CN103115571A - Displacement measurement system - Google Patents
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- CN103115571A CN103115571A CN2013100207411A CN201310020741A CN103115571A CN 103115571 A CN103115571 A CN 103115571A CN 2013100207411 A CN2013100207411 A CN 2013100207411A CN 201310020741 A CN201310020741 A CN 201310020741A CN 103115571 A CN103115571 A CN 103115571A
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Abstract
The invention provides a displacement measurement system which mainly comprises a laser, a data acquisition and processing unit, and further comprises a feedback unit and a third reflecting mirror, wherein the laser is used for outputting dual-frequency laser light, the data acquisition and processing unit is used for receiving interference laser light output by the laser and carrying out data processing, the feedback unit comprises a first reflecting mirror and a second reflecting mirror which are opposite to each other and arranged at an interval, the first reflecting mirror is provided with a first surface to directly receive incident laser light, the first surface is provided with a plurality of first grooves extending along the same direction in parallel, a second reflecting mirror is provided with a second surface opposite to the first surface, the second surface comprises a plurality of second grooves extending along the same direction side by side, the laser light output by the laser is reflected for multiple times among the first grooves and the second grooves then enters the third reflecting mirror, and then the laser light output by the laser returns to the laser along an original path through the reflection of the third reflecting mirror to form laser feedback.
Description
Technical field
The invention belongs to the displacement measuring technology field, especially about a kind of nano-grade displacement measuring system based on the right-angle prism feedback.
Background technology
Nano measurement is the basis of nano science development, and nano science is mainly that research, discovery and processing structure size are less than material, device and the system of 100 nanometers, obtaining needed function and performance, and be used widely in fields such as material, chemistry, biology, the energy and medical and health.Along with the arrival of nanometer era, the demand that the product of nanoscale is detected increases day by day, also the nano measurement technology has been proposed higher standard simultaneously.Nano measurement need to reach nano level resolution in millimetre-sized measurement range, need simultaneously to consider the requirement of the aspects such as environmental baseline, system complex degree and traceability.
The nano measurement technology is according to the standard of range, resolution and uncertainty of measurement, can be divided into two large classes: a class is mentioned laser interferometer, be characterized in that range is large, can reach tens meters, but will realize with divided methods such as electronics phase demodulations the displacement less than half optical wavelength; Another kind of is beat method Fabry-Perot-type (Fabry-Perot, F-P) interferometer technique, X ray interferometer technique, optics+X ray interferometer technique, frequency measurement technology and frequency comb technology etc., their characteristics are that resolution and uncertainty of measurement are low, can reach even micromicron magnitude of inferior nanometer.Yet mentioned laser interferometer is due to the impact of the nonlinearity errons such as electronic noise, and therefore half-wavelength is difficult to satisfy high-resolution requirement with interior displacement measurement and unreliable.And the range of beat Fabry-Perot interferometer technology etc. is little, generally in micron dimension, has limited its range of application.
Based on the displacement measurement method of laser feedback have advantages of simple in structure, autocollimation and cost performance high.Yet, traditional laser feedback that utilizes is measured in the measurement mechanism of displacement, owing to adopting uncollimated exocoel feedback, feedback order and the resolution of laser beam in the feedback exocoel can not directly obtain, but just can know the resolution of this device after needing interferometer to demarcate, when realizing nano level displacement measurement resolution, can't realize the demarcation certainly of resolution.
Summary of the invention
In sum, necessaryly provide a kind of displacement measurement system that has nanometer resolution and can directly obtain resolution.
A kind of displacement measurement system mainly comprises: a laser instrument, in order to export double-frequency laser; One data acquisition and processing unit are in order to the interference laser that receives laser instrument output and carry out data and process; Wherein, further comprise a feedback unit, described feedback unit comprises: one first catoptron, described the first catoptron has a first surface with direct reception incident laser, described first surface has a plurality of the first grooves that extend along first direction, and each first groove comprises one first vertical side and one second side; One second catoptron and interval relative with described the first catoptron arranges, described the second catoptron has the second surface of facing with described first surface, described second surface comprises a plurality of the second grooves that extend along first direction, and each second groove comprises one the 3rd vertical side and one the 4th side; And one the 3rd catoptron be arranged on described the first catoptron one side, and in the face of described the second catoptron setting, the laser straight access of laser instrument output is incident upon described the first catoptron, after Multi reflection between a plurality of second grooves of a plurality of first grooves of described the first catoptron and the second catoptron, be incident to described the 3rd catoptron, through after described the 3rd mirror reflects along forming laser feedback in original optical path return laser light device.
