CN103934747A - Method for grinding glass substrate, method for manufacturing glass substrate, and grinding device - Google Patents
Method for grinding glass substrate, method for manufacturing glass substrate, and grinding device Download PDFInfo
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- CN103934747A CN103934747A CN201410027681.0A CN201410027681A CN103934747A CN 103934747 A CN103934747 A CN 103934747A CN 201410027681 A CN201410027681 A CN 201410027681A CN 103934747 A CN103934747 A CN 103934747A
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- Prior art keywords
- abradant surface
- glass substrate
- grinding
- motor
- electric power
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
- B24B37/07—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool
- B24B37/08—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for double side lapping
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/005—Control means for lapping machines or devices
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- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Surface Treatment Of Glass (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
Abstract
The invention relates to a method for grinding a glass substrate, a method for manufacturing a glass substrate, and a grinding device. The method for grinding the glass substrate and the grinding device capable of obtaining the glass substrate excellent in parallelism are provided. The method for grinding the glass substrate is characterized in that the grinding conditions of the glass substrates are controlled based on electric power or detection values of current of a motor which changes positions of the plurality of glass substrates butt joint with grinding surfaces of a flat panel of the grinding device, so that difference among grinding speeds of the grinding surfaces is reduced. The grinding device comprises the flat panel having the grinding surfaces, a holding member for holding the plurality of glass substrates to be grinded by the grinding surfaces, the motor which changes relative positions of the grinding surfaces and the holding member, and a control part which controls the grinding conditions of the glass substrates based on the electric power or detection values of current of the motor in order to reduce grinding speed difference of the grinding surfaces.
Description
Technical field
The present invention relates to the technology of grinding glass substrate accurately.
Background technology
Such as, requiring, in the glass substrate product of high manufacturing accuracy (glass substrate, photomask glass substrate etc. for magnetic recording medium), to seek the technology of utilizing lapping device to grind accurately glass substrate.As the prior art document relevant to the technology of utilizing lapping device to grind accurately glass substrate, for example, propose to have patent documentation 1.
[patent documentation 1] TOHKEMY 2004-345018 communique
Summary of the invention
But, exist and utilize prior art cannot meet the strict situation that requires benchmark for grinding precision in recent years.The object of the present invention is to provide Ginding process and manufacture method and the lapping device of the glass substrate of the glass substrate that can obtain depth of parallelism excellence.
In order to reach above-mentioned purpose, the invention provides a kind of Ginding process of glass substrate and there is the manufacture method of the glass substrate of the grinding step that uses this Ginding process, the Ginding process of above-mentioned glass substrate is characterised in that, based on making and the electric power of motor or the detected value of electric current of the change in location of multiple glass substrates of the dull and stereotyped abradant surface butt of lapping device, grinding condition to above-mentioned glass substrate is controlled, and to make, in above-mentioned abradant surface, grinding rate is poor diminishes.
And, in order to reach above-mentioned purpose, the invention provides a kind of lapping device,
This lapping device possesses:
Flat board, this flat board has abradant surface;
Keeper, this keeper can keep multiple glass substrates that will utilize above-mentioned abradant surface to grind;
Motor, this motor changes the relative position between above-mentioned abradant surface and above-mentioned keeper; And
Control part, the electric power of this control part based on said motor or the detected value of electric current are controlled the grinding condition of above-mentioned glass substrate, and to make, in above-mentioned abradant surface, grinding rate is poor diminishes.
In addition, grinding rate is poor poor equivalent in meaning with abrasive power.What grinding rate poor (abrasive power is poor) was maximum grinding rate (abrasive power) in abradant surface with minimum grinding rate (abrasive power) is poor.
According to the present invention, can obtain the glass substrate of depth of parallelism excellence.
Brief description of the drawings
Fig. 1 is the stereogram of magnetic recording medium glass substrate.
Fig. 2 is the sectional block diagram of magnetic recording medium glass substrate.
Fig. 3 is the sketch of double-side polishing apparatus.
Fig. 4 is sketch position, keeper that the retaining hole that keeps magnetic recording medium glass substrate is shown.
Fig. 5 be the abradant surface of upper flat plate of schematically illustrated double-side polishing apparatus when two of glass substrate principal planes are ground simultaneously and the abradant surface of lower flat board be shaped as D1 < D2 time the cutaway view of shape.
Fig. 6 be the abradant surface of upper flat plate of schematically illustrated double-side polishing apparatus when two of glass substrate principal planes are ground simultaneously and the abradant surface of lower flat board be shaped as D1 > D2 time the cutaway view of shape.
Fig. 7 is the example that the chart of the relation between electric power and the abradant surface shape of motor is shown.
Fig. 8 is the block diagram of the configuration example of double-side polishing apparatus.
Label declaration:
10: magnetic recording medium glass substrate; 20: double-side polishing apparatus; 21,22,23,24: motor; 25: lapping liquid feeder; 26: grinding pressure adjusting device; 27: motor state detection sensor; 30: the abradant surface of upper flat plate; 40: lower dull and stereotyped abradant surface; 50: keeper; 60: interior Zhou Duan; 70: outer circumference end; 90: control part; 101: principal plane; 102: inner circumferential side face; 103: circumferential lateral surface; 104: interior all chamfered section; 105: periphery chamfered section; 201: upper flat plate; 202: lower dull and stereotyped; 203: sun gear; 204: internal gear; 501: glass substrate retaining hole; 501A: internal side diameter retaining hole; 501B: pars intermedia retaining hole; 501C: outside diameter retaining hole.
Detailed description of the invention
Below to describing for implementing embodiments of the present invention, but the present invention is not limited to following recorded embodiment.
First, the stereogram of glass substrate 10 for magnetic recording medium shown in Fig. 1, shown in Fig. 2, dissect magnetic recording medium glass substrate 10 and sectional block diagram.In Fig. 1 and Fig. 2, each label represents respectively principal plane 101, inner circumferential side face 102, circumferential lateral surface 103, interior all chamfered section 104, the periphery chamfered section 105 of magnetic recording medium glass substrate 10.In Fig. 2, A1 and A6 represent the thickness of slab in the outside diameter region (regions of circumferential lateral surface 103 sides) of magnetic recording medium glass substrate 10.A2 and A5 represent the thickness of slab of the zone line (region being clipped by the region of circumferential lateral surface 103 sides and the region of inner circumferential side face 102 sides) of magnetic recording medium glass substrate 10.A3 and A4 represent the thickness of slab in the internal side diameter region (regions of inner circumferential side face 102 sides) of magnetic recording medium glass substrate 10.
