CN103474727B - A kind of performance regulate and control method of multi-layer metamaterial unit structure - Google Patents
A kind of performance regulate and control method of multi-layer metamaterial unit structure Download PDFInfo
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Abstract
The invention discloses a kind of multi-layer metamaterial unit structure and preparation thereof and regulate and control method, it is followed successively by coating metal, top dielectric, metallic intermediate layer, layer dielectric, underlying metal from top to bottom.Top layer and metallic intermediate layer are made up of the becket that size is different, and there is overlapping region and underlapped region between this double layer of metal ring simultaneously, and the underlying metal of structure is continuous print metal film.For multi-layer metamaterial proposed by the invention, except being undertaken except property regulation by means such as traditional change resonance metal figure, metal and dielectric material parameters, importantly, can also by changing top layer and the diameter of intermediate layer double layer of metal ring, the means such as width in the width of the overlapping region of two rings and the underlapped region of two rings regulate Meta Materials to the response frequency of incident electromagnetic wave and frequency band.Compared with traditional metamaterial structure, the present invention has the advantages such as wider response band, more concentrated dielectric loss, thinner device material.
Description
Technical field
The present invention relates to Meta Materials and terahertz detection technical field, be specifically related to a kind of Terahertz multi-layer metamaterial unit structure and preparation thereof and regulate and control method.
Background technology
Owing to lacking effective Terahertz (THz) source and detection technique, Terahertz research stagnates within a very long time.In recent years, along with the fast development of physics, materialogy, laser engineering and nanometer technology, Terahertz Technology makes great progress, and becomes current international research focus.Terahertz detector, by detecting through the situation of change of the Terahertz photon of object, realizes the detection of pattern to object or composition.Compared with the Detection Techniques such as X ray, nulcear magnetic resonance (NMR) of routine, terahertz detector has the advantages such as detection speed is fast, precision is high, penetrability is strong, radiation damage is little.Wherein, non-refrigeration type terahertz detector military and civilian in the middle of be with a wide range of applications, be a key areas of Terahertz Technology.Regrettably, the development of current non-brake method terahertz detector is subject to larger restriction, and its reason mainly lacks the device material effectively absorbing Terahertz photon.The appearance of electromagnetism metamaterial probably makes Terahertz application technology, especially makes terahertz electromagnetic wave imaging technique obtain and breaks through development.
Electromagnetism Meta Materials (Metamaterial), is called for short Meta Materials, refers to that a class has artificial composite structure or the composite material of the extraordinary electromagnetic property not available for natural material.Calendar year 2001, Walser first time propose electromagnetism Meta Materials concept (see R.M.Walser, " Electromagnetic matematerials ", Pro.SPIE, 4467,1 (2001). document), just cause the extensive attention of academia soon.Utilize Meta Materials can realize electromagnetic wave and light wave performance any " cutting out ", thus the particular device such as such as perfect lens, stealthy cape, the perfect absorber of electromagnetic wave can be obtained.Nowadays, Meta Materials become focus that theoretical basis research and technology application study pay close attention to jointly (see N.I.Zheludev, " The road ahead for metamaterials ", Science, 328,582 (2010). document).
According to effective Media Theory, the characteristic of Meta Materials can be regulated and controled by the structurally ordered design of key physical size.So, by adjusting its physical size and material parameter, Meta Materials can be made to produce with the electromagnetic component of incident electromagnetic wave be coupled, thus the overwhelming majority of the incident electromagnetic wave of special frequency band (or even 100%) is absorbed, obtain special Meta Materials " perfect absorber " thus (see N.I.Landy, S.Sajuyigbe, J.J.Mock, " Perfect metamaterial absorber ", Phys.Rev.Lett., 100,7402 (2008). document).Based on this principle, 2008, the people such as Tao design a kind of Meta Materials Terahertz absorber of being made up of metal, medium, metal trilaminate material (see H.Tao, N.I.Landy, C.M.Bingham, X.Zhang, R.D.Averitt, W.J.Padilla, " A metamaterial absorber for the terahertz regime:Design, fabrication and characterization ", Opt.Express, 16,7182 (2008). document), its bottom and top layer Au metal are rectangle strip and split ring resonator shape structure respectively.This meta-material absorber at 1.12THz place to the theoretical value of incident electromagnetic wave absorptivity up to 98%, measured value is 70%.But the absorption band of this traditional Meta Materials is narrower.
