CN104111539A - Array light spot generator and generating method - Google Patents
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Abstract
The invention relates to an array light spot generator. The array light spot generator generates two-dimensional orthogonal array light spots at a special diffraction distance after incident coherent planar lights are diffracted by a diffraction optical element, and is characterized in that the diffraction optical element is a two-order pure-phase plate which is composed of elements in same size and in close arrangement, wherein each element is in binary phase distribution, and each element has such a structure that a rectangular light through hole is added in one quadrate light through hole; relative displacement exists between the center of each rectangular light through hole and the center of each quadrate light through hole; the specific diffraction distance is relevant to the wavelength of the incident light, the width of each element and a compression ratio. The array light spot generator is simple in structure, easy to process and copy, relatively low in cost, and suitable for multiple different light sources, can be widely applied to the fields such as optical computing, optical communication and photoelectric dual disposal.
Description
Technical field
The present invention relates to a kind of array hot spot generator and production method.
Background technology
Array hot spot generator can be divided into regular one dimension or two-dimensional array hot spot input beam, and then realizes the functions such as luminous power distribution, hyperchannel interconnection and micrographics transmission.The generation of array hot spot has fully demonstrated high speed and the concurrency of optical processing, and value has a wide range of applications in fields such as photometry calculation, optical communication and photoelectricity hybrid processing.For example, as the uniform array hot spot generator of each optical gate in two-dimentional light logic array, improve the energy collector array of infrared focal plane array seeker performance etc.
At present, there is the multiple optical element that can be used for producing array hot spot, such as utilizing microlens array or diffraction grating etc.Microlens array can make the different piece of incident beam directly focus on, but the intensity distributions of the array hot spot producing from a microlens array is inhomogeneous.Utilize Galileo or Newtonian telescopic system can make microlens array produce the array hot spot that even intensity distributes, but its additional optical element increase cost.Utilize common diffraction grating light beam can be divided into the inferior hot spot of multiple orders of diffraction, but common diffraction grating can not produce the array hot spot that even intensity distributes.The diffraction grating of particular design, as Darman raster, can produce the array hot spot that even intensity distributes.But Darman raster is the diffraction optical element of the special construction that draws based on optimized algorithm, the number of the array hot spot based on its generation is subject to certain restrictions, and the diffraction efficiency of Darman raster reduces along with the increase of array number of spots, therefore utilizes Darman raster can not produce the array hot spot of high-diffraction efficiency, high compression ratio and big figure.
Utilize mark Tabo effect to make optical array hot spot generator, i.e. Taibo array hot spot generator, can produce even intensity distribution, high-diffraction efficiency and the array hot spot of ratio of compression arbitrarily.And can there is different splitting ratio amplifications at each mark talbot distance place, obtain more array number of spots [Opt.Lett.15,288 (1990) with less raster unit number; US Patent No. 5124843].But Taibo array hot spot generator is all the phase-plate multistage based on, obtain the array hot spot of high-diffraction efficiency, high compression ratio, big figure, and needed phase place exponent number will be higher.But current processing technology is difficult to make the phase-plate of this high-order, and machining process complexity, and the phase-plate of producing is expensive, is difficult to copy, be difficult to be applied in practice.
Summary of the invention
Technical matters to be solved by this invention is in order to overcome the existing problem and shortage of prior art, and a kind of array hot spot production method that can simultaneously realize even intensity distribution, high compression ratio, big figure array hot spot is provided.
The technical scheme that the present invention solves the problems of the technologies described above is as follows: a kind of array hot spot production method, specifically comprises the following steps:
Step 1: choose multiple binary primitives, the sizes values Δ of each binary primitive is set, hot spot compression ratio β and array hot spot, at one-dimensional square number value M upwards, by above-mentioned setting value, calculate the size value of diffraction optical element;
Step 2: the phase value that calculates all binary primitives position according to the setting value arranging in step 1
Step 3: the phase value obtaining according to step 2
calculate the relative displacement value δ at center and the binary primitive center of rectangle light hole in all binary primitives with all binary primitive sizes values Δs
mn;
Step 4: by M × M binary primitive opsition dependent parameter (m, n) close-packed arrays, produce the binary phase distribution plan of binary primitive;
Step 5: according to binary phase distribution plan, M × M binary primitive is prepared into diffraction optical element;
Step 6: determine diffraction distance according to the wavelength X of the sizes values Δ of each binary primitive, hot spot compression ratio β and incident light, incident light produces in this diffraction distance the orthogonal array hot spot that two-dimentional M × M even intensity distributes after diffraction optical element.