A kind of displacement measurement system mainly comprises: a laser instrument, in order to the double-frequency laser of output along the Z direction; One data acquisition and processing unit are in order to the interference laser that receives laser instrument output and carry out data and process; Wherein, further comprise a feedback unit, described feedback unit comprises one first catoptron, the second catoptron and one the 3rd catoptron, described the first catoptron and interval relative with described the second catoptron arranges, described the first catoptron has a first surface, and described first surface comprises an incidence zone, the first echo area, the first boot section, the second boot section; Described incidence zone has a plurality of the 3rd grooves that extend along directions X; Described the first echo area has a plurality of the 4th grooves that extend along directions X, and described the 4th groove and described the 3rd groove are arranged side by side; Described the first boot section, the first echo area and described the second boot section set gradually along Y-direction, and described the first boot section has a plurality of the 5th grooves that extend along Y-direction; Described the second boot section has a plurality of the 6th grooves that extend along Y-direction, described the 6th groove and the staggered corresponding setting of described the 5th groove; Described the second catoptron has a second surface and described first surface is faced setting, and described second surface has a plurality of the second grooves that extend along directions X; Wherein, the direction of laser instrument Output of laser is the Z direction, with the direction of Z perpendicular direction be orthogonal directions X and Y-direction; The laser straight access of laser instrument incident is incident upon the 3rd groove of described incidence zone, and through described the 4th groove of reflexing to of the second groove, be incident to one the 5th groove after Multi reflection between described the 4th groove and described the second groove, through again being incident to the 4th groove after the 5th groove reflection, and be incident to described the 6th groove after the reflection through the 4th groove and the second groove, through being incident to described the second groove after one the 6th groove reflection; Described the 3rd mirror reflects is from the laser of the second groove incident described in described the second catoptron, and make described laser through after described the 3rd mirror reflects along forming laser feedback in original optical path return laser light device.
Compared with prior art, displacement measurement system provided by the invention, by being set, the second catoptron and the first catoptron form feedback unit in feedback unit, utilize laser feedback effect a little less than the substance high-order that comes and goes between the first catoptron and the second catoptron, have the high-order frequency-doubled effect on the one hand, can reach nano level displacement measurement resolution; On the other hand, the resolution of described displacement measurement system can be counted according to the reflected light in feedback unit and obtain simultaneously, demarcate and need not other devices, so method is simpler, therefore has broad application prospects.
Description of drawings
Fig. 1 is the structural representation of the displacement measurement system that provides of first embodiment of the invention.
Fig. 2 is the structural representation of feedback unit in the described displacement measurement system of Fig. 1.
Fig. 3 is the structural representation of the first catoptron and the second catoptron in feedback unit shown in Figure 2.
Fig. 4 is the structural representation of the second catoptron in feedback unit shown in Figure 2.
Fig. 5 is the index path in feedback unit.
The structural representation of the displacement measurement system that Fig. 6 provides for second embodiment of the invention.
Fig. 7 is the structural representation of feedback unit in displacement measurement system shown in Figure 6.
Fig. 8 is the structural representation of the first catoptron in feedback unit shown in Figure 7.
Fig. 9 is that the first catoptron shown in Figure 8 is along the structural representation of Y-Z face.
Figure 10 is that the first catoptron shown in Figure 8 is along the structural representation of X-Z face.
Figure 11 is that the first catoptron shown in Figure 8 is along the structural representation of X-Z face.
Figure 12 is the feedback intensity modulation curve of traditional displacement measurement system.
The feedback intensity modulation curve of the displacement measurement system that Figure 13 provides for second embodiment of the invention.
The main element symbol description
| The |
1 |
| The |
2 |
| The second inner chamber catoptron | 3 |
| Birefringence element | 4 |
| |
5 |
| Gain |
6 |
| The first |
7 |
| Amici prism | 8 |
| The |
9 |
| The |
10 |
| |
11 |
| |
12 |
| |
13 |
| |
20 |
| |
30 |
| Data acquisition and |
40 |
| |
101 |
| The |
102 |
| The |
103 |
| The |
104 |
| The second boot section | 105 |
| The |
1013 |
| The |
1012 |
| |
201 |
| The |
2012 |
| The |
1011 |
| The |
1011a、1021a、1031a、1041a、1051a |
| The |
1011b、1021b、1031b、1041b、1051b |
| The |
2011 |
| The |
2011a |
| The |
2011b |
Following specific embodiment further illustrates the present invention in connection with above-mentioned accompanying drawing.
Embodiment
Describe displacement measurement system provided by the invention and measuring method thereof in detail below with reference to accompanying drawing.
See also Fig. 1, first embodiment of the invention provides a kind of displacement measurement system, and described displacement measurement system comprises laser instrument 20, one feedback units 30 and a data acquisition and a processing unit 40.Enter described feedback unit 30 from the laser of described laser instrument 20 outputs, return to described laser instrument 20 after feedback unit 30 feedback reflections, and enter data acquisition and processing unit 40.
Described laser instrument 20 is used for the output double-frequency laser; Can select gas laser, solid state laser or semiconductor laser etc.In the present embodiment, described laser instrument 20 is a helium-neon laser.Described laser instrument 20 comprises a shell 15, and is arranged at one first inner chamber catoptron 7, a gain tube 6, an anti-reflection window 5, a birefringence element 4 and one second inner chamber catoptron 3 in shell 15.Described shell 15 helps to keep temperature and the thermal equilibrium of laser instrument 20 inside.Described gain tube 6 can be fixed in described shell 15 by a bracing frame 14.Be appreciated that support frame as described above 14, shell 15 are an optional structure.Described the first inner chamber catoptron 7, gain tube 6, anti-reflection window 5, birefringence element 4 and the second inner chamber catoptron 3 are along the axis coaxial setting successively of described laser instrument 20 Output of lasers, and the inner chamber of formation laser instrument.Described birefringence element 4 makes described laser instrument 20 output double-frequency lasers for generation of frequency splitting, and the material of described birefringence element 4 can be quartz crystal, bilingual stone etc., also can produce the material of frequency splitting for other.Described birefringence element 4 and arranges with described anti-reflection window 5 and described the second inner chamber catoptron 3 intervals between described anti-reflection window 5 and described the second inner chamber catoptron 3.Described birefringence element 4 has two relative planes on the Output of laser axis direction, and anti-reflection film is all plated on described two planes.The chamber length of the inner chamber of described laser instrument 20 can be 180mm～200mm.
