CN103726022A - Heating evaporation source for organic materials - Google Patents
Heating evaporation source for organic materials Download PDFInfo
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- CN103726022A CN103726022A CN201310596167.4A CN201310596167A CN103726022A CN 103726022 A CN103726022 A CN 103726022A CN 201310596167 A CN201310596167 A CN 201310596167A CN 103726022 A CN103726022 A CN 103726022A
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Abstract
The invention discloses a heating evaporation source for organic materials. The heating evaporation source comprises an evaporation chamber as well as a crucible and heaters which are arranged in the evaporation chamber, wherein the heaters comprise a heating wire distributed on the periphery of the crucible, and in addition, the distribution density of the heating wire at the upper part of the crucible is larger than that of the heating wire in the middle and at the lower part of the crucible. According to the heating evaporation source, one heating wire is used, a group of heaters are matched, two heating sections are divided, the heating wire in the middle and at the lower part of the crucible is loosely arranged while the heating wire at the upper part of the crucible is closely arranged, due to the difference of distribution densities of the heating wire in the middle and at the lower part of the crucible as well as at the upper part of the crucible, the upper part of the crucible is at a higher temperature, and The temperature of the upper part of the crucible is higher than that of the bottom of the crucible, so that evaporation materials cannot coagulate at an upper port of the crucible, and the problem of blockage caused by material coagulation is solved; in addition, only one heating wire is needed, so that only one group of heaters are needed, and the cost is lower.
Description
Technical field
The present invention relates to a kind of manufacture craft of AMOLED display screen, relate in particular to a kind of organic materials heating vapor deposition source with stable vaporator rate.
Background technology
Organic materials heating vapor deposition source only configures one group of well heater 22 mostly now, as shown in Figure 1, because the top of crucible 21 has opening, therefore easily heat radiation, cause deposition material easily on crucible 21 tops, to condense, the material condensing in crucible 21 tops can block the evaporation path of the material of crucible 21 bottom evaporations, makes evaporation rate unstable, rear whole mouth of pot of long duration will be blocked completely, and evaporation cannot be continued.
Need to there be stable vaporator rate in desirable vacuum evaporation source, so just can use the gimmick of common evaporation, prepares the OLED device of specific composition, completes the making of AMOLED display screen.Present most organic evaporating source, in the control of evaporation, use automatic PID(proportional-integral-differential) controller, when material condenses and will vaporator rate (Evaporation rate) be reduced at mouth of pot, now vapor deposition source will improve heater temperature, will there be more material evaporation crucible bottom, but also cause more condensation of materials in mouth of pot, after finally stopping up completely, just do not had evaporation speed.But vapor deposition source well heater still continues to increase temperature, in crucible, the space empty a sealing is burnt, may cause material to burn rotten.Until well heater is warming up to quite high temperature, the material that condenses in mouth of pot is also evaporated, now just can there is once again evaporation speed, but due to the suitable high temperature of well heater, so evaporation speed is also very high, does not meet required.
Appeal this kind of vapor deposition source under long-time operation, evaporation speed is fluctuated unstable, is not suitable for volume production condition.
Volume production is used the evaporation source that can stablize evaporation speed now, conventionally there is the more than one well heater of configuration, as shown in Figure 2, first group of well heater 321 controlled crucible 31 tops, second group of well heater 322 controlled in the middle of crucible 31 and bottom, by setting the temperature of well heater 321 and 322, allow the well heater 322 of well heater 321 to the second groups of first group maintain higher temperature, material is not condensed at crucible 31 upper limbs.Though the vapor deposition source of a plurality of well heaters has solved condensation of materials obstructing problem, but need the cost of multiple to purchase more heater systems, while particularly carrying out the production of AMOLED panel, need tens organic heating vapor deposition source, so need expend a large amount of equipment costs.