Meta Materials electromagnetic wave absorber relies on the electromagnetic resonance of Meta Materials to absorb incident electromagnetic wave.Regrettably, the response band of the Meta Materials of traditional structure is general narrower (see N.I.Landy, S.Sajuyigbe, J.J.Mock, et al. " Perfect metamaterial absorber " .Phys.Rev.Lett., 100 (20), 207402(2008) document).This narrow-band absorption becomes restriction Meta Materials electromagnetic wave absorber and deeply develops the Main Bottleneck with device application.So the meta-material absorber that design has wide response band has important practical significance.So far, the method widening Meta Materials response band mainly contains two kinds.Method be in same plane the Meta Materials with different response frequency carry out combining (see a B.Kearney, F.Alves, D.Grbovic, G.Karunasiri, " Al SiO
xal single and multi band metamaterial absorbers for terahertz sensor applications ", Optical Engineering52 (1), 013801(2013) document).In the middle of this Meta Materials design, certain two groups of arrangement or the metal pattern configuration of different size more than two is constructed in same plane, make Meta Materials produce two and above absorption peak thus, its always absorb be different size figure produce the stack result of absorption.Regrettably, this absorption curve fluctuation is large, and, the absorption value between absorption peak little (being even only 40%).So, although this method can reach the object of widening Meta Materials response band, make that the absorptivity of Meta Materials obviously reduces, bad stability.Another kind method adopts the multilayer metamaterial structure of layering (see N.R.Han, Z.C.Chen, C.S.Lim, B.Ng, M.H.Hong, " Broadband multi-layer terahertz metamaterials fabrication and characterization on flexible substrates ", Opt.Express19 (8), 6990 (2011) documents).Multilayer (as 5 layers), the coaxial but metamaterial structure of different size is superimposed this layering metamaterial structure, not response between each layer, at a distance of 100 μm between adjacent metal structures, the gross thickness of Meta Materials is up to 600 μm, and its absorption curve also fluctuates larger.So, although this second layered approach also can widen the absorption band of Meta Materials, obviously thicken making the thickness of Meta Materials (even up to 600 μm).In addition, the cross structure of 3 kinds of different lengths is embedded in the middle of medium and also achieves wideband absorption (see Y.Q.Ye by the people such as Ye, Y.Jin, S.He, " Omnidirectional, polarization-insensitive and broadband thin absorber in the terahertz regime ", J.Opt.Soc.Am.B, 27 (3), 498 (2010) documents).Similarly, this Meta Materials has 7 layers, and the thinnest dielectric layer also reaches 700nm, and it exists 3 absorption peaks, and total absorption is that different layers response absorption is formed by stacking.The Meta Materials of this layering obviously reduces making the speed of response of device, and dielectric loss is comparatively disperseed, and is unfavorable for the absorbing detection of device.Particularly, the Meta Materials of this layering adopts thicker multilayer dielectric film, and thicker material structure, by seriously affecting the performances such as the calorifics of related device, electricity and mechanics, makes device generation deformation, even lost efficacy.These deficiencies limit existing Meta Materials frequency band Widening Technique at device, especially have the application in the middle of the non-brake method Terahertz micro-metering bolometer of microactuator suspension bridge construction.
In a word, current Terahertz metamaterial structure Shortcomings, is unfavorable for practical application and theoretical research.
Summary of the invention
For above-mentioned prior art, the technical problem to be solved in the present invention is: how to provide the multilayer metamaterial structure that a kind of response band is wider, material thickness is thinner, dielectric loss is concentrated more, be conducive to device application.
In order to solve the problems of the technologies described above, the present invention adopts following technical scheme:
A kind of multilayer Terahertz metamaterial modular construction, is characterized in that, this multi-layer metamaterial unit structure comprises and is followed successively by coating metal 5, top dielectric 4, metallic intermediate layer 3, layer dielectric 2, underlying metal 1 totally five layer materials from top to bottom.Wherein, coating metal 5 and metallic intermediate layer 3 are the different annular metal of diameter dimension, and there is overlapping region and underlapped region between two rings simultaneously, and bottom metal 1 is continuous print metal film.
According to multi-layer metamaterial unit structure provided by the present invention, it is characterized in that, be in the upper dielectric layer 4 between coating metal 5 and metallic intermediate layer 3 metal and the underlying dielectric layers 2 mediated between layer metal 3 and underlying metal 1 in described multi-layer metamaterial unit structure and be respectively one in the middle of polyimide film, silicon nitride film, silicon oxide film, amorphous silicon membrane, silicon oxynitride film, aluminum oxide film, hafnia film, hafnium aluminum oxide film or their composite membrane.Wherein, the thickness being in the top dielectric layer 4 between coating metal 5 and metallic intermediate layer 3 is 10nm ~ 10 μm, and the best is 100nm, 150nm, 200nm, 250nm, 300nm, 350nm, 400nm, 450nm, 500nm etc.; The thickness of the underlying dielectric layers 2 mediated between layer metal 3 and underlying metal 1 is 50nm ~ 40 μm, and the best is 1.0 μm, 1.2 μm, 1.4 μm, 1.6 μm, 1.8 μm, 2.0 μm, 2.2 μm, 2.4 μm, 2.6 μm, 2.8 μm, 3 μm etc.; The dielectric constant of top dielectric layer 4 or 2 is 1 ~ 12, and the best is 2,2.8,3,3.5,4,4.5,5,6,7,8,9,10,11,12 etc.
According to multi-layer metamaterial unit structure provided by the present invention, it is characterized in that, the coating metal ring 5 of described multi-layer metamaterial unit structure and the size of metallic intermediate layer ring 3 are respectively: the internal diameter r of coating metal ring 5
1be 2 ~ 20 μm, width w
1be 1 ~ 10 μm, the internal diameter r of metallic intermediate layer ring 3
2be 10 ~ 14 μm, width w
2be 3 ~ 6, best of breed parameter is r
1=9 μm, w
1=5 μm, r
2=11 μm and w
2=5 μm, or r
1=10 μm, w
1=4 μm, r
2=11 μm and w
2=5 μm, r
1=10 μm, w
1=4 μm, r
2=12 μm and w
2=4 μm, r
1=10 μm, w
1=4 μm, r
2=13 μm and w
2=3 μm of grades wherein one group.
