CN104353643B - A kind of maintenance system and maintaining method for reducing ultrasonic cleaner - Google Patents
A kind of maintenance system and maintaining method for reducing ultrasonic cleaner Download PDFInfo
- Publication number
- CN104353643B CN104353643B CN201410716093.8A CN201410716093A CN104353643B CN 104353643 B CN104353643 B CN 104353643B CN 201410716093 A CN201410716093 A CN 201410716093A CN 104353643 B CN104353643 B CN 104353643B
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- CN
- China
- Prior art keywords
- quartz ampoule
- ultrasonic cleaner
- twin
- safeguarded
- reduce
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
Abstract
The invention discloses it is a kind of reduce ultrasonic cleaner maintenance system and maintaining method, comprising：Board, it includes quartz ampoule；Microwave system, its one end activity is nested with quartz ampoule.Board is also comprising the gas line and twin-jet nozzle being sequentially connected；Wherein quartz ampoule is horizontally disposed with, and is connected with the input of gas line；Gas enters from quartz ampoule, and is delivered to twin-jet nozzle via gas line.Connection between microwave system and board is set to activity by the present invention, changes the position of applicator during processing procedure so that quartz ampoule is uniformly consumed during processing procedure, the maintenance times of ultrasonic cleaner is reduced, so as to increase the use time of quartz ampoule.
Description
Technical field
Field is cleaned the present invention relates to semiconductor ultrasonic wave, more particularly to a kind of maintenance system for reducing ultrasonic cleaner
And maintaining method.
Background technology
The ultrasonic cleaner of prior art（Such as the ultrasonic cleaner of CDE200 series）, can be to stone during processing procedure
English pipe has been consumed, with the increase of board radio frequency time, and the tube wall of quartz ampoule can be gradually thinning, because microwave system is fixed on
On quartz ampoule, therefore it is only capable of during processing procedure consuming the quartz ampoule of microwave system fixed connection place.Add ultrasonic wave cleaning
The maintenance times of device.
The content of the invention
It is an object of the invention to provide it is a kind of reduce ultrasonic cleaner maintenance system and maintaining method, by microwave system with
Connection between board is set to activity, changes the position of applicator during processing procedure so that quartz ampoule is equal during processing procedure
Even consumption, reduces the maintenance times of ultrasonic cleaner, so as to increase the use time of quartz ampoule.
In order to realize the above object the present invention is achieved by the following technical solutions：
A kind of maintenance system for reducing ultrasonic cleaner, is characterized in, comprising：
Board, it includes quartz ampoule；
Microwave system, its one end activity is nested with quartz ampoule.
Described board is also comprising the gas line and twin-jet nozzle being sequentially connected；
Wherein described quartz ampoule is horizontally disposed with, and is connected with the input of gas line；
Gas enters from quartz ampoule, and is delivered to twin-jet nozzle via gas line.
Described board also includes electrostatic chuck, and it is located at the bottom of twin-jet nozzle；
Gas is sprayed by twin-jet nozzle, and is precipitated by the electrostatic chuck for the bottom for being arranged on twin-jet nozzle, finally from board
Discharge bottom.
Described microwave system includes automatic frequency adjustment device and the orientation frequency mixer, the Virtual Load insulator that are sequentially connected
And microwave oscillator；
Described automatic frequency adjustment device one end is connected with orientation frequency mixer, and its other end activity is nested with quartz ampoule.
The described automatic frequency adjustment device other end is movably connected on quartz ampoule by high-frequency electrode, and causes described microwave
System is slided along quartz ampoule.
The present invention compared with prior art, with advantages below：
Connection between microwave system and board is set to activity by the present invention, changes the position of applicator during processing procedure
Put so that quartz ampoule is uniformly consumed during processing procedure, the maintenance times of ultrasonic cleaner are reduced, so as to increase quartz ampoule
Use time.
Brief description of the drawings
Fig. 1 is a kind of structural representation for the maintenance system for reducing ultrasonic cleaner of the present invention.
Embodiment
Below in conjunction with accompanying drawing, by describing a preferably specific embodiment in detail, the present invention is further elaborated.
As described in Figure 1, a kind of maintenance system for reducing ultrasonic cleaner, comprising：Board 1, it includes quartz ampoule 11；It is micro-
Wave system system 2, its one end activity is nested with quartz ampoule 11.
Board 1 is also comprising the gas line 12 and twin-jet nozzle 13 being sequentially connected；Wherein quartz ampoule 11 be horizontally disposed with, and with gas
The input of fluid line 12 is connected；Gas enters from quartz ampoule 11, and is delivered to double sprays 13 via gas line 12.Board is also wrapped
Containing electrostatic chuck 14, it is located at the bottom of twin-jet nozzle 13；Gas is sprayed by twin-jet nozzle 13, and by being arranged on twin-jet nozzle 13
The electrostatic chuck 14 of bottom is precipitated, and is finally discharged from the bottom of board 1.
Microwave system 2 includes automatic frequency adjustment device 21 and the orientation frequency mixer 22, the Virtual Load insulator 23 that are sequentially connected
With microwave oscillator 24；The one end of automatic frequency adjustment device 21 is connected with orientation frequency mixer 22, and its other end activity is nested with quartz ampoule 11
On, microwave oscillator 24 produces the microwave of concussion by Virtual Load insulator 23, orientation frequency mixer 22 and automatic frequency adjustment device 21
Into fixed frequency microwave transmission tremendously high frequency electrode after processing, the ionized gas production in the quartz ampoule 11 of microwave-excitation microwave system 2
Raw ion.
