CN104458046A - Platinum film resistor manufacturing method - Google Patents
Platinum film resistor manufacturing method Download PDFInfo
- Publication number
- CN104458046A CN104458046A CN201410757774.9A CN201410757774A CN104458046A CN 104458046 A CN104458046 A CN 104458046A CN 201410757774 A CN201410757774 A CN 201410757774A CN 104458046 A CN104458046 A CN 104458046A
- Authority
- CN
- China
- Prior art keywords
- resistance
- temperature
- platinum
- silver slurry
- silver paste
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
The invention provides a platinum film resistor manufacturing method. The method comprises the steps that 1, platinum resistor elements obtained through sputter coating are subjected to high-heat treatment, and argon gas is fed in simultaneously; when the temperature rises to 600 DEG C, the temperature is kept for four hours, and four hours later, heat keeping is stopped, and cooling is started; 2, when platinum resistors are cooled to 160 DEG C, the temperature is continuously kept for 24 hours, and 24 hours later, heat keeping is stopped, and the platinum resistors cool down naturally to the indoor temperature and then are taken out; 3, the platinum resistors are subjected to lead smearing by using silver paste, the silver paste is dried and solidified through heat treatment, and the drying temperature of the silver paste is kept at 150 DEG C for 15 minutes; the silver paste needs to be solidified at the high temperature of 550 DEG C for 15 minutes; silver paste leads of the platinum resistors subjected to drying and solidifying are good in welding performance. The substrate bonding strength of a thin film treated through the method is improved remarkably, the service life of a sensor is prolonged, and the use efficiency of a heat flow measuring sensor is guaranteed.
Description
Technical field
The present invention relates to a kind of new film platinum resistor manufacture method, especially for the thermal treatment of the film platinum resistor of shock tunnel Aerodynamic Heating environmental test heat flux sensor.
Background technology
Heat transfer and thermal protection problem are the outstanding problems in hypersonic flight always.Aerodynamic Heating environmental experiment mainly relies on the shock tunnel that can provide High Mach number, high stagnation pressure and high reynolds number, and main means of testing is with the point-measurement technique of based thin film platinum sensor.
The basic methods that point-measurement technique is measured as shock tunnel thermal environment, developing history is long, technology maturation, and combines with micro-processing technology in recent years, and sensor manufacturing process significantly improves, and solves complex appearance sensor installation question.Therefore, to the heat flow measurement of complex appearance aircraft, conventional point measuring technique main status is in the measurements irreplaceable.But among other advantages, platinum sensor is exposed in the middle of air-flow due to its thermal sensing element, and its abrasion resistance governs the service efficiency of sensor always.In order to improve the problem in serviceable life of sensor, we must solve film and substrate adhesion problem from manufacture craft.
Summary of the invention
In order to solve in shock tunnel thermal environmental test, be exposed to the abrasion resistance problem of the platinum resistance in the middle of air-flow, and solve the platinum resistance temperature-coefficient of electrical resistance that obtains of coating process problem less than normal.The invention provides a kind of new film platinum resistor Technology for Heating Processing, by optimizing thermal treatment flow process, change the physical property of sputtered film, improve the temperature-coefficient of electrical resistance of platinum resistance, improve the measurement performance of sensor, and thermal treatment can improve the adhesion of platinum resistance and substrate of glass, thus realize the lifting of airflow scouring capability.
Film platinum resistor manufacture method of the present invention comprises: step 1: the platinum resistive element obtained by sputter coating carries out high-temperature heat treatment, is filled with argon gas simultaneously.When temperature is elevated to 600 DEG C, keep temperature 4 hours, the time is incubated to rear stopping, beginning to cool down; Step 2: when platinum resistance is cooled to 160 DEG C, keep this temperature, continues 24 hours, after the time arrives, takes out after stopping insulation naturally cooling to room temperature; With step 3: to platinum resistance carry out silver slurry retouch be coated with lead-in wire operation, and through bakingout process make silver slurry slurry dry and consolidation, silver slurry bake out temperature remain on 150 DEG C, 15 minutes.Silver slurry consolidation then will through the high temperature of 550 DEG C, same maintenance 15 minutes.Through the platinum resistance of drying and after consolidation, silver slurry lead-in wire welding performance is better.