The interference laser that described data acquisition and processing unit 40 are exported from described laser instrument 20 first inner chamber catoptrons 7 in order to reception, and carry out data and process and calculate umber of pulse.Described data acquisition and processing unit 40 comprise an Amici prism 8, the first photodetector 9, the second photodetector 10, a filter amplification circuit 11, a signal processing unit 12 and a display device 13.Described Amici prism 8 arranges near the first inner chamber catoptron 7 of described laser instrument 20, with the laser of reception first inner chamber catoptron 7 outputs from laser instrument 20, and the laser of output is divided into o light, the e light component that two-way has phasic difference in the space.Described the first photodetector 9, the second photodetector 10 be in order to surveying respectively o light and the e light component by Amici prism 8 outputs, and be converted into two path signal.Described filter amplification circuit 11 is electrically connected to described the first photodetector 9 and the second photodetector 10, and two path signal is carried out current/voltage-converted, amplification and filtering process.Described signal processing unit 12 is used for counting is processed and realized to the two path signal of filter amplification circuit 11 outputs, the umber of pulse N that produces during with the calculating change in optical path length, and direction of motion relatively leading according to the position of two path signal or the judgement testee that lags behind.Further, can be electrically connected to described signal processing unit 12 by described display device 13, be used for number of pulses N and show.Be appreciated that described display device 13 is only an optional structure, described umber of pulse N also can obtain by other counting elements.
See also Fig. 2 and Fig. 3, described feedback unit 30 comprises one first catoptron 1, the second catoptron 2 and one the 3rd catoptron 1013, described the second catoptron 2 and interval relative with described the first catoptron 1 arranges, its minimum spacing d can be more than or equal to 1 millimeter less than or equal to 1000 millimeters, as 2 millimeters, 5 millimeters, 10 millimeters, 20 millimeters etc.Described feedback unit 30 consists of the FP feedback exocoel of described laser instrument 20.The material of described the first catoptron 1 and the second catoptron 2 can be glass, also can be other transparent solid materials.Described the first catoptron 1 has a first surface 101 towards described laser instrument 20, makes the Output of laser can be directly into being incident upon described first surface 101.Described the second catoptron 2 has a second surface 201 and is oppositely arranged with described first surface 101, be incident to second surface 201 after being incident to the laser reflection of first surface 101, and return to again first surface 101 through after the reflection of second surface 201, by that analogy.Through after Multi reflection, described laser reflexes to the 3rd catoptron 1013 from described second surface 201, after the 3rd catoptron 1013 reflections along forming laser feedback in original optical path return laser light device 20.
The first surface 101 of described the first catoptron 1 comprises a plurality of first reflector elements of adjacent setting, the surface of described second surface 201 comprises a plurality of second reflector elements of adjacent setting, the laser of laser instrument 20 output is directly incident on described the first reflector element, and through reflection back reflection to the second reflector element of the first reflector element; And then through first reflector element that reflexes to of the second reflector element, by that analogy, the laser of described laser instrument output is at the first reflector element and the second reflector element Multi reflection.At last, incide described the 3rd catoptron 1013 through the laser of the second reflector element reflection, through after the reflection of the 3rd catoptron 1013 along in original optical path return laser light device 20, form laser feedback.Concrete, described each first reflector element can comprise one first groove 1011, described each second reflector element comprises one second groove 2011.The bearing of trend of described the first groove 1011 and the second groove 2011 is all identical.Each first groove 1011 comprises one first side 1011a and one second side 1011b, and each second groove 2011 comprises one the 3rd side 2011a and one the 4th side 2011b.The laser of laser instrument 20 outputs is directly incident on one first side 1011a, then reflexes to the second adjacent side 1011b; Reflex to the 3rd side 2011a through the second side 1011b, then reflex to the 4th side 2011b; After the 4th side 2011b reflection, then reflex to the first side 1011a of next the first reflector element, the like, laser between the first reflector element and the second reflector element toward interflection.At last, the laser that reflects through the 4th side 2011b incides described the 3rd catoptron 1013, after the 3rd catoptron 1013 reflections, along in original optical path return laser light device 20, forms laser feedback.
