CN104441990A - Liquid jet device and manufacturing method thereof - Google Patents
Liquid jet device and manufacturing method thereof Download PDFInfo
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- CN104441990A CN104441990A CN201310444465.1A CN201310444465A CN104441990A CN 104441990 A CN104441990 A CN 104441990A CN 201310444465 A CN201310444465 A CN 201310444465A CN 104441990 A CN104441990 A CN 104441990A
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Abstract
The invention provides a liquid jet device and a manufacturing method of the liquid jet device. The manufacturing method of the liquid jet device includes the following steps that a groove is formed in a substrate in an etched mode; a sacrificial layer is formed in the groove and is flush with the surface of the substrate; an elastic film is formed on the sacrificial layer, so that the elastic film is in lap joint with the edge of the groove, the opening of the groove is covered with a part of the elastic film, and the elastic film can elastically deform under the action of external force; the sacrificial layer is removed. Due to the fact that the sacrificial layer formed according to the electroplating method has the advantages of being resistant to high temperature, high in deposition speed, easy to remove and the like, the problems that sacrificial layer materials used in traditional methods are low in removal speed and prone to deformation under high temperature and consequently deformation of a bridge type structure is caused are solved, a prepared bridge type structure is high in forming speed and flat, the preparation process of the bridge type structure in the piezoelectric type jet device is optimized, and product quality is improved.
Description
Technical field
The present invention relates to a kind of piezoelectric structure technology of preparing, particularly a kind of liquid injection apparatus and manufacture method thereof.
Background technology
The liquid injection apparatus of printer utilizes piezoelectric element to be sprayed by ink as actuator, liquid injection apparatus mainly contains following two types, a kind of is form by piezoelectric element and oscillating plate part the pressure chamber be communicated with the nozzle of discharging ink, by the distortion of piezoelectric element and oscillating plate, the volume of pressure chamber is changed, thus the ink in pressure chamber is sprayed from nozzle.Because need the Volume Changes of pressure chamber, so need the distortion of piezoelectric element and oscillating plate very large, the sidewall of pressure chamber needs good intensity and toughness simultaneously, in order to obtain the ejection ink droplet of required size, piezoelectric element should have certain deflection required for area guarantee, the sidewall of pressure chamber also needs good intensity and toughness, thus is difficult to the high-density array realizing nozzle.
The second piezoelectric type liquid injection apparatus is arranged in balancing gate pit by piezoelectric element and oscillating plate with the form of bridge type beam, concrete structure as shown in Figure 1, the manufacture method of this liquid injection apparatus is: first adopt etching method or laser method to form nozzle 102 and balancing gate pit 103 on the substrate 101, then resin filling balancing gate pit 103 is used, bridge type beam 104 is formed successively again above balancing gate pit 103, bottom electrode 105, piezoelectric film 106 and top electrode 107, wherein the formation of piezoelectric film 106 needs the high-temperature calcination of about 800 DEG C, then resin release bridge type beam 104 is removed, the frame 108 that finally bonds forms fluid reservoir 109.During use, bridge type beam 104 deforms under the effect of piezoelectric element (bottom electrode 105, piezoelectric film 106 and top electrode 107), thus drives liquid to spray from nozzle 102.
But, time in prior art by resin filling balancing gate pit 103, need the surface of potting resin extremely smooth, otherwise during release bridge type beam 104 structure, bridge type beam 104 can produce flexural deformation phenomenon, and the formation of piezoelectric film 106 needs the high-temperature calcination of about 800 DEG C, now can there is thermal expansion in resin, the thermal expansion of resin can cause bridge type beam 104 flexural deformation, the flexural deformation of self mechanism of bridge type beam 104 can affect jeting effect on the one hand, the structural flexural deformation of bridge type beam 104 is easy to make bridge type beam 104, under piezoelectric element effect, breakage phenomenon occur on the other hand.
Summary of the invention
The invention provides a kind of liquid injection apparatus and manufacture method thereof, to optimize the preparation technology of bridge architecture in piezoelectric type injection apparatus, improve the quality of products.
