CN104893188B - 一种低表面光泽度聚偏氟乙烯薄膜及其制备方法 - Google Patents

一种低表面光泽度聚偏氟乙烯薄膜及其制备方法 Download PDF

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CN104893188B
CN104893188B CN201510194820.3A CN201510194820A CN104893188B CN 104893188 B CN104893188 B CN 104893188B CN 201510194820 A CN201510194820 A CN 201510194820A CN 104893188 B CN104893188 B CN 104893188B
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顾方明
刘会举
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Hangzhou Fu Fu New Materials Polytron Technologies Inc
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Abstract

本发明涉及一种低表面光泽度聚偏氟乙烯薄膜及其制备方法,属于太阳能光伏电池应用领域。一种低表面光泽度聚偏氟乙烯薄膜,其是由如下按重量份计的组分混合后流涎或吹膜而成:聚偏氟乙烯59.9~69.4份,消光剂1~10份,加工助剂0.5~5份,无机填料0~5份,增韧改性剂10~20份。本发明配方中的消光剂降低了薄膜的表面光泽度,使得制备的薄膜表面光泽度低于30。加工助剂改善聚偏氟乙烯的流动性,易于进行熔融挤出和薄膜成型;增韧改性剂有利于薄膜保持良好的韧性。本发明制备的聚偏氟乙烯薄膜具有优良的机械性能、低表面光泽度、高耐候性以及高水、汽阻隔性等优点。

