CN111715997A - System and method for homogenizing Gaussian laser - Google Patents
System and method for homogenizing Gaussian laser Download PDFInfo
- Publication number
- CN111715997A CN111715997A CN201910216977.XA CN201910216977A CN111715997A CN 111715997 A CN111715997 A CN 111715997A CN 201910216977 A CN201910216977 A CN 201910216977A CN 111715997 A CN111715997 A CN 111715997A
- Authority
- CN
- China
- Prior art keywords
- lens array
- fresnel lens
- laser
- homogenizing
- beams
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims abstract description 30
- 230000003287 optical effect Effects 0.000 claims abstract description 23
- 238000000265 homogenisation Methods 0.000 claims abstract description 8
- 230000008878 coupling Effects 0.000 claims description 17
- 238000010168 coupling process Methods 0.000 claims description 17
- 238000005859 coupling reaction Methods 0.000 claims description 17
- 238000004519 manufacturing process Methods 0.000 abstract description 6
- 230000009286 beneficial effect Effects 0.000 abstract description 4
- 238000009826 distribution Methods 0.000 description 11
- 238000010586 diagram Methods 0.000 description 9
- 230000000694 effects Effects 0.000 description 8
- 238000005530 etching Methods 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 239000010453 quartz Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 241001270131 Agaricus moelleri Species 0.000 description 2
- 238000004364 calculation method Methods 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 238000004088 simulation Methods 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 238000012356 Product development Methods 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 238000004093 laser heating Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 230000010363 phase shift Effects 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000009827 uniform distribution Methods 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/067—Dividing the beam into multiple beams, e.g. multifocusing
- B23K26/0676—Dividing the beam into multiple beams, e.g. multifocusing into dependently operating sub-beams, e.g. an array of spots with fixed spatial relationship or for performing simultaneously identical operations
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Laser Beam Processing (AREA)
Abstract
The invention discloses a system and a method for homogenizing Gaussian laser beams, wherein the system comprises the following components from left to right: a laser device; a collimated beam expanding system; a 16-step binary random phase Fresnel lens array; an 8-step Fresnel lens array; a focusing lens; and a charge coupled device. The invention also discloses a method for homogenizing the Gaussian laser, which comprises the following steps: an incident laser beam emitted by a laser; the light beam enters the front surface of a 16-step binary random phase Fresnel lens array after passing through a collimation beam expanding system; the array divides incident laser light into a series of sub-beams and applies pi phase delay to the sub-beams; then, the sub-beams pass through an 8-step Fresnel lens array to eliminate diffraction envelopes; the light beams are converged on the charge coupled device through the focusing lens to realize beam homogenization. The system and the method for homogenizing the Gaussian laser beam, provided by the invention, enable the optical system structure to be more compact, and are beneficial to assembly and mass production.
Description
Technical Field
The invention relates to the field of laser beam homogenizing, in particular to a system and a method for homogenizing Gaussian laser beams.
Background
Laser beams are widely used in many fields such as laser heating, laser medicine, and laser direct writing. Although the laser beam has the advantages of good directivity, strong monochromaticity and energy concentration, the light intensity of the laser beam is in Gaussian distribution, the central energy of the laser beam is high, the edge energy of the laser beam is low, and the laser beam has a series of problems of uneven action area in practical application, and in order to solve the problems, people generally convert the Gaussian laser beam into a flat top type by using a homogenization means.
At present, there are many methods for shaping the gaussian intensity distribution of the laser beam into a uniform distribution, for example, the laser beam is shaped by using an aspheric lens group, a free-form surface lens, a diffractive optical element, and the like. However, these methods have narrow application range, and need to be designed in strict compliance with the intensity distribution of the incident laser, and in some industrial production and laser product development modes, the light intensity distribution of the obtained laser beam does not accord with the designed intensity distribution of the incident laser, and the beam-homogenizing effect brought by these methods is not ideal. The micro-lens array method has the characteristics of no consideration of the light intensity distribution of incident light, strong applicability and high energy utilization rate. However, this method also has two problems: firstly, the existing microlens array method usually adopts a refraction aspheric lens array, but the aspheric lens has high surface precision requirement, is difficult to process and cannot be miniaturized; secondly, due to the high coherence of the laser, when the laser beam passes through the microlens array, a multi-beam interference effect is generated, thereby affecting the beam homogenizing effect.