See also Fig. 3, the Laser output direction of definition laser instrument 20 is the Z direction, is defined as respectively directions X, Y-direction with the direction of Z perpendicular direction, and X, Y, Z are mutually vertical.Described a plurality of the first groove 1011 extends along directions X, and namely the bearing of trend of described the first groove 1011 is perpendicular to the direction of described laser instrument 20 Output of lasers, and described a plurality of the first groove 1011 is arranged side by side along Y-direction.Described the first side 1011a and the second side 1011b are a plane, and mutually vertically form described the first groove 1011.Described the first groove 1011 can be V-arrangement at the xsect of directions X, also can be other shapes, as long as guarantee described the first side 1011a and described the second vertical setting of side 1011b.Described the first side 1011a and the second side 1011b alternately arrange on Y-direction, form one first fin 1012 between two adjacent the first grooves 1011, and the drift angle of described the first fin 1012 is the right angle.Described the first fin 1012 can be the absolute construction that is arranged at a matrix (not shown), also can form an integrative-structure with described matrix.In the present embodiment, described each first fin 1012 combines for two right-angle prisms that are arranged at a matrix surface, and the xsect of right-angle prism on its bearing of trend is isosceles triangle.The first side 1011a and the second side 1011b that the inclined-plane consists of described the first groove 1011 are set in described right-angle prism in opposite directions.The degree of depth of described a plurality of the first grooves 1011 and width are all identical.Described " width " refer to described each first groove 1011 Y-direction across ultimate range.In the present embodiment, the width of described the first groove 1011 is 23 millimeters.The laser straight access of laser instrument 20 outputs is incident upon described the first side 1011a, and is incident to described the second side 1011b after the first side 1011a reflection, and the normal of described laser instrument 20 Output of lasers and described the first side 1011a is 45 degree.
See also Fig. 4, described the second catoptron 2 has a second surface 201 relative with described first surface 101, described second surface 201 has a plurality of the second grooves 2011 that extend side by side in the same direction equally, the bearing of trend of described the second groove 2011 is identical with the bearing of trend of described the first groove 1011, and described a plurality of the second groove 2011 equally along Y-direction side by side.Form one second fin 2012 between the second adjacent groove 2011, and the drift angle of described the second fin 2012 is the right angle.The structure of described the second groove 2011 as shape, the degree of depth and width all with as described in the first groove 1011 identical.Described a plurality of the second groove 2011 and described a plurality of the first staggered corresponding settings of groove 1011.Described staggered corresponding setting refers to described the second groove 2011 and described the first fin 1012 in the face of arranging, and described the second fin 2012 is faced setting with described the first groove 1011.Described the 3rd side 2011a and the 4th side 2011b intersect vertically and form described the second groove 2011, and the xsect of described the second groove 2011 on directions X is V-arrangement.Form one second fin 2012 between two adjacent the second grooves 2011.Concrete, on the Z direction, described the 3rd side 2011a and described the second side 1011b parallel interval and in the face of arranging, described the 4th side 2011b is parallel with described the first side 1011a and face setting.
Described the 3rd catoptron 1013 is in order to being reflected into the laser that is incident upon the 3rd catoptron 1013, and incident laser is returned in described laser instrument 20 along input path former road.After laser instrument 20 Output of lasers described the first catoptrons 1 of process and the second catoptron 2 Multi reflections, be incident to described the 3rd catoptron 1013, and return along former road in described laser instrument 20 after the 3rd catoptron 1013 reflections, form laser feedback.In the present embodiment, described the 3rd catoptron 1013 is a plane, is arranged at the first surface 101 of described the first catoptron 1, and perpendicular to the direction of described laser instrument 20 Output of lasers.Further, on described the 3rd catoptron 1013 surfaces, the input path of described laser can overlap with reflected light path.Described the 3rd catoptron 1013 is arranged at described a plurality of the first grooves 1011 side by side along the end of Y-direction, is connected with the second side 1011b of described the second groove 1011.Further, described the 3rd catoptron 1013, makes it along original optical path return laser light device 20 with the laser of reflection from the 4th side 2011b incident in the face of the 4th side 2011b along the second groove 2011 of Y-direction end in described the second catoptron 2 arranges.Be appreciated that, described the 3rd catoptron 1013 also can be the reflecting element of independent setting, as catoptron, prism of corner cube etc., can be integrated with described the first catoptron 1, also can arrange respectively, as long as after guaranteeing that the laser of described laser instrument 20 outputs reflects through the 3rd catoptron 1013, can be reflected back described laser instrument 20 formation feedbacks and get final product.
See also Fig. 5, the described first side 1011a sequence of the laser instrument 20 direct incidents of Output of laser is a
1, be b through the second side 1011b sequence of direct incident after its refraction
1On Y-direction with described b
1The first adjacent side 1011a sequence is a
2, with a
2The second adjacent side 1011b sequence is b
2, by that analogy.Described the first side 1011a and described the second side 1011b along Y-direction according to a
1, b
1, a
2, b
2A
n, b
nMode arrange.Described b
nIndividual the second side 1011b is connected with described the 3rd catoptron 1013.Simultaneously, after laser instrument 20 Output of lasers were reflected through the first catoptron 1, described first the 3rd side 2011a sequence of incident was c
1, the 4th side 2011b sequence of incident is d after superrefraction
1On Y-direction with the c of institute
1The 3rd adjacent side 2011a sequence is c
2, with c
2The 4th adjacent side 2011b sequence is d
2, by that analogy.Be described the 3rd side 2011a and described the 4th side 2011b along Y-direction according to c
1, d
1, c
2, d
2C
n, d
nMode arrange.Described d
nIndividual the 4th side 2011b and described the 3rd catoptron 1013 are in the face of arranging, through d
nAfter laser after individual the 4th side 2011b reflection is incident to described the 3rd catoptron 1013, after the reflection through the 3rd catoptron 1013, be back to described d along original optical path
nIn the present embodiment, laser is through d
nAfter reflection, be incident to described the 3rd catoptron 1013 along the direction perpendicular to the 3rd catoptron 1013, and through after the 3rd catoptron 1013 reflections, return along original optical path.
Concrete, the laser of laser instrument 20 outputs is incident to a
1, and through a
1Reflex to b
1, b
1With laser reflection to c
1, c
1Reflex to again d
1, through d
1The reflection back reflection is to a
2, the like.That is to say, laser is according to a
1-b
1-c
1-d
1-a
2-...-a
n-b
n-c
n-d
nMode reflect successively, and laser is through d
nAfter reflection, directly into being incident upon described the 3rd catoptron 1013, and through after the 3rd catoptron 1013 reflections, reflex to d
n, then by being back to along original optical path in laser instrument 20, form feedback.
The principle of described displacement measurement system is as follows.Described the first catoptron 1 is fixed in object under test one surface.Be appreciated that described the first catoptron 1 can omit when described object under test surface itself namely has a plane of reflection.Two the crossed polarized light o light that is produced by birefringence element 4 division and e light, in the situation that the light feedback, light field can be divided into two parts.Reflector space is the inner chamber propagation field of light beam after laser instrument 20 inner chambers come and go a week, and regional transmission is that light beam turns back to the propagation field of laser instrument 20 inner chambers again along former road after interior round n week of feedback unit 30 (being the feedback order).Due to the Multi reflection through the first catoptron 1 and the second catoptron 2, therefore the laser attenuation of laser instrument 20 outputs is larger, so turn back at last in laser cavity the feedback light intensity a little less than, so just can realize substance, high-order, weak feedback effect in the situation that do not add attenuator.Just know the feedback order according to laser at the interior round number of times of feedback unit 30, thereby obtain the resolution of feedback unit 30, and do not need other instrument to demarcate, and have higher resolution.
See also Fig. 6 and Fig. 7, second embodiment of the invention provides a kind of displacement measurement system, and described displacement measurement system comprises laser instrument 20, one feedback units 30 and a data acquisition and a processing unit 40.Enter described feedback unit 30 from the laser of described laser instrument 20 outputs, return to described laser instrument 20 after feedback unit 30 feedback reflections, and enter data acquisition and processing unit 40.Described feedback unit 30 comprises one first catoptron 1 and the second catoptron 2.
The displacement measurement system that second embodiment of the invention provides, basic identical with the displacement measurement system that the first embodiment provides, its difference is, in the displacement measurement system that described the second embodiment provides, described the first catoptron 1 comprises a plurality of reflector spaces.
See also Fig. 8 to Figure 11, the first surface 101 of described the first catoptron 1 is divided into an incidence zone 102, the first echo area 103, the first boot section 104, the second boot section 105 and one the 3rd catoptron 1013 according to the travel path of laser.On directions X, described incidence zone 102 and described the second adjacent setting in boot section 105, described the 3rd catoptron 1013 is arranged at described the second boot section 105 away from an end of incidence zone 102.On Y-direction, described the first boot section 104, the first echo area 103 and described the second boot section 105 set gradually along Y-direction, described the first boot section 104 and described the second boot section 105 be used for guiding described laser at reflection process along the directions X translation.Described the first 103 whiles and described incidence zone 102 and the second adjacent setting in boot section 105 of echo area; Described the first boot section 104 and described the first adjacent setting in echo area 103.Described laser instrument 20 emitting lasers are directly into being incident upon described incidence zone 102, and through after the second catoptron 2 reflection to the first echo area 103, the like, through the first echo area 103, the first boot section 104, the first echo area 103, the second boot section 105, enter to inject at last described the 3rd catoptron 1013, and form feedback through being back in described laser instrument 20 by original optical path after the 3rd catoptron 1013 reflections.
In the present embodiment, described incidence zone 102 comprises that one the 3rd groove 1021 extends along directions X, described each the 3rd groove 1021 comprises one first side 1021a and one second side 1021b, and described the first side 1021a and described the second side 1021b intersect vertically and form described the 3rd groove 1021.The length that described the 3rd groove 1021 extends on directions X equals half of described the 3rd groove 1021 width.The laser straight access of described laser instrument 20 outputs is incident upon described the first side 1021a, and through being incident to described the second side 1021b after the first side 1021a reflection.Described the second side 1021b is parallel with the 3rd side 2011a of described the second catoptron 2 and face setting, after laser reflects through the second side 1021b, is incident to the 3rd side 2011a of described the second catoptron 2.The structure of the structure of described the 3rd groove 1021 and described the first groove 1011 is basic identical.Described the 3rd groove 1021 is formed by two right-angle prisms along the directions X horizontal positioned, and the inclined-plane of two right-angle prisms arranges in opposite directions and forms described the 3rd groove 1021.The width of described the 3rd groove 1021 is 23 millimeters, and development length is 11.5 millimeters.
In the present embodiment, described the first echo area 103 comprises a plurality of the 4th grooves 1031 that extend along directions X, and described a plurality of the 4th grooves 1031 are arranged side by side in Y-direction.Described each the 4th groove 1031 comprises one first side 1031a and one second side 1031b.In described the first side 1031a and described incidence zone 102, the second side 1021b of the 3rd groove 1021 intersects vertically.The length that described the 4th groove 1031 extends is more than or equal to described incidence zone 102, the second boot section 105 length at directions X, thereby guarantees that described laser can incide described the 3rd catoptron 1013.The hierarchy structure of described the 4th groove 1031 is identical with described the 3rd groove 1021.Described the 4th groove 1031 is comprised of 6 right-angle prisms that be arranged in parallel, and the inclined-plane that adjacent two right-angle prisms arrange in opposite directions consists of described the 4th groove 1031, forms 3 the 4th grooves 1031.Described the 4th groove 1031 is in the length l of directions X
2Be 115 millimeters, width is 23 millimeters.The second staggered corresponding setting of groove 2011 on described the 4th groove 1031 and described the second catoptron 2 surfaces.After the reflection of described laser instrument 20 emitting lasers through incidence zone 102 and the second catoptron 2, be incident to the first side 1031a of described the 4th groove 1031, then reflex to the second side 1031b, and reflex to the second catoptron 2 through the second side 1031b, the like.