The invention provides a kind of manufacture method of liquid injection apparatus, comprising:
On substrate, etching forms groove;
In described groove, form sacrifice layer, described sacrifice layer is concordant with the surface of described substrate;
Described sacrifice layer is formed an elastic membrane, and with the edge making described elastic membrane be overlapped on described groove, and part covers the uncovered of described groove, and described elastic membrane can produce elastic deformation under external force;
Remove described sacrifice layer.
The manufacture method of liquid injection apparatus as above, preferably, forms sacrifice layer and comprises in described groove:
Adopt the electroplate liquid of ammonium salt and citric acid composition, the zinc layers formed by galvanoplastic, as described sacrifice layer.
The manufacture method of liquid injection apparatus as above, preferably, is formed before sacrifice layer, also comprises: adopt galvanoplastic Titanium Electroplating, copper and titanium layer successively on described groove inner wall, as Seed Layer.
The manufacture method of liquid injection apparatus as above, preferably, described sacrifice layer is formed an elastic membrane, comprising:
Form elastic membrane by Low Pressure Chemical Vapor Deposition or plasma enhanced chemical vapor deposition method, the material of described elastic membrane is SiO
2or Si
3n
4.
The manufacture method of liquid injection apparatus as above, preferably, also comprise after described sacrifice layer is formed an elastic membrane: in described elastomeric film surface, form piezoelectric element, described piezoelectric element is for generation of the external force made needed for described elastic membrane generation elastic deformation.
The manufacture method of liquid injection apparatus as above, preferably, described elastomeric film surface forms piezoelectric element and comprises:
Described elastic membrane forms lower electrode layer by sputtering method;
By sol-gal process on above-mentioned lower electrode layer, and carry out high-temperature calcination, form piezoelectric body layer;
Described piezoelectric body layer forms upper electrode layer by sputtering method.
The manufacture method of liquid injection apparatus as above, preferably, described lower electrode layer is titanium layer, platinum layer or multiple titanium layer superimposed layer; Described piezoelectric body layer is lead zirconate titanate layer; Described upper electric layer is platinum layer or gold layer.
The manufacture method of liquid injection apparatus as above, preferably, remove described sacrifice layer and comprise:
Watery hydrochloric acid is adopted to remove described sacrifice layer.
The manufacture method of liquid injection apparatus as above, preferably, the length of described elastic membrane is greater than the length of described groove, and the width of described elastic membrane is less than the width of described groove, and described elastic membrane forms bridge architecture relative to described groove.
The manufacture method of liquid injection apparatus as above, preferably, after removing described sacrifice layer, also comprise: the penetrating gap to described groove is offered in the one end described elastic membrane be overlapped among the two ends in recess edge, becomes cantilever structure to make described elastic membrane.
The manufacture method of liquid injection apparatus as above, preferably, also comprises after removing described sacrifice layer: form ink-feed channel, public chamber and pressure chamber on the substrate, the outer wall of described pressure chamber forms nozzle.
The liquid injection apparatus that the manufacture method that the invention provides a kind of above-mentioned arbitrary described liquid injection apparatus manufactures.
Liquid injection apparatus of the present invention and manufacture method thereof, the sacrifice layer formed by galvanoplastic has the fast and easy feature such as removal of high temperature resistant, deposition velocity, the sacrificial layer material of avoiding conventional method to use to be removed under the slow and high temperature of speed easily distortion and causes the problems such as the distortion of bridge architecture, the bridge architecture of preparation is formed, and speed is fast and structure is smooth, optimize the preparation technology of bridge architecture in piezoelectric type injection apparatus, improve product quality.
Accompanying drawing explanation
Fig. 1 is the structural representation of liquid injection apparatus in prior art;
Fig. 2 is the flow chart of the manufacture method of the liquid injection apparatus of one embodiment of the invention;
Fig. 3 is the flow chart of the manufacture method of the liquid injection apparatus of further embodiment of this invention;
Fig. 4 is the structural representation of the liquid injection apparatus of one embodiment of the invention;
Fig. 5 is the structural representation one of liquid injection apparatus of the present invention;
Fig. 6 A is the structural representation two of liquid injection apparatus of the present invention;
Fig. 6 B is the side structure schematic diagram of Fig. 6 A;
Fig. 7 is the structural representation three of liquid injection apparatus of the present invention;
Fig. 8 A is the structural representation four of liquid injection apparatus of the present invention;
Fig. 8 B is the side structure schematic diagram of Fig. 8 A;
Fig. 9 is the structural representation five of liquid injection apparatus of the present invention.
