CN103320825B - Method for manufacturing high-density large-scale micro-nano-structure array - Google Patents
Method for manufacturing high-density large-scale micro-nano-structure array Download PDFInfo
- Publication number
- CN103320825B CN103320825B CN201310224893.3A CN201310224893A CN103320825B CN 103320825 B CN103320825 B CN 103320825B CN 201310224893 A CN201310224893 A CN 201310224893A CN 103320825 B CN103320825 B CN 103320825B
- Authority
- CN
- China
- Prior art keywords
- micro
- array
- conduit
- light electrolysis
- nano
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Abstract
The invention discloses a method for manufacturing a high-density large-scale micro-nano-structure array. The method comprises the steps that: (1) a low-density micro-electrolysis catheter array template composed of N*M micro-electrolysis catheters is prepared; (2) the low-density micro-electrolysis catheter array template prepared in the step (1) is arranged on a micro-electrolytic deposition system; the electro-deposition growth of the micro-electrolysis catheters on a conductive substrate are controlled, such that a high-density small-scale micro-nano-structure array with n micro-nano-structures on a row with a space of d1 between adjacent micro-nano-structures and with m micro-nano-structures on a column with a space of d2 between adjacent micro-nano-structures is formed. Micro-electrolysis catheters on the entire N*M micro-electrolysis catheter array work synchronically, such that the high-density large-scale micro-nano-structure array formed by (N*N)*(m*M) micro-nano-structures can be manufactured. With the method, the high-density large-scale micro-nano-structure array can be manufactured with low cost and high efficiency.
Description
Technical field
The present invention relates to micro-nano material and manufacture field, is specifically a kind of method manufacturing high-density large-scale micro-nano-structurearray array.
Background technology
Micro-nano structure array is the orderly material structure of the arrangement of a kind of micron or nanoscale, material can be metal, pottery, semi-conductor or organic materials, there is specific electricity, magnetics, optics and mechanical characteristic and function, be applied to various unicircuit and photoelectric chip manufacture, test and medical probe field.The micro-nano structure array of indication of the present invention refers in particular to the metal, semi-conductor or the ceramic structure that planar arrange orderly different shape.
Microcell electrolytic deposition technology is a kind of micro-nano technology technology based on Scanning probe technique (SPT), and its principle adopts bore at the light electrolysis conduit of micro-nano size as the supply source of electrolytic solution, realizes the growth of microcell electrochemical deposition.Microcell electrowinning systems is made up of computer and circuit amplifier, piezoelectric bar (or precision motor and drive shaft), light electrolysis conduit and the electrolytic solution filled in light electrolysis conduit.Computer and circuit amplifier provide and control three road voltages and export, every road voltage driven piezoelectric bar (or precision motor), change the light electrolysis conduit that three road voltage output values just can make to be fixed on three piezoelectric bar (or motor drive shaft) point of intersection of X, Y, Z axis and do three-dimensional motion, the current potential simultaneously controlling electrolytic solution in light electrolysis conduit carries out the microcell galvanic deposit of material, realizes the deposition growth of three-dimensional micro-nano structure; Principle of work is similar to 3D printer, can referenced patent US7955486.
Microcell electrolytic deposition technology is owing to combining the similar Piezoelectric Control Technology of SPT, high precision control can be carried out at three-dimensional space to Material growth position (i.e. light electrolysis conduit outlet point), as: the nano metal post etc. growing ordered arrangement on the silicon substrate of conduction.Therefore, microcell electrolytic deposition technology is that a kind of three-dimensional straight of novelty writes the micro-nano structure growing technology that declines, and can be used for the micro-nano structure array manufacturing various complicated shape.
