CN105093746B - 阵列基板及液晶显示面板 - Google Patents

阵列基板及液晶显示面板 Download PDF

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CN105093746B
CN105093746B CN201510487331.7A CN201510487331A CN105093746B CN 105093746 B CN105093746 B CN 105093746B CN 201510487331 A CN201510487331 A CN 201510487331A CN 105093746 B CN105093746 B CN 105093746B
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array base
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CN105093746A (zh
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曹尚操
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TCL China Star Optoelectronics Technology Co Ltd
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Shenzhen China Star Optoelectronics Technology Co Ltd
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Priority to US14/778,754 priority patent/US10317759B2/en
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    • G—PHYSICS
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    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136209—Light shielding layers, e.g. black matrix, incorporated in the active matrix substrate, e.g. structurally associated with the switching element
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    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
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    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
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Abstract

本发明提供一种阵列基板及液晶显示面板，通过设置在金属走线的上方的不同颜色的色阻层相重叠，从而形成覆盖金属走线且不透光的遮光层以代替黑矩阵，无需制备黑矩阵的光罩制程，能够减少所使用的光罩的类型及数量，简化制程并降低生产成本。

Description

阵列基板及液晶显示面板
技术领域
本发明涉及显示领域，具体涉及一种阵列基板及液晶显示面板。
背景技术
当前，制造液晶显示器(Liquid Crystal Display，LCD)的工艺复杂，尤其是制备阵列基板(Array基板)所需的光罩(Mask)的类型及数量较多，导致制造流程繁多，无法降低生产成本。因此如何减少制造时所使用的光罩的类型及数量，实为目前企业需要努力的目标。
发明内容
有鉴于此，本发明提供一种阵列基板及液晶显示面板，能够减少制造时所使用的光罩的类型及数量。
本发明实施例提供的阵列基板，包括衬底基材、形成于衬底基材上的金属走线及以阵列方式排列的多个不同颜色的色阻层，在金属走线上方不同颜色的色阻层重叠设置，进而形成覆盖金属走线的遮光层。
其中，阵列基板包括依次形成于衬底基材上的第一金属层、绝缘层、第二金属层，第一金属层包括沿阵列基板的行方向设置的多条扫描线，第二金属层包括沿阵列基板的列方向设置的多条数据线，所述遮光层设置成覆盖数据线和扫描线至少一者。
其中，阵列基板还包括位于扫描线和数据线所定义的像素区域内的薄膜晶体管开关，所述遮光层进一步设置成覆盖薄膜晶体管开关。
其中，阵列基板进一步包括设置于第二金属层上方的透明电极层，第一金属层进一步包括公共电极走线，透明电极层包括位于扫描线和数据线所定义的像素区域内的像素电极和覆盖于扫描线和数据线至少一者上方的公共电极，且公共电极通过过孔与公共电极走线实现电连接。
其中，色阻层进一步设置成与像素电极重叠，且每一像素电极的下方仅与一种颜色的色阻层重叠。
其中，阵列基板还包括位于扫描线和数据线所定义的像素区域内的薄膜晶体管开关，公共电极进一步设置成覆盖薄膜晶体管开关。
其中，色阻层设置于第二金属层与透明电极层之间。
其中，阵列基板进一步包括位于第二金属层与透明电极层之间的平坦层，色阻层设置于平坦层与第二金属层之间。
其中，用于形成遮光层的色阻层为红光色阻层和蓝光色阻层。
本发明实施例提供的液晶显示面板，包括彩膜基板、与彩膜基板相对间隔设置的上述阵列基板以及设置于两者之间的液晶层。
本发明实施例的阵列基板及液晶显示面板，通过设置在金属走线的上方的不同颜色的色阻层相重叠，从而形成覆盖金属走线且不透光的遮光层以代替黑矩阵(BlackMatrix)，无需制备黑矩阵的光罩制程，可减少所使用的光罩的类型及数量，简化制程并降低生产成本。
附图说明
图1是本发明一实施例的液晶显示面板的剖视图；
图2是图1所示液晶显示面板一实施例的像素结构示意图；
图3是图1所示液晶显示面板沿图2所示A-A线的结构剖视图；
图4是图1所示液晶显示面板沿图2所示B-B线的结构剖视图；
图5是图1所示液晶显示面板沿图2所示C-C线的结构剖视图。
具体实施方式
下面将结合本发明实施例中的附图，对本发明所提供的示例性的实施例的技术方案进行清楚、完整地描述。
图1是本发明一实施例的液晶显示面板的剖视图，图2是图1所示液晶显示面板一实施例的像素结构示意图。结合图1和图2，液晶显示面板10包括相对间隔设置的彩膜基板(Color Filter Substrate，CF基板或彩色滤光片基板)11和阵列基板(Thin FilmTransistor Substrate，TFT基板或薄膜晶体管基板)12以及填充于两者之间的液晶13，所述阵列基板12包括衬底基材121、形成于衬底基材121上的金属走线L以及以阵列方式排列的多个不同颜色的色阻层122。
其中，在金属走线L上方的不同颜色的色阻层122重叠设置，以形成覆盖金属走线L的遮光层123以代替黑矩阵实现遮光，从而无需制备黑矩阵的光罩制程，减少了所使用的光罩的类型及数量，可简化制程并降低生产成本。具体地，对于包括红色子像素(R，Red)、蓝色子像素(B，Blue)和绿色子像素(G，Green)的液晶显示面板10，红色子像素的红光色阻层允许红色光透过，蓝色子像素的蓝光色阻层允许蓝色光透过，绿色子像素的绿光色阻层允许绿色光透过，鉴于红光色阻层和蓝光色阻层相叠加即可实现滤光，因此本实施例优选红光色阻层(下文及说明书附图以R表示红光色阻层)和蓝光色阻层(下文及说明书附图以B表示蓝光色阻层)在在金属走线L上方重叠设置。
所述金属走线L包括沿列方向设置的多条数据线D、沿行方向设置的多条扫描线G以及公共电极走线等其他走线，多条扫描线G和多条数据线D定义出阵列基板12的多个像素区域。图2中仅示出四个像素区域中，不同颜色的色阻层122重叠设置在金属走线L的上方。
结合图3-图5所示液晶显示面板10沿A-A、B-B、C-C线的结构剖视图，阵列基板12包括依次形成于衬底基材121上的第一金属层M1、绝缘层124、第二金属层M2，第一金属层M1和第二金属层M2即为前述金属走线L，其中，第一金属层M1包括公共电极走线Mcom以及沿阵列基板12的行方向设置的多条扫描线G，第二金属层M2包括沿阵列基板12的列方向设置的多条数据线D，对应地，遮光层123设置成覆盖数据线D、扫描线G和公共电极走线Mcom的至少一者。
参阅图3所示，第一金属层M1还包括薄膜晶体管开关T的与扫描线D连接的栅极，鉴于阵列基板12的位于扫描线G和数据线D所定义的像素区域内的薄膜晶体管开关T也需要遮光以提高显示对比度，因此遮光层123进一步设置成覆盖薄膜晶体管开关T。
结合图3和图5所示，阵列基板12还包括设置于第二金属层M2上方的透明电极层X以及位于该透明电极层X与第二金属层M2之间的平坦层125，该透明电极层X包括位于扫描线D和数据线G所定义的像素区域内的像素电极126和覆盖于扫描线D和数据线G至少一者上方的公共电极127，该公共电极127覆盖薄膜晶体管开关T且通过过孔O1与公共电极走线Mcom实现电连接，由于色阻层122用于形成设置于各个像素区域的子像素，因此色阻层122被设置成与像素电极126重叠，且所述色阻层122位于第二金属层M2与平坦层125之间，每一像素电极126的下方仅与一种颜色的色阻层122重叠，每一像素电极126通过过孔O2与对应的薄膜晶体管开关T的源极或漏极电连接。其中，所述过孔O1和过孔O2均穿透红光色阻层R、蓝光色阻层B和平坦层125，所述过孔O1还穿透绝缘层124。
进一步地，本实施例的液晶显示面板10在显示画面时，公共电极127所接收的电位等于彩膜基板11上的公共电极111所接收的电位，因此位于公共电极127和公共电极111之间的液晶分子不会发生偏转，即对应位于扫描线D上方的液晶分子不会发生偏转，从而显示为常黑模式，也可以充当黑矩阵的作用。
本发明实施例的核心发明目的是：通过设置在金属走线的上方的不同颜色的色阻层相重叠，从而形成覆盖金属走线且不透光的遮光层以代替黑矩阵，无需制备黑矩阵的光罩制程，可减少所使用的光罩的类型及数量，简化制程并降低生产成本。
在此基础上，以上所述仅为本发明的实施例，并非因此限制本发明的专利范围，凡是利用本发明说明书及附图内容所作的等效结构或等效流程变换，例如各实施例之间技术特征的相互结合，或直接或间接运用在其他相关的技术领域，均同理包括在本发明的专利保护范围内。