Preferably the film platinum resistor also comprised taking out after described step 2 cools carries out resistance measuring process, and judge according to resistance, when resistance is between 70 ~ 80 ohm, enter described step 3, if and resistance is not or not above-mentioned interval, is then considered as unacceptable product and abandons.
Preferably also comprise the film platinum resistor after to the thermal treatment of described step 3 silver slurry lead-in wire and carry out resistance measuring process, and judge according to resistance, when resistance is between 40 ~ 60 ohm, be judged to be certified products, Technology for Heating Processing terminates, if and resistance is not or not above-mentioned interval, is then considered as unacceptable product and abandons.
The present invention utilizes resistance furnace to heat-treat Slag coating film, improves adhesion of thin film.Starch with silver the order processed by adjustment thermal treatment; Film is carried out to the high-temperature heat treatment of short time; And long Low Temperature Heat Treatment is carried out to film; Control oven dry and consolidation temperature and the time of silver slurry again, the physical property of sputtered film can be changed, improve the temperature-coefficient of electrical resistance of platinum resistance, improve the measurement performance of sensor, and, thermal treatment can improve the adhesion of platinum resistance and substrate of glass, thus realizes the lifting of airflow scouring capability.
The invention has the beneficial effects as follows: in shock tunnel thermal environmental test process, air-flow is very strong to the erosion of platinum resistance film, and the film of sputter coating synthesis is very poor at suprabasil adhesion, this just requires to improve adhesion of thin film by rational thermal treatment.Through the film of process of the present invention, significantly improve with the adhesion of substrate, improve the serviceable life of sensor, ensure that the service efficiency of heat flow measurement sensor.
Accompanying drawing explanation
Fig. 1 is process flow diagram of the present invention.
Embodiment
As shown in Figure 1, the present invention is a kind of new film platinum resistor Technology for Heating Processing, and step is as follows:
(1) platinum resistive element obtained by sputter coating carries out high-temperature heat treatment.Platinum resistive element is put into pallet, puts into resistance furnace and heat, be filled with argon gas simultaneously.When temperature is elevated to 600 DEG C, stop heating, keep temperature 4 hours, the time begins to cool down to rear stopping insulation simultaneously.
(2) when platinum resistance is cooled to 160 DEG C, keep this temperature, continue 24 hours, after the time arrives, take out after stopping insulation naturally cooling to room temperature.
(3) film platinum resistor that cooling is taken out is carried out resistance measurement, and to judge according to resistance, when resistance is between 70 ~ 80 ohm, enter next step, and if resistance not in above-mentioned interval, be then considered as unacceptable product and abandon.
(4) platinum resistance meeting resistance standard is carried out silver slurry and retouch the operation of painting lead-in wire, after smearing silver slurry, will make slurry oven dry and consolidation through bakingout process, silver slurry bake out temperature remains on 150 DEG C, 15 minutes.Silver slurry consolidation then will through the high temperature of 550 DEG C, same maintenance 15 minutes.Through the platinum resistance of drying and after consolidation, silver slurry lead-in wire welding performance is better.
(5) silver slurry lead-in wire thermal treatment rear film platinum resistance is carried out resistance measurement, and judge according to resistance, when resistance is between 40 ~ 60 ohm, be judged to be certified products, Technology for Heating Processing terminates, and if resistance not in above-mentioned interval, be then considered as unacceptable product and abandon.
Above the preferred embodiment of the present invention is illustrated, but the present invention is not limited to above-described embodiment.To one skilled in the art, in the category described in claims, various modification or fixed case can be expected apparently, certainly also belong to technology category of the present invention.