Light electrolysis conduit is the key part of microcell electrowinning systems (have employed the system of microcell electrolytic deposition technology), the light electrolysis conduit of current use is the common mono-layer tube of glass-pulling, will by microcell electrolytic deposition technical application, key improves the efficiency that this technology manufactures high-density large-scale micro-nano-structurearray array.Practical high-density large-scale micro-nano-structurearray array (as high-density probe etc.), often comprise tens thousand of above monomer micro-nano structure, adopt single light electrolysis conduit to be engaged in this large array manufacture, efficiency and yield rate are all very low.And directly adopt and to make light electrolysis conduit template with Target Aerial Array high-density in proportion large array light electrolysis conduit and carry out disposable synchronous forming and manufacture high-density large-scale micro-nano-structurearray array, although manufacture efficiency very high (once can complete the manufacture of whole array), the technology and a cost difficult problem that manufacture high-density large array light electrolysis conduit template itself can be run into.
Summary of the invention
Technical problem to be solved by this invention is, overcomes the shortcoming of above prior art: provide a kind of low cost, the method for high efficiency manufacture high-density large-scale micro-nano-structurearray array.
Technical solution of the present invention is as follows:
Manufacture a method for high-density large-scale micro-nano-structurearray array, it comprises the following steps:
1) a low density light electrolysis conduit array template be made up of N × M light electrolysis conduit is prepared, described light electrolysis conduit array is rectangular array, described N is light electrolysis conduit number horizontally-arranged in light electrolysis conduit array, described M is the light electrolysis conduit number of tandem in light electrolysis conduit array, and described N and M is the integer between 3-500; In described low density light electrolysis conduit array template, the spacing of horizontally-arranged adjacent light electrolysis conduit is D1, and the spacing of the adjacent light electrolysis conduit of tandem is D2;
2) by the low density light electrolysis conduit array model sheetinstallat prepared in step 1) on microcell electrowinning systems, microcell electrowinning systems is by each light electrolysis conduit synchronous electric deposition growing micro-nano structure on electrically-conductive backing plate in low density light electrolysis conduit array template described in computer control, control each light electrolysis conduit and on electrically-conductive backing plate, complete a horizontally-arranged n micro-nano structure and the spacing of adjacent micro-nano structure is d1, tandem m micro-nano structure and the spacing of adjacent micro-nano structure are the deposition growth of the high density, compact micro-nano structure array of d2, light electrolysis conduit synchronous working on whole N × M light electrolysis conduit array, the high-density large-scale micro-nano-structurearray array be made up of the individual micro-nano structure of (n × N) × (m × M) can be obtained, described high-density large-scale micro-nano-structurearray array is spliced by N × M high density, compact micro-nano structure array, described high density, compact micro-nano structure array is rectangular array, described n is the horizontally-arranged number of micro-nano structure in high density, compact micro-nano structure array, described m is the tandem number of micro-nano structure in high density, compact micro-nano structure array, described n and m is the integer between 1-100, described D1 is the positive integer times of d1, and described D2 is the positive integer times of d2, described d1 and d2 scale size is 5nm-20 μm.
As preferably, described D1 be the n of d1 doubly, described D2 be the m of d2 doubly.
Described low density light electrolysis conduit array template is that N × M light electrolysis conduit assembles or be directly made of one piece.
As preferably, the exit inside diameter of described light electrolysis conduit is 5nm-100 μm.
Beneficial effect of the present invention is: adopt low density light electrolysis conduit array template of the present invention to manufacture high-density large-scale micro-nano-structurearray array in conjunction with microcell electrolytic deposition technology, compared with being engaged in this high-density large-scale micro-nano-structurearray array with the single light electrolysis conduit of employing, the manufacture efficiency of array of structures can be increased substantially; The present invention adopts low density light electrolysis conduit array template, compare and directly use high-density large-scale micro-nano-structurearray array template in proportion as processing template, manufacture difficulty and cost reduce all greatly, and each the light electrolysis conduit in light electrolysis conduit array is when growing n × m micro-nano structure array, different electrolytic solution can be filled with, thus further expand material complicacy and the functional diversity of micro-nano structure array.
