CN104328387A - Device for cleaning sprinkler head of vapor deposition device - Google Patents
Device for cleaning sprinkler head of vapor deposition device Download PDFInfo
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- CN104328387A CN104328387A CN201410687729.0A CN201410687729A CN104328387A CN 104328387 A CN104328387 A CN 104328387A CN 201410687729 A CN201410687729 A CN 201410687729A CN 104328387 A CN104328387 A CN 104328387A
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Abstract
The invention discloses a device for cleaning a sprinkler head of a vapor deposition device. The device comprises a cleaning part detachably arranged on a rotating tray, wherein the rotating radius of the cleaning part is greater than or equal to the radius of the sprinkler head. By fixedly arranging the cleaning part on the rotating tray of the vapor deposition device, after the vapor phase epitaxial growth per furnace is completed, the rotating tray is driven to upwards move and rotate so as to achieve automatic cleaning of the sprinkler head, the manpower is saved and the scrubbing is uniform. The power of the rotating tray is derived from the device, thus having good adaptability and reproducibility. After the fixed distance and the fixed rotating speed of the cleaning part relative to the sprinkler head are set, cleaning force and the rotating speed of each time are same so that each degree of cleanliness is consistent and the stability of the process is ensured. In addition, since high and low brush hairs are arranged at intervals and the height of the cleaning part is adjusted, the brush hairs can penetrate through small holes of the sprinkler head to clean and the cleaning of the surface and pore spaces of the sprinkler head can be effectively achieved.
Description
Technical field
The invention belongs to gaseous phase deposition equipment technical field, be specifically related to a kind of gaseous phase deposition equipment spray header cleaning device.
Background technology
MOCVD (Metal-Organic Chemical Vapor Deposition organometallics chemical gaseous phase deposition) is a kind of Novel air phase epitaxy growing technology grown up on the basis of vapor phase epitaxial growth.
MOCVD be one by specific starting material by a series of strict control, be transferred to heat growth district, in this vitellarium, element compounds after starting material thermolysis forms the crystalline material with certain optical, electrical performance.General MOCVD device comprises heating system, cooling system, gas transport system, exhaust treatment system and Controlling System.Adopt coupling spray header (Closed Coupled Showerhead, the upper cover employing aperture of CVD system CCS) transports in gaseous starting materials to reaction chamber and reacts, because the aperture of Showerhead (spray header) is very little, and the distance of reaction platform is very near in distance reaction chamber, a large amount of pre-reaction can be there is unavoidably in gaseous starting materials material, this reactant can cover rapidly the orifice surface of showerhead, often grow a stove, all need and manually scrub clean showerhead surface, this operation not only waste of manpower, also can because of different employee, different time is firmly different, or the homogeneity of brush is good not, badly influence the production of next stove, it is the important factor causing board instability.
The clean level of Showerhead brush, directly has influence on of heap of stone crystalline condition and the temperature control system of epitaxy technique, if less after process window blocking, is then difficult to grow stable handicraft product.Also the showerhead situation of the different clean level of coupling is difficult to by the adjustment of processing parameter.
In addition, the artificial clean surface generally only scrubbing spray header, still can lingering section material in the hole of spray header, and duration of service one is long, and small aperture still can be more and more less, and it is a lot of that this will cause processing parameter to drift about, and cannot stablize the industrial production of MOCVD.
Therefore, in view of above problem, be necessary the cleaning device proposing a kind of spray header, after often growing a stove, automatic cleaning realized to spray header, save manpower, scrub evenly, thoroughly clean, and guarantee that each clean-up performance is consistent, thus ensure the stability of technique.
Summary of the invention
In view of this, the invention provides a kind of gaseous phase deposition equipment spray header cleaning device, by being fixed on the rotary-tray of equipment by cleaning member, by driving rotary-tray moving and rotating after often growing a stove, realize the automatic cleaning to spray header, save manpower, scrub evenly, thoroughly clean, and clean dynamics, rotating speed are identical at every turn, guarantee that each clean-up performance is consistent, thus ensure the stability of technique.