According to multi-layer metamaterial unit structure provided by the present invention, it is characterized in that, the coating metal ring 5 of described multi-layer metamaterial unit structure, metallic intermediate layer ring 3 and underlying metal 1 are Au or metal A l, Ti, TiN
x, TiSi
x, TiW
x, W, WSi
x, Ni, NiSi
x, Ta, TaN
x, Fe, Pt, Cu, Ag, NiCr
xone in the middle of alloy, or their composite membrane.The conductivity of metallic film is 2 × 10
5~ 1 × 10
8s/m, the best is 1 × 10
6s/m, 5 × 10
6s/m, 1 × 10
7s/m, 2 × 10
7s/m, 3 × 10
7s/m, 3.5 × 10
7s/m, 4 × 10
7s/m, 4.5 × 10
7s/m, 5 × 10
7s/m, 5.5 × 10
7s/m, 6 × 10
7s/m etc.The thickness of metal film is 5 ~ 2000nm, and the best is 30nm, 50nm, 80nm, 100nm, 120nm, 150nm, 200nm, 250nm, 300nm, 350nm, 400nm, 450nm, 500nm etc.
Prepare a method for above-mentioned multilayer metamaterial structure, it is characterized in that, bag following steps:
1, clean substrate, then dry up with high pure nitrogen, for subsequent use;
2, on the surface of substrate, utilize reactor to deposit metal continuous film that a layer thickness is 5 ~ 2000nm, as the underlying metal 1 of multi-layer metamaterial;
3, on the surface of above-mentioned metal continuous film, spin coating a layer thickness is the deielectric-coating of 50nm ~ 40 μm, as the underlying dielectric layers 2 of multi-layer metamaterial;
4, reactor is utilized, on the surface of dielectric layer, the second layer metal film of deposit multilayer Meta Materials, thickness is 5 ~ 2000nm;
5, utilize the method for etching, according to the size of setting, by mask, selective etch is carried out to second layer metal film until expose layer dielectric 2 below, form the intermediate layer annular metal structure of multi-layer metamaterial, i.e. metallic intermediate layer 3;
6, on the surface of above-mentioned metal film, spin coating a layer thickness is the deielectric-coating of 10nm ~ 10 μm, as the top dielectric 4 of multi-layer metamaterial;
7, reactor is utilized, on the surface of top dielectric 4, the 3rd layer of metal film of deposition Meta Materials, thickness is 5 ~ 2000nm;
8, utilize the method for etching, according to the size of setting, by mask, selective etch is carried out until expose top dielectric 4 below to the 3rd layer of metal film, form the top layer annular metal structure of multi-layer metamaterial, i.e. coating metal 5.
According to the preparation method of multi-layer metamaterial unit structure provided by the present invention, it is characterized in that, support substrates used is in step 1 monocrystalline silicon piece, or be the one in the middle of silicon nitride film, amorphous silicon membrane, silicon oxide film, silicon oxynitride film, polyimide film, polyethylene film, polystyrene film, polypropylene film, gallium arsenide film, or their composite membrane.
According to a kind of multi-layer metamaterial unit structure provided by the present invention, it is characterized in that, when material gross thickness is identical or close, this multi-layer metamaterial to the response band of incident electromagnetic wave by broadening more obvious than traditional three layers of Meta Materials.
According to a kind of multi-layer metamaterial unit structure provided by the present invention, it is characterized in that, there is Arbitrary Rotation symmetry in this multi-layer metamaterial, and namely no matter electromagnetic electric field is along what direction, is identical concerning this multi-layer metamaterial.So the polarised direction of multilayer metamaterial structure to electromagnetic field that the present invention proposes be insensitive, can realize any polarization, it is polarization non-sensitive type Meta Materials.
A kind of regulate and control method of Terahertz response characteristic of multilayer metamaterial structure provided by the present invention, it is characterized in that, except being undertaken except property regulation by means such as traditional change resonance metal figure, metal and dielectric material parameters, importantly, response band and the frequency band of Meta Materials is also controlled by means such as the width in the size of the coating metal 5 and metallic intermediate layer 3 double layer of metal ring that change this multi-layer metamaterial, the width of two ring overlapping regions and the underlapped region of two rings.Wherein, when metallic intermediate layer 3 parameter constant of multi-layer metamaterial, make that the external diameter of coating metal 5 is constant and its internal diameter reduces, namely the ring width of coating metal 5 broadening when, or when coating metal 5 parameter constant, make that the external diameter of metallic intermediate layer 3 is constant and its internal diameter increases, i.e., when the ring width constriction of metallic intermediate layer 3, the response frequency of multi-layer metamaterial will be broadening to high-frequency mobile, response band.But, when coating metal 5 parameter constant, make that the external diameter of metallic intermediate layer 3 is constant and its internal diameter reduces, namely the ring width of metallic intermediate layer 3 broadening when, or when metallic intermediate layer 3 parameter constant, make that the external diameter of coating metal 5 is constant and its internal diameter increases, i.e., when the ring width constriction of coating metal 5, the center response frequency of multi-layer metamaterial will move to low frequency, response band constriction.
According to multi-layer metamaterial unit structure provided by the present invention, it is characterized in that, in this multilayer metamaterial structure, when there is overlapping region in its coating metal 5 and metallic intermediate layer 3 double layer of metal ring, owing to there is the highfield of concussion between two rings, so dielectric loss will concentrate in the middle of top dielectric 4, dielectric loss will be more concentrated, and distribution is comparatively even.