Accompanying drawing explanation
Fig. 1 is the structural representation of light electrolysis conduit of the present invention.
Fig. 2 is mounting board structure schematic diagram in the embodiment of the present invention.
Fig. 3 is low density light electrolysis conduit array formwork structure schematic diagram of the present invention.
Fig. 4 is micro-nano structure array of the present invention and electrically-conductive backing plate schematic diagram.
Fig. 5 is high-density large-scale micro-nano-structurearray array of the present invention and electrically-conductive backing plate schematic diagram.
As shown in the figure: 1, light electrolysis conduit, 1.1, light electrolysis conduit outlet, 2, installation base plate, 3, open holes, 4, electrically-conductive backing plate, 5, micro-nano structure.
Embodiment
With specific embodiment, the present invention is described in further details below, but the present invention is not only confined to following specific embodiment.
Embodiment one
Manufacture the high-density large-scale micro-nano-structurearray array be made up of the individual micro-nano structure of (n × N) × (m × M), described N and M is the integer between 3-500, described n and m is the integer between 1-100, described N is light electrolysis conduit number horizontally-arranged in light electrolysis conduit array, and described M is the light electrolysis conduit number of tandem in light electrolysis conduit array; In described high-density large-scale micro-nano-structurearray array, the spacing of horizontally-arranged adjacent micro-nano structure is d1, and the spacing of the adjacent micro-nano structure of tandem is d2, and described d1 and d2 scale size is 5nm-20 μm:
1) composition graphs 1-Fig. 5, an installation base plate 2 with Plane Installation hole rectangular array is provided, the quantity of described Plane Installation hole rectangular array midplane open holes 3 equals N × M, in the rectangular array of described Plane Installation hole, the spacing of horizontally-arranged adjacent open holes 3 is D1, and the spacing of the adjacent open holes 3 of tandem is D2; The thickness of described installation base plate 2 is 10 μm of-5mm, and the mode that described installation base plate 2 can be processed by the precision optical machinery working method of prior art or microelectromechanical systems (MEMS) prepares, and described D1 is n times of d1, and described D2 is m times of d2; There is provided N × M light electrolysis conduit 1, described light electrolysis conduit outlet 1.1 internal diameter is 5nm-100 μm; Vertical insertion light electrolysis conduit 1 in the Plane Installation hole 3 of each installation base plate 2, regulate all light electrolysis conduit outlet 1.1 ends to be in same level, and a low density light electrolysis conduit array template be made up of N × M light electrolysis conduit made by the fixing light electrolysis conduit 1 of bonding on installation base plate 2.
2) by the low density light electrolysis conduit array model sheetinstallat prepared in step 1) on microcell electrowinning systems, microcell electrowinning systems is by each light electrolysis conduit 1 synchronous electric deposition growing micro-nano structure 5 on electrically-conductive backing plate in low density light electrolysis conduit array template described in computer control, and by accurate step motor type of drive or Piezoelectric Driving mode precise hard_drawn tuhes each light electrolysis conduit completes a horizontally-arranged n micro-nano structure on electrically-conductive backing plate and the spacing of adjacent micro-nano structure is d1, tandem m micro-nano structure and the spacing of adjacent micro-nano structure are the deposition growth of the high density, compact micro-nano structure array of d2, light electrolysis conduit synchronous working on whole N × M light electrolysis conduit array, the high-density large-scale micro-nano-structurearray array be made up of the individual micro-nano structure of (n × N) × (m × M) can be obtained, described high-density large-scale micro-nano-structurearray array is equivalent to be spliced by N × M high density, compact micro-nano structure array, described high density, compact micro-nano structure array is rectangular array, described n is the horizontally-arranged number of micro-nano structure in high density, compact micro-nano structure array, described m is the tandem number of micro-nano structure in high density, compact micro-nano structure array, precision optical machinery working method or microelectromechanical systems (MEMS) processing mode can be adopted directly to process low density light electrolysis conduit array template in obtained step 1).