Description

一种低表面光泽度聚偏氟乙烯薄膜及其制备方法
技术领域
本发明涉及一种低表面光泽度聚偏氟乙烯薄膜及其制备方法,属于太阳能光伏电池应用领域。
背景技术
太阳能是取之不尽、用之不竭的清洁能源。太阳能电池是通过光电效应直接把光能转化为电能的装置。太阳能电池组件一般包括前板钢化玻璃、EVA胶膜、电池片、背板、边框及接线盒等。电池片不耐候,尤其在潮湿的环境中电转换效率急剧下降,甚至损坏。背板处于太阳能组件的北面,其作用是保护电池片,起封装、绝缘与阻水隔气的作用。常见的背板一般具有三层结构:内层为聚乙烯(PE)薄膜或含氟涂层;中间层为双向拉伸的聚对苯二甲酸乙二醇酯(PET)薄膜;外层是氟膜,包括聚氟乙烯(PVF),聚偏氟乙烯(PVDF)或其他含氟材料。
聚偏氟乙烯是一种性能优异的含氟材料,具有突出的耐高低温、耐化学腐蚀、耐候性以及优异的电绝缘性,这些优良性能使PVDF能够满足太阳能电池封装背板外层保护膜的要求。美国的Akema公司制备了PVDF薄膜,商品名为Kynar,但存在以下缺点,即薄膜表面光泽度高,超过了50度,由于剧烈反光而影响了背板的自动层压工艺,逐渐被市场淘汰。CN102010554A公开了一种PVDF薄膜专用料,其优点在于流动性好,易成型;专用料制备的聚偏氟乙烯薄膜具高机械强度、高耐候性、低热收缩率及高水、汽阻隔性等优点。此专利中制备的也是表面光泽度高的PVDF薄膜。塑料薄膜表面光泽度的测量参照国家标准GB8807-88“塑料镜面光泽实验方法”进行,对样品均采用45°角测量。本发明要解决的技术问题之一是:研制具有低薄膜表面光泽度,即表面光泽度低于30,且性能满足要求的PVDF薄膜,用于太阳能电池背板上对太阳能电池组件进行封装。
发明内容
本发明提供一种表面光泽度低于30,且性能满足使用要求的低表面光泽度聚偏氟乙烯薄膜。
本发明还提供一种上述低表面光泽度聚偏氟乙烯薄膜的制备方法。
本发明解决其技术问题所采用的技术方案是:
一种低表面光泽度聚偏氟乙烯薄膜,其是由如下按重量份计的组分混合后流涎或吹膜而成:聚偏氟乙烯 59.9~69.4份,消光剂 1~10份,加工助剂 0.5~5份,无机填料 0~5份,增韧改性剂 10~20份。本发明配方中的消光剂降低了薄膜的表面光泽度,使得制备的薄膜表面光泽度低于30。加工助剂改善聚偏氟乙烯的流动性,易于进行熔融挤出和薄膜成型;增韧改性剂有利于薄膜保持良好的韧性。本发明制备的聚偏氟乙烯薄膜具有优良的机械性能、低表面光泽度、高耐候性以及高水、汽阻隔性等优点。
作为优选,所述配方还包括5~15份钛白粉,钛白粉的平均粒径为50~200纳米。
作为优选,所述配方还包括0.1~1份热稳定助剂。
作为优选,所述的消光剂是固体消光剂、液体消光剂的任一种或几种的组合。固体消光剂选自气相法制备的二氧化硅颗粒、聚四氟乙烯微粉、硫酸钡颗粒、交联聚甲基丙烯酸甲酯(PMMA)微粉;固体消光剂的平均粒径为0.5~10微米;液体消光剂选自硅烷类偶联剂、邻苯二甲酸酯类增塑剂。本发明中,硅烷类偶联剂包括:乙烯基三氯硅烷、乙烯基三乙氧基硅烷、乙烯基三(β-甲氧乙氧基)硅烷、γ-缩水甘油丙基-三甲氧基硅烷、γ-甲基丙烯酰氧基丙基-三甲氧基硅烷、N-(β-氨乙基)-γ-氨丙基-三甲氧基硅烷、N-(β-氨乙基)-γ-氨丙基-甲基-三甲氧基硅烷、γ-氯丙基-三甲氧基硅烷、γ-巯丙基-三甲氧基硅烷、γ-氨丙基-三甲氧基硅烷等。邻苯二甲酸酯类包括:邻苯二甲酸酯二甲酯、邻苯二甲酸酯二乙酯、邻苯二甲酸酯二丁酯、邻苯二甲酸酯二己酯、邻苯二甲酸酯二辛酯、邻苯二甲酸酯二异辛酯、邻苯二甲酸酯二异癸酯、邻苯二甲酸酯二(2-甲基己酯)、邻苯二甲酸二环己酯等。
作为优选,所述加工助剂为亚克力类中的任一种或任几种的组合。本发明所用的加工助剂为亚克力类中的任一种或任几种的组合,可以是罗门哈斯公司Paraloid产品,包括K120p、K125p、K175p、130p等;日本三菱公司Metblen产品;日本钟渊化学工业公司KaneAce产品等。
作为优选,所述增韧改性剂是具有核壳结构的丙烯酸酯类或甲基丙烯酸酯类弹性体中的任一种或任几种的组合。
作为优选,所述的无机填料是二氧化硅、二氧化钛、碳酸钙、硫酸钡、硫化锌中的任一种或任几种的组合,所述无机填料的平均粒径为0.1~10微米。
作为优选,所述的热稳定助剂为有机锡类、金属皂类中的任一种或任几种的组合。其中,有机锡类的热稳定剂可以是:二月桂酸二丁基锡、马来酸二正辛基锡、双(马来酸单丁酯)二丁锡、双(月桂基硫醇)二丁基锡、S,S’-双(硫代甘醇酸异辛锡)二丁基锡、二月桂酸二正辛基锡等;金属皂类的热稳定剂可以是:硬脂酸钙、硬脂酸镁、硬脂酸锂、硬脂酸锌、硬脂酸铝、双硬脂酸铝、月桂酸钙、月桂酸锌、蓖麻醇酸钙、2-乙基己酸锌等。
