CN104089963A - Detection method of subsurface defect of optical glass - Google Patents
Detection method of subsurface defect of optical glass Download PDFInfo
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- CN104089963A CN104089963A CN201410312808.3A CN201410312808A CN104089963A CN 104089963 A CN104089963 A CN 104089963A CN 201410312808 A CN201410312808 A CN 201410312808A CN 104089963 A CN104089963 A CN 104089963A
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Abstract
The invention relates to a detection method of a subsurface defect of optical glass. The detection method comprises the steps: preparing a glass sample of the subsurface defect in an asphalt or polyurethane polishing mode; reasonably determining a sampling point of the sample, so as to comprehensively evaluate the subsurface defect of the sample; manufacturing a removal function of a removal area which is in a regular shape according to the sampling point, and convolving with the value of the dwell time, so as to obtain a plurality of sampling areas which are in regular shapes; uniformly removing the sampling areas with different depths by utilizing the removal function and ion beam machining; and observing the sampling areas by using surface morphology observation equipment, so as to obtain the morphology of the subsurface defect of the optical glass. According to the detection method, surface hydrolysis layers of the different sampling points in a full field of the optical glass are removed by adopting the ion beam machining, and surface microtopography detection equipment is used for observation. The detection method has the characteristics of being simple in principle, accurate and visual in measurement results and the like, hydrofluoric acid is not used, and the detection method is a safe and effective measuring method of the subsurface defect.
Description
Technical field
The present invention relates to optics processing and detection field, particularly a kind of optical glass subsurface defect detection method.
Background technology
For the litho machine of large scale integrated circuit manufacture, can expose and produce tens nanometer feature sizes figures, meet that chip size is more and more less, the more and more higher needs of integrated level.As the light projection photoetching objective lens of the main part of litho machine, be complicated optical system at present, in its manufacturing process to optical design, processing, detect and debug and all propose high requirement.For optics processing, after optical glass polishing, still have subsurface defect and exist.The existence of these defects, especially micro-crack can be under superlaser irradiation local field strengthen, reduce the resisting laser damage ability of optical material, and these defects can make light beam generation scattering, affect optical system imaging quality.Current commercial photo-etching machine illumination can reach 20mJ with light source single pulse energy, repetition frequency 6K, and need be in running order for a long time, so subsurface defect of optical element more and more comes into one's own.
Milling process is the important procedure in optical element process, is also the main process of subsurface defect output.Polishing process is to remove buckle layer and the crackle layer that milling process produces, and glass is thrown to bright process.In polishing process, quartzy can hydrolysis under the effect of water produces silicic acid film, at glass surface Plastic Flow, cover glass surface, therefore can not intuitively find subsurface defect that milling process produces whether remove with polishing process in whether produce new subsurface defect.It is exactly the process of removing glass surface hydrolysis layer or seeing through defects detection under hydrolysis layer effects on surface that the subsurface defect of optical glass detects.
Optical glass subsurface defect detection method is divided into destructive detection and two kinds of Non-Destructive Testings according to removing glass surface hydrolysis layer and seeing through hydrolysis layer.Glass subsurface defect lossless detection method mainly contains roughness empirical method (according to the anti-subsurface defect degree of depth that pushes away of surfaceness peak-to-valley value), confocal microscopy method, total internal reflection microscopy etc., the equipment price general charged of using is expensive, complicated operation, result relies on operating personnel, obtains accurate result more difficult.Destructive detection method simple, intuitive is accurate comparatively speaking, can improve the trust data information that provides for optical glass processing technology.Current destructive detection method mainly contains hydrofluorite etch and magnetorheological method.Because silicon dioxide only reacts with hydrofluorite, corrosion can only be selected hydrogen fluorine fluoric acid with acid, and the corrosivity of hydrofluorite own is very strong, and it is a kind of colourless toxic gas that the two reaction produces silicon fluoride gas, so protect important in hydrofluorite use and corrosion process; Magnetorheological processing is a kind of harmless processing mode, and it adopts polishing fluid processing mode the same with other, can produce hydrolysis layer at optical glass surface, although than general hydrolysis layer thin thickness, can not directly observe subsurface defect situation.With reference to Fig. 2, the shortcoming such as optical glass subsurface defect detection technique in the past, be (a) and (b) copolymerization Jiao's microscopic method and the total internal reflection microscopic method in lossless detection method, has apparatus expensive, and result is not intuitive and reliable; (c) and (d) be respectively gummed polishing hydrofluorite etch and magnetorheological method, have the problems such as poor stability and result be not directly perceived.
Summary of the invention
The present invention will solve technical matters of the prior art, provides a kind of can guiding optics glass machining technique improved, optical glass subsurface defect detection method.
In order to solve the problems of the technologies described above, technical scheme of the present invention is specific as follows:
An optical glass subsurface defect detection method, comprises the following steps:
Step I: adopt pitch or polyurethane polishing mode to prepare subsurface defect glass sample;
Step I i: rationally determine sample sampled point, with thoroughly evaluating sample subsurface defect;
Step I ii: make and remove the removal function that region is regular shape according to sampled point, with some sample area of residence time convolution acquisition regular shape;
Step I v: utilize above-mentioned removal function and I.B.M. to carry out different depth to sample area and evenly remove;
Step v: use surface topography facilities for observation to observe sample area, obtain optical glass subsurface defect pattern.
In technique scheme, described surface topography facilities for observation is white light interferometer or atomic force microscope.
In technique scheme, after step I v, before step v, be also provided with step: if hydrolysis layer is not removed completely, sample area is removed again.
The present invention has following beneficial effect:
Optical glass subsurface defect detection method of the present invention adopts I.B.M. to remove different sampled point surface hydrolysis layers in the full visual field of optical glass, use surface microscopic topographic checkout equipment to observe it, be a kind of effective means that detects optical glass subsurface defect, optics processing technology is improved and had directive significance;
Than optical glass subsurface defect lossless detection method, the present invention is more accurate and visual, and without expensive checkout equipment, testing result greatly reduces operating personnel's dependence;
Than hydrofluorite caustic solution, this invention safety and reliability;
Than magnetorheological job operation, this invention does not produce new subsurface defect simultaneously except having, and after processing, can not produce new hydrolysis layer, can directly sub-surface topography be observed and be measured.
Accompanying drawing explanation
Below in conjunction with the drawings and specific embodiments, the present invention is described in further detail.
Fig. 1 is optical glass subsurface defect schematic diagram;
Figure a-d in Fig. 2 is respectively optical glass subsurface defect detection method schematic diagram of the prior art;
Fig. 3 is I.B.M. principle schematic;
Fig. 4 is subsurface defect testing process schematic diagram of the present invention;
Fig. 5 is sample processing Samples selecting schematic diagram;
Fig. 6 removes function for processing and makes schematic diagram.
Embodiment
Invention thought of the present invention is:
Optical glass subsurface defect detection method of the present invention, comprises following steps:
Adopt the polishing modes such as pitch, polyurethane to prepare subsurface defect glass sample;
Rationally determine that sample sampled point is with thoroughly evaluating sample subsurface defect;
According to sampled point, make and remove the removal function that region is regular shape, with some sample area of residence time convolution acquisition regular shape;
Utilizing above-mentioned removal function and I.B.M. to carry out different depth to sample area evenly removes;
Use existing surface topography facilities for observation to observe sample area, obtain optical glass subsurface defect pattern, if it is inadequate to remove the degree of depth, sample area is removed again, obtain the subsurface defect degree of depth.
Below in conjunction with accompanying drawing, the present invention is described in detail.
With reference to Fig. 1, after optical glass polishing, surface structure can be divided into hydrolysis layer, defect layer, deformation layer and zero defect layer, and defect layer is hydrolyzed layer and covers, and is difficult for directly observing.
With reference to Fig. 3, I.B.M. (IBF) adopts inert ion to bombard optical surface, and glass surface material is removed, and has and does not form new hydrolysis layer, and after processing, sub-surface topography observes convenient and reliable, and security is secure.
With reference to Fig. 4-6, will describe in detail specific embodiment:
(1), having subsurface defect glass sample makes: adopt polyurethane to carry out polishing to diameter 150mm melting quartz glass planar sample, compare pitch polishing and can produce thinner hydrolysis layer, hydrolysis layer thickness approximately tens nanometers are to nanometers up to a hundred;
(2), Samples selecting: the planar sample of 150mm bore is selected to choose 4 points as sampled point, as shown in Figure 5 on three 120 ° of radiuses of being separated by;
(3), removing function makes: in 150mm bore plane, the conformality region that sample point removal region selection bore is 10mm is as removing region, as shown in Figure 6.Add and can take 1mm man-hour as working interval is to removing region processing, 10mm region is relatively little, and square area is beneficial to processing, can reduce process time;
(4), glass sample sample area material is removed: by controlled working residence time utilize I.B.M. to remove region carry out 10nm, 20nm ... the 100nm degree of depth is evenly removed;
(5), sub-surface topography observation: utilize white light interferometer to observe removing region, obtain glass subsurface defect information;
(6) if hydrolysis layer is not removed completely, glass sample sampled point region is removed again, and then sub-surface topography is observed.
Obviously, above-described embodiment is only for example is clearly described, and the not restriction to embodiment.For those of ordinary skill in the field, can also make other changes in different forms on the basis of the above description.Here exhaustive without also giving all embodiments.And the apparent variation of being extended out thus or change are still among the protection domain in the invention.
Claims (3)
1. an optical glass subsurface defect detection method, is characterized in that, comprises the following steps:
Step I: adopt pitch or polyurethane polishing mode to prepare subsurface defect glass sample;
Step I i: rationally determine sample sampled point, with thoroughly evaluating sample subsurface defect;
Step I ii: make and remove the removal function that region is regular shape according to sampled point, with some sample area of residence time convolution acquisition regular shape;
Step I v: utilize above-mentioned removal function and I.B.M. to carry out different depth to sample area and evenly remove;
Step v: use surface topography facilities for observation to observe sample area, obtain optical glass subsurface defect pattern.
2. optical glass subsurface defect detection method according to claim 1, is characterized in that, described surface topography facilities for observation is white light interferometer or atomic force microscope.
3. optical glass subsurface defect detection method according to claim 1 and 2, is characterized in that, after step I v, before step v, is also provided with step: if hydrolysis layer is not removed completely, sample area is removed again.
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| CN105092585A (en) * | 2014-05-05 | 2015-11-25 | 南京理工大学 | Subsurface measuring device and method based on total internal reflection and optical coherence tomography |
| CN106248350A (en) * | 2015-12-21 | 2016-12-21 | 中国科学院长春光学精密机械与物理研究所 | The material homogeneity detection method of a kind of optical glass and device |
| CN107543824A (en) * | 2016-06-23 | 2018-01-05 | 中国科学院长春光学精密机械与物理研究所 | The detection means and its detection method of planar optical elements beauty defects |
| CN109932529A (en) * | 2019-03-08 | 2019-06-25 | 河海大学 | A method of based on polymer dispersity in atomic force microscope detection SBS modified pitch |
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| CN105092585A (en) * | 2014-05-05 | 2015-11-25 | 南京理工大学 | Subsurface measuring device and method based on total internal reflection and optical coherence tomography |
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| CN106248350A (en) * | 2015-12-21 | 2016-12-21 | 中国科学院长春光学精密机械与物理研究所 | The material homogeneity detection method of a kind of optical glass and device |
| CN106248350B (en) * | 2015-12-21 | 2019-01-29 | 中国科学院长春光学精密机械与物理研究所 | A kind of material homogeneity detection method and device of optical glass |
| CN107543824A (en) * | 2016-06-23 | 2018-01-05 | 中国科学院长春光学精密机械与物理研究所 | The detection means and its detection method of planar optical elements beauty defects |
| CN109932529A (en) * | 2019-03-08 | 2019-06-25 | 河海大学 | A method of based on polymer dispersity in atomic force microscope detection SBS modified pitch |
| CN109932529B (en) * | 2019-03-08 | 2020-12-25 | 河海大学 | Method for detecting polymer dispersibility in SBS modified asphalt based on atomic force microscope |
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