CN103182806A - Working die and plated film layer - Google Patents
Working die and plated film layer Download PDFInfo
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- CN103182806A CN103182806A CN2011104530179A CN201110453017A CN103182806A CN 103182806 A CN103182806 A CN 103182806A CN 2011104530179 A CN2011104530179 A CN 2011104530179A CN 201110453017 A CN201110453017 A CN 201110453017A CN 103182806 A CN103182806 A CN 103182806A
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Abstract
A working die and a plated film layer. The working die comprises a die body, and at least one plated film layer extending upwards from the die body; the plated film layer comprises a layer of a high temperature resistant plated film formed by plating nickel aluminium alloy rich in aluminium; the high temperature resistant plated film contains trace elements which are selected from cobalt, iron, chromium, copper, vanadium, or a combination of the above substances. With the crystal structure of the high temperature resistant plated nickel aluminium alloy, the plated film layer has more excellent adhesion resistance and antioxidation characteristic at high temperature, which allows the whole working die to perform molding formation at high temperature.
Description
Technical field
The present invention relates to a kind of work mould and plated film layer, particularly relate to a kind of work mould for high temperature process and plated film layer.
Background technology
Consult Fig. 1, existing work mould 1 comprises a mould ground 11, an and functional film layer 12 that is formed on this mould ground 11, this functional film layer 12 has and prevents because being stained with the glutinous effect that damages when causing product stripping, and can improve the whole service life of work mould 1, so the research of this functional film layer 12 is the important topics that develop on the present industry.
TaiWan, China the 093126646th patent application case discloses and utilizes the class diamond rete of rich graphitic carbon phase carbon to be formed on the mould ground, and obtain the easy demoulding, hardness height with the allotment of the ratio of different carbon phases, and the technological means of the work mould of characteristics such as long service life.Yet, the temperature tolerance deficiency of class diamond rete, when the model temperature was higher than 400 ℃, class diamond rete can begin to produce carbonization and lose original good demoulding effect and protection effect to the mould surface of bottom material.
Again; TaiWan, China the 093121109th patent application case is comparable to the ceramic material of diamond as the mould ground with expansion rate; and form the technological means of diamond diaphragm thereon, utilize the advantage such as high rigidity, high temperature tolerance of diamond to obtain can be applicable to the work mould of high temperature model.But no matter be ceramic material, and/or the processing procedure of diamond diaphragm all has the restriction of suitable process conditions and cost, and makes this type of work mould there is no actual application value.
In addition, then disclose in TaiWan, China the 096133395th patent application case by both overlapping technology that form nano-multilayer film at least in the platinum more than 20～60 layers (Pt), iridium (Ir), ruthenium (Ru), rhodium (Rh) or the tungsten alloy firms such as (W), so as to the model temperature that improves the work mould mechanical strength with itself; And for example United States Patent (USP) 5171348 also proposes with precious metal alloys: platinum (Pt), iridium (Ir), ruthenium (Ru), rhodium (Rh), tungsten (W), palladium (Pd), rhenium (Re), tantalum (Ta), one of them kind of osmium (Os) constitute the technology of the function film on the mould ground.The shortcoming of this two inventions technology all is to constitute with noble metal the functional film layer of protection mould ground, and its material cost and processing procedure cost are all very high, will be very restricted for industrial application in large quantities.
Also have, TaiWan, China the 094146036th patent application case discloses a kind of with Teflon (Teflon, Polytetrafluoroethene; Abbreviation PTFE), the composite that contains Teflon, and contain the technological means of one of them function film that constitutes of material of pottery, to promote the anti-stickiness of being stained with of work mold integral, its shortcoming is that when the model temperature is higher than 400 ℃ the Teflon material also can begin carbonization and lose the anti-glutinous characteristic of being stained with.