Detailed description of the invention
Fig. 2 is the flow chart of the manufacture method of the liquid injection apparatus of one embodiment of the invention.As shown in Figure 2, the manufacture method of the liquid injection apparatus of the present embodiment can comprise:
Step 200, on substrate etching formed groove.
In the present embodiment, groove on substrate can be formed by wet etching or dry etching, wherein according to the actual requirements, substrate can offer one or more groove, the size of groove and shape can be determined according to concrete should being used for, can be cuboid groove, can be also oval recess, do not limited in the present embodiment.
Step 201, in described groove, form sacrifice layer, described sacrifice layer is concordant with the surface of described substrate.
In the present embodiment, galvanoplastic are adopted to form sacrifice layer in groove, and the sacrifice layer formed is concordant with the surface of substrate, namely sacrifice layer is full of whole groove, the electroplate liquid adopted during plating can be without ammonium chloride electroplate liquid, or alkaline zincate electroplate liquid, or ammonium salt electroplate liquid etc., the kind of electroplate liquid is not limited in the present embodiment, is preferably ammonium salt electroplate liquid.
Step 202, on described sacrifice layer, form elastic membrane, with the edge making described elastic membrane be overlapped on described groove, and part covers the uncovered of described groove, and described elastic membrane can produce elastic deformation under external force.
At the present embodiment, by step 201, after sacrifice layer is concordant with substrate surface, by Low Pressure Chemical Vapor Deposition or plasma enhanced chemical vapor deposition method, sacrifice layer forms elastic membrane, elastic membrane is overlapped on the edge of described groove, and part covers the uncovered of described groove, wherein the shape of elastic membrane can be rectangle, also can be other shapes, when elastic membrane is rectangle, both sides wherein can be overlapped on the edge of groove, can also by wherein while be overlapped on the edge of groove, in the present embodiment, elastic membrane can be SiO
2layer or Si
3n
4layer, or elastic membrane also can be SiO
2layer and Si
3n
4multilayer laminated structure.
Step 203, remove described sacrifice layer.
In the present embodiment, after step 202, the sacrifice layer of filling in groove is needed to remove, hydrochloric acid specifically can be adopted to remove sacrifice layer, also can use and can react with sacrifice layer but other chemical reagent do not reacted with elastic membrane and substrate, after sacrifice layer is removed, elastic membrane is hung on groove, some troublesome impurities stayed in its further groove, removal residual impurity can be soaked with the mixed solution of hydrogen peroxide and weak aqua ammonia, in the present embodiment, after sacrifice layer is removed, a liquid feeding channel is offered by between substrate upper groove, and form public chamber and a pressure chamber, liquid feeding channel is used for liquid to be supplied to public chamber, public chamber is used for liquid to be supplied to corresponding pressure chamber respectively, liquid feeding channel, public chamber and balancing gate pit are interconnected, the outer wall of balancing gate pit is formed with nozzle, when applying drive singal, liquid in balancing gate pit sprays from nozzle under elastic membrane effect.
Liquid injection apparatus of the present invention and manufacture method thereof, the sacrifice layer formed by galvanoplastic has the fast and easy feature such as removal of high temperature resistant, deposition velocity, the sacrificial layer material of avoiding conventional method to use to be removed under the slow and high temperature of speed easily distortion and causes the problems such as the distortion of bridge architecture, the bridge-type of preparation is formed, and speed is fast and structure is smooth, optimize the preparation technology of bridge architecture in piezoelectric type injection apparatus, improve product quality.
Fig. 3 is the flow chart of the manufacture method of the liquid injection apparatus of further embodiment of this invention.As shown in Figure 3, on the basis of the embodiment of the manufacture method of aforesaid liquid injection apparatus, the manufacture method of the liquid injection apparatus of the present embodiment is done above-described embodiment and is illustrated further.
Step 300, on substrate etching formed groove.
In the present embodiment, substrate can be silicon substrate, wet etching or dry etching is adopted to form groove, the size of groove, quantity and shape can set according to the actual requirements, quantity can be one or more, shape can be square, also can be other shape, not limited in the present embodiment.
