CN103728682A - Foam silicon reflecting mirror and manufacturing method thereof - Google Patents
Foam silicon reflecting mirror and manufacturing method thereof Download PDFInfo
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- CN103728682A CN103728682A CN201310412181.4A CN201310412181A CN103728682A CN 103728682 A CN103728682 A CN 103728682A CN 201310412181 A CN201310412181 A CN 201310412181A CN 103728682 A CN103728682 A CN 103728682A
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- Prior art keywords
- foam
- silicon
- coating
- foam silicon
- mirror
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- 239000006260 foam Substances 0.000 title claims abstract description 72
- 229910052710 silicon Inorganic materials 0.000 title claims abstract description 52
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims abstract description 49
- 239000010703 silicon Substances 0.000 title claims abstract description 48
- 238000004519 manufacturing process Methods 0.000 title abstract description 4
- 239000011248 coating agent Substances 0.000 claims abstract description 32
- 238000000576 coating method Methods 0.000 claims abstract description 32
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 claims abstract description 17
- 238000003754 machining Methods 0.000 claims abstract description 6
- 239000000758 substrate Substances 0.000 claims abstract description 6
- 238000000197 pyrolysis Methods 0.000 claims abstract description 3
- 238000002360 preparation method Methods 0.000 claims description 14
- 229910003902 SiCl 4 Inorganic materials 0.000 claims description 10
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 claims description 8
- 238000000034 method Methods 0.000 claims description 8
- 239000007789 gas Substances 0.000 claims description 7
- 238000003763 carbonization Methods 0.000 claims description 6
- 241000662429 Fenerbahce Species 0.000 claims description 4
- 239000013078 crystal Substances 0.000 claims description 4
- 239000000126 substance Substances 0.000 claims description 4
- 238000000280 densification Methods 0.000 claims description 2
- 239000007788 liquid Substances 0.000 claims description 2
- 238000004062 sedimentation Methods 0.000 claims description 2
- 239000007787 solid Substances 0.000 claims description 2
- 238000000151 deposition Methods 0.000 claims 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract 2
- 229910052799 carbon Inorganic materials 0.000 abstract 2
- 229920005830 Polyurethane Foam Polymers 0.000 abstract 1
- 229910003460 diamond Inorganic materials 0.000 abstract 1
- 239000010432 diamond Substances 0.000 abstract 1
- 239000011496 polyurethane foam Substances 0.000 abstract 1
- 239000000463 material Substances 0.000 description 6
- 230000003287 optical effect Effects 0.000 description 6
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 238000013461 design Methods 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 238000002310 reflectometry Methods 0.000 description 4
- 230000003139 buffering effect Effects 0.000 description 3
- 238000007789 sealing Methods 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 2
- 230000006399 behavior Effects 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 235000013871 bee wax Nutrition 0.000 description 1
- 229940092738 beeswax Drugs 0.000 description 1
- 239000012166 beeswax Substances 0.000 description 1
- 229910052790 beryllium Inorganic materials 0.000 description 1
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 description 1
- 230000008033 biological extinction Effects 0.000 description 1
- 239000008358 core component Substances 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 239000005304 optical glass Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000007634 remodeling Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Optical Elements Other Than Lenses (AREA)
Abstract
Provided is a foam silicon reflecting mirror and a manufacturing method of the foam silicon reflecting mirror. The foam silicon reflecting mirror is characterized by comprising a foam silicon blank body and a compact silicon coating attached to the surface of the blank body. The foam silicon blank body is porous foams and adopts carbon foam as a substrate, and a silicon film is attached to the surface of the foam silicon blank body. The thickness of the silicon film is 50 nanometers-20 micrometers. The compact silicon coating is attached to the surface of the blank body, and the thickness of the coating is 0.5-3mm. The mirror surface of the reflecting mirror can be a flat surface or a curved surface. The manufacturing method of the foam silicon reflecting mirror is characterized by sequentially comprising the steps that (1) pyrolysis is carried out on polyurethane foams to prepare the carbon foams; (2) one or more faces of the prepared carbon foams are processed to obtain a needed mirror surface structure; (3) the silicon film is prepared; (4) the surface silicon coating is prepared; (5) the foam silicon with the compact coating attached to the surface is taken out of a siliconization furnace and is machined into the needed mirror surface in a finish machining mode through a diamond, and finally the foam silicon reflecting mirror is obtained.
Description
Technical field
The present invention relates to a kind of catoptron and preparation method thereof, particularly relate to a kind of foam Si mirror and preparation method thereof.