From the above, the employed functional film layer of general work mould is broadly divided into alloy, the ceramic material that contains noble metal, and class diamond carbon (Diamond Like Carbon, three classes such as DLC), but the cost height that is film material with the alloy that contains noble metal or diamond, the ceramic material selectional restriction is many and relatively poor usually for the tack of mould ground, in addition, quasi cobalt carbon diaphragm is low for the tolerance of temperature, therefore, all has sizable room for improvement.
In addition, United States Patent (USP) 7618719 discloses and a kind ofly can be applicable to be higher than 600 ℃ glass with the technological means of model instrument, it is characterized in that the work mould has good demoulding effect and persistent hard films (Hard coating) when being included in the high temperature model, this hard films tungstenic (W), vanadium (V), boron (B), carbon (C), nitrogen (N) also are formed on the noncrystalline CrSiN layer, in the hope of overcoming alloy, the ceramic material that contains noble metal, (Diamond Like Carbon DLC) waits three class materials to constitute the shortcoming of the work mould of functional film layer to reach the class diamond carbon.Based on the technological means that this patent case discloses, develop when having an opportunity that the processing procedure cost is cheaper, temperature tolerance Gao Erke is widely used in model, particularly the work mould of high temperature model.
Summary of the invention
The object of the present invention is to provide a kind of high temperature resistant and can be applicable to a large amount of industrial work moulds.
Moreover another purpose of the present invention is to provide a kind of high temperature resistant, plated film layer that cost of material is low.
Work mould of the present invention comprises a die ontology, and at least one plated film layer that upwards forms from this die ontology.This plated film layer comprises a high temperature resistance plated film that forms with the nickel alumin(i)um alloy plating that is rich in aluminium, and this high temperature resistance plated film has trace element in forming, and this trace element is selected from cobalt, iron, chromium, copper, vanadium, or a combination of aforementioned substances.
Work mould of the present invention, the atom content percentage of the trace element in this high temperature resistance plated film is not more than 5at%, and this aluminium atom content percentage is 42at%～55at%.
Work mould of the present invention, this plated film layer comprise that also is selected from nickel alumin(i)um alloy and one of them the anti-diffusion plated film that constitutes of noncrystalline glassy metal that is rich in nickel, and this high temperature resistance plated film is formed on this anti-diffusion plated film surface away from this film tool body.
Work mould of the present invention, this anti-diffusion plated film are that the nickel alumin(i)um alloy that is rich in nickel constitutes and the nickle atom percentage composition is 51at%～58at%.
Work mould of the present invention, this anti-diffusion plated film is to constitute with the noncrystalline glassy metal, and the noncrystalline glassy metal is selected among zirconium base metal glass, nickel based metal glass, titanium-based metal glass, copper base metal glass, platinum base metal glass, or palladium-based metal glass.
Work mould of the present invention, this die ontology comprise a ground, and one link this ground and this plated film layer in conjunction with material.
Work mould of the present invention, this ground are to be selected from cast iron, carbon steel, high-speed steel, nickel-base alloy, cobalt-base alloys, or tungsten carbide, and this is to be selected from aluminium, copper, chromium, nickel, titanium, vanadium, niobium, tungsten, cobalt, zirconium in conjunction with material, or a combination of aforementioned substances.
Work mould of the present invention, this thickness in conjunction with material is to be not less than 25nm.
Plated film layer of the present invention comprises a first filming, and this first plating mould is made of the nickel alumin(i)um alloy that is rich in aluminium that adds trace element, and this trace element is to be selected from cobalt, iron, chromium, copper, vanadium, or making up of aforementioned substances.
Plated film layer of the present invention, the aluminium atom content percentage in this first filming is 42at%～55at%, and atom content percentage that should trace element is not more than 5at%.
Plated film layer of the present invention also comprises one and be selected from nickel alumin(i)um alloy and one of them second plated film that constitutes of noncrystalline glassy metal that is rich in nickel, and this first filming is formed at this second coated surface.