The depth of parallelism as magnetic recording medium with two principal planes of glass substrate, magnetic recording medium is for example, with the thickness of slab (A1～A6) in each region of glass substrate better, and the thickness of slab more inhomogeneous (thickness deviation is large) in each region is poorer.
Fig. 3 is the sketch of double-side polishing apparatus 20.In Fig. 3,10 represent magnetic recording medium glass substrate, the abradant surface of 30 expression upper flat plates, and 40 represent lower dull and stereotyped abradant surface, and 50 represent keepers, and 201 represent upper flat plate, and 202 expressions are lower dull and stereotyped, and 203 represent sun gears, and 204 represent internal gear.
Magnetic recording medium is clamped between the abradant surface 30 of upper flat plate and the abradant surface 40 of lower flat board under the state of glass substrate retaining hole that is held in keeper 50 with glass substrate 10.The abradant surface 40 of the abradant surface of upper flat plate 30 and lower flat board is being pressed on mutually under the state of two principal planes of glass substrate, two principal planes towards glass substrate are supplied with lapping liquid, and glass substrate and abradant surface relatively move, two principal planes of glass substrate are polished simultaneously.
For double-side polishing apparatus 20, by sun gear 203 and internal gear 204 are rotarilyd actuate with the rotation ratio of regulation respectively, make the mode that keeper 50 revolves round the sun with one side rotation around sun gear 203 move (planetary drive) on one side.Double-side polishing apparatus 20 carries out planetary drive, and upper flat plate 201 and lower dull and stereotyped 202 is rotarilyd actuate with rotating speed separately, and two of glass substrate principal planes are ground simultaneously.
Be equipped with grinding pad in upper flat plate 201 and lower dull and stereotyped 202 with the opposed face of glass substrate.For the abradant surface 40 of the abradant surface of upper flat plate 30 and lower flat board being formed as respectively to the shape of regulation, use dressing tool to implement finishing processing to being assemblied in upper flat plate 201 and lower dull and stereotyped 202 grinding pad.Finishing is processed and is carried out in the following manner: towards supplying with finishing water between dressing tool and grinding pad, and dressing tool and grinding pad are relatively moved, thereby the surface to grinding pad (becoming the abradant surface 30 of upper flat plate and the face of the abradant surface 40 of lower flat board) cut.
The sketch of the keeper 50 using in the manufacturing process with glass substrate at magnetic recording medium shown in Fig. 4.In figure, 50 represent keeper, and 501 represent glass substrate retaining hole.Glass substrate retaining hole 501 comprises internal side diameter retaining hole 501A, pars intermedia retaining hole 501B and outside diameter retaining hole 501C.Be held in glass substrate at magnetic recording medium under the state of glass substrate retaining hole 501 of keeper 50, two principal planes of glass substrate are polished simultaneously.In the time that glass substrate is ground, can be not yet at all glass substrate retaining holes 501 placing glass substrates of keeper 50.And the quantity of the glass substrate retaining hole 501 of keeper 50 can be set arbitrarily.
The glass substrate retaining hole 501 of keeper 50 is formed as the concentric circles centered by the central authorities of keeper 50.In the time using double-side polishing apparatus 20 to grind glass substrate, maintain keeper 50 revolution around sun gear 203 on one side of rotation on one side (planetary drive) of glass substrate.The peripheral speed of the glass substrate that therefore, grind is according to the maintained position of institute on keeper 50 and difference.
In the time utilizing double-side polishing apparatus 20 to grind glass substrate, for the relative velocity between glass substrate and abradant surface, when interior week with glass substrate by abradant surface is distolateral compared with, relative velocity when glass substrate is distolateral by periphery is fast.In the time that the relative velocity between glass substrate and abradant surface is fast, the grinding rate of the glass substrate grinding uprises (grinding quantitative change many), in the time that the relative velocity between glass substrate and abradant surface is slow, the grinding rate step-down (amount of grinding tails off) of the glass substrate that grind.
Using double-side polishing apparatus 20 to carry out in grinding situation glass substrate, need to suppress the deviation of the amount of grinding in keeper 50, make the thickness of slab, the depth of parallelism that are maintained between internal side diameter retaining hole 501A and the glass substrate of outside diameter retaining hole 501C not produce deviation.
In the time utilizing double-side polishing apparatus 20 to grind glass substrate, in order to obtain the glass substrate 10 for magnetic recording medium of depth of parallelism excellence, for example, when the state on supposition grinding pad surface (abradant surface) is in abradant surface evenly time, be preferably formed as the close abradant surface shape in the abradant surface 30 of the upper flat plate inner side parallel or slight with the abradant surface 40 of lower flat board, more preferably slight inner side is close.
Grinding rate is for example represented by the formula of " coefficient of friction × grinding pressure × relative velocity on grinding rate=grinding pad surface (abradant surface) ".Interior week of abradant surface, distolateral relative velocity was lower than the distolateral relative velocity of the periphery of abradant surface.Therefore, obtain the glass substrate of depth of parallelism excellence in order to make being evenly distributed of grinding rate in abradant surface, more than distolateral " coefficient of friction × grinding pressure " of periphery that preferably distolateral " coefficient of friction × grinding pressure " of interior week of abradant surface is abradant surface.
Fig. 5 is the cutaway view of the shape of the abradant surface of schematically illustrated D1 < D2, be illustrated in and interior week hold the distance between the abradant surface 30 of 60 side upper flat plates and the abradant surface 40 of lower flat board short, hold the abradant surface shape of the powerful close inner side of 60 sides near state interior week.D represents the distance between the abradant surface 30 of upper flat plate and the abradant surface 40 of lower flat board of any position in abradant surface.D1 represents the distance between the interior all abradant surface 30 of upper flat plate and abradant surfaces 40 of lower flat board of holding 60 sides.D2 represents the distance between the abradant surface 30 of upper flat plate and the abradant surface 40 of lower flat board of outer circumference end 70 sides.
For example can carry out the distance B between the abradant surface 30 of instrumentation upper flat plate and the abradant surface 40 of lower flat board with vortex flow extensometer.The abradant surface 30 of upper flat plate locate and abradant surface 30 and the abradant surface 40 of lower flat board of the immediate position instrumentation upper flat plate that locates of the abradant surface 40 of lower flat board between distance B.For example, by from the abradant surface 30 of upper flat plate locate with respect to the abradant surface 40 of the flat board position of vertically hanging down be made as the locating of abradant surface 40 of lower flat board.
