CN103630960B - The bilayer offsetting grating of vertical incidence quartz 1 × 2 beam splitting of TM polarization - Google Patents
The bilayer offsetting grating of vertical incidence quartz 1 × 2 beam splitting of TM polarization Download PDFInfo
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Abstract
A kind of bilayer offsetting grating of vertical incidence quartz 1 × 2 beam splitting of the TM polarization for 1064 nano wave lengths, the upper grating identical by grating structural parameter is formed with relative offsetting of lower grating, upper grating and lower grating combine closely continuously every, on this, the screen periods of grating and lower grating is 1326 ~ 1329 nanometers, ridge is wide is 609 ~ 612 nanometers, side-play amount is 177 ~ 179 nanometers, total grating depth is 2016 ~ 2018 nanometers, when TM polarized light vertical incidence, the total diffraction efficiency of its transmitted light can higher than 96%, and the homogeneity of beam splitter is better than 3.10%.The double-deck offsetting grating of quartz of the vertical incidence of TM polarization of the present invention is processed in conjunction with microelectronics deep etching process by electron-beam direct writing device, and draw materials conveniently, cost is little, can produce in enormous quantities, have important practical prospect.
Description
Technical field
The present invention relates to transmission quartz grating, the bilayer offsetting grating of particularly a kind of vertical incidence quartz 1 × 2 beam splitting of the TM polarization for 1064 nano wave lengths.
Background technology
Beam splitter is the primary element in optical system, has important application in optical system.Irreplaceable effect is had in optical communication, optical information processing, optical oomputing, holography etc. system.Traditional beam splitter, due to complex process, cost intensive, and also laser-damaged threshold value is not high.Fused quartz is a kind of desirable grating material, and it has high optical quality: stable performance, high damage threshold, and designs and produces high-level efficiency beam-splitting optical grating by fused quartz, and structure is simple, and technological process is simple.Therefore, etch high-density deeply etched fused quartz grating to be with a wide range of applications as novel beam splitter device.To quartz grating, a kind of comparatively common light incidence is vertical incidence, and namely incident angle is zero degree.
The people such as JijunFeng high-level efficiency transmission-type rectangle fused quartz 1 × 3 beam splitting polarization devised under a kind of smooth vertical incidence has nothing to do grating [in first technology 1:J.Fengetal., Appl.Opt.47,6638-6643 (2008)].Above grating is based on the rectangular raster of Bragg angle incidence, when light vertical impinge upon on double-deck offsetting grating, because double-layer grating structurally exists asymmetric characteristic, can there is mal-distribution in transmitted light energy, can realize vertical incidence 1 × 2 beam splitter.
Double-layer grating utilizes microelectronics deep etching process, the grating with double-deck flute profile that substrate processes.Hd dual-layered grating diffration is theoretical, can not be explained by simple scalar optical grating diffraction equation, and must adopt the Maxwell equation of vector form and in conjunction with boundary condition, accurately calculate result by the computer program of coding.The people such as Moharam have given the algorithm [at first technology 2:M.G.Moharametal., J.Opt.Soc.Am.A.12,1077 (1995)] of rigorous coupled wave approach, can solve the Diffraction Problems of this kind of high dencity grating.But as far as we know, so far, also nobody is given in the design of the double-deck offsetting grating of quartz 1 × 2 beam splitting fused quartz substrate realizing vertical incidence for conventional 1064 nano wave lengths.
Summary of the invention
The technical problem to be solved in the present invention is to provide a kind of bilayer offsetting grating of vertical incidence quartz 1 × 2 beam splitting of the TM polarization for 1064 nano wave lengths.This grating has important practical value.
Technical solution of the present invention is as follows:
A kind of double-deck offsetting grating of quartz 1 × 2 beam splitting of vertical incidence of the TM polarization for 1064 nano wave lengths, this structure is made up of offset relative with lower grating of upper grating that grating structural parameter is identical, upper grating and lower grating combine closely continuously every, on this, the screen periods of grating and lower grating is 1326 ~ 1329 nanometers, ridge is wide is 609 ~ 612 nanometers, the side-play amount of double-deck offsetting grating is 177 ~ 179 nanometers, and total grating depth is 2016 ~ 2019 nanometers.
Best screen periods is 1327.5 nanometers, and side-play amount is 178 nanometers, and ridge is wide is 610.6 nanometers, and total grating depth is 2017 nanometers.
Technique effect of the present invention is as follows:
Particularly when the screen periods of grating is 1327.5 nanometers, side-play amount is 178 nanometers, and ridge is wide is 610.6 nanometers, and total grating depth is 2017 nanometers.The diffraction efficiency maximal value of total transmitted light is greater than 96%, and the homogeneity of beam splitter is better than 3.10%.The present invention have flexible and convenient to use, homogeneity better, diffraction efficiency comparatively advantages of higher, it is a kind of ideal diffraction optical element, utilize electron-beam direct writing device in conjunction with microelectronics deep etching process, can produce in enormous quantities, at low cost, grating stable performance after etching, reliable, there is important practical prospect.
Accompanying drawing explanation
Fig. 1 is the geometry of the bilayer offsetting grating of vertical incidence quartz 1 × 2 beam splitting of the TM polarization of the present invention 1064 nano wave length.