Embodiment two
Manufacture the high-density large-scale column micro-nano structure rectangular array be made up of (3 × 3) × (1 × 3) individual column micro-nano structure, wherein in tandem, the spacing of adjacent column micro-nano structure is 2 μm, and the spacing of horizontally-arranged middle adjacent column micro-nano structure is 1 μm:
1) composition graphs 1-Fig. 5, an installation base plate 2 with Plane Installation hole rectangular array is provided, the quantity of described Plane Installation hole rectangular array midplane open holes 3 equals 3 × 3(that is 9), wherein, in tandem, the spacing of adjacent open holes 3 is set to 2 μm, in horizontally-arranged, the spacing of adjacent open holes 3 is set to 3 μm, the thickness of described installation base plate 2 is 350 μm, the mode that described installation base plate 2 is processed by the microelectromechanical systems (MEMS) of prior art prepares, there is provided 3 × 3 light electrolysis conduit 1(i.e. 9 light electrolysis conduits 1), the internal diameter of described light electrolysis conduit outlet 1.1 is 200nm, vertical insertion light electrolysis conduit 1 in the Plane Installation hole 3 of each installation base plate 2, regulate all light electrolysis conduit outlet 1.1 ends to be in same level, and a low density light electrolysis conduit array template be made up of 3 × 3 light electrolysis conduits made by the fixing light electrolysis conduit 1 of bonding on installation base plate 2.
2) by the low density light electrolysis conduit array model sheetinstallat prepared in step 1) on microcell electrowinning systems, microcell electrowinning systems is by each light electrolysis conduit 1 synchronous electric deposition growing column micro-nano structure 5 on electrically-conductive backing plate in low density light electrolysis conduit array template described in computer control, first on electrically-conductive backing plate, synchronous electric deposition growing goes out 3 × 3 column micro-nano structure rectangular arrays (as shown in Figure 4) corresponding with low density light electrolysis conduit array template, secondly Piezoelectric Driving mode precise hard_drawn tuhes low density light electrolysis conduit array template is passed through after the distance of transverse positional displacement 1 μm, on electrically-conductive backing plate, synchronous electric deposition growing goes out 3 × 3 column micro-nano structure rectangular arrays corresponding with low density light electrolysis conduit array template again, finally continue through Piezoelectric Driving mode precise hard_drawn tuhes low density light electrolysis conduit array template and keep consistent with offset direction last time in horizontal position, again offset the distance of 1um, on electrically-conductive backing plate, synchronous electric deposition growing goes out 3 × 3 column micro-nano structure rectangular arrays corresponding with low density light electrolysis conduit array template again, the spacing of the adjacent column micro-nano structure of final obtained tandem is 2um, the spacing of horizontally-arranged adjacent column micro-nano structure is high-density large-scale column micro-nano structure rectangular array (as shown in Figure 5) be made up of (3 × 3) × (1 × 3) individual column micro-nano structure of 1um.The present embodiment just simply illustrates, do not represent described low density light electrolysis conduit array template and be only limited to transverse excursion, it can also produce more massive array in conjunction with vertical misalignment.