The invention has the beneficial effects as follows: diffraction optical element of the present invention is the binary devices of pure phase position, be easy to processing and copy, processing cost is low; Can realize the generation of the two-dimensional quadrature array hot spot of even intensity distribution, high compression ratio, big figure simultaneously; The present invention can produce the orthogonal array hot spot, particularly high compression ratio of any ratio of compression, the array hot spot of high-diffraction efficiency; The present invention only need be by controlling primitive size, and the size of diffraction optical element and ratio of compression can produce the orthogonal array hot spot of any period; The present invention is simple in structure, can be widely used in the fields such as photometry calculation, optical communication and photoelectricity hybrid processing.
On the basis of technique scheme, the present invention can also do following improvement.
Further, in described step 3 by phase value
bring following formula (1) into primitive sizes values Δ and calculate the relative displacement value δ at center and the primitive center of rectangle light hole in all primitives
mn;
formula (1)
Wherein, m: be to represent primitive in array hot spot generator location parameter in the horizontal direction, round numbers;
N: be the location parameter that represents the primitive in the vertical direction in array hot spot generator, round numbers;
Δ: be to represent the foursquare length of side;
δ
mn: the relative displacement in the primitive that expression location parameter is (m, n) between the center of rectangle light hole and the center of square light hole;
represent the phase value of the primitive present position that location parameter is (m, n).
Further, in described step 2, calculate the phase value of all primitives position according to the formula of the following stated (2)
formula (2)
Wherein, hot spot compression ratio β: statement ratio of compression, value is positive integer;
L: the value of the span of regulation β;
Above-mentioned phase value
span be [π, π].
Further, the method processing diffraction optical element that adopts photoelectron preparation technology photoetching and wet etching to combine in described step 5; Or the method processing diffraction optical element that adopts photoelectron preparation technology's photoetching and dry etching to combine.
Technical matters to be solved by this invention is in order to overcome the existing problem and shortage of prior art, a kind of array hot spot generator that can simultaneously realize even intensity distribution, high compression ratio, big figure array hot spot is provided, and this array hot spot generator, simple in structure, be easy to processing and copy, cost is lower.
The technical scheme that the present invention solves the problems of the technologies described above is as follows: a kind of array hot spot generator, comprises the light source emitter that sets gradually along same axis, expands and corrugated reshaper, diffraction optical element and hot spot display surface;
Described light source emitter is used for sending coherent light;
Described expand and corrugated reshaper expands the coherent light of incident into relevant planar light; Expand and Gauss beam reshaping little light beam spot diameter is expanded the plane light wave larger into a branch of hot spot by corrugated reshaper;
Described diffraction optical element is by M × M binary primitive opsition dependent parameter (m, n) close-packed arrays, produces the binary phase distribution plan of binary primitive; And according to binary phase distribution plan, the diffraction optical element that M × M binary primitive is prepared into; Wherein, the PHASE DISTRIBUTION that each binary primitive is binary.
The invention has the beneficial effects as follows: diffraction optical element of the present invention is the binary devices of pure phase position, be easy to processing and copy, processing cost is low; Can realize the generation of the two-dimensional quadrature array hot spot of even intensity distribution, high compression ratio, big figure simultaneously; The present invention can produce the orthogonal array hot spot, particularly high compression ratio of any ratio of compression, the array hot spot of high-diffraction efficiency; The present invention only need be by controlling primitive size, and the size of diffraction optical element and ratio of compression can produce the orthogonal array hot spot of any period; The present invention is simple in structure, can be widely used in the fields such as photometry calculation, optical communication and photoelectricity hybrid processing.