Compared with prior art, the present invention has following beneficial effect:
(1) the absorption response band of multi-layer metamaterial provided by the present invention to incident electromagnetic wave is wider, and the adjustment of absorption frequency is simple more flexibly, also has the advantages such as polarization is insensitive;
(2) multilayer metamaterial structure provided by the present invention, when there is overlapping region in its coating metal 5 and metallic intermediate layer 3 double layer of metal ring, owing to there is the highfield of concussion between two rings, so dielectric loss will concentrate in the middle of top dielectric 4, dielectric loss is more concentrated, and distribution is comparatively even, advantageously in device application;
(3) incident THz wave enters from the top layer of multi-layer metamaterial unit structure, the electromagnetic component of THz wave produces with Meta Materials and is coupled, cause the selective absorbing of incident THz wave, the underlying metal film reflected terahertz hereby ripple of multi-layer metamaterial, strengthen Terahertz absorption characteristic further.So, multilayer Terahertz Meta Materials provided by the present invention have thickness thin, absorb strong, response frequency and be easy to the advantages such as control, can terahertz detector be applied to.
Accompanying drawing explanation
Fig. 1 is the schematic diagram of metamaterial modular construction of traditional metal, medium, metal trilaminate material composition;
Fig. 2 be implement that the present invention proposes by coating metal ring, top dielectric, metallic intermediate layer ring, layer dielectric, the underlying metal continuous film schematic diagram of multi-layer metamaterial unit structure that forms of totally five layer materials;
Fig. 3 implements the multi-layer metamaterial of the present invention's proposition and the absorption effect contrast figure of traditional three layers of Meta Materials;
Fig. 4 is the metallic pattern that can replace its coating metal 5 and metallic intermediate layer 3 in the multilayer metamaterial structure of enforcement the present invention proposition;
Fig. 5 implements the multilayer metamaterial structure that the present invention proposes and the absorption comparison diagram removed its coating metal 5 or remove after its metallic intermediate layer 3;
Fig. 6 is the multi-layer metamaterial that proposes impedance curve when propagating along the positive negative sense of Z axis that carries out an invention;
Fig. 7 a and Fig. 7 b be when the present invention propose the coating metal 5 of multi-layer metamaterial and the ring width of metallic intermediate layer 3 change time, the situation of change of the Terahertz response characteristic of dependency structure, wherein: Fig. 7 a is the impact of coating metal 5 ring width change on multi-layer metamaterial absorption frequency; Fig. 7 b is the impact of metallic intermediate layer 3 ring width change on multi-layer metamaterial absorption frequency;
Fig. 8 a and 8b is whether the coating metal 5 of the multi-layer metamaterial that the present invention proposes and the overlapping region width of metallic intermediate layer 3 and coating metal 5 exist with metallic intermediate layer 3 impact responded the Terahertz of structure, wherein: Fig. 8 a is that coating metal 5 changes with the overlapping region width of metallic intermediate layer 3 and when coating metal 5 or metallic intermediate layer 3 individualism, the Terahertz response characteristic of relevant Meta Materials; Fig. 8 b is when coating metal 5 is blocked completely by metallic intermediate layer 3 and whether coating metal 5 or metallic intermediate layer 3 exist the impact of the Terahertz response characteristic on relevant metamaterial structure;
Fig. 9 a, 9b, 9c are the equivalent-circuit model implementing the multi-layer metamaterial that the present invention proposes, wherein: Fig. 9 a be that coating metal 5 exists overlapping region with metallic intermediate layer 3 and coating metal 5 is not blocked completely by metallic intermediate layer 3 time, the equivalent-circuit model of Meta Materials; Fig. 9 b be coating metal 5 with metallic intermediate layer 3 not overlapping region time equivalent-circuit model; Fig. 9 c is the equivalent-circuit model of coating metal 5 when being blocked completely by metallic intermediate layer 3;
Figure 10 be the coating metal 5 of implementing the multi-layer metamaterial that the present invention proposes with metallic intermediate layer 3 not overlapping region time, Meta Materials is to the absorption curve of incident electromagnetic wave;
Figure 11 a, Figure 11 b, Figure 11 c, Figure 11 d implement the surface current of multi-layer metamaterial unit structure, electric field and the loss density figure that the present invention proposes, wherein: Figure 11 a is the surface current of this multilayer Terahertz Meta Materials; Figure 11 b is that this multi-layer metamaterial unit does cross section, the Electric Field Distribution of cutting plane by the ring heart along the polarised direction y-axis direction of electric field; Figure 11 c is that it does cross section by the ring heart along the polarised direction of electric field, the loss density distribution of cutting plane; Figure 11 d is at the plane place of the interface 100nm apart from surface metal 5 and top dielectric 4, and namely between two rings, the loss density at medium 4 center distributes;
Figure 12 a, 12b are traditional metal, medium, the electric field of metal (Fig. 1 single ring architecture) three layers of metamaterial modular construction and loss density figure, wherein: Figure 12 a is that this tradition three layers of metamaterial unit do cross section, the Electric Field Distribution of cutting plane by the ring heart along the polarised direction (y-axis direction) of electric field; Figure 12 b is that it does cross section by the ring heart along the polarised direction of electric field, the loss density distribution of cutting plane.
Embodiment
Below in conjunction with the drawings and the specific embodiments, the invention will be further described.