Claims (8)

1.一种阵列基板，其特征在于，所述阵列基板包括衬底基材、形成于所述衬底基材上的金属走线以及以阵列方式排列的多个不同颜色的色阻层，其中在所述金属走线上方所述不同颜色的色阻层重叠设置，进而形成覆盖所述金属走线的遮光层，所述金属走线包括依次形成于所述衬底基材上的第一金属层、和第二金属层，所述阵列基板还包括位于所述第二金属层上的透明电极层，所述第一金属层包括多条扫描线和公共电极走线，所述第二金属层包括多条数据线，所述遮光层覆盖所述数据线和所述扫描线至少一者，所述透明电极层包括位于所述扫描线和所述数据线所定义的像素区域内的像素电极和覆盖于所述扫描线和所述数据线至少一者上方的公共电极，且所述公共电极通过过孔与所述公共电极走线实现电连接，所述公共电极与彩膜基板一侧的公共电极接收的电位相等，使得分别位于所述阵列基板和所述彩膜基板的公共电极之间的液晶分子不会发生偏转，以此显示为常黑模式。
2.根据权利要求1所述的阵列基板，其特征在于，所述阵列基板还包括位于所述扫描线和所述数据线所定义的像素区域内的薄膜晶体管开关，所述遮光层进一步设置成覆盖所述薄膜晶体管开关。
3.根据权利要求1所述的阵列基板，其特征在于，所述色阻层进一步设置成与所述像素电极重叠，且每一所述像素电极的下方仅与一种颜色的所述色阻层重叠。
4.根据权利要求1所述的阵列基板，其特征在于，所述阵列基板还包括位于所述扫描线和所述数据线所定义的像素区域内的薄膜晶体管开关，所述公共电极进一步设置成覆盖所述薄膜晶体管开关。
5.根据权利要求1所述的阵列基板，其特征在于，所述色阻层设置于所述第二金属层与所述透明电极层之间。
6.根据权利要求2所述的阵列基板，其特征在于，所述阵列基板进一步包括位于所述第二金属层与所述透明电极层之间的平坦层，所述色阻层设置于所述平坦层与所述第二金属层之间。
7.根据权利要求1所述的阵列基板，其特征在于，用于形成所述遮光层的所述色阻层为红光色阻层和蓝光色阻层。
8.一种液晶显示面板，其特征在于，包括彩膜基板、与所述彩膜基板相对间隔设置的权利要求1-7任意一项所述的阵列基板、以及设置于所述彩膜基板和所述阵列基板之间的液晶层。
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