying layer (21); Described ultra-thin interface-modifying layer (21) is formed the modifying interface of transparent conductive film layer (2), and it weakens the adhesive force between described transparent conductive film layer (2) and conductive membrane layer (4).
5. the transparent conductive film of taking off arbitrary graphic as claimed in claim 4, it is characterized in that, the described modifying interface to transparent conductive film layer (2) be employing pass into nitrogen, oxygen, Ar, methane, acetylene, hydrogen or steam carry out surface plasma process or pass into silane gas formed self-assembling ultrathin interface-modifying layer (21).
6. the transparent conductive film of taking off arbitrary graphic as claimed in claim 1, it is characterized in that, it comprises substrate interface decorative layer (10); Described substrate interface decorative layer (10) is that it strengthens the adhesive force between described substrate (1) and transparent conductive film layer (2) by carrying out chemistry or physical modification formation on substrate (1) surface.
7. the transparent conductive film of taking off arbitrary graphic as claimed in claim 6, it is characterized in that, described substrate interface decorative layer (10) is included in the functionalised silica gel layer of substrate (1) surface-coated.
8. the transparent conductive film of taking off arbitrary graphic as claimed in claim 1, is characterized in that,
Described substrate (1) is transparent material;
Described transparent conductive film layer (2) be metal or metal alloy form transparent metal film, transparent conductive oxide film or transparent conductive oxide/metal/transparent conductive oxide composition laminated film;
Described conductive membrane layer (4) is the translucent or opaque metal film that metal or metal alloy is formed.
9. the transparent conductive film of taking off arbitrary graphic as claimed in claim 8, is characterized in that,
Any one of the transparent metal film that the transparent metal film that described metal or metal alloy is formed is aluminium, titanium, chromium, nickel, iron, copper, silver, gold, titanium chromium, silver-colored aluminium, magnalium, titanium silver, magnesium are silver-colored, nickeline, Ag-Cu-Zn unitary or multicomponent alloy are formed; Described transparent conductive oxide film is Al-Doped ZnO, gallium-doped zinc oxide, mix indium zinc oxide, any one of transparent conductive film that tin-doped indium oxide, fluorine doped tin oxide are formed;
The laminated film of described transparent conductive oxide/metal/transparent conductive oxide composition is any one of AZO|Ag|AZO, ZnO|Ag|ZnO, ITO|Ag|ITO, GZO|Ag|GZO, AZO|AgAl|AZO multi-layered composite system;
Any one of transparent, the translucent or opaque metallic film that described conductive film (4) is aluminium, titanium, chromium, nickel, iron, copper, silver, titanium chromium, silver-colored aluminium, magnalium, titanium silver, magnesium silver-colored, nickeline, Ag-Cu-Zn unitary or multicomponent alloy are formed.
10. the application of the transparent conductive film of the taking off arbitrary graphic as shown in claim 1, is characterized in that, the transparent conductive film of described taking off arbitrary graphic is used as the transparency electrode of photoelectric device or is used as the transparent window of anti-electromagnetic wave interference.
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| CN107393979A (en) * | 2017-06-09 | 2017-11-24 | 中国科学院宁波材料技术与工程研究所 | A kind of transparency electrode based on ultrathin metallic film and its preparation method and application |
| CN109545979A (en) * | 2018-10-19 | 2019-03-29 | 杭州电子科技大学 | The organic photovoltaic cell of metallic transparent electrode and preparation method and composition |
| CN109830545A (en) * | 2019-02-14 | 2019-05-31 | 中国科学院半导体研究所 | A kind of aluminum-doped zinc oxide films surface modifying material, preparation method and battery |
| CN111816365A (en) * | 2019-04-10 | 2020-10-23 | 中国科学院苏州纳米技术与纳米仿生研究所 | Method for transferring conductive polymer onto flexible substrate and flexible electrode |
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN107393979A (en) * | 2017-06-09 | 2017-11-24 | 中国科学院宁波材料技术与工程研究所 | A kind of transparency electrode based on ultrathin metallic film and its preparation method and application |
| CN107393979B (en) * | 2017-06-09 | 2019-07-16 | 中国科学院宁波材料技术与工程研究所 | A kind of transparent electrode and its preparation method and application based on ultrathin metallic film |
| CN109545979A (en) * | 2018-10-19 | 2019-03-29 | 杭州电子科技大学 | The organic photovoltaic cell of metallic transparent electrode and preparation method and composition |
| CN109830545A (en) * | 2019-02-14 | 2019-05-31 | 中国科学院半导体研究所 | A kind of aluminum-doped zinc oxide films surface modifying material, preparation method and battery |
| CN111816365A (en) * | 2019-04-10 | 2020-10-23 | 中国科学院苏州纳米技术与纳米仿生研究所 | Method for transferring conductive polymer onto flexible substrate and flexible electrode |
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