Adopt provided by the invention by coating metal 5, top dielectric 4, metallic intermediate layer 3, layer dielectric 2, underlying metal 1 multilayer metamaterial structure that forms of totally five layer materials, there is special Terahertz response performance.The embodiment that the present invention makes this multilayer metamaterial structure is as follows:
(1) select monocrystalline silicon piece as the substrate of Meta Materials, after cleaning, dry up with high pure nitrogen, for subsequent use;
(2) on the surface of substrate, utilize electron beam evaporation system to deposit continuous gold film that a layer thickness is 5 ~ 2000nm, as the underlying metal 1 of multi-layer metamaterial;
(3) on the surface of above-mentioned continuous gold film, spin coating a layer thickness is the polyimide film of 50nm ~ 40 μm, as the layer dielectric 2 of multi-layer metamaterial;
(4) on the surface of polyimides layer dielectric 2, utilize electron beam evaporation system to deposit the second layer gold film of Meta Materials, thickness is 5 ~ 2000nm;
(5) utilize the method for etching, by mask, according to setting size, selective etching is carried out until expose polyimide layer below to second layer gold film, forms the metallic intermediate layer loop configuration of multi-layer metamaterial, i.e. metallic intermediate layer 3;
(6) on the surface of above-mentioned metallic pattern, spin coating a layer thickness is the polyimide film of 10nm ~ 10 μm, as the top dielectric 4 of multi-layer metamaterial;
(7) reactor is utilized, on the surface of top dielectric 4, the 3rd layer of golden film of deposition Meta Materials, thickness is 5 ~ 2000nm;
(8) method of etching is utilized, according to the size of setting, pass through mask, selective etch is carried out until expose polyimide layer below to the 3rd layer of golden film, form the coating metal ring structure of multi-layer metamaterial, i.e. coating metal 5, prepares the multilayer metamaterial structure be made up of five layer materials shown in Fig. 2 that the present invention proposes thus.
Fig. 2 is the cellular construction meeting the multi-layer metamaterial of impedance matching condition that the present invention proposes, and is made up of altogether five layer materials, is followed successively by underlying metal 1, layer dielectric 2, metallic intermediate layer 3, top dielectric 4, coating metal 5.In Fig. 2, the cell size of multi-layer metamaterial is a=36 μm, r
1=10 μm, r
2=11 μm, w
1=4 μm, w
2=5 μm, t
1=0.2 μm, t
2=2.8 μm.There is overlapping region between coating metal 5 and two rings of metallic intermediate layer 3, the overlapping region width shown in Fig. 2 is 3 μm.
For the multilayer metamaterial structure shown in Fig. 2 that the present invention proposes, wherein, being in top dielectric 4 between every double layer of metal and layer dielectric 2 layers is not particularly limited, except polyimide film, can also be the silicon nitride (SiN of different-thickness, different component
x) film or amorphous silicon (a-Si) film, silica (SiO
x) film, silicon oxynitride (SiN
xo
y) film, aluminium oxide (AlO
x) film, hafnium oxide (HfO
x) film, hafnium aluminum oxide (HfAlO
x) wherein a kind of such as film or their composite membrane, or the dielectric material of other known in the industry form.
The formation metal of the coating metal 5 of the multilayer metamaterial structure shown in Fig. 2 that the present invention proposes, metallic intermediate layer 3 and underlying metal 1 is also not particularly limited, and can be metal A u or metal A l, Ti, TiN
x, TiSi
x, TiW
x, W, WSi
x, Ni, NiSi
x, Ta, TaN
x, Fe, Pt, Cu, Ag, NiCr
xa kind of in the middle of alloy or their composite membrane, or the electrode of other known in the industry form.The support substrates of the multi-layer metamaterial shown in Fig. 2 that the present invention proposes also is not particularly limited, and can be the composite membrane of a kind of or these materials wherein such as monocrystalline silicon piece or silicon nitride film, amorphous silicon membrane, silicon oxide film, silicon oxynitride film, polyimide film, polyethylene film, polystyrene film, polypropylene film, gallium arsenide film.The figure of the coating metal 5 meeting the multi-layer metamaterial of regulation rule that the present invention proposes and metallic intermediate layer 3 resonance metal is also not particularly limited, can be the one in the middle of the becket graphic structure of the present invention's proposition shown in Fig. 2, the graphic structure shown in Fig. 4, or the symmetry graphic structure of other known in the industry form.
Through following methods analyst, the advantage such as absorption frequency, concentrated dielectric loss that the multi-layer metamaterial that provable employing the present invention proposes has wider absorption response band, easily regulates, meets the needs of non-brake method terahertz detector.
The multilayer metamaterial structure (Fig. 2) using the frequency domain algorithm in CST Microwave Studio2011 electromagnetic simulation software to carry the present invention calculates, construction unit X and Y-direction border are set as (unit cell) cycle boundary, namely construction unit is in X and the arrangement of Y-direction infinite period, and wave vector K is along Z-direction.Because bottom is continuous metal film, so be transmitted as zero, absorptivity can pass through A (ω)=1-|S
11|
2obtain.Simulation parameter comprises: conductivity δ=4.561 × 10 that the dielectric constant of polyimides is 2.8, loss tangent is 0.0313, Au film
7s/m.
The simulation result of multilayer (five layers) metamaterial structure shown in Fig. 2 that Fig. 3 proposes for the present invention and traditional metal, medium, the Terahertz absorptivity of metal three layers of metamaterial structure under same frequency.Wherein, the multi-layer metamaterial (Fig. 2) that the present invention proposes, when the thickness of its each rete is respectively 200nm(Au), 200nm(polyimides), 200nm(Au), 2800nm(polyimides), 200nm(Au) time, the center response frequency of multi-layer metamaterial is 2.338THz, absorptivity is 99.9%, and response band (being defined as the half peak breadth of absworption peak) is 348GHz.Fig. 1 is traditional Meta Materials be made up of trilaminate material, its coating metal adopts single ring architecture, design parameter comprises: the thickness of underlying metal continuous film is 200nm, the thickness of middle dielectric layer is 2.8 μm, and the thickness of the external diameter 14.6 μm of coating metal ring, ring width 3.2 μm, this becket is 200nm.Fig. 3 shows, although two kinds of Meta Materials are all greater than 99.9% in the absorptivity of 2.338THz frequency, and, the response band of the traditional metal shown in Fig. 1, medium, metal three layers of Meta Materials is only 231GHz.By comparison, the response band of five layers of Meta Materials that the present invention shown in Fig. 2 proposes is wide reaches 348GHz, has widened 51% than the response band of traditional three-decker (Fig. 1).
