CN104105958A - 污染区域的检测 - Google Patents
污染区域的检测 Download PDFInfo
- Publication number
- CN104105958A CN104105958A CN201380004812.7A CN201380004812A CN104105958A CN 104105958 A CN104105958 A CN 104105958A CN 201380004812 A CN201380004812 A CN 201380004812A CN 104105958 A CN104105958 A CN 104105958A
- Authority
- CN
- China
- Prior art keywords
- label
- detection
- fluorescence
- deep
- pollutant
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/94—Investigating contamination, e.g. dust
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
- G01N21/63—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
- G01N21/64—Fluorescence; Phosphorescence
- G01N21/6447—Fluorescence; Phosphorescence by visual observation
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/91—Investigating the presence of flaws or contamination using penetration of dyes, e.g. fluorescent ink
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
- G01N21/63—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
- G01N21/64—Fluorescence; Phosphorescence
- G01N21/645—Specially adapted constructive features of fluorimeters
- G01N21/6456—Spatial resolved fluorescence measurements; Imaging
- G01N2021/646—Detecting fluorescent inhomogeneities at a position, e.g. for detecting defects
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/47—Scattering, i.e. diffuse reflection
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
- G01N21/63—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
- G01N21/64—Fluorescence; Phosphorescence
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
- G03F1/84—Inspecting
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70566—Polarisation control
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
Landscapes
- Health & Medical Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Abstract
本发明描述了一种用于在进行表面涂覆之前检测该表面上的污染的方法,所述方法包括:使标记物与表面接触,其中标记物具有在表面上的污染区域处积聚的能力;以及检测表面上的标记物,其中标记物是非极性的或两亲性的。
Description
技术领域
本发明涉及一种用于在进行表面涂覆之前检测该表面的污染的方法。
背景技术
目前有多种涉及检测表面上的污物或对此类表面的污染程度定量的方法。例如在US5828460中公开了一种用于在对金属表面进行后续处理诸如涂漆之前检查该金属表面的方法。若干光源据称用具有不同波长的光束照明被检查的表面,检测反射辐射并将其转化为电信号,对电信号进行数字处理并显示处理的结果。另外,如上述所公开方法的多种方法已知可用于例如车辆行业。在US6320654中,例如公开了一种检测车身的所选表面缺陷的方法,该方法包括:使多个所述车身沿着行进线输送;用光的网格图形以所选角度照射所述车身的连续横截面;光学检测来自所述横截面的光的反射网格图形;对代表所述反射网格图形的数据进行处理,利用三角测量技术并且计入三维相移,以生成复合检测数据;将所述复合数据与代表所选车身的相关缺陷表面的所选参考数据比较,并且生成代表所述车身的相关缺陷表面的坐标的标识数据;以及响应于所述标识数据的所述坐标而对所述车身上的相关缺陷表面进行标记。
