JP2015509198A - 汚染領域の検出 - Google Patents
汚染領域の検出 Download PDFInfo
- Publication number
- JP2015509198A JP2015509198A JP2014554692A JP2014554692A JP2015509198A JP 2015509198 A JP2015509198 A JP 2015509198A JP 2014554692 A JP2014554692 A JP 2014554692A JP 2014554692 A JP2014554692 A JP 2014554692A JP 2015509198 A JP2015509198 A JP 2015509198A
- Authority
- JP
- Japan
- Prior art keywords
- marker
- detection
- fluorescence
- contaminant
- detecting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/94—Investigating contamination, e.g. dust
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
- G01N21/63—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
- G01N21/64—Fluorescence; Phosphorescence
- G01N21/6447—Fluorescence; Phosphorescence by visual observation
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/91—Investigating the presence of flaws or contamination using penetration of dyes, e.g. fluorescent ink
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
- G01N21/63—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
- G01N21/64—Fluorescence; Phosphorescence
- G01N21/645—Specially adapted constructive features of fluorimeters
- G01N21/6456—Spatial resolved fluorescence measurements; Imaging
- G01N2021/646—Detecting fluorescent inhomogeneities at a position, e.g. for detecting defects
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/47—Scattering, i.e. diffuse reflection
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
- G01N21/63—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
- G01N21/64—Fluorescence; Phosphorescence
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
- G03F1/84—Inspecting
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70566—Polarisation control
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
Landscapes
- Health & Medical Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Abstract
Description
Claims (6)
- 表面のコーティングを行う前に前記表面上の汚染を検出する方法であって、
前記表面上の汚染領域で蓄積する能力を有するマーカを前記表面と接触させること、
非極性または両親媒性である、前記表面上の前記マーカを検出すること、
とを含む方法。 - 前記マーカがシリコーントレーサである請求項1に記載の方法。
- 前記マーカが蛍光であり、前記表面上の前記マーカの検出が蛍光の検出を含む請求項1または2に記載の方法。
- 紫外光を当てることによって蛍光の検出を行う請求項3に記載の方法。
- 前記マーカが環境に敏感であり、周辺媒体の極性に応じて放射光の周波数を変化させる請求項1から4のいずれかに記載の方法。
- 前記マーカが蛍光であり、ナイルブルーもしくはナイルレッド、またはその組合せである請求項1から5のいずれかに記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SE1250056A SE1250056A1 (sv) | 2012-01-27 | 2012-01-27 | Detektering av kontaminerade områden |
SE1250056-7 | 2012-01-27 | ||
PCT/SE2013/050035 WO2013112098A1 (en) | 2012-01-27 | 2013-01-21 | Detection of contaminated areas |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2015509198A true JP2015509198A (ja) | 2015-03-26 |
Family
ID=48873734
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2014554692A Pending JP2015509198A (ja) | 2012-01-27 | 2013-01-21 | 汚染領域の検出 |
Country Status (9)
Country | Link |
---|---|
US (1) | US9435748B2 (ja) |
EP (1) | EP2807468A4 (ja) |
JP (1) | JP2015509198A (ja) |
KR (1) | KR20140119041A (ja) |
CN (1) | CN104105958A (ja) |
BR (1) | BR112014018130A8 (ja) |
CA (1) | CA2861083A1 (ja) |
SE (1) | SE1250056A1 (ja) |
WO (1) | WO2013112098A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2021106635A1 (ja) * | 2019-11-28 | 2021-06-03 | 住友化学株式会社 | 光学フィルムの製造方法 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01321346A (ja) * | 1988-06-21 | 1989-12-27 | Rockwell Internatl Corp | 水洗可能な汚染検知及び標識組成物及びその使用方法 |
US20020034825A1 (en) * | 2000-05-31 | 2002-03-21 | Helmut Schweigart | Method and testing liquid for the detection of acidic fluxing agent residue on electronic components |
US20020142473A1 (en) * | 2001-02-01 | 2002-10-03 | General Electric Company | Fluorescent labeling method and substrate |
JP2009506188A (ja) * | 2005-08-30 | 2009-02-12 | エイジェンシー フォー サイエンス, テクノロジー アンド リサーチ | 絡み合った蛍光ポリマーおよび両親媒性分子を含んだ水溶性蛍光粒子 |
WO2011124945A1 (en) * | 2010-04-07 | 2011-10-13 | Empire Technology Development Llc. | Detector for detecting contaminants in water or aqueous solutions |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3527709A (en) * | 1969-01-14 | 1970-09-08 | James R Alburger | Fluorescent tracer process and compositions |
