CN104089963B - A kind of optical glass subsurface defect detection method - Google Patents
A kind of optical glass subsurface defect detection method Download PDFInfo
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- CN104089963B CN104089963B CN201410312808.3A CN201410312808A CN104089963B CN 104089963 B CN104089963 B CN 104089963B CN 201410312808 A CN201410312808 A CN 201410312808A CN 104089963 B CN104089963 B CN 104089963B
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- subsurface defect
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Abstract
The present invention relates to a kind of optical glass subsurface defect detection method, the steps include: to use Colophonium or polyurethane polishing mode to prepare subsurface defect glass sample；Rationally determine sample point, with thoroughly evaluating sample subsurface defect；Make according to sampled point and remove the removal function that region is regular shape, with some sample area that residence time convolution obtains regular shape；Utilize above-mentioned removal function and ion beam processing that sample area is carried out different depth uniformly to remove；Use surface topography facilities for observation that sample area is observed, it is thus achieved that optical glass subsurface defect pattern.The present invention uses ion beam processing to be removed sampled point surface hydrolysis layers different in optical glass full filed, uses surface microscopic topographic detection equipment to be observed it；It is simple that the present invention has principle, the features such as measurement result is accurate and visual, it is to avoid use Fluohydric acid., is one safely and effectively subsurface defect measuring method.
Description
Technical field
The present invention relates to optical manufacturing and detection field, particularly to a kind of optical glass subsurface defect detection
Method.
Background technology
Litho machine for large scale integrated circuit manufacture can expose generation tens nanometer feature sizes figures,
Meet that chip size is more and more less, the more and more higher needs of integrated level.Projection as the main part of litho machine
Lithographic objective is current complicated optical system, its manufacture during to optical design, process, detect
With debuging, high requirement is all proposed.For optical manufacturing, still have sub-surface after optical glass polishing and lack
Fall into and exist.The existence of these defects, especially micro-crack can strengthen by local field under superlaser irradiation, fall
The resisting laser damage ability of low optical material, and these defects can make light beam scatter, and affect optical system
System image quality.At present Commercial photolithography machine illumination light source single pulse energy is up to 20mJ, repetition rate 6K,
And need the most in running order, so subsurface defect of optical element increasingly comes into one's own.
Milling process is the important procedure in the optical element course of processing, is also the main of subsurface defect output
Process.Polishing process is to remove buckle layer and the crackle layer that milling process produces, and glass is thrown bright mistake
Journey.In polishing process, quartz hydrolysis can produce silicic acid thin film, at glass surface Plastic Flow under the effect of water
Cover at glass surface, therefore can not intuitively find whether the subsurface defect that milling process produces is removed and throw
Whether photoreduction process produces new subsurface defect.Glass is removed in the subsurface defect detection of optical glass exactly
Surface hydrolysis layer or process sub-surface defect detected through hydrolysis layer.
Optical glass subsurface defect detection method is according to removing glass surface hydrolysis layer and being divided into through hydrolysis layer
Destructive detection and Non-Destructive Testing two kinds.Glass subsurface defect lossless detection method mainly has roughness experience
Method (pushing away the subsurface defect degree of depth according to surface roughness peak-to-valley value is counter), confocal microscopy method, total internal reflection microscopy
Deng, the equipment price general charged of use is expensive, operation complexity, and result relies on operator, it is thus achieved that accurate result
Relatively difficult.Destructive detection method simple, intuitive is accurate comparatively speaking, can be optical glass producing technique
Improve and trust data information is provided.The most destructive detection method mainly has Fluohydric acid. etch and magnetorheological side
Method.Owing to silicon dioxide only reacts with Fluohydric acid., corrosion acid can only select hydrogen fluorine fluoric acid, Fluohydric acid.
Corrosivity own is very strong, and it is a kind of colourless toxic gas that the two reaction produces silicon fluoride gas, so Fluohydric acid.
Use and corrosion process protected important；Magnetorheological processing is a kind of lossless processing mode, but itself and its
He uses polishing fluid processing mode the same, can produce hydrolysis layer at optical glass surface, although than general hydrolysis
Layer thickness is thin, can not directly observe subsurface defect situation.With reference to Fig. 2, surface, conventional optical glass Asia lacks
Falling into detection technique, (a) and (b) is the copolymerization Jiao's microscopic method in lossless detection method and total internal reflection microscopic method,
There is apparatus expensive, the shortcomings such as result is the most intuitive and reliable；C () and (d) is respectively gluing polishing Fluohydric acid. etch
With magnetorheological method, there is poor stability and the problem such as result is the most directly perceived.