Disclosure of Invention
Technical problem to be solved
In order to convert Gaussian laser into flat-top laser and solve the problems of high processing cost, high processing difficulty, limited process conditions and the like of miniaturization of a refractive microlens array, the invention provides a system and a method for homogenizing Gaussian laser.
(II) technical scheme
The invention provides a system for homogenizing Gaussian laser, which specifically comprises:
a laser for emitting an incident laser beam;
the collimation beam expanding system is used for collimating and expanding the incident beam emitted by the laser;
the 16-step binarization random phase Fresnel lens array is used for dividing the laser subjected to collimation and beam expansion by the collimation and beam expansion system into a series of sub-beams and applying pi phase delay to the sub-beams;
the 8-step Fresnel lens array is used for forming an optical channel in one-to-one correspondence with the sub-lenses in the 16-step binary random phase Fresnel lens array to eliminate diffraction envelopes caused by the sub-beams;
the focusing lens is used for converging the sub-beams with the diffraction envelopes eliminated to obtain homogenized light spots with required sizes; and
and the charge coupling element is used for receiving the homogenized light spot focused by the focusing lens and converting an optical signal into an electric signal to transmit an image.
Wherein the incident laser beam emitted by the laser is a single-mode laser beam.
The 8-step Fresnel lens array is positioned on the back focal plane of the 16-step Fresnel lens array and positioned on the front focal plane of the focusing lens.
Wherein the diameter of the focusing lens is larger than or equal to the diameter of the array in the 8-step Fresnel lens array or the 16-step Fresnel lens array.
The charge coupling element is positioned on the back focal plane of the focusing lens, and the receiving surface area of the charge coupling element is larger than the size of the homogenization light spot.
The focal length F of the focusing lens, the focal length F of each lens in the 16-step binarization random phase Fresnel lens array and the 8-step Fresnel lens array, and the diameter p of each lens in the 16-step binarization random phase Fresnel lens array and the 8-step Fresnel lens array and the required light spot size S meet the following requirements:
based on the system for homogenizing the Gaussian laser, the invention also provides a method for homogenizing the Gaussian laser, which comprises the following steps:
the laser emits a laser beam;
the collimation and beam expansion system is used for collimating and expanding the laser beam and then enabling the laser beam to enter the front surface of the 16-step binarization random phase Fresnel lens array;
the 16-step binarization random phase Fresnel lens array divides incident laser collimated and expanded by the collimation and expansion system into a series of sub-beams and applies pi phase delay to the sub-beams;
the 8-step Fresnel lens array and the sub-lenses in the 16-step binary random phase Fresnel lens array form an optical channel in a one-to-one correspondence mode, and diffraction envelopes caused by the sub-beams are eliminated;
the focusing lens converges the light beam with the diffraction envelope eliminated;
the charge coupling element receives the light beam focused by the focusing lens, converts the optical signal into an electric signal and outputs an image.
The 8-step Fresnel lens array is positioned on the back focal plane of the 16-step Fresnel lens array and positioned on the front focal plane of the focusing lens; the aperture of the focusing lens is larger than or equal to the diameter of the array in the 8-step Fresnel lens array or the 16-step Fresnel lens array; the charge coupling element is positioned on the back focal plane of the focusing lens, and the receiving surface area of the charge coupling element is larger than the size of the homogenization light spot.
The focal length F of the focusing lens, the focal length F of each lens in the 16-step binarization random phase Fresnel lens array and the 8-step Fresnel lens array, and the diameter p of each lens in the 16-step binarization random phase Fresnel lens array and the 8-step Fresnel lens array and the required light spot size S satisfy the formula:
(III) advantageous effects
According to the technical scheme, the system and the method for homogenizing the Gaussian laser beam have the following beneficial effects:
(1) according to the system and the method for homogenizing Gaussian laser beams, the Fresnel lens is adopted to replace a refractive micro lens, so that the manufacturing difficulty and the production cost of the micro lens array are reduced, and the miniaturization of the micro lens array is realized. From fig. 2, it can be seen that the fill factor of the array is close to one hundred percent, and the energy utilization rate is very high;
(2) the system and the method for homogenizing Gaussian laser beams integrate the functions of homogenizing beams and eliminating interference on the same device, so that the optical system has a more compact structure and is beneficial to assembly;
(3) the system and the method for homogenizing Gaussian laser beams have the advantages that the quartz plate substrate used by the Fresnel lens array is small in size and light in weight, and can be copied and produced in batches.