A kind of gaseous phase deposition equipment spray header cleaning device that object according to the present invention proposes, for cleaning the tectum on spray header surface, described gaseous phase deposition equipment comprises heating system, reaction chamber, be arranged at the rotary-tray in described reaction chamber, the spray header of gaseous starting materials is carried in described reaction chamber, described cleaning device comprises the cleaning member be removable installed on described rotary-tray, described cleaning member is with rotary-tray synchronous axial system, and the rotation radius of cleaning member is more than or equal to the radius of described spray header;
Described cleaning device also comprises the rotating mechanism driving rotary-tray running, and drive rotary-tray to move up and down the hoisting appliance making cleaning member and spray header surface contact, time clean, hoisting appliance driven rotary pallet moves and contacts with spray header, rear drive rotary-tray drives cleaning member cleaning spray head.
Preferably, the described cleaning member bristle that comprises connection bracket, be fixedly installed on the brush in described connection bracket and be positioned on described brush.
Preferably, described bristle adopts height bristle spaced arrangement to arrange.
Preferably, described connection bracket and brush all adopt resistant to elevated temperatures tetrafluoroethylene material.
Preferably, described connection bracket and the machine-shaping of brush one.
Preferably, described connection bracket is ring structure, and described connection bracket and described rotary-tray connect and fix, described connection bracket with described rotary-tray is respectively arranged with the bayonet socket and buckle that mutually mate.
Preferably, described brush is for starting point is multiple spokes of radial distribution with described connection bracket center.
Preferably, described spoke is linear structure or shaped form structure or broken-line type structure.
Compared with prior art, the advantage of gaseous phase deposition equipment spray header cleaning device disclosed by the invention is: by being fixed on the rotary-tray of equipment by cleaning member, by driving rotary-tray moving and rotating after often growing a stove, realize the automatic cleaning to spray header, save manpower, scrub evenly, thoroughly clean.
Rotary-tray is the integral part of gaseous phase deposition equipment, so the propulsion source of rotary-tray is from of equipment itself, has good adaptability and circulation ratio.
Setting the fixing distance of the relative spray header of cleaning member, after fixing rotating speed, each clean dynamics, rotating speed are all identical, guarantee that each clean-up performance is consistent, thus ensure the stability of technique.
In addition, bristle adopts height to be spaced, and by the height of adjustment cleaning member, bristle can be penetrated in spray header aperture clean, and what can effectively realize spray header surface and hole is clean, clean more thorough.
Accompanying drawing explanation
In order to be illustrated more clearly in the embodiment of the present invention or technical scheme of the prior art, be briefly described to the accompanying drawing used required in embodiment or description of the prior art below, apparently, accompanying drawing in the following describes is only some embodiments of the present invention, for those of ordinary skill in the art, under the prerequisite not paying creative work, other accompanying drawing can also be obtained according to these accompanying drawings.
Fig. 1 is the structure diagram of gaseous phase deposition equipment.
Fig. 2 to Fig. 5 is the schematic diagram of 4 kinds of structures of cleaning member.
The title of the numeral in figure or the corresponding component representated by letter:
1, heating system 2, reaction chamber 3, rotary-tray 4, spray header 5, cleaning member 6, rotating shaft 51, connection bracket 52, brush
Embodiment
When employing coupling spray header transports and reacts in gaseous starting materials to reaction chamber, because the aperture of spray header is very little, and the distance of reaction platform is very near in distance reaction chamber, a large amount of pre-reaction can be there is unavoidably in gaseous starting materials material, this reactant can cover rapidly the orifice surface of spray header, often grow a stove, all need and manually scrub cleaning spray head surface, this operation not only waste of manpower, also can because of different employee, different time is firmly different, or the homogeneity of brush is good not, badly influence the production of next stove, it is the important factor increasing board instability.The clean level that spray header is clean, directly has influence on of heap of stone crystalline condition and the temperature control system of epitaxy technique, if process window is less, is difficult to grow stable handicraft product.Also the spray header situation of the different clean level of coupling is difficult to by the adjustment of processing parameter.
