CN103425328A - Optical filter component, preparation method thereof and touch display component - Google Patents
Optical filter component, preparation method thereof and touch display component Download PDFInfo
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- CN103425328A CN103425328A CN2013101137399A CN201310113739A CN103425328A CN 103425328 A CN103425328 A CN 103425328A CN 2013101137399 A CN2013101137399 A CN 2013101137399A CN 201310113739 A CN201310113739 A CN 201310113739A CN 103425328 A CN103425328 A CN 103425328A
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Abstract
The invention relates to an optical filter component and a touch display screen. The optical filter component comprises a base material, a shading matrix layer, a color resist layer and a conducting layer, wherein the shading matrix layer and the color resist layer are arranged on the base material, the shading matrix layer comprises grid lines which cross to form grids, the color resist layer is formed in the grids, the conducting layer is arranged between the base material and the shading matrix layer, the conducting layer comprises first and second conductive patterns which are arranged at intervals to form an induction structure. The optical filter component can achieve touch operation and a filtering function, and the thicknesses of electronic products are reduced.
Description
Technical field
The present invention relates to touch-screen, particularly relate to a kind of optical filter box and preparation method thereof and the touch display screen that uses this optical filter box.
Background technology
Touch-screen is a kind of inductive arrangement that receives the Touching controlling lamp input signal.Touch-screen has given information interaction brand-new looks, is extremely attractive brand-new information interaction equipment.The development of touch screen technology has caused the common concern of domestic and international information medium circle, has become the Chaoyang new high-tech industry that the photoelectricity industry is a dark horse.
At present, having the electronic product that touches Presentation Function includes display screen and is positioned at the touch-screen on display screen, yet, touch-screen as with display screen assembly independently, when for some, realizing the electronic product of man-machine interaction, all need to be ordered according to the size of aobvious screen, assembled again afterwards, the assembling of existing touch-screen and display screen mainly contains two kinds of modes, be that frame pastes and full laminating, it is by the laminating of the edge of touch-screen and display screen that frame pastes, and full laminating is by whole laminating of the upper surface of the lower surface of touch-screen and display screen.
Display screen is as the composite module of polaroid, optical filter, Liquid Crystal Module and TFT etc., its thickness is larger, simultaneously, touch-screen and display screen are member independently, when electronic product is assembled, not only need complicated packaging technology, also can again increase thickness and the weight of electronic product, moreover, many one packaging technologies, just mean and increased the bad probability of product, greatly increase the production cost of product.
Summary of the invention
Based on this, be necessary to provide optical filter box that a kind of thickness is less and preparation method thereof and the touch display screen that uses this optical filter box.
A kind of optical filter box comprises:
Base material;
Be arranged on shading matrix layer and colorama resistance layer on described base material; Described shading matrix layer comprises cross one another ruling, described ruling intersection shaping grid, and described colorama resistance layer is formed in described grid;
Conductive layer, be arranged between described base material and described shading matrix layer, and described conductive layer comprises the first conductive pattern and the second conductive pattern, and described the first conductive pattern and the second conductive pattern space form induction structure.
In embodiment, described the first conductive pattern and described the second conductive pattern comprise the continuous conduction grid therein, and described conductive grid is intersected to form by described conductive thread.
In embodiment, the width of described conductive thread is not more than the width between two adjacent colorama resistance layers therein.
In embodiment, the thickness of described shading matrix layer is not more than the thickness of described colorama resistance layer therein.
In embodiment, the material of described conductive thread is at least one in gold, silver, copper, aluminium, zinc, tin and molybdenum therein.
In embodiment, the line-spacing of described conductive grid is the integral multiple of the ruling distance of described shading matrix therein.
In embodiment, a side of each described the first conductive pattern is arranged with the second conductive pattern of at least two spaces, the described second conductive pattern mutually insulated of each the first conductive pattern both sides therein.