Summary of the invention
Technical problem to be solved by this invention is to provide a kind ofly can use one group of well heater, at crucible upper limb, still can keep the condition of high temperature, material is not condensed at crucible upper limb, not only solved condensation of materials obstructing problem, do not increase in addition again the organic materials heating vapor deposition source of cost.
For realizing above-mentioned technique effect, the invention discloses a kind of organic materials heating vapor deposition source, comprise an evaporation chamber and be located at crucible and the well heater in described evaporation chamber, described well heater comprises a heater wire, described heater wire is distributed in the periphery of described crucible, and described heater wire is greater than in the middle of described crucible and the distribution density of lower position in the distribution density of described crucible upper position.
The present invention is owing to having adopted above technical scheme, making it have following beneficial effect is: use one group of well heater, be divided into two heating blocks, position heater wire middle at crucible and lower edge is arranged looser, and heater wire arrangement in crucible upper limb position is tightr, see through different arrangement modes between the two and obtain higher temperature by crucible upper limb, allow the temperature of crucible upper limb make material higher than crucible bottom, material is not condensed at crucible upper limb, solved condensation of materials obstructing problem.And because only need to use a heater wire, therefore only needing one group of well heater to realize, cost is lower.
The present invention further improves and is, described well heater also comprises a thermal insulation layer, be used for maintaining heater wire temperature, avoid period immediately after the bereavement of one's parent to lose, with plural pyrolitic boron nitride ring, described thermal insulation layer is sheathed on outside described crucible, the inwall of described thermal insulation layer is provided with plural circular groove groove, described pyrolitic boron nitride ring is individually fixed in described groove, and the distributing position of the corresponding described heater wire of described pyrolitic boron nitride ring offers aperture, described heater wire is arranged in described aperture and then is fixed on described pyrolitic boron nitride ring.
The present invention further improves and is, described evaporation chamber is provided with a vacuum flange for isolated ambient atmosphere, and described well heater is fixed on described vacuum flange by a well heater permanent seat.
The present invention further improves and is, the bottom of described crucible is provided with a temperature detecting mechanism, and for detecting the temperature of described crucible reality, described temperature detecting mechanism comprises:
One thermocouple fixing base, is positioned at the below of described crucible and is fixed on described well heater permanent seat;
One insulating ceramic rod, activity is inserted in described thermocouple fixing base, and the middle part of described insulating ceramic rod is provided with a butting section, and is provided with a return spring between described butting section and described thermocouple fixing base;
One thermopair, described thermopair is arranged at the top of described insulating ceramic rod and is resisted against described crucible.
When thermopair top is pushed down by crucible bottom, thermopair, insulating ceramic rod and thermocouple fixing base be interlock down, can guarantee that thermopair touches crucible bottom, the temperature of detecting crucible reality.
When crucible is taken away, original position is got back on thermopair, insulating ceramic rod and the thermocouple fixing base right side, can avoid thermopair to be heated line impact, guarantees to detect exactly the actual temperature of crucible.
The present invention further improves and is, the bottom of described crucible is provided with a groove, and described thermopair stretches in described groove.Guarantee all to detect when each crucible is put into same crucible position temperature.
The present invention further improves and is, described heater wire adopts refractory metal material to make.
The present invention further improves and is, described well heater comprises a heater electrode, and the first end of described heater electrode connects described heater wire, and the second end of described heater electrode runs through described vacuum flange and links external power source.
The present invention further improves and is, described temperature detecting mechanism comprises a thermopair electrode, and the first end of described thermopair electrode connects described thermopair, and the second end of described thermopair electrode runs through described vacuum flange and links outside temperature monitoring device.
Accompanying drawing explanation
Fig. 1 is a kind of project organization schematic diagram of existing organic materials heating vapor deposition source.
Fig. 2 is the project organization schematic diagram of another kind of existing organic materials heating vapor deposition source.
Fig. 3 is the structural representation of organic materials heating vapor deposition source of the present invention.
Fig. 4 is that organic materials heating vapor deposition source structure of the present invention conceals the heater wire distribution plan after well heater permanent seat and external insulation layer.