Claims (4)
1. manufacture a method for high-density large-scale micro-nano-structurearray array, it is characterized in that: it comprises the following steps:
1) a low density light electrolysis conduit array template be made up of N × M light electrolysis conduit is prepared, described light electrolysis conduit array is rectangular array, described N is light electrolysis conduit number horizontally-arranged in light electrolysis conduit array, described M is the light electrolysis conduit number of tandem in light electrolysis conduit array, and described N and M is the integer between 3-500; In described low density light electrolysis conduit array template, the spacing of horizontally-arranged adjacent light electrolysis conduit is D1, and the spacing of the adjacent light electrolysis conduit of tandem is D2;
2) by step 1) in preparation low density light electrolysis conduit array model sheetinstallat on microcell electrowinning systems, microcell electrowinning systems is by each light electrolysis conduit synchronous electric deposition growing micro-nano structure on electrically-conductive backing plate in low density light electrolysis conduit array template described in computer control, control each light electrolysis conduit and on electrically-conductive backing plate, complete a horizontally-arranged n micro-nano structure and the spacing of adjacent micro-nano structure is d1, tandem m micro-nano structure and the spacing of adjacent micro-nano structure are the deposition growth of the high density, compact micro-nano structure array of d2, light electrolysis conduit synchronous working on whole N × M light electrolysis conduit array, the high-density large-scale micro-nano-structurearray array be made up of the individual micro-nano structure of (n × N) × (m × M) can be obtained, described high-density large-scale micro-nano-structurearray array is spliced by N × M high density, compact micro-nano structure array, described high density, compact micro-nano structure array is rectangular array, described n be in high density, compact micro-nano structure array micro-nano structure each horizontally-arranged in number, described m is the number of micro-nano structure in each tandem in high density, compact micro-nano structure array, described n and m is the integer between 1-100, described D1 is the positive integer times of d1, and described D2 is the positive integer times of d2, described d1 and d2 scale size is 5nm-20 μm, and in described high-density large-scale micro-nano-structurearray array, the spacing of horizontally-arranged adjacent micro-nano structure is d1, and the spacing of the adjacent micro-nano structure of tandem is d2, described n is not equal to 1, m and is not equal to 1.
2. the method for manufacture high-density large-scale micro-nano-structurearray array according to claim 1, is characterized in that: described D1 is n times of d1, and described D2 is m times of d2.
3. the method for manufacture high-density large-scale micro-nano-structurearray array according to claim 1, is characterized in that: described low density light electrolysis conduit array template is that N × M light electrolysis conduit assembles or be directly made of one piece.
4. the method for manufacture high-density large-scale micro-nano-structurearray array according to claim 1, is characterized in that: the exit inside diameter of described light electrolysis conduit is 5nm-100 μm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310224893.3A CN103320825B (en) | 2013-06-06 | 2013-06-06 | Method for manufacturing high-density large-scale micro-nano-structure array |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310224893.3A CN103320825B (en) | 2013-06-06 | 2013-06-06 | Method for manufacturing high-density large-scale micro-nano-structure array |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103320825A CN103320825A (en) | 2013-09-25 |
| CN103320825B true CN103320825B (en) | 2015-07-08 |
Family
ID=49189854
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201310224893.3A Active CN103320825B (en) | 2013-06-06 | 2013-06-06 | Method for manufacturing high-density large-scale micro-nano-structure array |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN103320825B (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104674313B (en) * | 2015-02-10 | 2017-05-31 | 华南理工大学 | A kind of electro-plating method and device that array micro-nano structure is prepared on coated metal surface |