The present invention is directed to deficiency of the prior art, provide a kind of gaseous phase deposition equipment spray header cleaning device, by being fixed on the rotary-tray of equipment by cleaning member, by driving rotary-tray moving and rotating after often growing a stove, realize the automatic cleaning to spray header, save manpower, scrub evenly, thoroughly clean, and clean dynamics, rotating speed are identical at every turn, guarantee that each clean-up performance is consistent, thus ensure the stability of technique.
A kind of gaseous phase deposition equipment spray header cleaning device that object according to the present invention proposes, for cleaning the tectum on spray header surface, described gaseous phase deposition equipment comprises heating system, reaction chamber, be arranged at the rotary-tray in described reaction chamber, the spray header of gaseous starting materials is carried in described reaction chamber, described cleaning device comprises the cleaning member be removable installed on described rotary-tray, described cleaning member is with rotary-tray synchronous axial system, and the rotation radius of cleaning member is more than or equal to the radius of described spray header;
Described cleaning device also comprises the rotating mechanism driving rotary-tray running, and drive rotary-tray to move up and down the hoisting appliance making cleaning member and spray header surface contact, time clean, hoisting appliance driven rotary pallet moves and contacts with spray header, rear drive rotary-tray drives cleaning member cleaning spray head.
Preferably, the described cleaning member bristle that comprises connection bracket, be fixedly installed on the brush in described connection bracket and be positioned on described brush.
Preferably, described bristle adopts height bristle spaced arrangement to arrange.
Preferably, described connection bracket and brush all adopt resistant to elevated temperatures tetrafluoroethylene material.
Preferably, described connection bracket and the machine-shaping of brush one.
Preferably, described connection bracket is ring structure, and described connection bracket and described rotary-tray connect and fix, described connection bracket with described rotary-tray is respectively arranged with the bayonet socket and buckle that mutually mate.
Preferably, described brush is for starting point is multiple spokes of radial distribution with described connection bracket center.
Preferably, described spoke is linear structure or shaped form structure or broken-line type structure.
To be clearly and completely described technical scheme of the present invention by embodiment below.Obviously, described embodiment is only the present invention's part embodiment, instead of whole embodiments.Based on the embodiment in the present invention, those of ordinary skill in the art, not making the every other embodiment obtained under creative work prerequisite, belong to the scope of protection of the invention.
Refer to Fig. 1, a kind of gaseous phase deposition equipment spray header cleaning device, for cleaning the tectum on spray header surface, gaseous phase deposition equipment comprises heating system 1, reaction chamber 2, be arranged at the rotary-tray 3 in reaction chamber 2, carry the spray header 4 of gaseous starting materials in reaction chamber 2, cleaning device comprises the cleaning member 5 be removable installed on rotary-tray 3, cleaning member 5 is with rotary-tray 3 synchronous axial system, and the rotation radius of cleaning member 5 is more than or equal to the radius of spray header 4.After each stove has grown, mechanical manipulator or transfer mechanism can be adopted to be transferred on rotary-tray by cleaning member, afterwards cleaning member to be removably fixed on rotary-tray.Wherein, cleaning member can connect and fix with rotary-tray.By ensureing that the rotation radius of cleaning member guarantees that the whole plane of spray header is all thoroughly cleaned.
Cleaning device also comprises the rotating mechanism driving rotary-tray 3 to operate, and drives rotary-tray 3 to move up and down the hoisting appliance making cleaning member and spray header surface contact.Rotating mechanism and hoisting appliance are the intrinsic mechanism of gaseous phase deposition equipment, and the running power resources of rotating mechanism, in equipment itself, have good adaptability and circulation ratio.Drive the running of rotary-tray to realize the clean automatization of spray header by rotating mechanism, save human cost, increase work efficiency.
And during rotating mechanism driving rotary-tray running, the position of its rotating speed and the relative spray header of cleaning member all can be unified to fix, ensure that spray header cleans dynamics, rotating speed is consistent at every turn, thus guarantee that each clean clean level is basically identical, guarantee the stability of technique.