Plated film layer of the present invention, this second plated film are that the nickel alumin(i)um alloy that is rich in nickel constitutes, and the nickle atom percentage composition is 51at%～58at%.
Plated film layer of the present invention, this second plated film constitutes with the noncrystalline glassy metal, and the noncrystalline glassy metal is selected among zirconium base metal glass, nickel based metal glass, titanium-based metal glass, copper base metal glass, platinum base metal glass, or palladium-based metal glass.
Plated film layer of the present invention, the thickness of this first filming are 300nm～5000nm, and the thickness of this second plated film is 25nm～500nm.
Beneficial effect of the present invention is: utilize high strength that this plated film layer has, favorable mechanical character, high temperature resistance, characteristic such as anti-oxidant; satisfy under the high temperature model; still can keep good demoulding effect and protective capability; and because the present invention does not use noble metal or rare metal as film material, and can take into account material cost, be extended to industrial extensive application development.
Description of drawings
Fig. 1 is a cutaway view, and existing work mould is described.
Fig. 2 is a cutaway view, and first preferred embodiment of work mould of the present invention is described.
Fig. 3 is a cutaway view, and second preferred embodiment of work mould of the present invention is described.
Fig. 4 is a cutaway view, and the 3rd preferred embodiment of work mould of the present invention is described.
Fig. 5 is a cutaway view, illustrates that the another kind of this second and third preferred embodiment is implemented aspect.
The specific embodiment
The present invention is described in detail below in conjunction with drawings and Examples.Before the present invention is described in detail, be noted that in the following description content similarly assembly is to represent with identical numbering.
Consult Fig. 2, first preferred embodiment of work mould of the present invention comprises a die ontology 2, and a plated film layer 3 that upwards forms from this die ontology 2.
This die ontology 2 comprises a ground 21, and one link this ground 21 and this plated film layer 3 in conjunction with material 22.This ground 21 is constituted by metal-containing material, as cast iron, carbon steel, high-speed steel, nickel-base alloy, cobalt-base alloys or tungsten carbide, and for being shaped required product, what pay special attention to is, when the temperature that shapes surpasses 600 ℃, be preferable selection with nickel-base alloy, cobalt-base alloys or the tungsten carbide that has than high-temperature stability.And be formed at these ground 21 finished surfaces this should select for use with this ground 21 and this plated film layer 3 in conjunction with material 22 the good material of good affinity, joint capacity is all arranged, generally based on metal film, for example aluminium (Al), copper (Cu), chromium (Cr), nickel (Ni), titanium (Ti), vanadium (V), niobium (Nb), tungsten (W), cobalt (Co), one of them kind of zirconium (Zr) are formed, and should be not less than 25 nanometers (nm) in conjunction with material 22 thickness, strengthen the adhesive force of 3 pairs of this ground 21 of this plated film layer whereby and reduce interfacial stress and not easily separated.
In the present embodiment, this ground 21 is that tungsten carbide constitutes, and should then be to be formed at the surface that this ground 21 is used for the processing model with the chromium metal in conjunction with material 22, and this chromium metal be about rice in 25 nanometers～500 in conjunction with material 22 thickness, preferably, thickness range is 100 nanometers～300 nanometers.
This plated film layer 3 comprises a high temperature resistance plated film 31 in conjunction with material 22 surfaces (the first filming just) that is connected in this die ontology 2, this high temperature resistance plated film 31 is that the nickel alumin(i)um alloy plating that is rich in aluminium forms, and wherein the atom content percentage of aluminium is at 42at%～55at%, preferably, the atom content percentage of aluminium can have more excellent high temperature life at 51at%～55at%, specifically, in the high temperature resistance plated film 31 that this nickel alumin(i)um alloy that is rich in aluminium constitutes, also has the trace element that atom content percentage is not more than 5at%, the trace element that adds is to be selected from the metal close with the nickle atom radius, as cobalt (Co), iron (Fe), chromium (Cr), copper (Cu), one of them kind of vanadium (V), thus, nickle atom vacant locations in the high temperature resistance plated film 31 that this nickel alumin(i)um alloy that is rich in aluminium constitutes just can be replaced by this trace meter, the quantity of atom vacancy in the crystal structure of reduction plated film.