Summary of the invention
The invention solves the problems that technical problem of the prior art, it is provided that one can be with guiding optics glass processing work
Skill is improved, optical glass subsurface defect detection method.
In order to solve above-mentioned technical problem, technical scheme is specific as follows:
A kind of optical glass subsurface defect detection method, comprises the following steps:
Step i: use Colophonium or polyurethane polishing mode to prepare subsurface defect glass sample；
Step ii: rationally determine sample point, with thoroughly evaluating sample subsurface defect；
Step iii: make according to sampled point and remove the removal function that region is regular shape, with residence time convolution
Obtain some sample area of regular shape；
Step iv: utilize above-mentioned removal function and ion beam processing that sample area is carried out different depth and uniformly go
Remove；
Step v: use surface topography facilities for observation that sample area is observed, it is thus achieved that surface, optical glass Asia
Defect pattern.
In technique scheme, described surface topography facilities for observation is white light interferometer or atomic force microscope.
In technique scheme, after step iv, before step v, it is additionally provided with step: if hydrolysis layer is the completeest
Full removal, removes again to sample area.
The present invention has a following beneficial effect:
The optical glass subsurface defect detection method of the present invention uses ion beam processing to optical glass full filed
Interior different sampled point surface hydrolysis layer is removed, and uses surface microscopic topographic detection equipment to be observed it,
It is a kind of effective means detecting optical glass subsurface defect, optical process is improved there is guidance meaning
Justice；
Compared to optical glass subsurface defect lossless detection method, the present invention is more accurate and visual, it is not necessary to expensive
Detection equipment, operator's dependency is greatly reduced by testing result；
Compared to Fluohydric acid. caustic solution, this invention safety and reliability；
Compared to magnetorheological processing method, this invention does not produces new subsurface defect simultaneously, after processing except having
New hydrolysis layer will not be produced, directly sub-surface topography can be observed and measured.
Accompanying drawing explanation
With detailed description of the invention, the present invention is described in further detail below in conjunction with the accompanying drawings.
Fig. 1 is optical glass subsurface defect schematic diagram；
Figure a-d in Fig. 2 is respectively optical glass subsurface defect detection method schematic diagram of the prior art；
Fig. 3 is ion beam processing principle schematic；
Fig. 4 is subsurface defect testing process schematic diagram of the present invention；
Fig. 5 is that Samples selecting schematic diagram processed by sample；
Fig. 6 removes function for processing and makes schematic diagram.
Detailed description of the invention
The invention thought of the present invention is:
The optical glass subsurface defect detection method of the present invention, comprises the steps of
The polishing mode such as Colophonium, polyurethane of employing prepares subsurface defect glass sample；
Rationally determine that sample point is with thoroughly evaluating sample subsurface defect；
Make according to sampled point and remove the removal function that region is regular shape, obtain rule with residence time convolution
Then some sample area of shape；
Utilize above-mentioned removal function and ion beam processing that sample area is carried out different depth uniformly to remove；
Use existing surface topography facilities for observation that sample area is observed, it is thus achieved that surface, optical glass Asia lacks
Fall into pattern, if it is inadequate to remove the degree of depth, sample area is removed again, it is thus achieved that the subsurface defect degree of depth.
Below in conjunction with the accompanying drawings the present invention is described in detail.
With reference to Fig. 1, after optical glass polishing, surface texture can be divided into hydrolysis layer, defect layer, deformation layer
With zero defect layer, defect layer is hydrolyzed layer and is covered, and is difficult to be directly observed.
With reference to Fig. 3, ion beam processing (IBF) uses inert ion to bombard optical surface, to glass surface
Material is removed, and has and is formed without new hydrolysis layer, and after processing, sub-surface topography observation is convenient and reliable, and
Safety is secure.
With reference to Fig. 4-6, specific embodiment will be described in detail:
(1), there is subsurface defect glass sample make: use polyurethane that diameter 150mm melts quartz glass
Glass planar sample is polished, and compares Colophonium polishing and can produce thinner hydrolysis layer, and hydrolysis layer thickness is the most several
Ten nanometers are to nanometers up to a hundred；
(2), Samples selecting: the planar sample selection three of 150mm bore is separated by 120 ° of radiuses to be chosen
4 points are as sampled point, as shown in Figure 5；
(3), remove function to make: in 150mm bore plane, sample point removes regional choice bore
For 10mm conformality region as remove region, as shown in Figure 6.Adding man-hour can be with 1mm as working interval
To removing region processing, 10mm region is relatively small, and square area is beneficial to processing, it is possible to reduce add man-hour
Between；
(4), glass sample sample area material is removed: utilize ion beam to add by controlling processing residence time
To removing, region carries out 10nm to work, 20nm ... 100nm uniform depth is removed；
(5), sub-surface topography observation: utilize white light interferometer to be observed removing region, it is thus achieved that glass
Subsurface defect information；
(6) if hydrolysis layer is removed the most completely, glass sample sampled point region is removed, then again
Again sub-surface topography is observed.
Obviously, above-described embodiment is only for clearly demonstrating example, and not to embodiment
Limit.For those of ordinary skill in the field, can also be made it on the basis of the above description
The change of its multi-form or variation.Here without also cannot all of embodiment be given exhaustive.And by
What this was extended out obviously changes or changes among still in the protection domain of the invention.
Claims (3)
1. an optical glass subsurface defect detection method, it is characterised in that comprise the following steps:
Step i: use Colophonium or polyurethane polishing mode to prepare subsurface defect glass sample；
Step ii: rationally determine sample point, with thoroughly evaluating sample subsurface defect；
Step iii: make according to sampled point and remove the removal function that region is regular shape, with residence time convolution
Obtain some sample area of regular shape；
Step iv: utilize above-mentioned removal function and ion beam processing that sample area is carried out different depth and uniformly go
Remove；
Step v: use surface topography facilities for observation that sample area is observed, it is thus achieved that surface, optical glass Asia
Defect pattern.
Optical glass subsurface defect detection method the most according to claim 1, it is characterised in that institute
Stating surface topography facilities for observation is white light interferometer or atomic force microscope.
Optical glass subsurface defect detection method the most according to claim 1 and 2, it is characterised in that
After step iv, before step v, it is additionally provided with step: if hydrolysis layer is removed the most completely, sample area is carried out
Again remove.
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| CN104089963B true CN104089963B (en) | 2016-11-02 |
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Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105092585B (en) * | 2014-05-05 | 2018-01-05 | 南京理工大学 | Sub-surface measurement apparatus and method based on total internal reflection and optical coherence tomography |
| CN106248350B (en) * | 2015-12-21 | 2019-01-29 | 中国科学院长春光学精密机械与物理研究所 | A kind of material homogeneity detection method and device of optical glass |
| CN107543824B (en) * | 2016-06-23 | 2022-03-22 | 中国科学院长春光学精密机械与物理研究所 | Device and method for detecting surface defects of planar optical element |
| CN109932529B (en) * | 2019-03-08 | 2020-12-25 | 河海大学 | Method for detecting polymer dispersibility in SBS modified asphalt based on atomic force microscope |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101135654A (en) * | 2007-09-29 | 2008-03-05 | 中国科学院上海光学精密机械研究所 | Method for detecting defect of sub-surface |
| CN103115927A (en) * | 2013-02-04 | 2013-05-22 | 中国人民解放军国防科学技术大学 | Nondestructive testing method for optical glass polishing sub-surface damages |
| CN103163154A (en) * | 2013-02-04 | 2013-06-19 | 西安交通大学 | Characterization method of hard brittle high-precision component sub-surface damage degree |
| CN103308529A (en) * | 2013-06-21 | 2013-09-18 | 中国科学院上海光学精密机械研究所 | Method for detecting subsurface defects of optical glass |
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Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101135654A (en) * | 2007-09-29 | 2008-03-05 | 中国科学院上海光学精密机械研究所 | Method for detecting defect of sub-surface |
| CN103115927A (en) * | 2013-02-04 | 2013-05-22 | 中国人民解放军国防科学技术大学 | Nondestructive testing method for optical glass polishing sub-surface damages |
| CN103163154A (en) * | 2013-02-04 | 2013-06-19 | 西安交通大学 | Characterization method of hard brittle high-precision component sub-surface damage degree |
| CN103308529A (en) * | 2013-06-21 | 2013-09-18 | 中国科学院上海光学精密机械研究所 | Method for detecting subsurface defects of optical glass |
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