A kind of preparation method of optical filter box comprises step:
Base material is carried out to plasma treatment;
Surface deposition layer of conductive material at described base material, then at described conductive material surface-coated photoresist, exposure, develop, obtain conductive layer after etching, described conductive layer comprises the first conductive pattern and the second conductive pattern, and described the first conductive pattern and the second conductive pattern space form induction structure;
Apply light screening material on described conductive layer, through exposure, remove portion light screening material after developing, obtain the shading matrix layer, and described shading matrix layer comprises cross one another ruling, described ruling intersection shaping grid; And
Deposit chromatic photoresist in the grid of described shading matrix layer, obtain the colorama resistance layer, obtain described optical filter box.
In embodiment, described the first conductive pattern and described the second conductive pattern comprise the continuous conduction grid therein, and described conductive grid is intersected to form by described conductive thread.
A kind of touch display screen, comprise the lower polaroid, TFT electrode, Liquid Crystal Module, public electrode, optical filter box and the upper polaroid that stack gradually, and described optical filter box is the as above described optical filter box of any one.
Above-mentioned optical filter box can be realized touch control operation and optical filter function simultaneously, as an indispensable assembly in display screen, during for display screen, can directly make display screen there is touch controllable function, without assemble again a touch-screen on display screen, not only be conducive to reduce the thickness of electronic product, also greatly saved material and assembly cost simultaneously.
The accompanying drawing explanation
The structural representation of the touch display screen that Fig. 1 is an embodiment;
The structural representation that Fig. 2 is optical filter box shown in Fig. 1;
The structural representation of the conductive layer that Fig. 3 is an embodiment;
The structural representation of the optical filter box that Fig. 4 is an embodiment;
The structural representation of the optical filter box that Fig. 5 is another embodiment;
The structural representation of the conductive thread that Fig. 6 a is an embodiment;
The structural representation of the conductive thread that Fig. 6 b is another embodiment;
The structural representation of the conductive thread that Fig. 7 is an embodiment;
The structural representation of the conductive thread that Fig. 8 is another embodiment;
The structural representation of the conductive thread that Fig. 9 is an embodiment;
The structural representation of the conductive thread that Figure 10 is another embodiment;
The structural representation of the conductive thread that Figure 11 is an embodiment;
The structural representation of the conductive thread that Figure 12 is another embodiment;
The process chart of the optical filter box that Figure 13 is an embodiment.
Embodiment
For above-mentioned purpose of the present invention, feature and advantage can be become apparent more, below in conjunction with accompanying drawing, the specific embodiment of the present invention is described in detail.A lot of details have been set forth in the following description so that fully understand the present invention.But the present invention can implement much to be different from alternate manner described here, those skilled in the art can be in the situation that do similar improvement without prejudice to intension of the present invention, so the present invention is not subject to the restriction of following public concrete enforcement.
It should be noted that, when element is called as " being fixed in " another element, can directly can there be element placed in the middle in it on another element or also.When an element is considered to " connection " another element, it can be directly connected to another element or may have centering elements simultaneously.
Unless otherwise defined, all technology that this paper is used are identical with the implication that belongs to the common understanding of those skilled in the art of the present invention with scientific terminology.The term used in instructions of the present invention herein, just in order to describe the purpose of specific embodiment, is not intended to be restriction the present invention.Term as used herein " and/or " comprise one or more relevant Listed Items arbitrarily with all combinations.
The present invention proposes a kind of optical filter box and uses the touch display screen of this optical filter box.This optical filter box can be realized touch operation and optical filter function, thereby makes touch display screen have the touch Presentation Function.
Refer to Fig. 1, the touch display screen 100 of an embodiment, comprise the lower polaroid 10, TFT electrode 20, Liquid Crystal Module 40, public electrode 50, diaphragm 60, optical filter box 200 and the upper polaroid 70 that stack gradually.
Structure and the function of the lower polaroid 10 of the present embodiment, TFT electrode 20, Liquid Crystal Module 40, public electrode 50, diaphragm 60 and upper polaroid 70 can be identical with existing product, do not repeat them here.
Be appreciated that for what to use backlight be polarized light source, as the OLED polarized light source, without lower polaroid 10, only need upper polaroid 70 to get final product.Diaphragm 60 also can omit.
But touch display screen 100 has tangible operation and polarized light function simultaneously, makes display screen have the touch Presentation Function.Display screen can be the LCDs of straight-down negative or side down light source.
Following emphasis is described optical filter box 200.
