CN103276368A - Particle pollution monitoring system and chemical vapor deposition device - Google Patents
Particle pollution monitoring system and chemical vapor deposition device Download PDFInfo
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- CN103276368A CN103276368A CN2013101568718A CN201310156871A CN103276368A CN 103276368 A CN103276368 A CN 103276368A CN 2013101568718 A CN2013101568718 A CN 2013101568718A CN 201310156871 A CN201310156871 A CN 201310156871A CN 103276368 A CN103276368 A CN 103276368A
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- particle contamination
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- sampler valves
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Abstract
The invention provides a particle pollution monitoring system for monitoring a particle pollution situation of a monitored object. The monitored object comprises an air-exhausting apparatus. The particle pollution monitoring system comprises at least one particle counter apparatus, wherein the particle counter apparatus is connected with the air-exhausting apparatus. In the particle pollution monitoring system provided by the invention, the particle counter apparatus is connected with the air-exhausting apparatus of the monitored object, particles of the monitored object can be monitored at any time, and the particle pollution can be found out timely.
Description
Technical field
The present invention relates to the ic manufacturing technology field, particularly a kind of particle contamination supervisory system and chemical vapor depsotition equipment.
Background technology
As everyone knows, in the ic manufacturing process, particle contamination is the major cause that causes defective, influences yield.And along with the development of integrated circuit fabrication process, the size of wafer is also increasing, and present 12 cun wafers have become main flow, this means that the cost of single-wafer is also more and more higher.In case because particle contamination causes wafer loss, the loss that causes is also bigger.For reducing the loss, generally need carry out the monitoring of particle contamination in manufacturing processed, in case find that particle contamination is serious, can in time take measures, avoid occurring large batch of scrapping.
At present, the monitoring to particle contamination mainly contains dual mode: on-line monitoring and monitored off-line.On-line monitoring refers at production link special defects detection equipment is set, and detects half-finished number of defects, reflects particle contamination situation in the unicircuit producing apparatus with this.Monitored off-line is the monitoring piece substitute products with special recyclable utilization, use the number of defects on the special defects detection equipment detection monitoring sheet, reflect particle contamination situation in the unicircuit producing apparatus with this, monitored off-line is regularly carried out usually, for example detects once every day.
But these two kinds of monitor modes have and detect untimely and risk omission.This is to detect time difference of existence because particle contamination problems occurs from the unicircuit producing apparatus in monitoring.During this period of time, often there has been a large amount of products contaminated, existed to detect untimely risk.And, to consider the process time and detect cost, on-line monitoring and monitored off-line generally all can only be taked the mode inspected by random samples, and the risk of omission is very high.Such as, chemical vapor depsotition equipment, chemical vapor depsotition equipment have a plurality of deposition chambers, if the detection frequency of particle contamination is to inspect a deposition chambers every day by random samples, well imagine that particle contamination appears in one of them deposition chambers does not but have the risk of discovery in time very high.
Summary of the invention
The object of the present invention is to provide a kind of particle contamination supervisory system and chemical vapor depsotition equipment, to solve the problem that in time to find particle contamination in the prior art.
For solving the problems of the technologies described above, the invention provides a kind of particle contamination supervisory system, be used for the particle contamination situation of the monitored object of monitoring, described monitored object comprises an air extractor, described particle contamination supervisory system comprises:
At least one particle counting device;
Wherein, described particle counting device is connected with described air extractor.
Preferably, in described particle contamination supervisory system, described particle counting device comprises main frame, alpha counter, sampling conduit and Sampler valves;
Wherein, an end of described sampling conduit is connected with described alpha counter, and the other end of described sampling conduit is connected with described air extractor by described Sampler valves;
Described main frame links to each other with Sampler valves with alpha counter respectively, is used for the described alpha counter of control and Sampler valves.
Preferably, in described particle contamination supervisory system, the quantity of described sampling conduit and the Sampler valves all quantity with monitored object is identical.
Preferably, in described particle contamination supervisory system, described Sampler valves is electromagnetic valve.
Preferably, in described particle contamination supervisory system, described air extractor comprises off-gas pump, evacuating valve and pump-line;
Wherein, described off-gas pump is connected with pump-line, and described evacuating valve is arranged on the pump-line.
Preferably, in described particle contamination supervisory system, described monitored object is the deposition chambers of chemical vapor depsotition equipment and/or the transfer chamber of chemical vapor depsotition equipment.