Background technology
Along with the aggravation of space field competition, the each power in the world all drops into a large amount of human and material resources and develops correlation technique.One of Main Function of spacecraft is collection information, therefore the performance of Space Optical System is launched to research significant.Space telescope normally adopts reflective structure design, and wherein principal reflection mirror is the core component of whole optical system.The trend of space telescope principal reflection mirror design is large area, low-gravity, requires reflecting mirror material to have excellent mechanical property and thermophysical property simultaneously.
The Chinese invention patent that publication number is 1576902 a kind of high reflection mirror is provided.This high reflection mirror has high reflectance in visible region, the excellent in te pins of durability of moisture-proof and resistance to salt water etc., and incident angle-dependent little (incident angle of light is difficult to cause the variation of reflectivity).It is on substrate, order with silverskin, low refractive index film, high refractive index film is carried out the high reflection mirror that lamination forms, it is characterized in that, in the contrary side of the substrate of silverskin, form to adhere to and improve film, the extinction coefficient of low-refraction and high refractive index film is all less than or equal to 0.01, and it is that oxidation film Bees Wax is less than or equal to 0.1 that adhesion improves film.
Publication number is that the Chinese invention patent of 102119304A discloses a kind of catoptron.This mirror assembly comprises catoptron and in the face of panel, at catoptron with in the face of between panel, has sealing gas space.Catoptron can be: the catoptron that comprises glass substrate, silver coating and at least one dope layer; Or comprise the catoptron that is bonded to on-chip organic mirror coating.The in the situation that of glass reflector, at least one dope layer is in the face of sealing gas space, and in the case of the catoptron that comprises organic mirror coating, mirror coating is in the face of sealing gas space.
Although can be a lot of for the candidate material of manufacturing optical mirror, consider the severity of space environment, what practical application was many is the materials such as metallic aluminium, metallic beryllium, metallic nickel, optical glass, silicon and silit.For meeting application demand, spacing reflection mirror is towards the trend development of heavy caliber, long-focus, high optical property, Si and SiC material rely on its comprehensive advantage at aspects such as physical characteristics, mechanical property, thermal behaviors, and instead of glass and metal become the main representative of third generation spacing reflection mirror blank of material.
Summary of the invention
The present invention, mainly for Space Optical System, provides a kind of foam Si mirror and preparation method thereof.The density of Si is 2.33, and thermal conductivity is 130, and elastic modulus reaches 155GPa, and the thermal expansivity of room temperature to 1000 ℃ is only 3.1, and more easily processes than SiC, is a kind of elite clone that is suitable for making catoptron.
A kind of foam Si mirror, the fine and close Si coating that it is characterized in that comprising foam silicon idiosome He be attached to idiosome surface.Described foam silicon idiosome is a kind of take carbon foam as substrate, and surface attachment has the open celled foam of Si film, and wherein, the thickness of Si film is 50nm～2 μ m.Foam inside presents tridimensional network, by irregular holes not of uniform size, is cross-linked and is formed, and has large specific surface area, can fill the many kinds of substance of solid, liquid, gas state.In idiosome surface attachment, have fine and close Si coating, coating thickness is 0.5～3mm.
The minute surface of above-mentioned catoptron can be plane, can be also curved surface.
A preparation method for foam Si mirror, is characterized in that comprising the step of following order:
(1), by isocyanurate foam pyrolysis, make carbon foam;
(2) by one or more surfaces mirror surface structure that becomes to need of the carbon Foam machining making;
(3) prepare Si film: finished carbon foam is put into CVI stove, pass into SiCl
4and H
2, control temperature and time, at open celled foam inwall, adhere to certain thickness Si film, finally obtain foam silicon;
(4) preparation of surperficial Si coating: take out foam silicon from CVI stove, put into silication stove, pass into H
2and SiCl
4, SiCl
4at 1100～1300 ℃, pyrolytic goes out Si, and the Si crystal grain decompositing is deposited on foam silicon face, and sedimentation time is 4～20 hours, finally at foam silicon face, adheres to the Si coating of one deck densification;
(5) surface attachment there is is the foam silicon of dense coating take out from silication stove, be finish-machined to needed minute surface with adamas, finally obtain a kind of foam silicon transmitting mirror.
According to above-mentioned preparation method, carbon foam is by isocyanurate foam, to heat carbonization to obtain, and concrete technological process is carried out in two steps: first in air, isocyanurate foam is heated at 200～255 ℃; Then in inert atmosphere, carbonization at 700～900 ℃.
Major advantage of the present invention is: 1. foam silicon structure provides high specific strength, thermal conductivity and very light quality, when maintaining a quite low surface density, can make the optical property of catoptron exceed the transmitting mirror of current glass, pottery and metal; 2. surperficial Si coating is completely fine and close, isotropy, and easily Precision Machining becomes smooth minute surface, and high reflectivity is provided; 3. this mirror structure is simple, easy to prepare, does not need complicated positioning system, has reduced cost; 4. the foam texture of porous can absorb energy, buffering distortion, makes this catoptron have excellent thermal stability and minimum metamorphopsic distortion.