Fig. 5 is in organic materials of the present invention heating vapor deposition source in the middle of crucible and the schematic diagram of the pyrolitic boron nitride ring of lower position.
Fig. 6 is the schematic diagram of the pyrolitic boron nitride ring of crucible upper position in organic materials heating vapor deposition source of the present invention.
Fig. 7 is the structural representation of temperature detecting mechanism in organic materials heating vapor deposition source of the present invention.
Fig. 8 is the use view of temperature detecting mechanism in organic materials heating vapor deposition source of the present invention.
Embodiment
Below in conjunction with accompanying drawing and embodiment, the present invention is further detailed explanation.
First consult shown in Fig. 3 and Fig. 4, the invention discloses a kind of organic materials heating vapor deposition source, comprise an evaporation chamber (not shown) and be located at crucible 11 and the well heater in this evaporation chamber, evaporation chamber is provided with a vacuum flange 14 for isolated ambient atmosphere, and well heater is fixed on vacuum flange 14 by a well heater permanent seat 18.As shown in Figure 4, crucible 11 upper end open, for loading steaming degree material, corresponding different deposition materials need be used unlike material.Well heater comprises a heater wire 12 and a heater electrode 120, and the first end of heater electrode 120 connects heater wire 12, and the second end of heater electrode 120 runs through vacuum flange 14 and links external power source.Heater wire 12 is generally refractory metal material (ex.Mo, Ta, NiCr, W), is distributed in the periphery of crucible 11, and heater wire 12 is greater than in the middle of crucible 11 and the distribution density of lower position in the distribution density of crucible 11 upper positions.Thereby make the present invention use a heater wire 12, see through the different distribution density of heater wire 12, be divided into upper and lower two heating blocks, make crucible 11 tops obtain higher temperature, allow the temperature on crucible 11 tops higher than crucible 11 bottoms, the phenomenon of having avoided crucible 11 upper opening place condensation of materials to block.And because only need to use a heater wire 12, therefore only needing to configure one group of well heater can realize, and reduces equipment cost.
Well heater also comprises a thermal insulation layer 17 and plural pyrolitic boron nitride ring (Pyrolytic boron nitride ring, be called for short PBN ring) 13, thermal insulation layer 17 is overmolding to tubbiness by tinsel and is sheathed on outside crucible 11, for maintaining heater wire temperature, avoids period immediately after the bereavement of one's parent to lose.The inwall of thermal insulation layer 17 is provided with plural circular groove groove (not shown), and pyrolitic boron nitride ring 13 is fixed on groove.Shown in Fig. 5 and Fig. 6, on pyrolitic boron nitride ring 13, the distributing position of corresponding heater wire 12 offers aperture 130, and heater wire 12 is arranged in aperture 130 and then is fixed on pyrolitic boron nitride ring 13.Wherein, Fig. 5 is positioned in the middle of crucible and the pyrolitic boron nitride ring 131 of lower position, and because crucible 11 distribution density middle and the desired heater wire 12 of lower position is less, therefore, when making, the aperture on pyrolitic boron nitride ring 131 130 distributes rarer herein; Fig. 6 is the pyrolitic boron nitride ring 132 that is positioned at crucible 11 upper positions, and because the distribution density of the desired heater wire 12 of crucible 11 upper position is larger, therefore, when making, the aperture on pyrolitic boron nitride ring 132 130 ' distributes also closeer herein
Consult again in conjunction with shown in Fig. 7 and Fig. 8, the bottom of crucible 11 is provided with a temperature detecting mechanism 15, for detecting the temperature of crucible 11 reality, this temperature detecting mechanism 15 mainly consists of a thermocouple fixing base 151, insulating ceramic rod 152 and one thermopair (Thermocouple is called for short TC) 153.
