CN103543484A - Efficient quartz double-layered offsetting grating - Google Patents
Efficient quartz double-layered offsetting grating Download PDFInfo
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Abstract
The invention discloses an efficient quartz double-layered offsetting grating applied for perpendicular incidence of TE polarization with the wavelength of 1310 nm. The grating period of the grating ranges from 1760 to 1770 nm, duty cycle is of 0.582, offset amount ranges from 565 to 575nm, total grating depth ranges from 2810 to 2830nm, and structural parameters of upper and lower grating are consistent; when a TE polarized light performs perpendicular incidence, the first-order diffraction efficiency of the transmitted light can be more than 97%. The efficient quartz double-layered offsetting grating applied for the perpendicular incidence of the TE polarization is processed through an electron beam direct writing device by the microelectronic deep etching process, material can be prepared conveniently, cost is low, and the efficient quartz double-layered offsetting grating can be produced in large scale and has important practical prospect.
Description
Technical field
This patent relates to the double-deck offsetting grating of high-efficiency quartz double-deck offsetting grating, particularly a kind of high-efficiency quartz of the vertical incidence TE polarization for 1310 nano wave lengths.
Background technology
Light deflector is the primary element in optical system, has important application in optical system.In optical communication, optical information processing, photometry calculation, holography etc. system, there is irreplaceable effect.Traditional light deflector, due to complex process, cost is expensive, and laser-damaged threshold value is not high.The electro-optic crystal rising this year, as light deflection, exists cost high too, manufactures the shortcomings such as difficulty.Fused quartz is a kind of desirable grating material, and it has high optical quality: stable performance, high damage threshold and from deep ultraviolet to far wide transmission spectrum, and design and produce high-level efficiency beam-splitting optical grating by fused quartz, simple in structure, technological process is simple.Therefore, the high-density deeply etched fused quartz grating of etching is with a wide range of applications as novel light deflector part.To quartz grating, a kind of comparatively common light incident mode is vertical incidence, and incident angle is zero degree.
The people such as Anduo Hu have designed the high-level efficiency reflection type quartz-1 grade high-level efficiency diffraction grating under a kind of Bragg angle incident, its TE reflection efficiency in 200 nanometer wavelength range higher than 92%[technology 1:Anduo Hu et al. formerly, J.Opt.14,055705 (2012)].Above grating is based on the rectangular reflective grating of Bragg angle incident, when vertical the impinging upon on oblique raster of light, because double-layer grating structurally exists asymmetric characteristic, can there is mal-distribution in transmitted light energy, can realize-1 grade of high efficiency transmission.
Double-layer grating is to utilize microelectronics deep etching technique, and the grating combination with rectangle flute profile processing in substrate arrives together.Hd dual-layered grating diffration is theoretical, can not be explained by simple scalar optical grating diffraction equation, and must adopt the Maxwell equation of vector form and in conjunction with boundary condition, by the computer program of encoding, accurately calculate result.The people such as Moharam have provided the algorithm [formerly technology 2:M.G.Moharam et al., J.Opt.Soc.Am.A.12,1077 (1995)] of rigorous coupled wave theory, can solve the Diffraction Problems of this class high dencity grating.But as far as we know,, so far, also nobody is given in for conventional 1310 nano wave lengths the design that realizes vertical incidence-1 grade high-level efficiency transmission on fused quartz substrate.
Summary of the invention
The technical problem to be solved in the present invention is to provide a kind of double-deck offsetting grating of high-efficiency quartz of vertical incidence of the TE polarization for 1310 nano wave lengths.When TE polarized light vertical incidence, this grating can make incident optical energy mainly be distributed on-1 grade of transmitted light, and the top efficiency of-1 grade of transmitted light is greater than 97%.Therefore, this grating has important practical value.
Technical solution of the present invention is as follows:
A kind of double-deck offsetting grating of high-efficiency quartz of vertical incidence of the TE polarization for 1310 nano wave lengths, the grating cycle of this grating is 1760～1770 nanometers, dutycycle is 0.582, side-play amount is 565～575 nanometers, total grating degree of depth is 2810～2830 nanometers, and upper and lower grating structural parameter is identical.
The best grating cycle is 1764.9 nanometers, and side-play amount is 571.8 nanometers, and dutycycle is 0.582, and total grating degree of depth is 2821.3 nanometers, and upper and lower grating structural parameter is identical.
Technique effect of the present invention is as follows:
Particularly the grating cycle when grating is 1764.9 nanometers, and side-play amount is 571.8 nanometers, and dutycycle is 0.582, and total grating degree of depth is 2821.3 nanometers, and upper and lower grating structural parameter is identical.The diffraction efficiency maximal value of-1 grade of transmitted light is greater than 97%.That the present invention has is flexible and convenient to use, homogeneity better, diffraction efficiency is compared with advantages of higher, it is a kind of ideal diffraction optical element, utilize electron-beam direct writing device in conjunction with microelectronics deep etching technique, can be in enormous quantities, produce at low cost, grating stable performance after etching, reliable, has important practical prospect.
Accompanying drawing explanation
Fig. 1 is the geometry of the double-deck offsetting grating of high-efficiency quartz of the TE polarization orthogonal incident of the present invention's 1310 nano wave lengths.
In figure, 1 represents that region 1(refractive index is n
1), 2 represent that region 2(refractive index is n
2), 3 represent incident light, 4 represent the emergent light under TE polarization mode.D is the grating cycle, and b is that ridge is wide, and h is the grating degree of depth, and x is side-play amount.
