CN103246168B - A kind of active driving cable table of photo-etching machine silicon chip platform - Google Patents
A kind of active driving cable table of photo-etching machine silicon chip platform Download PDFInfo
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- CN103246168B CN103246168B CN201210024607.4A CN201210024607A CN103246168B CN 103246168 B CN103246168 B CN 103246168B CN 201210024607 A CN201210024607 A CN 201210024607A CN 103246168 B CN103246168 B CN 103246168B
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Abstract
The present invention proposes a kind of active driving cable table of photo-etching machine silicon chip platform, comprise Y-direction slide unit, Y-direction guide rail and pantograph linkage of intersecting, Y-direction slide unit is arranged on Y-direction guide rail by air-bearing, Y-direction slide unit is driven by slide unit motor and keeps being synchronized with the movement in Y-direction and silicon wafer stage, cable facility is transported on silicon wafer stage via described Y-direction slide unit along intersection pantograph linkage, pantograph linkage of intersecting comprises intersection shrinking connecting-rod and driver, intersection shrinking connecting-rod one end connects described Y-direction slide unit, the other end is connected to silicon wafer stage by cable facility, driver intersects shrinking connecting-rod along X to moving for driving, thus drive cable facility along X to moving.The active driving cable table of photo-etching machine silicon chip platform of the present invention, realizes the ACTIVE CONTROL of cable stage and cable stage the accompany movement of silicon wafer stage at X-Y plane.
Description
Technical field
The present invention relates to semiconductor lithography apparatus field, and in particular to a kind of active driving cable table of photo-etching machine silicon chip platform.
Background technology
In semiconductor lithography equipment, the precision workpiece such as silicon wafer stage and mask platform stage movement system is extremely important critical component, and its positioning precision directly affects the performance of lithographic equipment, and its travelling speed directly affects the production efficiency of lithographic equipment.Along with improving constantly of VLSI (very large scale integrated circuit) device integration, the continuous enhancing of photoetching resolution, to the characteristic line breadth index request of litho machine also in continuous lifting, the travelling speed of corresponding work stage, acceleration and accuracy requirement also improve constantly.
The typical version of lithography machine stage system is the structure that thick, fine motion combines, due to planar motor, to have force density high, the features such as high speed, high reliability, and be easy to be integrated in controlled device, there is fast response time, control the advantages such as highly sensitive, physical construction is simple, be applied in semiconductor lithography equipment at present, realized the Long travel coarse motion of silicon wafer stage.But realize the silicon wafer stage of Long travel coarse motion without X, Y-direction guide rail owing to adopting planar motor, and for the silicon wafer stage supporting various communications cables, power cable and the pipeline facility such as tracheae, water pipe to need to follow silicon wafer stage at XY move in plane, therefore need to arrange cable support guide piece.Common silicon wafer stage cable facility be passive silicon wafer stage of following at XY move in plane, when silicon wafer stage carries out high-speed motion and nanoscale is accurately located, the pipeline facility of dragging will be can not ignore the disturbance that silicon wafer stage produces.
Prior art discloses a kind of planar motor that adopts and drives silicon wafer stage to realize the workpiece table system of Long travel coarse motion, its cable support guide piece comprises one group of V-type link assembly linked together by a revolute pair, one end of link assembly is arranged on X on slide unit by revolute pair, the other end is arranged on silicon wafer stage by revolute pair, silicon wafer stage cable facility is sent to silicon wafer stage from slide unit along link assembly, and moves at the passive silicon wafer stage of following of Y-direction together with link assembly.Program pipeline facility has support vertical, avoids sagging with work top friction, but follows silicon wafer stage motion Y-direction is passive, can affect silicon wafer stage motion positions precision.
Another prior art discloses a kind of cable stage adopting the photo-etching machine silicon chip platform of multi-joint manipulator, this cable stage comprises a control device and at least one multi-joint manipulator, silicon wafer stage pipeline facility is gone on silicon wafer stage by multi-joint manipulator, ensure that pipeline facility initiatively follows silicon wafer stage at XY move in plane by the corner controlling each joint driver, avoid the impact of pipeline facility on silicon wafer stage motion positions precision, but this cable stage complex structure, the more number of drives causing using of manipulator joint number is more, About Redundant Manipulator Control System Design more complicated simultaneously, cost of development is relatively high.
