CN103176366A - Active drive cable table of lithography machine wafer stage - Google Patents
Active drive cable table of lithography machine wafer stage Download PDFInfo
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- CN103176366A CN103176366A CN2011104366831A CN201110436683A CN103176366A CN 103176366 A CN103176366 A CN 103176366A CN 2011104366831 A CN2011104366831 A CN 2011104366831A CN 201110436683 A CN201110436683 A CN 201110436683A CN 103176366 A CN103176366 A CN 103176366A
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Abstract
The invention proposes an active drive cable table of a lithography machine wafer stage. The active drive cable table of the lithography machine wafer stage comprises a Y-direction sliding table, a Y-direction lead rail and a five-connecting rod mechanism, wherein the Y-direction sliding table is arranged on the Y-direction lead rail through an air bearing; one end of the five-connecting-rod mechanism is connected to the Y-direction sliding table; the other end of the five-connecting-rod mechanism is connected to the wafer stage through a cable facility; the Y-direction sliding table is driven by the motor to keep synchronous movement together with the wafer stage in a Y direction; the cable facility is conveyed to the wafer stage along the five-connecting-rod mechanism via the Y-direction sliding table; and the five-connecting-rod mechanism comprises an active drive joint for driving the five-connecting-rod mechanism to move along the X direction, so as to drive the cable facility to move along the X direction. The active drive cable table of the lithography machine wafer stage provided by the invention achieves active control on the cable table and pursuit movement of the wafer stage in an X-Y plane by the wafer stage.
Description
Technical field
The present invention relates to the semiconductor lithography apparatus field, and be particularly related to a kind of active driving cable table of photo-etching machine silicon chip platform.
Background technology
In semiconductor lithography equipment, silicon wafer stage precision workpiece stage movement system is extremely important critical component, and its bearing accuracy directly affects the performance of lithographic equipment, and its travelling speed directly affects the production efficiency of lithographic equipment.Along with improving constantly of VLSI (very large scale integrated circuit) device integrated level, the continuous enhancing of photoetching resolution, also in continuous lifting, travelling speed, acceleration and the accuracy requirement of corresponding work stage also improve constantly to the characteristic line breadth index request of litho machine.
The structure that the typical version of photo-etching machine work-piece platform system combines for thick, fine motion, to have the force density of going out high due to planar motor, the characteristics such as high reliability at a high speed,, and be easy to it is integrated in controlled device, have the advantages such as fast response time, control is highly sensitive, physical construction is simple, be applied at present in semiconductor lithography equipment, realized the long stroke coarse motion of silicon wafer stage.But realize that owing to adopting planar motor the silicon wafer stage of long stroke coarse motion is without X, Y-direction guide rail, move in the XY plane and be used for to follow silicon wafer stage to pipeline facilities such as the silicon wafer stage supporting various communications cables, power cable and tracheae, water pipes, therefore the cable support oriented device need to be set.Common silicon wafer stage cable facility is that the passive silicon wafer stage of following moves in the XY plane, carries out high-speed motion and nanoscale when accurately locating at silicon wafer stage, and the pipeline facility that drags will be can not ignore the disturbance that silicon wafer stage produces.
A kind of planar motor that adopts that prior art is announced drives the workpiece table system that silicon wafer stage is realized long stroke coarse motion, its cable support oriented device mainly comprises one group of V-type link assembly that links together by a revolute pair, one end of link assembly is arranged on slide unit by revolute pair, the other end is arranged on silicon wafer stage by revolute pair, silicon wafer stage cable facility is sent on silicon wafer stage along link assembly from slide unit, and moves at the passive silicon wafer stage of following of Y-direction together with link assembly.This scheme pipeline facility has a support vertical, has avoided sagging and work top friction, but follows the silicon wafer stage motion Y-direction is passive, can affect silicon wafer stage motion positions precision.
a kind of cable stage that adopts the photo-etching machine silicon chip platform of multi-joint manipulator of announcing of prior art for another example, this cable stage comprises a control device and at least one multi-joint manipulator, the silicon wafer stage pipeline facility is gone on silicon wafer stage by multi-joint manipulator, guarantee that by the corner of controlling each joint driver pipeline facility initiatively follows silicon wafer stage and move in the XY plane, avoided the impact of pipeline facility on silicon wafer stage motion positions precision, but this cable stage complex structure, the manipulator joint number is more causes the number of drives used more, while About Redundant Manipulator Control System Design more complicated, cost of development is relatively high.
