CN102866442A - Mg/Zr extreme ultraviolet multilayer film reflector and manufacturing method thereof - Google Patents
Mg/Zr extreme ultraviolet multilayer film reflector and manufacturing method thereof Download PDFInfo
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- CN102866442A CN102866442A CN2011101891334A CN201110189133A CN102866442A CN 102866442 A CN102866442 A CN 102866442A CN 2011101891334 A CN2011101891334 A CN 2011101891334A CN 201110189133 A CN201110189133 A CN 201110189133A CN 102866442 A CN102866442 A CN 102866442A
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Abstract
The invention relates to a Mg/Zr extreme ultraviolet multilayer film reflector and a manufacturing method thereof. A bond coat is plated on an ultrasmooth silicon chip or an ultrasmooth glass substrate; Mg and Zr film layers are alternately plated to form a Mg/Zr period multilayer film; and then B4C is plated on the period multilayer film to form a protection film. Compared with the prior art, the metal Zr with a high melting point and a stable phase state is used as an adsorption layer of the multilayer film; and the manufactured Mg/Zr extreme ultraviolet multilayer film reflector overcomes the defect of poor stability of conventional Mg-based multilayer films such as Mg/SiC and the like. Meanwhile, the Zr has a suitable optical constant in the extreme ultraviolet waveband; and the Mg/Zr extreme ultraviolet multilayer film reflector keeps the excellent optical performance of a Mg-based multilayer film reflector. Therefore, the Mg/Zr multilayer film reflector which gives consideration to the optical performance and the thermal stability is suitable to apply in the extreme ultraviolet waveband with a high working environment temperature, in which the operations of synchronously radiating a light source, observing a space and the like are carried out.
Description
Technical field
The invention belongs to precison optical component and make the field, especially relate to a kind of Mg/Zr multiplayer films in EUV catoptron and preparation method thereof.
Background technology
The extreme ultraviolet astronomical sight is the important means of research solar activity, solar-terrestrial environment, long-range weather forecasting, by the extreme ultraviolet astronomical telescope the important sun spectral lines such as Fe XV (28.4nm) and He II (30.4nm) are carried out imaging, can Real Time Monitoring the sun dynamically and on the impact of the earth.On the other hand, there are many elemental characteristic spectral lines in extreme ultraviolet waveband, and the evaluation of carrying out the elemental characteristic spectral line in the artificial light sourcess such as synchrotron radiation is chemico-analytic important means.And at extreme ultraviolet waveband, various materials all exist absorption and refractive index near 1, and refractive optical system is inapplicable, and adopting multi-layer mirror is modal efficient system as the anisotropy surface system of primary element.Because the L absorption edge of Mg is at 25nm, Mg is the material spacer layer of 25-40nm wave band widespread use, existing Mg/SiC, Mg/Y
2O
3With Mg Quito tunic catoptrons such as Mg/Co, the anisotropy surface rate of actual measurement reaches more than 40%, has shown excellent optical property.In synchrotron radiation light source and space sun observation etc. are used, multi-layer mirror is worked under the irradiation of high light for a long time, reach hundreds of degree centigrade owing to irradiation causes that mirror temperature rises, in these working environments, to require multi-layer mirror in the environment of high temperature, stably to work.Yet the Mg chemical property is active, and fusing point low (650 ℃) is so that it is extremely difficult to promote the thermal stability of Mg Quito tunic catoptron.Present existing Mg/SiC, Mg/Y
2O
3Only can be keeping stable below 200 ℃ with the Mg/Co multi-layer mirror, in the rapid variation of multi-layer film structure more than 200 ℃, optical property sharply descends thereupon.Studies show that, in the Mg/SiC multilayer film, the interface of Mg rete and SiC rete chemical reaction under hot conditions is active, generates MgSi
2, interface quality is descended, cause the optical property variation of Mg/SiC multi-layer mirror.In the Mg/Co multilayer film, the interface of Mg rete and Co rete increases severely 300 degrees centigrade of left and right sides roughness, and interface quality descends and finally causes optical property to descend.Existing Mg Quito tunic catoptron only suitably in the lower application of operating ambient temperature, its thermal stability greatly limited it at synchrotron radiation light source, be used for the application of the key areas such as extreme ultraviolet astronomical telescope of sun imaging.
Summary of the invention
Purpose of the present invention is exactly that propose for the defective that overcomes existing Mg Quito tunic poor heat stability a kind of adopts metallic Z r as Mg/Zr multiplayer films in EUV catoptron of absorption layer and preparation method thereof.