Refer to Fig. 2 to Fig. 5, wherein, the bristle (not shown) that cleaning member comprises connection bracket 51, is fixedly installed on the brush 52 in connection bracket 51 and is positioned on brush.Connection bracket is used for brush and rotary-tray to be connected and fixed.Connection bracket can be ring structure or multistage arcuate structure etc., and concrete shape does not limit.
In the present embodiment, connection bracket adopts ring structure, can realize being connected with the stable of rotary-tray on the one hand, realizes fixing brush on the other hand, improves the overall construction intensity of brush.
Connection bracket 51 and rotary-tray 3 connect and fix, connection bracket 51 with rotary-tray 3 is respectively arranged with the mutual bayonet socket (not shown) that mates and buckle (not shown).Except employing snap fit is fixing, also can adopt and be threaded, concrete mode of connection does not limit.
Brush is for starting point is multiple spokes of radial distribution with connection bracket 51 center.Wherein spoke can be linear structure or shaped form structure or broken-line type structure etc., and effectively can ensure the clean radius of brush, concrete structure shape does not limit.
Wherein, brush and connection bracket all can adopt resistant to elevated temperatures polytetrafluoroethylmaterial material to make, and ensure can not produce the problems such as high temperature deformation damage when cleaning spray head.
Bristle adopts height bristle spaced arrangement to arrange, can the tectum material of effective cleaning spray head surface.In addition, be in the bristle of higher position when contacting with spray header, bristle part can stretch in the aperture of spray header, realizes cleaning spray header hole, and cleaning efficiency is higher and thorough.
The invention discloses a kind of gaseous phase deposition equipment spray header cleaning device, comprise the cleaning member be removable installed on rotary-tray, cleaning member is with rotary-tray synchronous axial system, and the rotation radius of cleaning member is more than or equal to spray header radius; By cleaning member is fixed on the rotary-tray of equipment, by driving rotary-tray moving and rotating after often growing a stove, realizes the automatic cleaning to spray header, save manpower, scrub evenly, thoroughly clean.
Rotary-tray is the integral part of gaseous phase deposition equipment, so the propulsion source of rotary-tray is from of equipment itself, has good adaptability and circulation ratio.
Setting the fixing distance of the relative spray header of cleaning member, after fixing rotating speed, cleaning dynamics at every turn, rotating speed is identical, guarantee that each clean-up performance is consistent, thus ensure the stability of technique.
In addition, bristle adopts height to be spaced, and by adjustment cleaning member height, bristle can be penetrated in spray header aperture clean, and what can effectively realize spray header surface and hole is clean.
To the above-mentioned explanation of the disclosed embodiments, professional and technical personnel in the field are realized or uses the present invention.To be apparent for those skilled in the art to the multiple amendment of these embodiments, General Principle as defined herein can without departing from the spirit or scope of the present invention, realize in other embodiments.Therefore, the present invention can not be restricted to these embodiments shown in this article, but will meet the widest scope consistent with principle disclosed herein and features of novelty.
Claims (8)
1. a gaseous phase deposition equipment spray header cleaning device, for cleaning the tectum on spray header surface, described gaseous phase deposition equipment comprises heating system, reaction chamber, be arranged at the rotary-tray in described reaction chamber, the spray header of gaseous starting materials is carried in described reaction chamber, it is characterized in that, described cleaning device comprises the cleaning member be removable installed on described rotary-tray, described cleaning member is with rotary-tray synchronous axial system, and the rotation radius of cleaning member is more than or equal to the radius of described spray header;
Described cleaning device also comprises the rotating mechanism driving rotary-tray running, and drive rotary-tray to move up and down the hoisting appliance making cleaning member and spray header surface contact, time clean, hoisting appliance driven rotary pallet moves and contacts with spray header, rear drive rotary-tray drives cleaning member cleaning spray head.