The multilayer metamaterial structure that Fig. 5 proposes for the present invention shown in Fig. 2 changes, comprising removal metallic intermediate layer 3(is now by coating metal 5, top dielectric 4, layer dielectric 2, the Meta Materials that underlying metal 1 is formed), remove coating metal 5(now little for whether being existed by top dielectric 4(medium 4 impact of Meta Materials absorption), metallic intermediate layer 3, layer dielectric 2, the Meta Materials that underlying metal 1 is formed), and two ring all exist (namely the present invention as shown in Figure 2 propose by coating metal 5, top dielectric 4, metallic intermediate layer 3, layer dielectric 2, underlying metal 1 totally five layer materials composition multi-layer metamaterial), the Terahertz absorption curve comparison diagram of metamaterial structure in these three kinds of situations.Fig. 5 shows, and when removing metallic intermediate layer 3, the center response frequency of corresponding Meta Materials is 2.660THz, absorptivity 96.1%, response band 288GHz; When removing coating metal 5, the center response frequency of corresponding Meta Materials is 2.218THz, absorptivity 99.84%, response band 234GHz.By comparison, the present invention proposes the center response frequency of multilayer (five layers) metamaterial structure shown in Fig. 2 is 2.338THz, absorptivity 99.9%, response band 348GHz.Fig. 5 result shows, the absorption of multi-layer metamaterial that the present invention proposes be not coating metal 5 or metallic intermediate layer 3 individualism time the simple superposition that absorbs.The absorption frequency of this five layers of Meta Materials is closer to the absorption frequency of metallic intermediate layer 3, but its response band is not only greater than response band during metallic intermediate layer 3 individualism, is also greater than response band during coating metal 5 individualism.So the Response Mechanism of the multi-layer metamaterial that the present invention proposes is different from existing Meta Materials significantly.
Because the multi-layer metamaterial shown in Fig. 2 that the present invention proposes exists Arbitrary Rotation symmetry, namely no matter electromagnetic electric field is along what direction, is identical concerning this multi-layer metamaterial.So the polarised direction of multilayer metamaterial structure to incident electromagnetic wave that the present invention proposes is insensitive, can realize the absorption that polarizes arbitrarily.
Fig. 6 is that the S parameter of multi-layer metamaterial by proposing the present invention extracts the equiva lent impedance real part obtained, and when 2.338THz, the equiva lent impedance real part along Z axis forward-propagating is 0.993, and the equiva lent impedance real part propagated along Z axis negative sense is 0.171.Fig. 6 simulation result shows, the multi-layer metamaterial that the present invention proposes is mated with free space approximate impedance in the becket side of Terahertz absorber, then do not mate with free space impedance in continuous film side, thus in absorption band, realizing reflectivity and transfer rate is minimum simultaneously, absorptivity reaches maximum.
For the multilayer metamaterial structure shown in Fig. 2 that the present invention proposes, except being undertaken except property regulation by means such as traditional change resonance metal figure, metal and dielectric material parameters, importantly, the absorption frequency of multi-layer metamaterial can also be controlled by changing the parameters such as the width of its coating metal 5 and the physical dimension of metallic intermediate layer 3 and the overlapping region of two rings.As shown in Figure 7a, when other parameter remains unchanged, if only change the width of coating metal 5, when its external diameter is fixing, make the ring width w of coating metal 5
1when little by little changing to 2 μm by 6 μm (curve is corresponding in turn to 1 ~ 5), structural change is (in corresponding diagram 2 rectangle C position) as shown in the structural representation of two rings on the right side of Fig. 7 a.This change makes the center response frequency of Meta Materials little by little will be displaced to 2.221THz by 2.512THz.Can find out, along with the ring width w of coating metal 5
1narrow, the response frequency of multi-layer metamaterial will move to low frequency, red shift will occur, and, response band by 396GHz constriction to 252GHz.But, work as w
1when 3 μm ~ 2 μm of range, the amplitude that response frequency reduces will obviously reduce (being reduced to 2.221THz by 2.257THz).This is due to when coating metal 5 width is greater than 3 μm, and coating metal 5 not only produces with layer dielectric 2 and underlying metal 1 and responds, and also produces response with metallic intermediate layer 3 and top dielectric 4.But when coating metal 5 width is further reduced to 2 μm by 3 μm, coating metal 5 is blocked completely by metallic intermediate layer 3, cause the response of coating metal 5 and layer dielectric 2 and underlying metal 1 little, can ignore.Because now coating metal 5 is little with the response of layer dielectric 2 and underlying metal 1, so the displacement amplitude of the response frequency of superstructure will obviously reduce.