| CN107177867B (en) * | 2017-05-08 | 2019-01-11 | 南京航空航天大学 | Crack the layering electrocasting method of rectangular waveguide |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101844272A (en) * | 2010-01-27 | 2010-09-29 | 长春理工大学 | Method and system for manufacturing self-cleaning surface structure by adopting laser interference photolithography technology |
| CN101980083A (en) * | 2010-09-13 | 2011-02-23 | 长春理工大学 | Method and system for preparing filter membrane mesh structure by laser interference photoetching technology |
| CN102205944A (en) * | 2011-04-19 | 2011-10-05 | 北京化工大学 | Device and method for manufacturing micro-nano structure |
| CN102766892A (en) * | 2012-08-10 | 2012-11-07 | 重庆绿色智能技术研究院 | Micro-nano processing method and device |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7955486B2 (en) * | 2007-02-20 | 2011-06-07 | The Board Of Trustees Of The University Of Illinois | Electrochemical deposition platform for nanostructure fabrication |
-
2013
- 2013-06-06 CN CN201310224893.3A patent/CN103320825B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101844272A (en) * | 2010-01-27 | 2010-09-29 | 长春理工大学 | Method and system for manufacturing self-cleaning surface structure by adopting laser interference photolithography technology |
| CN101980083A (en) * | 2010-09-13 | 2011-02-23 | 长春理工大学 | Method and system for preparing filter membrane mesh structure by laser interference photoetching technology |
| CN102205944A (en) * | 2011-04-19 | 2011-10-05 | 北京化工大学 | Device and method for manufacturing micro-nano structure |
| CN102766892A (en) * | 2012-08-10 | 2012-11-07 | 重庆绿色智能技术研究院 | Micro-nano processing method and device |
Non-Patent Citations (5)
| Title |
|---|
| 基于SPM的微等离子无掩模扫描刻蚀加工方法的研究;文莉;《中国博士学位论文全文数据库 工程科技I辑》;20130115;B022-16 * |
| 崔铮.扫描探针加工技术.《微纳米加工技术及其应用 第二版》.高等教育出版社,2009,第204-221页. * |
| 微纳米加工技术及其应用综述;崔铮;《物理》;20060131(第1期);第34-39页 * |
| 扫描探针加工技术的新进展及扫描等离子体加工技术的研究;王海等;《微纳电子技术》;20030831(第7/8期);第177-180和185页 * |
| 电化学扫描探针显微镜在表面微/纳米加工的应用;汤儆等;《微纳电子技术》;20030831(第7/8期);第192-196页 * |
Also Published As
| Publication number | Publication date |
|---|---|
| CN103320825A (en) | 2013-09-25 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN100513300C (en) | Micro nano structure direct-writing device | |
| Han et al. | Self-powered velocity and trajectory tracking sensor array made of planar triboelectric nanogenerator pixels | |
| CN103668367B (en) | The manufacture method of micro-nano structure array fin | |
| CN103973159B (en) | Miniature Inchworm type Piezoelectric Driving rotary joint mechanism | |
| CN103320825B (en) | Method for manufacturing high-density large-scale micro-nano-structure array | |
| CN103056463B (en) | Manufacturing method for carbon nano tube tool electrode for micro electrochemical machining and multi-functional working tanks | |
| CN110016696B (en) | Micro electroforming device based on photoinduced conductive electrode plate and micro electroforming method thereof | |
| CN101544351B (en) | Low-dimensional nanophase material high-flexibility assembling chip and application method | |
| CN106517083B (en) | A kind of micro channel array and preparation method thereof | |
| CN110093641A (en) | A kind of micro-structure is without magnetic property method and system | |
| CN103030098A (en) | Method for manufacturing large-area nano gap electrode arrays in parallel | |
| Lai et al. | High precision electrochemical micromachining based on confined etchant layer technique | |
| CN100395374C (en) | Three-dimensional microstructure electroforming method and apparatus | |
| CN103613064A (en) | Flat-plate-restraint evaporation-induced nanoparticle line self-assembly method | |
| CN101497428A (en) | Method for arranging nano-wire array using electrostatic filature | |
| Bang et al. | Assembly and densification of nanowire arrays via shrinkage | |
| CN201386022Y (en) | Low-dimensional nanostructure material assembled chip based on three-dimensional controllable dielectrophoresis | |
| CN106405692B (en) | A kind of preparation technology of electric field induction fly's-eye lens multilevel hierarchy | |
| CN103305884B (en) | Manufacture the method for micro-nano coaxial tube | |
| CN103066170B (en) | A kind of manufacture method of nano patterned substrate | |
| CN107385504B (en) | The Constraints etching system of array electrode | |
| CN105502278A (en) | Cavity film and manufacturing method thereof | |
| CN103754820B (en) | Based on sound field synthesis and the parallel operation device of ultrasonic transducer annular array | |
| CN111748829B (en) | Three-beat-type liquid-based metal ion source electrodeposition micro additive manufacturing method | |
| CN202007125U (en) | System for batch preparation of three-dimensional microstructures with large aspect ratio |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant |