CN103186054A - Carrier device and exposure device - Google Patents

Carrier device and exposure device Download PDF

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Publication number
CN103186054A
CN103186054A CN2011104592993A CN201110459299A CN103186054A CN 103186054 A CN103186054 A CN 103186054A CN 2011104592993 A CN2011104592993 A CN 2011104592993A CN 201110459299 A CN201110459299 A CN 201110459299A CN 103186054 A CN103186054 A CN 103186054A
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China
Prior art keywords
objective table
arc
sidewall
wafer
carrying apparatus
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CN2011104592993A
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CN103186054B (en
Inventor
伍强
郝静安
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Semiconductor Manufacturing International Shanghai Corp
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Semiconductor Manufacturing International Shanghai Corp
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Abstract

The invention discloses a carrier device and an exposure device. The carrier device comprises a stage, wherein the stage comprises a first surface, a second surface opposite to the first surface, and a lateral wall located between the first surface and the second surface. The carrier device is characterized in that the stage further comprises an arc-shaped junction zone for connecting the lateral wall with the first surface and the second surface; and by means of the junction zone, the resistance of air to the stage and the disturbance generated by air during the movement of the stage are reduced.

Description

Carrying apparatus and exposure device
Technical field
The present invention relates to field of semiconductor manufacture, particularly a kind of carrying apparatus and exposure device.
Background technology
Photoetching is as the together very important operation in the semiconductor fabrication, and it is that the figure on the mask is transferred to technological process on the wafer by exposure, is considered to the core procedure of large scale integrated circuit in making.A series of complexity in the semiconductor manufacturing and photoetching process consuming time mainly is to be finished by corresponding exposure machine.And the development of photoetching technique in other words the exposure machine development of technology mainly launch round this three big index of live width, alignment precision and throughput rate.
In stepping projection exposure machine, wafer stage is used for the carrying wafer, does being synchronized with the movement under the effect of drive unit.In present most stepping projection exposure machine, the bottom of wafer stage has corresponding air floating structure, pressure by air floats wafer stage, to reduce extraneous vibration to the interference of wafer stage, is conducive to accurately to control the position of the wafer stage of high-speed motion.
With reference to figure 1, Fig. 1 is the cross-sectional view of existing wafer stage, described wafer stage comprises first surface 101, and first surface 101 opposing second surface 102 and the sidewall 103 between first surface 101 and second surface 102, and first surface 101, second surface 102 and sidewall 103 constitute square wafer stage; The first surface 101 of described wafer stage also has the sucker (not shown), is used for fixedly wafer 105; The sidewall 103 of described wafer stage has the position-measurement device 104 of measuring stage position, in order to measure the position of wafer stage, described position-measurement device 104 is interference of light meter, the end that transmits and receives of interference of light meter is arranged on the fixed pedestal (not shown), and the moving reflector of interference of light meter is arranged on the sidewall 103.
More introductions about wafer stage please refer to the United States Patent (USP) that publication number is US2008/0192219A1.
Existing wafer stage is when motion, because the disturbance of air, the position of objective table can not accurately be controlled, and influences the precision of alignment.
Summary of the invention
The problem that the present invention solves provides a kind of carrying apparatus and exposure device, reduces the disturbance of air, improves the degree of accuracy of stage position.
For addressing the above problem, the invention provides a kind of carrying apparatus, comprising:
Objective table, described objective table comprises first surface, and first surface opposing second surface and the sidewall between first surface and second surface, it is characterized in that, described objective table also comprises the junctional area that connects described sidewall and first surface and second surface, described junctional area is curved, and air is to the resistance of objective table and the disturbance of air generation when reducing stage movement.
Optionally, described arc is a kind of of circular arc, elliptic arc, logarithmic curve arc, index curve arc, conic arc, parabolic curve arc.
Optionally, described arc is two or more combination of circular arc, elliptic arc, logarithmic curve arc, index curve arc, conic arc, parabolic curve arc.
Optionally, the sidewall of described objective table is provided with the stage position measurement mechanism.
Optionally, described measurement mechanism is interference of light meter.
Optionally, described objective table bottom comprises be used to the mattress device that objective table is floated.
Optionally, described objective table first surface comprises for fixedly sucker or the wafer clamper of wafer.
Optionally, the area of described first surface and second surface is greater than the area of wafer.
Optionally, the crowning of described arc is away from the center of objective table.
The present invention also provides a kind of exposure device, comprise: at least one objective table, described objective table comprise first surface, with the first surface opposing second surface, between first surface and second surface sidewall and be connected described sidewall and the junctional area of first surface and second surface, described junctional area is curved, described first surface is used for placing wafer, and exposure device exposes to the wafer that is placed on the first surface.
Optionally, described exposure device is the immersion exposure device.
Optionally, the number of described objective table is two.
Compared with prior art, technical solution of the present invention has the following advantages:
Sidewall is connected with the junctional area of second surface by arc with first surface, be equivalent to the sidewall of square stage of the prior art and the angle of cut arcization of upper and lower surface, when stage movement, the junctional area of arc can reduce air to the resistance of objective table, reduce the disturbance of air in the stage movement process, make the influence that the light of interference of light meter can not be subjected to air turbulence in reflection and the aerial transmission of reflected light of the moving reflector of sidewall, improved the precision of the objective table of interference of light instrumentation amount, make that the gauge position of wafer does not have deviation on the objective table, when the wafer on the objective table is exposed, the accuracy of exposure and the precision of alignment have been improved.In addition, because objective table is in when operation, air reduces its resistance, can reduce the generation of drive unit heat, has reduced energy consumption.
Description of drawings
Fig. 1 is the cross-sectional view of existing wafer stage;
Fig. 2 is the structural representation of embodiment of the invention carrying apparatus;
Fig. 3 is that Fig. 2 is along line of cut A-B directional profile structural representation;
Fig. 4 is the local structure for amplifying synoptic diagram of junctional area shown in Figure 3.
Embodiment
Existing exposure machine adopts interference of light meter to measure the position of wafer stage, to guarantee the accuracy of position measurement.Thereby interference of light meter is to utilize principle of interference to measure the optical instrument of the difference mensuration displacement of light path, the light that the light source of interference of light meter sends, be divided into two-way by spectroscope, and reflect from stationary mirror and moving reflector respectively and can be combined on the spectroscope and produce interference fringe, when moving reflector moves, the two catoptrical optical path differences that stationary mirror and moving reflector reflect change, the light intensity that two reflected light can be incorporated into the interference fringe on the spectroscope changes, the light intensity variation of interference fringe is converted to electric impulse signal by the photo-electric conversion element in the receptacle of interference of light meter and electronic circuit etc., through shaping, amplify back input up-down counter and calculate the overall pulse number, calculated the displacement of moving reflector again by robot calculator.Interference of light meter is in the application of the position that is used for measuring wafer stage, and the moving reflector of interference of light meter is arranged on the sidewall of wafer stage, and other parts of interference of light meter are arranged on the constant pedestal of stationkeeping.
The inventor finds, uses the alignment precision of the wafer that existing exposure machine exposes limited.
The inventor further discovers, the speed of the motion of wafer stage in exposure machine is generally 0.2～1 meter per second, with respect to other moving components in the exposure machine, the movement velocity of wafer stage is quite fast, and the wafer stage of existing exposure machine is square platform, the sidewall of wafer stage and the angle of cut of upper and lower surface are the right angle, when wafer stage moves, air produces resistance to the wafer stage sidewall, very easily make the air in the exposure machine produce disturbance at the sidewall surface of contact of wafer stage, turbulent flow such as air, the disturbance meeting of this air influences the light of interference of light meter in reflection and the aerial transmission of reflected light of the moving reflector of the sidewall of wafer stage, cause the optical path difference of the two-way light that the spectroscope of interference of light meter tells to produce deviation, make the light intensity of the interference fringe on the spectroscope produce deviation, influence the accuracy of interference of light meter, make the position of wafer stage of interference of light instrumentation amount produce deviation, the gauge position of wafer also produces deviation on the wafer stage, and during to exposing wafer, the precision of exposure is the gauge position positive correlation with wafer, cause the exposing reduction of alignment precision on the wafer of back of the deviation of the gauge position of wafer.
For addressing the above problem, the inventor proposes a kind of carrying apparatus, comprise: objective table, described objective table comprises first surface, and first surface opposing second surface and the sidewall between first surface and second surface, it is characterized in that, described objective table also comprises the junctional area that connects described sidewall and first surface and second surface, and described junctional area is curved.According to aerodynamic principle, when stage movement, the junctional area of arc can reduce air to the resistance of objective table.
For above-mentioned purpose of the present invention, feature and advantage can be become apparent more, below in conjunction with accompanying drawing the specific embodiment of the present invention is described in detail.When the embodiment of the invention was described in detail in detail, for ease of explanation, synoptic diagram can be disobeyed general ratio and be done local the amplification, and described synoptic diagram is example, and it should not limit protection scope of the present invention at this.In addition, in actual fabrication, should comprise the variation of the three dimensions size of length, width and the degree of depth.
With reference to figure 2, Fig. 2 is the structural representation of embodiment of the invention carrying apparatus, comprise: objective table 20, described objective table 20 comprises: first surface 201, with first surface 201 opposing second surface 202, between first surface 201 and second surface 202 sidewall 203, be connected the junctional area 204 of described sidewall 203 and first surface 201 and second surface 202, described junctional area 204 is curved.Junctional area 204 between first surface 201, second surface 202, sidewall 203, first surface 201 and second surface 202 and the sidewall 203 constitutes objective table 20.
Described objective table 20 can be metal materials such as steel, aluminium, and described objective table 20 also can be the nonmetallic materials of the rigidity of lightweight.
Also have fixedly sucker or the wafer clamper (not shown) of wafer on the first surface 201 of described objective table 20.Described sucker can adopt vacuum suction or electromagnetism absorption.
In other embodiments of the invention, the first surface 201 of objective table 20 can be used for placing light shield.
The bottom of described objective table 20 also has be used to the mattress device (not shown) that objective table is floated.
Described objective table 20 also comprises the drive unit (not shown) that makes stage movement.
The area of first surface 201 and second surface 202 is greater than the area of wafer.
The sidewall 203 of described objective table 20 is provided with for the measurement mechanism (not shown) of measuring stage position.Described measurement mechanism is interference of light meter, and the moving reflector of interference of light meter is arranged on the sidewall 203 of objective table 20, and other parts of interference of light meter are arranged on the objective table 20 fixing pedestal on every side.
Being shaped as of the arc of four limits of first surface 201 and second surface 202 and the junctional area 204 of sidewall 203 is identical.
With reference to figure 3, Fig. 3 be Fig. 2 along line of cut A-B directional profile structural representation, described objective table 20 comprises: first surface 201, with first surface 201 opposing second surface 202, between first surface 201 and second surface 202 sidewall 203, be connected the junctional area 204 of described sidewall 203 and first surface 201 and second surface 202.Described junctional area 204 is curved, and the crowning of arc is away from the center of objective table 20, and the height of sidewall 203 is slightly larger than or equals the height of the moving reflector 205 of interference of light meter.
Sidewall 203 is connected with the junctional area 204 of second surface 202 by arc with first surface 201, be equivalent to the sidewall of square stage of the prior art and the angle of cut arcization of upper and lower surface, when objective table 20 motions, the junctional area 204 of arc can reduce air to the resistance of objective table 20, reduce the disturbance of air in objective table 20 motion processes, make the influence that the light of interference of light meter can not be subjected to air turbulence in reflection and the aerial transmission of reflected light of the moving reflector 205 of sidewall 203, improved the precision of the objective table 20 of interference of light instrumentation amount, make that the gauge position of wafer does not have deviation on the objective table 20, when the wafer on the objective table 20 is carried out coherent detection or PROCESS FOR TREATMENT, detection and PROCESS FOR TREATMENT precision have been improved, find after deliberation, sidewall 203 is connected with the junctional area 204 of second surface 202 by arc with first surface 201, than existing square stage, can reduce by 60% air resistance, improve 60% alignment precision.In addition, because objective table 20 is in when operation, air reduces its resistance, can reduce the generation of drive unit heat, reduces energy consumption.
In the board that adopts two objective tables, can reduce the motion of an objective table to the interference of another one objective table, improve the accuracy of stage position.
The arc of described junctional area 204 can be for circular arc, elliptic arc, logarithmic curve arc, index curve arc, conic arc, parabolic curve arc a kind of.
Described junctional area 204 arcs also can be two or more combination of circular arc, elliptic arc, logarithmic curve arc, index curve arc, conic arc, parabolic curve arc.
Described junctional area 204 arcs also can be the arc of other shapes.
Junctional area 204 arcs are one or more the combination in circular arc, elliptic arc, logarithmic curve arc, index curve arc, conic arc, the parabolic curve arc in the embodiment of the invention, the arc that refers to junctional area 204 has the Partial Feature on the curve of function correspondences such as circle, ellipse, logarithmic function, exponential function, quadratic function, parabolic function, and the crowning of curve is all away from the center of objective table.
Junctional area 204 arcs are the combination of multiple curve arc, be when further reducing stage movement air to the resistance of objective table.Please refer to Fig. 4, Fig. 4 is the local structure for amplifying synoptic diagram of Fig. 3 junctional area 204.The arc of described junctional area 204 is divided into three parts, comprise: the I of first, second portion II, third part III, the I of first, second portion II, third part III be the different curve arc of correspondence respectively, for example the I of first can be elliptic arc, second portion II is the logarithmic curve arc, and third part III is the parabolic curve arc, makes junctional area 204 have the cambered surface of a gradient gradual change, during with further minimizing stage movement, air is to the resistance of objective table.The arc of described junctional area 204 can be divided into a plurality of parts greater than three in other embodiments of the invention.
The junctional area 204 that forms arc can adopt existing advanced frosting technology and numerically-controlled machine technology square shaped objective table to process.Can utilize the wind-tunnel facilities with relevant Computer Simulation and design aids the aerodynamic force mathematic(al) parameter of the objective table of processing to be carried out preferably, make as parameter minimums such as resistance, lift, torsion, to design preferred arcuate structure.
The present invention also provides a kind of exposure device that has as above-mentioned carrying apparatus, comprise: at least one objective table, described objective table comprise first surface, with the first surface opposing second surface, between first surface and second surface sidewall and be connected described sidewall and the junctional area of first surface and second surface, described junctional area is curved, described first surface is used for placing wafer, and exposure device exposes to the wafer that is placed on the first surface.
Described exposure device is the immersion exposure device.
The objective table of described exposure device is two, has the objective table of arc junctional area, can reduce the motion of an objective table to the interference of another one objective table, improves the accuracy of stage position.
The sidewall of objective table is connected with the junctional area of second surface by arc with first surface, be equivalent to the sidewall of square stage of the prior art and the angle of cut arcization of upper and lower surface, when stage movement, the junctional area of arc can reduce air to the resistance of objective table, reduce the disturbance of air in the stage movement process, make the influence that the light of interference of light meter can not be subjected to air turbulence in reflection and the aerial transmission of reflected light of the moving reflector of sidewall, improved the precision of the objective table of interference of light instrumentation amount, make that the gauge position of wafer does not have deviation on the objective table, exposure device has improved the accuracy of exposure and the precision of alignment to the exposing wafer on the objective table time.
To sum up, the carrying apparatus that the embodiment of the invention provides and exposure device, sidewall is connected with the junctional area of second surface by arc with first surface, be equivalent to the sidewall of square stage of the prior art and the angle of cut arcization of upper and lower surface, when stage movement, the junctional area of arc can reduce air to the resistance of objective table, reduce the disturbance of air in the stage movement process, make the influence that the light of interference of light meter can not be subjected to air turbulence in reflection and the aerial transmission of reflected light of the moving reflector of sidewall, improved the precision of the objective table of interference of light instrumentation amount, make that the gauge position of wafer does not have deviation on the objective table, when the wafer on the objective table is exposed, the accuracy of exposure and the precision of alignment have been improved.In addition, because objective table is in when operation, air reduces its resistance, can reduce the generation of drive unit heat, reduces energy consumption.
Though the present invention with preferred embodiment openly as above; but it is not to limit the present invention; any those skilled in the art without departing from the spirit and scope of the present invention; can utilize method and the technology contents of above-mentioned announcement that technical solution of the present invention is made possible change and modification; therefore; every content that does not break away from technical solution of the present invention; to any simple modification, equivalent variations and modification that above embodiment does, all belong to the protection domain of technical solution of the present invention according to technical spirit of the present invention.

Claims (12)

1. carrying apparatus comprises:
Objective table, described objective table comprises first surface, and first surface opposing second surface and the sidewall between first surface and second surface, it is characterized in that, described objective table also comprises the junctional area that connects described sidewall and first surface and second surface, described junctional area is curved, and air is to the resistance of objective table and the disturbance of air generation when reducing stage movement.
2. carrying apparatus as claimed in claim 1 is characterized in that, described arc is a kind of of circular arc, elliptic arc, logarithmic curve arc, index curve arc, conic arc, parabolic curve arc.
3. carrying apparatus as claimed in claim 1 is characterized in that, described arc is two or more combination of circular arc, elliptic arc, logarithmic curve arc, index curve arc, conic arc, parabolic curve arc.
4. carrying apparatus as claimed in claim 1 is characterized in that, the sidewall of described objective table is provided with the stage position measurement mechanism.
5. carrying apparatus as claimed in claim 4 is characterized in that, described measurement mechanism is interference of light meter.
6. carrying apparatus as claimed in claim 1 is characterized in that, described objective table bottom comprises be used to the mattress device that objective table is floated.
7. carrying apparatus as claimed in claim 1 is characterized in that, described objective table first surface comprises for fixedly sucker or the wafer clamper of wafer.
8. carrying apparatus as claimed in claim 1 is characterized in that, the area of described first surface and second surface is greater than the area of wafer.
9. carrying apparatus as claimed in claim 1 is characterized in that, the crowning of described arc is away from the center of objective table.
10. exposure device, it is characterized in that, comprise: at least one objective table, described objective table comprise first surface, with the first surface opposing second surface, between first surface and second surface sidewall and be connected described sidewall and the junctional area of first surface and second surface, described junctional area is curved, described first surface is used for placing wafer, and exposure device exposes to the wafer that is placed on the first surface.
11. exposure device as claimed in claim 10 is characterized in that, described exposure device is the immersion exposure device.
12. exposure device as claimed in claim 10 is characterized in that, the number of described objective table is two.
CN201110459299.3A 2011-12-31 2011-12-31 Carrier device and exposure device Active CN103186054B (en)

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Application Number Priority Date Filing Date Title
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CN103186054A true CN103186054A (en) 2013-07-03
CN103186054B CN103186054B (en) 2014-12-24

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Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1432440A (en) * 2001-11-27 2003-07-30 东京毅力科创株式会社 Solution processing unit and method
CN101515119A (en) * 2009-04-03 2009-08-26 清华大学 Silicon chip bench double-bench switching system employing air floatation plane motor

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1432440A (en) * 2001-11-27 2003-07-30 东京毅力科创株式会社 Solution processing unit and method
CN101515119A (en) * 2009-04-03 2009-08-26 清华大学 Silicon chip bench double-bench switching system employing air floatation plane motor

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