When other parameter remains unchanged, if only change the width of the metallic intermediate layer 3 of multi-layer metamaterial, when its external diameter is fixing, make the ring width w of metallic intermediate layer 3
2when little by little changing to 3 μm by 6 μm (curve is corresponding in turn to 7 ~ 10), structural change is as shown in the structural representation of two rings on the right side of Fig. 7 b.This structural change make the center response frequency of multi-layer metamaterial will to high-frequency mobile, occur blue shift (excursion is 2.335 ~ 2.383THz), and the response band of Meta Materials will be broadening to 366GHz(Fig. 7 b by 306GHz).Comparison diagram 7a and 7b, can find out, the width w of metallic intermediate layer 3
2change is weaker than the width w of coating metal 5 significantly on the impact (Fig. 7 b) of multi-layer metamaterial absorption frequency
1impact (Fig. 7 a).
In order to study the Response Mechanism of the multilayer metamaterial structure shown in Fig. 2 proposed by the invention to incident electromagnetic wave further, we simulate when Fig. 2 structure takes following structural parameters: (1) t
1=0.2 μm, t
2=2.8 μm, r
1=10 μm, r
2=11 μm, w
1=4 μm, w
2=5 μm (result is curve 11 in Fig. 8 a); (2) t1=0.2 μm, t2=2.8 μm, r1=10 μm, r2=13 μm, w1=4 μm, w2=3 μm (in Fig. 8 a curve 13); And under (1) with (2) size, remove respectively metallic intermediate layer 3(due to the coating metal 5 under these two kinds of conditions and other structural parameters identical, the absorption curve of relevant Meta Materials is identical, all curves 15 in corresponding diagram 8a), or remove curve 12,14 in coating metal 5(Fig. 8 a) when, relevant Meta Materials is to the absorbing state of incident electromagnetic wave.Be the structural representation of two rings under above-mentioned parameter on the right side of Fig. 8 a, black represent existence, grey represent remove relevant range.As shown in Figure 8 a, when the width generation constriction of metallic intermediate layer 3, the multilayer metamaterial structure shown in Fig. 2 moves to absworption peak direction during coating metal 5 individualism the central absorbent frequency of incident electromagnetic wave.This result illustrates again, and the absorption of multilayer (five layers) Meta Materials that the present invention proposes not is the result that metallic intermediate layer 3 and coating metal 5 produce the simple superposition absorbed.But the result of illustrated multilayer metamaterial structure Whole Response.When the ring width generation constriction of metallic intermediate layer 3, the region that coating metal 5 is blocked is reduced gradually, coating metal 5 is caused to strengthen gradually, so this change causes absorbing the character showing coating metal 5 more and more with the response of layer dielectric 2 and underlying metal 1.
In order to confirm above-mentioned analysis, when we are blocked by metallic intermediate layer 3 completely to coating metal 5 (as shown in the structural representation of two rings on the right side of Fig. 8 b, black represents existence, grey represent remove relevant range) absorbing state of multi-layer metamaterial emulates, result is as shown in Figure 8 b.When coating metal 5 is blocked completely by metallic intermediate layer 3, the absorption peak of Meta Materials is identical with the absorption frequency peak value of (be now top dielectric 4, the Meta Materials that forms of metallic intermediate layer 3, layer dielectric 2, underlying metal 1) when removing coating metal 5, but due to the existence of coating metal 5, cause existing between two rings interacting, add loss.Compared with removing the structure of becket 5 (in Fig. 8 b curve 18), coating metal 5 exists but the response band of the multi-layer metamaterial (in Fig. 8 b curve 16) of being blocked completely by metallic intermediate layer 3 broadening 21GHz slightly, the increase amplitude of response band broadening is only 7.6%, is less than significantly and adopts Fig. 2 parameter (a=36 μm, r
1=10 μm, r
2=11 μm, w
1=4 μm, w
2=5 μm, t
1=0.2 μm, t
2=2.8 μm), coating metal 5 exists and the increase amplitude (51%) of the response band broadening of the multi-layer metamaterial (in Fig. 8 a curve 11) of not blocked completely by metallic intermediate layer 3.
The equivalent-circuit model of the multilayer metamaterial structure shown in Fig. 2 that Fig. 9 proposes for the present invention, the inductance of L1 corresponding to coating metal 5, the inductance of L2 corresponding to metallic intermediate layer 3, C1 to be electric capacity, C2 that coating metal 5 is formed with underlying metal 1 be electric capacity that coating metal 5 formed with metallic intermediate layer 3, C3 are the electric capacity that metallic intermediate layer 3 and underlying metal 1 are formed.
When the multi-layer metamaterial that the present invention proposes coating metal 5 and metallic intermediate layer 3 not overlapping region time, electric capacity C2 between coating metal 5 and metallic intermediate layer 3 is approximately zero, its equivalent electric circuit as shown in figure 9b, there are two resonance frequencys in this circuit model, (a=36 μm, r during corresponding Figure 10 two ring zero lap
1=10 μm, r
2=15 μm, w
1=4 μm, w
2=2 μm, t
1=0.2 μm, t
2=2.8 μm) two absorption peaks.
When the coating metal 5 of the multi-layer metamaterial of the present invention's proposition is blocked completely by metallic intermediate layer 3, coating metal 5 is zero with the electric capacity C1 of underlying metal film 1, its equivalent electric circuit as is shown in fig. 9 c, this circuit only has a resonance frequency, so only have an absworption peak, as Fig. 8 b curve 16 shown in.