同样,在WO87/00629中公开了一种用于检查例如汽车的涂漆表面的表面检查设备,该设备包括提供辐射束的激光装置、用于在表面上扫描光束的扫描装置、被提供用以使从表面反射的辐射沿着入射光束路径反射回的反光材料,该设备包括作为单元安装的反光材料,以借助机器人在汽车的表面上移动。光信号的分析据称指示缺陷,诸如刮痕、涂漆内含物、橘皮皱、干喷、凹痕和光泽度缺陷。
另外,在US5844801中公开了一种制造车身的方法,该方法尤其包括通过将表面变形程度与预定的判定值进行比较来识别表面的缺陷区域,从而确定所述表面变形是否为可接受的。
本发明的一个目的是提供一种用于检测表面上的污染的改进方法,该方法非常有效并且还易于使用。另外,根据本发明的方法旨在有效地检测目前常见的或大量使用的污染物。此类例子在下面给出。
发明内容
上述目的通过在进行表面涂覆之前检测该表面上的污染的方法来实现,所述方法包括:使标记物与表面接触,其中所述标记物具有在表面上的污染区域处积聚的能力;以及检测表面上的标记物,其中标记物是非极性的或两亲性的。该表述“标记物具有在污染区域处积聚的能力”意味着标记物(或探针)与污染区域中存在的至少一种污染物缔合。
污染区域是保持待检测的所关注的一种或多种物质(污染物)的区域。此类污染物可以是例如不同种类的油性物质,例如用于所有胶粘、胶合、接合或密封行业的润滑油。此类行业的一个例子是汽车行业。其他例子是不同种类的污物,例如粉尘粒子。另外的例子是所有种类的特氟隆和有机硅基产品、白油脂、油基产品、润滑剂和隔离剂(即防止在无机械影响的情况下渗透的化学品)。
在US4858465中公开了一种用于检测和视觉定位物体上的表面污染物的方法,该方法包括向其上具有污染物的物体表面施加含水污染物定位组合物,该组合物检测并指示物体表面上污染物的存在;从物体表面移除过量的污染物定位组合物;将含水污染物鉴定剂荧光显色剂施加于表面上的所指示的污染物处;通过迁移将染料分子转移至污染物并使其与污染物缔合,从而使污染物发荧光;从物体表面移除过量的显色剂;以及在光照条件下查看物体表面以便视觉定位所述表面污染物。污染物鉴定剂组合物基本上由荧光染料和合适载体组成。
在US4858465中提到,如果没有被检测到并移除的话,污染物可防止渗透检查过程润湿正被检查缺陷诸如裂纹的部件和组件的表面,并且还防止涂漆和粘结过程有效地实施。然而,应当认为根据US4858465的方法涉及检测方法而不涉及具有结合检测工序的涂覆工序。此外,当与本发明比较时,根据US4858465的方法涉及使用含水污染物定位组合物,而不涉及非极性的或两亲性的标记物,诸如根据本发明的标记物。另外,根据US4858465的方法涉及若干步骤,这些步骤并非根据本发明方法所必要的或预期的。
应该指出的是,根据本发明的方法可用于多种不同的技术应用,然而其与上清漆应用尤其有关,例如作为在进行涂漆/涂覆/上清漆之前的预处理方法,例如作为在汽车涂漆之前进行的污染物检测方法。此外,应当理解根据本发明的方法可用作确定适用于所述表面的后续涂覆的清洁表面的方法。该方法旨在检测污染物,因此还作为确定适用于后续涂覆的清洁表面的安全方法。另外,该表述“在进行表面涂覆之前”应解释为涵盖所有不同种类的可能涂覆技术,诸如涂漆、上清漆,以及其他种类的覆盖技术等。
存在目前用于汽车/车辆行业中的检测方法。例如,在US6320654中公开了一种用于在涂漆之前检测车身的所选表面缺陷的***,所述***利用三角测量技术并且计入三维相移,以生成复合检测数据,将此类复合检测数据与所选参考数据比较,以生成代表相关缺陷表面的坐标的标识数据,以及对相关缺陷表面进行标记。应该指出的是,标记装置可据称涉及根据US6320654的***,但这与使用标记物质诸如水溶性标记物质来标记缺陷表面有关,而不是作为用于与表面上的污染区域缔合并且随后被检测的诸如根据本发明的标记物。
具体实施方式
本发明的具体实施例在下面公开。根据本发明的一个实施例,标记物是有机硅示踪剂。在本行业内,存在非常多被胶合、接合在一起、涂漆或涂覆的制品。如果任何有机硅正污染预期用于此类用途的表面,则任何材料都无法适当地粘附到该表面。有机硅的一大问题是不使用特殊装置就无法检测该物质。另外,洗涤方法和机械方法两者都不足以用于移除作为污染物的有机硅。
有机硅大量用于汽车行业,因此根据本发明的方法在此类汽车应用中具有特定用途。
根据本发明的一个具体实施例,标记物是荧光的,并且表面上的标记物的检测涉及荧光的检测。
应该指出的是,使用荧光检测的原因是目前已知的。例如在US2009/0223635中公开了对表面的相对于污染物的清洁度进行定量的方法。该方法据称包括使用探询辐射源,污染物对该探询辐射进行响应。从该源发出的辐射由辐射装置朝可保持污染物的表面或表面清洁剂引导。检测器检测由污染物响应于探询辐射而产生的来自表面或表面清洁剂的辐射,例如荧光或磷光辐射,并且生成对应的信号,分析仪将该信号与对应于可接受清洁状态下的表面的电子标准进行比较,以对表面的清洁度定量。根据US2009/0223635的方法不涉及使用标记物。根据US2009/0223635的方法可包括最后一个步骤,该步骤涉及将表面置于污染物敏感环境,适当地处于氧气设施中,例如允许表面被设置成与卤素例如氟接触。应该指出的是,该卤素不充当标记物,尤其是不充当随后被检测以用于与污染表面缔合的标记物。
