CN103978746B - A kind of film and preparation method thereof, display floater and display device - Google Patents
A kind of film and preparation method thereof, display floater and display device Download PDFInfo
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- CN103978746B CN103978746B CN201410188019.3A CN201410188019A CN103978746B CN 103978746 B CN103978746 B CN 103978746B CN 201410188019 A CN201410188019 A CN 201410188019A CN 103978746 B CN103978746 B CN 103978746B
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- polycrystalline silicon
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- 238000002360 preparation method Methods 0.000 title abstract description 7
- 239000012528 membrane Substances 0.000 claims abstract description 58
- 239000000758 substrate Substances 0.000 claims abstract description 57
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims abstract description 49
- 229910010271 silicon carbide Inorganic materials 0.000 claims abstract description 36
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims abstract description 33
- 239000000463 material Substances 0.000 claims description 51
- 238000000034 method Methods 0.000 claims description 16
- 230000008569 process Effects 0.000 claims description 6
- 239000004973 liquid crystal related substance Substances 0.000 claims description 4
- 230000015572 biosynthetic process Effects 0.000 claims description 2
- 230000008021 deposition Effects 0.000 claims description 2
- 239000000126 substance Substances 0.000 claims description 2
- 229920000642 polymer Polymers 0.000 claims 1
- 239000010408 film Substances 0.000 description 71
- 239000010410 layer Substances 0.000 description 42
- 208000034699 Vitreous floaters Diseases 0.000 description 31
- 239000005357 flat glass Substances 0.000 description 4
- 230000008859 change Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 239000011241 protective layer Substances 0.000 description 3
- JDZUWXRNKHXZFE-UHFFFAOYSA-N 1,2,3,4,5-pentachloro-6-(2,4,6-trichlorophenyl)benzene Chemical compound ClC1=CC(Cl)=CC(Cl)=C1C1=C(Cl)C(Cl)=C(Cl)C(Cl)=C1Cl JDZUWXRNKHXZFE-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000001182 laser chemical vapour deposition Methods 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 241001597008 Nomeidae Species 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- -1 argon for carrier Chemical class 0.000 description 1
- 230000017531 blood circulation Effects 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 229910021419 crystalline silicon Inorganic materials 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 238000004880 explosion Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052756 noble gas Inorganic materials 0.000 description 1
- 150000002835 noble gases Chemical class 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 208000017983 photosensitivity disease Diseases 0.000 description 1
- 231100000434 photosensitization Toxicity 0.000 description 1
- 229950000845 politef Drugs 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
- 238000000197 pyrolysis Methods 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
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Abstract
The invention discloses a kind of film and preparation method thereof, display floater and display device; main contents include: by deposited on substrates polycrystalline silicon membrane; and on polycrystalline silicon membrane, form silicon carbide film layer, thus, form the protecting film in order to protect display floater. Owing to the scratch resistance capability of the silicon carbide film layer of described protecting film is relatively strong, explosion-proof capabilities is better, and thinner thickness, therefore, it can the protecting film as display floater.
Description
Technical field
The present invention relates to Display Technique field, particularly relate to a kind of film and preparation method thereof, display floater and display device.
Background technology
In existing Display Technique field; no matter it is Organic Light Emitting Diode (OrganicLight-EmittingDiode; OLED) display device; or liquid crystal (LiquidCrystal; LC) display device; outermost layer at display floater needs a protective layer, in order to prevent scuffing polaroid or other structures. At present, comparatively conventional protective layer is based on cover-plate glass, and it has that surface smoothness is good, case hardness is higher and the advantage such as scratch resistance capability is stronger, therefore, is widely used in making the protecting film of display device.
But, when cover-plate glass uses as protective layer, its thickness there is is certain requirement, it is impossible to be made too thin, otherwise, the thickness of display floater can be affected; Additionally, due to the quality of cover-plate glass is more crisp, it is not easy to realize machining, and, it is easy to cause the explosion of cover-plate glass.
Summary of the invention
The embodiment of the present invention provides a kind of film and preparation method thereof, display floater and display device, in order to solve problems of the prior art.
The embodiment of the present invention is by the following technical solutions:
A kind of film, including: base material; Being arranged on the first rete of the first surface of described base material, wherein, described first rete includes the first polycrystalline silicon membrane near described base material, and is positioned on described polycrystalline silicon membrane away from the first silicon carbide film layer of described base material.