Drawings
Fig. 1 is a system configuration diagram for homogenizing gaussian laser beams and an optical path configuration diagram for homogenizing laser beams by the system provided by the invention.
FIG. 2A is a schematic cross-sectional view of the lens elements with pi phase variation in a system for homogenizing Gaussian laser beams according to the present invention. The left figure is a schematic 2D cross-section and the right figure is a schematic 3D cross-section.
Fig. 2B is a random phase structure diagram of a fresnel lens array in the system for homogenizing gaussian laser beams according to the present invention.
Fig. 2C is a binary random phase fresnel lens array in the system for homogenizing gaussian laser according to the present invention.
FIG. 3A is a two-dimensional distribution graph of homogenized focal spot intensity for a non-random phase Fresnel lens array according to an embodiment of the present invention.
FIG. 3B is a three-dimensional distribution graph of homogenized focal spot intensity of a non-random phase Fresnel lens array according to an embodiment of the present invention;
FIG. 3C is a two-dimensional distribution diagram of focal spot intensities of a binarized random phase Fresnel lens array according to an embodiment of the present invention.
Fig. 3D is a three-dimensional distribution diagram of focal spot intensities of a binarized random phase fresnel lens array according to an embodiment of the present invention.
FIG. 4A is a graph showing the results of a Fresnel lens array test without random phase according to an embodiment of the present invention.
FIG. 4B is a diagram of the result of the test of the binary random phase Fresnel lens array according to the embodiment of the present invention.
[ description of reference ]
1: laser device
2: collimation and beam expansion aspheric lens group
3: 16-step binary random phase Fresnel lens array
4: 8-step Fresnel lens array
5: focusing lens
6: charge-coupled device
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more apparent, the present invention is described in further detail below with reference to specific embodiments and the accompanying drawings.
In order to meet the requirement of miniaturization of the micro-lens array, the invention adopts a semiconductor planarization process to manufacture 8-step Fresnel lenses on a thin quartz substrate to replace refractive micro-lenses.
And etching the zone plate by adopting plasma etching on the basis of the prepared 8-step Fresnel zone plate array. Because the relation between the etching depth and the phase is satisfied:
wherein the content of the first and second substances,
for phase, k is the wavevector (value 2 π/λ), n is the refractive index of the material, and d is the etch depth.
By combining the formula, the application of the pi phase shift of the light beam is realized by adjusting the etching depth, and finally a 16-step binary random phase Fresnel lens array is formed, so that the purpose of disturbing the periodic distribution of the phase of the lens array is achieved.
The prepared 16-step binarization random phase Fresnel lens array can greatly weaken the multi-beam interference effect caused by laser coherence after the laser passes through the micro lens array, and greatly improve the beam homogenizing effect.
FIG. 2A is a schematic cross-sectional view of the lens elements with pi phase variation in a system for homogenizing Gaussian laser beams according to the present invention. Fig. 2B is a random phase structure diagram of the fresnel lens array in the system for homogenizing gaussian laser according to the present invention, where the light color cell in the random phase arrangement diagram represents that the phase value applied to the cell is 0, and the dark color cell represents that the phase value applied to the cell is pi. Fig. 2C is a binary random phase fresnel lens array in the system for homogenizing gaussian laser according to the present invention.
The invention provides a system for homogenizing Gaussian laser, which specifically comprises:
a laser for emitting an incident laser beam;
the collimation beam expanding system is used for collimating and expanding the incident beam emitted by the laser;
the 16-step binarization random phase Fresnel lens array is used for dividing the laser subjected to collimation and beam expansion by the collimation and beam expansion system into a series of sub-beams and applying pi phase delay to the sub-beams;
the 8-step Fresnel lens array is used for forming an optical channel in one-to-one correspondence with the sub-lenses in the 16-step binary random phase Fresnel lens array to eliminate diffraction envelopes caused by the sub-beams;
the focusing lens is used for converging the sub-beams with the diffraction envelopes eliminated to obtain homogenized light spots with required sizes; and
and the charge coupling element is used for receiving the homogenized light spot focused by the focusing lens and converting an optical signal into an electric signal to transmit an image.
Wherein the incident laser beam emitted by the laser is a single-mode laser beam.
The 8-step Fresnel lens array is positioned on the back focal plane of the 16-step Fresnel lens array and positioned on the front focal plane of the focusing lens.
Wherein the diameter of the focusing lens is larger than or equal to the diameter of the array in the 8-step Fresnel lens array or the 16-step Fresnel lens array.
The charge coupling element is positioned on the back focal plane of the focusing lens, and the receiving surface area of the charge coupling element is larger than the size of the homogenization light spot.
The focal length F of the focusing lens, the focal length F of each lens in the 16-step binarization random phase Fresnel lens array and the 8-step Fresnel lens array, and the diameter p of each lens in the 16-step binarization random phase Fresnel lens array and the 8-step Fresnel lens array and the required light spot size S meet the following requirements:
based on the system for homogenizing Gaussian laser provided by the invention, the invention also provides a method for homogenizing Gaussian laser by using the system, and the method comprises the following steps:
the laser emits a laser beam;
the collimation and beam expansion system is used for collimating and expanding the laser beam and then enabling the laser beam to enter the front surface of the 16-step binarization random phase Fresnel lens array;
the 16-step binarization random phase Fresnel lens array divides incident laser collimated and expanded by the collimation and expansion system into a series of sub-beams and applies pi phase delay to the sub-beams;
the 8-step Fresnel lens array and the sub-lenses in the 16-step binary random phase Fresnel lens array form an optical channel in a one-to-one correspondence mode, and diffraction envelopes caused by the sub-beams are eliminated;
the focusing lens converges the light beam with the diffraction envelope eliminated;
the charge coupling element receives the light beam focused by the focusing lens, converts the optical signal into an electric signal and outputs an image.
The 8-step Fresnel lens array is positioned on the back focal plane of the 16-step Fresnel lens array and positioned on the front focal plane of the focusing lens; the aperture of the focusing lens is larger than or equal to the diameter of the array in the 8-step Fresnel lens array or the 16-step Fresnel lens array; the charge coupling element is positioned on the back focal plane of the focusing lens, and the receiving surface area of the charge coupling element is larger than the size of the homogenization light spot.
The focal length F of the focusing lens, the focal length F of each lens in the 16-step binarization random phase Fresnel lens array and the 8-step Fresnel lens array, and the diameter p of each lens in the 16-step binarization random phase Fresnel lens array and the 8-step Fresnel lens array and the required light spot size S satisfy the formula:
in order to make the objects, technical solutions and advantages of the present invention more apparent, the present invention will be described in further detail below with reference to the accompanying drawings in conjunction with specific embodiments.
This example is intended to obtain a 2.5mm by 2.5mm homogenization spot. According to a spot size calculation formula:
wherein S is the size of homogenized light spots, F is the focal length of a focusing lens, F is the focal length of each lens in the 16-step binarization random phase Fresnel lens array and the 8-step Fresnel lens array, p is the diameter of each lens in the 16-step binarization random phase Fresnel lens array and the 8-step Fresnel lens array, and the focusing lens with the focal length of 30mm, the diameter of each lens of 0.5mm and the Fresnel lens with the focal length of 6mm are selected.
FIG. 1 shows a diagram of an optical path structure of a homogenizing beam system, which comprises: laser 1, collimation beam expanding aspheric surface lens group 2, 16 step binarization random phase Fresnel lens array 3, 8 step Fresnel lens array 4, focusing lens 5 and CCD6, wherein:
the laser 1 emits an incident laser beam; the collimation and beam expansion aspheric lens group 2 is used as a collimation and beam expansion system to perform collimation and beam expansion on incident laser beams; the 16-step binarization random phase Fresnel lens array 3 divides incident laser into a series of sub-beams and applies pi phase delay to the sub-beams; the 8-step Fresnel lens array 4 and the 16-step binary random phase Fresnel lens array 3 form optical channels in a one-to-one correspondence mode, and diffraction envelopes caused by sub beams are eliminated; the focusing lens 5 converges the sub-beams with the diffraction envelope eliminated to obtain homogenized light spots with required sizes; the CCD6 receives the homogenized light spots focused by the focusing lens and converts optical signals into electric signals to transmit images.