Described the first boot section 104 comprises a plurality of the 5th grooves 1041 that extend along Y-direction, and described each the 5th groove 1041 comprises one first side 1041a and the second side 1041b that intersects vertically.The structure of the structure of described the 5th groove 1041 and described the 3rd groove 1021 is basic identical, and bearing of trend is mutually vertical.On directions X, described a plurality of the 5th groove 1041 is arranged side by side, and the total length that extends at the above a plurality of the 5th groove 1041 that are arranged side by side of directions X is more than or equal to the development length of described the 4th groove 1031, thereby guarantees that described laser can incide described the 3rd catoptron 1013.The laser of described laser instrument 20 outputs enters in 104 1 5th grooves 1041 of described the first boot section through the Multi reflection between incidence zone 102 and the first echo area 103 and the second catoptron 2.Described the 3rd groove 1021 on Y-direction with the one first corresponding setting of side 1051a of described the 5th groove 1041, namely through after reflection between the 3rd groove 1021 and the second catoptron 2, through after Multi reflection between the 4th groove 1031 and described the second catoptron 2, at first incide described the first side 1051a again.The width of described each the 5th groove 1041 equals the twice of described the 3rd groove 1021 development lengths, and the first corresponding setting of side 1041a of described the 3rd groove 1021 and described the 5th groove 1041, namely on directions X, the length that described the 3rd groove 1021 extends equals the development length of the first side 1041a, and laser is through being incident to described the first side 1041a after Multi reflection, and then through the second side 1041b that reflexes to of the first side 1041a.Described the 5th groove 1041 is comprised of 10 right-angle prisms along the Y-direction setting, and the inclined-plane of adjacent two right-angle prisms consists of described the 5th groove 1041, forms 5 the 5th grooves 1041.Each right-angle prism is 11.5 millimeters in the length of Y-direction.The width that forms each the 5th groove 1041 is 23 millimeters, and the length of extending on Y-direction is 11.5 millimeters.Be appreciated that the length that the 5th groove 1041 extends is not limited to above the act on Y-direction, as long as guarantee that length that described the 5th groove 1041 extends is more than or equal to half of the second groove 2011 width described in described the second catoptron 2 on Y-direction.
Described the second boot section 105 comprises a plurality of the 6th grooves 1051 that extend along Y-direction, and described a plurality of the 6th grooves 1051 are arranged side by side on directions X.Described each the 6th groove 1051 comprises one first side 1051a and the second side 1051b that intersects vertically, and near in described the 6th groove 1051 of described incidence zone 102, described the first side 1051a is connected with described incidence zone 102.The structure of the structure of described the 6th groove 1051 and described the 5th groove 1041 is basic identical and extend in the same direction, further, described the 6th groove 1051 and described the 5th staggered corresponding setting of groove 1041, namely the first side 1051a of described the 6th groove 1051 arranges with the second side 1041b corresponding same X coordinate on Y-direction of described the 5th groove 1041; The second side 1051b of described the 6th groove 1051 same X coordinate corresponding to the first side 1041a of described the 5th groove 1041 arranges.Through the laser of the second side 1041b reflection of described the 5th groove 1041 through the first echo area 103 and the second catoptron 2 Multi reflections after, at first be incident to the first side 1051a of described the 6th groove 1041; Through the laser of the second side 1051b reflection of described the 6th groove 1051 through the first echo area 103 and the second catoptron 2 Multi reflections after, be incident to the first side 1041a of described the 5th groove 1041, the like.The length that described the 6th groove 1051 extends at directions X more than or equal to described the 3rd groove 1021 at the development length of Y-direction, and the width of described the 6th groove 1051 equals the twice of described the 3rd groove 1021 development lengths, thereby guarantees can be incident to described the 6th groove 1051 from the laser of laser instrument 20 outputs through after Multi reflection.In the present embodiment, described the second boot section 105 is comprised of 8 right-angle prisms that set gradually along directions X, and the inclined-plane of two adjacent right-angle prisms consists of described the 6th groove 1051, forms 4 the 6th grooves 1051.
Described the 3rd catoptron 1013 is used for the laser of reflection incident, and laser is returned along input path.Described the 3rd catoptron 1013 is arranged at described the second boot section 105 end away from described incidence zone 102 on directions X.Described the 3rd catoptron 1013 can be a plane mirror, also can be a prism of corner cube, can form integrative-structure with described the first catoptron 1, also can be the reflecting element of independent setting.The laser that is incident to the 3rd catoptron 1013 through the 3rd catoptron 1013 reflections after, return along input path.In the present embodiment, described the 3rd catoptron 1013 is the level crossing with described the second boot section 105 adjacent settings.Be appreciated that described the 3rd catoptron 1013 also can with described the first adjacent setting in boot section 104, as long as guarantee that the laser that described laser instrument 20 incides the 3rd catoptron 1013 can return along original optical path.
The principle of described displacement measurement system is as follows.Described the first catoptron 1 is fixed in object under test one surface.Be appreciated that described the first catoptron 1 can omit when described object under test surface itself namely has a plane of reflection.Two the crossed polarized light o light that is produced by birefringence element 4 division and e light, in the situation that the light feedback, light field can be divided into two parts.Reflector space is the inner chamber propagation field of light beam after laser instrument 20 inner chambers come and go a week, and regional transmission is that light beam turns back to the propagation field of laser instrument 20 inner chambers again along former road after interior round n week of feedback unit 30 (being the feedback order).The inner chamber propagation field forms self-mixed interference with the propagation field stack that turns back to inner chamber at the round n of feedback unit 30 after week, and the output intensity of o light and e light can be expressed as under low light level feedback condition:
In formula:
With
The output intensity of two crossed polarized lights when being unglazed feedback,
With
The laser feedback factor,
With
Coupling coefficient,
With
Be the angular frequency of o light and e light, l is the spacing between the first catoptron 1 and the second catoptron 2.Following formula shows that when the light feedback was arranged, the output intensity of two crossed polarized lights was all modulated, and waveform is similar to cosine curve.Especially, the fringe density of feedback fringe is mainly by the feedback order
Determine.
The laser of laser instrument 20 outputs is advanced along following path in described feedback unit 30.The laser straight access of laser instrument 20 outputs is incident upon the first side 1021a of the 3rd groove 1021 in described incidence zone 102, reflexes to the second side 1021b; Be incident to the 3rd side 2011a of the second groove 2011 in described the second catoptron 2 after reflection through the second side 1021b, and reflex to the 4th side 2011b;
After reflection through the 4th side 2011b, described laser is incident to the first side 1031a of the 4th groove 1031 in described the first echo area 103, and reflexes to the second side 1031b;
After reflection through the second side 1031b, described laser is incident to the 3rd side 2011a of the second groove 2011 in described the second catoptron 2, and reflex to the 4th side 2011b, then be reflected back the first side 1031a of the 4th groove 1031 in described the first echo area 103;
After Multi reflection between the first echo area 103 and the second catoptron 2, be incident to the first side 1041a of the 5th groove 1041 described in described the first boot section 104, and reflex to the second side 1041b;
After the second side 1041b reflection, described laser is incident to the 4th side 2011b of described the second catoptron 2, and reflexes to the 3rd side 2011a;
After the 3rd side 2011a reflection, described laser is incident to the second side 1031b of the 4th groove 1031 described in described the first echo area 103, and reflexes to the first side 1031a;
After Multi reflection between the first echo area 103 and the second catoptron 2, described laser is incident to the first side 1051a of the 6th groove 1051 described in described the second boot section 105, and reflexes to the second side 1051b;
After the second side 1051b reflection, described laser is incident to the 3rd side 2011a of the second groove 2011 in described the second catoptron 2, and reflexes to the 4th side 2011b;
After the 4th side 2011b reflection, described laser is incident to the first side 1031a of the 4th groove 1031 described in described the first echo area 103, and reflexes to the second side 1031b;
After reflection through the second side 1031b, described laser is incident to the 3rd side 2011a of the second groove 2011 described in described the second catoptron 2, and after reflexing to the 4th side 2011b, then be reflected back described the first echo area 103;
Described laser through the Multi reflection between the first echo area 103 and the second catoptron 2 after, be incident to described the first boot section 104, after reflection through the first boot section 104 and described the second catoptron 2, once more be reflected back described the first echo area 103, and reflex to described the second boot section 105, loop successively.
Finally, described laser is through after Multi reflection, be incident to described the 3rd catoptron 1013 from the laser of the 3rd side 2011a reflection of the second groove 2011 described in described the second catoptron 2, then through the reflection of the 3rd catoptron 1013, make described laser be back in described laser instrument 20 along input path, form laser feedback.
See also Figure 12 and Figure 13, during measurement, move along the laser axis direction described incidence zone 102, and the laser intensity curve that described the first photodetector 9, the second photodetector 10 obtain as shown in figure 13, be very close high-order frequency multiplication striped, be tens times of the weak feedback of tradition shown in Figure 12.The optical resolution of described displacement measurement system can be less than 10 nanometers, less than 8 nanometers, less than 5 nanometers, less than 2 nanometers.As can be seen from Figure 13, when the round number of times when the laser of laser instrument 20 outputs arrives the 3rd catoptron 1013 through repeatedly coming and going is 40, because laser is returned along former road by the 3rd catoptron 1013, so total order of reflection is 80 times, the feedback order that is feedback fringe is 80, and corresponding optical resolution is 4nm.After the first photodetector 9, the second photodetector 10 detect this feedback fringe, utilize 11 pairs of signals of filter amplification circuit to carry out filter amplifying processing; Then utilize signal processing unit 12, realize the digital conversion and further shaping, filtering of signal, and the edge of two paths of signals is processed and realized counting, and measurement result is presented on display device 13.
The present invention is based on the displacement measurement system of FP feedback exocoel, utilize the weak feedback effect of laser substance high-order, not only have the high-order frequency-doubled effect, reach nano level displacement measurement resolution; But also the further electronic fine-grained Measurement Resolution of Subnano-class and the direction of motion of recognition object of reaching; In addition, the method also has advantages of optical resolution from demarcating, and can just can obtain the feedback order according to the order of reflection of FP feedback chamber mirror, thereby obtain the resolution of displacement measurement system, and not need other benchmark instruments to demarcate.Described displacement measurement system have resolution high, simple in structure, can be traceable to the characteristics such as optical maser wavelength.
In addition, those skilled in the art also can do other and change in spirit of the present invention, and these variations of doing according to spirit of the present invention certainly all should be included in the present invention's scope required for protection.
Claims (10)
1. displacement measurement system mainly comprises:
One laser instrument is in order to export double-frequency laser;
One data acquisition and processing unit are in order to the interference laser that receives laser instrument output and carry out data and process;
It is characterized in that, further comprise a feedback unit, described feedback unit comprises:
One first catoptron, described the first catoptron have a first surface with direct reception incident laser, and described first surface has a plurality of the first grooves that extend along first direction, and each first groove comprises one first vertical side and one second side;
One second catoptron and interval relative with described the first catoptron arranges, described the second catoptron has the second surface of facing with described first surface, described second surface comprises a plurality of the second grooves that extend along first direction, and each second groove comprises one the 3rd vertical side and one the 4th side; And
One the 3rd catoptron is arranged on described the first catoptron one side, and in the face of described the second catoptron setting, the laser straight access of laser instrument output is incident upon described the first catoptron, after Multi reflection between a plurality of second grooves of a plurality of first grooves of described the first catoptron and the second catoptron, be incident to described the 3rd catoptron, through after described the 3rd mirror reflects along forming laser feedback in original optical path return laser light device.
2. displacement measurement system as claimed in claim 1, is characterized in that, a plurality of first grooves of described the first catoptron and the staggered corresponding setting of a plurality of second grooves of the second catoptron.
3. displacement measurement system as claimed in claim 2, it is characterized in that, the 3rd side of described the second groove and the second parallel sided of described the first groove and in the face of arranging, the 4th side of described the second groove and the second parallel sided of described the first groove and in the face of setting.
4. displacement measurement system as claimed in claim 1, is characterized in that, is a level crossing at described the 3rd catoptron, and the input path of described laser overlaps with reflected light path.
5. displacement measurement system as claimed in claim 1, is characterized in that, described the 3rd catoptron and described the first mirror integral moulding.
6. displacement measurement system mainly comprises:
One laser instrument is in order to the double-frequency laser of output along the Z direction;
One data acquisition and processing unit are in order to the interference laser that receives laser instrument output and carry out data and process;
It is characterized in that, further comprise a feedback unit, described feedback unit comprises one first catoptron, the second catoptron and one the 3rd catoptron, described the first catoptron and interval relative with described the second catoptron arranges, described the first catoptron has a first surface, and described first surface comprises an incidence zone, the first echo area, the first boot section, the second boot section;
Described incidence zone has a plurality of the 3rd grooves that extend along directions X;
Described the first echo area has a plurality of the 4th grooves that extend along directions X, and described the 4th groove and described the 3rd groove are arranged side by side;
Described the first boot section, the first echo area and described the second boot section set gradually along Y-direction, and described the first boot section has a plurality of the 5th grooves that extend along Y-direction;
Described the second boot section has a plurality of the 6th grooves that extend along Y-direction, described the 6th groove and the staggered corresponding setting of described the 5th groove;
Described the second catoptron has a second surface and described first surface is faced setting, and described second surface has a plurality of the second grooves that extend along directions X; Wherein, the direction of laser instrument Output of laser is the Z direction, with the direction of Z perpendicular direction be orthogonal directions X and Y-direction;
The laser straight access of laser instrument incident is incident upon the 3rd groove of described incidence zone, and through described the 4th groove of reflexing to of the second groove, be incident to one the 5th groove after Multi reflection between described the 4th groove and described the second groove, through again being incident to the 4th groove after the 5th groove reflection, and be incident to described the 6th groove after the reflection through the 4th groove and the second groove, through being incident to described the second groove after one the 6th groove reflection; Described the 3rd mirror reflects is from the laser of the second groove incident described in described the second catoptron, and make described laser through after described the 3rd mirror reflects along forming laser feedback in original optical path return laser light device.
7. displacement measurement system as claimed in claim 6, is characterized in that, on directions X, and described incidence zone and described the second adjacent setting in boot section, described the 3rd catoptron is arranged at described the second boot section away from an end of incidence zone; On Y-direction, described the first echo area while and the adjacent setting in described incidence zone and the second boot section; Described the first boot section and described the first adjacent setting of reflector space.
8. displacement measurement system as claimed in claim 6, it is characterized in that, described the 3rd groove on Y-direction with described the 5th groove in the one first corresponding setting in side, the laser of laser instrument output through the reflection between the 3rd groove, the 4th groove and the second catoptron after, incide described the first side.
9. displacement measurement system as claimed in claim 6, is characterized in that, the width of described the 6th groove equals the width of described the 5th groove.
10. displacement measurement system as claimed in claim 6, is characterized in that, the optical resolution of described displacement measurement system is less than 5 nanometers.
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| CN108662984A (en) * | 2018-07-17 | 2018-10-16 | 北方民族大学 | A kind of precise displacement sensor and its measurement method based on corner cube mirror group |
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