Embodiment
Below in conjunction with specific embodiment, further illustrate the present invention, should understand these embodiment is only not used in and limits the scope of the invention for the present invention is described, after having read the present invention, those skilled in the art all fall within the application's claims to the modification of the various equivalent form of values of the present invention and limit.
Embodiment 1
(1) isocyanurate foam is heated in air atmosphere to 200 ℃, organic substance volatilization, then puts into high-purity argon gas atmosphere and is heated to 800 ℃, and skeleton carbonization obtains carbon foam;
(2) by one or more surfaces mirror surface structure that becomes to need of the carbon Foam machining making;
(3) prepare Si film: finished carbon foam is put into CVI stove, pass into SiCl
4and H
2, control temperature and time, at open celled foam inwall, adhere to the Si film of 100nm thickness, finally obtain foam silicon;
(4) preparation of surperficial Si coating: take out silicon foam from CVI stove, put into silication stove, pass into H
2and SiCl
4, at 1135 ℃, pyrolytic goes out Si, and Si crystal grain is deposited on foam silicon face, controls temperature and time, makes surface obtain the fine and close Si coating that thickness is 1mm.
(5) surface attachment there is is the foam silicon of dense coating take out from silication stove, be finish-machined to needed minute surface with adamas, finally obtain a kind of foam silicon transmitting mirror.
Said method obtains a kind of foam Si mirror, and this catoptron comprises foam silicon idiosome and is attached to the fine and close Si coating on idiosome surface.The porous foam structure of this catoptron inside can absorb energy, buffering distortion, make this catoptron there is excellent thermal stability and minimum metamorphopsic distortion, simultaneously, the easy isotropy of fine and close Si coating on surface, easily processing, when keeping mirror surface density extremely low, reflectivity can increase substantially.
Embodiment 2
(1) isocyanurate foam is heated in air atmosphere to 250 ℃, organic substance volatilization, then puts into high-purity argon gas atmosphere and is heated to 900 ℃, and skeleton carbonization obtains carbon foam;
(2) by one or more surfaces mirror surface structure that becomes to need of the carbon Foam machining making;
(3) prepare Si film: finished carbon foam is put into CVI stove, pass into SiCl
4and H
2, control temperature and time, at open celled foam inwall, adhere to the Si film of 1 μ m thickness, finally obtain foam silicon;
(4) preparation of surperficial Si coating: take out silicon foam from CVI stove, put into silication stove, pass into H
2and SiCl
4, at 1200 ℃, pyrolytic goes out Si, and Si crystal grain is deposited on foam silicon face, controls temperature and time, makes surface obtain the fine and close Si coating that thickness is 2mm.
(5) surface attachment there is is the foam silicon of dense coating take out from silication stove, be finish-machined to needed minute surface with adamas, finally obtain a kind of foam silicon transmitting mirror.
Said method obtains a kind of foam Si mirror, and this catoptron comprises foam silicon idiosome and is attached to the fine and close Si coating on idiosome surface.The porous foam structure of this catoptron inside can absorb energy, buffering distortion, make this catoptron there is excellent thermal stability and minimum metamorphopsic distortion, simultaneously, the easy isotropy of fine and close Si coating on surface, easily processing, when keeping mirror surface density extremely low, reflectivity can increase substantially.
Above are only two embodiments of the present invention, but design concept of the present invention is not limited to this, allly utilizes this design to carry out the change of unsubstantiality to the present invention, all should belong to the behavior of invading the scope of protection of the invention.In every case be the content that does not depart from technical solution of the present invention, any type of simple modification, equivalent variations and the remodeling above embodiment done according to technical spirit of the present invention, still belong to the protection domain of technical solution of the present invention.
Claims (10)
1. a foam Si mirror, the fine and close Si coating that it is characterized in that comprising foam silicon idiosome He be attached to idiosome surface.
2. catoptron according to claim 1, is characterized in that described foam silicon idiosome is a kind of take carbon foam as substrate, and surface attachment has the open celled foam of Si film.
3. foam silicon idiosome according to claim 2, is characterized in that the thickness of described Si film is 50nm～2 μ m.
4. catoptron according to claim 1, is characterized in that described foam silicon idiosome inside presents tridimensional network, has large specific surface area, can fill the many kinds of substance of solid, liquid, gas state.
5. catoptron according to claim 1, is characterized in that described Si coating becomes compact texture, is attached to the surface of foam silicon idiosome, and thickness is 0.5～3mm.
6. catoptron according to claim 1, the minute surface that it is characterized in that catoptron can be plane, can be also curved surface.