还应该指出的是,荧光材料对于目前某些检测目的而言是已知的。例如,GB573183涉及制品表面瑕疵的检测。将该制品浸入荧光材料,移除过量的材料,其后将荧光的存在用作表面中瑕疵诸如裂纹、裂缝、裂隙的迹象。然而,荧光材料不用于如下方法中,所述方法包括使用旨在与污染表面缔合的标记物,并且还涉及标记物的检测。
根据本发明的一个具体实施例,该方法涉及通过施加紫外光来检测荧光。在这个意义上,应该指出的是,可根据本发明使用不同的标记物,并且它们可与光不同地相互作用。多种可能的标记物通过紫外光激发,然而,一些标记物也通过可见光激发。因此,可根据本发明使用紫外光,然而,也可根据所用的标记物溶液而使用其他检测装置(诸如其他光源)。应该指出的是,根据本发明的方法还涵盖在不使用此类光源的情况下检测标记物与表面污染物的缔合。
另外,如上所提及的,可根据本发明使用不同的标记物。根据所用的标记物,其浓度、检测装置等可变化。根据本发明的一个具体实施例,标记物是非极性的或两亲性的,其中两亲性物质是由亲水部分和疏水部分构成的物质。疏水的或两亲性的标记物富含油染剂,因此在这些油区域中产生增加的强度。因此,它们用作根据本发明的标记物是备受关注的。根据本发明,标记物/探针和污染物之间的缔合由标记物和污染物之间的疏水相互作用驱动。因此,该相互作用不是化学键合。
根据本发明的所关注的标记物组的例子是两亲性的罗丹明或荧光素衍生物,诸如十八烷基罗丹明B或两亲性的荧光素、或DPH(二苯基己三烯)和DPH衍生物例如TMA-DPH;非极性的BODIPY,如BODIPY荧光团或BODIPY FL C5-神经酰胺;非极性的嵌二萘标记物和双满类(bimane)标记物,例如双满类叠氮化物、LipidtoxTM中性脂质染剂、6-丙酰基-2-二甲基氨基萘(Prodan)和Laurdan、dapoxyl衍生物、苯胺基萘磺酸盐及其衍生物。这些标记物组与疏水材料诸如细胞膜缔合,并且还应对油例如润滑油起作用。因此,根据本发明,它们可极为相关。应该提到的是,也可使用其他标记物组,例如脂肪酸类似物以及例如磷脂。根据本发明,其他标记物也是可能的。
根据本发明的另一个具体实施例,标记物是环境敏感的,并且根据周围介质的极性来改变发射光的频率。这意味着取决于周围介质是水还是油,所述颜色会发生变化。在这种情况下,可对上述增加的强度添加颜色变化的效果。
根据本发明的另一个具体实施例,标记物是荧光的,并且是尼罗蓝或尼罗红、或它们的组合。尼罗蓝(或尼罗蓝A)和尼罗红(也称为尼罗蓝嗪酮)是用于生物学和组织学的亲脂染剂。尼罗蓝和尼罗红二者均是环境敏感的,并且当从水环境转移至非极性介质时,除根据环境极性发生颜色变化之外,荧光强度也显著增加。尼罗红可由尼罗蓝与硫酸的溶液煮沸而产生。二者均结合荧光显微术使用。根据本发明,两个标记物均可很好地使用和发挥作用,然而,由于尼罗红比尼罗蓝更贵,因此尼罗蓝可为优选的。这些标记物之间的选择取决于应用。可提到的是,对于许多应用而言,尼罗红在比尼罗蓝更低的浓度下发挥作用,但由于尼罗红更贵,因此尼罗蓝通常仍然是更经济的选择。
Claims (6)
1.用于在进行表面涂覆之前检测所述表面上的污染的方法,所述方法包括:使标记物与所述表面接触,其中所述标记物具有在所述表面上的污染区域处积聚的能力;以及检测所述表面上的所述标记物,其中所述标记物是非极性的或两亲性的。
2.根据权利要求1所述的方法,其中所述标记物是有机硅示踪剂。
3.根据权利要求1或2所述的方法,其中所述标记物是荧光的,并且所述表面上的所述标记物的检测涉及荧光的检测。
4.根据权利要求3所述的方法,其中所述荧光的检测通过施加紫外光来进行。
5.根据权利要求1-4中任一项所述的方法,其中所述标记物是环境敏感的并且根据周围介质的极性来改变发射光的频率。
6.根据权利要求1-5中任一项所述的方法,其中所述标记物是荧光的并且是尼罗蓝或尼罗红、或它们的组合。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SE1250056A SE1250056A1 (sv) | 2012-01-27 | 2012-01-27 | Detektering av kontaminerade områden |
SE1250056-7 | 2012-01-27 | ||
PCT/SE2013/050035 WO2013112098A1 (en) | 2012-01-27 | 2013-01-21 | Detection of contaminated areas |
Publications (1)
Publication Number | Publication Date |
---|---|
CN104105958A true CN104105958A (zh) | 2014-10-15 |
Family
ID=48873734
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201380004812.7A Pending CN104105958A (zh) | 2012-01-27 | 2013-01-21 | 污染区域的检测 |
Country Status (9)
Country | Link |
---|---|
US (1) | US9435748B2 (zh) |
EP (1) | EP2807468A4 (zh) |