Summary of the invention
The present invention proposes a kind of active driving cable table of photo-etching machine silicon chip platform, realizes the ACTIVE CONTROL of cable stage and cable stage the accompany movement of silicon wafer stage at X-Y plane.
in order to achieve the above object, the present invention proposes a kind of active driving cable table of photo-etching machine silicon chip platform, comprise the Y-direction slide unit, Y-direction guide rail and five-bar mechanism, described Y-direction slide unit is arranged on described Y-direction guide rail by air-bearing, described five-bar mechanism one end is connected in described Y-direction slide unit, the other end is connected in silicon wafer stage by the cable facility, wherein, described Y-direction slide unit is kept being synchronized with the movement in Y-direction and silicon wafer stage by motor-driven, described cable facility is transported on described silicon wafer stage along described five-bar mechanism via described Y-direction slide unit, described five-bar mechanism has the active drive joint, being used for driving described five-bar mechanism moves along X-direction, thereby driving described cable facility moves along X-direction.
Further, described five-bar mechanism comprises five connecting rods, forming the A font connects, wherein the end points of two connecting rods of close described Y-direction slide unit is individually fixed in 2 points of described Y-direction slide unit, independent intermediate connecting rod is connected in the interlude of above-mentioned two connecting rods, one end of two connecting rods of close described silicon wafer stage is connected with two connecting rods of close described Y-direction slide unit respectively, and the other end is connected with each other and tapers off to a point and flexibly connect by described cable facility and described silicon wafer stage.
Further, the end points of described five connecting rods all is provided with turning axle pivot and bearing, makes described five-bar mechanism to positive Y-direction or negative Y-direction bending, thereby the tip of the described five-bar mechanism of the close described silicon wafer stage of drive is along the directions X tangential movement.
Further, be provided with spacer pin or angular stop means near one of them end of two connecting rods of described Y-direction slide unit, in order to limit described five-bar mechanism only at the scope intrinsic deflection of unidirectional design angle, described connecting rod end is provided with back-moving spring simultaneously.
Further, described five connecting rod medial surfaces and/or lateral surface are provided with the buckle for cable facility cabling.
Further, two connecting rods near described silicon wafer stage are provided with to measure connecting rod with respect to the planar three freedom displacement transducer of silicon wafer stage locus.
Further, described five-bar mechanism is cantilever design, and described five connecting rod aluminium alloys, magnesium alloy, titanium alloy, carbon fiber, pottery or other non-magnetic materials come processing and manufacturing.
Further, described active drive joint is driven by electric rotating machine, and described electric rotating machine adopts DC servo motor, is provided with rotary encoder or circle grating on motor shaft, is used for measuring and controlling the motor corner.
Further, between described five-bar mechanism and silicon wafer stage, the cable by described cable facility flexibly connects.
Further, the length of described cable is 10mm～20mm.
Further, described silicon wafer stage is plane air supporting single silicon-chip platform, the many silicon wafer stages of plane air supporting, the floating single silicon-chip platform of planar magnetic or the floating many silicon wafer stages of planar magnetic.
Further, described cable facility comprises the communications cable, power cable, tracheae, water pipe.
The present invention proposes a kind of active driving cable table of photo-etching machine silicon chip platform, a kind of five-bar mechanism device has been proposed as mechanical arm, be used for realizing following work stage in the one dimension free movement of directions X from cable stage, be arranged on the Y-direction horizontal guide rail with cable stage, be used for realizing that cable stage is in the one dimension free movement of Y-direction; A whole set of cable stage device possesses the two-dimensional freedom at X-Y plane.
The servomotor of an ACTIVE CONTROL only is set in the five-bar mechanism equipment mechanism, is used for realizing mechanism's head cable in the ACTIVE CONTROL of the degree of freedom of X-direction and follows the micropositioner motion.All the other hinges adopt the bearing of passive freedom degree to connect, and mechanism rotates flexibly, and frictional dissipation is low, and is little to the interference of micropositioner; Realize the ACTIVE CONTROL of cable stage and cable stage the accompany movement of micropositioner at X-Y plane with this.
The number (servomotor) of reduction system ACTIVE CONTROL unit increases Passive Control unit (bearing hinge and connecting rod), improves the reliability and stability of system with this.