A kind of display floater, including described film.
A kind of display device, including described display floater.
A kind of method preparing film, including:
One base material is provided;
The first rete is formed at least one surface of described base material;
Wherein, the process forming described first rete is: form polycrystalline silicon membrane at least one surface of base material; On at least one polycrystalline silicon membrane, form silicon carbide film layer.
Film provided by the invention, by deposited on substrates polycrystalline silicon membrane, and forms silicon carbide film layer on polycrystalline silicon membrane, thus, form the protecting film in order to protect display floater. Owing to the scratch resistance capability of the silicon carbide film layer of described protecting film is relatively strong, explosion-proof capabilities is better, therefore, it can the protecting film as display floater.
Accompanying drawing explanation
In order to be illustrated more clearly that the technical scheme in the embodiment of the present invention, below the accompanying drawing used required during embodiment is described is briefly introduced, apparently, accompanying drawing in the following describes is only some embodiments of the present invention, for those of ordinary skill in the art, under the premise not paying creative work, it is also possible to obtain other accompanying drawing according to these accompanying drawings.
Fig. 1 is the first structural representation of the described film in the embodiment of the present invention;
Fig. 2 is the second structural representation of the described film in the embodiment of the present invention;
Fig. 3 is the third structural representation of the described film in the embodiment of the present invention;
Fig. 4 is the structural representation of the first rete of the described film in the embodiment of the present invention;
Fig. 5 is the light path schematic diagram of the microprism array structure of the described film in the embodiment of the present invention;
Fig. 6 is the structural representation of the OLED display panel in the embodiment of the present invention;
Fig. 7 is a kind of method flow schematic diagram preparing film in the embodiment of the present invention.
Detailed description of the invention
In order to make the object, technical solutions and advantages of the present invention clearly, below in conjunction with accompanying drawing, the present invention is described in further detail, it is clear that described embodiment is only a part of embodiment of the present invention, rather than whole embodiments. Based on the embodiment in the present invention, all other embodiments that those of ordinary skill in the art obtain under not making creative work premise, broadly fall into the scope of protection of the invention.
In embodiments of the present invention, by deposited on substrates polycrystalline silicon membrane, and on polycrystalline silicon membrane, form silicon carbide film layer, thus, form the protecting film in order to protect display floater. Owing to the scratch resistance capability of the silicon carbide film layer of described protecting film is relatively strong, explosion-proof capabilities is better, therefore, it can the protecting film as display floater.
Below by specific embodiment, the solution of the present invention being described in detail, the present invention includes but are not limited to: following example.
As it is shown in figure 1, the first structural representation of a kind of film for providing in the embodiment of the present invention, described film, for being attached to the outermost layer of display floater, plays the effect of protection display floater. Specifically, described film includes: base material 101; It is arranged on the first rete 102 of the first surface of described base material, wherein, described first rete 102 comprises: near the first polycrystalline silicon membrane 1021 of described base material, and the first silicon carbide film layer 1022 being positioned on described first polycrystalline silicon membrane 1021 away from described base material 101.
Preferably, described film is not limited to the structure shown in Fig. 1, it is also possible to for the third structure shown in the second structure as shown in Figure 2 or Fig. 3.
As in figure 2 it is shown, described film includes: base material 101; It is arranged on the first rete 102 of the first surface of described base material, it is arranged on the second rete 103 of the second surface of described base material 101, wherein, described second surface and described first surface are oppositely arranged, described second rete 103 comprises: near the second polycrystalline silicon membrane 1031 of described base material 101, and the second silicon carbide film layer 1032 being positioned on described second polycrystalline silicon membrane 1031 away from described base material 101.
As it is shown on figure 3, described film includes: base material 101; Being arranged on the first rete 102 of the first surface of described base material, be arranged on the second rete 104 of the second surface of described base material 101, wherein, described second surface and described first surface are oppositely arranged, and described second rete 104 is described second polycrystalline silicon membrane.
In the structure of three of the above film, described base material 101 is transparent flexible organic polymer material. In the present embodiment alternatively, the material of described base material 101 can be politef (PET), but the present invention is not limited to this material. Wherein, optionally, the thickness range of described base material 101 is 0.05mm��0.15mm.
Alternatively, in described first rete 102 and described second rete 103, described polycrystalline silicon membrane directly contacts with described silicon carbide film layer.