This high temperature resistance plated film 31 that is rich in the nickel alumin(i)um alloy of aluminium is the B2 type crystal structure, and very easily oxidation and generate the alumina layer of tool protectiveness of the top layer that contacts with air.In addition, aluminium content is higher, it is anti-oxidant that the speed of generation aluminium oxide also reaches follow-up film body sooner, effect against corrosion, and have good high-temperature non-oxidizability and heat conductivity, but on the higher nickel alumin(i)um alloy B2 crystal structure of aluminium content, because the more meeting of aluminium atomic quantity causes the position of nickle atom to be easier to produce vacancy, these vacancies will make the oxidizing atmosphere of external environment, or nickel, the aluminium atom diffuses into towards these die ontology 2 directions along this vacancy path, and allow this high temperature resistance plated film 31 that is rich in the nickel alumin(i)um alloy of aluminium may lose original B2 crystal structure, lose high temperature resistant, oxidation resistant characteristic, therefore, fill up in the nickle atom vacancy by the trace meter atom that makes an addition in this high temperature resistance plated film 31, thereby reduce the vacancy quantity of crystal structure in this high temperature resistance plated film 31, to reduce as the problem of oxidizing atmosphere such as oxygen and the past diffusion inside of alloy atom.
Therefore, work mould of the present invention utilizes in this plated film layer 3, be this high temperature resistance plated film 31 of main composition with the nickel alumin(i)um alloy structure that is rich in aluminium, borrow aluminium content many nickel aluminium crystal structures, make temperature tolerance, antioxygen lifting, and take into account under the high temperature and anti-ly to be stained with glutinous effect, and do not need with the high material of material costs such as noble metal, diamond as composition, a big advantage that reduces cost especially for a large amount of uses on the industry.
Consult Fig. 3, second preferred embodiment of work mould of the present invention and this first preferred embodiment are similar, comprise this die ontology 2, and a plated film layer 4 that upwards forms from this die ontology 2, and different places is the composition of this plated film layer 4.
This plated film layer 4 comprises that one is connected in the anti-diffusion plated film 41 in conjunction with material 22 surfaces (second plated film just) of this die ontology 2, and one is formed on this anti-diffusion plated film 41 away from the lip-deep high temperature resistance plated film 42 (the first filming just) of this die ontology 2.
This high temperature resistance plated film 42 is that the nickel alumin(i)um alloy plating that is rich in aluminium forms, and wherein the atom content percentage of aluminium is at 42at%～55at%, preferably, the atom content percentage of aluminium is that 300nm～5000nm has more excellent high temperature life at 51～55at%, thickness.Specifically, in the high temperature resistance plated film 42 that this nickel alumin(i)um alloy that is rich in aluminium constitutes, also has the trace element that is not more than 5at%, the trace element that adds is to be selected from the metal close with the nickle atom radius, as cobalt (Co), iron (Fe), chromium (Cr), copper (Cu), one of them kind of vanadium (V), thus, nickle atom vacant locations in the high temperature resistance plated film 42 that this nickel alumin(i)um alloy that is rich in aluminium constitutes just can be replaced by this trace meter, reduces the quantity of atom vacancy in the crystal structure of this high temperature resistance plated film 42.
This anti-diffusion plated film 41 is that the nickel alumin(i)um alloy that is rich in nickel is formed, and wherein the atom content percentage of nickel is 25nm～500nm at 51at%～58at%, thickness.