JP (1) | JP2015509198A (zh) |
KR (1) | KR20140119041A (zh) |
CN (1) | CN104105958A (zh) |
BR (1) | BR112014018130A8 (zh) |
CA (1) | CA2861083A1 (zh) |
SE (1) | SE1250056A1 (zh) |
WO (1) | WO2013112098A1 (zh) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2021085760A (ja) * | 2019-11-28 | 2021-06-03 | 住友化学株式会社 | 光学フィルムの製造方法 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3527709A (en) * | 1969-01-14 | 1970-09-08 | James R Alburger | Fluorescent tracer process and compositions |
US4858465A (en) * | 1988-06-21 | 1989-08-22 | Rockwell International Corporation | Water washable contaminant detection and labeling compositions and method for utilizing same |
US20020142473A1 (en) * | 2001-02-01 | 2002-10-03 | General Electric Company | Fluorescent labeling method and substrate |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4867796A (en) * | 1982-04-05 | 1989-09-19 | Maxwell Laboratories, Inc. | Photodecontamination of surfaces |
US4651010A (en) * | 1984-06-04 | 1987-03-17 | Laser Science, Inc. | Method and apparatus for fluorescent sensing |
US5191803A (en) * | 1991-01-22 | 1993-03-09 | Mag Chem Inc. | Detection of an anticorrosion oil applied into a ship's ballast |
US5225675A (en) * | 1992-01-22 | 1993-07-06 | Inco Alloys International, Inc. | Method of monitoring removal of metal treatment solutions |
DE19846775A1 (de) * | 1998-10-10 | 2000-04-27 | Henkel Kgaa | Automatische Ölerkennung und Ölrestmengenbestimmung |
SE521948C2 (sv) * | 1998-12-17 | 2003-12-23 | Act Ab | Mätinstrument och förfarande för mätning av damm- och smutsbeläggningsgrad på en yta |
DE19958641A1 (de) * | 1999-12-06 | 2001-06-28 | Inst Chemo Biosensorik | Verfahren zur Qualitätskontrolle von Materialschichten |
DE10027236A1 (de) | 2000-05-31 | 2001-12-06 | Wack O K Chemie Gmbh | Verfahren und Testflüssigkeit zum Nachweisen von sauren Flußmittelrückständen an elektronischen Baugruppen |
DE10055557C2 (de) * | 2000-11-09 | 2002-09-26 | Ecolab Gmbh & Co Ohg | Verfahren zur gleichzeitigen Erfassung mehrerer Rückstandsarten |
DE10217950B4 (de) * | 2001-04-24 | 2011-01-13 | Volkswagen Ag | Verfahren zur Bestimmung einer Beschichtungsstärke |
DE10145985C2 (de) * | 2001-09-18 | 2003-11-13 | Fkfs Forschungsinstitut Fuer K | Verfahren und Vorrichtungen zur Bestimmung der quantitativen Verschmutzung von Oberflächen |