Mode by mechanical five-bar mechanism is to the effective decoupling zero of system, and the corresponding output of input of system reduces the difficulty of system and control strategy, reduces the cost of cable stage device, the realization that the cable stage of being convenient to initiatively to follow is controlled.
The cable module assembly is on five-bar mechanism, and whole system possesses flexibility characteristics, meets the demand of cable flexible design.
A kind of cable support device, it can realize initiatively that cable is controlled again can be as passive actuator, and wherein the difference of passive device and aggressive device is to change the servomotor installation place into bearing.
Beneficial effect of the present invention is:
1) reduce system's ACTIVE CONTROL unit number, increase the Passive Control unit, improve the reliability and stability of system.
2) reduce the difficulty of system and control strategy, reduce the design cost of device.The realization that the cable stage of being convenient to initiatively to follow is controlled.
3) the vertical size of cable stage is little, occupies little space, quality is light, and device is applicable to high-speed motion.
4) reduce cable stage to the disturbance of micropositioner, shorten the stabilization time of work stage, improve the litho machine overall efficiency.
Description of drawings
Figure 1 shows that the active driving cable table structural representation of the photo-etching machine silicon chip platform of preferred embodiment of the present invention.
Figure 2 shows that the five-bar mechanism of preferred embodiment of the present invention is to the work schematic diagram of negative Y-direction bending.
Figure 3 shows that the five-bar mechanism of preferred embodiment of the present invention is to the work schematic diagram of positive Y-direction bending.
Figure 4 shows that the Y-direction slide unit of preferred embodiment of the present invention and the structural representation that five-bar mechanism coordinates.
Figure 5 shows that the bar linkage structure schematic diagram of the five-bar mechanism of preferred embodiment of the present invention.
Figure 6 shows that the active driving cable table structural representation of the photo-etching machine silicon chip platform of another preferred embodiment of the present invention.
Figure 7 shows that the Y-direction slide unit of another preferred embodiment of the present invention and the structural representation that five-bar mechanism coordinates.
Figure 8 shows that the passive matrix cable stage structural representation of preferred embodiment of the present invention.
Embodiment
In order more to understand technology contents of the present invention, especially exemplified by specific embodiment and coordinate appended graphic being described as follows.
A kind of active driving cable table that is applied to photo-etching machine silicon chip platform that the present invention proposes is particularly useful for adopting planar motor to realize the work stage kinematic system of silicon chip director stroke coarse motion, and is also applicable to the double-workpiece-table system that adopts traditional H type framework.The present invention with planar motor as realizing that silicon chip director stroke coarse motion system is introduced.
Please refer to Fig. 1, Figure 1 shows that the active driving cable table structural representation of the photo-etching machine silicon chip platform of preferred embodiment of the present invention. Silicon wafer stage 11,12 be separately to should there be an independently cable stage 410,420, and cable stage 410,420 structure are in full accord.Now as an example of the cable stage 410 of the first half example in detail its structure is described in detail:
the present invention proposes a kind of active driving cable table 410 of photo-etching machine silicon chip platform, comprise Y-direction slide unit 41, Y-direction guide rail 51 and five-bar mechanism 21, described Y-direction slide unit 41 is arranged on described Y-direction guide rail 51 by air-bearing, described five-bar mechanism 21 1 ends are connected in described Y-direction slide unit 41, the other end is connected in silicon wafer stage 11 by the cable facility, wherein, described Y-direction slide unit 41 is kept being synchronized with the movement in Y-direction and silicon wafer stage 11 by motor-driven, described cable facility 23 is transported on described silicon wafer stage 11 along described five-bar mechanism 21 via described Y-direction slide unit 41, described cable facility 23 comprises the communications cable, power cable, tracheae, the pipelines such as water pipe, described five-bar mechanism 21 has active drive joint 31, being used for driving described five-bar mechanism 21 moves along X-direction, thereby driving described cable facility moves along X-direction.
When silicon wafer stage 11 moves along X-direction, five-bar mechanism 21 can either play the support guide effect to cable facility 23, can drive cable facility 23 under the driving in active drive joint 31 again moves along X-direction, control simultaneously whole driving active driving cable table 410 and initiatively follow silicon wafer stage 11 motions in the XY plane, avoid disturbance propagation that cable facility 23 produces in the motion of X-direction and Y-direction to silicon wafer stage 11, affect the kinematic accuracy of silicon wafer stage 11.
Please refer to again Fig. 2 and Fig. 3, Figure 2 shows that the five-bar mechanism of preferred embodiment of the present invention to the work schematic diagram of negative Y-direction bending, Figure 3 shows that the five-bar mechanism of preferred embodiment of the present invention is to the work schematic diagram of positive Y-direction bending.A whole set of five-bar mechanism can be to positive Y-direction bending, so that forward terminal C is accurately along the directions X tangential movement.Simultaneously, five-bar mechanism also can be symmetrical to negative Y-direction bending, so that forward terminal C is accurately along the directions X tangential movement.The set direction of its cable support bending is any in principle, depends on the layout in work stage space in reality, is suitable for suitable with the work stage space layout.
Described five-bar mechanism comprises five connecting rods, forms " A " font and connects, and be respectively AB bar, BC bar, CD bar, DE bar and GF bar.AB bar and DE bar are the connecting rods of a pair of symmetry, and BC bar and CD bar are also the connecting rods of a pair of symmetry, and intermediate connecting rod GF is overlapped on separately connecting rod AB and DE interlude.At its terminal A, B, C, D, E, F and G, all being provided with to provide the axle of rotation pivot and bearing, chooses wherein a certain end points (for example A or B) as the mounting points in active rotation joint.A point and the E point of this five-bar mechanism are fixed on (or on base) on the Y-direction slide unit, AB bar and DE bar can be at certain angular range intrinsic deflections, retrain as main degree of freedom with the GF bar, control five-bar mechanism, contraction and extension, guarantee that the C point can move reciprocatingly along the direction of OC horizontal linear, be C motion of point track along moving reciprocatingly on the OA straight line, wherein OC is vertical in AE.
For limiting five-bar mechanism 2 supports to forward and any bending of negative sense both direction, be provided with spacer pin (or angular stop means) 4 at five connecting rod AB bar (or DE bar) ends and limit AB bars (or DE bar) only at the scope intrinsic deflection of unidirectional design angle, be provided with simultaneously back-moving spring 5, when five-bar mechanism 2 was in contraction state, back-moving spring 5 was in inelastic state.When five-bar mechanism 2 was in extended state, back-moving spring 5 was in extended state (the spring restoring force is maximum).Realize monolateral back and forth movement with this, and control the problem that deflection angle avoids crossing over critical extended state transfer point.
Please refer to again Fig. 4, Figure 4 shows that the Y-direction slide unit of preferred embodiment of the present invention and the structural representation that five-bar mechanism coordinates.At connecting rod medial surface and/or lateral surface (for example AB bar side 100 and BC bar side 200), the pipeline buckle 400 for the fixed cable facility is installed.Connecting rod AB 1 end A point coexists and installs on cable stage 300, in have rotation axis pivot 500 to be connected.Electric rotating machine 600 and rotary encoder (not shown) are installed on the active drive joint, described electric rotating machine 600 adopts DC servo motor, provide a whole set of connecting rod to select required power, and control flexible at directions X of five connecting rods, be provided with rotary encoder or circle grating on motor shaft, be used for measuring and control motor corner; Be connected by a rotation axis pivot 500 between connecting rod BC and connecting rod CD, its end is provided with to measure connecting rod with respect to the planar three freedom displacement transducer (not shown) of silicon wafer stage locus; All connecting rods must less than silicon wafer stage laser interferometer catoptron at vertical height, can not block the optical path of laser interferometer during with the normal operation of assurance silicon wafer stage in vertical overall height with joint motor.
Figure 5 shows that the bar linkage structure schematic diagram of the five-bar mechanism of preferred embodiment of the present invention, structure three-dimensional view for AB bar and BC bar, the A end of connecting rod AB is fixed together with cable stage, in have axle pivot/bearing to make it the axle rotation around A1A2 dot center, the B end (axle centered by B1B2) of connecting rod AB is fixed together with the stator axis bearing of electric rotating machine.The B end (axle centered by B1B2) of connecting rod BC is fixed together with the mover axle of electric rotating machine, so that electric rotating machine is by selecting mover to control AB bar and BC bar, take the angle of B1B2 as common central shaft folding.The C end of connecting rod BC and the C end coaxial (axle centered by C1C2) of CD bar due to the variation of the angle that is subjected to AB bar and the folding of BC bar and the geometrical constraint of whole five-bar mechanism, make the C end to carry out the one dimension tangential movement along directions X.The B end of connecting rod AB is arranged on rotating shaft B1B2 by two bearings, wherein connecting rod AB and bearing outer ring interference fit.Bearing inner race links together with interference fit with rotation axis B1B2, motor is connected with rotation axis B1B2 by small size coupling, the B end of connecting rod BC is fixedly mounted on rotation axis B1B2, is equipped with on the C end of connecting rod BC and measures connecting rod with respect to the planar three freedom displacement transducer of silicon wafer stage.Pipeline buckle 400 for the fixed cable facility is installed on connecting rod AB and the BC outside, the left side of linkage assembly is used for signal cable, the power cable equal diameter is less, the cable facility cabling of corresponding bending radius less, the right side is used for tracheae, the water pipe equal diameter is larger, and bending radius is relatively large cable facility cabling also.