The present invention also provides a kind of chemical vapor depsotition equipment, and described chemical vapor depsotition equipment comprises:
Deposition chambers, transfer chamber, Device Host and particle contamination supervisory system;
Wherein, described deposition chambers and transfer chamber are provided with air extractor, and described particle contamination supervisory system comprises at least one particle counting device, and described particle counting device is connected with Device Host with described air extractor.
Preferably, in described chemical vapor depsotition equipment, described particle counting device comprises alpha counter, sampling conduit and Sampler valves;
Wherein, an end of described sampling conduit is connected with alpha counter, and the other end of described sampling conduit is connected with described air extractor by Sampler valves.
Preferably, in described chemical vapor depsotition equipment, the quantity of described sampling conduit is identical with the quantity of Sampler valves;
Preferably, in described chemical vapor depsotition equipment, described Sampler valves is electromagnetic valve.
Preferably, in described chemical vapor depsotition equipment, described air extractor comprises off-gas pump, evacuating valve, pump-line and throttle;
Wherein, described off-gas pump is connected with pump-line, and described evacuating valve and throttle all are arranged on the pump-line, and described throttle is arranged between evacuating valve and the Sampler valves.
Description of drawings
Fig. 1 is the structural representation of a kind of particle contamination supervisory system of the embodiment of the invention;
Fig. 2 is a kind of part-structure synoptic diagram that adopts the chemical vapor depsotition equipment of particle contamination supervisory system of the embodiment of the invention.
Embodiment
Below in conjunction with the drawings and specific embodiments particle contamination supervisory system and the chemical vapor depsotition equipment that the present invention proposes is described in further detail.According to the following describes and claims, advantages and features of the invention will be clearer.It should be noted that accompanying drawing all adopts very the form of simplifying and all uses non-ratio accurately, only in order to convenient, the purpose of the aid illustration embodiment of the invention lucidly.
[embodiment one]
Please refer to Fig. 1, Figure 1 shows that the structural representation of a kind of particle contamination supervisory system of the embodiment of the invention.As shown in Figure 1, described particle contamination supervisory system 1 is used for the particle contamination situation of the monitored object of monitoring, and described monitored object comprises an air extractor, and described particle contamination supervisory system 1 comprises:
At least one particle counting device 10;
Wherein, described particle counting device 10 is connected with described air extractor 20.
Concrete, described particle counting device 10 comprises main frame 11, alpha counter 12, sampling conduit 13 and Sampler valves 14.Wherein, main frame 11 is connected with Sampler valves 14 with alpha counter 12 respectively by data connecting line, is used for control alpha counter 12 and Sampler valves 14.The air extractor 20 that is connected with particle counting device 10 comprises off-gas pump 21, evacuating valve 22 and pump-line 23.Wherein, described off-gas pump 21 is connected with pump-line 23, and described evacuating valve 22 is arranged on the pump-line 23, and between off-gas pump 21 and Sampler valves 14.One end of described sampling conduit 13 is connected with alpha counter 12, and the other end is connected with pump-line 23 in the air extractor 20 by Sampler valves 14.
A monitored object generally needs a sampling conduit 13, a Sampler valves 14, and a plurality of monitored object then need many sampling conduits 13, a plurality of Sampler valves 14, and all the quantity with monitored object is identical for the quantity of sampling conduit 13 and Sampler valves 14.Described Sampler valves 14 adopts electromagnetic valve, and each Sampler valves 14 is subjected to main frame 11 controls, can open or close separately.
If monitored each air extractor 20 connects a Sampler valves 14 and sampling conduits 13 to liking a plurality of unicircuit producing apparatuss with air extractor 20, all sampling conduits 13 can be connected with an alpha counter 12.Thus, particle contamination supervisory system 1 just can be monitored a plurality of unicircuit producing apparatuss by an alpha counter 12.Because each Sampler valves 14 can be controlled separately, the unicircuit producing apparatus in the particle contamination supervisory system 1 can be realized independently particle contamination monitoring.
Described monitored object comprises the deposition chambers of chemical vapor depsotition equipment and/or the transfer chamber of chemical vapor depsotition equipment, the air extractor 20 of each deposition chambers and/or transfer chamber is connected with a sampling conduit 13 with a Sampler valves 14 respectively, and sampling conduit 13 all is connected with an alpha counter 12.Thus, particle contamination supervisory system 1 just can be monitored a plurality of deposition chambers and/or transfer chamber by an alpha counter 12.
The unicircuit producing apparatus need carry out particle contamination when monitoring, detected result be started working and be obtained immediately to particle contamination supervisory system 1 can at any time, does not need product or monitoring sheet to produce or flow.The process of particle contamination monitoring is specific as follows: at first, open the evacuating valve 22 of monitored object, start off-gas pump 21; Then, open the Sampler valves 14 that is connected with monitored object by main frame 11; Then, 12 work of main frame 11 control alpha counters, and the detected result of Collection and analysis alpha counter 12.
If monitored object does not arrange air extractor 20, such as the cleaning equipment in the unicircuit producing apparatus, photoresist material coating apparatus etc., also only need to increase an air extractor 20 on the basis of particle contamination supervisory system 1 and get final product, just can realize the particle contamination monitoring after air extractor 20 is fixedlyed connected with monitored object.
[embodiment two]
Please refer to Fig. 2, Figure 2 shows that the part-structure synoptic diagram of a kind of chemical vapor depsotition equipment of the embodiment of the invention.As shown in Figure 2, described chemical vapor depsotition equipment comprises:
Deposition chambers, transfer chamber, Device Host 50 and particle contamination supervisory system;
Wherein, described deposition chambers and transfer chamber are provided with air extractor 40, and described particle contamination supervisory system comprises at least one particle counting device 30, and described particle counting device 30 is connected with Device Host 50 with described air extractor 40.
Concrete, air extractor 40 comprises off-gas pump 41, evacuating valve 42, pump-line 43 and throttle 44, wherein, described off-gas pump 41 is connected with pump-line 43, described evacuating valve 42 and throttle 44 all are arranged on the pump-line 43, and described throttle 44 is arranged between evacuating valve 42 and the Sampler valves 34.Described particle counting device 30 comprises alpha counter 32, sampling conduit 33 and Sampler valves 34.One end of described sampling conduit 33 is connected with alpha counter 32, and the other end is connected with pump-line 43 in the air extractor 40 by Sampler valves 34.Device Host 50 links to each other with Sampler valves 34 with alpha counter 32 respectively by data connecting line, can control alpha counter 32 and Sampler valves 34.
Monitor a deposition chambers or transfer chamber and generally need a sampling conduit 33, a Sampler valves 34, monitoring a plurality of deposition chambers or a plurality of transfer chamber then needs many sampling conduits 33, a plurality of Sampler valves 34, and all the quantity with monitored object is identical for the quantity of sampling conduit 33 and Sampler valves 34.Each air extractor 40 connects a Sampler valves 34 and a sampling conduit 33, and all sampling conduits 33 can be connected with an alpha counter 32.And described Sampler valves 34 adopts electromagnetic valve, and each Sampler valves 34 is subjected to main frame 31 controls, can open or close separately.So each deposition chambers or transfer chamber can realize independently particle contamination monitoring.
Need carry out particle contamination when monitoring to chemical vapor depsotition equipment, not need to drop into product or the monitoring sheet is produced or flow, can directly move the particle contamination supervisory system and obtain detected result.The process of particle contamination monitoring is specific as follows: at first, open evacuating valve 42 and the off-gas pump 41 of deposition chambers or transfer chamber, in this process, can reconcile throttle 44 control gas flows; Then, open Sampler valves 34 by Device Host 50; Then, the detected result of Device Host 50 control alpha counters, 32 work and Collection and analysis alpha counter 32.
As seen, the device of particle counting described in the present embodiment 30 directly utilizes the Device Host 50 in the chemical vapor depsotition equipment main body, control alpha counter 32 and Sampler valves 34.Concrete, control that alpha counter 32 is relevant and data gathering, routine analyzer are integrated on the Device Host in the chemical vapor depsotition equipment 50 on the software, by data connecting line alpha counter 32 are connected with Device Host 50 in Sampler valves 34 chemical vapor depsotition equipments on the hardware to get final product.In other embodiments of the invention, particle counting device 30 also can arrange main frame separately, is used for control alpha counter 32 and Sampler valves 34.
To sum up, in the particle contamination supervisory system that the embodiment of the invention provides, the particle counting device is connected with the air extractor of monitored object, can monitor the particulate matter of monitored object at any time, in time finds particle contamination.Further, chemical vapor depsotition equipment adopts the particle contamination supervisory system, can directly control the particle counting device by the Device Host in the chemical vapor depsotition equipment, deposition chambers or transfer chamber are carried out the particle contamination monitoring, monitor convenient, effective.