JP2009506188A (ja) * | 2005-08-30 | 2009-02-12 | エイジェンシー フォー サイエンス, テクノロジー アンド リサーチ | 絡み合った蛍光ポリマーおよび両親媒性分子を含んだ水溶性蛍光粒子 |
DE102006029485A1 (de) * | 2006-06-27 | 2008-01-03 | Reik Winkel | Vorrichtung zur Bestimmung der Reinigungswirkung von Waschvorgängen |
JP2009014505A (ja) * | 2007-07-04 | 2009-01-22 | Olympus Corp | 汚れ検出装置および分析装置 |
CN103364381B (zh) | 2007-12-17 | 2016-04-06 | 生命技术公司 | 用于检测无机涂敷的聚合物表面中的缺陷的方法 |
US7715008B2 (en) * | 2008-03-21 | 2010-05-11 | Xerox Corporation | System and method of optically monitoring contamination of a machine component |
JP5632529B2 (ja) * | 2010-04-07 | 2014-11-26 | エンパイア テクノロジー ディベロップメント エルエルシー | 化学化合物用の検出器 |
-
2012
- 2012-01-27 SE SE1250056A patent/SE1250056A1/sv not_active Application Discontinuation
-
2013
- 2013-01-21 WO PCT/SE2013/050035 patent/WO2013112098A1/en active Application Filing
- 2013-01-21 US US14/373,619 patent/US9435748B2/en not_active Expired - Fee Related
- 2013-01-21 JP JP2014554692A patent/JP2015509198A/ja active Pending
- 2013-01-21 KR KR1020147020561A patent/KR20140119041A/ko not_active Application Discontinuation
- 2013-01-21 BR BR112014018130A patent/BR112014018130A8/pt not_active IP Right Cessation
- 2013-01-21 CA CA2861083A patent/CA2861083A1/en not_active Abandoned
- 2013-01-21 EP EP13741399.3A patent/EP2807468A4/en not_active Withdrawn
- 2013-01-21 CN CN201380004812.7A patent/CN104105958A/zh active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3527709A (en) * | 1969-01-14 | 1970-09-08 | James R Alburger | Fluorescent tracer process and compositions |
US4858465A (en) * | 1988-06-21 | 1989-08-22 | Rockwell International Corporation | Water washable contaminant detection and labeling compositions and method for utilizing same |
US20020142473A1 (en) * | 2001-02-01 | 2002-10-03 | General Electric Company | Fluorescent labeling method and substrate |
Non-Patent Citations (6)
Title |
---|
[苏联]Л.Л.聂洛斯拉夫斯卡娅著,程鹏远等译,孙宝林等校,: "《氧化铝厂设备结垢的防治》", 31 October 1982 * |
周公度: "《结构和物性——化学原理的应用》", 31 May 2009 * |
王春梅等: "《激光扫描共聚焦显微镜技术》", 31 July 2004, article "第二十三章 常用荧光探针" * |
王锡春: "《汽车涂装工艺技术》", 31 January 2005 * |
谢文心、郭李有等: "《高分子物理》", 30 November 1989 * |
高名芩: "《玻璃风化及其防止法》", 31 December 1995 * |
Also Published As
Publication number | Publication date |
---|---|
US9435748B2 (en) | 2016-09-06 |
BR112014018130A8 (pt) | 2017-07-11 |
SE1250056A1 (sv) | 2013-07-28 |
BR112014018130A2 (zh) | 2017-06-20 |
EP2807468A4 (en) | 2015-10-21 |
KR20140119041A (ko) | 2014-10-08 |
US20140361195A1 (en) | 2014-12-11 |
EP2807468A1 (en) | 2014-12-03 |
JP2015509198A (ja) | 2015-03-26 |
CA2861083A1 (en) | 2013-08-01 |
WO2013112098A1 (en) | 2013-08-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP2223087B1 (en) | Method for detecting defects in inorganic-coated polymer surfaces and substrate | |
JP2796101B2 (ja) | 水洗可能な汚染検知及び標識組成物及びその使用方法 | |
Kohli | Methods for monitoring and measuring cleanliness of surfaces | |
US20140175305A1 (en) | Methods for Detecting Defects in Inorganic-Coated Polymer Surfaces | |
KR20150138751A (ko) | 자분탐상 검사 장치 및 방법 | |
Kutman et al. | Use of bacteria as fluorescent penetrant for penetrant testing (PT) | |
EP1886115A1 (en) | Fluorescent probe for the detection of corrosion | |
US7942037B2 (en) | Method for detecting residues on a component | |
CN104105958A (zh) | 污染区域的检测 | |
JPS6373140A (ja) | ガラス部品表面汚れ部位測定法 | |
Kohli et al. | Developments in surface contamination and cleaning, volume 12: Methods for assessment and verification of cleanliness of surfaces and characterization of surface contaminants | |
WO2002073198A3 (en) | Non-separation assay and system using opaque particles | |
JP2010197173A (ja) | 異物の識別方法 | |
CZ35218U1 (cs) | Zařízení pro sekvenční detekci organických mastných látek na povrchu pohybujících se součástí a systém pro automatickou kontrolu aplikace konzervačních a/nebo lubrikačních látek na povrchu průběžného pásu plechu | |
JP7245703B2 (ja) | Pcbを含む油の検出方法、及びpcbを含む油の除去方法 | |
Bennett et al. | Suitability of Nile Red Dye for In-Situ Microplastic Detection | |
KR100212805B1 (ko) | 샌드페이퍼의 오염 측정방법 | |
CN113684103A (zh) | 一种荧光清洗剂 | |
Niedbalski | Is Penetrant Testing Still Relevant? | |
DUBOSC et al. | Penetrant testing and year 2060 | |
WO2013094632A1 (ja) | 表示パネルの製造方法、これに用いられる搬送装置および搬送装置群ならびにオイルミスト発生源特定方法 | |
Pries | A7. 3-Giant-Magnetic-Resistance-An Aplication in Nondestructive Testing | |
JP2013200288A (ja) | 付着物検出方法 | |
JPS63293684A (ja) | 画像処理における可視光および紫外光利用照明方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
WD01 | Invention patent application deemed withdrawn after publication | ||
WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20141015 |