Summary of the invention
The present invention proposes a kind of active driving cable table of photo-etching machine silicon chip platform, realizes the ACTIVE CONTROL of cable stage and cable stage the accompany movement of silicon wafer stage at X-Y plane.
For reaching above-mentioned purpose, the present invention proposes a kind of active driving cable table of photo-etching machine silicon chip platform, comprise Y-direction slide unit, Y-direction guide rail and pantograph linkage of intersecting, Y-direction slide unit is arranged on Y-direction guide rail by air-bearing, Y-direction slide unit is driven by slide unit motor and keeps being synchronized with the movement in Y-direction and silicon wafer stage, cable facility is transported on silicon wafer stage via described Y-direction slide unit along intersection pantograph linkage, pantograph linkage of intersecting comprises intersection shrinking connecting-rod and driver, intersection shrinking connecting-rod one end connects described Y-direction slide unit, the other end is connected to silicon wafer stage by cable facility, driver intersects shrinking connecting-rod along X to moving for driving, thus drive cable facility along X to moving.
Further, described intersection shrinking connecting-rod comprises eight rod members, described eight rod members intersect to form four intersection points and three parallelogram between two, two intersection points near described Y-direction slide unit are individually fixed in 2 points of Y-direction slide unit, intersection point near described silicon wafer stage is unsettled, and connects described silicon wafer stage by cable facility.
Further, Y-direction slide unit is provided with the first supporting base and the second supporting base, leading screw is provided with between first supporting base and the second supporting base, feed screw nut is arranged on leading screw by screw pair, two intersection points near described Y-direction slide unit in four intersection points are individually fixed in above-mentioned first supporting base of Y-direction slide unit and above-mentioned second supporting base, described driver is electric rotating machine, and the motor shaft of electric rotating machine is connected firmly mutually by shaft coupling one end with leading screw.
Further, the motor shaft of described electric rotating machine is provided with rotary encoder or Circular gratings, is used for measuring and controlling motor corner.
Further, be all connected by revolute pair between eight rod members of described intersection shrinking connecting-rod.
Further, each bar of described intersection shrinking connecting-rod
The side of part is provided with the cable buckle for cable facility cabling.
Further, near the intersection point connecting sensor support of silicon wafer stage in described four intersection points, sensor stand is provided with two displacement transducers, is used for measuring and intersects pantograph linkage relative to the angular displacement of silicon wafer stage X to displacement and silicon wafer stage Rz axis.
Further, described intersection shrinking connecting-rod is cantilever design, and every root rod member aluminium alloy, magnesium alloy, titanium alloy, carbon fiber, pottery or other non-magnetic materials carry out processing and manufacturing.
Further, flexibly connected by the cable of described cable facility between described intersection shrinking connecting-rod and silicon wafer stage.
Further, described silicon wafer stage is plane air supporting single silicon-chip platform, the many silicon wafer stages of plane air supporting, planar magnetic floats single silicon-chip platform or planar magnetic floats many silicon wafer stages.
Further, described cable facility comprises the communications cable, power cable, tracheae, water pipe.
In sum, the present invention is directed to and adopt planar motor to realize the work stage kinematic system of silicon wafer stage Long travel coarse motion, propose a kind of active driving cable table structure, each silicon wafer stage is to there being an independently cable stage, this cable stage structure is simple, can drive silicon wafer stage cable facility in XY plane, initiatively follow silicon wafer stage motion, ensure cable facility X to flexible can not by disturbance propagation to silicon wafer stage.
The present invention estimate produce benefit can be summarized as following some:
1. the cable stage of silicon wafer stage of photo-etching machine of the present invention's proposition, effectively can support and drive silicon wafer stage cable facility synchronously to follow the step-scan campaign of silicon wafer stage, ensure that the disturbance produced in cable ride motion process can not be delivered to silicon wafer stage, and then improve the motion positions precision of silicon wafer stage;
2. the intersection pantograph linkage on cable stage only comprises single driver, physical construction and control algolithm are relatively simple, for different lithography machine stage system, can according to silicon wafer stage X to limit travel and the minimum radius that bends of cable facility disposed thereon choose the cable stage of the group array Cheng Xin of the parallelogram length of side and parallelogram linkage flexibly, structure is simple, and extensibility is good.
3. for double-workpiece-table system, this cable stage device can work stage laser interferometer measurement less than region as two work stage be in dual stage exchange the position such as position, fluctuating plate position time, or before the initialization of work stage laser interferometer, replace laser interferometer to measure the position of silicon wafer stage in XY plane.
Accompanying drawing explanation
Figure 1 shows that the active driving cable table structural representation of the photo-etching machine silicon chip platform of the embodiment of the present invention 1.
Figure 2 shows that in embodiment 1 that intersecting pantograph linkage is installed on the schematic diagram of feed screw nut.
Figure 3 shows that the schematic diagram of the intersection pantograph linkage in embodiment 1.
Figure 4 shows that the kinetic control system calcspar of the active driving cable table of the photo-etching machine silicon chip platform in embodiment 1.
Figure 5 shows that the active driving cable table structural representation of the photo-etching machine silicon chip platform of the embodiment of the present invention 2.
Figure 6 shows that the active driving cable table structural representation of the photo-etching machine silicon chip platform of the embodiment of the present invention 3.
Embodiment
In order to more understand technology contents of the present invention, institute's accompanying drawings is coordinated to be described as follows especially exemplified by specific embodiment.
A kind of silicon wafer stage cable stage being applied to the employing intersection pantograph linkage of litho machine that the present invention proposes, being particularly useful for adopting planar motor to realize the work stage kinematic system of silicon wafer stage Long travel coarse motion, being also suitable for adopting the dual-workpiece system of traditional H type frame structure.
Figure 1 shows that the active driving cable table structural representation of the photo-etching machine silicon chip platform of the embodiment of the present invention 1.Figure 2 shows that in embodiment 1 and intersect the schematic diagram being installed on feed screw nut of pantograph linkage; Figure 3 shows that the intersection pantograph linkage schematic diagram in embodiment 1.Please also refer to Fig. 1 to Fig. 3, the active driving cable table CS1 of photo-etching machine silicon chip platform comprises Y-direction slide unit 1, Y-direction guide rail 2 and along X to reciprocating intersection pantograph linkage 10, Y-direction slide unit 1 is arranged on Y-direction guide rail 2 by air-bearing, Y-direction slide unit 1 is driven by slide unit motor and keeps being synchronized with the movement in Y-direction and silicon wafer stage WST1, necessary various communications cable when silicon wafer stage WST1 normally works, power cable, tracheae, the pipeline facilities such as water pipe are carried by cable stage CS1, namely cable facility is transported on silicon wafer stage WST1 along intersection pantograph linkage 10 via Y-direction slide unit 1.Pantograph linkage 10 of intersecting comprises intersection shrinking connecting-rod 107 and driver 101, intersection shrinking connecting-rod 107 one end connects Y-direction slide unit 1, the other end is connected to silicon wafer stage WST1 by cable facility, driver 101 intersects shrinking connecting-rod along X to moving for driving, thus drives cable facility along X to moving.
Particularly when silicon wafer stage WS1 is along X to when moving, pantograph linkage 10 of intersecting can either play support guide effect to cable facility, again can under the effect of the driver 101 of intersection pantograph linkage 10, drive cable facility to making reciprocal telescopic movement, realizes X to the folding of cable and stretching, extension at X.In addition, intersect pantograph linkage end and silicon wafer stage X to distance remain constant, avoid cable facility X to the disturbance propagation that produces of stretching motion to silicon wafer stage.
The shrinking connecting-rod 107 that intersects comprises eight rod member 107a-107h, and eight rod members intersect to form four intersection points and three parallelogram between two.Y-direction slide unit 1 be provided with the first supporting base 103 and be provided with leading screw 104 between the second supporting base 106, first supporting base 103 and the second supporting base 106, feed screw nut 105 is arranged on leading screw 104 by screw pair.The shrinking connecting-rod 107 that intersects is individually fixed in 2 points of Y-direction slide unit near two intersection point A and B of Y-direction slide unit 1, the intersection point C near silicon wafer stage WST1 is unsettled, is connected and at X to keeping certain gap with silicon wafer stage WST1 mechanical.