On the basis of technique scheme, the present invention can also do following improvement.
Further, described each binary primitive is the rectangle light hole that superposes in a square light hole, and the center of rectangle light hole and the center of square light hole are not overlapping.
Further, the phase place of described square light hole is 0, and the phase place of rectangle light hole is π; Or the phase place of described square light hole is π, the phase place of rectangle light hole is 0.
Further, a length of side of described rectangle light hole equates with the square length of side, the half that another length of side of rectangle light hole is square light hole, and between minor face length direction and the center of square light hole, there is relative displacement in the center of rectangle light hole.
Further, the relative displacement between the described center of rectangle light hole and the center of square light hole is determined by following formula (1):
formula (1)
Wherein, m: be to represent primitive in array hot spot generator location parameter in the horizontal direction, round numbers;
N: be the location parameter that represents the primitive in the vertical direction in array hot spot generator, round numbers;
Δ: be to represent the foursquare length of side;
δ
mn: the relative displacement in the primitive that expression location parameter is (m, n) between the center of rectangle light hole and the center of square light hole;
represent the phase value of the primitive present position that location parameter is (m, n).
Further, in described formula (1)
calculated by following formula (2):
formula (2)
Wherein, hot spot compression ratio β: statement ratio of compression, value is positive integer;
L: the value of the span of regulation β;
Above-mentioned phase value
span be [π, π].
Above-mentioned specific diffraction distance with the pass of lambda1-wavelength, element width and ratio of compression is: with in the time that β is positive even numbers, specific diffraction is z=β Δ 2/ λ apart from value; In the time that β is positive odd number, specific diffraction is z=2 β Δ 2/ λ apart from value, and wherein, λ is lambda1-wavelength.
The number of spots of above-mentioned two-dimensional quadrature array hot spot is relevant with the size of ratio of compression, primitive size and diffraction optical element with the cycle.
Basic thought of the present invention is based on detour phase encoding principle [Appl.Opt.5,967 (1966)], phase-plate in Taibo array hot spot generator is divided into compact arranged sampling unit, again the light hole of a rectangle is put in the middle of each sampling unit, by the position between center and the sampling center of change rectangle light hole, phase place is encoded.The multistage PHASE DISTRIBUTION of each primitive in Taibo array hot spot generator is encoded into binary (0, π) distribution, thereby multistage Taibo array hot spot generator is converted into the array hot spot generator of binary.
Brief description of the drawings
Fig. 1 is the process flow diagram of a kind of array hot spot of the present invention production method;
Fig. 2 is the first PHASE DISTRIBUTION schematic diagram of primitive of the present invention;
Fig. 3 is the first geometry cross-sectional schematic of primitive of the present invention;
Fig. 4 is the second PHASE DISTRIBUTION schematic diagram of primitive of the present invention;
Fig. 5 is the second geometry cross-sectional schematic of primitive of the present invention;
Fig. 6 is that ratio of compression of the present invention is the binary phase distribution plan of 10 × 10 array hot spots of β=30;
Fig. 7 is the light path schematic diagram of array hot spot generator of the present invention;
Fig. 8 is that ratio of compression of the present invention is the intensity distribution of 10 × 10 array hot spots of β=30;
Fig. 9 is that ratio of compression of the present invention is the one dimension intensity of 10 × 10 array hot spots of β=30;
Figure 10 is that ratio of compression of the present invention is the binary phase distribution plan of 20 × 20 array hot spots of β=15;
Figure 11 is the intensity distribution of ratio of compression that the present invention designs 20 × 20 the array hot spots that are β=15;
Figure 12 is the one dimension intensity of ratio of compression that the present invention designs 20 × 20 the array hot spots that are β=15.
In accompanying drawing, the list of parts of each label representative is as follows:
1, light source emitter, 2, expand and corrugated reshaper, 3, diffraction optical element, 4, hot spot display surface.