The other end of automatic frequency adjustment device 21 is movably connected on quartz ampoule 11 by high-frequency electrode 3, and causes described microwave
System 2 is slided along quartz ampoule 11.
A kind of maintaining method for reducing ultrasonic cleaner, comprising：By described microwave system 2 along quartz ampoule during processing procedure
The step for 11 slip.
In summary, a kind of maintenance system for reducing ultrasonic cleaner of the present invention, by between microwave system and board
Connection is set to activity, changes the position of applicator during processing procedure so that quartz ampoule is uniformly consumed during processing procedure, reduces
The maintenance times of ultrasonic cleaner, so as to increase the use time of quartz ampoule.
Although present disclosure is discussed in detail by above preferred embodiment, but it should be appreciated that above-mentioned
Description is not considered as limitation of the present invention.After those skilled in the art have read the above, for the present invention's
A variety of modifications and substitutions all will be apparent.Therefore, protection scope of the present invention should be limited to the appended claims.
Claims (7)
1. a kind of reduce the system that ultrasonic cleaner is safeguarded, it is characterised in that includes：
Board（1）, it includes quartz ampoule（11）；
Microwave system（2）, its one end activity is nested with quartz ampoule（11）On；
Described microwave system（2）Include automatic frequency adjustment device（21）And the orientation frequency mixer being sequentially connected（22）, Virtual Load
Insulator（23）And microwave oscillator（24）；
Described automatic frequency adjustment device（21）One end and orientation frequency mixer（22）It is connected, its other end activity is nested with quartz ampoule（11）
On.
2. reduce the system that ultrasonic cleaner is safeguarded as claimed in claim 1, it is characterised in that described board（1）Also
Include the gas line being sequentially connected（12）And twin-jet nozzle（13）；
Wherein described quartz ampoule（11）It is horizontally disposed, and and gas line（12）Input be connected；
Gas is from quartz ampoule（11）Into, and via gas line（12）It is delivered to twin-jet nozzle（13）.
3. reduce the system that ultrasonic cleaner is safeguarded as claimed in claim 2, it is characterised in that described board is also included
Electrostatic chuck（14）, it is located at twin-jet nozzle（13）Bottom；
Gas passes through twin-jet nozzle（13）Spray, and by being arranged on twin-jet nozzle（13）Bottom electrostatic chuck（14）Precipitation, most
Afterwards from board（1）Discharge bottom.
4. reduce the system that ultrasonic cleaner is safeguarded as claimed in claim 1, it is characterised in that described automatic frequency adjustment device
（21）The other end passes through high-frequency electrode（3）It is movably connected in quartz ampoule（11）On, and cause described microwave system（2）Along stone
Ying Guan（11）Slide.
5. reduce the system that ultrasonic cleaner is safeguarded as claimed in claim 4, it is characterised in that described microwave system exists
Sliding distance is ultrasonic wave manufacturing process for cleaning distance on quartz ampoule.
6. a kind of reduce the method that ultrasonic cleaner is safeguarded, it is characterised in that includes：By microwave system during processing procedure（2）Along
Quartz ampoule（11）The step for slip；
Described microwave system（2）Include automatic frequency adjustment device（21）And the orientation frequency mixer being sequentially connected（22）, Virtual Load
Insulator（23）And microwave oscillator（24）；
Described automatic frequency adjustment device（21）One end and orientation frequency mixer（22）It is connected, its other end activity is nested with quartz ampoule（11）
On.
7. reduce the method that ultrasonic cleaner is safeguarded as claimed in claim 6, it is characterised in that described microwave system
（2）Pass through high-frequency electrode（3）Along quartz ampoule（11）Slide.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410716093.8A CN104353643B (en) | 2014-12-02 | 2014-12-02 | A kind of maintenance system and maintaining method for reducing ultrasonic cleaner |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410716093.8A CN104353643B (en) | 2014-12-02 | 2014-12-02 | A kind of maintenance system and maintaining method for reducing ultrasonic cleaner |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN104353643A CN104353643A (en) | 2015-02-18 |
| CN104353643B true CN104353643B (en) | 2017-07-25 |
Family
ID=52521002
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410716093.8A Active CN104353643B (en) | 2014-12-02 | 2014-12-02 | A kind of maintenance system and maintaining method for reducing ultrasonic cleaner |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN104353643B (en) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1038036A (en) * | 1988-05-10 | 1989-12-20 | 公共供应公司 | Method with the after-glow plasma clean surface |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63235480A (en) * | 1987-03-24 | 1988-09-30 | Res Dev Corp Of Japan | Device for microwave plasma cvd |
| US8057777B2 (en) * | 2007-07-25 | 2011-11-15 | Nanocomp Technologies, Inc. | Systems and methods for controlling chirality of nanotubes |
| CN102627370A (en) * | 2012-03-30 | 2012-08-08 | 宁波大学 | Microwave photocatalytic device for degrading wastewater and being capable of keeping high treatment efficient continuously |
| CN102826698A (en) * | 2012-09-11 | 2012-12-19 | 宁波大学 | Wastewater-degradation microwave photocatalytic device beneficial to inhibiting energy unnecessary dissipation |
| CN203910132U (en) * | 2014-04-21 | 2014-10-29 | 成都科创佳思科技有限公司 | Diffraction teaching device |
-
2014
- 2014-12-02 CN CN201410716093.8A patent/CN104353643B/en active Active
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1038036A (en) * | 1988-05-10 | 1989-12-20 | 公共供应公司 | Method with the after-glow plasma clean surface |
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| CN104353643A (en) | 2015-02-18 |
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