Step 301, adopt galvanoplastic Titanium Electroplating, copper and titanium layer successively on described groove inner wall, as Seed Layer.
In the present embodiment, first groove inner wall can electroplate one deck Seed Layer, its seed layer materials is selected according to sacrificial layer material and baseplate material, general selection principle is the good adhesion between Seed Layer and substrate, its macroscopic property coupling better, and Seed Layer can not react with the electroplate liquid of sacrifice layer and be corroded, put Seed Layer in atmosphere in addition also not easily oxidized, in the present embodiment, Seed Layer forms by electroplating Ti, Cu and Ti layer successively, and sacrifice layer is electroplated Zn layer by ammonium salt electroplate liquid and formed.
Step 302, in described groove, form sacrifice layer, described sacrifice layer is concordant with the surface of described substrate.
In the present embodiment, when galvanoplastic form sacrifice layer, its electroplate liquid can be without ammonium chloride electroplate liquid, or alkaline zincate electroplate liquid, or ammonium salt electroplate liquid etc., the performance of various electroplate liquid through Experimental Comparison, concrete as table 1:
Table 1 electroplate liquid performance comparison
In the present embodiment, preferably adopt the electroplate liquid of ammonium salt and citric acid composition, form zinc layers, as sacrifice layer through electro-deposition.Composition and the electroplating parameter of its electroplate liquid are as shown in table 2:
Table 2 electroplate liquid composition and electroplating parameter
In actual applications, the parameter in table 2 preferably temperature controls below 23 DEG C, and current density is 15mA/cm
2, electroplating time is 20 minutes, and can obtain 10 μm of thick Zn layers, the Zn layer surface obtained under this electroplating parameter is comparatively smooth, and covering power is better, and deposition velocity is fast.After electro-deposition Zn fills up whole groove, substrate is placed in vacuum drying oven, and be warmed up to about 200 DEG C baking sacrifice layers gradually, gas (all having hydrogen evolution phenomenon during electro-deposition Zn) in sacrifice layer is discharged, avoid follow-up carry out high-temperature technology time, body structure surface emergent gas destroy sacrificial layer structure.
Step 303, on described sacrifice layer, form elastic membrane, with the edge making described elastic membrane be overlapped on described groove, and part covers the uncovered of described groove, and described elastic membrane can produce elastic deformation under external force.
In the present embodiment, by Low Pressure Chemical Vapor Deposition or plasma enhanced chemical vapor deposition method, sacrifice layer forms elastic membrane, the shape of elastic membrane can be rectangle, also can be square, it can also be other shape, when elastic membrane be rectangle or square time, elastic membrane can by both sides wherein or while be overlapped on the edge of groove, preferably the length of elastic membrane is greater than the length of groove in the present embodiment, the width of elastic membrane is less than the width of groove, and the edge that the two ends of elastic membrane length direction can be overlapped on respectively groove is connected with substrate, the two ends of elastic membrane width do not overlap with recess edge, namely bridge architecture is formed, in the present embodiment, elastic membrane can be SiO
2layer or Si
3n
4layer, or elastic membrane also can be SiO
2layer and Si
3n
4multilayer laminated structure.
Step 304, in described elastic membrane, form piezoelectric element, described piezoelectric element produces external force needed for elastic deformation for generation of making described elastic membrane.
In the present embodiment, elastic membrane is formed a piezoelectric element, when piezoelectric element two ends apply the voltage of forward or negative sense, piezoelectric element can up-down vibration make elastic membrane can produce elastic deformation on certain direction, after applied voltage removes, elastic membrane distortion also disappears thereupon, and elastic membrane returns to nature.
The present embodiment is by adopting piezoelectric element to make elastic membrane produce elastic deformation, in addition, can also make elastic membrane generation elastic deformation, do not limited in the application by heat, light or magnetic actuation.
In the present embodiment, elastic membrane forms piezoelectric element, specifically comprise: in elastic membrane, form lower electrode layer by sputtering method; By sol-gal process on lower electrode layer, and carry out high-temperature calcination, form piezoelectric body layer; Piezoelectric body layer forms upper electrode layer by sputtering method, wherein the length of lower electrode layer, piezoelectric body layer and upper electrode layer is equal and be less than the length of elastic membrane, the width of lower electrode layer, piezoelectric body layer and upper electrode layer is equal respectively and be less than the width of elastic membrane, and lower electrode layer can be titanium (Ti) layer, platinum (Pt) layer or multiple titanium layer superimposed layer; Piezoelectric body layer can be lead zirconate titanate (PZT) layer; Upper electric layer can be platinum (Pt) layer or gold layer.
Step 305, remove described sacrifice layer.
In the present embodiment, corresponding chemical reagent is selected to be removed by sacrifice layer, hydrochloric acid is preferably adopted to remove sacrifice layer, after removing sacrifice layer, substrate is formed ink-feed channel, public chamber and pressure chamber, the outer wall of pressure chamber forms nozzle, completes the manufacturing process of liquid injection apparatus.
In the present embodiment, if in step 303, the two ends of elastic membrane length direction are overlapped on the edge of groove, when the two ends of width are not overlapped on recess edge, after step 305, the penetrating gap to described groove is offered in the one end preferably elastic membrane be overlapped among the two ends in recess edge, or the penetrating gap to described groove is offered in one end among two ends elastic membrane being overlapped in recess edge and elastic membrane one end be overlapped in recess edge, elastic membrane is made to only have one end to be connected with recess edge, namely cantilever structure is formed, because cantilever structure only has one end to be fixed on substrate, its constraint be subject to compared with bridge architecture is less, so under the effect of piezoelectric element, the distortion of elastic membrane is larger.
Liquid injection apparatus of the present invention and manufacture method thereof, by increasing Seed Layer between substrate and sacrifice layer, improve the adhesion property between sacrifice layer and substrate, the sacrificial layer material Zn formed by galvanoplastic again carrys out filling groove, because Zn layer is high temperature resistant, deposition velocity soon and easily remove, the sacrificial layer material of avoiding conventional method to use to be removed under the slow and high temperature of speed easily distortion and causes the problems such as the distortion of bridge architecture, the bridge-type of preparation is formed, and speed is fast and structure is smooth, optimize the preparation technology of bridge architecture in existing piezoelectric type injection apparatus, improve product quality, and by offering gap between elastic membrane and groove, elastic membrane is made to become cantilever structure, increase the amplitude of deformation of elastic membrane.
Fig. 4 is the structural representation of the liquid injection apparatus of one embodiment of the invention, Fig. 5 is the structural representation one of liquid injection apparatus of the present invention, Fig. 6 A is the structural representation two of liquid injection apparatus of the present invention, Fig. 6 B is the side structure schematic diagram of Fig. 6 A, Fig. 7 is the structural representation three of liquid injection apparatus of the present invention, Fig. 8 A is the structural representation four of liquid injection apparatus of the present invention, Fig. 8 B is the side structure schematic diagram of Fig. 8 A, with reference to Fig. 4-Fig. 8 B, the liquid injection apparatus of the present embodiment can be used in various printer, this liquid injection apparatus is that the method recorded according to an above-mentioned embodiment obtains, comprise: substrate 1, groove 2, elastic membrane 3, upper electrode layer 4, piezoelectric body layer 5, lower electrode layer 6, liquid feeding channel 10, public chamber 7, nozzle 8 and pressure chamber 9, wherein substrate 1 there is one or more groove 2, each face of groove 2 forms sacrifice layer 2a by plating, in practical operation, can increase by a Seed Layer 2b(as shown in Figure 5 between substrate 1 and sacrifice layer 2a), after having electroplated, sacrifice layer forms elastic membrane 3 by chemical vapour deposition technique, elastic membrane 3 is formed by sputtering method and forms upper electrode layer 4 and lower electrode layer 6 respectively, between upper electrode layer 4 and lower electrode layer 6, by sol-gal process and high-temperature calcination forms a piezoelectric body layer 5, upper electrode layer 4, lower electrode layer 6 and piezoelectric body layer 5 constitute piezoelectric element, piezoelectric element is for generation of the external force making elastic membrane 3 occur needed for corresponding deformation.Then, as shown in figs. 8 a and 8b, sacrifice layer 2a and Seed Layer 2b is removed by chemical reagent, after removal, form liquid feeding channel 10 on substrate 1, public chamber 7 and pressure chamber 9, the outer wall of pressure chamber 9 forms nozzle 8, complete the manufacturing process of liquid injection apparatus, in real work, liquid enters from liquid feeding channel 10, the pressure chamber 9 of the right and left is flowed to respectively by public chamber 7, apply voltage simultaneously and make piezoelectric element up-down vibration, thus make elastic membrane 3 that corresponding deformation occur, liquid in squeeze pressure chamber 9 sprays from nozzle 8.
Liquid injection apparatus of the present invention, the sacrifice layer formed by galvanoplastic carrys out filling groove makes the elastic membrane structure of preparation smooth, avoids in existing piezoelectric type injection apparatus the problem that easily to occur bending and deformation when discharging bridge type beam, improves product quality.
Fig. 9 is the structural representation five of liquid injection apparatus of the present invention, with reference to shown in Fig. 4-9, further, liquid injection apparatus of the present invention also comprises a gap 11(as shown in Figure 9), in the present embodiment, the length of elastic membrane 3 is greater than the length of groove 2, and the width of elastic membrane 3 is less than the width (as shown in Figure 6 A and 6 B) of groove 2.When after removal sacrifice layer 2a and Seed Layer 2b, the penetrating gap 11 to groove 2 is offered in one end elastic membrane 3 be overlapped among the two ends on groove 3 edge, to make elastic membrane 3 one-tenth cantilever structure.
Liquid injection apparatus of the present invention, by elastic membrane is arranged to cantilever structure, because cantilever structure only has one end to be fixed on substrate, its constraint be subject to compared with bridge architecture is less, so under the effect of piezoelectric element, the distortion of elastic membrane is larger, improves jeting effect.
Last it is noted that above each embodiment is only in order to illustrate technical scheme of the present invention, be not intended to limit; Although with reference to foregoing embodiments to invention has been detailed description, those of ordinary skill in the art is to be understood that: it still can be modified to the technical scheme described in foregoing embodiments, or carries out equivalent replacement to wherein some or all of technical characteristic; And these amendments or replacement, do not make the essence of appropriate technical solution depart from the scope of various embodiments of the present invention technical scheme.
Claims (12)
1. a manufacture method for liquid injection apparatus, is characterized in that, comprising:
On substrate, etching forms groove;
In described groove, form sacrifice layer, described sacrifice layer is concordant with the surface of described substrate;
Described sacrifice layer is formed an elastic membrane, and with the edge making described elastic membrane be overlapped on described groove, and part covers the uncovered of described groove, and described elastic membrane can produce elastic deformation under external force;
Remove described sacrifice layer.
2. the manufacture method of liquid injection apparatus according to claim 1, is characterized in that, forms sacrifice layer and comprise in described groove:
Adopt the electroplate liquid of ammonium salt and citric acid composition, form zinc layers by galvanoplastic, as described sacrifice layer.
3. the manufacture method of liquid injection apparatus according to claim 1, is characterized in that, before forming sacrifice layer, also comprises:
Adopt galvanoplastic Titanium Electroplating, copper and titanium layer successively on described groove inner wall, as Seed Layer.
4. liquid injection apparatus manufacture method according to claim 1, is characterized in that, described sacrifice layer is formed an elastic membrane, comprising:
Form elastic membrane by Low Pressure Chemical Vapor Deposition or plasma enhanced chemical vapor deposition method, the material of described elastic membrane is SiO
2or Si
3n
4.
5. liquid injection apparatus manufacture method according to claim 1, it is characterized in that, also comprise after described sacrifice layer is formed an elastic membrane: in described elastomeric film surface, form piezoelectric element, described piezoelectric element is for generation of the external force made needed for described elastic membrane generation elastic deformation.
6. liquid injection apparatus manufacture method according to claim 5, is characterized in that, described elastomeric film surface forms piezoelectric element and comprises:
Described elastic membrane forms lower electrode layer by sputtering method;
By sol-gal process on above-mentioned lower electrode layer, and carry out high-temperature calcination, form piezoelectric body layer;
Described piezoelectric body layer forms upper electrode layer by sputtering method.
7. liquid injection apparatus manufacture method according to claim 6, is characterized in that, described lower electrode layer is titanium layer, platinum layer or multiple titanium layer superimposed layer; Described piezoelectric body layer is lead zirconate titanate layer; Described upper electric layer is platinum layer or gold layer.