Fig. 2 is that the double-deck offsetting quartz grating of the high-efficiency quartz in claimed range of the present invention (quartzy refractive index is 1.45) the grating cycle is 1764.9 nanometers, side-play amount is 571.8 nanometers, dutycycle is 0.582, total grating degree of depth is 2821.3 nanometers, the upper and lower grating degree of depth is identical, and diffraction efficiency is with the curve of wavelength variations.
Embodiment
Below in conjunction with embodiment and accompanying drawing, the invention will be further described, but should not limit the scope of the invention with this.
First refer to Fig. 1, Fig. 1 is the geometry of the double-deck offsetting grating of high-efficiency quartz of the TE polarization orthogonal incident of the present invention's 1310 nano wave lengths.In figure, region 1,2 is all uniformly, is all fused quartz (refractive index n=1.45).TE polarized incident light is corresponding to the direction of vibration of electric field intensity perpendicular to the plane of incidence, and it impinges perpendicularly on grating.As seen from the figure, the present invention is the double-deck offsetting grating of high-efficiency quartz of the TE polarization orthogonal incident of 1310 nano wavebands for wavelength, the grating cycle of this grating is 1764.9 nanometers, side-play amount is 571.8 nanometers, dutycycle is 0.582, total grating degree of depth is 2821.3 nanometers, and the structural parameters of upper and lower grating are identical.
Under optical grating construction as shown in Figure 1, the present invention adopts rigorous coupled wave theoretical [formerly technology 2] to calculate double-deck quartz grating in the diffraction efficiency of 1310 nano wavebands.We utilize rigorous coupled wave theoretical [formerly technology 2] to obtain grating initial configuration, and adopt simulated annealing rule [technology 3:W.Goffe et al. formerly, J.Econometrics60,65-99 (1994)] be optimized, thus obtain this-1 grade high-efficiency quartz transmission grating.
Table 1 has provided a series of embodiment of the present invention, and in table, d is the grating cycle, and b is that ridge is wide, and h is the grating degree of depth, and λ is incident wavelength, and x is side-play amount, and f is dutycycle, is diffraction efficiency.Making the process of the present invention for the high-level efficiency outgoing quartz transmission grating of the TE polarization orthogonal incident of 1310 nano wave lengths, suitably selective light grid cycle, ridge are wide, and side-play amount and etching depth just can obtain high-diffraction efficiency in certain bandwidth.
Fig. 2 is that the present invention-1 grade transmitted light diffraction efficiency is with the curve of wavelength variations.
The double-deck offsetting grating of high-efficiency quartz of TE polarization orthogonal of the present invention incident, have flexible and convenient to use, homogeneity better, diffraction efficiency is compared with advantages of higher, it is a kind of ideal diffraction optical element, utilize electron-beam direct writing device in conjunction with microelectronics deep etching technique, can be in enormous quantities, produce at low cost, grating stable performance after etching, reliable, has important practical prospect.
During table 1 vertical incidence, the TE polarized light of different wave length is in-1 order diffraction efficiency, and dutycycle is that 0.582, h is total grating degree of depth, and d is the grating cycle, and x is side-play amount
Claims (2)
1. the double-deck offsetting grating of the high-efficiency quartz for the vertical incidence of the TE polarization of 1310 nano wave lengths, the grating cycle of this grating is 1760～1770 nanometers, dutycycle is 0.582, side-play amount is 565～575 nanometers, total grating degree of depth is 2810～2830 nanometers, and upper and lower grating structural parameter is identical.
2. the double-deck offsetting grating of TE according to claim 1 polarization-1 grade high-efficiency quartz, it is characterized in that the described grating cycle is 1764.9 nanometers, side-play amount is 571.8 nanometers, and dutycycle is 0.582, total grating degree of depth is 2821.3 nanometers, and upper and lower grating structural parameter is identical.
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113031139A (en) * | 2019-12-25 | 2021-06-25 | 南开大学 | Transmission type large-angle deflection double-layer uniform grating for 3D printing |
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| US7289214B1 (en) * | 2004-11-23 | 2007-10-30 | N&K Technology, Inc. | System and method for measuring overlay alignment using diffraction gratings |
| CN1687810A (en) * | 2005-03-18 | 2005-10-26 | 南开大学 | Double-layer graphite rod tunable optical fibre raster form and its preparation |
| US20100091369A1 (en) * | 2008-10-15 | 2010-04-15 | Lumella Inc. | Double-layer grating |
| CN101571608A (en) * | 2009-06-09 | 2009-11-04 | 中国科学院上海光学精密机械研究所 | Quartz transmission dual-channel polarization-independent beam-splitting grating for 1310 nano wave band |
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| ANDUO HU ET AL: "Modal analysis of high-efficiency wideband reflective gratings", 《JOURNAL OF OPTICS:PURE AND APPLIED OPTICS》, vol. 14, no. 055705, 19 March 2012 (2012-03-19), pages 1 - 5 * |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113031139A (en) * | 2019-12-25 | 2021-06-25 | 南开大学 | Transmission type large-angle deflection double-layer uniform grating for 3D printing |
| CN113031139B (en) * | 2019-12-25 | 2022-07-05 | 南开大学 | Transmission type large-angle deflection double-layer uniform grating for 3D printing |
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