And this high temperature resistance plated film 42 that is rich in the nickel alumin(i)um alloy of aluminium causes the position of nickle atom to be easier to produce vacancy easily, make the oxidizing atmosphere of external environment, or nickel, the aluminium atom diffuses into towards these die ontology 2 directions along this vacancy path, and allow this high temperature resistance plated film 42 that is rich in the nickel alumin(i)um alloy of aluminium lose high temperature resistant, the problem of oxidation resistant characteristic, except filling up in the nickle atom vacancy by making an addition in this high temperature resistance plated film 42 with the trace meter atom, this is rich in the anti-diffusion plated film 41 of the nickel alumin(i)um alloy of nickel in this second preferred embodiment, because of the nickle atom radius less, so being filled by the many nickle atoms of content easily, the vacancy that the aluminium atom in the crystal structure causes replaces, and can more effectively further overcome metallic atom in this high temperature resistance plated film 42 toward diffusion inside, keep good high temperature resistant of this high temperature resistance plated film 42, anti-oxidation characteristics is with the engineering properties of excellence.
What is particularly worth mentioning is that, the work mould of the present invention at high temperature glass sample of formed thereby does not only have atomizing defective, surfacing, also has simultaneously good light transmittance, the particularly glass lens of following high optical characteristics or the demands such as face glass of high-order electronic product, all will be shaped in the operating temperature more than 650 ℃, work mould of the present invention just also has industrial competitiveness at this.
What this remarked additionally especially be, though nickel alumin(i)um alloy itself has the excellent material characteristic, low-density, high-melting-point, high rates of heat transfer, high strength, against corrosion, resistance to high temperature oxidation and conduction etc. and can be applicable to the line contacts of semiconductor subassembly, catalyst, tie breaker, or aviation surperficial heat insulating coating interlayer material of part etc., but because the casting difficulty of nickel alumin(i)um alloy, general use PM technique is synthetic and it can't be applied in a large number high-temperature structural material, do not have especially under the situation of high temperature (greater than 650 ℃) model yet, at nickel alumin(i)um alloy in the discussion of using of work mould, therefore, the present invention utilizes sputtering way, but not alloy cube matherial was metallurgical synthetic in the past, not only cost degradation on the processing procedure also is suitable for large-scale work mould.
Consult Fig. 4, the 3rd preferred embodiment of work mould of the present invention, the 3rd preferred embodiment and this second preferred embodiment are similar, its different place only is that the anti-diffusion plated film 41 ' (second plated film just) of this plated film layer 4 is to constitute with the noncrystalline glassy metal, and the noncrystalline glassy metal is selected among zirconium base metal glass, nickel based metal glass, titanium-based metal glass, copper base metal glass, platinum base metal glass, or palladium-based metal glass.
The noncrystalline glassy metal is because no crystal boundary exists, and the same atom of this high temperature resistance plated film 42 and the oxidizing atmosphere of can making significantly reduces the speed of past diffusion inside, and makes the longer service life of overall work mould, usefulness better.
What this replenished especially be, be implementation with a plated film layer 4 all in above-mentioned this second and third preferred embodiment, but in fact, but also comprise plated film layer 4 stacked more than two as shown in Figure 5, focus on, its end face one is decided to be high temperature resistant, the oxidation resistant high temperature resistance plated film 42 of this tool (the first filming just).
In sum, work mould of the present invention is borrowed in conjunction with material 22 and is reduced plated film layer 3,4 and the stress of 21 of grounds, and increase adhesive force to each other, add this based on the high temperature resistance plated film 31 of the nickel alumin(i)um alloy that is rich in aluminium, 42 strengthen the engineering properties of working surface, promote heatproof, the antioxygen characteristic also possesses good demoulding ability, and the anti-diffusion plated film 41 of antigen diffusion under the high temperature, 41 ' further consolidates the high temperature resistant of this high temperature resistance plated film 42, oxidation resistant crystal structure, therefore, make that work mould of the present invention can be at processing procedure, still can carry out the enforcement of high temperature model under the prerequisite that the cost of material is low.