In the present embodiment, driver 101 is electric rotating machine, and the motor shaft of electric rotating machine 101 is connected firmly mutually by shaft coupling 102 one end with leading screw 104.Motor shaft is also provided with rotary encoder or Circular gratings, is used for measuring and controlling motor corner.The shrinking connecting-rod 107 that intersects adopts electric rotating machine to drive, utilize feed screw nut 105 by the convert rotational motion of motor 101 for along X to straight reciprocating motion, and then drive the cable facility being arranged in and intersecting in pantograph linkage 10 along X to making reciprocal telescopic movement, in conjunction with the motion of the Y-direction slide unit 1 on cable stage in Y-direction, cable stage initiatively can be followed silicon wafer stage WST1 and moves by drive cable facility in XY plane, and the disturbance produced when ensureing cable ride motion can not be delivered to silicon wafer stage system.
In the present embodiment, be all connected by revolute pair between each rod member of intersection shrinking connecting-rod 107.
Further, the side of each rod member arranges cable buckle 108, for being fixedly transported to the various cable facilities on silicon wafer stage.During in order to reduce power cable and signal cable hypotelorism, produce crosstalk each other, power cable and signal cable divide two-way to be transported to silicon wafer stage from Y-direction slide unit along parallelogram pantograph linkages 107 through cable buckle 108, and the pipeline facilities such as tracheae, water pipe is also transported on silicon wafer stage WST1 along intersection shrinking connecting-rod 107 by two-way Y-direction slide unit respectively.Above-mentioned two cabling circuits are respectively: circuit 1, Y-direction slide unit → 107b-107c-107f-107g → silicon wafer stage; Circuit 2, Y-direction slide unit → 107a-107d-107e-107h → silicon wafer stage.
Further, near the intersection point C connecting sensor support 110 of silicon wafer stage WST1, being provided with two parallel placements, just shrinking connecting-rod 107 being intersected relative to silicon wafer stage WST1 displacement transducer 109a, 109b at X axis relative position to being used for measuring to X, by the shift differences measured by displacement transducer 109a, 109b, the angular displacement of silicon wafer stage WST1 in Rz axis can be obtained.The vertical height of pantograph linkage 10 of intersecting is less than silicon wafer stage WST1 laser interferometer catoptron at vertical height, to ensure that cable stage follows the optical path that silicon wafer stage WST1 can not block laser interferometer when XY move in plane.
In the present embodiment, pantograph linkage 10 of intersecting is cantilever design, and every root rod member aluminium alloy, magnesium alloy, titanium alloy, carbon fiber, pottery or other non-magnetic materials carry out processing and manufacturing.Silicon wafer stage can be plane air supporting single silicon-chip platform, the many silicon wafer stages of plane air supporting, planar magnetic floats single silicon-chip platform or planar magnetic floats many silicon wafer stages.Cable facility comprises the communications cable, power cable, tracheae, water pipe.
The motion control of the cable stage of silicon wafer stage of photo-etching machine of intersection pantograph linkage is adopted to adopt close-loop feedback to control, its feedback control system calcspar is as shown in Figure 4: be arranged on one group of displacement transducer 109a, 109b intersecting on pantograph linkage 10 end for measure the relative silicon wafer stage WST1 of pantograph linkages X to distance, when intersection pantograph linkage 10 is synchronized with the movement according to given distance and silicon wafer stage WST1, displacement transducer 109a, 109b do not have signal to export, when being disturbed, therebetween ranging offset expectation value, displacement transducer 109a, 109b exports the signal be directly proportional to range deviation, compare through comparator circuit, amplifier is sent to control device after amplifying, control device controls performance element electric rotating machine and turns an angle, drive controlled device to intersect pantograph linkage 10 to stretch certain displacement, with reduce to intersect pantograph linkages relative silicon wafer stage WST1 X to range deviation, along with the reduction of range deviation, displacement transducer 109a, the output signal of 109b is more and more less, range deviation also reduces thereupon, until distance gets back to expectation value.In order to better improve the drived control precision to cable stage, in the present embodiment above-mentioned close-loop feedback being controlled to be called main feedback control, being described in conjunction with following local feedback control.Local feedback control regulates to intersect the angular displacement of pantograph linkage relative to silicon wafer stage Rz axis.Described in Fig. 4, displacement transducer 109a, 109b output cross pantograph linkage is relative to the angular displacement of silicon wafer stage Rz axis, compare through comparator circuit, amplifier amplify after be sent to control device, control device controls performance element electric rotating machine and turns an angle, to reduce to intersect the angular displacement of pantograph linkage relative to silicon wafer stage Rz axis, along with the reduction of angular displacement deviation, the output signal of displacement transducer 109a, 109b is more and more less, angular displacement deviation also reduces thereupon, until distance gets back to expectation value, then carry out main feedback control.
Figure 5 shows that the active driving cable table structural representation of the photo-etching machine silicon chip platform of the embodiment of the present invention 2.See Fig. 5, silicon wafer stage WST1, WST2 is separately to there being an independently cable stage CS1, CS2, cable stage CS1, the structure of CS2 is identical and completely the same with the cable stage structure in embodiment 1, cable stage CS1, two displacement transducer 109a of the parallelogram intersection pantograph linkage end on CS2, 109b can record the relative cable stage of silicon wafer stage intersect pantograph linkage X to relative displacement and silicon wafer stage around the angular displacement of Rz axis, in conjunction with the one-dimensional grating chi measuring cable stage Y-direction sliding displacement, this cable stage device CS1, CS2 can work stage laser interferometer measurement less than region such as two silicon wafer stages be in dual stage exchange position, during the positions such as fluctuating plate position, or before the initialization of work stage laser interferometer, laser interferometer is replaced to measure the position of silicon wafer stage in XY plane.
Figure 6 shows that the active driving cable table structural representation of the photo-etching machine silicon chip platform of the embodiment of the present invention 3.See Fig. 6, by embodiment 1 in this embodiment, the driver of pantograph linkage 10 of intersecting in embodiment 2 has made into along X to the linear electric motors moved by electric rotating machine, the stator 111 of linear electric motors is arranged on Y-direction slide unit 1, mover 112 is arranged on X on slide unit 113, 113, slide unit is arranged on Y-direction slide unit 1 by vertical levitation device, intersection pantograph linkage 10 described in embodiment 1 is connected to slide unit 113 with X by revolute pair, X adopts one-dimensional grating chi to measure to slide unit 113 in the displacement of X axis, pantograph linkage of intersecting adopts with mode identical in embodiment 1 with relative position measurement in the plane between silicon wafer stage.This example structure is simple, by two in XY plane two linear electric motors of quadrature arrangement on cable stage slide unit and one group of parallelogram intersect pantograph linkage and support and drive silicon wafer stage cable facility initiatively to follow silicon wafer stage at XY move in plane, the disturbance produced when significantly reducing silicon wafer stage cable facility stretching motion is on the impact of silicon wafer stage motion positions precision.
Although the present invention with preferred embodiment disclose as above, so itself and be not used to limit the present invention.Persond having ordinary knowledge in the technical field of the present invention, without departing from the spirit and scope of the present invention, when being used for a variety of modifications and variations.Therefore, protection scope of the present invention is when being as the criterion depending on those as defined in claim.
Claims (11)
1. the active driving cable table of a photo-etching machine silicon chip platform, it is characterized in that, comprise Y-direction slide unit, Y-direction guide rail and pantograph linkage of intersecting, described Y-direction slide unit is arranged on described Y-direction guide rail by air-bearing, described Y-direction slide unit is driven by slide unit motor and keeps being synchronized with the movement in Y-direction and silicon wafer stage, described cable facility is transported on described silicon wafer stage via described Y-direction slide unit along described intersection pantograph linkage, pantograph linkage of intersecting comprises intersection shrinking connecting-rod and driver, described intersection shrinking connecting-rod one end connects described Y-direction slide unit, the other end is connected to silicon wafer stage by cable facility, described driver is for driving described intersection shrinking connecting-rod along X to moving, thus drive described cable facility along X to moving.