一种所述的低表面光泽度聚偏氟乙烯薄膜的制备方法,该方法包括如下步骤:①首先用高速混合机将原料各组分混合均匀,得到聚偏氟乙烯混合物,高速混合机的转速为500~1500rpm,混合时间为10~60min;
②然后通过双螺杆挤出机熔融、混合并挤出聚偏氟乙烯混合物,得到PVDF制膜专用粒子,挤出温度为180~250℃,螺杆转速为200~450rpm;
③将聚偏氟乙烯专用粒子流涎成膜或吹塑成膜。
进一步的,步骤③具体过程如下:采用单层或多层流涎机,挤出温度180~260℃,螺杆转速为30~120rpm,流涎机头温度为190~240℃,挤出的薄膜经冷却辊冷却固化,然后缠绕收卷,即可制备聚偏氟乙烯薄膜;或是,采用单层或多层吹膜机,挤出温度180~260℃,螺杆转速为30~80rpm,吹膜机头温度为190~240℃,吹塑得到的薄膜经冷却定性后经剖边,然后缠绕收卷,即可制备聚偏氟乙烯薄膜。
本发明的有益效果是:通过消光剂的作用,大大降低了PVDF薄膜的表面光泽度,满足了市场需求;同时,所述配方中的增韧改性剂保持了薄膜的韧性,增加薄膜的耐撕裂强度,使PVDF薄膜在降低表面光泽度的同时,力学性能也能满足使用要求。
具体实施方式
下面通过具体实施例,对本发明的技术方案作进一步的具体说明。应当理解,本发明的实施并不局限于下面的实施例,对本发明所做的任何形式上的变通和/或改变都将落入本发明保护范围。
在本发明中,若非特指,所有的份、百分比均为重量单位,所采用的设备和原料等均可从市场购得或是本领域常用的。下述实施例中的方法,如无特别说明,均为本领域的常规方法。
实施例1-4
低表面光泽度聚偏氟乙烯薄膜的配方参见表1。各实施例中采用的原料如下:
1、聚偏氟乙烯(PVDF):商品名是PVDF DS206,供应商为山东华夏神州新材料科技有限公司,熔融指数为20g/10min(测试条件是:230℃,5kg)。
2、消光剂是固体消光剂、液体消光剂的任一种或几种的组合。固体消光剂是聚四氟乙烯(PTFE)微粉,供应商为美国三叶科技有限公司;微粉的平均粒径为2微米;液体消光剂为N-(β-氨乙基)-γ-氨丙基-甲基-三甲氧基硅烷,供应商为南京向前化工有限公司。
3、加工助剂为亚克力类中的任一种或任几种的组合。其中一种加工助剂商品名是:IRS-306,供应商为三菱丽阳(南通)高分子有限公司,分子量20万。另一种助剂商品名是:Acrylic K-355P,供应商为:美国陶氏化学公司,分子量5万。
4增韧改性剂的商品名为:Acrylic Exl 2388,供应商为:美国陶氏化学公司。
5、钛白粉商品名为:R-103,供应商为:美国杜邦公司;微粒平均尺寸为100纳米。
6、无机填料是纳米碳酸钙:商品名:NPCC-201,供应商为:山西芮城新泰纳米材料有限公司,平均尺寸为50纳米。
7、热稳定助剂是一种有机锡类稳定剂与一种金属皂类稳定剂的组合,其中:有机锡类稳定剂是马来酸二丁基锡(DBTM),供应商为:瑞典AKZO公司;金属皂类稳定剂是硬脂酸钙,供应商为:山东淄博淄川创业油脂化工厂。热稳定助剂的组合的协同作用在PVC工业是比较普遍的,为公知常识,非本发明所以要研究的重点,在此不做累述。
表1(重量份数:%)
按表1中的配方和下述步骤制备聚偏氟乙烯薄膜:
将原料各组分进行机械混合,采用高速混合机,在常温下混合10~60分钟,高速混合机的转速为500~1500rpm;
将混合均匀的混合物进行熔融挤出造粒,采用双螺杆挤出机,挤出温度为180~250℃,螺杆转速为200~450rpm,机头压力4.5~8MPa,即可得到PVDF薄膜专用料粒子。
将专用料粒子流涎成膜,采用单层流涎机,挤出温度180~260℃,螺杆转速为30~120rpm,流涎机头温度为190~240℃。挤出的薄膜经冷却辊冷却固化,然后缠绕收卷,即可得到聚偏氟乙烯薄膜。
该过程也可以是:采用单层或多层吹膜机,挤出温度180~260℃,螺杆转速为30~80rpm,吹膜机头温度为190~240℃,吹塑得到的薄膜经冷却定性后经剖边,然后缠绕收卷,即可制备聚偏氟乙烯薄膜。
在实施例1~4中,均制成25微米厚度的薄膜,然后测试产品聚偏氟乙烯薄膜的拉伸强度、水蒸汽透过率、耐候性与热收缩率等关键性能指标。测试结果如表2所示。
表2实施例1~5与对比例的性能测试结果
以上各实施例配方易于双螺杆挤出及薄膜成型。对比例为高表面光泽度配方,即不添加消光剂。通过对比例与实施例1-4的比较,说明本发明的聚偏氟乙烯薄膜表面光泽度低于30度,并具有良好的力学性能、较低的水蒸气透过率以及优异的耐老化性能,完全满足太阳能光伏电池背板的使用要求。
以上所述的实施例只是本发明的一种较佳的方案,并非对本发明作任何形式上的限制,在不超出权利要求所记载的技术方案的前提下还有其它的变体及改型。