For multilayer metamaterial structure (a=36 μm, r shown in Fig. 2 that the present invention proposes
1=10 μm, r
2=11 μm, w
1=4 μm, w
2=5 μm, t
1=0.2 μm, t
2=2.8 μm), its loss mainly concentrates in the middle of top dielectric 4.Figure 11 a is the field function for monitoring using CST, the surface current of the multi-layer metamaterial shown in Fig. 2 proposed by the invention when 2.338THz obtained, can find out: the induced current on this surface is dipole pattern, show the electric resonance response under external electric field excitation.Figure 11 b does cross section, the Electric Field Distribution of cutting plane through the ring heart along the polarised direction (y-axis direction) of electric field, there is very strong electric field between visible two rings.Figure 11 c does cross section through the ring heart along the polarised direction of electric field, the energy loss density of cutting plane, can find out, the dielectric loss of the multi-layer metamaterial that the present invention proposes mainly concentrates in the middle of the top dielectric 4 between coating metal 5 and metallic intermediate layer 3, and its loss density is greater than 10
15w/m
3.By comparison, the maximum of the loss density in the middle of the layer dielectric 2 mediated between layer metal 3 and underlying metal 1 is only 10
14w/m
3, an order of magnitude lower than the loss in top dielectric 4.Figure 11 d is between coating metal 5 and metallic intermediate layer 3, distribute apart from the loss density at the plane place (i.e. medium center between two rings) of the interface 100nm of surface metal ring 5 and top dielectric 4, can find out that the plane distribution of loss is comparatively even.Electric field (electric field along the y-axis direction) drive the lower surface current formed make the A place of Fig. 2 top right plot formation electronics accumulation, be left behind positive charge at the B place of Fig. 2 top right plot.Highfield is produced between two rings.Along with the periodic transformation of incident electromagnetic wave electric field, surface current generating period concussion in ring, thus cause the periodicity forming highfield between coating metal 5 and metallic intermediate layer 3 to be shaken, the concussion of highfield produces strong loss in the middle of top dielectric 4.The loss simulation result of the traditional three layer Meta Materials (Fig. 1) of contrast shown in Figure 12, the dielectric loss of multilayer (five layers) metamaterial structure (Fig. 2) proposed by the invention is more concentrated (to be concentrated in very thin top dielectric 4, as shown in fig. live), advantageously in being applied in the middle of photodetector.
Claims (5)
1. the performance regulate and control method of a multi-layer metamaterial unit structure, multi-layer metamaterial unit structure comprises five layers, be followed successively by coating metal (5), top dielectric (4), metallic intermediate layer (3), layer dielectric (2), underlying metal (1) from top to bottom, wherein, for ring-like, and there is overlapping region and underlapped region between this double layer of metal ring in coating metal (5) and metallic intermediate layer (3), underlying metal (1) is continuous print metal film simultaneously, it is characterized in that
The performance of multi-layer metamaterial unit structure by changing the coating metal (5) of this multi-layer metamaterial and the size of metallic intermediate layer (3) double layer of metal ring, the width in the width of the overlapping region of two rings and the underlapped region of two rings regulates;
Regulate the center response frequency of multi-layer metamaterial unit structure as follows to the method that high-frequency mobile, response band are broadening:
When metallic intermediate layer (3) parameter constant, make that the external diameter of coating metal (5) is constant and its internal diameter reduces, namely the ring width of coating metal (5) is broadening; Or when coating metal (5) parameter constant, make that the external diameter of metallic intermediate layer (3) is constant and its internal diameter increases, i.e. the ring width constriction of metallic intermediate layer (3);
The center response frequency of adjustment multi-layer metamaterial unit structure moves to low frequency, the method for response band constriction is as follows:
When coating metal (5) parameter constant, make that the external diameter of metallic intermediate layer (3) is constant and its internal diameter reduces, namely the ring width of metallic intermediate layer (3) is broadening; Or when metallic intermediate layer (3) parameter constant, make that the external diameter of coating metal (5) is constant and its internal diameter increases, i.e. the ring width constriction of coating metal (5).
2. the performance regulate and control method of multi-layer metamaterial unit structure according to claim 1, it is characterized in that, when coating metal ring (5) is not blocked completely by metallic intermediate layer ring (3), the overlapping region of coating metal ring (5) and metallic intermediate layer ring (3) double layer of metal ring is larger, and it will be more even for being in the energy loss that the electromagnetic wave absorption in the middle of the top dielectric (4) between this double layer of metal ring causes.
3. the performance regulate and control method of multi-layer metamaterial unit structure according to claim 1, is characterized in that, the size of described coating metal (5) is different from metallic intermediate layer (3).
4. the performance regulate and control method of multi-layer metamaterial unit structure according to claim 1, is characterized in that,
Described top dielectric (4) and layer dielectric (2) are polyimide film or silicon nitride film, one in the middle of silicon oxide film, amorphous silicon membrane, silicon oxynitride film, aluminum oxide film, hafnia film, hafnium aluminum oxide film, or their composite membrane
The thickness of top dielectric (4) is 10 nm ~ 10 μm, and the thickness of layer dielectric (2) is 50 nm ~ 40 μm, and top dielectric (4) is 1 ~ 12 with the dielectric constant of layer dielectric (2).
5. the performance regulate and control method of multi-layer metamaterial unit structure according to claim 1, is characterized in that, coating metal (5), metallic intermediate layer (3) and underlying metal (1) are Au or metal A l, Ti, TiN
x , TiSi
x , TiW
x , W, WSi
x , Ni, NiSi
x , Ta, TaN
x , Fe, Pt, Cu, Ag, NiCr
x central one, or their composite membrane, the conductivity of described coating metal (5), metallic intermediate layer (3) and underlying metal (1) is 2 × 10
5~ 1 × 10
8s/m, thickness is 5 ~ 2000 nm.
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