8., according to the manufacture method of the arbitrary described liquid injection apparatus of claim 1-7, it is characterized in that, remove described sacrifice layer and comprise:
Watery hydrochloric acid is adopted to remove described sacrifice layer.
9. the manufacture method of liquid injection apparatus according to claim 8, is characterized in that:
The length of described elastic membrane is greater than the length of described groove, and the width of described elastic membrane is less than the width of described groove, and described elastic membrane forms bridge architecture relative to described groove.
10. the manufacture method of liquid injection apparatus according to claim 8, is characterized in that, after removing described sacrifice layer, also comprises:
The penetrating gap to described groove is offered in the one end described elastic membrane be overlapped among the two ends in recess edge, becomes cantilever structure to make described elastic membrane.
The manufacture method of 11. liquid injection apparatus according to claim 8, is characterized in that, also comprises after removing described sacrifice layer:
Form ink-feed channel, public chamber and pressure chamber on the substrate, the outer wall of described pressure chamber forms nozzle.
12. 1 kinds of liquid injection apparatus adopting the manufacture method of the arbitrary described liquid injection apparatus of claim 1-11 to manufacture.
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|---|---|---|---|
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|---|---|---|---|
| CN201310444465.1A CN104441990B (en) | 2013-09-23 | 2013-09-23 | Liquid injection apparatus and manufacture method thereof |
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|---|---|---|---|---|
| CN1490160A (en) * | 2002-10-16 | 2004-04-21 | 飞赫科技股份有限公司 | Piezo ink-jet head and pressure cavity shaping method |
| CN1631551A (en) * | 2003-12-23 | 2005-06-29 | 明基电通股份有限公司 | Fluid jetting device and its production process |
| CN101003206A (en) * | 2006-01-20 | 2007-07-25 | 三星电机株式会社 | Inkjet printer head and fabricating method thereof |
| CN102285230A (en) * | 2010-06-17 | 2011-12-21 | 精工爱普生株式会社 | Method for producing liquid-ejecting head |
| CN102729629A (en) * | 2011-04-13 | 2012-10-17 | 富士胶片株式会社 | Forming a membrane having curved features |
-
2013
- 2013-09-23 CN CN201310444465.1A patent/CN104441990B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1490160A (en) * | 2002-10-16 | 2004-04-21 | 飞赫科技股份有限公司 | Piezo ink-jet head and pressure cavity shaping method |
| CN1631551A (en) * | 2003-12-23 | 2005-06-29 | 明基电通股份有限公司 | Fluid jetting device and its production process |
| CN101003206A (en) * | 2006-01-20 | 2007-07-25 | 三星电机株式会社 | Inkjet printer head and fabricating method thereof |
| CN102285230A (en) * | 2010-06-17 | 2011-12-21 | 精工爱普生株式会社 | Method for producing liquid-ejecting head |
| CN102729629A (en) * | 2011-04-13 | 2012-10-17 | 富士胶片株式会社 | Forming a membrane having curved features |
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Owner name: ZHUHAI SEINE PRINTING TECHNOLOGY CO., LTD. Free format text: FORMER OWNER: ZHUHAI NASIDA ENTERPRISE MANAGEMENT CO., LTD. Effective date: 20150528 |
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Effective date of registration: 20150528 Address after: 519075, Guangdong, Xiangzhou District, Zhuhai Avenue, No. 01, building 1, 3883, 2, 4, 7, 02, 04, 1, 2, 3, 5, Zhuhai Applicant after: Zhuhai Seine Printing Technology Co., Ltd. Address before: 519075 Xiangzhou, Zhuhai, Pearl Road, North District, No. 63, No. Applicant before: Zhuhai Nasida Enterprise Management Co., Ltd. |
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Effective date of registration: 20200925 Address after: Room 105-60088, No. 6, Baohua Road, Hengqin New District, Zhuhai City, Guangdong Province Patentee after: Zhuhai Sanwei Technology Co.,Ltd. Address before: 519075, Guangdong, Xiangzhou District, Zhuhai Avenue, No. 01, building 1, 3883, 2, 4, 7, 02, 04, 1, 2, 3, 5, Zhuhai Patentee before: Zhuhai Saina Printing Technology Co.,Ltd. |