CN104831243B - 一种低电阻率氧化铌掺铌溅射旋转靶材及其制备方法 - Google Patents
一种低电阻率氧化铌掺铌溅射旋转靶材及其制备方法 Download PDFInfo
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CN106567046A (zh) * | 2016-10-13 | 2017-04-19 | 法柯特科技(江苏)有限公司 | 氧化铌溅射靶材的制备方法 |
CN107267945A (zh) * | 2017-07-17 | 2017-10-20 | 绍兴斯普瑞涂层技术有限公司 | 一种高致密度高纯度溅射旋转银靶材的制备方法 |
CN113355626A (zh) * | 2021-05-28 | 2021-09-07 | 芜湖映日科技股份有限公司 | 一种氧化铌旋转溅射靶材的制备工艺 |
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