In order to obtain the glass substrate 10 for magnetic recording medium of depth of parallelism excellence, need to be formed as making the abradant surface 30 inner side close state parallel or slight with the abradant surface 40 of lower flat board of upper flat plate, for example, preferably D2-D1 is made as to 0～+ 30 μ m, more preferably be made as 0～+ 25 μ m, be further preferably made as 0～+ 20 μ m.
At abradant surface for example, in excessive inner side in the situation (situations of exceed+30 μ m of D2-D1) near state, hold 60 sides in interior week, the abradant surface 30 of upper flat plate is crossed butt doughtily with the abradant surface of lower flat board 40, interior week, the distolateral abrasive power abrasive power distolateral with respect to periphery became excessive, and the abrasive power in abradant surface distributes and becomes inhomogeneous.Therefore, in the time that the close abradant surface shape in the inner side with excessive is ground glass substrate, amount of grinding between the glass substrate that have amount of grinding between the each region in the principal plane of glass substrate, grinds in same batch becomes inhomogeneous, is difficult to the worry of the magnetic recording medium glass substrate 10 that obtains depth of parallelism excellence.
In addition, the glass substrate grinding in same batch refers to and uses same lapping device to carry out multiple glass substrates of attrition process simultaneously.
On the other hand, Fig. 6 is the cutaway view of the shape of the abradant surface of schematically illustrated D1 > D2, be illustrated in distance between the abradant surface 30 of outer circumference end 70 side upper flat plates and the abradant surface 40 of lower flat board short, the powerful close outside of outer circumference end 70 sides is near the abradant surface shape under state.
In the situation (D2-D1 is less than 0 μ m(for example-20 μ situation m)) of in the close abradant surface shape in the powerful close outside of outer circumference end 70 sides, glass substrate being ground at the abradant surface 30 with upper flat plate and the abradant surface 40 of lower flat board, uprise in outer circumference end 70 sides of abradant surface for the load of the attrition process of glass substrate.Therefore, for the glass substrate that will grind, when outer circumference end 70 side by abradant surface, grinding rate accelerates, and grinds quantitative change many.
In the time glass substrate being ground with the close abradant surface shape in outside, in the time that glass substrate passes through outer circumference end 70 side of abradant surface, the load of attrition process is high, and the relative velocity between glass substrate and grinding pad also accelerates.Thus, compared with the amount of grinding of the glass substrate keeping with internal side diameter retaining hole 501A by keeper 50, the grinding quantitative change of the glass substrate being kept by the outside diameter retaining hole 501C in keeper 50 is many.Therefore, in the time glass substrate being ground with the close abradant surface shape in outside, amount of grinding between the glass substrate that have amount of grinding between the each region in the principal plane of glass substrate, grinds in same batch becomes inhomogeneous, is difficult to the worry of the magnetic recording medium glass substrate 10 that obtains depth of parallelism excellence.
But in the time using lapping device to grind glass substrate, due to the heating in grinding, plate temperature changes.If plate temperature changes, dull and stereotyped because of temperature expansion Volume Changes, writing board shape distortion, produces warpage (bending) at dull and stereotyped abradant surface.If abradant surface warpage in process of lapping, can cause large impact to the machining accuracy of glass substrate.By abradant surface warpage in process of lapping, the butt state variation between abradant surface and glass substrate, therefore, the grinding pressure in abradant surface distributes and produces deviation, produces the deviation (deviation of amount of grinding) of grinding rate in abradant surface.
In embodiments of the present invention, utilize abradant surface and and multiple glass substrates of this abradant surface butt between butt state there is this point of dependency relation with electric power or the electric current of motor of the change in location that makes the plurality of glass substrate.
Fig. 7 be abradant surface to representing double-side polishing apparatus 20 and and multiple glass substrates of this abradant surface butt between butt state describe with the measured data that makes the dependency relation between the electric power of motor of the change in location of the plurality of glass substrate and must an example of chart.The D2-D1 of the transverse axis of each chart represents the butt state between abradant surface and glass substrate, D2-D1 on the occasion of time represent that inner side is near state (with reference to Fig. 5), D2-D1 represents while being negative value that outside is near state (with reference to Fig. 6).The longitudinal axis of Fig. 7 (a) represents the electric power that the motor of lower dull and stereotyped 202 rotations is consumed.The electric power that the motor that the longitudinal axis of Fig. 7 (b) represents upper flat plate 201 is rotated consumes.The electric power that the motor that the longitudinal axis of Fig. 7 (c) represents internal gear 204 is rotated consumes.The electric power that the motor that the longitudinal axis of Fig. 7 (d) represents sun gear 203 is rotated consumes.Below, electric power motor being consumed is called " power consumption of motor ".
Be inner side close in the situation that at abradant surface, the power consumption of each motor that lower flat board, upper flat plate and sun gear are used have along with between upper flat plate and lower flat board interior week end 60 sides distance B 1 narrow (for example along with at abradant surface interior week end 60 side grinding pressures or grinding rate uprise) and the tendency that declines.On the other hand, be outside close in the situation that at abradant surface, the power consumption of each motor that lower flat board, upper flat plate or sun gear are used has along with the distance B 2 of outer circumference end 70 sides between upper flat plate and lower flat board narrows (for example, along with outer circumference end 70 side grinding pressures or grinding rate at abradant surface uprise) and the tendency that rises.The current sinking of each motor that lower flat board, upper flat plate and sun gear are used also has identical tendency.
On the other hand, be inner side close in the situation that at abradant surface, the power consumption of the motor that internal gear is used have along with between upper flat plate and lower flat board interior week end 60 sides distance B 1 narrow (for example along with at abradant surface interior week end 60 side grinding pressures or grinding rate uprise) and the tendency that rises.On the other hand, be outside close in the situation that at abradant surface, the power consumption of the motor that internal gear is used has along with the distance B 2 of outer circumference end 70 sides between upper flat plate and lower flat board narrows (for example, along with outer circumference end 70 side grinding pressures or grinding rate at abradant surface uprise) and the tendency that declines.The current sinking of the motor that internal gear is used also has identical tendency.
Thereby, the big or small detected value of the electric power of motor that can be based on the position of glass substrate is changed in abradant surface or electric current judge abradant surface be the inner side of which kind of degree near state or the outside of which kind of degree near state.And, can judge that whether the abradant surface of upper flat plate and the abradant surface of lower flat board be parallel.
In embodiments of the present invention, the electric power of at least one said motor or the movement of electric current during glass substrate is ground monitor, use this supervision result to judge the distribution of abrasive power (grinding rate) in abradant surface.And then grinding rate poor diminish of distolateral and periphery of interior week of the abradant surface on one side according to this result of determination, grinding condition being controlled to make to grind between distolateral, grinds glass substrate on one side.Thus, the deviation of the grinding rate in abradant surface (amount of grinding) is suppressed.