Embodiment
Below in conjunction with accompanying drawing, principle of the present invention and feature are described, example, only for explaining the present invention, is not intended to limit scope of the present invention.
As shown in Figure 1, a kind of array hot spot production method of the present invention, specifically comprises the following steps:
Step 1: choose multiple binary primitives, the sizes values Δ of each binary primitive is set, hot spot compression ratio β and array hot spot, at one-dimensional square number value M upwards, by above-mentioned setting value, calculate the size value of diffraction optical element;
Step 2: the phase value that calculates all binary primitives position according to the setting value arranging in step 1
Step 3: the phase value obtaining according to step 2
calculate the relative displacement value δ at center and the binary primitive center of rectangle light hole in all binary primitives with all binary primitive sizes values Δs
mn;
Step 4: by M × M binary primitive opsition dependent parameter (m, n) close-packed arrays, produce the binary phase distribution plan of binary primitive;
Step 5: according to binary phase distribution plan, M × M binary primitive is prepared into diffraction optical element;
Step 6: determine diffraction distance according to the wavelength X of the sizes values Δ of each binary primitive, hot spot compression ratio β and incident light, incident light produces in this diffraction distance the orthogonal array hot spot that two-dimentional M × M even intensity distributes after diffraction optical element.
Below with incident light wave length λ=633nm, element width Δ=60um, it is example that diffraction optical element is of a size of 18mm × 18mm, designs the specific embodiments of the orthogonal array hot spot of a kind of high compression ratio, big figure.
It shown in Fig. 2, is the first PHASE DISTRIBUTION schematic diagram of primitive in diffraction optical element of the present invention.As shown in the figure, primitive is to add the rectangle light hole that a phase place is π in the square light hole that is 0 in a phase place.For this pure phase position diadactic structure, the method that can adopt ripe photoelectron preparation technology photoetching and wet method/dry etching to combine is processed.In the present embodiment, selecting lambda1-wavelength is 633nm, and the BK7 glass that refractive index is 1.515 is substrate, and corresponding etching depth is 615nm.Its geometrical structure parameter as shown in Figure 3.It shown in Fig. 4, is the second PHASE DISTRIBUTION schematic diagram of primitive in diffraction optical element of the present invention.Figure 5 shows that the second geometry schematic diagram of primitive.For two kinds of PHASE DISTRIBUTION of primitive in diffraction optical element of the present invention, the effect that produces array hot spot is the same.Implementation result is described as an example of the first example in the present embodiment.
In the present embodiment, the physical dimension of square light hole is Δ × Δ=60um × 60um; The physical dimension of rectangle light hole is Δ × Δ/2=60um × 30um.Between the geometric center of rectangle light hole and the geometric center of square light hole, there is relative displacement δ
mnΔ, displacement is along rectangle minor face x direction, its relative shift δ
mnwith the residing location parameter m of primitive, n is relevant, can be provided by formula (1):
formula (1)
Wherein,
formula (2)
Wherein, the β statement ratio of compression in formula (2), its value is positive integer; L is the value of the span of regulation β, and value is 0 or positive integer.Wherein,
span be [π, π], and by size and the element width of diffraction optical element, can be in the hope of primitive at one-dimensional square number M=18mm/60um=300 upwards, i.e. m, n ∈ [1,300].
Therefore, by formula (1) and formula (2), can obtain the relative displacement of all primitives in all diffraction optical elements, and then the geometry of definite each primitive, then all primitives are pressed to corresponding location parameter close-packed arrays, obtained the PHASE DISTRIBUTION figure of binary pure phase position diffraction optical element.
Figure 6 shows that ratio of compression is the binary pure phase position distribution plan of positive even numbers β=30 o'clock diffraction optical element.According to the pure PHASE DISTRIBUTION of the binary shown in Fig. 6, processing makes pure phase position diffraction optical element, and then applies this diffraction optical element and can produce array hot spot.