In the structure of above-mentioned three kinds of films, in the first rete 102 on base material 101, described first polycrystalline silicon membrane 1021 has microprism array structure, and in the second rete 103, described second polycrystalline silicon membrane 1031 can also have microprism array structure. As shown in Figure 4, for the first rete 102, each described micro-prism structure is all with surface that self contacts with base material 101 for benchmark, the micro-prism structure that height is 20��50 microns to self structure highest point, wherein, the cross section figure of each micro-prism structure can be triangle as shown in Figure 4, it is also possible to be trapezoidal, semicircle etc., the concrete shape of described sectional view is not limited by the present invention, as long as have reflection or the effect of refraction light; And described micro-prism structure extends along the horizontal or vertical direction on this surface on the surface of base material 101, and then, multiple adjacent micro-prism structures together form described microprism array structure.
In embodiments of the present invention, described microprism array structure can use as optical prism thin film, especially for OLED display panel, according to geometric optical theory, the blood circulation that emergent ray is constituted through described film, make light can be accumulated to greatest extent and launch, as shown in Figure 5, assume that light enters described microprism array structure, when emergent ray 1 is when first micro-prism structure place outgoing, refraction action due to micro-prism structure so that major part light is all refracted between light 1 and light 2; Even if light offsets, all right light 4 in Fig. 5 of emergent ray, enter another adjacent micro-prism structure, re-start the operations such as the reflection of light, refraction, thus reaching to increase the effect of display floater brightness. It addition, the first silicon carbide film layer 1022 on described first polycrystalline silicon membrane 1021, and the second silicon carbide film layer 1032 on described second polycrystalline silicon membrane 1031; Owing to the Mohs' hardness of carborundum is 9.5 grades, being only second to diamond (10 grades) the hardest in the world, therefore, the hardness of carborundum is very big, has good resistance to marring; And, carborundum is a kind of quasiconductor, has excellent heat conductivility. Comprehensive factors above, the first rete being made up of polycrystalline silicon membrane and silicon carbide film layer has a good resistance to marring, and its thinner thickness, it is suitable for the outermost protecting film as display floater.
Based on a kind of film that above-described embodiment provides, the embodiment of the present invention additionally provides a kind of display floater, including film involved in above-described embodiment, in order to as protecting film, to be attached to the outermost of described display floater, with scratch resistance, protects display floater.
Alternatively, described display floater also includes: first substrate; The second substrate being oppositely arranged with first substrate; Wherein, described film is arranged at outside described first substrate.
Alternatively, described display floater also includes: be arranged on the polaroid between described film and described first substrate.
Alternatively, described display floater also includes: be arranged on the liquid crystal layer between described first substrate and described second substrate, or, it is arranged on the luminescent device on described second substrate.
Alternatively, described display floater also includes: touch screen. Wherein, touch screen has various structures, it is possible between two substrates, or is integrated on first substrate or second substrate, or on-cell structure etc.
Such as: for display panels, first substrate and second substrate are oppositely arranged; First substrate is array base palte, and second substrate is color membrane substrates, or, first substrate is color membrane substrates, and second substrate is array base palte. And, the outside of array base palte and color membrane substrates is provided with polaroid. Polaroid outside color membrane substrates is between color membrane substrates and described film.
For OLED display panel, first substrate is same with second substrate to be oppositely arranged; First substrate is oled substrate, when being not provided with colored hair photosphere on described oled substrate, then described second substrate is color membrane substrates, when being provided with colored hair photosphere on described oled substrate, then described second substrate is encapsulated layer; Or, second substrate is oled substrate, when being not provided with colored hair photosphere on described oled substrate, then described first substrate is color membrane substrates, when being provided with colored hair photosphere on described oled substrate, then described first substrate is encapsulated layer. And, color membrane substrates or can be provided with polaroid outside encapsulated layer, to obtain line polarized light.
Described display floater can be the display floaters such as OLED, LCD, and the type of the display floater that described film is applied is not made concrete restriction by the present invention, further, it is also possible to as the outermost layer protecting film in other devices. Describe in detail for OLED display panel below.
As shown in Figure 6, for the structural representation of OLED display panel in the embodiment of the present invention, it should be noted that, following example only introduce main functional film layer, other base film layer existing are not described by the present invention, but the film layer structure of display floater involved in the present invention is not limited to content below.