US4867796A (en) * | 1982-04-05 | 1989-09-19 | Maxwell Laboratories, Inc. | Photodecontamination of surfaces |
US4651010A (en) * | 1984-06-04 | 1987-03-17 | Laser Science, Inc. | Method and apparatus for fluorescent sensing |
US5191803A (en) * | 1991-01-22 | 1993-03-09 | Mag Chem Inc. | Detection of an anticorrosion oil applied into a ship's ballast |
US5225675A (en) * | 1992-01-22 | 1993-07-06 | Inco Alloys International, Inc. | Method of monitoring removal of metal treatment solutions |
DE19846775A1 (de) * | 1998-10-10 | 2000-04-27 | Henkel Kgaa | Automatische Ölerkennung und Ölrestmengenbestimmung |
SE521948C2 (sv) * | 1998-12-17 | 2003-12-23 | Act Ab | Mätinstrument och förfarande för mätning av damm- och smutsbeläggningsgrad på en yta |
DE19958641A1 (de) * | 1999-12-06 | 2001-06-28 | Inst Chemo Biosensorik | Verfahren zur Qualitätskontrolle von Materialschichten |
DE10055557C2 (de) * | 2000-11-09 | 2002-09-26 | Ecolab Gmbh & Co Ohg | Verfahren zur gleichzeitigen Erfassung mehrerer Rückstandsarten |
DE10217950B4 (de) * | 2001-04-24 | 2011-01-13 | Volkswagen Ag | Verfahren zur Bestimmung einer Beschichtungsstärke |
DE10145985C2 (de) * | 2001-09-18 | 2003-11-13 | Fkfs Forschungsinstitut Fuer K | Verfahren und Vorrichtungen zur Bestimmung der quantitativen Verschmutzung von Oberflächen |
DE102006029485A1 (de) * | 2006-06-27 | 2008-01-03 | Reik Winkel | Vorrichtung zur Bestimmung der Reinigungswirkung von Waschvorgängen |
JP2009014505A (ja) * | 2007-07-04 | 2009-01-22 | Olympus Corp | 汚れ検出装置および分析装置 |
CN103364381B (zh) | 2007-12-17 | 2016-04-06 | 生命技术公司 | 用于检测无机涂敷的聚合物表面中的缺陷的方法 |
US7715008B2 (en) * | 2008-03-21 | 2010-05-11 | Xerox Corporation | System and method of optically monitoring contamination of a machine component |
-
2012
- 2012-01-27 SE SE1250056A patent/SE1250056A1/sv not_active Application Discontinuation
-
2013
- 2013-01-21 WO PCT/SE2013/050035 patent/WO2013112098A1/en active Application Filing
- 2013-01-21 US US14/373,619 patent/US9435748B2/en not_active Expired - Fee Related
- 2013-01-21 JP JP2014554692A patent/JP2015509198A/ja active Pending
- 2013-01-21 KR KR1020147020561A patent/KR20140119041A/ko not_active Application Discontinuation
- 2013-01-21 BR BR112014018130A patent/BR112014018130A8/pt not_active IP Right Cessation
- 2013-01-21 CA CA2861083A patent/CA2861083A1/en not_active Abandoned
- 2013-01-21 EP EP13741399.3A patent/EP2807468A4/en not_active Withdrawn
- 2013-01-21 CN CN201380004812.7A patent/CN104105958A/zh active Pending
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01321346A (ja) * | 1988-06-21 | 1989-12-27 | Rockwell Internatl Corp | 水洗可能な汚染検知及び標識組成物及びその使用方法 |
US20020034825A1 (en) * | 2000-05-31 | 2002-03-21 | Helmut Schweigart | Method and testing liquid for the detection of acidic fluxing agent residue on electronic components |
US20020142473A1 (en) * | 2001-02-01 | 2002-10-03 | General Electric Company | Fluorescent labeling method and substrate |
JP2009506188A (ja) * | 2005-08-30 | 2009-02-12 | エイジェンシー フォー サイエンス, テクノロジー アンド リサーチ | 絡み合った蛍光ポリマーおよび両親媒性分子を含んだ水溶性蛍光粒子 |
WO2011124945A1 (en) * | 2010-04-07 | 2011-10-13 | Empire Technology Development Llc. | Detector for detecting contaminants in water or aqueous solutions |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2021106635A1 (ja) * | 2019-11-28 | 2021-06-03 | 住友化学株式会社 | 光学フィルムの製造方法 |
Also Published As
Publication number | Publication date |
---|---|
US9435748B2 (en) | 2016-09-06 |
BR112014018130A8 (pt) | 2017-07-11 |
SE1250056A1 (sv) | 2013-07-28 |
BR112014018130A2 (ja) | 2017-06-20 |
EP2807468A4 (en) | 2015-10-21 |
KR20140119041A (ko) | 2014-10-08 |
US20140361195A1 (en) | 2014-12-11 |
CN104105958A (zh) | 2014-10-15 |
EP2807468A1 (en) | 2014-12-03 |
CA2861083A1 (en) | 2013-08-01 |
WO2013112098A1 (en) | 2013-08-01 |
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