Claims (14)
1. a work mould comprises a die ontology, it is characterized in that:
This work mould also comprises at least one plated film layer that upwards forms from this die ontology, this plated film layer comprises a high temperature resistance plated film that forms with the nickel alumin(i)um alloy plating that is rich in aluminium, this high temperature resistance plated film has trace element in forming, and this trace element is selected from cobalt, iron, chromium, copper, vanadium, or a combination of aforementioned substances.
2. work mould according to claim 1, it is characterized in that: the atom content percentage of the trace element in this high temperature resistance plated film is not more than 5at%, and this aluminium atom content percentage is 42at%～55at%.
3. work mould according to claim 1, it is characterized in that: this plated film layer comprises that also is selected from nickel alumin(i)um alloy and one of them the anti-diffusion plated film that constitutes of noncrystalline glassy metal that is rich in nickel, and this high temperature resistance plated film is formed on this anti-diffusion plated film surface away from this film tool body.
4. work mould according to claim 3 is characterized in that: this anti-diffusion plated film is that the nickel alumin(i)um alloy that is rich in nickel constitutes and the nickle atom percentage composition is 51at%～58at%.
5. work mould according to claim 3, it is characterized in that: this anti-diffusion plated film is to constitute with the noncrystalline glassy metal, and the noncrystalline glassy metal is selected among zirconium base metal glass, nickel based metal glass, titanium-based metal glass, copper base metal glass, platinum base metal glass, or palladium-based metal glass.
6. according to claim 1 or 3 described work moulds, it is characterized in that: this die ontology comprises a ground, and one link this ground and this plated film layer in conjunction with material.
7. work mould according to claim 6, it is characterized in that: this ground is to be selected from following material to constitute: cast iron, carbon steel, high-speed steel, nickel-base alloy, cobalt-base alloys, or tungsten carbide, this is to be selected from following material to constitute in conjunction with material: aluminium, copper, chromium, nickel, titanium, vanadium, niobium, tungsten, cobalt, zirconium, or a combination of aforementioned substances.
8. work mould according to claim 7, it is characterized in that: this thickness in conjunction with material is not less than 25nm.
9. a plated film layer comprises a first filming, it is characterized in that:
This first plating mould is made of the nickel alumin(i)um alloy that is rich in aluminium that adds trace element, and this trace element is to be selected from cobalt, iron, chromium, copper, vanadium, or making up of aforementioned substances.
10. plated film layer according to claim 9, it is characterized in that: the aluminium atom content percentage in this first filming is 42at%～55at%, and atom content percentage that should trace element is not more than 5at%.
11. plated film layer according to claim 9 is characterized in that: also comprise one and be selected from nickel alumin(i)um alloy and one of them second plated film that constitutes of noncrystalline glassy metal that is rich in nickel, and this first filming is formed at this second coated surface.
12. plated film layer according to claim 11 is characterized in that: this second plated film is that the nickel alumin(i)um alloy that is rich in nickel constitutes, and the nickle atom percentage composition is 51at%～58at%.
13. plated film layer according to claim 11, it is characterized in that: this second plated film constitutes with the noncrystalline glassy metal, and the noncrystalline glassy metal is selected among zirconium base metal glass, nickel based metal glass, titanium-based metal glass, copper base metal glass, platinum base metal glass, or palladium-based metal glass.
14. plated film layer according to claim 11 is characterized in that: the thickness of this first filming is 300nm～5000nm, and the thickness of this second plated film is 25nm～500nm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
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| CN201110453017.9A CN103182806B (en) | 2011-12-30 | 2011-12-30 | Work mould and film plating layer |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201110453017.9A CN103182806B (en) | 2011-12-30 | 2011-12-30 | Work mould and film plating layer |
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| CN103182806A true CN103182806A (en) | 2013-07-03 |
| CN103182806B CN103182806B (en) | 2016-01-20 |
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