Further, described five-bar mechanism is cantilever design, in order to reduce the cantilever quality, consider simultaneously and be applied in the occasion that adopts the magnetic-floating plane motor, connecting rod aluminium alloy, magnesium alloy, titanium alloy, carbon fiber or the less non-magnetic material of ceramic isodensity come processing and manufacturing, and described silicon wafer stage is plane air supporting single silicon-chip platform, the many silicon wafer stages of plane air supporting, the floating single silicon-chip platform of planar magnetic or the floating many silicon wafer stages of planar magnetic.
Sum up above embodiment, the five-bar mechanism that it comprises an active drive joint is one dimension degree of freedom motion, any point making under the electric rotating machine effect on the line of symmetry of end C arrival take the AE line segment as mid point of this linkage assembly makes the C point along the X-direction horizontal reciprocating movement.In addition, in conjunction with the shift motion of Y-direction slide unit in Y-direction, cable stage can drive a whole set of initiatively follows the silicon wafer stage motion without connecting rod cable facility in the XY plane, and the disturbance that produces during assurance cable ride motion can not be delivered to silicon wafer stage system.Greatly lowered by the mechanism of an Electric Machine Control difficulty and relevant device and cost that system controls simultaneously.
Please refer to again Fig. 6 and Fig. 7, Figure 6 shows that the active driving cable table structural representation of the photo-etching machine silicon chip platform of another preferred embodiment of the present invention, Figure 7 shows that the Y-direction slide unit of another preferred embodiment of the present invention and the structural representation that five-bar mechanism coordinates.Wherein the layout of cable and pipeline can be arranged in the inboard of five-bar mechanism, arranges along AB and BC, and cable and flexible pipe are same with the inwardly bending of five connecting rods.In addition, can be arranged in A end or E end as the electric rotating machine in the active drive joint 31 of five-bar mechanism, to control the selected angle of AB bar, control the flexible of a whole set of five-bar mechanism, and then control the C point along the motion in one dimension of X-direction.Due to symmetric principle, AB and DE pole pair claim, BC and CD pole pair claim.This sentences the AB bar and the BC bar is that example has illustrated corresponding arrangement, and wherein the pipeline buckle is arranged in the inboard of two bars.Pipeline can be chosen in inboard configuration or outside configuration according to the configuration needs, or both configure simultaneously.Wherein the drive unit electric rotating machine of five connecting rods can be arranged in the A end, makes five connecting rod front end cantilever quality alleviate, and makes simple in structure reliable with system.
Figure 8 shows that the passive matrix cable stage structural representation of preferred embodiment of the present invention.This device also can as a kind of passive cable support device, be carried out the Passive Control that drags cable because of the work stage motion.When as passive device, the difference of it and aggressive device is that changing servomotor installation place 310 into bearing installs.Realize the free-extension at directions X of five connecting rod cable supports with this.
When as active control device, whole five-bar mechanism relies on driven by servomotor, controls and shrinks or extended state, controls five-bar mechanism C point and does motion in one dimension at directions X.When as passive towed equipment, whole five-bar mechanism relies on micropositioner and drives, and controls and shrinks or extended state, controls five-bar mechanism C point and does the one dimension to-and-fro movement at directions X.
Although the present invention discloses as above with preferred embodiment, so it is not to limit the present invention.The persond having ordinary knowledge in the technical field of the present invention, without departing from the spirit and scope of the present invention, when being used for a variety of modifications and variations.Therefore, protection scope of the present invention is as the criterion when looking claims person of defining.