Based on the system for homogenizing gaussian laser shown in fig. 1, the method for homogenizing gaussian laser comprises the following steps: an incident laser beam emitted by the laser 1; after passing through the collimation and beam expansion aspheric lens group 2, the light is incident on the front surface of a 16-step binary random phase Fresnel lens array 3; the array divides incident laser light into a series of sub-beams and applies pi phase delay to the sub-beams; the 8-step Fresnel lens array and the sub-lenses in the 16-step binary random phase Fresnel lens array form optical channels in a one-to-one correspondence mode, and diffraction envelopes caused by the sub-beams are eliminated; the focusing lens converges the light beam with the diffraction envelope eliminated to obtain a light spot with the size of 2.5mm multiplied by 2.5 mm; the charge coupling element receives the light beam focused by the focusing lens, converts the optical signal into an electric signal and outputs an image.
The parameters of the 8-step Fresnel lens array 4 are the same as those of the 16-step Fresnel lens array 3, and the 8-step Fresnel lens array 4 is located on the back focal plane of the 16-step Fresnel lens array 3 and on the front focal plane of the focusing lens 5, so that the lenses in the 8-step Fresnel lens array 4 and the lenses in the 16-step Fresnel lens array 3 are required to be aligned to form an optical channel.
In order to receive more light energy, the aperture of the focusing lens 5 satisfies the diameter D of the array in the 8-step fresnel lens array 3 or the 16-step fresnel lens array 4 as much as possible.
Wherein CCD6 is placed on the back focal plane of focusing lens 5, and the receiving surface area of CCD6 is larger than the size of homogenizing light spot.
According to the system and the method for homogenizing Gaussian laser beams, the Fresnel lens is adopted to replace a refractive micro lens, so that the manufacturing difficulty and the production cost of a micro lens array are reduced, and the miniaturization of the micro lens array is realized. It can be seen from fig. 2 that the fill factor of the array is close to one hundred percent and the energy utilization is very high.
The system and the method for homogenizing Gaussian laser provided by the invention integrate the functions of homogenizing and eliminating interference on the same device, so that the optical system has a more compact structure and is beneficial to assembly.
The invention provides a system and a method for homogenizing Gaussian laser beams, wherein a quartz plate substrate used by a Fresnel lens array is small in size and light in weight, and can be copied and produced in batch.
Simulation results for this example: MATLAB simulation software is used for carrying out simulation analysis on the beam homogenizing effect of the Fresnel lens array without the random phase and the Fresnel lens array with the binary random phase, and a result comparison graph of the Fresnel lens array without the random phase and the Fresnel lens array with the binary random phase is shown in figures 3A and 3B. It can be seen from fig. 3C and fig. 3D that the interference effect is greatly reduced, and through calculation, the uniformity of the light spot reaches 90%, and the energy utilization rate reaches 96%.
Experimental results for this example: fig. 4A and 4B show comparative graphs of beam homogenizing experimental results of a random-phase-free fresnel lens array and a binary random-phase fresnel lens array, wherein the uniformity of light spots is calculated to reach 83%, and the energy utilization rate reaches 89%.
The above-mentioned embodiments are intended to illustrate the objects, technical solutions and advantages of the present invention in further detail, and it should be understood that the above-mentioned embodiments are only exemplary embodiments of the present invention, and are not intended to limit the present invention, and any modifications, equivalents, improvements and the like made within the spirit and principle of the present invention should be included in the protection scope of the present invention.
Claims (9)
1. A system for homogenizing a gaussian laser comprising:
a laser for emitting an incident laser beam;
the collimation beam expanding system is used for collimating and expanding the incident beam emitted by the laser;
the 16-step binarization random phase Fresnel lens array is used for dividing the laser subjected to collimation and beam expansion by the collimation and beam expansion system into a series of sub-beams and applying pi phase delay to the sub-beams;
the 8-step Fresnel lens array is used for forming an optical channel in one-to-one correspondence with the sub-lenses in the 16-step binary random phase Fresnel lens array to eliminate diffraction envelopes caused by the sub-beams;
the focusing lens is used for converging the sub-beams with the diffraction envelopes eliminated to obtain homogenized light spots with required sizes; and
and the charge coupling element is used for receiving the homogenized light spot focused by the focusing lens and converting an optical signal into an electric signal to transmit an image.
2. The system for homogenizing a gaussian laser according to claim 1 wherein said laser emits an incident laser beam that is a single mode laser beam.
3. The system for homogenizing a gaussian laser according to claim 1 wherein said 8-step fresnel lens array is located on a back focal plane of said 16-step fresnel lens array and on a front focal plane of a focusing lens.
4. The system for homogenizing a gaussian laser according to claim 1 wherein said focusing lens has a diameter equal to or greater than the diameter of the array of 8-step fresnel lenses or the diameter of the array of 16-step fresnel lenses.