Purpose of the present invention can be achieved through the following technical solutions:
A kind of Mg/Zr multiplayer films in EUV catoptron is characterized in that this catoptron comprises substrate, has stacked gradually prime coat, Mg/Zr periodic multilayer film and protective seam in substrate, and wherein the Mg/Zr periodic multilayer film periodically alternately is coated with by Mg film and Zr film and consists of.
The material of described substrate is monocrystalline silicon piece or glass.
Described prime coat is coated in the substrate, and the material of prime coat is metallic Z r, and thickness is 2-3nm.
Described Mg/Zr periodic multilayer film is coated on the prime coat, and the ground floor that is coated with is the Mg film, and last one deck is the Zr film, and periodicity is 30-40, and the gross thickness of Mg/Zr periodic multilayer film is 450-640nm, and the Mg layer thickness is 0.6-0.8 with the ratio of gross thickness.
Described protective seam is coated on the Mg/Zr periodic multilayer film, and material is B
4C, thickness are 3-5nm.
A kind of method for making of Mg/Zr multiplayer films in EUV catoptron is characterized in that, the method may further comprise the steps:
1) being coated with thickness in the monocrystalline silicon piece of ultra-smooth or substrate of glass is that the Zr rete of 2-3nm is as prime coat;
2) be coated with the Mg/Zr periodic multilayer film that periodicity is 30-40 at prime coat, gross thickness is 460-640nm, and the ground floor that is coated with is the Mg rete, and last one deck is the Zr rete;
3) be coated with the thick B of 3.5-5nm at the Mg/Zr periodic multilayer film
4The C rete can obtain Mg/Zr multiplayer films in EUV catoptron as protective seam.
Described prime coat, Mg/Zr periodic multilayer film and protective seam all adopt magnetically controlled sputter method to be coated with, and pattern is permanent power sputter, and operating air pressure is 1 millitorr.
Described prime coat, the Mg target that Mg/Zr periodic multilayer film and protective seam adopt, Zr target and B
4The purity of C target is 99.5%.
Step 1) base vacuum is better than 8E-5Pa before being coated with prime coat in.
Compared with prior art, Mg/Zr multiplayer films in EUV catoptron of the present invention has been introduced fusing point high (1852 ℃), chemical property and physical property still keep stable metallic Z r as the absorption layer of multilayer film under hot conditions, have solved that the Mg layer diffusion aggravation, fusion and chemical reaction occurs and cause the multilayer film Quality Down finally to cause the problem of optical property variation with absorption layer along with the rising of temperature in the tunic of Mg Quito.Traditional Mg Quito tunic is combined as the master with metal/non-metal, and active Mg layer changes multi-layer film structure along with being easy to non-metallic layer generation chemical reaction in the temperature uphill process, and for example the Mg/SiC multilayer film generates MgSi when high temperature
2, the diffusion of simultaneously rapid Mg layer and SiC layer has destroyed multi-layer film structure, causes optical property sharply to descend.Emerging Mg/Co multilayer film, although aspect the prevention interfacial diffusion very large improvement is being arranged, the transformation in crystal orientation can occur in Co in the temperature uphill process, make multi-layer film structure generation significant change, causes optical property to descend.Therefore, existing Mg Quito tunic, comprise Mg/SiC and Mg/Co etc., because interfacial structure, film layer structure can not keep stable under hot conditions, shown relatively poor thermal stability, can only in being operated in the lower environment of temperature, greatly limit the application of Mg Quito tunic in the key areas such as synchrotron radiation light source, extreme ultraviolet astronomical sight of excellent optical performance.And the Mg/Zr multilayer film is by adopting metallic Z r as the absorption layer material, solved well the thermal stability problems of the application of long-term puzzlement Mg Quito tunic, the Mg/Zr multi-layer mirror still keeping about 300 degrees centigrade with normal temperature under consistent structural and optical properties almost, and below 550 degrees centigrade, although its optical property slightly descends, still can work.
In addition, the optical constant of Zr is suitable at extreme ultraviolet waveband, and the Mg/Zr multi-layer mirror is the same with other Mg Quito tunic catoptrons, has preferably optical property.Therefore, Mg/Zr multiplayer films in EUV catoptron has been taken into account two aspect advantages of optical property and thermal stability, is applicable in the important application such as synchrotron radiation light source and extreme ultraviolet astronomical sight.