Foregoing description only is the description to preferred embodiment of the present invention, is not any restriction to the scope of the invention, and any change, modification that the those of ordinary skill in field of the present invention is done according to above-mentioned disclosure all belong to the protection domain of claims.
Claims (11)
1. particle contamination supervisory system is used for the particle contamination situation of the monitored object of monitoring, and described monitored object comprises an air extractor, it is characterized in that, described particle contamination supervisory system comprises:
At least one particle counting device;
Wherein, described particle counting device is connected with described air extractor.
2. particle contamination supervisory system as claimed in claim 1 is characterized in that, described particle counting device comprises main frame, alpha counter, sampling conduit and Sampler valves;
Wherein, an end of described sampling conduit is connected with described alpha counter, and the other end of described sampling conduit is connected with described air extractor by described Sampler valves;
Described main frame links to each other with Sampler valves with alpha counter respectively, is used for the described alpha counter of control and Sampler valves.
3. particle contamination supervisory system as claimed in claim 2 is characterized in that, the quantity of described sampling conduit and the Sampler valves all quantity with monitored object is identical.
4. particle contamination supervisory system as claimed in claim 2 is characterized in that, described Sampler valves is electromagnetic valve.
5. particle contamination supervisory system as claimed in claim 1 is characterized in that, described air extractor comprises off-gas pump, evacuating valve and pump-line;
Wherein, described off-gas pump is connected with pump-line, and described evacuating valve is arranged on the pump-line.
6. particle contamination supervisory system as claimed in claim 1 is characterized in that, described monitored object is the deposition chambers of chemical vapor depsotition equipment and/or the transfer chamber of chemical vapor depsotition equipment.
7. a chemical vapor depsotition equipment is characterized in that, comprising:
Deposition chambers, transfer chamber, Device Host and particle contamination supervisory system;
Wherein, described deposition chambers and transfer chamber are provided with air extractor, and described particle contamination supervisory system comprises at least one particle counting device, and described particle counting device is connected with Device Host with described air extractor.
8. chemical vapor depsotition equipment as claimed in claim 7 is characterized in that, described particle counting device comprises alpha counter, sampling conduit and Sampler valves;
Wherein, an end of described sampling conduit is connected with alpha counter, and the other end of described sampling conduit is connected with described air extractor by Sampler valves.
9. chemical vapor depsotition equipment as claimed in claim 8 is characterized in that, the quantity of described sampling conduit is identical with the quantity of Sampler valves.
10. chemical vapor depsotition equipment as claimed in claim 8 is characterized in that, described Sampler valves is electromagnetic valve.
11. chemical vapor depsotition equipment as claimed in claim 7 is characterized in that, described air extractor comprises off-gas pump, evacuating valve, pump-line and throttle;
Wherein, described off-gas pump is connected with pump-line, and described evacuating valve and throttle all are arranged on the pump-line, and described throttle is arranged between evacuating valve and the Sampler valves.
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| Application Number | Priority Date | Filing Date | Title |
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| CN2013101568718A CN103276368A (en) | 2013-04-28 | 2013-04-28 | Particle pollution monitoring system and chemical vapor deposition device |
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| Application Number | Priority Date | Filing Date | Title |
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| CN2013101568718A CN103276368A (en) | 2013-04-28 | 2013-04-28 | Particle pollution monitoring system and chemical vapor deposition device |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108663293A (en) * | 2018-05-23 | 2018-10-16 | 长江存储科技有限责任公司 | Particulate matter detection means and particle detection method |
| CN111524841A (en) * | 2020-07-06 | 2020-08-11 | 上海陛通半导体能源科技股份有限公司 | Semiconductor process equipment and method capable of detecting mechanical microparticles in real time |
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| JPH05326417A (en) * | 1992-05-15 | 1993-12-10 | Matsushita Electric Ind Co Ltd | Apparatus for forming cvd thin film |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN108663293A (en) * | 2018-05-23 | 2018-10-16 | 长江存储科技有限责任公司 | Particulate matter detection means and particle detection method |
| CN111524841A (en) * | 2020-07-06 | 2020-08-11 | 上海陛通半导体能源科技股份有限公司 | Semiconductor process equipment and method capable of detecting mechanical microparticles in real time |
| CN111524841B (en) * | 2020-07-06 | 2020-10-23 | 上海陛通半导体能源科技股份有限公司 | Semiconductor process equipment and method capable of detecting mechanical microparticles in real time |
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Application publication date: 20130904 |