5. The system for homogenizing a gaussian laser according to claim 1, wherein said charge-coupled device is located at the back focal plane of the focusing lens and the receiving surface area of said charge-coupled device is larger than the size of the homogenizing spot.
6. The system for homogenizing gaussian laser beams according to claim 1, wherein the focal length F of said focusing lens, the focal length F of each lens in said 16-step binary random phase fresnel lens array and said 8-step fresnel lens array, the diameter p of each lens in said 16-step binary random phase fresnel lens array and said 8-step fresnel lens array, and the required spot size S are satisfied:
7. a method for homogenizing Gaussian laser beams based on the system for homogenizing Gaussian laser beams in any one of claims 1 to 6, comprising:
the laser emits a laser beam;
the collimation and beam expansion system is used for collimating and expanding the laser beam and then enabling the laser beam to enter the front surface of the 16-step binarization random phase Fresnel lens array;
the 16-step binarization random phase Fresnel lens array divides incident laser collimated and expanded by the collimation and expansion system into a series of sub-beams and applies pi phase delay to the sub-beams;
the 8-step Fresnel lens array and the sub-lenses in the 16-step binary random phase Fresnel lens array form an optical channel in a one-to-one correspondence mode, and diffraction envelopes caused by the sub-beams are eliminated;
the focusing lens converges the light beam with the diffraction envelope eliminated;
the charge coupling element receives the light beam focused by the focusing lens, converts the optical signal into an electric signal and outputs an image.
8. The method of homogenizing a gaussian laser according to claim 7, wherein:
the 8-step Fresnel lens array is positioned on the back focal plane of the 16-step Fresnel lens array and positioned on the front focal plane of the focusing lens;
the aperture of the focusing lens is larger than or equal to the diameter of the array in the 8-step Fresnel lens array or the 16-step Fresnel lens array;
the charge coupling element is positioned on the back focal plane of the focusing lens, and the receiving surface area of the charge coupling element is larger than the size of the homogenization light spot.
9. The method according to claim 7, wherein the focal length F of the focusing lens, the focal length F of each lens in the 16-step binary random phase fresnel lens array and the 8-step fresnel lens array, and the diameter p of each lens in the 16-step binary random phase fresnel lens array and the 8-step fresnel lens array satisfy the following formula:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910216977.XA CN111715997A (en) | 2019-03-21 | 2019-03-21 | System and method for homogenizing Gaussian laser |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910216977.XA CN111715997A (en) | 2019-03-21 | 2019-03-21 | System and method for homogenizing Gaussian laser |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN111715997A true CN111715997A (en) | 2020-09-29 |
Family
ID=72562589
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201910216977.XA Pending CN111715997A (en) | 2019-03-21 | 2019-03-21 | System and method for homogenizing Gaussian laser |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN111715997A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112815872A (en) * | 2021-03-08 | 2021-05-18 | 哈尔滨工业大学 | Natural vibration space-time mixing phase-shifting microsphere surface morphology detection system |
| CN113376721A (en) * | 2021-04-25 | 2021-09-10 | 苏州苏大维格科技集团股份有限公司 | Engineering diffusion sheet and design and manufacturing method thereof |
| CN113467095A (en) * | 2021-06-08 | 2021-10-01 | 西安交通大学 | Non-imaging laser homogeneous system and method for manufacturing homogeneous element |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007102091A (en) * | 2005-10-07 | 2007-04-19 | Sumitomo Electric Ind Ltd | Laser beam optical system for large area irradiation |
| CN102023388A (en) * | 2009-09-16 | 2011-04-20 | 中国科学院微电子研究所 | Array photon sieve light equalizer and manufacturing method thereof |
| CN102023386A (en) * | 2009-09-16 | 2011-04-20 | 中国科学院微电子研究所 | Array full-ring photon sieve light equalizer and manufacturing method thereof |
| CN103246066A (en) * | 2013-05-17 | 2013-08-14 | 中国科学院光电技术研究所 | Optical system for homogenizing planar array semiconductor laser beam |