The grinding rate of distolateral and periphery of interior week of the grinding rate poor abradant surface that can be upper flat plate of distolateral and periphery of interior week of abradant surface between distolateral between distolateral poor can be also the poor of the grinding rate of distolateral and periphery of interior week of abradant surface of lower flat board between distolateral.And the grinding rate of distolateral and periphery of interior week of abradant surface between distolateral is poor can be also abradant surface and the grinding rate sum of the grinding rate sum of the abradant surface of lower flat board and the distolateral abradant surface of upper flat plate of periphery and the abradant surface of lower flat board poor of distolateral upper flat plate of interior week.
Fig. 8 is the block diagram that the configuration example of double-side polishing apparatus 20 is shown.Double-side polishing apparatus 20 possesses drive division, and this drive division has the multiple CD-ROM drive motors that make upper flat plate 201 rotations such as grade.Motor 21 is CD-ROM drive motors that upper flat plate 201 is rotated.Motor 22 is the CD-ROM drive motors that make lower dull and stereotyped 202 rotations.Motor 23 is CD-ROM drive motors that the sun gear 203 with the external tooth engaging with the periphery of keeper 50 is rotated.Motor 24 is CD-ROM drive motors that the internal gear 204 with the internal tooth engaging with the periphery of keeper 50 is rotated.According to from the control signal of control part 90, said motor being controlled, thereby the relative position between abradant surface and keeper 50 is changed.When the driving by motor and when the change in location of keeper 50, the position of the glass substrate being kept by keeper 50 also changes in abradant surface.
Utilize motor state detection sensor 27 to detect motor 21～24 electric power or electric current separately.Motor state detection sensor 27 for example comprises current detection sensor, the rotating speed detecting sensor that the rotating speed of motor 21～24 is detected etc. that the load current to flowing through motor 21～24 detects.Motor state detection sensor 27 is exported the power consumption that consumes respectively at motor 21～24 or the detected value of current sinking to control part 90.Control part 90 also can the sensor signal based on exporting from motor state detection sensor 27 calculates the power consumption that consumes respectively at motor 21～24 or the detected value of current sinking.
Control part 90 based in motor 21～24 at least one electric power or the detected value of electric current the grinding condition of glass substrate is controlled, so that the abrasive power poor (grinding rate poor) of distolateral and periphery of interior week of abradant surface between distolateral diminished.Control part 90 also can based in motor 21～24 at least one electric power or the detected value of electric current the grinding condition of glass substrate is controlled, become even so that grinding rate in abradant surface is distributed.Control part 90 also can based in motor 21～24 at least one electric power or the detected value of electric current the grinding condition of glass substrate is controlled, to make distance between the abradant surface of upper flat plate and the abradant surface of the lower flat board any part in abradant surface all become impartial.The grinding condition of glass substrate is for example the load of lapping liquid temperature, lapping liquid flow, dull and stereotyped rotating speed, attrition process etc.
Control part 90 is for example by controlling temperature and the flow of the lapping liquid of supplying with from lapping liquid feeder 25 to forming the temperature adjustment device of lapping liquid feeder 25 and the action of pump.Control part 90 is for example by the rotary actuation of motor 21 being controlled to the rotating speed of upper flat plate 201, and by the rotary actuation of motor 22 being controlled to lower dull and stereotyped 202 rotating speed.Control part 90 for example puts on the increase and decrease of the load of the attrition process of the glass substrate being kept by keeper 50 by the action of the cylinder body that forms grinding pressure adjusting device 26 being controlled to the abradant surface 30 of upper flat plate.As the concrete example of control part 90, can enumerate the computer that possesses CPU.
For example, (friction) producing when grinding because of by glass substrate is dull and stereotyped while being out of shape in the mode of warpage thereby the dull and stereotyped abradant surface of heat expands, the situation of holding the distance B 1 between the abradant surface 30 of upper flat plate and the abradant surface 40 of lower flat board of 60 sides to narrow in existing in week.In this case, in interior all ends 60 sides of dull and stereotyped abradant surface, grinding rate uprises (state that inner side is close).
Therefore, control part 90 is judged in the close state in inner side (especially excessive inner side is near state) at the detected value that uses motor, carry out abradant surface to carry out cooling control, the warpage of the caused flat board of abradant surface expanding to make Yin Re is restored.By such control, thereby make Yin Re and the dull and stereotyped abradant surface that expands shrinks dull and stereotyped warpage is restored, distance B 1 is widened thus, therefore, can make the abrasive power poor (grinding rate is poor) that interior week is distolateral and periphery is distolateral in abradant surface even.
As the control method of concrete grinding condition, for example, can enumerate and reduce towards the temperature of the lapping liquid of supplying with in abradant surface, improve towards the flow of the lapping liquid of supplying with in abradant surface; Etc..And control part 90 also can be by reducing upper flat plate 201 and/or lower dull and stereotyped 202 rotating speed, reduce to utilize the load etc. of the attrition process that abradant surface carries out to control grinding condition, thereby carry out cooling to abradant surface.
Or, control part 90 is judged in the close state in inner side (especially excessive inner side is near state) at the detected value that uses motor, also can carry out the control that the face with abradant surface opposition side of flat board is heated, to suppress the warpage of the caused flat board of abradant surface expanding because of heat.By such control, by making the dull and stereotyped surface expansion with abradant surface opposition side that dull and stereotyped warpage is restored, distance B 1 is widened thus, therefore, can make the abrasive power poor (grinding rate is poor) that interior week is distolateral and periphery is distolateral in abradant surface even.
As the control method of concrete grinding condition, for example, can enumerate and make warm braw contact dull and stereotyped face, raising with abradant surface opposition side adjust the water temperature of water or reduce plate temperature the flow of adjusting water at the moving plate temperature of the surface current with abradant surface opposition side of flat board; Etc..
The electric power of any in the motor that lower flat board, upper flat plate and sun gear are used or electric current detect, in the time that in the grinding at glass substrate, this detected value becomes the desired value that is less than regulation, control part 90 is judged the state that abradant surface is close in inner side.Or, also can be formed as: the electric power of any in the motor that lower flat board, upper flat plate and sun gear are used or electric current detect, in the time that in the grinding at glass substrate, this detected value becomes the desired value that is less than regulation, control part 90 judges that the interior week of abradant surface distolateral grinding rate is higher than the distolateral grinding rate of the periphery of abradant surface.In this case, until the electric power of any in the motor that lower flat board, upper flat plate and sun gear are used or the detected value of electric current rise and converge to desired value, control part 90 is controlled grinding condition in the manner described above, the temperature of abradant surface is reduced or temperature rise flat board and face abradant surface opposition side.