Description of drawings
Fig. 1 is the structural representation of Mg/Zr multiplayer films in EUV catoptron;
Fig. 2 is the work schematic diagram of Mg/Zr multiplayer films in EUV catoptron.
Among the figure 1 for substrate, 2 be the Zr prime coat, 3 for the Mg film in the Mg/Zr periodic multilayer film, 4 for the Zr film in the Mg/Zr periodic multilayer film, 5 is the Mg/Zr periodic multilayer film, 6 is B
4The C protective seam, 7 is incident light, 8 is reflected light.
Embodiment
The present invention is described in detail below in conjunction with the drawings and specific embodiments.
Embodiment
A kind of Mg/Zr multiplayer films in EUV catoptron; its structure as shown in Figure 1; this catoptron comprises substrate 1, has stacked gradually prime coat 2, Mg/Zr periodic multilayer film 5 and protective seam 6 in substrate, and wherein the Mg/Zr periodic multilayer film is periodically alternately plated to establish by Mg film and Zr film and consists of.The material of substrate 1 is monocrystalline silicon piece or glass, and it is the monocrystalline silicon piece of (100) that the present embodiment adopts the crystal orientation, and prime coat 2 is coated in the substrate 1, and the material of prime coat 2 is metallic Z r, and thickness is 2-3nm.Be 2nm in the present embodiment.Mg/Zr periodic multilayer film 5 is coated on the prime coat 2, the ground floor that is coated with is Mg film 3, last one deck is Zr film 4, periodicity is 30-40, periodicity in the present embodiment is 40, the gross thickness of Mg/Zr periodic multilayer film 5 is 450-640nm, and the Mg layer thickness is 0.6-0.8 with the ratio of periodic thickness, is 0.8 in the present embodiment.Protective seam 6 is coated on the Mg/Zr periodic multilayer film 5, and material is B
4C, thickness are 3-5nm, and the present embodiment is 4nm.
At first select the monocrystalline silicon piece (crystal orientation for (100)) of ultra-smooth or glass as the substrate 1 of catoptron, roughness of the substrate is 0.3-0.5nm.Then being coated with thickness in substrate is that the Zr rete of 2nm is as prime coat 2.Alternately be coated with Mg rete 3 and Zr rete 4 forming Mg/Zr periodic multilayer film 5 on prime coat 2, periodicity is that the ratio of thickness and the periodic thickness of 40, Mg is 0.8 again, and the ground floor that is coated with in the periodic multilayer film 5 is the Mg layer, and last one deck is the Zr layer.At last be coated with the B that thickness is 4nm at periodic multilayer film
4The C layer can obtain the Mg/Zr multiplayer films in EUV catoptron of excellent performance as protective seam 6.Direct current magnetron sputtering process is all adopted in being coated with of rete, and pattern is constant power type, and operating air pressure is 1 millitorr; rete is coated with front base vacuum and is better than 8E-5 Pascal; the purity that is coated with the target that prime coat, periodic multilayer film and protective seam adopt is Mg (99.5%), Zr (99.5%), B
4C (99.5%).
Fig. 2 is the schematic diagram in the work of Mg/Zr multiplayer films in EUV, and incident light 7 passes through protective seam 6, Mg/Zr periodic multilayer film 5, and prime coat 2 all reflects on each interface, outgoing reflected light 8.The optical constant of Zr is suitable, simultaneously protective seam B
4The absorption of C is smaller, and catoptron can obtain higher reflectivity, shows good optical property.On the other hand, the stable in properties of Zr, and it is stable that the interface of Mg and Zr still can keep under the condition of high temperature, chemical reaction or serious diffusion do not occur, even being heat, light energy conversion causes when temperature rises to below 550 degrees centigrade, the Mg/Zr multilayer film can keep its performance at room temperature, does not affect the normal use of Mg/Zr multi-layer mirror.
The application is not limited to the in detail embodiment of record of the present invention, and those skilled in the art can make to this various distortion or modification.But these distortion or only revise otherwise deviate from spirit of the present invention and intention are still within protection scope of the present invention.
Claims (9)
1. Mg/Zr multiplayer films in EUV catoptron; it is characterized in that; this catoptron comprises substrate (1); stacked gradually prime coat (2), Mg/Zr periodic multilayer film (5) and protective seam (6) in substrate (1), wherein Mg/Zr periodic multilayer film (5) periodically alternately is coated with formation by Mg film (3) and Zr film (4).
2. a kind of Mg/Zr multiplayer films in EUV catoptron according to claim 1 is characterized in that, the material of described substrate (1) is silicon chip or glass.
3. a kind of Mg/Zr multiplayer films in EUV catoptron according to claim 1 is characterized in that, described prime coat (2) is coated in the substrate (1), and the material of prime coat (2) is metallic Z r, and thickness is 2-3nm.
4. a kind of Mg/Zr multiplayer films in EUV catoptron according to claim 1, it is characterized in that, described Mg/Zr periodic multilayer film (5) is coated on the prime coat (2), the ground floor that is coated with is the Mg film, last one deck is the Zr film, and periodicity is 30-40, and the gross thickness of Mg/Zr periodic multilayer film (5) is 450-640nm,, the Mg layer thickness is 0.6-0.8 with the ratio of gross thickness.
5. a kind of Mg/Zr multiplayer films in EUV catoptron according to claim 1 is characterized in that, described protective seam (6) is coated on the Mg/Zr periodic multilayer film (5), and material is B
4C, thickness are 3-5nm.
6. the method for making of a Mg/Zr multiplayer films in EUV catoptron as claimed in claim 1 is characterized in that, the method may further comprise the steps:
1) substrate (1) in silicon chip or glass formation is coated with the prime coat that thickness is 2-3nm (2);
2) be coated with Mg/Zr periodic multilayer film (5) at Zr prime coat (2);
3) be coated with B at Mg/Zr periodic multilayer film (5)
4The C protective seam can obtain Mg/Zr multiplayer films in EUV catoptron.
7. the method for making of a kind of Mg/Zr multiplayer films in EUV catoptron according to claim 6 is characterized in that, described prime coat (2), Mg/Zr periodic multilayer film (5) and protective seam (6) all adopt magnetically controlled sputter method to plate and establish.
8. the method for making of a kind of Mg/Zr multiplayer films in EUV catoptron according to claim 6 is characterized in that, described prime coat (2), Mg target, Zr target and B that Mg/Zr periodic multilayer film (5) and protective seam (6) adopt
4The purity of C target is 99.5%.
9. the method for making of a kind of Mg/Zr multiplayer films in EUV catoptron according to claim 6 is characterized in that step 1) in be coated with the front base vacuum of prime coat (2) and be better than 8E-5Pa.
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| CN2011101891334A CN102866442A (en) | 2011-07-07 | 2011-07-07 | Mg/Zr extreme ultraviolet multilayer film reflector and manufacturing method thereof |
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Cited By (4)
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|---|---|---|---|---|
| CN105698930A (en) * | 2016-02-29 | 2016-06-22 | 苏州宏策光电科技有限公司 | Co-sputtering Mo2C/B4C intraocular lens monochromator and manufacturing method thereof |
| CN109298475A (en) * | 2018-12-06 | 2019-02-01 | 中国工程物理研究院上海激光等离子体研究所 | Cr/C high thermal stability X-ray multi-layer mirror and preparation method thereof |
| CN112159962A (en) * | 2020-09-10 | 2021-01-01 | 同济大学 | Rapid preparation method and application of environment erosion resistant extreme ultraviolet multilayer film surface protective layer |
| CN112684526A (en) * | 2020-12-28 | 2021-04-20 | 中国科学院长春光学精密机械与物理研究所 | Ultra-smooth dual-band reflector and preparation method thereof |
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Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105698930A (en) * | 2016-02-29 | 2016-06-22 | 苏州宏策光电科技有限公司 | Co-sputtering Mo2C/B4C intraocular lens monochromator and manufacturing method thereof |
| CN109298475A (en) * | 2018-12-06 | 2019-02-01 | 中国工程物理研究院上海激光等离子体研究所 | Cr/C high thermal stability X-ray multi-layer mirror and preparation method thereof |
| CN109298475B (en) * | 2018-12-06 | 2021-05-04 | 中国工程物理研究院上海激光等离子体研究所 | Cr/C high-thermal-stability X-ray multilayer film reflecting mirror and preparation method thereof |
| CN112159962A (en) * | 2020-09-10 | 2021-01-01 | 同济大学 | Rapid preparation method and application of environment erosion resistant extreme ultraviolet multilayer film surface protective layer |
| CN112159962B (en) * | 2020-09-10 | 2021-09-03 | 同济大学 | Rapid preparation method and application of environment erosion resistant extreme ultraviolet multilayer film surface protective layer |
| CN112684526A (en) * | 2020-12-28 | 2021-04-20 | 中国科学院长春光学精密机械与物理研究所 | Ultra-smooth dual-band reflector and preparation method thereof |
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Application publication date: 20130109 |