Wherein, thermocouple fixing base 151 is arranged in the below of crucible 11 and top and is fixed on well heater permanent seat 18(figure and does not show), bottom is provided with the opening 155 that a bore is less than its internal diameter, the 152 lower end activities of insulating ceramic rod are inserted in the opening 155 of thermocouple fixing base 151 bottoms, thermopair 153 is arranged at the top of insulating ceramic rod 152, and be resisted against crucible 11, the middle part of insulating ceramic rod 152 is provided with a butting section 154, the external diameter of this butting section 154 is between the internal diameter and its bottom opening 155 bores of thermocouple fixing base 151, and between butting section 154 and thermocouple fixing base 151, be provided with a return spring 156.
When thermopair 153 tops are pushed down by crucible 11 bottoms, thermopair 153 and down motion of insulating ceramic rod 152, thermopair 153 touches crucible bottom all the time, the actual temperature of detecting real-time crucible 11.
When crucible 11 is taken away, thermopair 153 and insulating ceramic rod 152, under the effect of return spring 156, are got back to again original position, can avoid thermopair 153 affected by heater wire 12, guarantee the accuracy of the actual temperature detecting of crucible 11.
As better embodiment of the present invention, in crucible 11 bottoms, make a groove 111, allow thermopair 153 stretch in groove 111, guarantee that thermopair 153 when each crucible 11 is put into can detect the temperature of same position crucible 11, be of value to temperature and control.
Shown in Fig. 3, temperature detecting mechanism 15 also comprises a thermopair electrode 150, and the first end of thermopair electrode 150 connects thermopair 153, and the second end of thermopair electrode 150 runs through vacuum flange 14 and links outside temperature monitoring device.
Below embodiment has been described in detail the present invention by reference to the accompanying drawings, and those skilled in the art can make many variations example to the present invention according to the above description.Thereby some details in embodiment should not form limitation of the invention, the present invention will be usingd scope that appended claims defines as protection scope of the present invention.
Claims (7)
1. an organic materials heats vapor deposition source, comprise an evaporation chamber and be located at crucible and the well heater in described evaporation chamber, it is characterized in that: described well heater comprises a heater wire, described heater wire is distributed in the periphery of described crucible, and described heater wire is greater than in the middle of described crucible and the distribution density of lower position in the distribution density of described crucible upper position.
2. vapor deposition source as claimed in claim 1, it is characterized in that: described well heater also comprises a thermal insulation layer and plural pyrolitic boron nitride ring, described thermal insulation layer is sheathed on outside described crucible, the inwall of described thermal insulation layer is provided with plural circular groove groove, described pyrolitic boron nitride ring is individually fixed in described groove, and the distributing position of the corresponding described heater wire of described pyrolitic boron nitride ring offers aperture, described heater wire is arranged in described aperture and then is fixed on described pyrolitic boron nitride ring.
3. vapor deposition source as claimed in claim 2, is characterized in that: described evaporation chamber is provided with a vacuum flange for isolated ambient atmosphere, and described well heater is fixed on described vacuum flange by a well heater permanent seat.
4. vapor deposition source as claimed in claim 3, is characterized in that: the bottom of described crucible is provided with a temperature detecting mechanism, and described temperature detecting mechanism comprises:
One thermocouple fixing base, is positioned at the below of described crucible and is fixed on described well heater permanent seat;
One insulating ceramic rod, activity is inserted in described thermocouple fixing base, and the middle part of described insulating ceramic rod is provided with a butting section, and is provided with a return spring between described butting section and described thermocouple fixing base;
One thermopair, described thermopair is arranged at the top of described insulating ceramic rod and is resisted against described crucible.
5. vapor deposition source as claimed in claim 4, is characterized in that: the bottom of described crucible is provided with a groove, and described thermopair stretches in described groove.
6. vapor deposition source as claimed in claim 5, is characterized in that: described well heater comprises a heater electrode, and the first end of described heater electrode connects described heater wire, and the second end of described heater electrode runs through described vacuum flange and links external power source.