Claims (3)
1. a film platinum resistor manufacture method, is characterized in that, comprising:
Step 1: the platinum resistive element obtained by sputter coating carries out high-temperature heat treatment, is filled with argon gas simultaneously.When temperature is elevated to 600 DEG C, keep temperature 4 hours, the time is incubated to rear stopping, beginning to cool down;
Step 2: when platinum resistance is cooled to 160 DEG C, keep this temperature, continues 24 hours, after the time arrives, takes out after stopping insulation naturally cooling to room temperature; With
Step 3: carry out silver slurry to platinum resistance and retouch the operation of painting lead-in wire, and make the slurry oven dry of silver slurry and consolidation through bakingout process, silver slurry bake out temperature remains on 150 DEG C, 15 minutes.Silver slurry consolidation then will through the high temperature of 550 DEG C, same maintenance 15 minutes.
2. film platinum resistor manufacture method according to claim 1, is characterized in that:
The film platinum resistor also comprised taking out after described step 2 cools carries out resistance measuring process, and judge according to resistance, when resistance is between 70 ~ 80 ohm, enter described step 3, if and resistance is not or not above-mentioned interval, is then considered as unacceptable product and abandons.
3. film platinum resistor manufacture method according to claim 1, is characterized in that:
Also comprise the film platinum resistor after to the thermal treatment of described step 3 silver slurry lead-in wire and carry out resistance measuring process, and judge according to resistance, when resistance is between 40 ~ 60 ohm, be judged to be certified products, Technology for Heating Processing terminates, and if resistance not in above-mentioned interval, be then considered as unacceptable product and abandon.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201410757774.9A CN104458046A (en) | 2014-12-10 | 2014-12-10 | Platinum film resistor manufacturing method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201410757774.9A CN104458046A (en) | 2014-12-10 | 2014-12-10 | Platinum film resistor manufacturing method |
Publications (1)
Publication Number | Publication Date |
---|---|
CN104458046A true CN104458046A (en) | 2015-03-25 |
Family
ID=52904468
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201410757774.9A Pending CN104458046A (en) | 2014-12-10 | 2014-12-10 | Platinum film resistor manufacturing method |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN104458046A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104931229A (en) * | 2015-06-12 | 2015-09-23 | 中国航天空气动力技术研究院 | Integrated thin film sensor for measuring surface heat flow rate in hypersonic flow |
CN105606331A (en) * | 2015-12-18 | 2016-05-25 | 中国航天空气动力技术研究院 | Film platinum resistor heat flux sensor with flexible substrate, and manufacturing method for film platinum resistor heat flux sensor |
CN105606332A (en) * | 2015-12-21 | 2016-05-25 | 中国航天空气动力技术研究院 | Method for manufacturing integral-type thin film platinum resistance sensor by using laser direct writing technology |
CN115216734B (en) * | 2022-08-09 | 2024-01-26 | 中国科学院力学研究所 | Method for improving binding force of platinum film and substrate material |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1042793A (en) * | 1988-11-16 | 1990-06-06 | 中国科学院上海冶金研究所 | The platinum film manufacture method of temperature sensor |
JPH02304904A (en) * | 1989-05-19 | 1990-12-18 | Tama Electric Co Ltd | Platinum thin film temperature sensor and manufacture of same |
CN1432799A (en) * | 2002-01-17 | 2003-07-30 | 董述恂 | Film resistor temperature sensor and its making process |
CN102539004A (en) * | 2011-12-23 | 2012-07-04 | 重庆市伟岸测器制造股份有限公司 | Method of manufacturing temperature sensor |
CN102607732A (en) * | 2012-03-20 | 2012-07-25 | 哈尔滨工程大学 | Preparation method of film temperature sensor for liquid floated gyroscope |
CN102749148A (en) * | 2012-07-13 | 2012-10-24 | 中国航天空气动力技术研究院 | Manufacture method for membrane resistance thermometer |
-
2014
- 2014-12-10 CN CN201410757774.9A patent/CN104458046A/en active Pending
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1042793A (en) * | 1988-11-16 | 1990-06-06 | 中国科学院上海冶金研究所 | The platinum film manufacture method of temperature sensor |