On the other hand, in the case of the electric power of motor that internal gear is used or electric current detect, when this detected value in the grinding at glass substrate becomes the desired value of regulation when above, control part 90 is judged the state that abradant surface is close in inner side.Or, also can be formed as: in the case of the electric power of motor that internal gear is used or electric current detect, in the time that in the grinding at glass substrate, this detected value becomes the desired value that is less than regulation, control part 90 judges that the interior week of abradant surface distolateral grinding rate is higher than the distolateral grinding rate of the periphery of abradant surface.In these cases, until the electric power of the motor that internal gear is used or the detected value of electric current decline and converge to desired value, control part 90 is controlled grinding condition in the manner described above, the temperature of abradant surface is reduced or temperature rise flat board and face abradant surface opposition side.
For example, when the detected value of the electric power of the motor of dull and stereotyped use is less than desired value 7.2kW instantly (with reference to Fig. 7 (a)), control part 90 can be judged in inner side near state.And when the detected value of the electric power of the motor of for example using when internal gear exceedes desired value 0.15kW (with reference to Fig. 7 (c)), control part 90 can be judged in inner side near state.
In addition, " desired value " setting also can comprise the meaning that makes desired value have " target zone " of amplitude.For example, can will be set as " target zone " near electric power scope corresponding to state with parallel and slight inner side.For example, in the case of Fig. 7 (a), above 6.6kW 7.2kW can be set as to " target zone " below.
On the other hand, exist the distance B 2 between the abradant surface 30 of upper flat plate and the abradant surface 40 of lower flat board of outer circumference end 70 sides to narrow, the situation (state that outside is close) uprising at the outer circumference end 70 side grinding rates of dull and stereotyped abradant surface.
Therefore, judge that at the detected value that uses motor control part 90 is controlled as follows in the close state in outside: thus abradant surface is heated and makes dull and stereotyped abradant surface side expansion that dull and stereotyped warpage is restored, so that distance B 1 is narrowed.By such control, the grinding rate convergence in distribution in abradant surface, to certain limit, therefore, can suppress the grinding rate deviation in abradant surface.
As the control method of concrete grinding condition, for example, can enumerate and improve towards the temperature of the lapping liquid of supplying with in abradant surface, reduce towards the flow of the lapping liquid of supplying with in abradant surface; Etc..And control part 90 also can be by improving upper flat plate 201 and/or lower dull and stereotyped 202 rotating speed, improve and utilize the load etc. of the attrition process that abradant surface carries out to control grinding condition, abradant surface is heated.
Or control part 90 also can be judged in the close state in outside at the detected value that uses motor, carry out carrying out cooling control to flat board with face abradant surface opposition side, to suppress the warpage of the caused flat board of abradant surface expanding because of heat.By such control, by making face contraction dull and stereotyped and abradant surface opposition side that dull and stereotyped warpage is restored, distance B 2 is widened thus, therefore, can make the abrasive power poor (grinding rate is poor) that interior week is distolateral and periphery is distolateral in abradant surface even.
As the control method of concrete grinding condition, for example can enumerate make cold wind contact dull and stereotyped with the face of abradant surface opposition side, be reduced in the moving plate temperature of the dull and stereotyped surface current with abradant surface opposition side and adjust the water temperature of water or improve plate temperature the flow of adjusting water; Etc..
The electric power of any in the motor that lower flat board, upper flat plate and sun gear are used or electric current detect, when this detected value in the grinding at glass substrate becomes the desired value of regulation when above, control part 90 is judged the state that abradant surface is close in outside.Or, also can be: the electric power of any in the motor that lower flat board, upper flat plate and sun gear are used or electric current detect, when this detected value in the grinding at glass substrate becomes the desired value of regulation when above, control part 90 judges that the distolateral grinding rate of the periphery of abradant surface is higher than distolateral grinding rate of the interior week of abradant surface.In these cases, until the electric power of any in the motor that lower flat board, upper flat plate and sun gear are used or the detected value of electric current decline and converge to desired value, control part 90 is controlled grinding condition in the manner described above, reduces with the temperature rise or temperature flat board and face abradant surface opposition side that make abradant surface.
On the other hand, in the case of the electric power of motor that internal gear is used or electric current detect, in the time that in the grinding at glass substrate, this detected value becomes the desired value that is less than regulation, control part 90 is judged the state that abradant surface is close in outside.Or, also can be: in the case of the electric power of motor that internal gear is used or electric current detect, in the time that in the grinding at glass substrate, this detected value becomes the desired value that is less than regulation, control part 90 judges that the distolateral grinding rate of the periphery of abradant surface is higher than distolateral grinding rate of the interior week of abradant surface.In these cases, until the electric power of the motor that internal gear is used or the detected value of electric current rise and converge to desired value, control part 90 is controlled grinding condition in the manner described above, reduces with the temperature rise or temperature flat board and face abradant surface opposition side that make abradant surface.
For example, when the detected value of the electric power of the motor of dull and stereotyped use exceedes desired value 7.2kW instantly (with reference to Fig. 7 (a)), control part 90 can be judged in outside near state.And for example, when the detected value of the electric power of the motor of using when internal gear is less than desired value 0.15kW (with reference to Fig. 7 (c)), control part 90 can be judged in outside near state.
In addition, " desired value " setting also can comprise the meaning that makes desired value have " target zone " of amplitude.
But, for example, although the electric power of motor (motor of internal gear, sun gear) or the detected value of electric current change according to abradant surface with the butt state of multiple glass substrates of this abradant surface butt, also have dependency relation with the ratio of the frictional force of abradant surface of upper flat plate and the frictional force of the abradant surface of lower flat board.Thereby, the electric power of motor (for example motor of internal gear, sun gear) or the detected value of electric current can be also for example the electric power of the ratio α that utilizes the frictional force of upper and lower abradant surface (=act on the frictional force of the abradant surface of lower flat board/the act on frictional force of the abradant surface of upper flat plate) to the motor being determined by motor state detection sensor 27 or the measured value of electric current revise and value.Revise by the electric power of comparison motor or the measured value of electric current of utilizing such frictional force, can judge accurately the butt state between abradant surface and glass substrate and grinding condition is controlled, therefore, grinding glass substrate more accurately.