Described display floater specifically includes that oled substrate 201; Being positioned at the luminescent layer 202 on described oled substrate 201, described luminescent layer 202 is not completely covered described oled substrate 201, and the non-display area outside the surrounding of described oled substrate 201 exposes viewing area; TP layer 203 between described luminescent layer 202 and described oled substrate 201; Being bundled in the flexible PCB 204 on described oled substrate 201, wherein, described flexible PCB 204 is integrated with TP drive circuit and TFT drive circuit; It is positioned at the encapsulated layer 205 on described TP layer 203, wherein, described encapsulated layer 205 includes the non-display area outside described viewing area and viewing area, and is coated with sealed plastic box 205 ', and described sealed plastic box 205 ' is for fitting together described encapsulated layer 205 with the para-position of described oled substrate 201; It is positioned at the polaroid 206 on described encapsulated layer 205; It is positioned at the scratch resistance film 207 on described polaroid 206. Wherein, described scratch resistance film 207 is the film in the embodiment of the present invention, this scratch resistance film 207 is made up of three retes, include under upper: the first rete being made up of silicon carbide film layer and polycrystalline silicon membrane, the base material being made up of transparent PET material, the second rete being made up of polycrystalline silicon membrane and silicon carbide film layer.The first rete being made up of polycrystalline silicon membrane and silicon carbide film layer has a good resistance to marring, and its thinner thickness, it is possible to the thickness of thinning display floater, it is suitable for the outermost protecting film as display floater.
Additionally, the embodiment of the present invention additionally provides a kind of display device, including the display floater described in above-described embodiment, meanwhile, described display device also includes other apparatus structures existing, for instance, backlight module etc.
Based on a kind of design identical for the film protecting display floater provided with above example, the embodiment of the present invention additionally provides a kind of method preparing film, is described in detail below by way of specific embodiment, but the invention is not limited in following example.
As it is shown in fig. 7, a kind of method flow schematic diagram preparing film provided for the embodiment of the present invention, it is shown that method comprises the following steps:
Step 301 a: base material is provided.
Step 302: form the first rete at least one surface of described base material. Wherein, the process forming described first rete is: form polycrystalline silicon membrane at least one surface of base material; On at least one polycrystalline silicon membrane, form silicon carbide film layer.
Preferably, form the process of described first rete, particularly as follows: concurrently form polycrystalline silicon membrane on two surfaces of base material, at least one polycrystalline silicon membrane, form silicon carbide film layer; Or form polycrystalline silicon membrane on a wherein surface of base material, on described polycrystalline silicon membrane, form silicon carbide film layer.
Preferably, described formation silicon carbide film layer, specifically include: utilize laser-induced chemical gas-phase deposition to form described silicon carbide film layer.
In concrete preparation process, it is possible to select suitable membrane structure according to demand, for instance, preparation membrane structure as shown in Figure 2. First, it is provided that a base material, described base material can be transparent flexible parent metal, for instance PET. Then, deposit one layer of non-crystalline silicon on the upper and lower surface of described base material simultaneously, utilize induced with laser or high-temperature annealing process forms polycrystalline silicon membrane; After defining polycrystalline silicon membrane, with noble gases such as argon for carrier, with the mixture containing carbon or derivant for raw material, it is thermal source heating (temperature is 350 DEG C �� 17 DEG C) by laser instrument, utilize the Inert gas molecule absorption to specific wavelength laser, thus causing the laser induced breakdown of gas molecule, thus, utilize pyrolysis, photosensitization and laser-induced chemical vapour deposition mode to form silicon carbide film layer. By above induced with laser chemical vapor deposition mode, can accurately control the response magnitude of polysilicon and carbon raw material, and, described in the purity of silicon carbide film layer that is prepared from is higher, optical transmittance is up to more than 98%, shore intensity, between 7��9, has good intensity and resistance to marring.
Although preferred embodiments of the present invention have been described, but those skilled in the art are once know basic creative concept, then these embodiments can be made other change and amendment. So, claims are intended to be construed to include preferred embodiment and fall into all changes and the amendment of the scope of the invention.
Obviously, the present invention can be carried out various change and modification without deviating from the spirit and scope of the present invention by those skilled in the art. So, if these amendments of the present invention and modification belong within the scope of the claims in the present invention and equivalent technologies thereof, then the present invention is also intended to comprise these change and modification.
