CN103269557A - Radio frequency ion source - Google Patents

Radio frequency ion source Download PDF

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Publication number
CN103269557A
CN103269557A CN2013101561969A CN201310156196A CN103269557A CN 103269557 A CN103269557 A CN 103269557A CN 2013101561969 A CN2013101561969 A CN 2013101561969A CN 201310156196 A CN201310156196 A CN 201310156196A CN 103269557 A CN103269557 A CN 103269557A
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CN
China
Prior art keywords
radio
ion source
quartz ampoule
frequency
frequency ion
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Pending
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CN2013101561969A
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Chinese (zh)
Inventor
刘东平
杨德明
范红玉
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Dalian Minzu University
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Dalian Nationalities University
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Publication date
Application filed by Dalian Nationalities University filed Critical Dalian Nationalities University
Priority to CN2013101561969A priority Critical patent/CN103269557A/en
Publication of CN103269557A publication Critical patent/CN103269557A/en
Pending legal-status Critical Current

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Abstract

The invention relates to a radio frequency ion source and belongs to the technical field of plasma application. The radio frequency ion source comprises a quartz tube, a copper tube wound on the outer wall of the quartz tube and a shielding cover used for shielding a radio frequency electric field. The quartz tube and the copper tube wound on the outer wall of the quartz tube are arranged in the shielding cover. An air inlet is formed in the upper end of the quartz pipe. An ion ejecting outlet is formed in the lower end of the quartz tube. Two ends of the copper tube are connected with two ends of a radio frequency power supply. A through hole for plasma to go through is formed at the center of the bottom of the shielding cover. The radio frequency ion source has the advantages that the shielding cover isolates the radio frequency electric field from a cavity and discharging of the cavity is prevented.