Can be also for example: in glass substrate grinds, according to the value of using the electric power of the motor 21 that the rotation of upper flat plate 201 is controlled to obtain divided by the electric power of the motor 22 that lower dull and stereotyped 202 rotation is controlled, obtain the ratio α of frictional force.This be because: the frictional force of abradant surface of the upper flat plate during the electric power of the electric power of motor 21 and motor 22 is ground by glass substrate and the frictional force of the abradant surface of lower flat board reflect.And, for than α, can utilize the sensor (for example rotary-type torque sensor) of regulation to measure upper flat plate 201 and lower dull and stereotyped 202 the moment of torsion of rotation, and obtain according to this torque ratio, the ratio of the temperature of the abradant surface that also can infer out according to the measured value of the surface temperature based on upper flat plate and lower flat board is obtained.
For example, even if grinding rate distribution is identical on the radial direction in abradant surface, the power consumption of the motor that internal gear is used or current sinking also can be because of the ratio α linear change of the frictional force of upper and lower abradant surface.Linear gradient changes according to the condition of the rotating speed of each gear, but generally at the rotating speed of internal gear under the condition faster than the rotating speed of sun gear, has the tendency of the power consumption decline of the motor that internal gear is used in the time that the ratio α of the frictional force of upper and lower abradant surface becomes large.
And the detected value of the electric power of motor can be also the value (electric power is except calculation value Pc) obtaining divided by the total electricity Pb of the specific electric power of CD-ROM drive motor and the electric power of other CD-ROM drive motors different from specific CD-ROM drive motor in above-mentioned multiple motors addition gained with the measured value Pa of the electric power of the specific CD-ROM drive motor in multiple motors.And the detected value of the electric power of motor can be also the value obtaining divided by the electric power of other CD-ROM drive motors different from specific CD-ROM drive motor in above-mentioned multiple motors with the measured value Pa of the electric power of the specific CD-ROM drive motor in multiple motors.And, the detected value of the electric power of motor also can use the detected value of the electric power of the motor from attrition process to deduct not carry out the motor in the idle running running of attrition process electric power detected value and value.Thus, can only take out as detected value grinding needed electric power.
And, the detected value of the electric current of motor can be also with the measured value Ia of the electric current of the specific CD-ROM drive motor in multiple motors divided by the electric current of specific CD-ROM drive motor with in above-mentioned multiple motors with specific CD-ROM drive motor the current summation gained of other different CD-ROM drive motors total current Ib and value (electric current removes calculation value Ic).And the detected value of the electric current of motor can be also the value obtaining divided by the electric power of other CD-ROM drive motors different from specific CD-ROM drive motor in above-mentioned multiple motors with the measured value Ia of the electric current of the specific CD-ROM drive motor in multiple motors.And, the detected value of the electric current of motor also can use the detected value of the electric current of the motor from attrition process to deduct not carry out the motor in the idle running running of attrition process electric current detected value and value.Thus, can only take out as detected value grinding needed electric current.
The electric power of other CD-ROM drive motors or electric current refer at other CD-ROM drive motors their aggregate value be multiple in the situation that.For example, in the case of being set as, specific CD-ROM drive motor motor that internal gear uses, other CD-ROM drive motors can be set as to the motor that lower flat board, upper flat plate and sun gear are used.
Although can change because the mesh obstruction of grinding pad etc. produces grinding rate, thereby cause the electric power of motor or the increase and decrease of the detected value of electric current, by electric power being removed to calculation value Pc or electric current except calculation value Ic is as index, can eliminate this impact., even if the entirety of grinding rate produces variation, identical as long as grinding rate distributes, electric power just can not change except calculation value Ic except calculation value Pc or electric current.
Thereby, judge butt state abradant surface and glass substrate between except calculation value Ic by using electric power except calculation value Pc or electric current, and according to this decision condition, grinding condition is controlled, compared with only using the electric power of specific CD-ROM drive motor or the situation of electric current, grinding glass substrate accurately.
[manufacture method of glass substrate]
Secondly, the Ginding process of the glass substrate in the manufacture method of glass substrate is described as example with the manufacturing process of glass substrate and disk taking magnetic recording medium.
For example, magnetic recording medium comprises following operation with the manufacturing process of glass substrate and disk (example of magnetic recording medium).
(operation 1), by by float glass process (float), melting (fusion) method, pulling method or punching formation, the glass original substrate of moulding is processed into the glass substrate at the round-meshed disc-shape of central portion tool, then internal all sides and circumferential lateral surface are carried out chamfer machining.
(operation 2) side surface part and chamfered section to glass substrate carried out end surface grinding.
(operation 3) used lapping device, supplies with milling liquid on one side on one side the principal plane of glass substrate is ground towards the principal plane of glass substrate.For grinding step, can only carry out 1 time and grind, can carry out grinding for 1 time and grinding for 2 times, also can after 2 times are ground, carry out 3 times and grind.
(operation 4) cleans glass substrate, obtains magnetic recording medium glass substrate.
(operation 5) with forming the films such as magnetosphere on glass substrate, manufactures disk at magnetic recording medium.
In manufacturing process at above-mentioned magnetic recording medium with glass substrate and disk, also can at least one party in the front and back of the operation of (operation 1) or (operation 2) implement the grinding (such as free abrasive grinding, bonded-abrasive grinding etc.) of principal plane.Also can implement the cleaning (inter process cleaning) of glass substrate, the etching (inter process etching) of glass baseplate surface at each inter process.In addition, the grinding of principal plane (such as free abrasive grinding, bonded-abrasive grinding etc.) is the grinding of sensu lato principal plane.
In addition, in the case of requiring high mechanical strength with glass substrate for magnetic recording medium, also can be before grinding step, after grinding step or the top layer that is implemented in glass substrate between grinding step forms the strengthening operation (for example chemical enhanced operation) of strengthening layer.
For example, and magnetic recording medium can be amorphous glass, can be glass ceramics, also can be the tempered glass (chemically reinforced glass) on the top layer of glass substrate with strengthening layer with glass substrate.And, the glass original substrate of glass substrate can by float glass process manufacture, can by fusion method manufacture, can be by pulling method manufacture, also can manufacture by punching formation.
When at the grinding step of (operation 3) or while using the Ginding process of the related glass substrate of present embodiment and lapping device in principal plane being carried out to the grinding step of grinding, on this aspect of glass substrate of excellent in uniformity that can obtain thickness of slab, be favourable.
[embodiment]
[table 1]
Table 1 illustrates and changes the method that the grinding condition of glass substrate is controlled and the result that glass substrate is ground.Example 1～example 4 is results of utilizing the related control method of embodiments of the invention to grind, and example 5 is results of utilizing the related control method of comparative example to grind.