Claims (14)
1. a film, it is characterised in that including: base material; It is arranged on the first rete of the first surface of described base material, wherein, described first rete includes the first polycrystalline silicon membrane near described base material and the first silicon carbide film layer being positioned on described first polycrystalline silicon membrane away from described base material, and described first polycrystalline silicon membrane has micro-prism structure.
2. film as claimed in claim 1, it is characterised in that also include: be arranged at the second rete of the second surface of described base material, wherein, described second surface and described first surface are oppositely arranged;
Described second rete includes: near the second polycrystalline silicon membrane of described base material.
3. film as claimed in claim 2, it is characterised in that described second rete also includes: be positioned on described second polycrystalline silicon membrane the second silicon carbide film layer away from described base material.
4. film as claimed in claim 3, it is characterised in that described first polycrystalline silicon membrane directly contacts with described first silicon carbide film layer, and described second polycrystalline silicon membrane directly contacts with described second silicon carbide film layer;
Wherein, described first polycrystalline silicon membrane and described second polycrystalline silicon membrane are the micro-prism structure of surface irregularity.
5. the film as described in any one of Claims 1 to 4, it is characterised in that the material of described base material is transparent with machine polymer.
6. a display floater, it is characterised in that include the film as described in any one of Claims 1 to 5.
7. display floater as claimed in claim 6, it is characterised in that described display floater also includes:
First substrate;
The second substrate being oppositely arranged with first substrate;
Wherein, described film is arranged at outside described first substrate.
8. display floater as claimed in claim 7, it is characterised in that described display floater also includes: be arranged on the polaroid between described film and described first substrate.
9. display floater as claimed in claim 7, it is characterised in that described display floater also includes: be arranged on the liquid crystal layer between described first substrate and described second substrate, or, it is arranged on the luminescent device on described second substrate.
10. display floater as claimed in claim 6, it is characterised in that described display floater also includes: touch screen.
11. a display device, it is characterised in that include the display floater as described in any one of claim 6��10.
12. the method preparing film, it is characterised in that including:
One base material is provided;
A rete is formed at least one surface of described base material;
Wherein, the process forming described rete is:
Form polycrystalline silicon membrane at least one surface of base material, described polycrystalline silicon membrane has micro-prism structure;
On at least one polycrystalline silicon membrane, form silicon carbide film layer.
13. method as claimed in claim 12, it is characterised in that form the process of described rete, particularly as follows:
Concurrently form polycrystalline silicon membrane on two surfaces of base material, at least one polycrystalline silicon membrane, form silicon carbide film layer; Or
Form polycrystalline silicon membrane on a wherein surface of base material, on described polycrystalline silicon membrane, form silicon carbide film layer.
14. the method as described in claim 12 or 13, it is characterised in that described formation silicon carbide film layer, specifically include: utilize laser-induced chemical gas-phase deposition to form described silicon carbide film layer.
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| CN201410188019.3A CN103978746B (en) | 2014-05-06 | 2014-05-06 | A kind of film and preparation method thereof, display floater and display device |
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Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101866956A (en) * | 2009-04-16 | 2010-10-20 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Anti-reflective film and preparation method thereof |
| CN103294237A (en) * | 2012-03-01 | 2013-09-11 | 上海天马微电子有限公司 | Touch panel, touch liquid crystal display panel and forming method thereof |
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| JPS6149416A (en) * | 1984-08-17 | 1986-03-11 | Hoxan Corp | Coating method of carbon tray for manufacturing polycrystalline silicon wafer |
| JPH03109718A (en) * | 1989-09-25 | 1991-05-09 | Kyocera Corp | Manufacture of single crystalline semiconductor thin film |
| TW468053B (en) * | 1999-12-14 | 2001-12-11 | Nissan Chemical Ind Ltd | Antireflection film, process for forming the antireflection film, and antireflection glass |
| JP5250321B2 (en) * | 2008-07-04 | 2013-07-31 | 昭和電工株式会社 | Method for producing seed crystal for silicon carbide single crystal growth and method for producing silicon carbide single crystal |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101866956A (en) * | 2009-04-16 | 2010-10-20 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Anti-reflective film and preparation method thereof |
| CN103294237A (en) * | 2012-03-01 | 2013-09-11 | 上海天马微电子有限公司 | Touch panel, touch liquid crystal display panel and forming method thereof |
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