2. the active driving cable table of photo-etching machine silicon chip platform according to claim 1, it is characterized in that, described intersection shrinking connecting-rod comprises eight rod members, described eight rod members intersect to form four intersection points and three parallelogram between two, two intersection points near described Y-direction slide unit are individually fixed in 2 points of Y-direction slide unit, intersection point near described silicon wafer stage is unsettled, and connects described silicon wafer stage by cable facility.
3. the active driving cable table of photo-etching machine silicon chip platform according to claim 2, it is characterized in that, Y-direction slide unit is provided with the first supporting base and the second supporting base, leading screw is provided with between first supporting base and the second supporting base, feed screw nut is arranged on leading screw by screw pair, two intersection points near described Y-direction slide unit in four intersection points are individually fixed in above-mentioned first supporting base of Y-direction slide unit and above-mentioned second supporting base, described driver is electric rotating machine, and the motor shaft of electric rotating machine is connected firmly mutually by shaft coupling one end with leading screw.
4. the active driving cable table of photo-etching machine silicon chip platform according to claim 3, is characterized in that, the motor shaft of described electric rotating machine is provided with rotary encoder or Circular gratings, is used for measuring and controlling motor corner.
5. the active driving cable table of photo-etching machine silicon chip platform according to claim 2, is characterized in that, is all connected by revolute pair between eight rod members of described intersection shrinking connecting-rod.
6. the active driving cable table of photo-etching machine silicon chip platform according to claim 2, is characterized in that, the side of each rod member of described intersection shrinking connecting-rod is provided with the cable buckle for cable facility cabling.
7. the active driving cable table of photo-etching machine silicon chip platform according to claim 2, it is characterized in that, near the intersection point connecting sensor support of silicon wafer stage in described four intersection points, sensor stand is provided with two displacement transducers, is used for measuring and intersects pantograph linkage relative to the angular displacement of silicon wafer stage X to displacement and silicon wafer stage Rz axis.
8. the active driving cable table of photo-etching machine silicon chip platform according to claim 2, it is characterized in that, described intersection shrinking connecting-rod is cantilever design, and every root rod member aluminium alloy, magnesium alloy, titanium alloy, carbon fiber, pottery or other non-magnetic materials carry out processing and manufacturing.
9. the active driving cable table of photo-etching machine silicon chip platform according to claim 1, is characterized in that, is flexibly connected between described intersection shrinking connecting-rod and silicon wafer stage by the cable of described cable facility.
10. the active driving cable table of photo-etching machine silicon chip platform according to claim 1, is characterized in that, described silicon wafer stage is plane air supporting single silicon-chip platform, the many silicon wafer stages of plane air supporting, planar magnetic floats single silicon-chip platform or planar magnetic floats many silicon wafer stages.
The active driving cable table of 11. photo-etching machine silicon chip platforms according to claim 1, is characterized in that, described cable facility comprises the communications cable, power cable, tracheae, water pipe.
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| CN104874860A (en) * | 2015-04-07 | 2015-09-02 | 苏州金童机械制造股份有限公司 | Telescopic cutting device for composite color steel plates |
| CN108121167B (en) * | 2016-11-30 | 2020-05-01 | 上海微电子装备（集团）股份有限公司 | Workpiece table shifting device and photoetching machine |
| CN109856920B (en) * | 2017-11-30 | 2021-06-04 | 上海微电子装备（集团）股份有限公司 | Rotation prevention device, motion table system and photoetching equipment |
| CN112089585B (en) * | 2020-10-15 | 2022-12-30 | 苏州宣嘉光电科技有限公司 | Vision training device |
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| CN101770180A (en) * | 2010-02-02 | 2010-07-07 | 清华大学 | Cable stage for lithography wafer stages, adopting multi-joint manipulators |
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Address after: 201203 Pudong New Area East Road, No. 1525, Shanghai Patentee after: Shanghai microelectronics equipment (Group) Limited by Share Ltd Address before: 201203 Pudong New Area East Road, No. 1525, Shanghai Patentee before: Shanghai Micro Electronics Equipment Co., Ltd. |