Refer to Fig. 2, optical filter box 200 comprises base material 22, shading matrix layer (Black Matrix) 24, colorama resistance layer 26 and conductive layer 28.
Colorama resistance layer 26 is for example, photoresist with coloured dye (red, green, blue), and it can adopt exposure, developing forms.Colorama resistance layer 26 is distributed among the grid of shading matrix layer 24 formation, and colorama resistance layer 26 and shading matrix layer 24 are distributed on the surface of base material 22.In the present embodiment, the chromatic photoresist of colorama resistance layer 26 is the R/G/B chromatic photoresist.From Plane Angle, colorama resistance layer 26 comprises a plurality of chromatic photoresists.
Refer to Fig. 2 and Fig. 3, conductive layer 28 is located between base material 22 and shading matrix layer 24.Conductive layer 28 comprises the first conductive pattern 282 and the second conductive pattern 284, and the first conductive pattern 282 and the second conductive pattern 284 spaces formation induction structures.
Refer to Fig. 3, the first conductive pattern 282 and the second conductive pattern 284 comprise the continuous conduction grid, and conductive grid is intersected to form by conductive thread 27, and the Basic Net ruling of conductive thread 27 can be the regular polygon grid, can be also the random grid figure.The mesh lines space insulation of the first conductive pattern 282 and the second conductive pattern 284.
Refer to Fig. 2, in one embodiment, the width of conductive layer 28 be less than the distance between two adjacent R/G/B chromatic photoresists, it is the grid line live width that the live width of conductive thread 27 can be less than shading matrix layer 24, so that conductive layer 28 is annihilated fully on 24 li, shading matrix layer, and guarantee the first conductive pattern 282 and the second conductive pattern 284 monolithic conductives that insulate in space.In other embodiments, also can only require the distance between two adjacent R/G/B chromatic photoresists of being not more than of conductive layer 28.As shown in Figure 4, the width of conductive layer 28 equals the distance between adjacent two R/G/B chromatic photoresists, and the overall width of conductive thread 27 equals the grid line live width of shading matrix layer 24.
Refer to Fig. 2 and Fig. 4, in one embodiment, the thickness of colorama resistance layer 26 can equal the integral thickness of shading matrix layer 24 and conductive layer 28.The thickness that is preferably colorama resistance layer 26 is greater than the integral thickness of shading matrix layer 24 and conductive layer 28, as shown in Figure 5, can increase like this light emission rate of light.If (, the thickness of colorama resistance layer 26 is less than the integral thickness of shading matrix layer 24 and conductive layer 28, looking that colorama resistance layer 26 is similar to is embedded in shading matrix layer 24, shading matrix layer 24 is lived the light shading, therefore from the colorama resistance layer, 26 light out can only be seen from front, side is all blocked by shading matrix layer 24, is unfavorable for bright dipping).
Therefore, the thickness of colorama resistance layer 26 is less than the transmittance that shading matrix layer 24 is conducive to improve optical filter box.Because conductive layer 28 is covered by shading matrix layer 24 fully, when the illumination therefore projected into from 10 directions of optical filter is mapped to conductive layer 28, even conductive layer 28 is opaque, also can be sheltered from by shading matrix layer 24, the user can not see conductive layer 28 in use, therefore can not affect the user and experience.
Refer to Fig. 6 a and Fig. 6 b, conductive layer 28 comprises the continuous conduction grid, and conductive grid is intersected to form by conductive thread 27, and the Basic Net ruling of conductive thread 27 can be regular polygon or random grid figure.Conductive thread 27 is to obtain required pattern conductive grid by carry out etching and development on shading matrix layer 24.The material of conductive thread be gold, silver, copper, aluminium, zinc, tin or molybdenum at least one.
Refer to Fig. 7 to 9, conductive thread 27 is all in complete embedding shading matrix layers 24, and can not drop on the zone of colorama resistance layer 26 because of part, and causes being removed when making colorama resistance layer 26 and produce the risk of broken string.
The basic grid shape of conductive thread 27 can with the similar fitgures that are shaped as of the chromatic photoresist of colorama resistance layer 26, as shown in Figure 3, conductive thread 27 can be linear pattern, can be also shaped form.The intersection point of conductive thread 27 grids overlaps with the intersection point of shading matrix layer 24.