Claims (12)
1. the active driving cable table of a photo-etching machine silicon chip platform, it is characterized in that, comprise the Y-direction slide unit, Y-direction guide rail and five-bar mechanism, described Y-direction slide unit is arranged on described Y-direction guide rail by air-bearing, described five-bar mechanism one end is connected in described Y-direction slide unit, the other end is connected in silicon wafer stage by the cable facility, wherein, described Y-direction slide unit is kept being synchronized with the movement in Y-direction and silicon wafer stage by motor-driven, described cable facility is transported on described silicon wafer stage along described five-bar mechanism via described Y-direction slide unit, described five-bar mechanism has the active drive joint, being used for driving described five-bar mechanism moves along X-direction, thereby driving described cable facility moves along X-direction.
2. the active driving cable table of photo-etching machine silicon chip platform according to claim 1, it is characterized in that, described five-bar mechanism comprises five connecting rods, forming the A font connects, wherein the end points of two connecting rods of close described Y-direction slide unit is individually fixed in 2 points of described Y-direction slide unit, independent intermediate connecting rod is connected in the interlude of above-mentioned two connecting rods, one end of two connecting rods of close described silicon wafer stage is connected with two connecting rods of close described Y-direction slide unit respectively, and the other end is connected with each other and tapers off to a point and flexibly connect by described cable facility and described silicon wafer stage.
3. the active driving cable table of photo-etching machine silicon chip platform according to claim 2, it is characterized in that, the end points of described five connecting rods all is provided with turning axle pivot and bearing, make described five-bar mechanism to positive Y-direction or negative Y-direction bending, thereby the tip of the described five-bar mechanism of the close described silicon wafer stage of drive is along the directions X tangential movement.
4. the active driving cable table of photo-etching machine silicon chip platform according to claim 2, it is characterized in that, be provided with spacer pin or angular stop means near one of them end of two connecting rods of described Y-direction slide unit, in order to limit described five-bar mechanism only at the scope intrinsic deflection of unidirectional design angle, described connecting rod end is provided with back-moving spring simultaneously.
5. the active driving cable table of photo-etching machine silicon chip platform according to claim 2, is characterized in that, described five connecting rod medial surfaces and/or lateral surface are provided with the buckle for cable facility cabling.
6. the active driving cable table of photo-etching machine silicon chip platform according to claim 2, is characterized in that, two connecting rods of close described silicon wafer stage are provided with to measure connecting rod with respect to the planar three freedom displacement transducer of silicon wafer stage locus.
7. the active driving cable table of photo-etching machine silicon chip platform according to claim 2, it is characterized in that, described five-bar mechanism is cantilever design, and described five connecting rod aluminium alloys, magnesium alloy, titanium alloy, carbon fiber, pottery or other non-magnetic materials come processing and manufacturing.
8. the active driving cable table of photo-etching machine silicon chip platform according to claim 1, it is characterized in that, described active drive joint is driven by electric rotating machine, described electric rotating machine adopts DC servo motor, be provided with rotary encoder or circle grating on motor shaft, be used for measuring and control motor corner.
9. the active driving cable table of photo-etching machine silicon chip platform according to claim 1, is characterized in that, the cable by described cable facility between described five-bar mechanism and silicon wafer stage flexibly connects.
10. the active driving cable table of photo-etching machine silicon chip platform according to claim 9, is characterized in that, the length of described cable is 10mm～20mm.
11. the active driving cable table of photo-etching machine silicon chip platform according to claim 1 is characterized in that, described silicon wafer stage is plane air supporting single silicon-chip platform, the many silicon wafer stages of plane air supporting, the floating single silicon-chip platform of planar magnetic or the floating many silicon wafer stages of planar magnetic.
12. the active driving cable table of photo-etching machine silicon chip platform according to claim 1 is characterized in that, described cable facility comprises the communications cable, power cable, tracheae, water pipe.
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| CN201110436683.1A CN103176366B (en) | 2011-12-22 | 2011-12-22 | Active drive cable table of lithography machine wafer stage |
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| CN201110436683.1A CN103176366B (en) | 2011-12-22 | 2011-12-22 | Active drive cable table of lithography machine wafer stage |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN108873621A (en) * | 2018-07-26 | 2018-11-23 | 中山新诺科技股份有限公司 | Sided exposure machine and double-faced exposure method |
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| CN103176366B (en) | 2015-01-21 |
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