Use the grinding pad of hard polyaminoester system and the lapping liquid (cerium oxide using average grain diameter as approximately 1.3 μ m is as the lapping liquid constituent of principal component) that contains cerium oxide abrasive particle as abrasive article, utilize 22B type double-side polishing apparatus (SpeedFam company system, ProductName: DSM22B-6PV-4MH) to grind upper and lower principal plane.
Example 5 is the electric power that do not use motor (state of the abradant surface of not perception in grinding) and situation that glass substrate is ground.Slurry temperature being remained under the constant state of 33 DEG C, glass substrate is ground.
Example 4 is to use the power value of the motor that internal gear uses to monitor the situation that the state of abradant surface is controlled grinding on one side.The power value of the motor of using at internal gear exceedes the desired value of regulation, judge in inner side near state, reduce the lapping liquid temperature of supplying with towards abradant surface, to abradant surface is carried out cooling and makes the abrasive power distribution (grinding rate distribution) in abradant surface become even.The power value of the motor of using at internal gear is less than the desired value of regulation, judge in outside near state, improve the lapping liquid temperature of supplying with towards abradant surface, to abradant surface is heated and makes the abrasive power distribution (grinding rate distribution) in abradant surface become even.Carry out such control while glass substrate is ground.
Example 3 is to use the ratio α of frictional force to monitor the situation that the state of abradant surface is controlled grinding on one side., the measured value of the electric power of the motor based on utilizing the frictional force of abradant surface of upper flat plate and the ratio α of the frictional force of the abradant surface of lower flat board to use internal gear revise and value (correction value A) judge the state of abradant surface.
In example 3, use by the measured value of the electric power of correction value A=(internal gear motor)-(k
1× α+k
2) and correction value A(k
1, k
2represent coefficient).
As above-mentioned k
1, k
2an example of asking method, under the different state of the ratio α of the upper and lower frictional force of abradant surface, glass substrate is ground.Now, only use the data of (abrasive power is well-distributed) that thickness deviation is little batch, using α as x axle, describe as y axle with the power value of motor using internal gear.Describe to use least square method to obtain near linear for this, the gradient of this straight line is made as to k
1, y intercept is made as to k
2.
The desired value that exceedes regulation at correction value A, judgement near state, reduces the lapping liquid temperature of supplying with towards abradant surface in inner side, to abradant surface is carried out cooling and makes the abrasive power distribution (grinding rate distribution) in abradant surface become even.The desired value that is less than regulation at correction value A, judgement near state, improves the lapping liquid temperature of supplying with towards abradant surface in outside, to abradant surface is heated and makes the abrasive power distribution (grinding rate distribution) in abradant surface become even.Carry out such control while glass substrate is ground.
Example 2 is to use the electric power between the electric power of motor 24 and the total electricity of motor 21～24 that internal gear uses to monitor than β the situation that the state of abradant surface is controlled grinding on one side.The value (correction value B) that uses the electric power of the motor of using with internal gear to obtain divided by total electricity.
The desired value of crossing regulation at correction value B ultrasonic, judgement near state, reduces the lapping liquid temperature of supplying with towards abradant surface in inner side, to abradant surface is carried out cooling and makes the abrasive power distribution (grinding rate distribution) in abradant surface become even.The desired value that is less than regulation at correction value B, judgement near state, improves the lapping liquid temperature of supplying with towards abradant surface in outside, to abradant surface is heated and makes the abrasive power distribution (grinding rate distribution) in abradant surface become even.Carry out such control while glass substrate is ground.
Example 1 is to use electric power than the state of the ratio α supervision abradant surface of β and frictional force while to grinding situation about controlling.Herein, use is carried out revised value (correction value C) by the value (correction value B) that the ratio α of the frictional force of abradant surface of upper flat plate and the frictional force of the abradant surface of lower flat board obtains divided by total electricity the electric power of the motor of using with internal gear.
In example 1,
Use by correction value C=correction value B-(k
1× α+k
2) and correction value C(k
1, k
2represent coefficient).
As above-mentioned k
1, k
2an example of asking method, with the different state of ratio α of the upper and lower frictional force of abradant surface, glass substrate is ground.Now, only use the data of (abrasive power is well-distributed) that thickness deviation is few batch, using α as x axle, describe as y axle using the power value of correction value B.Describe to use least square method to obtain near linear for this, the gradient of this straight line is made as to k
1, y intercept is made as to k
2.
The desired value that exceedes regulation at correction value C, judgement near state, reduces the lapping liquid temperature of supplying with towards abradant surface in inner side, to abradant surface is carried out cooling and makes the abrasive power distribution (grinding rate distribution) in abradant surface become even.The desired value that is less than regulation at correction value C, judgement near state, improves the lapping liquid temperature of supplying with towards abradant surface in outside, to abradant surface is heated and makes the abrasive power distribution (grinding rate distribution) in abradant surface become even.Carry out such control while glass substrate is ground.
The mensuration order of the thickness deviation in same group of table 1 is as described below.
(1) use laser extensometer (KEYENCE company system, laser head is that LK-G15/ amplifier is LK-G3000V) to measure the thickness of slab a of the glass substrate after grinding.
(2) in the region of central part 20mm of using glass substrate apart from magnetic recording medium (pars intermedia in storing, regenerating region), measure position everywhere the total of 0 °, 90 °, 180 °, 270 °.
(3) mean value of the thickness of slab of the position finding everywhere in same glass substrate face is made as to the thickness of slab a of glass substrate.
The mensuration order of the depth of parallelism in same group of table 1 is as described below.
(1) use laser interferometer (FUJINON company system, ProductName: G102S) to measure the depth of parallelism b of the glass substrate after grinding.
(2) observe the interference fringe because forming from the catoptrical phase difference of two principal planes of glass substrate, use interference fringe resolver (FUJINON company system, ProductName: A1) to calculate (automatically calculating) depth of parallelism b.
(3) the storing, regenerating region of the magnetic recording medium use glass substrate that comprises external diameter 65mm, internal diameter 20mm is set in the mensuration region of depth of parallelism b for.In the present embodiment, measuring region sets for apart from the 10.0mm～32.5mm of disc centre portion region.
As shown in the example 1～example 4 of table 1, utilize the deviation of the thickness of slab of (between same group of glass substrate) between the glass substrate of same lapping device simultaneous grinding to be suppressed compared with example 5.And the depth of parallelism (maximum, minimum of a value) of the principal plane of glass substrate also diminishes compared with example 5.