| CN103293677A (en) * | 2012-02-24 | 2013-09-11 | 中国科学院微电子研究所 | Light homogenizer and manufacturing method thereof |
| CN104991347A (en) * | 2015-07-16 | 2015-10-21 | 哈尔滨工业大学 | Laser shaping illuminator based on microlens array |
| CN106842589A (en) * | 2017-04-18 | 2017-06-13 | 广东工业大学 | A kind of array hole processing device |
-
2019
- 2019-03-21 CN CN201910216977.XA patent/CN111715997A/en active Pending
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007102091A (en) * | 2005-10-07 | 2007-04-19 | Sumitomo Electric Ind Ltd | Laser beam optical system for large area irradiation |
| CN102023388A (en) * | 2009-09-16 | 2011-04-20 | 中国科学院微电子研究所 | Array photon sieve light equalizer and manufacturing method thereof |
| CN102023386A (en) * | 2009-09-16 | 2011-04-20 | 中国科学院微电子研究所 | Array full-ring photon sieve light equalizer and manufacturing method thereof |
| CN103293677A (en) * | 2012-02-24 | 2013-09-11 | 中国科学院微电子研究所 | Light homogenizer and manufacturing method thereof |
| CN103246066A (en) * | 2013-05-17 | 2013-08-14 | 中国科学院光电技术研究所 | Optical system for homogenizing planar array semiconductor laser beam |
| CN104991347A (en) * | 2015-07-16 | 2015-10-21 | 哈尔滨工业大学 | Laser shaping illuminator based on microlens array |
| CN106842589A (en) * | 2017-04-18 | 2017-06-13 | 广东工业大学 | A kind of array hole processing device |
Non-Patent Citations (1)
| Title |
|---|
| 裴宪梓等: "随机位相菲涅耳透镜阵列激光束匀化", 《光子学报》 * |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112815872A (en) * | 2021-03-08 | 2021-05-18 | 哈尔滨工业大学 | Natural vibration space-time mixing phase-shifting microsphere surface morphology detection system |
| CN112815872B (en) * | 2021-03-08 | 2022-08-05 | 哈尔滨工业大学 | Natural vibration space-time mixing phase-shifting microsphere surface morphology detection system |
| CN113376721A (en) * | 2021-04-25 | 2021-09-10 | 苏州苏大维格科技集团股份有限公司 | Engineering diffusion sheet and design and manufacturing method thereof |
| CN113467095A (en) * | 2021-06-08 | 2021-10-01 | 西安交通大学 | Non-imaging laser homogeneous system and method for manufacturing homogeneous element |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN111715997A (en) | System and method for homogenizing Gaussian laser | |
| US11442284B2 (en) | Structured light projector including an integrated metalens and diffractive optical element | |
| GB2521730A (en) | Mass spectrometer with laser spot pattern for MALDI | |
| US20200152682A1 (en) | An image sensor comprising at least one sensing unit with light guiding means | |
| US9279914B2 (en) | Condensing lens, compound-eye lens condenser, and compound-eye concentrating solar cell assembly | |
| JP7248662B2 (en) | optical beamformer | |
| JP2013508741A (en) | Fresnel fly-eye microlens array for focusing on solar cells | |
| CN112782799B (en) | Diffractive optical element and system for generating a focused flat-topped light spot beam | |
| CN104991347A (en) | Laser shaping illuminator based on microlens array | |
| CN108845409B (en) | Device and method for generating array multiple focuses based on polyhedral prism | |
| CN113419301A (en) | Preparation method of micro-lens array and wafer | |
| CN103185286B (en) | Even optical element and light-source system | |
| EP4348780A1 (en) | Single element dot pattern projector | |
| CN112368849A (en) | Light emitting diode with light guide structure | |
| CN107643596A (en) | The diffraction axis axicon lens system and its Diode laser imaging method of a kind of binary zone plate form | |
| CN107063124B (en) | Optical assembly and 3D measuring device | |
| CN213648656U (en) | Lens impression mould and lens module | |
| CN212626514U (en) | Transmitting terminal module and structured light system | |
| US7092165B2 (en) | Microlens arrays having high focusing efficiency | |
| CN113253468A (en) | Laser homogenizing and shaping system based on micro-lens array | |
| CN216718826U (en) | Light-emitting module and TOF imaging device | |
| US20140307323A1 (en) | Optical lens and apparatus for producing uniform beam using same | |
| CN111123532A (en) | Planar light source beam shaping method and device based on holographic transfer | |
| CN116381953B (en) | Laser shaping device | |
| CN108693688B (en) | Light source system and projection equipment |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20200929 |
|
| WD01 | Invention patent application deemed withdrawn after publication |