JPH02304904A (en) * | 1989-05-19 | 1990-12-18 | Tama Electric Co Ltd | Platinum thin film temperature sensor and manufacture of same |
CN1432799A (en) * | 2002-01-17 | 2003-07-30 | 董述恂 | Film resistor temperature sensor and its making process |
CN102539004A (en) * | 2011-12-23 | 2012-07-04 | 重庆市伟岸测器制造股份有限公司 | Method of manufacturing temperature sensor |
CN102607732A (en) * | 2012-03-20 | 2012-07-25 | 哈尔滨工程大学 | Preparation method of film temperature sensor for liquid floated gyroscope |
CN102749148A (en) * | 2012-07-13 | 2012-10-24 | 中国航天空气动力技术研究院 | Manufacture method for membrane resistance thermometer |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104931229A (en) * | 2015-06-12 | 2015-09-23 | 中国航天空气动力技术研究院 | Integrated thin film sensor for measuring surface heat flow rate in hypersonic flow |
CN105606331A (en) * | 2015-12-18 | 2016-05-25 | 中国航天空气动力技术研究院 | Film platinum resistor heat flux sensor with flexible substrate, and manufacturing method for film platinum resistor heat flux sensor |
CN105606332A (en) * | 2015-12-21 | 2016-05-25 | 中国航天空气动力技术研究院 | Method for manufacturing integral-type thin film platinum resistance sensor by using laser direct writing technology |
CN115216734B (en) * | 2022-08-09 | 2024-01-26 | 中国科学院力学研究所 | Method for improving binding force of platinum film and substrate material |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN104458046A (en) | Platinum film resistor manufacturing method | |
CN102682944A (en) | Negative temperature coefficient (NTC) thermosensitive resistor material | |
CN108007595A (en) | A kind of sonde-type thin-film thermocouple temperature sensor and preparation method thereof | |
CN107012425A (en) | A kind of thin film sensor composite insulation layer and preparation method thereof | |
CN110987215A (en) | Film temperature sensor for detecting thermal insulation effect of thermal barrier coating | |
CN101206135B (en) | Method for manufacturing weighting sensor in hot environment | |
CN102928106A (en) | Integrated thin film temperature heat flow compound sensor and preparation method thereof | |
CN107622851B (en) | A kind of negative tempperature coefficient thermistor and preparation method thereof with nano-particular film | |
CN104797016A (en) | Inorganic non-metal semiconductor far infrared electric heating film material and preparation process thereof | |
CN102627445A (en) | composition for preparing negative temperature coefficient (NTC) thermistor chip and NTC thermistor made by using composition | |
CN103451980B (en) | A kind of heat-sensitive variable colour rope and preparation method thereof | |
WO2020019120A1 (en) | Ceramic heater and preparation method and use of ceramic heater | |
CN102693795B (en) | Negative temperature coefficient thermistor | |
CN104319043A (en) | Manufacturing method of negative-temperature-coefficient thermistor chip electrode | |
CN104051095B (en) | A kind of quaternary system thermistor material for adding titanium oxide | |
CN107515637A (en) | A kind of glass plate steel process course control method for use | |
CN108117378B (en) | Wide-temperature-range high-precision NTC (negative temperature coefficient) thermosensitive chip for body temperature measurement and manufacturing method thereof | |
CN102693794B (en) | Ultralow-resistivity high-B value negative temperature coefficient (NTC) thermistor | |
CN113755793B (en) | Anti-oxidation self-repairing protective layer for thin film sensor and preparation method thereof | |
CN104086160B (en) | Add the binary system thermistor material of lanthana | |
CN202994696U (en) | Thin-film heat flux sensor | |
CN109141663A (en) | A kind of production method of integrated form coaxial thermocouple | |
CN204286742U (en) | Miniature thin-film platinum resistance heat flux sensor | |
CN108303378B (en) | Device and method for measuring and testing high-temperature emissivity of heat-proof tile | |
CN112321330A (en) | Ceramic heating element based on multiple subgroup elements and preparation method and application thereof |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
WD01 | Invention patent application deemed withdrawn after publication | ||
WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20150325 |