Above, the Ginding process by embodiment example to glass substrate and manufacture method and lapping device are illustrated, but the present invention is not limited to above-mentioned embodiment example.The various distortion such as combination, displacement of part or all of other embodiment example and improvement all comprise within the scope of the invention.
For example, the kind of glass substrate is not limited to magnetic recording medium use, can be also photomask used for optical part etc. with display use, light pickup device, optical light filter, optical lenses etc. such as, liquid crystal or organic EL.
And, also can apply the present invention to glass substrate substrate in addition.As the substrate beyond glass substrate, for example, can enumerate aluminium base for magnetic recording medium, semiconductor silicon substrate etc.
And above-mentioned embodiment is double-side polishing apparatus, but also can apply the present invention to single-sided grinding device.For example, lower flat board can be also the not revolvable flat board of fixing.
Claims (12)
1. a Ginding process for glass substrate, is characterized in that,
Based on making and the electric power of motor or the detected value of electric current of the change in location of multiple glass substrates of the dull and stereotyped abradant surface butt of lapping device, the grinding condition of described glass substrate is controlled, to make, in described abradant surface, grinding rate is poor diminishes.
2. the Ginding process of glass substrate according to claim 1, is characterized in that,
Described abradant surface is formed as having the disc-shape of interior Zhou Duan and outer circumference end,
Based on described detected value, described grinding condition is controlled, to make distolateral and distolateral poor the diminishing of grinding rate of periphery of interior week of described abradant surface.
3. the Ginding process of glass substrate according to claim 2, is characterized in that,
In the case of being judged to be the distolateral grinding rate of the periphery of described abradant surface higher than the interior week of described abradant surface distolateral grinding rate, based on described detected value, described grinding condition is controlled, to improve the temperature of described abradant surface;
In the case of being judged to be interior week of described abradant surface distolateral grinding rate higher than the distolateral grinding rate of the periphery of described abradant surface, based on described detected value, described grinding condition is controlled, to reduce the temperature of described abradant surface.
4. according to the Ginding process of the glass substrate described in any one in claims 1 to 3, it is characterized in that,
Based on described detected value judge described abradant surface and and multiple glass substrates of this abradant surface butt between butt state, and according to this result of determination, described grinding condition is controlled.
5. according to the Ginding process of the glass substrate described in any one in claim 1 to 4, it is characterized in that,
Described lapping device has the abradant surface of upper flat plate and the abradant surface of lower flat board,
Based on described detected value, described grinding condition is controlled, to make the distance between the abradant surface of upper flat plate and the abradant surface of lower flat board become impartial in abradant surface.
6. according to the Ginding process of the glass substrate described in any one in claim 1 to 5, it is characterized in that,
Described lapping device has the abradant surface of upper flat plate and the abradant surface of lower flat board,
Described detected value is to utilize the electric power of the described motor of comparison or the measured value of electric current of the frictional force of abradant surface of upper flat plate and the frictional force of the abradant surface of lower flat board to carry out revised value.
7. according to the Ginding process of the glass substrate described in any one in claim 1 to 6, it is characterized in that,
Described motor is at least one CD-ROM drive motor driving in flat board, sun gear, internal gear.
8. the Ginding process of glass substrate according to claim 7, is characterized in that,
Described detected value is the value obtaining divided by the electric power of the electric power of described specific CD-ROM drive motor and other CD-ROM drive motors different from described specific CD-ROM drive motor in described motor is added the total electricity of gained with the electric power of the specific CD-ROM drive motor in described motor, or the value obtaining divided by the total current of the electric current of described specific CD-ROM drive motor and the current summation gained of described other different CD-ROM drive motors with the electric current of described specific CD-ROM drive motor.
9. the Ginding process of glass substrate according to claim 7, is characterized in that,
Described detected value is the value obtaining divided by the electric power of other CD-ROM drive motors different from described specific CD-ROM drive motor in described motor with the electric power of the specific CD-ROM drive motor in described motor, or the value obtaining divided by the electric current of described other different CD-ROM drive motors with the electric current of described specific CD-ROM drive motor.
10. a manufacture method for glass substrate, is characterized in that,
The manufacture method of described glass substrate has the grinding step of the Ginding process of the glass substrate described in any one in right to use requirement 1 to 9.
The manufacture method of 11. glass substrates according to claim 10, is characterized in that,
Described glass substrate is magnetic recording medium glass substrate.
12. 1 kinds of lapping devices, is characterized in that,
Described lapping device possesses:
Flat board, this flat board has abradant surface;
Keeper, this keeper can keep multiple glass substrates that will utilize described abradant surface to grind;
Motor, this motor changes the relative position between described abradant surface and described keeper; And
Control part, the electric power of this control part based on described motor or the detected value of electric current are controlled the grinding condition of described glass substrate, and to make, in described abradant surface, grinding rate is poor diminishes.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013008782A JP5983422B2 (en) | 2013-01-21 | 2013-01-21 | Glass substrate polishing method and manufacturing method |
| JP2013-008782 | 2013-01-21 |
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| CN103934747A true CN103934747A (en) | 2014-07-23 |
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|---|---|---|---|
| CN201410027681.0A Pending CN103934747A (en) | 2013-01-21 | 2014-01-21 | Method for grinding glass substrate, method for manufacturing glass substrate, and grinding device |
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| Country | Link |
|---|---|
| JP (1) | JP5983422B2 (en) |
| CN (1) | CN103934747A (en) |
| PH (1) | PH12014000029A1 (en) |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06170728A (en) * | 1992-11-30 | 1994-06-21 | Naoetsu Seimitsu Kako Kk | Hard brittle thin plate polishing method |
| JP2004141984A (en) * | 2002-10-22 | 2004-05-20 | Hoya Corp | Method for manufacturing substrate for mask blanks |
| JP2004306173A (en) * | 2003-04-03 | 2004-11-04 | Sharp Corp | Substrate polishing device |
| JP5454180B2 (en) * | 2010-02-02 | 2014-03-26 | 旭硝子株式会社 | Manufacturing method of glass substrate for magnetic recording medium and glass substrate for magnetic recording medium |
-
2013
- 2013-01-21 JP JP2013008782A patent/JP5983422B2/en active Active
-
2014
- 2014-01-21 PH PH12014000029A patent/PH12014000029A1/en unknown
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| CN109414799B (en) * | 2016-07-13 | 2020-12-11 | 胜高股份有限公司 | Double-side grinding device |
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Also Published As
| Publication number | Publication date |
|---|---|
| JP5983422B2 (en) | 2016-08-31 |
| PH12014000029A1 (en) | 2015-07-27 |
| JP2014138973A (en) | 2014-07-31 |
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Application publication date: 20140723 |