Preferably, the mesh lines of conductive thread 27 is apart from being the same axially integral multiple of adjacent two distance between center lines of shading matrix layer 24.Here can be divided into three kinds of situations: 1. only for example, on first axial (transverse axis), the mesh lines of conductive thread 27 is apart from being the same axially integral multiple of adjacent two distance between center lines of shading matrix layer 24, at the mesh lines of the conductive thread 27 of X direction apart from the integral multiple that is about a grid live width, as shown in figure 10; 2. only for example, on second axial (longitudinal axis), the mesh lines of conductive thread 27 is apart from being the same axially integral multiple of adjacent two distance between center lines of shading matrix layer 24, at the mesh lines of the conductive thread 27 of y direction apart from the integral multiple that is about a grid live width, as shown in figure 11; 3. first axially and second axially on, the conductive thread mesh lines is apart from being all the same axially integral multiple of adjacent two distance between center lines of shading matrix layer 24, at the mesh lines of the conductive thread 27 of transverse axis and y direction apart from all being about the integral multiple of a grid live width, as shown in figure 12.
Refer to Figure 13, the preparation method of the optical filter box of an embodiment.When conductive layer 28 is the individual layer multipoint configuration, its manufacturing process can be as follows:
S101, base material is carried out to plasma (Plasma) process, remove the spot of described substrate surface, and make described substrate surface ionization.
Plasma treatment can make to increase base material in subsequent process with the cohesive force of colorama resistance layer and shading matrix layer.In the present embodiment, base material 22 is glass baseplate.
S102, in glass baseplate surface deposition layer of conductive material, and then the surface-coated photoresist of conductive material, utilize exposure-development-etching technique to obtain conductive layer 28, conductive layer 28 comprises the first conductive pattern 282 and the second conductive pattern 284; The first conductive pattern 282 and the second conductive pattern 284 spaces form induction structure; The first conductive pattern 282 and the second conductive pattern 284 comprise the continuous conduction grid, and conductive grid is intersected to form by described conductive thread 27.
As plated metal level at the whole face of base material 22 or applying the layer of metal conductive ink.The present embodiment can adopt the conductive silver ink.
S103, on conductive layer 28, apply light screening material, through exposure, remove portion light screening material after developing, obtain shading matrix layer 26, and shading matrix layer 26 comprises cross one another ruling, and ruling intersects the shaping grid.
In the present embodiment, light screening material can be black UV glue or crome metal, if light screening material is black UV glue, adopts exposure-developing technique that the light screening material in the zone of colorama resistance layer 26 correspondences is removed and obtained shading matrix layer 24.If light screening material is crome metal, first be coated with one deck photoresist again through overexposure-development-etching technique, the light screening material in the zone of colorama resistance layer 26 correspondences is removed and obtained shading matrix layer 24.
S104, in the grid of described shading matrix layer, deposit chromatic photoresist, obtain the colorama resistance layer, described shading matrix layer and chromatic photoresist interlayer are every being distributed on described base material.
In the present embodiment, in the regional gradation of removing light screening material, plate/coat the R/G/B chromatic photoresist, obtain colorama resistance layer 26.
The present invention has following advantage:
(1) optical filter box in the present invention can be realized touch control operation and optical filter function simultaneously, as an indispensable assembly in display screen, during for display screen, can directly make display screen there is touch controllable function, without assemble again a touch-screen on display screen, not only be conducive to reduce the thickness of electronic product, also greatly saved material and assembly cost simultaneously.
(2) while preparing optical filter box of the present invention, cover conductive layer on substrate of glass, deposit respectively again light screening material and chromatic photoresist, obtain shading matrix layer and colorama resistance layer, conductive layer is covered by the shading matrix layer, therefore from the illumination that projects into of optical filter direction while being mapped to conductive grid, even conductive grid is opaque, can be sheltered from by the shading matrix layer, so the user can not see conductive grid in use yet, therefore can not affect the user and experience.Can prevent the conductive layer oxidation, guarantee electric conductivity simultaneously.