7. a preparation method for foam Si mirror, is characterized in that comprising the step of following order:
(1), by isocyanurate foam pyrolysis, make carbon foam;
(2) by one or more surfaces mirror surface structure that becomes to need of the carbon Foam machining making;
(3) prepare Si film: finished carbon foam is put into CVI stove, pass into SiCl
4and H
2, control temperature and time, at open celled foam inwall, adhere to certain thickness Si film, finally obtain foam silicon;
(4) preparation of surperficial Si coating: take out foam silicon from CVI stove, put into silication stove, pass into H
2and SiCl
4, SiCl
4at 1100～1300 ℃, pyrolytic goes out Si, and the Si crystal grain decompositing is deposited on foam silicon face, and sedimentation time is 4～20 hours, finally at foam silicon face, adheres to the Si coating of one deck densification;
(5) surface attachment there is is the foam silicon of dense coating take out from silication stove, be finish-machined to needed minute surface with adamas, finally obtain a kind of foam silicon transmitting mirror.
8. preparation method according to claim 7, is characterized in that described carbon foam is by isocyanurate foam, heat carbonization to obtain, and concrete technological process is carried out in two steps: elder generation heats isocyanurate foam in air, at 200～255 ℃; Then in inert atmosphere, carbonization at 700～900 ℃.
9. preparation method according to claim 7, is characterized in that described Si film is to obtain by the method for CVI.
10. preparation method according to claim 7, is characterized in that described Si coating is to obtain by the method for CVD, and depositing temperature is 1100～1300 ℃, and the time is 4～20 hours.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310412181.4A CN103728682B (en) | 2013-09-11 | 2013-09-11 | Foam silicon reflecting mirror and manufacturing method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310412181.4A CN103728682B (en) | 2013-09-11 | 2013-09-11 | Foam silicon reflecting mirror and manufacturing method thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103728682A true CN103728682A (en) | 2014-04-16 |
| CN103728682B CN103728682B (en) | 2017-02-01 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201310412181.4A Active CN103728682B (en) | 2013-09-11 | 2013-09-11 | Foam silicon reflecting mirror and manufacturing method thereof |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110803694A (en) * | 2019-11-13 | 2020-02-18 | 万华化学集团股份有限公司 | Method for recycling waste polyurethane foam and application thereof |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1988007688A1 (en) * | 1987-04-01 | 1988-10-06 | Hughes Aircraft Company | Lightweight silicon carbide mirror |
| CN101240417A (en) * | 2007-02-05 | 2008-08-13 | 中南大学 | Method for preparing silicon carbide reflecting mirror material and CVI forming device thereof |
-
2013
- 2013-09-11 CN CN201310412181.4A patent/CN103728682B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1988007688A1 (en) * | 1987-04-01 | 1988-10-06 | Hughes Aircraft Company | Lightweight silicon carbide mirror |
| US4856887A (en) * | 1987-04-01 | 1989-08-15 | Hughes Aircraft Company | Lightweight silicon carbide mirror |
| EP0309520B1 (en) * | 1987-04-01 | 1993-04-14 | Hughes Aircraft Company | Lightweight silicon carbide mirror |
| CN101240417A (en) * | 2007-02-05 | 2008-08-13 | 中南大学 | Method for preparing silicon carbide reflecting mirror material and CVI forming device thereof |
Non-Patent Citations (1)
| Title |
|---|
| 韩杰才,等: "《大尺寸轻型SiC光学反射镜研究进展》", 《宇航学报》, vol. 22, no. 6, 30 November 2001 (2001-11-30), pages 130 * |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110803694A (en) * | 2019-11-13 | 2020-02-18 | 万华化学集团股份有限公司 | Method for recycling waste polyurethane foam and application thereof |
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|---|---|
| CN103728682B (en) | 2017-02-01 |
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Address after: 215400 Chengxiang City, Taicang Province town of the People South Road, No. 162, No. Patentee after: TAICANG PAIOU TECHNICAL ADVISORY SERVICE Co.,Ltd. Address before: 215400 people's road, Jiangsu, Taicang Hua Xu apartment C412 Patentee before: TAICANG PAIOU TECHNICAL ADVISORY SERVICE Co.,Ltd. |
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Effective date of registration: 20240715 Address after: 215400 No. 162 Renmin South Road, Chengxiang Town, Taicang, Jiangsu Patentee after: SUZHOU HONGJIU AVIATION HEAT-RESISTANT MATERIAL TECHNOLOGY Co.,Ltd. Country or region after: China Address before: 215400 No. 162 Renmin South Road, Chengxiang Town, Taicang, Jiangsu Patentee before: TAICANG PAIOU TECHNICAL ADVISORY SERVICE Co.,Ltd. Country or region before: China |