2. gaseous phase deposition equipment spray header cleaning device as claimed in claim 1, is characterized in that, the bristle that described cleaning member comprises connection bracket, is fixedly installed on the brush in described connection bracket and is positioned on described brush.
3. gaseous phase deposition equipment spray header cleaning device as claimed in claim 2, is characterized in that, described bristle adopts height bristle spaced arrangement to arrange.
4. gaseous phase deposition equipment spray header cleaning device as claimed in claim 2, it is characterized in that, described connection bracket and brush all adopt resistant to elevated temperatures tetrafluoroethylene material.
5. gaseous phase deposition equipment spray header cleaning device as claimed in claim 2, is characterized in that, described connection bracket and the machine-shaping of brush one.
6. gaseous phase deposition equipment spray header cleaning device as claimed in claim 2, it is characterized in that, described connection bracket is ring structure, and described connection bracket and described rotary-tray connect and fix, described connection bracket with described rotary-tray is respectively arranged with the bayonet socket and buckle that mutually mate.
7. gaseous phase deposition equipment spray header cleaning device as claimed in claim 2, is characterized in that, described brush is for starting point is multiple spokes of radial distribution with described connection bracket center.
8. gaseous phase deposition equipment spray header cleaning device as claimed in claim 7, is characterized in that, described spoke is linear structure or shaped form structure or broken-line type structure.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410687729.0A CN104328387A (en) | 2014-11-25 | 2014-11-25 | Device for cleaning sprinkler head of vapor deposition device |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201410687729.0A CN104328387A (en) | 2014-11-25 | 2014-11-25 | Device for cleaning sprinkler head of vapor deposition device |
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| CN104328387A true CN104328387A (en) | 2015-02-04 |
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| CN201410687729.0A Pending CN104328387A (en) | 2014-11-25 | 2014-11-25 | Device for cleaning sprinkler head of vapor deposition device |
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108588681A (en) * | 2018-05-25 | 2018-09-28 | 聚灿光电科技股份有限公司 | MOCVD systems and its method for cleaning |
| CN110931384A (en) * | 2018-09-20 | 2020-03-27 | 广东众元半导体科技有限公司 | Non-contact type spraying cleaning device |
| CN114369811A (en) * | 2021-08-16 | 2022-04-19 | 芜湖启迪半导体有限公司 | MOCVD reaction chamber cleaning device and cleaning method thereof |
| CN114657536A (en) * | 2022-03-23 | 2022-06-24 | 广东省智能机器人研究院 | MOCVD equipment for ZnO film growth |
| CN116141766A (en) * | 2023-04-20 | 2023-05-23 | 广州市传麒制衣有限公司 | Multilayer composite textile fabric and preparation method thereof |
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Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108588681A (en) * | 2018-05-25 | 2018-09-28 | 聚灿光电科技股份有限公司 | MOCVD systems and its method for cleaning |
| CN110931384A (en) * | 2018-09-20 | 2020-03-27 | 广东众元半导体科技有限公司 | Non-contact type spraying cleaning device |
| CN114369811A (en) * | 2021-08-16 | 2022-04-19 | 芜湖启迪半导体有限公司 | MOCVD reaction chamber cleaning device and cleaning method thereof |
| CN114657536A (en) * | 2022-03-23 | 2022-06-24 | 广东省智能机器人研究院 | MOCVD equipment for ZnO film growth |
| CN114657536B (en) * | 2022-03-23 | 2024-04-16 | 广东省智能机器人研究院 | MOCVD equipment for ZnO film growth |
| CN116141766A (en) * | 2023-04-20 | 2023-05-23 | 广州市传麒制衣有限公司 | Multilayer composite textile fabric and preparation method thereof |
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Address after: 215123 Suzhou Province Industrial Park, Jiangsu new road, No. 8 Applicant after: FOCUS LIGHTINGS TECHNOLOGY CO., LTD. Address before: 215123 Suzhou Province Industrial Park, Jiangsu new road, No. 8 Applicant before: Focus Lightings Tech Inc. |
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Application publication date: 20150204 |