(3), when conductive pattern is selected metal material, can reduce greatly resistance to reduce the energy consumption of touch-screen.
(4) material that conductive pattern is selected only expands all suitable conductive materials to transparent material by tradition, when conductive pattern is selected metal material, can reduce greatly resistance to reduce the energy consumption of touch-screen.
(5) above-mentioned conductive pattern adopts the metal grill structure, adopts imprint process to be manufactured, the technique compared to traditional ITO film as conductive layer, mesh shape can one step forming, and technique is simple, does not need the expensive device such as sputter, evaporation, yield is high, is applicable to large tracts of land, production in enormous quantities.
(6) conductive pattern adopts the metal grill structure, is convenient to blade coating technique, and produces agglomeration effect while preventing sintering and cause wire fracture.
The above embodiment has only expressed several embodiment of the present invention, and it describes comparatively concrete and detailed, but can not therefore be interpreted as the restriction to the scope of the claims of the present invention.It should be pointed out that for the person of ordinary skill of the art, without departing from the inventive concept of the premise, can also make some distortion and improvement, these all belong to protection scope of the present invention.Therefore, the protection domain of patent of the present invention should be as the criterion with claims.
Claims (10)
1. an optical filter box, is characterized in that, comprising:
Base material;
Be arranged on shading matrix layer and colorama resistance layer on described base material; Described shading matrix layer comprises cross one another ruling, described ruling intersection shaping grid, and described colorama resistance layer is formed in described grid;
Conductive layer, be arranged between described base material and described shading matrix layer, and described conductive layer comprises the first conductive pattern and the second conductive pattern, and described the first conductive pattern and the second conductive pattern space form induction structure.
2. optical filter box according to claim 1, is characterized in that, described the first conductive pattern and described the second conductive pattern comprise the continuous conduction grid, and described conductive grid is intersected to form by described conductive thread.
3. optical filter box according to claim 2, is characterized in that, the width of described conductive thread is not more than the width between two adjacent colorama resistance layers.
4. optical filter box according to claim 1, is characterized in that, the thickness of described shading matrix layer is not more than the thickness of described colorama resistance layer.
5. optical filter box according to claim 1, is characterized in that, the material of described conductive thread is at least one in gold, silver, copper, aluminium, zinc, tin and molybdenum.
6. optical filter box according to claim 1, is characterized in that, the line-spacing of described conductive grid is the integral multiple of the ruling distance of described shading matrix.
7. optical filter box according to claim 1, is characterized in that, a side of each described the first conductive pattern is arranged with the second conductive pattern of at least two spaces, the described second conductive pattern mutually insulated of each the first conductive pattern both sides.
8. the preparation method of an optical filter box, is characterized in that, comprises step:
Base material is carried out to plasma treatment;
Surface deposition layer of conductive material at described base material, then at described conductive material surface-coated photoresist, exposure, develop, obtain conductive layer after etching, described conductive layer comprises the first conductive pattern and the second conductive pattern, and described the first conductive pattern and the second conductive pattern space form induction structure;
Apply light screening material on described conductive layer, through exposure, remove portion light screening material after developing, obtain the shading matrix layer, and described shading matrix layer comprises cross one another ruling, described ruling intersection shaping grid; And
Deposit chromatic photoresist in the grid of described shading matrix layer, obtain the colorama resistance layer, obtain described optical filter box.
9. the preparation method of optical filter box according to claim 8, is characterized in that, described the first conductive pattern and described the second conductive pattern comprise the continuous conduction grid, and described conductive grid is intersected to form by described conductive thread.
10. a touch display screen, is characterized in that, comprises the lower polaroid, TFT electrode, Liquid Crystal Module, public electrode, optical filter box and the upper polaroid that stack gradually, and described optical filter box is optical filter box as described as claim 1～7 any one.
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Effective date of registration: 20170630 Address after: 330000 Jiangxi city of Nanchang Province Economic and Technological Development Zone HUANGJIAHU Road Applicant after: Nanchang OFilm Tech. Co.,Ltd. Address before: North to the East, 330013 in Jiangxi province Nanchang city Nanchang economic and technological development zones clove road Longtan ditch Applicant before: Nanchang Ofilm Display Tech Co.,Ltd. |
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