In figure, 1 represents incident light, and 2,3 represent the emergent light under TM polarization mode, and 4 represent upper strata grating, and (refractive index is n), and 5 represent lower floor's grating, and (refractive index is n).D is screen periods, and b is that ridge is wide, and h is grating depth, and c is side-play amount.
Fig. 2 is the screen periods of the quartz grating (refractive index of quartz is 1.45) of-1 grade of high-level efficiency transmission within the scope of application claims is 1327.5 nanometers, side-play amount is 178 nanometers, ridge is wide is 610.6 nanometers, total grating depth is 2017 nanometers, upper and lower grating structural parameter is identical, and diffraction efficiency is with the curve of wavelength variations.
Embodiment
Below in conjunction with embodiment and accompanying drawing, the invention will be further described, but should not limit the scope of the invention with this.
First refer to Fig. 1, Fig. 1 is the geometry of the bilayer offsetting grating of vertical incidence quartz 1 × 2 beam splitting of the TM polarization of the present invention 1064 nano wave length.In figure, region 4,5 is all fused quartz (refractive index n=1.45).As seen from the figure, the present invention is used for the bilayer offsetting grating that wavelength is vertical incidence quartz 1 × 2 beam splitting of the TM polarization of 1064 nano wave lengths, the grating week screen periods of this grating is 1327.5 nanometers, side-play amount is 178 nanometers, ridge is wide is 610.6 nanometers, total grating depth is 2017 nanometers, and upper and lower grating structural parameter is identical.
Under optical grating construction as shown in Figure 1, the present invention adopts rigorous coupled wave approach [in first technology 2] to calculate the diffraction efficiency of double-deck quartz grating at 1064 nano wavebands.We utilize rigorous coupled wave approach [in first technology 2] to obtain grating initial configuration, and adopt simulated annealing rule [at first technology 3:W.Goffeetal., J.Econometrics60,65-99 (1994)] be optimized, thus obtain the bilayer offsetting grating of this quartzy 1 × 2 beam splitting.
Table 1 gives the present invention a series of embodiment, and in table, d is screen periods, and b is that ridge is wide, and h is grating depth, and λ is incident wavelength, and c is side-play amount, and η is diffraction efficiency, and t is homogeneity.Making in the process of the present invention for the bilayer offsetting grating of vertical incidence quartz 1 × 2 beam splitting of the TM polarization of 1064 nano wave lengths, suitable selective light grid cycle, ridge are wide, and side-play amount and etching depth just can obtain high-diffraction efficiency in certain bandwidth.
Fig. 2 is the curve of the total diffraction efficiency of the present invention with wavelength variations.
The bilayer offsetting grating of vertical incidence quartz 1 × 2 beam splitting of the TM polarization of 1064 nano wave lengths of the present invention, have flexible and convenient to use, homogeneity better, diffraction efficiency comparatively advantages of higher, it is a kind of ideal diffraction optical element, utilize electron-beam direct writing device in conjunction with microelectronics deep etching process, can produce in enormous quantities, at low cost, grating stable performance after etching, reliable, there is important practical prospect.
The diffraction efficiency that during table 1 vertical incidence, the TM polarized light of different wave length is total and beam splitter homogeneity t, ridge is wide be b, h is total grating depth, and d is screen periods, and c is side-play amount.
Claims (2)
1. the bilayer offsetting grating for vertical incidence quartz 1 × 2 beam splitting of the TM polarization of 1064 nano wave lengths, be characterised in that it is made up of with relative offsetting of lower grating the upper grating that grating structural parameter is identical, the optical grating construction of upper grating is positioned at lower surface, the optical grating construction of lower grating is positioned at upper surface, upper grating and lower grating combine closely continuously every, on this, the screen periods of grating and lower grating is 1326 ~ 1329 nanometers, ridge is wide is 609 ~ 612 nanometers, the side-play amount of upper grating and lower grating is 177 ~ 179 nanometers, and total grating depth is 2016 ~ 2019 nanometers.
2. the bilayer offsetting grating of vertical incidence quartz 1 × 2 beam splitting of TM polarization according to claim 1, it is characterized in that the screen periods of described upper grating and lower grating is 1327.5 nanometers, side-play amount is 178 nanometers, and ridge is wide is 610.6 nanometers, and total grating depth is 2017 nanometers.
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Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN101750648A (en) * | 2009-12-25 | 2010-06-23 | 中国科学院上海光学精密机械研究所 | Wavelength-independent fused silica transmission 1 x 2 polarization-independent beam splitting grating |
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| JP4833797B2 (en) * | 2006-07-10 | 2011-12-07 | 株式会社リコー | Optical pickup and optical information processing apparatus |
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Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101750648A (en) * | 2009-12-25 | 2010-06-23 | 中国科学院上海光学精密机械研究所 | Wavelength-independent fused silica transmission 1 x 2 polarization-independent beam splitting grating |
Non-Patent Citations (2)
| Title |
|---|
| 《Beam splitting of low-contrast binary gratings under second Bragg angle incidence》;jiangjun zheng等;《J.Opt.Soc.Am.A》;20080418;第25卷(第5期);1075-1083 * |
| 《Three-port beam splitter of a binary fused-silica grating》;Jijun Feng等;《APPLIED OPTICS》;20081210;第47卷(第35期);6638-6643 * |
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