Description

A kind of radio-frequency ion source
Technical field
The present invention relates to a kind of radio-frequency ion source, belong to plasma applicating technology field.
Background technology
In recent decades, along with quick development of human society, demand to the energy is also increasing day by day, yet the utilizable energy source is fewer and feweri, the realization of controlled nuclear fusion becomes the research focus of the world today, and controlled nuclear fusion has two hang-ups: steady-state plasma problem and reactor critical material problem.At present there are a plurality of research groups carrying out the research work of this respect in the world, yet to low-temperature plasma n-body simulation n irradiation fusion reactor first wall material, and rare research of aspect such as first wall material radiation damage mechanism.This class can realize that the device of simulating fusion reactor irradiation also compares rarely at home and abroad, and the purposes of device and the means of building also have nothing in common with each other.What the cardiac component of device-ionogenic design became is very important, and the rf electric field of high frequency can influence the operate as normal of other equipment, thereby irradiation devices can't normally be moved.
Most of ion sources all are to be embedded in the cavity, radio-frequency coil is exposed in the atmosphere, can prevent the cavity discharge like this, but the rf electric field of high frequency affects other equipment, as the mass flow display instrument, grid bias power supply etc., rf electric field constantly changes the registration of mass flow instrument, and gas flow changes with registration, thus the guiding discharge instability, irradiation also constantly changes to the number of ions of sample surfaces, makes the calculating of the implantation dosage complicated inaccuracy that becomes; Radio frequency also can exert an influence to the people simultaneously, harm operating personnel's health; Even add radome at ion source, but because ion source need have circuits such as air inlet, vacuum measurement, and shield effectiveness also can be relatively poor relatively, still have and disturb existence.
Summary of the invention
The present invention utilizes cavity shielded radio frequency electric field by radio-frequency ion source is sealed in the cavity, the rf electric field that has solved radio-frequency ion source to the influence of other equipment with and the shielding problem, solved cavity discharge problem simultaneously.
The invention provides a kind of radio-frequency ion source, described radio-frequency ion source comprises quartz ampoule, be wrapped in the copper pipe on the quartz ampoule outer wall and be used for the radome of shielded radio frequency electric field, described quartz ampoule and the copper pipe that is wrapped on the quartz ampoule outer wall place in the radome, described quartz ampoule upper end is provided with air inlet, the quartz ampoule lower end is provided with the ion jet, described copper pipe two ends are connected with the radio-frequency power supply two ends, and described radome bottom centre position is provided with for the through hole by plasma.
The end that quartz ampoule of the present invention is provided with air inlet is connected by flange seal with cavity, quartz ampoule other end center is provided with the ion jet, the diameter of ion jet can require to adjust according to material irradiation, be provided with thermocouple vacuum gauge in the quartz ampoule, the thermocouple vacuum gauge range is 0.1~1000Pa, described copper pipe two ends connect the radio-frequency power supply two ends, and radio-frequency power supply power peak adjustable range is 0~600W, and the feedback power adjustable range is 0~200W.
Air inlet of the present invention is preferably the flowmeter that is provided with for the control gas flow, and an end and the air inlet of described flowmeter are tightly connected, and the other end is connected with discharge gas, and flowmeter is controlled by flow instrument.
Be preferably the thermocouple vacuum gauge of measuring quartzy intraductal pressure when being provided with for discharge in the quartz ampoule of the present invention.
Radio-frequency ion source using method of the present invention is to feed working gas from air inlet, described working gas is at least a in hydrogen, helium and the argon gas, by control mass flow instrument, control intake velocity, working gas are full of in the quartz ampoule and in the cavity, regulate radio-frequency power supply power, when radio-frequency power supply power adds to corresponding gas ionization value, begin discharge in the quartz ampoule, produce gaseous plasma, the pressure during discharge in the quartz ampoule is by adjusting gas flow control.
Copper pipe of the present invention is preferably an end and is provided with water inlet, and the other end is provided with delivery port.
Through hole of the present invention be preferably be positioned at the ion jet under.
It is identical with ion jet diameter that through hole of the present invention is preferably.
The present invention's purpose on the other hand is to provide the described radio-frequency ion source of the invention described above to be applied to the plasma radiation platform.
Beneficial effect of the present invention is:
1. radio-frequency ion source is sealed in the cavity, effectively utilizes cavity shielded radio frequency electric field;
2. can require to change ion jet diameter according to material irradiation;
3. the pressure of radio-frequency ion source can on-line monitoring, and the pressure of radio-frequency ion source can control during discharge;
4. radome is isolated rf electric field and cavity, stops the cavity electric discharge phenomena;
5. feed condensed water in the copper pipe, can guarantee the long-time steady operation of radio-frequency ion source.
Description of drawings
Accompanying drawing 1 width of cloth of the present invention,
Fig. 1 is the radio-frequency ion source structural representation;
Wherein, 1, quartz ampoule, 11, air inlet, 12, the ion jet, 2, copper pipe, 3, radome, 31, through hole.
Embodiment
Following non-limiting example can make those of ordinary skill in the art more fully understand the present invention, but does not limit the present invention in any way.
Embodiment 1
A kind of radio-frequency ion source;
Described radio-frequency ion source comprises quartz ampoule 1, be wrapped in the copper pipe 2 on quartz ampoule 1 outer wall and be used for the radome 3 of shielded radio frequency electric field, described quartz ampoule 1 and the copper pipe 2 that is wrapped on quartz ampoule 1 outer wall place in the radome 3, described quartz ampoule 1 upper end is provided with air inlet 11, described air inlet 11 is provided with the volume flowmeter for the control gas flow, quartz ampoule 1 lower end is provided with ion jet 12, measure the thermocouple vacuum gauge of quartzy intraductal pressure when being provided with for discharge in the described quartz ampoule 1, described copper pipe 2 two ends are connected with the radio-frequency power supply two ends, radio-frequency power supply power peak adjustable range is 0~600W, the feedback power adjustable range is 0~200W, described copper pipe 2 one ends are provided with water inlet, the other end is provided with delivery port, described radome 3 bottom centre positions are provided with for the through hole 31 by plasma, through hole 31 identical with ion jet 12 diameters and be positioned at ion jet 12 under.
Described radio-frequency ion source is applied to the plasma radiation platform.

Claims (7)

1. radio-frequency ion source, it is characterized in that: described radio-frequency ion source comprises quartz ampoule (1), be wrapped in the copper pipe (2) on quartz ampoule (1) outer wall and be used for the radome (3) of shielded radio frequency electric field, described quartz ampoule (1) and the copper pipe (2) that is wrapped on quartz ampoule (1) outer wall place in the radome (3), described quartz ampoule (1) upper end is provided with air inlet (11), quartz ampoule (1) lower end is provided with ion jet (12), described copper pipe (2) two ends are connected with the radio-frequency power supply two ends, and described radome (3) bottom centre position is provided with for the through hole (31) by plasma.
2. radio-frequency ion source according to claim 1 is characterized in that: described air inlet (11) is provided with the flowmeter for the control gas flow.
3. radio-frequency ion source according to claim 1 is characterized in that: the thermocouple vacuum gauge of measuring quartzy intraductal pressure when being provided with for discharge in the described quartz ampoule (1).
4. radio-frequency ion source according to claim 1, it is characterized in that: described copper pipe (2) one ends are provided with water inlet, and the other end is provided with delivery port.
5. radio-frequency ion source according to claim 1 is characterized in that: described through hole (31) be positioned at ion jet (12) under.
6. radio-frequency ion source according to claim 1, it is characterized in that: described through hole (31) is identical with ion jet (12) diameter.
7. the application of a radio-frequency ion source is characterized in that: the described radio-frequency ion source of claim 1 is applied to the plasma radiation platform.
CN2013101561969A 2013-04-28 2013-04-28 Radio frequency ion source Pending CN103269557A (en)