Claims (2)

1.一种低表面光泽度聚偏氟乙烯薄膜,其特征在于其是由如下按重量份计的组分混合后流涎或吹膜而成:
聚偏氟乙烯 59.9~69.4份,
消光剂 1份,
加工助剂 0.5~5份,
无机填料 0~5份,
增韧改性剂 10~20份,
平均粒径为50~200纳米的钛白粉 5~15份,
热稳定助剂 0.1~1份,
所述的消光剂包括聚四氟乙烯微粉0.5份和N-(β-氨乙基)-γ-氨丙基-甲基-三甲氧基硅烷0.5份,其中,聚四氟乙烯微粉的平均粒径为2微米,
所述加工助剂为亚克力类中的任一种或任几种的组合;
所述的无机填料是二氧化硅、二氧化钛、碳酸钙、硫酸钡、硫化锌中的任一种或任几种的组合,所述无机填料的平均粒径为0.1~10微米;
所述增韧改性剂是具有核壳结构的丙烯酸酯类或甲基丙烯酸酯类弹性体中的任一种或任几种的组合;
所述的热稳定助剂为有机锡类、金属皂类中的任一种或任几种的组合。
2.一种权利要求1所述的低表面光泽度聚偏氟乙烯薄膜的制备方法,其特征在于该方法包括如下步骤:
①首先用高速混合机将原料各组分混合均匀,得到聚偏氟乙烯混合物,高速混合机的转速为500~1500rpm,混合时间为10~60min;
②然后通过双螺杆挤出机熔融、混合并挤出聚偏氟乙烯混合物,得到PVDF制膜专用粒子,挤出温度为180~250℃,螺杆转速为200~450rpm;
③将聚偏氟乙烯专用粒子流涎成膜或吹塑成膜;
所述步骤③具体过程如下:
采用单层或多层流涎机,挤出温度180~260℃,螺杆转速为30~120rpm,流涎机头温度为190~240℃,挤出的薄膜经冷却辊冷却固化,然后缠绕收卷,即可制备聚偏氟乙烯薄膜;或是,采用单层或多层吹膜机,挤出温度180~260℃,螺杆转速为30~80rpm,吹膜机头温度为190~240℃,吹塑得到的薄膜经冷却定性后经剖边,然后缠绕收卷,即可制备聚偏氟乙烯薄膜。
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