Fig. 7 has provided the light path schematic diagram of array hot spot generator, the light that light source emitter 1 sends, through expanding and corrugated reshaper 2, becomes even incident coherent plane wave, see through after diffraction optical element 3, on the hot spot display surface 4 of certain diffraction distance, produce array hot spot.
Correspondence different diffraction distance z by the diffraction optical element of different geometries, and diffraction distance z is relevant with lambda1-wavelength, element width and ratio of compression.In the time that ratio of compression β is positive even numbers, diffraction distance z=β Δ 2/ λ; In the time that ratio of compression β is positive odd number, specific diffraction distance z=2 β Δ 2/ λ.In this example, try to achieve z=2 × 30 × 602/0.633um=170.6mm by above-mentioned parameter.Shown in Fig. 8, for the diffraction light intensity of diffraction distance z=170.6mm place simulation distributes, can be as seen from Figure 8, this diffraction distance has produced 10 × 10 orthogonal array hot spots.Fig. 9 is corresponding one dimension strength distribution curve figure in a lateral direction.As can be seen from the figure the light intensity of array hot spot is equally distributed.The grating cycle can be calculated by the physical dimension of diffraction optical element, and the cycle is β × Δ=30 × 60um=1.8mm, and the size 18mm × 18mm of diffraction optical element in this example, so the array hot spot number obtaining is 10 × 10.
Figure 10 shows that ratio of compression is the binary pure phase position distribution plan of positive odd number β=15 o'clock diffraction optical element.In the time that ratio of compression β is positive odd number, specific diffraction distance z=2 β Δ 2/ λ=170.6mm.As shown in figure 11, for the diffraction light intensity of diffraction distance z=170.7mm place simulation distributes, can be as seen from Figure 11, this diffraction distance has produced orthogonal array hot spot equally.Figure 12 is corresponding one dimension strength distribution curve figure in a lateral direction.As can be seen from the figure obtained the array hot spot of even intensity, but the array hot spot cycle becomes β × Δ=15 × 60um=0.9mm.Size 18mm × the 18mm of diffraction optical element, so the array hot spot number obtaining is 20 × 20.
Visible, the present invention can produce the two-dimensional quadrature array hot spot that even intensity distributes, and the number of hot spot is relevant with the size of ratio of compression, primitive size and phase-plate.This array hot spot generator, the manufacture craft of reality can meet completely, simple in structure, is easy to processing and copies, and cost is lower, therefore can apply widely.
The foregoing is only preferred embodiment of the present invention, in order to limit the present invention, within the spirit and principles in the present invention not all, any amendment of doing, be equal to replacement, improvement etc., within all should being included in protection scope of the present invention.
Claims (10)
1. an array hot spot production method, is characterized in that, specifically comprises the following steps:
Step 1: choose multiple binary primitives, the sizes values Δ of each binary primitive is set, hot spot compression ratio β and array hot spot, at one-dimensional square number value M upwards, by above-mentioned setting value, calculate the size value of diffraction optical element;
Step 2: the phase value that calculates all binary primitives position according to the setting value arranging in step 1
Step 3: the phase value obtaining according to step 2
calculate the relative displacement value δ at center and the binary primitive center of rectangle light hole in all binary primitives with all binary primitive sizes values Δs
mn;
Step 4: by M × M binary primitive opsition dependent parameter (m, n) close-packed arrays, produce the binary phase distribution plan of binary primitive;
Step 5: according to binary phase distribution plan, M × M binary primitive is prepared into diffraction optical element;
Step 6: determine diffraction distance according to the wavelength X of the sizes values Δ of each binary primitive, hot spot compression ratio β and incident light, incident light produces in this diffraction distance the orthogonal array hot spot that two-dimentional M × M even intensity distributes after diffraction optical element.