Priority Applications (1)

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CN2013101561969A CN103269557A (en) 2013-04-28 2013-04-28 Radio frequency ion source

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Application Number Priority Date Filing Date Title
CN2013101561969A CN103269557A (en) 2013-04-28 2013-04-28 Radio frequency ion source

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Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105590823A (en) * 2014-10-22 2016-05-18 上海凯世通半导体股份有限公司 Rf ion source apparatus
CN106561447A (en) * 2016-10-27 2017-04-19 合肥优亿科机电科技有限公司 Radio frequency source high density low energy ion beam biological modification equipment
CN109195298A (en) * 2018-09-06 2019-01-11 西安交通大学 A kind of generating means and method of negative hydrogen ion
CN109298123A (en) * 2018-04-23 2019-02-01 河北丰研翔科技发展限公司 A kind of novel thin layer chromatogram scanner and the analysis method using the scanner
CN111741583A (en) * 2020-05-26 2020-10-02 中国原子能科学研究院 Integrated desktop type neutron generator
CN112962087A (en) * 2021-02-01 2021-06-15 湖南红太阳光电科技有限公司 Built-in flat plate type conjugate ion source and vacuum coating device
EP3890449A1 (en) * 2020-04-02 2021-10-06 Tofwerk AG Microwave driven plasma ion source

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EP0977470A2 (en) * 1994-03-17 2000-02-02 Fuji Electric Co., Ltd. Method and apparatus for generating induced plasma
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CN1901774A (en) * 2005-07-20 2007-01-24 三星Sdi株式会社 Inductively coupled plasma processing apparatus
CN102503177A (en) * 2011-10-21 2012-06-20 苏州大学 Plasma processing device used for super-smooth surface

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JPS6431421A (en) * 1987-07-27 1989-02-01 Anelva Corp Microwave plasma treatment device
EP0977470A2 (en) * 1994-03-17 2000-02-02 Fuji Electric Co., Ltd. Method and apparatus for generating induced plasma
JPH09250986A (en) * 1996-03-16 1997-09-22 Horiba Ltd Ignition circuit for icp emission spectrochemical analyzer
CN2504276Y (en) * 2001-09-03 2002-08-07 浙江大学分析测试中心西溪校区分中心 Chemical gas phase deposition appts. for heating prepn. of film by inductively coupled plasma auxiliary tungsten filament
US20030111963A1 (en) * 2001-12-14 2003-06-19 Tolmachev Yuri Nikolaevich Inductively coupled plasma system
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CN102503177A (en) * 2011-10-21 2012-06-20 苏州大学 Plasma processing device used for super-smooth surface

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Title
冯志庆等: "射频等离子体FC薄膜沉积实验研究", 《第十三届全国等离子体科学技术会议论文集》 *

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105590823A (en) * 2014-10-22 2016-05-18 上海凯世通半导体股份有限公司 Rf ion source apparatus
CN106561447A (en) * 2016-10-27 2017-04-19 合肥优亿科机电科技有限公司 Radio frequency source high density low energy ion beam biological modification equipment
CN109298123A (en) * 2018-04-23 2019-02-01 河北丰研翔科技发展限公司 A kind of novel thin layer chromatogram scanner and the analysis method using the scanner
CN109195298A (en) * 2018-09-06 2019-01-11 西安交通大学 A kind of generating means and method of negative hydrogen ion
CN109195298B (en) * 2018-09-06 2020-03-03 西安交通大学 Negative hydrogen ion generating device and method
EP3890449A1 (en) * 2020-04-02 2021-10-06 Tofwerk AG Microwave driven plasma ion source
WO2021198462A1 (en) * 2020-04-02 2021-10-07 Tofwerk Ag Microwave driven plasma ion source
CN111741583A (en) * 2020-05-26 2020-10-02 中国原子能科学研究院 Integrated desktop type neutron generator
CN111741583B (en) * 2020-05-26 2021-09-28 中国原子能科学研究院 Integrated desktop type neutron generator
CN112962087A (en) * 2021-02-01 2021-06-15 湖南红太阳光电科技有限公司 Built-in flat plate type conjugate ion source and vacuum coating device

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Application publication date: 20130828