7. vapor deposition source as claimed in claim 6, it is characterized in that: described temperature detecting mechanism comprises a thermopair electrode, the first end of described thermopair electrode connects described thermopair, and the second end of described thermopair electrode runs through described vacuum flange and links outside temperature monitoring device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310596167.4A CN103726022A (en) | 2013-11-22 | 2013-11-22 | Heating evaporation source for organic materials |
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|---|---|---|---|
| CN201310596167.4A CN103726022A (en) | 2013-11-22 | 2013-11-22 | Heating evaporation source for organic materials |
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| CN103726022A true CN103726022A (en) | 2014-04-16 |
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| CN201310596167.4A Pending CN103726022A (en) | 2013-11-22 | 2013-11-22 | Heating evaporation source for organic materials |
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Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104078626A (en) * | 2014-07-22 | 2014-10-01 | 深圳市华星光电技术有限公司 | Heating device for OLED (Organic Light Emitting Diode) material evaporation |
| CN104988463A (en) * | 2015-06-24 | 2015-10-21 | 深圳市华星光电技术有限公司 | Heating source and organic light emitting diode evaporator |
| CN105568225A (en) * | 2014-10-13 | 2016-05-11 | 中国科学院物理研究所 | Resistance heating apparatus and resistance heating type evaporation source |
| CN108624849A (en) * | 2018-07-19 | 2018-10-09 | 北京泰科诺科技有限公司 | A kind of thermal resistance evaporation device |
| CN110938801A (en) * | 2019-12-13 | 2020-03-31 | 山东国晶新材料有限公司 | Metal point source for evaporation equipment and application thereof |
| CN113373412A (en) * | 2021-06-16 | 2021-09-10 | Tcl华星光电技术有限公司 | Evaporation source and evaporation equipment |
| CN113637944A (en) * | 2021-10-14 | 2021-11-12 | 中国科学院沈阳科学仪器股份有限公司 | Button type high temperature heating ware |
| CN113802095A (en) * | 2021-09-30 | 2021-12-17 | 北京博宇半导体工艺器皿技术有限公司 | Evaporation plating device |
| CN114182208A (en) * | 2021-12-10 | 2022-03-15 | 深圳市华星光电半导体显示技术有限公司 | Evaporation source and evaporation equipment |
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Cited By (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104078626A (en) * | 2014-07-22 | 2014-10-01 | 深圳市华星光电技术有限公司 | Heating device for OLED (Organic Light Emitting Diode) material evaporation |
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| CN108624849A (en) * | 2018-07-19 | 2018-10-09 | 北京泰科诺科技有限公司 | A kind of thermal resistance evaporation device |
| CN108624849B (en) * | 2018-07-19 | 2023-09-22 | 北京泰科诺科技有限公司 | Resistance evaporator |
| CN110938801A (en) * | 2019-12-13 | 2020-03-31 | 山东国晶新材料有限公司 | Metal point source for evaporation equipment and application thereof |
| CN113373412A (en) * | 2021-06-16 | 2021-09-10 | Tcl华星光电技术有限公司 | Evaporation source and evaporation equipment |
| CN113373412B (en) * | 2021-06-16 | 2023-10-13 | Tcl华星光电技术有限公司 | Evaporation source and evaporation equipment |
| CN113802095A (en) * | 2021-09-30 | 2021-12-17 | 北京博宇半导体工艺器皿技术有限公司 | Evaporation plating device |
| CN113637944A (en) * | 2021-10-14 | 2021-11-12 | 中国科学院沈阳科学仪器股份有限公司 | Button type high temperature heating ware |
| CN114182208A (en) * | 2021-12-10 | 2022-03-15 | 深圳市华星光电半导体显示技术有限公司 | Evaporation source and evaporation equipment |
| CN114182208B (en) * | 2021-12-10 | 2024-01-23 | 深圳市华星光电半导体显示技术有限公司 | Evaporation source and evaporation equipment |
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Application publication date: 20140416 |