2. a kind of array hot spot production method according to claim 1, is characterized in that, in described step 3 by phase value
bring following formula (1) into primitive sizes values Δ and calculate the relative displacement value δ at center and the primitive center of rectangle light hole in all primitives
mn;
formula (1)
Wherein, m: be to represent primitive in array hot spot generator location parameter in the horizontal direction, round numbers;
N: be the location parameter that represents the primitive in the vertical direction in array hot spot generator, round numbers;
Δ: be to represent the foursquare length of side;
δ
mn: the relative displacement in the primitive that expression location parameter is (m, n) between the center of rectangle light hole and the center of square light hole;
represent the phase value of the primitive present position that location parameter is (m, n).
3. a kind of array hot spot production method according to claim 2, is characterized in that, in described step 2, calculates the phase value of all primitives position according to the formula of the following stated (2)
formula (2)
Wherein, hot spot compression ratio β: statement ratio of compression, value is positive integer;
L: the value of the span of regulation β;
Above-mentioned phase value
span be [π, π].
4. according to a kind of array hot spot production method described in claim 1-3 any one, it is characterized in that the method processing diffraction optical element that adopts photoelectron preparation technology photoetching and wet etching to combine in described step 5; Or the method processing diffraction optical element that adopts photoelectron preparation technology's photoetching and dry etching to combine.
5. an array hot spot generator, is characterized in that, comprises the light source emitter that sets gradually along same axis, expands and corrugated reshaper, diffraction optical element and hot spot display surface;
Described light source emitter is used for sending coherent light;
Described expand and corrugated reshaper expands the coherent light of incident into relevant planar light;
The relevant planar light of incident is carried out diffraction by described diffraction optical element; Make to present on hot spot display surface two-dimensional quadrature array hot spot;
Described diffraction optical element is by M × M binary primitive opsition dependent parameter (m, n) close-packed arrays, produces the binary phase distribution plan of binary primitive; And according to binary phase distribution plan, the diffraction optical element that M × M binary primitive is prepared into; Wherein, the PHASE DISTRIBUTION that each binary primitive is binary.
6. a kind of array hot spot generator according to claim 5, is characterized in that, described each binary primitive is the rectangle light hole that superposes in a square light hole, and the center of rectangle light hole and the center of square light hole are not overlapping.
7. a kind of array hot spot generator according to claim 6, is characterized in that, the phase place of described square light hole is 0, and the phase place of rectangle light hole is π; Or the phase place of described square light hole is π, the phase place of rectangle light hole is 0.
8. a kind of array hot spot generator according to claim 7, it is characterized in that, one length of side of described rectangle light hole equates with the square length of side, the half that another length of side of rectangle light hole is square light hole there is relative displacement in the center of rectangle light hole between minor face length direction and the center of square light hole.
9. according to a kind of array hot spot generator described in claim 5-8 any one, it is characterized in that, the relative displacement between the described center of rectangle light hole and the center of square light hole is determined by following formula (1):
formula (1)
Wherein, m: be to represent primitive in array hot spot generator location parameter in the horizontal direction, round numbers;
N: be the location parameter that represents the primitive in the vertical direction in array hot spot generator, round numbers;
Δ: be to represent the foursquare length of side;
δ
mn: the relative displacement in the primitive that expression location parameter is (m, n) between the center of rectangle light hole and the center of square light hole;
represent the phase value of the primitive present position that location parameter is (m, n).
10. a kind of array hot spot generator according to claim 9, is characterized in that, in described formula (1)
calculated by following formula (2):
formula (2)
Wherein, hot spot compression ratio β: statement ratio of compression, value is positive integer;
L: the value of the span of regulation β;
Above-mentioned phase value
span be [π, π].
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| CN111295614A (en) * | 2017-08-28 | 2020-06-16 | 赫普塔冈微光有限公司 | Structured light projection |
| JP2019203960A (en) * | 2018-05-22 | 2019-11-28 | 日本電信電話株式会社 | Diffraction element |
| CN112098980A (en) * | 2020-07-19 | 2020-12-18 | 武汉光谷航天三江激光产业技术研究院有限公司 | Performance index testing device and method for GM-APD array camera |
| CN112965242A (en) * | 2021-02-02 | 2021-06-15 | 奥比中光科技集团股份有限公司 | Under-screen speckle projection module, design method, display device and terminal device |
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